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JPH0531263B2 - - Google Patents
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JPH0531263B2 - - Google Patents

Info

Publication number
JPH0531263B2
JPH0531263B2 JP58099063A JP9906383A JPH0531263B2 JP H0531263 B2 JPH0531263 B2 JP H0531263B2 JP 58099063 A JP58099063 A JP 58099063A JP 9906383 A JP9906383 A JP 9906383A JP H0531263 B2 JPH0531263 B2 JP H0531263B2
Authority
JP
Japan
Prior art keywords
signal
scanning
period
output
detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58099063A
Other languages
Japanese (ja)
Other versions
JPS59224038A (en
Inventor
Teruji Hirai
Fukuo Zenitani
Masao Kawai
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP58099063A priority Critical patent/JPS59224038A/en
Publication of JPS59224038A publication Critical patent/JPS59224038A/en
Publication of JPH0531263B2 publication Critical patent/JPH0531263B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/252Tubes for spot-analysing by electron or ion beams; Microanalysers
    • H01J37/256Tubes for spot-analysing by electron or ion beams; Microanalysers using scanning beams

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Description

【発明の詳細な説明】 (イ) 産業上の利用分野 本発明は走査型電子顕微鏡とか電子線マイクロ
アナライザのような経時的な測定信号を映像化し
て表示する装置に関する。
DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to an apparatus for visualizing and displaying measurement signals over time, such as a scanning electron microscope or an electron beam microanalyzer.

(ロ) 従来技術 上述した装置によつて試料面の分析結果を試料
面のCRT映像として観察する場合、検出器によ
つてはバツクグラウンドのドリフトが大きく、
CRTの一画面走査中にバツクグラウンドの輝度
が著るしく変化して像観察が困難になる場合があ
つた。例えば試料を電子ビームで照射したとき試
料から出る赤外域の蛍光を検出して映像表面する
場合Ge検出器を用いると、バツクグラウンドの
ドリフトはCRT画面の輝度値換算で表わして、
検出器冷却後90分において100/分、100分後にお
いて20/分程度に落付いて来る。他方CRTの明
暗レンジは28程度であるから、CRT画像を写真
撮影する場合を考えて一画面走査の所要時間を1
分とすると、検出器冷却後100分待つてから走査
を開始しても画面の下部ではバツクグラウンドだ
けで画面コントラストのレンジの70%を占めてし
まつて試料像の観察は甚だ困難となる。
(b) Prior art When observing the analysis results of the sample surface as a CRT image of the sample surface using the above-mentioned apparatus, depending on the detector, background drift may be large;
There were cases in which the brightness of the background changed significantly during one CRT screen scan, making it difficult to observe the image. For example, when a Ge detector is used to detect the infrared fluorescence emitted from the sample when it is irradiated with an electron beam and display the image, the background drift is expressed in terms of the brightness value of the CRT screen.
100/min 90 minutes after the detector has cooled down, and drops to about 20/min 100 minutes later. On the other hand, since the brightness range of a CRT is about 28, the time required to scan one screen is reduced to 1 when taking a photograph of a CRT image.
Even if you wait 100 minutes after the detector has cooled before starting scanning, the background alone will occupy 70% of the screen contrast range at the bottom of the screen, making it extremely difficult to observe the sample image.

(ハ)目的 本発明は走査型分析装置で測定系のドリフトが
大きくてCRT映像による試料観察が困難になる
場合に対する対策を目的とする。
(C) Purpose The purpose of the present invention is to provide a countermeasure against the case where the measurement system drift of a scanning analyzer is large and it becomes difficult to observe a sample using a CRT image.

(ニ)構成 本発明は、試料面を電子等の価電粒子のビーム
で走査する際、走査線の適当本数を掃引する毎に
走査線の帰線期間中に走査ビームのブランキング
を行い、ブランキング期間中の測定系の出力を補
正値として次のブランキング動作まで保持し、一
つのブランキング動作から次のブランキング動作
までの間の測定系の出力からその間保持されてい
る補正値を引算してCRTの輝度信号とするもの
である。
(D) Structure When scanning a sample surface with a beam of valence particles such as electrons, the present invention performs blanking of the scanning beam during the retrace period of the scanning line every time an appropriate number of scanning lines are swept. The output of the measurement system during the blanking period is held as a correction value until the next blanking operation, and the correction value held during that period is calculated from the output of the measurement system between one blanking operation and the next blanking operation. This is subtracted to obtain the CRT luminance signal.

(ホ) 実施例 第1図は本発明の一実施例を示す。Dは検出器
で電子ビームEによつて励起された試料Sから放
射される適宜の放射線を検出する。検出器Dの出
力はバツフアアンプA1、アンプA2、差動アン
プA3を経てCRTに輝度信号として入力される。
Hはサンプルホールド回路でサンプリングスイツ
チSwを通してバツフアアンプA1の出力が入力
される。走査制御回路Cからブランク信号がバツ
フア回路Bに入力され、バツフア回路Bの出力が
トライバ回路Drを介してビーム偏向コイルKに
入力される。コイルKにブランク信号が入力され
ている間、電子ビームは横へ外れて試料Sへは入
射せず、従つて検出器Dには試料からの放射線は
入射せず、この間の検出器出力はバツクグラウン
ドレベルを示す。バツフア回路Bから出力された
ブランク信号は波形成形回路Fによりブランク信
号期間内に含まれ、同信号より幅のせまいパルス
信号に変換され、この信号がある間サンプリング
スイツチSwがオンとなりブランク信号期間のバ
ツフアアンプA1の出力即ち検出器Dのバツクグ
ラウンド信号がサンプリングされてサンプルホー
ルド回路Hに入力される。波形成形回路Fより上
記パルス信号が出力されている期間以外の期間サ
ンプリングスイツチはオフとなつており、その間
サンプルホールド回路Hは、先にサンプリングさ
れたバツクグラウンド信号を保持しており、この
保持されているバツクグラウンド信号が差動アン
プA3の反転端子に印加されている。従つて電子
ビームが試料面を掃引している間、差動アンプA
3はその期間の初期における検出器Dのバツクグ
ラウンドレベルが反転端子に印加されており、差
動アンプA3の出力は検出器Dの正味の検出信号
である。
(E) Embodiment FIG. 1 shows an embodiment of the present invention. A detector D detects appropriate radiation emitted from the sample S excited by the electron beam E. The output of the detector D is input as a luminance signal to the CRT via a buffer amplifier A1, an amplifier A2, and a differential amplifier A3.
H is a sample and hold circuit to which the output of the buffer amplifier A1 is input through the sampling switch Sw. A blank signal is input from the scan control circuit C to the buffer circuit B, and the output of the buffer circuit B is input to the beam deflection coil K via the driver circuit Dr. While a blank signal is input to the coil K, the electron beam is deviated sideways and does not enter the sample S, so no radiation from the sample enters the detector D, and the detector output during this period is back. Indicates ground level. The blank signal output from the buffer circuit B is included in the blank signal period by the waveform shaping circuit F, and is converted into a narrower pulse signal than the same signal. While this signal is present, the sampling switch Sw is turned on and the blank signal period ends. The output of the buffer amplifier A1, that is, the background signal of the detector D is sampled and input to the sample hold circuit H. The sampling switch is off during periods other than the period in which the pulse signal is output from the waveform shaping circuit F, and during this period the sample and hold circuit H holds the previously sampled background signal. A background signal is applied to the inverting terminal of differential amplifier A3. Therefore, while the electron beam is sweeping the sample surface, the differential amplifier A
3, the background level of the detector D at the beginning of the period is applied to the inverting terminal, and the output of the differential amplifier A3 is the net detection signal of the detector D.

第2図は上述装置の動作を説明するタイムチヤ
ートである。同図Xは第1図の走査制御回路Cか
ら出力されるX方向走査信号で偏向コイルKに入
力されており、BLはX方向走査信号の帰線期間
に相当して制御回路Cから出力されるブランク信
号である。Slは波形整形回路Fの出力信号でブラ
ンク信号期間内に含まれ、スイツチSwを閉じさ
せて検出器Dのバツクグラウンド信号をサンプリ
ングするサンプリング信号である。Dは検出器D
の出力でBCは変化して行くバツクグラウンドレ
ベルであり、真の試料信号はSで示される。Vは
差動アンプA3の出力である輝度信号で、X方向
走査の始点毎にバツクグラウンドレベルが0に引
戻されている。
FIG. 2 is a time chart illustrating the operation of the above-mentioned apparatus. In the same figure, X is the X-direction scanning signal output from the scan control circuit C in FIG. 1, which is input to the deflection coil K, and BL is the signal output from the control circuit C corresponding to the retrace period of the X-direction scanning signal. This is a blank signal. Sl is the output signal of the waveform shaping circuit F and is included in the blank signal period, and is a sampling signal for closing the switch Sw and sampling the background signal of the detector D. D is detector D
At the output of , BC is the changing background level, and the true sample signal is denoted by S. V is a luminance signal that is the output of the differential amplifier A3, and the background level is pulled back to 0 at each starting point of the X direction scan.

上述実施例ではバツクグラウンド補正は一X方
向走査毎に毎回行つているが、ドリフトの程度に
よつてはX方向走査線の何本分かに一度ずつ補正
するようにしてもよいことは云うまでもない。
In the above embodiment, the background correction is performed every time one X-direction scan is performed, but it goes without saying that the background correction may be performed once every several X-direction scanning lines depending on the degree of drift. Nor.

(ハ)効果 本発明荷電粒子線走査型分析装置は上述したよ
うな構成であるから、ドリフトの大きな検出器を
用いる場合であつても、均一なバツクグラウンド
レベルを持つた画像を得ることができる。
(c) Effect Since the charged particle beam scanning analyzer of the present invention has the above-described configuration, it is possible to obtain images with a uniform background level even when using a detector with a large drift. .

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例装置の構成を示すブ
ロツク図、第2図は上記装置の動作を説明するタ
イムチヤートである。 E……電子ビーム、S……試料、K……電子ビ
ーム偏向コイル、D……検出器、Sw……サンプ
リングスイツチ、H……サンプルホールド回路、
C……走査制御回路。
FIG. 1 is a block diagram showing the configuration of an apparatus according to an embodiment of the present invention, and FIG. 2 is a time chart illustrating the operation of the apparatus. E...electron beam, S...sample, K...electron beam deflection coil, D...detector, Sw...sampling switch, H...sample hold circuit,
C...Scanning control circuit.

Claims (1)

【特許請求の範囲】[Claims] 1 試料面を走査する荷電粒子線ビームのX方向
走査線の適数本を走査する毎に、走査線の帰線期
間中に走査ビームのブランキングを行い、このブ
ランキング期間中の測定系の出力を補正値信号と
してサンプリングして次のブランキングまで保持
し、次のブランキングまでの期間中先にサンプリ
ングされ保持されている補正値信号によつてその
期間中の測定系出力にバツクグラウンド補正を行
つて映像信号としてCRTに供給することを特徴
とする荷電粒子線走査型分析装置。
1 Every time an appropriate number of X-direction scanning lines of the charged particle beam scan the sample surface, blanking of the scanning beam is performed during the retrace period of the scanning line, and the measurement system during this blanking period is The output is sampled as a correction value signal and held until the next blanking, and the previously sampled and held correction value signal is used to perform background correction on the measurement system output during that period. A charged particle beam scanning analyzer characterized by performing the following steps and supplying the signal to a CRT as a video signal.
JP58099063A 1983-06-02 1983-06-02 Charged particle beam scanning analyzer Granted JPS59224038A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP58099063A JPS59224038A (en) 1983-06-02 1983-06-02 Charged particle beam scanning analyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP58099063A JPS59224038A (en) 1983-06-02 1983-06-02 Charged particle beam scanning analyzer

Publications (2)

Publication Number Publication Date
JPS59224038A JPS59224038A (en) 1984-12-15
JPH0531263B2 true JPH0531263B2 (en) 1993-05-12

Family

ID=14237297

Family Applications (1)

Application Number Title Priority Date Filing Date
JP58099063A Granted JPS59224038A (en) 1983-06-02 1983-06-02 Charged particle beam scanning analyzer

Country Status (1)

Country Link
JP (1) JPS59224038A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2418061B (en) * 2004-09-03 2006-10-18 Zeiss Carl Smt Ltd Scanning particle beam instrument
US8125518B2 (en) 2008-12-15 2012-02-28 Hitachi High-Technologies Corporation Scanning electron microscope
JP6298601B2 (en) * 2013-07-12 2018-03-20 株式会社日立ハイテクノロジーズ Charged particle beam equipment

Also Published As

Publication number Publication date
JPS59224038A (en) 1984-12-15

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