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JPH0542149B2 - - Google Patents
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JPH0542149B2 - - Google Patents

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Publication number
JPH0542149B2
JPH0542149B2 JP62064585A JP6458587A JPH0542149B2 JP H0542149 B2 JPH0542149 B2 JP H0542149B2 JP 62064585 A JP62064585 A JP 62064585A JP 6458587 A JP6458587 A JP 6458587A JP H0542149 B2 JPH0542149 B2 JP H0542149B2
Authority
JP
Japan
Prior art keywords
semiconductor laser
length
mode
external
laser element
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP62064585A
Other languages
Japanese (ja)
Other versions
JPS63229889A (en
Inventor
Hiroshi Hayashi
Shusuke Kasai
Osamu Yamamoto
Nobuyuki Myauchi
Shigeki Maei
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sharp Corp
Original Assignee
Sharp Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sharp Corp filed Critical Sharp Corp
Priority to JP6458587A priority Critical patent/JPS63229889A/en
Publication of JPS63229889A publication Critical patent/JPS63229889A/en
Publication of JPH0542149B2 publication Critical patent/JPH0542149B2/ja
Granted legal-status Critical Current

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Description

【発明の詳細な説明】 〈産業上の利用分野〉 本発明は、半導体レーザ素子の後方出射光を外
部反射部材(ミラー)によつて反射させて半導体
レーザ素子内ー帰還させる外部共振器型半導体レ
ーザ装置に関する。
[Detailed Description of the Invention] <Industrial Application Field> The present invention relates to an external resonator type semiconductor in which rear emitted light from a semiconductor laser device is reflected by an external reflecting member (mirror) and returned to the inside of the semiconductor laser device. This invention relates to a laser device.

〈従来の技術〉 従来の半導体レーザの発振軸モードは、レーザ
媒質の利得分布と、レーザ共振器の透過特性によ
つて選択さる。第6図は、従来の半導体レーザの
発振軸モード選択性を表わす図であり、第6図a
は波長(横軸)に対するレーザ媒質の利得分布
を、同図bは波長に対する各軸モードのスペクト
ルを、同図cは上記aとbとを重畳させたスーパ
ーラデイアント状態のスペクトルをそれぞれ模式
的に示している。レーザの各軸モードのうち、利
得分布のピーク(最大値)に近い波長のものが最
大の利得を得て発振軸モードとなるが、周囲温度
が変化すると、半導体のバンドギヤツプが変化す
るため利得分布のピーク波長は2〜3Å/degの
割合で長波長側へ変化する。また、媒質の屈折率
が変化する上にレーザ素子自体も熱膨張するた
め、レーザ共振器の実効的な光学長が変わり、そ
れによつて各軸モードは約3Åの間隔を保ちなが
ら0.7Å/deg程度の割合で長波長側へ変化する。
従つて、ある状態より温度を上昇させると、利得
分布の変化量が軸モードの変化量よりも大きいた
め、しばらくは発振波長は連続変化をするが、や
がてモードホツピングをおこし、以後、第8図に
示すように連続変化とモードホツピングをくり返
し、階段上に変化する。また、半導体レーザを駆
動する電流値によつても波長は変化するため、将
来に期待される波長多重光通信や高分解能の分光
の光源としての応用を妨げてきた。
<Prior Art> The oscillation axis mode of a conventional semiconductor laser is selected depending on the gain distribution of the laser medium and the transmission characteristics of the laser resonator. FIG. 6 is a diagram showing the oscillation axis mode selectivity of a conventional semiconductor laser, and FIG.
Figure b shows the gain distribution of the laser medium with respect to wavelength (horizontal axis), Figure b shows the spectrum of each axial mode with respect to wavelength, and Figure c schematically shows the spectrum of the super radiant state where the above a and b are superimposed. It is shown in Among the various axial modes of the laser, the one with a wavelength close to the peak (maximum value) of the gain distribution obtains the maximum gain and becomes the oscillation axial mode. However, as the ambient temperature changes, the band gap of the semiconductor changes, causing the gain distribution to change. The peak wavelength of changes to the longer wavelength side at a rate of 2 to 3 Å/deg. Furthermore, since the refractive index of the medium changes and the laser element itself also thermally expands, the effective optical length of the laser resonator changes, and as a result, each axial mode maintains a spacing of approximately 3 Å, while the laser element itself thermally expands. It changes to the longer wavelength side at a certain rate.
Therefore, when the temperature is raised beyond a certain state, the oscillation wavelength changes continuously for a while because the amount of change in the gain distribution is larger than the amount of change in the axial mode, but eventually mode hopping occurs, and after that, the oscillation wavelength changes continuously for a while. As shown in the figure, continuous changes and mode hopping are repeated, and changes occur on a staircase. In addition, the wavelength changes depending on the current value used to drive the semiconductor laser, which has hindered its application as a light source for wavelength multiplexed optical communications and high-resolution spectroscopy, which are expected in the future.

そこで、SECレーザ(Short External Cavity
Laser diode)が発明されたが、これは半導体レ
ーザの後方出射光を外部ミラーにより反射させ、
半導体レーザ本体に帰還させるもので、この場合
の発振軸モードは、通常のレーザの利得分布とレ
ーザ軸モードと外部共振器による波長選択性の3
つの要因により選択さる。この様子を模式的に第
6図に対応させて示したのが第7図であり、第7
図aは波長に対するレーザ媒質の利得分布を、同
図bは波長に対する各軸モードのスペクトルを、
同図cは波長に対する外部共振器の共振特性を、
同図dは上記a,b,c重畳したスーパーラデイ
アント状態のスペクトルを示している。スーパー
ラデイアント状態でのスペクトルの包絡線は第6
図の場合と異なり、第7図dのようにリツプルを
有している。この場合、包絡線のピークの温度特
性は、外部共振器長、すなわち、半導体レーザと
外部ミラーとのギヤツプ長を変えることにより制
御できるため、モードホツプを抑制することが可
能となる。
Therefore, SEC laser (Short External Cavity
A laser diode was invented, which reflects the backward emitted light of a semiconductor laser using an external mirror.
The oscillation axis mode is fed back to the semiconductor laser main body.
The selection is based on two factors. Figure 7 schematically shows this situation in correspondence with Figure 6.
Figure a shows the gain distribution of the laser medium with respect to wavelength, and figure b shows the spectrum of each axial mode with respect to wavelength.
Figure c shows the resonance characteristics of the external resonator with respect to wavelength.
Figure d shows the spectrum of the super radiant state in which a, b, and c are superimposed. The spectral envelope in the superradiant state is the 6th
Unlike the case shown in the figure, it has ripples as shown in FIG. 7d. In this case, since the temperature characteristic of the peak of the envelope can be controlled by changing the external cavity length, that is, the gap length between the semiconductor laser and the external mirror, mode hops can be suppressed.

このSECレーザの温度に対する発振波長の特性
の代表例を第9図a,b,cに示すが、いずれも
Δtという温度範囲では同一の軸モードが維持さ
れ、ΔTという温度範囲では、第7図dに示すス
ペクトルの包絡線の同一の山において順次軸モー
ドが最大利得を得て発振軸モードとなり、ΔTを
越えると発振軸モードが包絡線の次の山のピーク
に移行して大きいモードホツプを生じる。
Typical examples of the characteristics of the oscillation wavelength with respect to temperature of this SEC laser are shown in Figures 9a, b, and c. In each case, the same axial mode is maintained in the temperature range Δt, and in the temperature range ΔT, Figure 7 At the same peak of the spectrum envelope shown in d, the axial mode sequentially gains maximum gain and becomes the oscillation axis mode, and when ΔT is exceeded, the oscillation axis mode shifts to the peak of the next peak of the envelope, creating a large mode hop. .

さらに、第9図aは、第7図dに示す包絡線の
ピーク波長の温度係数d/dTと第7図bに示
す軸モードの温度係数γについて、d/dT<
γのときに、発振軸モードが短波長側に隣接する
軸モードに順次移行して、ΔTの範囲内で小さい
モードホツプを起こす状態を示し、第9図bはd
λ/dT=γのときにΔT=Δtとなつて大きいモ
ードホツプのみが生じる状態を示す。さらに、第
9図cは、d/dT>γのときに、発振軸モー
ドが長波長側に隣接する軸モードに順次移行し
て、小さいモードホツプを生じる状態を示してい
る。
Furthermore, FIG. 9a shows that for the temperature coefficient d/dT of the peak wavelength of the envelope shown in FIG. 7d and the temperature coefficient γ of the axial mode shown in FIG.
When γ, the oscillation axis mode sequentially shifts to the adjacent axis mode on the shorter wavelength side, and a small mode hop occurs within the range of ΔT.
This shows a state in which ΔT=Δt when λ/dT=γ, and only large mode hops occur. Further, FIG. 9c shows a state in which, when d/dT>γ, the oscillation axis mode sequentially shifts to the adjacent axis mode on the longer wavelength side, producing a small mode hop.

〈発明が解決しようとする問題点〉 従来のSECレーザは、例えばGaAs−GaAlAs
系の場合、GaAs基板上にAlGaAsを活性層とす
るVSIS構造を積層したダブルヘテロ接合型半導
体レーザと高反射率をもたせるため劈開端面に誘
電体コーテイングを施したGaAsチツプの外部反
射部材とを銅製の載置台に所定の外部共振器長
(半導体レーザの出射端面と外部反射部材のミラ
ー反射面との間隔)だけ離して固定したものであ
る。このとき、反射部材となるGaAsチツプのレ
ーザ共振器方向の長さは、半導体レーザの共振器
長と同等もしくはそれ以上に設定されていた。こ
れは主として製造上の制約すなわちGaAsチツプ
の取扱いの容易さのためである。GaAsチツプの
長さが300μmの場合、d/dTを軸モードの温
度係数(0.7Å/deg)に一致させ第9図bのよう
な特性を得ようとすれば外部共振器長を65μmに
設定すればよく、このとき同図に示すΔT=26℃
の範囲でモードホツプを起こさないようにするこ
とが可能である。ところが、モードホツプを発生
する温度(第9図bに示すΔTの範囲の両端の温
度)任意に制御することは難しく、このような特
性を有する半導体レーザ素子でも利用する上で全
くモードホツプを発生しない温度範囲をある特定
の温度領域に限定して使用する場合には歩留低下
をきたし良質素子の選別に手間取ることになる。
この問題を解決するためには、モードホツプを起
こさない温度範囲ΔTをできるだけ大きくするこ
とが有効である。
<Problems to be solved by the invention> Conventional SEC lasers are made of GaAs-GaAlAs, for example.
In the case of a system, a double heterojunction semiconductor laser is made of a GaAs substrate with a VSIS structure stacked with AlGaAs as the active layer, and an external reflective member of a GaAs chip with a dielectric coating on the cleaved end face to provide high reflectance. The external resonator is fixed to a mounting table at a distance of a predetermined external resonator length (the distance between the emission end face of the semiconductor laser and the mirror reflection surface of the external reflection member). At this time, the length of the GaAs chip serving as the reflective member in the direction of the laser cavity was set to be equal to or longer than the cavity length of the semiconductor laser. This is primarily due to manufacturing constraints, namely the ease of handling GaAs chips. When the length of the GaAs chip is 300 μm, if you want to match d/dT with the temperature coefficient of the axial mode (0.7 Å/deg) and obtain the characteristics shown in Figure 9b, the external cavity length should be set to 65 μm. At this time, ΔT = 26℃ as shown in the same figure.
It is possible to prevent mode hops from occurring within the range of . However, it is difficult to arbitrarily control the temperature at which mode hops occur (the temperature at both ends of the range of ΔT shown in Figure 9b), and even when using a semiconductor laser device with such characteristics, there is a temperature at which no mode hops occur at all. If the range is limited to a specific temperature range for use, the yield will decrease and it will take time to select high-quality elements.
In order to solve this problem, it is effective to make the temperature range ΔT in which mode hops do not occur as large as possible.

本発明は上述のΔTをさらに大きくするための
外部共振器構造の改良技術を提供することを目的
とする。
An object of the present invention is to provide an improved technique for the external resonator structure to further increase the above-mentioned ΔT.

〈発明の概要〉 第1図は本発明の基本原理の説明に供する説明
図であり、1は半導体レーザ素子、2は半導体レ
ーザ素子1の一方の出射端面1aから出射された
レーザ光を半導体レーザ1に帰還させるための反
射面2aを有する反射部材、3は半導体レーザ素
子1および反射部材2を載置固定する載置部材で
ある。lは出射端面1aと反射面2aとの間隔
(外部共振器長)、Lは半導体レーザ素子1の全共
振器長の1/2の長さ、Mは反射部材2の中心から
反射面2aまでの距離、Dは半導体レーザ素子1
と反射部材2の中心間の距離であり、反射部材2
の長さ2Mは半導体レーザ素子1の共振器長2L
以下であるように構成されている。
<Summary of the Invention> FIG. 1 is an explanatory diagram for explaining the basic principle of the present invention, in which 1 is a semiconductor laser element, and 2 is a semiconductor laser that emits laser light emitted from one emission end face 1a of the semiconductor laser element 1. 1 is a reflecting member having a reflecting surface 2a for returning the semiconductor laser element 1 and the reflecting member 2, and 3 is a mounting member on which the semiconductor laser element 1 and the reflecting member 2 are placed and fixed. l is the distance between the emission end face 1a and the reflection surface 2a (external cavity length), L is the length of 1/2 of the total cavity length of the semiconductor laser element 1, and M is the distance from the center of the reflection member 2 to the reflection surface 2a. distance, D is the semiconductor laser element 1
is the distance between the center of the reflective member 2 and the reflective member 2
The length 2M is the cavity length 2L of the semiconductor laser element 1.
It is configured as follows:

〈作用〉 すでに述べたように外部共振器型半導体レーザ
の発振モードの振舞いは、レーザの利得分布、レ
ーザの軸モード、そして外部共振器による波長選
択性の3つの要因によつて決定される。発振モー
ドの温度変化に関しては、これら3つの要因の温
度依存性を考慮した上で適正な条件を設定するこ
とにより第9図bに示すようにΔTなる温度範囲
で全くモードホツプを発生しない良好な特性を有
する素子が得られる。ΔTをさらに拡げるために
は、外部共振器長lをより小さく設定し、第7図
cに示す外部共振器の共振特性における共振間隔
を拡げることが有効であるが、他の条件を変えず
に単にlを小さくしたのみでは、外部共振器の共
振特性のピーク波長λeの温度特性dλe/dTが増
大し、レーザの発振特性は第9図cのようにΔT
の範囲内で長波長側モードへとモードホツプを発
生してしまう。
<Operation> As already mentioned, the behavior of the oscillation mode of an external cavity semiconductor laser is determined by three factors: the gain distribution of the laser, the axial mode of the laser, and the wavelength selectivity of the external cavity. Regarding the temperature change of the oscillation mode, by setting appropriate conditions after considering the temperature dependence of these three factors, it is possible to obtain good characteristics in which no mode hops occur in the temperature range of ΔT, as shown in Figure 9b. An element having the following properties is obtained. In order to further widen ΔT, it is effective to set the external resonator length l smaller and widen the resonance interval in the resonance characteristics of the external resonator shown in Figure 7c, but without changing other conditions. If l is simply made smaller, the temperature characteristic dλe/dT of the peak wavelength λe of the resonance characteristic of the external resonator will increase, and the oscillation characteristic of the laser will change to ΔT as shown in Figure 9c.
A mode hop is generated toward the longer wavelength mode within the range of .

本発明は、反射部材が熱膨張する領域を小さく
することにより付設された外部共振器の熱膨張を
低減し、これに基いた外部モード(外部共振器の
共振ピーク波長)の温度変化をも低減して発振波
長の安定温度領域(モードホツプしない温度領
域)を拡大しようとするものである。以下、この
点について説明する。
The present invention reduces the thermal expansion of the attached external resonator by reducing the thermal expansion area of the reflective member, and also reduces the temperature change of the external mode (resonance peak wavelength of the external resonator) based on this. This is an attempt to expand the stable temperature range of the oscillation wavelength (temperature range in which no mode hops occur). This point will be explained below.

外部モードλeの温度依存性には主として外部
共振器の熱膨張が作用する。一般に外部モードの
温度変化率dλe/dTは、 dλe/dT=λo/l・dl/dT ……(1) (ただしlはλoを共振波長とする外部共振器
長) で表わされ、外部共振器の熱膨張係数が小さいほ
ど外部モードの温度変化率が減少する。第1図に
示すレーザ装置の概略構成図において、温度変化
に伴い熱変形するものは半導体レーザ素子1、反
射部材2および載置部材3であり、これらの熱変
形の合成として外部共振器長lが温度変化すると
考えられる。半導体レーザ素子1および反射部材
2は融着材により載置部材3に固定されているが
温度変化により、それぞれの中央(XおよびY)
を中心に熱変形すると考えられる。従つて外部共
振器長lの温度変化を考える際には、載置部材の
熱変形する領域として両熱膨張中心(Xおよび
Y)間の長さDなる領域に注目すればよい。この
とき、外部共振器長lは l=D−(L+M) ……(2) である。半導体レーザ1、反射部材2、載置部材
3の線膨張係数をそれぞれα1,α2,α3とするとl
の温度変化率は dl/dT=α3D−(α1L+α2M) =α3l+(α3−α1)L+(α3−α2)M ……(3) であるから(1)式を用いて外部モードの温度変化率
は dλe/dT=λo{α3+L/l (α3−α1)+M/l(α3−α2)} ……(4) と表わされる。
The temperature dependence of the external mode λe is mainly affected by the thermal expansion of the external resonator. Generally, the temperature change rate dλe/dT of the external mode is expressed as dλe/dT = λo/l・dl/dT (1) (where l is the length of the external resonator with λo as the resonant wavelength), and the external mode The smaller the coefficient of thermal expansion of the vessel, the lower the rate of temperature change in the external mode. In the schematic configuration diagram of the laser device shown in FIG. 1, the parts that thermally deform with temperature changes are the semiconductor laser element 1, the reflection member 2, and the mounting member 3, and the external cavity length l is the composite of these thermal deformations. is thought to be caused by temperature changes. The semiconductor laser element 1 and the reflection member 2 are fixed to the mounting member 3 with a fusion material, but due to temperature changes, their centers (X and Y)
It is thought that thermal deformation occurs mainly in Therefore, when considering the temperature change of the external resonator length l, it is sufficient to pay attention to the region having the length D between the two thermal expansion centers (X and Y) as the region where the mounting member is thermally deformed. At this time, the external resonator length l is l=D-(L+M)...(2). If the linear expansion coefficients of the semiconductor laser 1, the reflective member 2, and the mounting member 3 are α 1 , α 2 , and α 3 , respectively, then l
The temperature change rate is dl/dT=α 3 D−(α 1 L+α 2 M) = α 3 L+(α 3 −α 1 )L+(α 3 −α 2 )M ……(3), so (1 ) The temperature change rate of the external mode is expressed as dλe/dT=λo{α 3 +L/l (α 3 −α 1 )+M/l(α 3 −α 2 )} (4).

いま半導体レーザ1と反射部材2が同じ材料で
構成されていれば(α1=α2=α)、(4)式は dλe/dT=λo{α3+L+M/l(α3−α)}…
…(4)′ となる。(4)式はLまたはMが小さいほどdλe/dTが 小さくなることを示している。すなわち載置部材
上に固定される半導体レーザ素子の共振器長、も
しくは同上に固定される反射部材の長さ(共振器
長方向)を減ずることにより外部モードの温度変
化率を低減できる。ここにいう反射部材の長さ
は、反射面を有する反射部材で、熱膨張のために
反射面を移動させるのに寄与する領域の共振器長
方向の長さである。上述のように半導体レーザ素
子の共振器長を短くすることもdλe/dTを低減する のに有効ではあるが、この場合注入電流密度の増
大、発振モードの多モード化などを招来し好まし
くない。
If the semiconductor laser 1 and the reflective member 2 are made of the same material (α 1 = α 2 = α), then equation (4) becomes dλe/dT=λo {α 3 +L+M/l(α 3 −α)} …
…(4)′ becomes. Equation (4) shows that the smaller L or M is, the smaller dλe/dT becomes. That is, by reducing the resonator length of the semiconductor laser element fixed on the mounting member or the length (in the resonator length direction) of the reflecting member fixed thereon, the temperature change rate of the external mode can be reduced. The length of the reflecting member referred to herein is the length in the resonator length direction of a region of the reflecting member having a reflecting surface that contributes to moving the reflecting surface due to thermal expansion. As mentioned above, shortening the cavity length of the semiconductor laser device is also effective in reducing dλe/dT, but this is not preferable because it causes an increase in the injection current density and multimode oscillation.

(4)式の計算結果を第4図に示す。同図から同じ
lを有していても反射部材の長さ2Mを減じるこ
とによりdλe/dTは減少し、また2Mを減少するこ とにより、lを短くしても同一のdλe/dTを維持で きることがわかる。
Figure 4 shows the calculation results of equation (4). From the same figure, even if the length of the reflective member is the same, dλe/dT decreases by reducing the length of the reflecting member by 2M, and by decreasing 2M, the same dλe/dT can be maintained even if the length of l is shortened. I understand.

例えばdλe/dT=0.5Å/℃となるときの外部共振 器長lは、反射部材の長さが300μmのときには
65μm,100μmの反射部材を用いると40μmまで
短くできる。
For example, the external cavity length l when dλe/dT = 0.5 Å/°C is
If reflective members of 65 μm and 100 μm are used, the length can be shortened to 40 μm.

一方反射部材の長さをパラメータとしたΔTの
外部共振器長依存性(計算値)は第5図のように
なる。これによれば反射部材の長さが300μm,
l=65μmのときΔT=26℃であるが、反射部材
を100μmと短くするとΔT=42℃とモードホツプ
しない温度範囲が広くなる。
On the other hand, the external resonator length dependence (calculated value) of ΔT with the length of the reflecting member as a parameter is as shown in FIG. According to this, the length of the reflective member is 300μm,
When l=65 μm, ΔT=26°C, but if the reflective member is shortened to 100 μm, ΔT=42°C, which widens the temperature range in which mode hops do not occur.

〈実施例〉 以下、図面に示す実施例に基いて本発明を詳述
する。なお、これによつてこの発明が限定される
ものではない。
<Examples> The present invention will be described in detail below based on examples shown in the drawings. Note that this invention is not limited to this.

第2図は本発明の一実施例を示す外部共振器型
半導体レーザ装置の斜視図であり、1はGaAs基
板上のAlGaAsを活性層とするVSIS型半導体レ
ーザ、1aはその一方の出射端面、2はGaAsチ
ツプからなる反射部材で1aと対向する面2aは
誘電体コーテイングより高反射率(90%以上)を
有する。3は半導体レーザ1とGaAsチツプ2と
を設置する載置部材(Cuヒートシンク)、4はAl
リード線である。2Lは半導体レーザの共振器
長、2Mは反射部材の長さ、lは半導体レーザ1
の出射端面1aと反射部材2の反射面2aとの間
隔(外部共振器長)である。
FIG. 2 is a perspective view of an external cavity type semiconductor laser device showing an embodiment of the present invention, in which 1 is a VSIS type semiconductor laser having an active layer of AlGaAs on a GaAs substrate, 1a is one of the emission end faces; Reference numeral 2 denotes a reflective member made of a GaAs chip, and the surface 2a facing 1a has a higher reflectance (90% or more) than the dielectric coating. 3 is a mounting member (Cu heat sink) on which the semiconductor laser 1 and GaAs chip 2 are installed, 4 is an Al
This is the lead wire. 2L is the resonator length of the semiconductor laser, 2M is the length of the reflecting member, and l is the semiconductor laser 1.
is the distance (external resonator length) between the emission end surface 1a and the reflection surface 2a of the reflection member 2.

このような構成において、半導体レーザの共振
器長2L=250μm、GaAsチツプの長さ2M=
150μm、外部共振器長l=45μmとしてそれぞれ
をCuヒートシンク上に実装し発振波長の温度依
存性を測定した。測定結果を第3図に示す。この
外部共振器型半導体レーザは、ΔT=35℃の範囲
で全くモードホツプを発生せず2M=300μmの
とき(ΔT=26℃)に比べてさらに9℃広い温度
領域にわたつて特定の発振モードを維持して安定
に発振した。
In this configuration, the cavity length of the semiconductor laser 2L = 250 μm, the length of the GaAs chip 2M =
Each was mounted on a Cu heat sink with an external cavity length of 150 μm and an external cavity length of 45 μm, and the temperature dependence of the oscillation wavelength was measured. The measurement results are shown in Figure 3. This external cavity semiconductor laser does not generate any mode hops in the range of ΔT = 35°C, and can maintain a specific oscillation mode over a 9°C wider temperature range than when 2M = 300 μm (ΔT = 26°C). It maintained stable oscillation.

半導体レーザの共振器長はレーザチツプの取扱
い易さ以外にヒートシンク上へのボンデイング強
度を確保する必要があるため短くすることは困難
であり実用的には200μm以上となるが、GaAsチ
ツプはリードボンドしないのでボンデイング強度
を考慮する必要がなく、長さとして100μm以下
でも実装上の問題はない。上記実施例のように
ΔTを広くするにはGaAsチツプの長さを短くす
ることが有効で、上記半導体レーザ装置では外部
共振器のみを制御するため半導体レーザ自体の良
い特性を保持したままΔTを拡げることができ
る。
The cavity length of a semiconductor laser is difficult to shorten because it is necessary to ensure bonding strength on the heat sink in addition to ease of handling the laser chip, and in practice it is 200 μm or more, but GaAs chips do not have lead bonding. Therefore, there is no need to consider bonding strength, and there are no mounting problems even if the length is 100 μm or less. As in the above example, it is effective to shorten the length of the GaAs chip in order to widen ΔT.In the above semiconductor laser device, only the external resonator is controlled, so ΔT can be increased while maintaining the good characteristics of the semiconductor laser itself. Can be expanded.

〈発明の効果〉 上記詳説した如く本発明によれば、広い温度範
囲にわたつて温度変化に対する発振モードのモー
ドホツプを制御することができ、動作特性の安定
な半導体レーザ装置を得ることができる。
<Effects of the Invention> As detailed above, according to the present invention, it is possible to control the mode hop of the oscillation mode with respect to temperature changes over a wide temperature range, and it is possible to obtain a semiconductor laser device with stable operating characteristics.

【図面の簡単な説明】[Brief explanation of drawings]

第1図は本発明の基本原理の説明に供する説明
図である。第2図は本発明の一実施例を示す半導
体レーザ装置の斜視図である。第3図は第2図に
示す半導体レーザ装置の発振波長の温度特性を示
す特性図である。第4図は反射部材の長さをパラ
メータとして外部共振器長と外部モードの温度変
化率の関係を計算値で説明する説明図である。第
5図は反射部材の長さをパラメータとして外部共
振器長とΔTとの関係を計算値で示す説明図であ
る。第6図は従来の半導体レーザの発振モードの
選択性を示す説明図である。第7図はSEC半導体
レーザの発振モードの選択性を示す説明図であ
る。第8図は従来の半導体レーザ装置の発振波長
の温度特性を示す特性図である。第9図a,b,
cは一般的なSEC半導体レーザにおける発振波長
の温度特性の各種態様を示す特性図である。 1……半導体レーザ素子、2……反射部材、3
……載置部材、4……リード線。
FIG. 1 is an explanatory diagram for explaining the basic principle of the present invention. FIG. 2 is a perspective view of a semiconductor laser device showing an embodiment of the present invention. FIG. 3 is a characteristic diagram showing the temperature characteristics of the oscillation wavelength of the semiconductor laser device shown in FIG. FIG. 4 is an explanatory diagram illustrating the relationship between the external resonator length and the temperature change rate of the external mode using calculated values using the length of the reflecting member as a parameter. FIG. 5 is an explanatory diagram showing the relationship between the external resonator length and ΔT using calculated values using the length of the reflecting member as a parameter. FIG. 6 is an explanatory diagram showing the selectivity of the oscillation mode of a conventional semiconductor laser. FIG. 7 is an explanatory diagram showing the selectivity of the oscillation mode of the SEC semiconductor laser. FIG. 8 is a characteristic diagram showing the temperature characteristics of the oscillation wavelength of a conventional semiconductor laser device. Figure 9 a, b,
c is a characteristic diagram showing various aspects of the temperature characteristics of the oscillation wavelength in a general SEC semiconductor laser. 1...Semiconductor laser element, 2...Reflection member, 3
...Placement member, 4...Lead wire.

Claims (1)

【特許請求の範囲】 1 半導体レーザ素子と、該半導体レーザ素子の
一方の出射端面から出射されたレーザ光を前記半
導体レーザ素子に帰還させ、前記半導体レーザ素
子との間で外部共振器を構成する反射面を有する
反射部材と、をそれぞれ載置部材上に載置固定
し、レーザの発振モードを前記半導体レーザ素子
の利得分布と軸モード及び前記外部共振器による
波長選択性の3つの要因により決定し、前記要素
の条件を温度範囲ΔTで全くモードホツプを発生
しないように設定してなる外部共振器型半導体レ
ーザ装置において、前記反射部材のレーザ共振方
向に平行な方向の長さを前記半導体レーザ素子の
内部共振器長以下として、かつ前記温度範囲ΔΤ
を拡大する方向に前記外部共振器長を短くしたと
を特徴とする外部共振器型半導体レーザ装置。 2 反射部材の材質が半導体レーザ素子の基板材
質と同一である特許請求の範囲第1項記載の外部
共振器型半導体レーザ装置。 3 反射部材のレーザ共振方向に平行な方向の長
さが250μm以下である特許請求の範囲第2項記
載の外部共振器型半導体レーザ装置。
[Scope of Claims] 1. A semiconductor laser element, and a laser beam emitted from one emission end face of the semiconductor laser element is returned to the semiconductor laser element, and an external resonator is formed between the semiconductor laser element and the semiconductor laser element. and a reflecting member having a reflecting surface are respectively mounted and fixed on a mounting member, and the oscillation mode of the laser is determined by three factors: the gain distribution and axial mode of the semiconductor laser element, and the wavelength selectivity of the external resonator. In an external cavity type semiconductor laser device in which the conditions of the elements are set so as not to generate any mode hops in the temperature range ΔT, the length of the reflecting member in the direction parallel to the laser resonance direction is the same as that of the semiconductor laser element. and the temperature range ΔΤ
1. An external cavity type semiconductor laser device, characterized in that the external cavity length is shortened in the direction of enlarging the length of the external cavity. 2. The external cavity type semiconductor laser device according to claim 1, wherein the material of the reflecting member is the same as the material of the substrate of the semiconductor laser element. 3. The external cavity type semiconductor laser device according to claim 2, wherein the length of the reflecting member in the direction parallel to the laser resonance direction is 250 μm or less.
JP6458587A 1987-03-19 1987-03-19 External cavity type semiconductor laser device Granted JPS63229889A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP6458587A JPS63229889A (en) 1987-03-19 1987-03-19 External cavity type semiconductor laser device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP6458587A JPS63229889A (en) 1987-03-19 1987-03-19 External cavity type semiconductor laser device

Publications (2)

Publication Number Publication Date
JPS63229889A JPS63229889A (en) 1988-09-26
JPH0542149B2 true JPH0542149B2 (en) 1993-06-25

Family

ID=13262469

Family Applications (1)

Application Number Title Priority Date Filing Date
JP6458587A Granted JPS63229889A (en) 1987-03-19 1987-03-19 External cavity type semiconductor laser device

Country Status (1)

Country Link
JP (1) JPS63229889A (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62257784A (en) * 1986-04-30 1987-11-10 Sharp Corp Semiconductor laser device

Also Published As

Publication number Publication date
JPS63229889A (en) 1988-09-26

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