JPH0533721B2 - - Google Patents
Info
- Publication number
- JPH0533721B2 JPH0533721B2 JP62000126A JP12687A JPH0533721B2 JP H0533721 B2 JPH0533721 B2 JP H0533721B2 JP 62000126 A JP62000126 A JP 62000126A JP 12687 A JP12687 A JP 12687A JP H0533721 B2 JPH0533721 B2 JP H0533721B2
- Authority
- JP
- Japan
- Prior art keywords
- rays
- ray
- defect
- inspected
- intensity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000007547 defect Effects 0.000 claims description 48
- 230000005540 biological transmission Effects 0.000 claims description 11
- 238000000691 measurement method Methods 0.000 claims description 8
- 238000002591 computed tomography Methods 0.000 description 17
- 238000000034 method Methods 0.000 description 11
- 230000002950 deficient Effects 0.000 description 10
- 229910000831 Steel Inorganic materials 0.000 description 7
- 238000010521 absorption reaction Methods 0.000 description 7
- 238000003384 imaging method Methods 0.000 description 7
- 238000005259 measurement Methods 0.000 description 7
- 239000010959 steel Substances 0.000 description 7
- 230000001678 irradiating effect Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 4
- 238000007796 conventional method Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 3
- 230000005855 radiation Effects 0.000 description 3
- 230000003247 decreasing effect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- 229910001220 stainless steel Inorganic materials 0.000 description 2
- 239000010935 stainless steel Substances 0.000 description 2
- 230000007423 decrease Effects 0.000 description 1
- 230000000593 degrading effect Effects 0.000 description 1
- 230000002542 deteriorative effect Effects 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000003325 tomography Methods 0.000 description 1
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
- G01N23/18—Investigating the presence of flaws defects or foreign matter
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/02—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material
- G01N23/06—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption
- G01N23/083—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by transmitting the radiation through the material and measuring the absorption the radiation being X-rays
Landscapes
- Health & Medical Sciences (AREA)
- General Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Biochemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Toxicology (AREA)
- Length-Measuring Devices Using Wave Or Particle Radiation (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- Apparatus For Radiation Diagnosis (AREA)
Description
【発明の詳細な説明】
〔発明の目的〕
(産業上の利用分野)
本発明はX線を使用した欠陥測定法に係り、特
にX線CT装置を使用した欠陥測定方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Object of the Invention] (Industrial Application Field) The present invention relates to a defect measurement method using X-rays, and particularly to a defect measurement method using an X-ray CT device.
(従来の技術)
コンピユータ・トモグラフイ(CT)はコンピ
ユータを利用した断層撮影法であり、通常のX線
写真と異なり、被検査体の任意の位置の輪切り像
を観察することが可能である。そのため、被検査
体の内奥部の欠陥や構造を非破壊的に測定するこ
とが可能であり、医療用、工業用として広く普及
している。(Prior Art) Computer tomography (CT) is a tomography method that uses a computer, and unlike ordinary X-ray photography, it is possible to observe a cross-sectional image of an arbitrary position of the subject. Therefore, it is possible to nondestructively measure defects and structures deep inside the object to be inspected, and it is widely used for medical and industrial purposes.
現在、最も普及しているものは、被検査体に照
射したX線の透過量をもとに画像を描き出すX線
CT装置が主流である。 Currently, the most popular type is X-ray, which draws an image based on the amount of X-ray transmitted through the object
CT devices are the mainstream.
従来のX線CT装置は、X線発生装置と、X線
の照射方向を絞るスリツトと、被検査体を載置し
て任意の位置に回転させるターンテーブルと、被
検査体から透過されるX線を検出するX線検出器
と、検出したX線の強度を演算合成する計算機
と、演算合成されたX線強度を表示する画像表示
装置とから構成される。 A conventional X-ray CT device consists of an X-ray generator, a slit that narrows down the direction of X-ray irradiation, a turntable on which the object to be inspected is placed and rotated to an arbitrary position, and an X-ray beam transmitted from the object. It consists of an X-ray detector that detects rays, a computer that calculates and synthesizes the intensity of the detected X-rays, and an image display device that displays the calculated and synthesized X-ray intensity.
またX線CT装置としては、前述のように被検
査体がターンテーブル上で回転する方式とは別
に、X線発生装置及び検出器自体が、被検査体の
周囲に配設した軌道上を数値制御されながら移動
する方式も採用されている。 In addition to the method in which the object to be inspected rotates on a turntable as described above, the X-ray CT system also uses an X-ray generator and detector itself that moves numerically on a trajectory placed around the object A controlled movement method has also been adopted.
上記X線CT装置を使用した従来の欠陥測定方
法では、被検査体に一体の線源電圧によつて発生
したX線を照射し、透過したX線の電気信号を被
検査体の周囲に多数配設したX線検出器によつて
検出し、検出した個々の信号をコンピユータで演
算処理して断層像を形成し、画像表示または、写
真撮影して欠陥等の状況の判断資料としている。 In the conventional defect measurement method using the above-mentioned X-ray CT device, the object to be inspected is irradiated with X-rays generated by an integrated radiation source voltage, and many electrical signals of the transmitted X-rays are distributed around the object to be inspected. The X-ray detector provided detects the signals, and a computer processes the individual signals to form a tomographic image, which is then displayed or photographed to serve as information for determining the status of defects and the like.
(発明が解決しようとする問題点)
しかし、従来のX線CT装置による欠陥測定方
法によつて金属部品または鋼構造物等の被検査体
を検査する場合、使用するX線CT装置の線源電
圧が一般に数百KV程度の低い電圧に設定されて
いるため、X線の強度が小さい。従つて1枚の画
像を形成するために長い照射時間を要する欠点が
ある。すなわち被検査体の板厚等の形状によつて
も異るが、1回の測定に対して数時間を要し、全
測定作業に要する時間が膨大になる欠点があつ
た。(Problem to be Solved by the Invention) However, when inspecting objects such as metal parts or steel structures using the conventional defect measurement method using an X-ray CT device, the radiation source of the X-ray CT device used is Since the voltage is generally set to a low voltage of several hundred kilovolts, the intensity of the X-rays is low. Therefore, there is a drawback that it requires a long irradiation time to form one image. In other words, it takes several hours for one measurement, depending on the shape of the object to be inspected, such as the thickness of the plate, which has the disadvantage that the entire measurement process takes an enormous amount of time.
一方、線源電圧を上げX線の強度を増大して使
用すると、短時間において画像を得ることができ
るが、画像のコントラストが低下し欠陥部の形状
または内部構造時の判別が困難になる問題点があ
つた。 On the other hand, by increasing the source voltage and increasing the X-ray intensity, images can be obtained in a short time, but the contrast of the image decreases, making it difficult to distinguish the shape or internal structure of the defect. The dot was hot.
本発明は上記の問題点を解決するにために発案
されたものであり、X線撮影に要する時間を短縮
して、測定作業の効率化を図り、かつ撮影画像の
画質が低下することがなく、欠陥等の判別が容易
な欠陥測定方法を提供することを目的とする。 The present invention was devised to solve the above-mentioned problems, and it shortens the time required for X-ray photography, improves the efficiency of measurement work, and prevents the quality of the captured images from deteriorating. The purpose of the present invention is to provide a defect measurement method that allows easy identification of defects.
(問題点を解決するための手段)
上記目的を達成するために本発明に係るX線
CT装置による欠陥測定方法は、線源電圧を複数
段階に調整できるX線CT装置を使用し、まず高
い線源電圧によつて発生する高強度のX線を被検
査体に照射し、被検査体を透過したX線によつ
て、低コントラストの透過画像を作成し、前記透
過画像を観察して欠陥部の概略位置を検出した後
に、前記線源電圧を降下せしめ低強度のX線を欠
陥部のみに所定時間照射して高コントラストの透
過画像を作成し、この透過画像を観察して欠陥部
の詳細形状を測定することを特徴とする。
(Means for solving the problems) In order to achieve the above object, the X-ray according to the present invention
The defect measurement method using a CT device uses an X-ray CT device that can adjust the source voltage in multiple stages. First, the object to be inspected is irradiated with high-intensity X-rays generated by the high source voltage. A low-contrast transmission image is created using the X-rays that have passed through the body, and after observing the transmission image and detecting the approximate location of the defect, the source voltage is lowered and the low-intensity X-rays are used to detect the defect. The method is characterized in that a high-contrast transmission image is created by irradiating only the defective part for a predetermined period of time, and the detailed shape of the defective part is measured by observing this transmission image.
(作用)
線源電圧が可変に調整できるX線発生装置にお
いて、まず線源電圧を高く設定して高強度のX線
を被検査体全体に短時間に照射し、その透過X線
を検出して透過画像を作成する。作成した透過画
像は高強度のX線を短時間に照射して得られたも
のであるため、画像のコントラストが低く不鮮明
である。しかし、疑似欠陥の有無およびその概略
位置は判別することができる。(Function) In an X-ray generator whose source voltage can be variably adjusted, the source voltage is first set high to irradiate the entire subject with high-intensity X-rays in a short period of time, and the transmitted X-rays are detected. Create a transparent image. The created transmission image is obtained by irradiating high-intensity X-rays in a short period of time, so the contrast of the image is low and it is unclear. However, the presence or absence of a pseudo defect and its approximate location can be determined.
次に、線源電圧を降下させて低強度のX線を発
生せしめ、上記の疑似欠陥部に照射位置を限定し
てX線を所定時間照射する。この場合低強度のX
線を比較的長く照射するため、得られる画像のコ
ントラストが高く鮮明である。その画像を観察す
ることによつて検出された疑似欠陥部をさらに詳
細に分析し、欠陥の真偽が容易に判定され、欠陥
部の形状、分布、位置も正確に測定できる。 Next, the source voltage is lowered to generate low-intensity X-rays, and the pseudo-defect portion is irradiated with the X-rays for a predetermined period of time with the irradiation position limited. In this case, the low intensity
Because the line is irradiated for a relatively long time, the resulting image has high contrast and clarity. By observing the image, the detected pseudo-defects can be analyzed in more detail, the authenticity of the defect can be easily determined, and the shape, distribution, and position of the defect can also be accurately measured.
本発明方法によれば、画像の利用目的に応じ
て、線源電圧を調整し、まず高強度のX線を短時
間に照射することによつて、被検査体全体にわた
り欠陥の有無及び位置を短時間内に把握し、次に
低強度のX線によつて欠陥部と思われる箇所を局
部的に撮影し、得られる高コントラストの画像に
よつて欠陥の状況が正確に測定される。そのため
従来一律に低電圧下で弱いX線を長時間照射して
実施していた従来方法と比較して、測定作業の効
率が大幅に向上する。また欠陥部の撮影画像の画
質が低下することなく、欠陥の有無の判別、また
欠陥部の位置、分布、形状の正確な測定が可能で
ある。(実施例)
次に本発明の一実施例を添付図面を参照して説
明する。 According to the method of the present invention, the source voltage is adjusted according to the purpose of image use, and by first irradiating high-intensity X-rays in a short time, the presence or absence and location of defects can be detected over the entire inspected object. The defect is identified within a short time, and then the suspected defect is locally photographed using low-intensity X-rays, and the resulting high-contrast image allows the state of the defect to be accurately measured. Therefore, the efficiency of measurement work is greatly improved compared to the conventional method, which uniformly irradiates weak X-rays for a long time under low voltage. Furthermore, it is possible to determine the presence or absence of a defect, and to accurately measure the position, distribution, and shape of the defective portion, without degrading the image quality of the photographed image of the defective portion. (Example) Next, an example of the present invention will be described with reference to the accompanying drawings.
第1図は本発明方法を実施するためのX線CT
装置の構成例を示す説明図である。 Figure 1 shows an X-ray CT for carrying out the method of the present invention.
FIG. 2 is an explanatory diagram showing a configuration example of a device.
第1図においてX線CT装置1は、陰極2と陽
極3との間に線源電圧を印加することによつてX
線を発生するX線発生装置4と、発生したX線に
指向性をもたせるスリツト5と、被検査体6を載
置して任意の位置に回転させるターンテーブル7
と、被検査体6を透過したX線を検出するX線検
出器8と、検出したX線の検出信号を伝達する信
号テーブル9と、検出信号を演算合成する計算機
10と、演算合成されたX線強度を画像として表
示する画像表示装置11とを備える。なお線源電
圧は、被検査体の形状、厚さ等に対応して複数段
階に適宜増減可能に構成される。 In FIG. 1, an X-ray CT apparatus 1 performs X-ray CT by applying a source voltage between a cathode 2 and an anode 3.
An X-ray generator 4 that generates rays, a slit 5 that gives directionality to the generated X-rays, and a turntable 7 on which an object to be inspected 6 is placed and rotated to an arbitrary position.
, an X-ray detector 8 that detects the X-rays transmitted through the object to be inspected 6, a signal table 9 that transmits the detection signal of the detected X-rays, and a computer 10 that computationally synthesizes the detection signals. It includes an image display device 11 that displays X-ray intensity as an image. Note that the line source voltage is configured to be able to be increased or decreased in multiple stages as appropriate in accordance with the shape, thickness, etc. of the object to be inspected.
次に上記構成のX線CT装置を使用して欠陥部
を検出し測定する原理について、第2図に従つて
説明する。第2図はX線を使用して被検査体中の
欠陥を検出する原理を説明する説明図である。 Next, the principle of detecting and measuring defective parts using the X-ray CT apparatus having the above configuration will be explained with reference to FIG. FIG. 2 is an explanatory diagram illustrating the principle of detecting defects in an object to be inspected using X-rays.
細い線束で指向性を有するX線が欠陥部12を
有する被検査体6に照射された場合、被検査体6
を透過する前後における
X線強度I
os、I
ps
の関係は(1)式で表わされる。 When the object to be inspected 6 having the defective part 12 is irradiated with X-rays having directivity in a thin flux, the object to be inspected 6
The relationship between the X-ray intensities I o s and I p s before and after passing through is expressed by equation (1).
I
ps=I
ose-〓T ……(1)
ここでI
os、I
psはそれぞれ、
被検査体6を通過通過する前後におけるX線強
度、eは自然対数の底、μは吸収係数(cm-1)、
Tは被検査体6の厚さ(cm)である。 I p s = I o s e - 〓 T ...(1) Here, I o s and I p s are the X-ray intensity before and after passing through the inspected object 6, e is the base of the natural logarithm, and μ is the absorption coefficient (cm -1 ),
T is the thickness (cm) of the object 6 to be inspected.
しかし実際に使用されるX線は、理想的な指向
性を有する細い線束ではなく、ある程度の散乱性
を有するため、その散乱線の影響を考慮すると、
被検査体6を通過する前後におけるX線強度Ip、
Ipの関係は(2)式で表わされる。 However, the X-rays actually used are not thin beams with ideal directivity, but have a certain degree of scattering, so considering the influence of the scattered rays,
X-ray intensity I p before and after passing through the inspected object 6,
The relationship between I p is expressed by equation (2).
Ip=(1+n)Ipe-〓T ……(2) ここでnはX線の散乱比である。 I p = (1 + n) I p e - 〓 T ... (2) where n is the scattering ratio of X-rays.
次に被検査体6内に空孔状の欠陥部12がある
場合、この欠陥部12を透過するX線の強度Ip′
は(3)式のように表わされる。但し欠陥部12の空
孔におけるX線吸収はなく、また欠陥部12の大
きさが微小であると仮定する。 Next, when there is a hole-like defect 12 in the object to be inspected 6, the intensity of the X-rays passing through this defect 12 I p ′
is expressed as equation (3). However, it is assumed that there is no X-ray absorption in the holes of the defective part 12 and that the size of the defective part 12 is minute.
Ip′=(1+n)Ipe-〓T+ΔI ……(3)
ΔI=Ip[e-〓(T-〓T)−e-〓T] ……(4)
ここでΔIは欠陥部12を直線透過することに
より増加したX線強度の増加分であり、またΔT
は被検査体の欠陥部12の厚さである。 I p ′=(1+n)I p e - 〓 T +ΔI ...(3) ΔI=I p [e - 〓 (T- 〓 T) −e - 〓 T ] ...(4) Here, ΔI is the defective part This is the increase in X-ray intensity due to straight-line transmission through 12, and ΔT
is the thickness of the defective portion 12 of the object to be inspected.
被検査体6内に欠陥が存在する場合と存在しな
い場合とにおける透過X線強度の差ΔIと、欠陥
が存在しない場合における透過X線強度Ipとの
比、すなわちΔI/Ipは、被写体コントラストkと
呼ばれ、被写体コントラストkが大であればより
鮮明な透過画像がえられる。 The ratio of the difference ΔI in transmitted X-ray intensity between when a defect exists and when there is no defect in the inspected object 6 and the transmitted X-ray intensity I p when there is no defect, that is, ΔI/I p , is This is called contrast k, and if the object contrast k is large, a clearer transmitted image can be obtained.
(2)式および(4)式より被写体コントラストkを求
めると、(5)式で表わされる。 When the subject contrast k is determined from equations (2) and (4), it is expressed by equation (5).
k=ΔI/Ip=Ip[e-〓(T-〓T)−e-〓T/(1+n)Ip
e−-〓T
=1/1+n(e〓〓T−1)
=μ/1+n・ΔT ……(5)
従つて散乱比nを小さくするか、または吸収係
数μを大きく設定することによつてより画質の優
れた透過画像を得ることができる。k=ΔI/I p =I p [e - 〓 (T- 〓 T) −e - 〓 T / (1+n)I p
e- - 〓 T = 1/1 + n (e〓〓 T -1) = μ/1 + n・ΔT ...(5) Therefore, by decreasing the scattering ratio n or setting the absorption coefficient μ large, Transparent images with better image quality can be obtained.
次に照射するX線の光量子エネルギと被写体コ
ントラスト及び撮影時間との相互関係を具体的に
グラフを参照して数値的に検討する。 Next, the correlation between the photon energy of the irradiated X-rays, the object contrast, and the imaging time will be numerically examined with reference to graphs.
被検査体として鋼構造物の欠陥を測定する場合
におけるX線の光量子エネルギと吸収係数μとの
関係は、第3図に示す通りである。すなわち、光
量子エネルギが0.1MeV、1MeVの場合における
吸収係数μはそれぞれ2(cm-1)、0.5(cm-1)であ
る。 The relationship between the photon energy of X-rays and the absorption coefficient μ when measuring defects in a steel structure as an object to be inspected is as shown in FIG. That is, when the photon energy is 0.1 MeV and 1 MeV, the absorption coefficient μ is 2 (cm -1 ) and 0.5 (cm -1 ), respectively.
また、X線の光量子エネルギと鋼の厚さTに対
する散乱被nの関係を第4図に示す。すなわちX
線発生装置の線源電圧が高く、光量子エネルギが
高いほど散乱比nは小さく、また被検査体である
鋼の厚さTが薄い程散乱比nは小さい。ちなみに
厚さTが5cmの鋼構造物の場合、光量子エネルギ
が0.4MeVのとき散乱比nは約5であり、1MeV
のとき約3である。 Further, FIG. 4 shows the relationship between the photon energy of X-rays and the scattering ratio n with respect to the thickness T of the steel. That is, X
The higher the source voltage of the line generator and the higher the photon energy, the smaller the scattering ratio n, and the thinner the thickness T of the steel to be inspected, the smaller the scattering ratio n. By the way, in the case of a steel structure with a thickness T of 5 cm, when the photon energy is 0.4 MeV, the scattering ratio n is approximately 5, which is 1 MeV.
It is about 3 when .
さらに、欠陥を分析する資料となる透過画像の
良否を決定する被写体コントラストkは前記(5)式
で与えられる。被写体コントラストkに対応する
μ/1+nの値と被検査体の厚さTとの関係を第
5図に示す。すなわち、X線のエネルギが低い
程、被写体コトラストは高くなり、より鮮明な画
像を得ることができる。ちなみに厚さTが10mmの
ステンレス鋼(SUS27)の場合、X線のエネル
ギが100KVのとき、μ/1+n値は約0.4(mm-1)
であり、また260KVの場合は、約0.1(mm-1)であ
る。従つて、高いコントラストを得たい場合はX
線発生装置の線源電圧を低くすることが必要であ
る。 Further, the object contrast k, which determines the quality of the transmitted image that serves as data for analyzing defects, is given by the above equation (5). FIG. 5 shows the relationship between the value of μ/1+n corresponding to the object contrast k and the thickness T of the object to be inspected. In other words, the lower the energy of the X-rays, the higher the object contrast becomes, and a clearer image can be obtained. By the way, in the case of stainless steel (SUS27) with a thickness T of 10 mm, when the X-ray energy is 100 KV, the μ/1 + n value is approximately 0.4 (mm -1 ).
In the case of 260KV, it is approximately 0.1 (mm -1 ). Therefore, if you want to obtain high contrast,
It is necessary to lower the line source voltage of the line generator.
また、照射するX線のエネルギと被検査体の厚
さTおよび撮影時間との関係を、第6図に示す。
X線発生装置4に流れる管電流iと、撮影時間t
との積である露出量eは、被検査体6の厚さによ
つて異なるが、同一の板厚と同一の管電流であれ
ばX線のエネルギが高い程、露出量eは少なく済
む。すなわち、X線のエネルギが高いほど撮影時
間は短い。例えば第6図において厚さTが5mmの
ステンレス鋼(SUS27)を撮影する際、X線
発生装置4の管電流iが1mAとすると、X線の
エネルギが100KVの場合、撮影時間は約30分間
を要する一方、X線のエネルギを160KVにする
と撮影時間は約1分間に短縮される。すなわち、
X線のエネルギ比よりもはるかに高い比率で撮影
時間が短縮される。 Further, FIG. 6 shows the relationship between the energy of the irradiated X-rays, the thickness T of the object to be inspected, and the imaging time.
Tube current i flowing through the X-ray generator 4 and imaging time t
The exposure amount e, which is the product of , differs depending on the thickness of the object 6 to be inspected, but if the plate thickness is the same and the tube current is the same, the higher the X-ray energy, the smaller the exposure amount e will be. That is, the higher the energy of the X-ray, the shorter the imaging time. For example, when photographing stainless steel (SUS27) with a thickness T of 5 mm in Fig. 6, if the tube current i of the X-ray generator 4 is 1 mA, and the X-ray energy is 100 KV, the photographing time will be approximately 30 minutes. However, when the X-ray energy is set to 160KV, the imaging time is shortened to about 1 minute. That is,
Imaging time is reduced by a much higher energy ratio than that of X-rays.
次に上記の原理に基づいて本発明方法の作用効
果を説明する。 Next, the effects of the method of the present invention will be explained based on the above principle.
本発明方法を実施する操作は、まずX線発生装
置4の線源電圧を調整して高強度のX線を発生せ
しめる。ここで線源電圧は被検査体6の形状、材
質等によつて異なるが、一般の鋼構造物、金属部
品にあつては1〜2MeV程度に設定する。次に発
生した高強度のX線を被検査体6に短時間照射
し、その透過X線をX線検出器8にて検出し、そ
の検出信号を計算機10にて演算処理して透過画
像13を形成し、その透過画像13を画像表示装
置11に表示せしめ、欠陥の有無を判別する。 The method of the present invention is carried out by first adjusting the source voltage of the X-ray generator 4 to generate high-intensity X-rays. Here, the line source voltage varies depending on the shape, material, etc. of the object 6 to be inspected, but is set to about 1 to 2 MeV for general steel structures and metal parts. Next, the generated high-intensity X-rays are irradiated onto the inspected object 6 for a short time, the transmitted X-rays are detected by the X-ray detector 8, and the detection signal is processed by the computer 10 to create a transmitted image 13. The transparent image 13 is displayed on the image display device 11 to determine whether there is a defect.
この段階で表示された透過画像13は、高強度
のX線を短時間に照射して作成しているため、コ
ントラストが低い。従つて欠陥の詳細な形状、分
布等を正確に把握することは困難である。しかし
ながら、欠陥の有無および概略の位置については
十分判別できる。 The transmitted image 13 displayed at this stage has low contrast because it is created by irradiating high-intensity X-rays in a short period of time. Therefore, it is difficult to accurately grasp the detailed shape, distribution, etc. of defects. However, the presence or absence of a defect and its approximate location can be sufficiently determined.
次に線源電圧を降下せしめ、低強度のX線を発
生せしめ、上記の疑似欠陥部に照射位置を限定し
て、再度、X線を所定時間照射する。なお照射位
置は被検査体6を載置したターンテーブル7を回
転して数値的に設定される。この操作によつて得
られる透過画像13は、低強度のX線を比較的長
時間にわたつて照射しているため、吸収係数μが
大でありコントラストが高く、鮮明である。 Next, the source voltage is lowered to generate low-intensity X-rays, and the irradiation position is limited to the pseudo-defect portion, and the X-rays are irradiated again for a predetermined period of time. Note that the irradiation position is set numerically by rotating the turntable 7 on which the object to be inspected 6 is placed. The transmission image 13 obtained by this operation has a large absorption coefficient μ, high contrast, and is clear because low-intensity X-rays are irradiated over a relatively long period of time.
従つてコントラストが高い画像を観察すること
によつて、疑似欠陥部の詳細な状況が正確に把握
され、欠陥の真偽が容易に判定され、さらに欠陥
部の形状、分布、位置が容易に測定できる。 Therefore, by observing images with high contrast, the detailed situation of the pseudo defect can be accurately grasped, the authenticity of the defect can be easily determined, and the shape, distribution, and position of the defect can be easily measured. can.
また実施例の測定方法によれば、線源電圧を調
整してX線の照射強度を変化させ、まず高強度の
X線を短時間に照射することによつて、被検査体
全体における欠陥の有無を短時間内に概略把握
し、次に低強度のX線によつて欠陥と思われる箇
所を局所的に撮影し、得られた高コントラストの
画像によつて詳細に欠陥部の状況が測定されるた
め、従来、一律に低強度のX線を長時間照射して
測定作業を実施していた従来方法と比較して測定
作業効率が大幅に改善される。 Furthermore, according to the measurement method of the example, the radiation source voltage is adjusted to change the X-ray irradiation intensity, and by first irradiating high-intensity X-rays for a short time, defects can be detected in the entire inspected object. The presence or absence of defects can be roughly ascertained within a short period of time, and then low-intensity X-rays are used to locally photograph the suspected defect, and the resulting high-contrast images can be used to determine the state of the defect in detail. Therefore, the efficiency of measurement work is greatly improved compared to the conventional method in which measurement work was carried out by uniformly irradiating low-intensity X-rays for a long time.
本発明によれば、透過画像の利用目的に応じ
て、また撮影時間と画像のコントラストを調整す
るため線源電圧を使い分けている。すなわち、ま
ず高電圧下で高強度のX線を被検査体に照射して
短時間内に被検査全体にわたつて欠陥の有無を概
略的に把握し、次に低電圧下で上記操作において
検出された欠陥と思われる部位に対して低強度の
X線を照射して高コントラストの鮮明な画像を得
るように構成されているため、欠陥部の形状、位
置、分布の正確な測定が可能である。
According to the present invention, the source voltage is used differently depending on the purpose of use of the transmitted image and to adjust the imaging time and image contrast. That is, first, the object to be inspected is irradiated with high-intensity X-rays under high voltage to roughly determine the presence or absence of defects over the entire object in a short period of time, and then the defects are detected by the above operation under low voltage. The system is configured to irradiate low-intensity X-rays to the area suspected to be a defect and obtain a clear, high-contrast image, making it possible to accurately measure the shape, location, and distribution of the defect. be.
また従来一律に低強度のX線を長時間照射して
実施していた従来方法と比較して測定作業時間が
大幅に短縮される。 Furthermore, compared to the conventional method, which uniformly irradiates low-intensity X-rays for a long time, the measurement time is significantly reduced.
第1図は、本発明方法を実施するためのX線
CT装置の構成例を示す説明図、第2図は、X線
を使用して被検査体中の欠陥を検出する原理を示
す説明図、第3図は、光量子エネルギと吸収係数
との関係を示すグラフ、第4図は、光量子エネル
ギと鋼の厚さに対す散乱比nの関係を示すグラ
フ、第5図は、被写体コントラストと、被検査体
の厚さTとの関係を示すグラフ、第6図は、板厚
Tと露出量eとの関係を示すグラフである。
1……X線CT装置、2……陰極、3……陽極、
4……X線発生装置、5……スリツト、6……被
検査体、7……ターンテーブル、8……X線検出
器、9……信号ケーブル、10……計算機、11
……画像表示装置、12……欠陥部、13……画
像。
FIG. 1 shows an X-ray for carrying out the method of the present invention.
An explanatory diagram showing an example of the configuration of a CT device, Fig. 2 is an explanatory diagram showing the principle of detecting defects in an object to be inspected using X-rays, and Fig. 3 shows the relationship between photon energy and absorption coefficient. 4 is a graph showing the relationship between the scattering ratio n and the photon energy and the thickness of the steel. FIG. 5 is a graph showing the relationship between the object contrast and the thickness T of the object to be inspected. FIG. 6 is a graph showing the relationship between the plate thickness T and the exposure amount e. 1...X-ray CT device, 2...cathode, 3...anode,
4...X-ray generator, 5...Slit, 6...Object to be inspected, 7...Turntable, 8...X-ray detector, 9...Signal cable, 10...Computer, 11
...Image display device, 12...Defect part, 13...Image.
Claims (1)
置を使用し、高い線源電圧によつて発生する高強
度のX線を被検査体に照射し、被検査体を透過し
たX線によつて、低コントラストの透過画像を作
成し、前記透過画像を観察して欠陥部の概略位置
を検出した後に、前記線源電圧を降下せしめ低強
度のX線を欠陥部のみに所定時間照射して高コン
トラストの透過画像を作成し、この透過画像を観
察して欠陥部の詳細形状を測定することを特徴と
するX線CT装置による欠陥測定方法。1 Using an X-ray CT device that can adjust the source voltage in multiple stages, the object to be inspected is irradiated with high-intensity X-rays generated by the high source voltage, and the X-rays that have passed through the object are detected. After creating a low-contrast transmission image and detecting the approximate position of the defect by observing the transmission image, the source voltage is lowered and low-intensity X-rays are irradiated only to the defect for a predetermined period of time. A defect measurement method using an X-ray CT device, which is characterized by creating a high-contrast transmission image and measuring the detailed shape of the defect by observing this transmission image.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62000126A JPS63168545A (en) | 1987-01-06 | 1987-01-06 | Measurement of detect using x-ray ct apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62000126A JPS63168545A (en) | 1987-01-06 | 1987-01-06 | Measurement of detect using x-ray ct apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63168545A JPS63168545A (en) | 1988-07-12 |
| JPH0533721B2 true JPH0533721B2 (en) | 1993-05-20 |
Family
ID=11465338
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62000126A Granted JPS63168545A (en) | 1987-01-06 | 1987-01-06 | Measurement of detect using x-ray ct apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63168545A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3031006U (en) * | 1996-05-08 | 1996-11-12 | 愛子 斎藤 | Sanitary napkin |
| JPH09294771A (en) * | 1996-05-07 | 1997-11-18 | Aiko Saito | Sanitary napkin |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7274771B2 (en) * | 2005-05-03 | 2007-09-25 | General Electric Company | Methods and systems for controlling exposure for medical imaging devices |
| FR3001802B1 (en) * | 2013-02-04 | 2019-05-24 | Cyxplus | DEVICE AND METHOD FOR NON-DESTRUCTIVE CONTROL OF TUMORS BY TOMOGRAPHY |
-
1987
- 1987-01-06 JP JP62000126A patent/JPS63168545A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH09294771A (en) * | 1996-05-07 | 1997-11-18 | Aiko Saito | Sanitary napkin |
| JP3031006U (en) * | 1996-05-08 | 1996-11-12 | 愛子 斎藤 | Sanitary napkin |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63168545A (en) | 1988-07-12 |
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