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JPH0530381B2 - - Google Patents
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JPH0530381B2 - - Google Patents

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Publication number
JPH0530381B2
JPH0530381B2 JP62271688A JP27168887A JPH0530381B2 JP H0530381 B2 JPH0530381 B2 JP H0530381B2 JP 62271688 A JP62271688 A JP 62271688A JP 27168887 A JP27168887 A JP 27168887A JP H0530381 B2 JPH0530381 B2 JP H0530381B2
Authority
JP
Japan
Prior art keywords
laminate
heat
weight
parts
metal
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP62271688A
Other languages
Japanese (ja)
Other versions
JPH01114433A (en
Inventor
Takeo Kimura
Shunji Chikamori
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NIPPON KODOSHI KOGYO KK
Original Assignee
NIPPON KODOSHI KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NIPPON KODOSHI KOGYO KK filed Critical NIPPON KODOSHI KOGYO KK
Priority to JP27168887A priority Critical patent/JPH01114433A/en
Publication of JPH01114433A publication Critical patent/JPH01114433A/en
Publication of JPH0530381B2 publication Critical patent/JPH0530381B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0306Inorganic insulating substrates, e.g. ceramic, glass
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/38Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/386Improvement of the adhesion between the insulating substrate and the metal by the use of an organic polymeric bonding layer, e.g. adhesive

Landscapes

  • Ceramic Products (AREA)
  • Laminated Bodies (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

〔産業上の利用分野〕 本発明は電子部品用材料等に使用される金属と
金属及び/又はセラミツクスを積層した高信頼性
の耐熱積層体に関する。 〔従来の技術〕 金属およびセラミツクスは熱伝導性に優れた材
料であり、その積層体はアルミナ基板に代表され
る電子部品用材料をはじめとする種々の用途に使
用され、今後さらに発展が期待されている。 この積層体の接着層には、従来から主としてエ
ポキシ系接着剤が用いられてきた(例えば、特開
昭58−18290号参照)。 しかし、エポキシ系接着剤には耐熱性が充分で
ないという問題点がある。 そこで、エポキシ系接着剤よりももつと耐熱性
の優れた芳香族ポリアミドイミドと接着性付与剤
からなる接着層を用いる方法が提案されている
(特開昭55−15826号参照)。 しかし残念ながらいずれの方法も昨今の高度な
耐熱性の要求を満足するものにはなり得ていな
い。 〔発明が解決しようとする問題点〕 すなわち、実用されていエポキシ系接着剤には
略々200℃程度の耐熱性しかなく、高温での信頼
性に欠けている。 一方、芳香族ポリアミドイミドと接着性付与剤
からなる接着剤は、確かにエポキシ系接着剤に比
べ、かなり高い耐熱性を示しているものの熱湿
時、つまり熱と湿度の両方の負荷がかかつたよう
な場合の密着性が充分でなく、厳しい環境下での
信頼性に欠けるという問題点が残つていた。 〔問題点を解決するための手段〕 本発明者は上記の問題を解決すべく鋭意検討を
重ねた結果、芳香族ポリアミドイミノド樹脂に特
定のフイラーを加えた接着層を用いることによ
り、耐熱性が優れ、且つ熱湿下の接着信頼性が高
く、金属又はセラミツクスが有している高い耐熱
性を生かした優れた積層体が得られたことを見出
し本発明に到達した。 すなわち本発明は、少なくとも1つの層が金属
であり、他の層が金属あるいはセラミツクスであ
る積層体において、接着層が 一般式
[Industrial Field of Application] The present invention relates to a highly reliable heat-resistant laminate in which metals and/or ceramics are laminated to be used as materials for electronic parts and the like. [Prior art] Metals and ceramics are materials with excellent thermal conductivity, and their laminates are used for a variety of purposes, including materials for electronic components such as alumina substrates, and further development is expected in the future. ing. Conventionally, epoxy adhesives have been mainly used for the adhesive layer of this laminate (see, for example, Japanese Patent Laid-Open No. 18290/1983). However, epoxy adhesives have a problem in that they do not have sufficient heat resistance. Therefore, a method has been proposed that uses an adhesive layer made of aromatic polyamideimide, which has better heat resistance than epoxy adhesives, and an adhesive agent (see Japanese Patent Application Laid-Open No. 15826/1983). Unfortunately, however, none of these methods has been able to satisfy the recent demands for high heat resistance. [Problems to be Solved by the Invention] In other words, epoxy adhesives currently in practical use only have a heat resistance of about 200° C. and lack reliability at high temperatures. On the other hand, adhesives made of aromatic polyamide-imide and adhesion promoters do show significantly higher heat resistance than epoxy adhesives, but they do not work well in hot and humid conditions, that is, when subjected to both heat and humidity loads. The problem remained that adhesion was insufficient in such cases, and reliability was lacking in harsh environments. [Means for Solving the Problems] As a result of extensive studies in order to solve the above problems, the inventors of the present invention have found that heat-resistant The present invention has been achieved based on the discovery that an excellent laminate can be obtained that has excellent adhesion reliability under hot and humid conditions and takes advantage of the high heat resistance of metals or ceramics. That is, the present invention provides a laminate in which at least one layer is made of metal and the other layers are made of metal or ceramics, in which the adhesive layer has the general formula:

【式】もしく は、 (但し、Xは酸素原子、硫黄原子、スルホニル
基、カルボニル基又はメチレン基を表わし、nは
2以上の整数を表わす)で表わされる極性有機溶
媒可溶性芳香族ポリアミドイミド樹脂と熱伝導度
が0.05cal/cm・sec・℃以上のベリリヤ、マグネ
シア、窒化ホウ素、アルミナ、炭化ケイ素、窒化
ケイ素、カーボン及びこれらの混合物から選ばれ
た高熱伝導性フイラーを1〜35容量%有する組成
物であることを特徴とする耐熱積層体を提供する
ものである。 以下本発明を詳細に説明する。 本発明の積層体の少なくとも1つの層は、金属
層であり、他の層は目的に応じて金属あるいはセ
ラミツクから選択できる。電子部品材料、特に放
熱基板の場合には金属である場合が多い。 金属層としては銅、アルミニウム等の層状にす
ることができる全ての金属に適用できる。又、セ
ラミツクス層としてはセラミツクスであればよ
く、種々のものが使用できる。例えば、アルミ
ナ、ジルコニア、窒化ケイ素、窒化ホウ素、炭化
ケイ素などが使用できる。 次に本発明の要部である接着層に用いられる芳
香族ポリアミドイミド樹脂は極性有機溶媒可溶性
の芳香族ポリアミドイミド樹脂であつて、 一般式
[Formula] or (However, X represents an oxygen atom, a sulfur atom, a sulfonyl group, a carbonyl group, or a methylene group, and n represents an integer of 2 or more) and a polar organic solvent-soluble aromatic polyamideimide resin with a thermal conductivity of 0.05 cal. The composition is characterized by having 1 to 35% by volume of a high thermal conductivity filler selected from beryllia, magnesia, boron nitride, alumina, silicon carbide, silicon nitride, carbon, and mixtures thereof with a temperature of /cm・sec・℃ or more. The present invention provides a heat-resistant laminate having the following properties. The present invention will be explained in detail below. At least one layer of the laminate of the present invention is a metal layer, and other layers can be selected from metal or ceramic depending on the purpose. Electronic component materials, especially heat-dissipating substrates, are often metals. As the metal layer, all metals that can be formed into a layer, such as copper and aluminum, can be used. Further, the ceramic layer may be any ceramic, and various types can be used. For example, alumina, zirconia, silicon nitride, boron nitride, silicon carbide, etc. can be used. Next, the aromatic polyamide-imide resin used in the adhesive layer, which is the main part of the present invention, is an aromatic polyamide-imide resin soluble in a polar organic solvent, and has the general formula:

【式】 もしくは、 (但し、Xは酸素原子、硫黄原子、スルホニル
基、カルボニル基又はメチレン基を表わし、nは
2以上の整数を表わす)で示される樹脂、又はそ
の混合物が用いられる。 本発明で用いる芳香族ポリアミドイミド樹脂の
還元粘度は0.5以上であれば特に制限されないが、
使用時の溶液粘度より3.5付近迄が実用的である。
還元粘度が低すぎると機械的強度及び可撓性が低
下するし、還元粘度が高すぎると極性有機溶媒に
対する溶解度が低下し実用的でなくなる。 これらの芳香族ポリアミドイミド樹脂は、公知
の方法、例えば 芳香族ジアミンと無水トリメリツト酸クロラ
イドとを反応させるか或いは芳香族ジイソシア
ネートとビスイミドジカルボン酸を反応させるか
によつて製造することができる。 このうちの反応を代表例として以下に説明す
る。 (A)
[Formula] Or, (However, X represents an oxygen atom, a sulfur atom, a sulfonyl group, a carbonyl group, or a methylene group, and n represents an integer of 2 or more) or a mixture thereof is used. The reduced viscosity of the aromatic polyamideimide resin used in the present invention is not particularly limited as long as it is 0.5 or more, but
A solution viscosity of around 3.5 during use is practical.
If the reduced viscosity is too low, the mechanical strength and flexibility will decrease, and if the reduced viscosity is too high, the solubility in polar organic solvents will decrease, making it impractical. These aromatic polyamide-imide resins can be produced by a known method, for example, by reacting an aromatic diamine with trimellitic anhydride chloride or reacting an aromatic diisocyanate with bisimidodicarboxylic acid. One of these reactions will be described below as a representative example. (A)

【式】 (式中のXは前記と同じ意味をもつ)或いは、 (B)【formula】 (X in the formula has the same meaning as above) or (B)

〔実施例〕〔Example〕

次に実施例、比較例で本発明を具体的に説明す
るが、本発明はこれらに限定されるものではな
い。 なお、実施例及び比較例で行つた積層体の評価
方法および条件は以下の通りである。 ハンダ耐熱性:試験片を300℃のハンダ浴に
30秒浸漬したときのふくれ及びはがれの有無を
みた。 密着性:クロスカツトテープ法で測定した。
試験片の金属箔面を、JIS K 5400のゴバン目
試験法に準じてクロスカツト後、PETテープ
を付着し、ついで引きはがし100箇の升目中の
残存升目数を測定した。なお密着性テストでは
該積層体を350℃3時間熱処理したものおよび
121℃2気圧のプレツシヤークツカーに1時間
放置したものの評価を行い、高温下および熱湿
下での信頼性を確認した。 接着性:JIS C 6481引きはがし強さ試験法
に準じて測定を行つた。 実施例 4 4,4′−ジアミノジフエニルエーテル
(DADPE)と無水トリメリツト酸クロリド
(TMAC)から合成した有機極性溶媒可溶性の芳
香族ポリアミドイミド樹脂(以下PAIと略す;還
元粘度1.6:比重1.5)100重量部に、N−メチル
ピロリドン450重量部を加えて、該PAIを溶解し
た。次いで平均粒径1.5μmの窒化ホウ素微粉末
(BN)(昭和電工社製シヨウビーエヌ:比重2.25)
20重量部をNMP50重量部に分散させた溶液と上
記PAI樹脂溶液とを混合し、ボールミールでBN
を均一に分散させ、ペースト状の組成物を得た。 次いで、該組成物を銅板(厚さ1mm)にペース
ト状で100μmコーテイングし、90℃で10分間予
備乾燥後、この組成物に圧延銅箔(厚さ35μm)
を重ね合わせ、上下にテフロンおよびシリコーン
ゴムシートのクツシヨン材をはさみ、プレス機に
て10Kg/cm2180℃30分間加熱圧着した。 この積層体の評価を前記の方法について行つた
結果ハンダ耐熱性ではふくれやはがれが見られ
なかつた。また、接着性テストではブランクで
1.61Kg/cm、350℃3時間の高温下処理で1.40
Kg/cm、プレツシヤークツカー処理後(121℃2
気圧1時間)で1.55Kg/cmといずれも接着性は良
好なものであつた。 実施例 2 実施例1で用いた組成物をアプリケーターで厚
さ約10μmの薄いフイルムを作製後、130℃、190
℃で各々30分加熱処理した。次にこのフイルムの
表面にN−メチルピロリドンを薄く噴霧し、アル
ミニウム箔(厚さ15μm)とアルミナの薄板(ノ
リタケ製厚み635μm)の間に入れテフロン及び
シリコンゴムシートのクツシヨン材で上下から押
え、5Kg/cm2、180℃、30分間プレス機で加熱圧
着しアルミニウム箔とアルミナの積層体を得た。 この積層体を実施例1と同じ方法、条件で評価
した結果ハンダ耐熱性ではふくれが観察され、
密着性テストでもブランクでは100/100、
350℃の高温処理で100/100、プレツシヤークツ
カー処理後で100/100であり、信頼性の非常に高
い積層体であることがわかつた。 実施例 3、4 実施例1と同様の方法によつて表1に示すよう
な金属の積層体を作製し、夫々の積層体の評価を
行つた。結果を表1に示す。いずれの積層体も優
れた効果を示した。
Next, the present invention will be specifically explained using Examples and Comparative Examples, but the present invention is not limited thereto. The evaluation methods and conditions for the laminates in Examples and Comparative Examples are as follows. Solder heat resistance: test piece in a 300℃ solder bath
The presence or absence of blistering and peeling was observed when immersed for 30 seconds. Adhesion: Measured by cross-cut tape method.
After cross-cutting the metal foil surface of the test piece according to the cross-cut test method of JIS K 5400, PET tape was attached, and then it was peeled off to measure the number of squares remaining among the 100 squares. In the adhesion test, the laminate was heat-treated at 350°C for 3 hours and
The product was evaluated after being left in a pressurizer at 121°C and 2 atm for 1 hour, and its reliability under high temperature and heat and humidity was confirmed. Adhesion: Measured according to JIS C 6481 peel strength test method. Example 4 Organic polar solvent soluble aromatic polyamideimide resin (hereinafter abbreviated as PAI; reduced viscosity 1.6: specific gravity 1.5) synthesized from 4,4'-diaminodiphenyl ether (DADPE) and anhydrous trimellitic acid chloride (TMAC) 100 450 parts by weight of N-methylpyrrolidone was added to the parts by weight to dissolve the PAI. Next, fine boron nitride powder (BN) with an average particle size of 1.5 μm (Showa Denko BN: specific gravity 2.25)
A solution in which 20 parts by weight of NMP is dispersed in 50 parts by weight of NMP is mixed with the above PAI resin solution, and BN is mixed with a ball mill.
was uniformly dispersed to obtain a paste composition. Next, a copper plate (thickness 1 mm) was coated with the composition in a paste form with a thickness of 100 μm, and after preliminary drying at 90°C for 10 minutes, this composition was coated with a rolled copper foil (thickness 35 μm).
were stacked on top of each other, cushion materials made of Teflon and silicone rubber sheets were sandwiched between the top and bottom, and heat and pressure bonded at 10 kg/cm 2 at 180°C for 30 minutes using a press. This laminate was evaluated using the method described above, and as a result, no blistering or peeling was observed in terms of solder heat resistance. Also, in the adhesion test, blank
1.61Kg/cm, 1.40 after high temperature treatment at 350℃ for 3 hours
Kg/cm, after pressurization (121℃2
Atmospheric pressure for 1 hour), the adhesion was 1.55 kg/cm, which was good in all cases. Example 2 A thin film with a thickness of about 10 μm was made using an applicator from the composition used in Example 1, and then heated at 130°C and 190°C.
Each sample was heat-treated at ℃ for 30 minutes. Next, a thin layer of N-methylpyrrolidone was sprayed onto the surface of this film, and the film was placed between an aluminum foil (thickness 15 μm) and an alumina thin plate (manufactured by Noritake, thickness 635 μm) and pressed from above and below with cushioning materials made of Teflon and silicone rubber sheets. A laminate of aluminum foil and alumina was obtained by heat-pressing at 5 kg/cm 2 at 180° C. for 30 minutes using a press. This laminate was evaluated using the same method and conditions as in Example 1. As a result, blistering was observed in terms of solder heat resistance.
Even in the adhesion test, the blank was 100/100,
It was found that the laminate was 100/100 after high-temperature treatment at 350°C, and 100/100 after pressure vacuum treatment, making it an extremely reliable laminate. Examples 3 and 4 Metal laminates as shown in Table 1 were produced by the same method as in Example 1, and each laminate was evaluated. The results are shown in Table 1. Both laminates showed excellent effects.

【表】 比較例 1 ポリイミドワニス(東レ社製 トレニース20%
溶液)500重量部とBN(昭和電工社製 シヨビ−
エヌ)20重量部をNMP50重量部に分散させた溶
液を混合し、ボールミールでBNを均一に分散さ
せた。次いで実施例1と同様の方法及び条件で銅
板とアルミニウム箔を加熱圧着して積層体を製作
し、同様に評価を行つた。 結果を表2に示す。 比較例 2 ビスフエノール型エポキシAER 331旭化成社
製 エポキシ当量180〜200)100重量部とBN20
重量部をNMP50重量部に分散させた溶液を混合
し、ボールミールでBNを均一に分散させた。次
に4,4′ジアミノジフエニルメタン25重量部を
NMP75重量部に溶かした溶液を上記BN混合エ
ポキシに加え攪拌した。次いで実施例1と同様の
方法及び条件で銅板とアルミニウム箔を加熱圧着
して積層体を製作し、同様に評価を行つた。 結果を表2に示す。 比較例 3 実施例1で用いたPAI100重量部にNMP400重
量部を加えて溶解した。次いでBN150重量部を
NMP200重量部に分散させた溶液を混合し、ボ
ールミールでBNを均一に分散させた。 次いで実施例1と同様の方法及び条件で銅板と
アルミニウム箔を加熱圧着して積層体を製作し、
同様に評価を行つた。 結果を表2に示す。
[Table] Comparative example 1 Polyimide varnish (Toray Co., Ltd. Torenice 20%)
Solution) 500 parts by weight and BN (Showa Denko Shoby)
N) A solution in which 20 parts by weight of NMP was dispersed in 50 parts by weight of NMP was mixed, and BN was uniformly dispersed using a ball mill. Next, a copper plate and an aluminum foil were bonded under heat and pressure in the same manner and under the same conditions as in Example 1 to produce a laminate, and evaluated in the same manner. The results are shown in Table 2. Comparative example 2 Bisphenol type epoxy AER 331 manufactured by Asahi Kasei Corporation Epoxy equivalent 180-200) 100 parts by weight and BN20
A solution in which part by weight was dispersed in 50 parts by weight of NMP was mixed, and BN was uniformly dispersed using a ball mill. Next, add 25 parts by weight of 4,4'diaminodiphenylmethane.
A solution dissolved in 75 parts by weight of NMP was added to the above BN mixed epoxy and stirred. Next, a copper plate and an aluminum foil were bonded under heat and pressure in the same manner and under the same conditions as in Example 1 to produce a laminate, and evaluated in the same manner. The results are shown in Table 2. Comparative Example 3 400 parts by weight of NMP was added to 100 parts by weight of PAI used in Example 1 and dissolved. Next, add BN150 parts by weight.
A solution containing 200 parts by weight of NMP was mixed, and BN was uniformly dispersed using a ball mill. Next, a laminate was produced by heat-pressing a copper plate and an aluminum foil using the same method and conditions as in Example 1.
Evaluation was conducted in the same way. The results are shown in Table 2.

〔発明の効果〕〔Effect of the invention〕

以上説明してきたように、本発明はハンダ耐熱
性が優れ、しかも熱湿下の接着信頼性を大巾に向
上せしめるという優れた効果を発揮する積層体を
提供するものである。 したがつて、本発明の耐熱積層体を用いること
により、電子部品の熱に対する信頼性が一段と向
上することが期待できる。又、本発明の耐熱積層
体は、その製造工程が簡単で且つ経済的であると
いう効果も有している。
As described above, the present invention provides a laminate that has excellent solder heat resistance and exhibits the excellent effect of greatly improving adhesion reliability under hot and humid conditions. Therefore, by using the heat-resistant laminate of the present invention, it is expected that the reliability of electronic components against heat will be further improved. Furthermore, the heat-resistant laminate of the present invention has the advantage that its manufacturing process is simple and economical.

Claims (1)

【特許請求の範囲】 1 少なくとも1つの層が金属であり、他の層が
金属あるいはセラミツクスである積層体におい
て、接着層が 一般式 【式】もしく は、 (但し、Xは酸素原子、硫黄原子、スルホニル
基、カルボニル基又はメチレン基を表わし、nは
2以上の整数を表わす)で表わされる極性有機溶
媒可溶性芳香族ポリアミドイミド樹脂と熱伝導度
が0.05cal/cm・sec・℃以上のベリリヤ、マグネ
シア、窒化ホウ素、アルミナ、炭化ケイ素、窒化
ケイ素、カーボン及びこれらの混合物から選ばれ
た高熱伝導性フイラーを1〜35容量%有する組成
物であることを特徴とする耐熱積層体。
[Claims] 1. In a laminate in which at least one layer is made of metal and the other layers are made of metal or ceramics, the adhesive layer has the general formula [formula] or, (However, X represents an oxygen atom, a sulfur atom, a sulfonyl group, a carbonyl group, or a methylene group, and n represents an integer of 2 or more) and a polar organic solvent-soluble aromatic polyamideimide resin with a thermal conductivity of 0.05 cal. The composition is characterized by having 1 to 35% by volume of a high thermal conductivity filler selected from beryllia, magnesia, boron nitride, alumina, silicon carbide, silicon nitride, carbon, and mixtures thereof with a temperature of /cm・sec・℃ or more. Heat-resistant laminate.
JP27168887A 1987-10-29 1987-10-29 Heat resistant laminated body Granted JPH01114433A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP27168887A JPH01114433A (en) 1987-10-29 1987-10-29 Heat resistant laminated body

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP27168887A JPH01114433A (en) 1987-10-29 1987-10-29 Heat resistant laminated body

Publications (2)

Publication Number Publication Date
JPH01114433A JPH01114433A (en) 1989-05-08
JPH0530381B2 true JPH0530381B2 (en) 1993-05-07

Family

ID=17503464

Family Applications (1)

Application Number Title Priority Date Filing Date
JP27168887A Granted JPH01114433A (en) 1987-10-29 1987-10-29 Heat resistant laminated body

Country Status (1)

Country Link
JP (1) JPH01114433A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2797044B2 (en) * 1992-04-20 1998-09-17 ニッポン高度紙工業 株式会社 Bonding method and adhesive member
DE102009041574A1 (en) * 2008-10-29 2010-05-12 Electrovac Ag Composite material, method of making a composite, and adhesive or bonding material

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0665697B2 (en) * 1986-02-27 1994-08-24 ニッポン高度紙工業株式会社 Flexible heat resistant resin composition

Also Published As

Publication number Publication date
JPH01114433A (en) 1989-05-08

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