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JPH0542511B2 - - Google Patents
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JPH0542511B2 - - Google Patents

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Publication number
JPH0542511B2
JPH0542511B2 JP61284925A JP28492586A JPH0542511B2 JP H0542511 B2 JPH0542511 B2 JP H0542511B2 JP 61284925 A JP61284925 A JP 61284925A JP 28492586 A JP28492586 A JP 28492586A JP H0542511 B2 JPH0542511 B2 JP H0542511B2
Authority
JP
Japan
Prior art keywords
plating
wire
nozzle
injection
wire material
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP61284925A
Other languages
Japanese (ja)
Other versions
JPS63137175A (en
Inventor
Jiro Shinmen
Takashi Sasaki
Yoshikazu Sasa
Kazuo Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kobe Steel Ltd
Original Assignee
Kobe Steel Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kobe Steel Ltd filed Critical Kobe Steel Ltd
Priority to JP28492586A priority Critical patent/JPS63137175A/en
Publication of JPS63137175A publication Critical patent/JPS63137175A/en
Publication of JPH0542511B2 publication Critical patent/JPH0542511B2/ja
Granted legal-status Critical Current

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Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/54Contact plating, i.e. electroless electrochemical plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1617Purification and regeneration of coating baths
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/1601Process or apparatus
    • C23C18/1619Apparatus for electroless plating
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/16Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
    • C23C18/31Coating with metals
    • C23C18/38Coating with copper

Landscapes

  • Chemical & Material Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electrochemistry (AREA)
  • Chemically Coating (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

(産業上の利用分野) 本発明は線条材の表面処理方法に係り、特に溶
接用ワイヤ、ビードワイヤ等の線条材の置換銅メ
ツキに好適な置換メツキ方法に関するものであ
る。 (従来の技術) 一般に、線条材、特に溶接用ワイヤにおいて
は、その製造工程中にメツキ工程があるが、この
メツキ工程には従来より電気メツキ法、置換メツ
キ法等が採用されている。これらのメツキ方法は
いずれも線条材を処理液中に走行浸漬させる方法
或いはコイル状の線状材を処理液中に浸漬する方
法である。 例えば、溶接用ワイヤの場合、周知の如く通電
性、給電チツプの耐摩耗性、送給性、耐錆性等の
向上のために鋼ワイヤの表面に銅メツキが施され
ているが、メツキされた銅分は溶接品質上は溶接
部の割れを起こす一因ともなることから有害とさ
れており、前述の条件が満たされる限りできるだ
け少量の方が好ましい。そのためのメツキ方法と
しては、従来、シアン化浴電気メツキが一般に実
施されていたが、近年、公害対策を含めてコスト
面から硫酸銅浴置換メツキも行われるようになつ
てきた。 (発明が解決しようとする問題点) これらのメツキ方法の工程は、線材を走行させ
る態様の場合、第14図(電気メツキ)及び第1
5図(置換メツキ)に例示するように、いずれも
ボビン2に巻かれた線材1は払出し装置によつて
引き出され、酸洗槽3、水洗槽4により表面を酸
洗し、スケール等を取り除いてワイヤ表面を活性
化した後、メツキ液が満たされたメツキ浴槽5中
を浸漬走行させてメツキし、水洗槽6で水洗し乾
燥後巻き取られるのが一般的である。しかし、前
者は浸漬通電時間を確保する必要があることから
長大な処理槽が必要であり、反面、ワイヤ走行速
度の高速化を難しくし、生産性の向上を図ること
ができない。また当然のことながら、電気メツキ
では整流路7をはじめ電気制御系も複雑大型化が
避けられず、後者の浸漬置換メツキでは整流器等
は不要であるが、所要メツキ厚(0.2〜1.0μ程度)
を得るための置換完了時間を確保するために大型
の処理槽が不可欠である。更には、大量の処理液
を必要とするため、本体設備、環境保全設備等に
多大な費用を要し、またメツキ品質上、密着性、
メツキ膜厚等にムラが生じやすく、細心の管理を
必要とする。その原因の1つとしては、このよう
なメツキ方法では槽中メツキ液が攪拌されない限
り、第16図に示す如く槽中メツキ液8が移動せ
ず、走行ワイヤ1の周辺に置換が終了した液及び
高濃度の鉄イオンが滞留するため、連続して送ら
れてくるワイヤへの銅の付着が極端に減少すると
共にメツキ品質上密着性を阻害するところとな
る。もつとも、実際には、この置換が進行するの
は走行ワイヤの振動とか熱による対流などによつ
てある程度はワイヤ周辺の液が入れ替わつている
ためであるが、大なり小なり第16図に示す如く
ワイヤ周辺に筒状の反応速度が遅い領域(点線部
内)9が生じ或いは生じやすいものである。 いずれにしても、溶接用ワイヤに限らず、他の
線条材の上記メツキ方法に際しても同様の問題が
生じるものである。 本発明は、上記従来技術の問題点を解決するた
めになされたものであつて、電気メツキ法よりも
簡易な置換メツキ法に関し、短時間で瞬間的にメ
ツキできる様高速化を図り、密着性、メツキ膜厚
の均一化等の良好な品質を確保でき、しかも簡便
な設備で足りる経済的な線条材表面処理方法を提
供することを目的とするものである。 (問題点を解決するための手段) 上記目的を達成するため、本発明者らは、従来
の電気メツキ方法、置換メツキ方法のいずれの浸
漬メツキ方式においてもワイヤ表面の凹深部も含
めてワイヤ周辺のメツキ液を如何に速く且つ効率
よく置き替えるかが肝要である点に着目して鋭意
実験研究を重ねた結果、新規且つ効率的な置換メ
ツキ法を見い出して本発明をなしたものである。
本発明は、要するに、高圧ポンプを用いてノズル
から置換メツキ液のジエツト様の噴出流を、浮遊
状態で走行する線条材に対し、単位面積当りの衝
撃圧力が0.05Kg/cm2以上で衝撃的に噴射させ、メ
ツキせんとするものである。 以下に本発明を実施例に基づいて詳細に説明す
る。 前述の如く、本発明法では、所定速度で空間を
走行する線条材(以下、ワイヤという)に対し、
高圧ポンプ等で加圧供給されるメツキ液をノズル
を介して高速且つ連続的に吹き付けるが、これに
より、置換反応を終了した液はワイヤ周辺に滞留
することなく高速噴流乃至ジエツト噴流ではじき
飛ばされ、しかもワイヤ表面の凹深部まで衝撃的
にフレツシユなメツキ液で洗滌置き替えが行われ
る。その洗滌置き替え効果は非常に大きなもので
あり、密着性のよいメツキが瞬時に完了する。 この点、従来の浸漬式の置換メツキ法では、例
えば溶接用ワイヤ等に適用されている比較的安価
な硫酸銅浴置換メツキの場合、析出メツキ層が比
較的粗い結晶粒子となりやすく、メツキの密着性
が劣るため、実用上問題があつた。そのため、析
出物粒子を密にする目的で古くからゼラチン、チ
オ尿素、フエノール、アミノ酸類等の種々の有機
化合物の添加が試みられてきたが、濃度管理が煩
雑であつたりして決定的な解決は得られていなか
つた。 これに対し、本発明は上記のメツキ液噴射方式
にて置換メツキ液をワイヤに高速かつ衝撃的に接
触させることにより、析出物粒子を密にしてメツ
キの密着性を良好にすることに成功したものであ
る。 更に置換メツキを行う場合、メツキ液濃度が高
いほどメツキ能率が向上するので望ましいことで
あるが、濃度が高いと密着性が悪くなる傾向にあ
ることが知られている。これは、銅置換メツキを
例にとるならば、Cu2+の還元速度が極めて大き
いので、それと同時に溶出する鉄の速度も極めて
大きくなり、生じた高濃度のFe++が溶液内部へ
の拡散により取り除かれる前に沈澱(FeSO4
Fe2O3)になり、銅の内部に閉じ込められてしま
うためで、このような沈澱を含めメツキは非常に
粗い構造を呈し、下地の鉄と強固な結合ができ
ず、簡単に剥離してしまう(「金属表面技術」
Vol.26、No.12(1975)、P595参照)。しかし、本発
明によれば、上記の傾向が緩和されるので、適用
濃度範囲を従来よりも拡大することができ、メツ
キ能率も向上する。 次に本発明法のプロセス条件について、置換銅
メツキの場合を例にとり具体的に説明する。 第1図は本発明の実施に用いる置換メツキ装置
の一例であり、1は適宜速度で走行するワイヤ、
10はこのワイヤに置換メツキ液を噴射するノズ
ルであり、このノズルは走行するワイヤ1の走行
方向に1個又は2個以上、また径方向に所定の角
度で1個又は2個以上配置されている。11はノ
ズル10から噴射されるメツキ液が0.05Kg/cm2
上の如く必要な衝撃圧力にてワイヤ表面に衝突す
るようにパイプ11′を介して高圧(例、0.5Kg/
cm2以上)でメツキ液を供給するポンプであり、通
常は処理槽5の下部に貯留されるメツキ液8を循
環させるものである。なお、12は水洗槽6に配
置した水洗又は洗滌用ノズルであり、ポンプ13
を使用してメツキ直後のワイヤ1に水を噴射させ
るものである。 ノズル10からの噴射方向は走行するワイヤ1
の走行方向との関係で種々の態様が可能であり、
ワイヤ走行方向に対する噴射方向の角度θが0゜≦
θ≦180゜で任意に決めることができ(第2図)、
90゜<θ≦180゜のときは順方向(同方向ノズル方
式)、0゜≦θ<90゜のときは逆方向(対向流ノズル
方式)と云うことができ、0<θ<180゜のときは
交叉する方向と云うことができる。メツキ液でワ
イヤ表面に有効な衝撃力を与えるためには直角方
向(θ=90゜)がよく、またワイヤ走行方向と逆
方向に噴射させる対向流ノズル方式によれば相対
速度を増すことができて銅析出を促進することが
できるので、ワイヤ性状、送給方法等によつて適
宜角度θを選択すればよい。なお、順方向のとき
はワイヤ走行速度と相対速度差をもつて噴射させ
ることは云うまでもない。 また、ノズルはワイヤ走行速度、所定メツキ厚
等のメツキ条件によりワイヤ走行方向に対し、1
個又は2個以上、ワイヤ径方向に1個又は2個以
上適宜選択して配置することができる。 ノズルをワイヤ径方向に複数個配置するとき
は、ワイヤ径に対して2方向、3方向の如く種々
の方向の態様でワイヤ断面形状を考慮して選択す
ることができ、丸線ワイヤの場合、各方向のなす
角δとしてノズル2個のときは約δ=180゜(第3
図)、3個のときは約δ1、δ2、δ3=120゜(第4図)
の如く同一乃至略同一の均等角をなすように配置
して第4図に示す如く効率よくワイヤ全面にメツ
キ液が当るように配慮するのが望ましい。 また、ワイヤ走行方式の関連で、上記例ではワ
イヤを真直状に走行させる場合を示したが、第7
図a,bに示すように、メツキ槽5内に複数個の
ターンローラ14を配置してワイヤ1を複数回方
向転換させる方式の場合にはワイヤの表面及び裏
面にメツキ液噴射されるように複数個のノズル1
0を配置することができ、この場合にはメツキ槽
5の長さを節減させることができる。 更に、第8図に示すように、ワイヤ1を螺線状
に走行させ、螺線状走行軌跡の頂点、底部等にて
ノズル10によりメツキ液を噴射させることも可能
で、この場合もワイヤの移動方向での処理長さを
節減することができる。 なお、以上のノズル配線態様で示したノズルは
走行するワイヤに対してワイヤ外側に配置した例
であつて、いわばジエツトノズル方式と云うこと
ができるが、ワイヤをノズル内中心に走行させる
ノズル中心ワイヤ走行方式も可能である。すなわ
ち、第5図に示すように、パイプ状ノズル10′
の中心にワイヤ1を通し、ワイヤの走行方向と逆
の方向(対向流)にメツキ液8を噴射させて相対
速度を増大させることにより、鉄イオンの滞留を
防止すると共に常にフレツシユなメツキ液を供給
する方式である。 また、メツキ液の噴射方向がワイヤ走行方向と
同一方向(順方向流)になる様ノズルを1個以上
設ける場合には、噴射方向が順方向となるのでワ
イヤ走行速度と相対速度差が生じるように噴射さ
せるのがよい。このようなノズル中心ワイヤ走行
方式の順方向ノズル配置の場合や対向流ノズル配
置の場合は、前記ジエツトノズル方式よりも効果
が小さくなる。何故ならば、ノズルから噴射され
たメツキ液はほゞワイヤ表面に平行な層流となる
のでメツキ液の撹拌性が悪く、ワイヤ表面の活性
化やメツキ液のイオン拡散が小さく、ジエツトノ
ズル方式ほどの十分な効果が得難いが、しかし、
従来の浸漬メツキ方式よりも格段に優れている。 上記ノズル中心ワイヤ走行方式の場合も、メツ
キ液の噴射方向とノズル個数との関連で、第6図
に示すように一対のパイプ状ノズル10′を対称
的に対向させて配置し、ノズル中心にワイヤ1を
走行させ、交叉する方向にメツキ液8を噴射させ
る変形方式が可能である。この場合、メツキ液は
各ノズルより高速噴射され、対向流(下流側ノズ
ル)と順方向流(上流側ノズル)の層流域15が
衝突した部分で完全な乱流(乱流域16)とな
り、ワイヤ表面全周にわたつてメツキ液の瞬間的
な入れ替りが達成される。このように両方向の噴
出流が衝突することにより、衝撃力がワイヤ表面
の活性化を進める一方、発生した乱流によりメツ
キ液のイオン拡散が大きくなり、高速且つ効率的
なメツキがなされる。 しかし、ノズル中心ワイヤ走行方式の場合、ワ
イヤがスムーズに通過するだけの間隙をノズル内
に設ける必要があり、間隙を設けるとメツキ液の
吹き出し側の反対側から大気が吸引されてワイヤ
周辺に空気が介在しやすいので、上記ジエツトノ
ズル方式に比べ、置換効率が悪く、或いはワイヤ
鉄地の酸化及びメツキ液の劣化によりメツキ効率
が低下する傾向がある。ワイヤが狭い間隙内を走
行するので、析出したメタル銅がノズル端に成長
してワイヤに疵を付けることがあるので、この点
に留意する必要がある。また、ノズル配置の状態
によつては噴射されたメツキ液は遠くまで達して
ミストとなり、環境を悪化させる問題はある。 次に、本発明各噴射態様におけるワイヤへのメ
ツキ液の衝撃圧力については、前述の噴射による
各作用を達成させるためには高いほどよく、0.05
Kg/cm2以上の値が望ましい。衝撃圧力を高くすれ
ばする程、メツキ密着性が向上する。この衝撃圧
力に応じてポンプによるメツキ液の供給圧力、流
量等々が決められる。 また、本発明を溶接用ワイヤ等置換銅メツキに
適用する場合、好ましくはCuSO4・5H2Oを>5
g/含み、比重<1.8であるメツキ液が適宜選択
される。これは、CuSO4・5H2Oが5g/以下
ではメツキ析出速度が遅きに過ぎ、比重1.8以上
では、溶解塩類の再析出のおそれが生じるためで
ある。 (実施例) 次に本発明の一実施例を示す。なお、本発明は
本実施例のみに限定されないことは云うまでもな
い。 実施例 1 置換銅メツキにつき本発明法と従来法の違いを
明確にするため、以下に示す実験方法及び条件で
置換メツキを実施した。なお、メツキ前後におけ
るメツキ前処理及びメツキ後処理は同一条件で実
施した。 実験に供した装置は、第15図に示した従来の
装置構成にて、まず従来の浸漬メツキ方式(従来
法)を行つた。その後、同図のメツキ浴槽5のメ
ツキ液を排出した後、メツキ浴槽5中に第5図に
示したノズル10′を連続配置して本発明法の1
例であるノズル中心ワイヤ走行方式(本発明法
1)を行い、また第5図に示したノズルの代りに
通常のスプレーノズル10をワイヤ径2方向(各
方向のなす角は約180゜)となるように配置すると
共に高圧ポンプを使用して本発明法の他の1例で
あるジエツトノズル方式(本発明法2)を行つ
た。 従来法及び本発明法1、2の実験設定条件は次
表に示すとうりである。
(Industrial Application Field) The present invention relates to a surface treatment method for wire materials, and particularly to a displacement plating method suitable for displacement copper plating of wire materials such as welding wires and bead wires. (Prior Art) Generally, wire materials, particularly welding wires, include a plating step during their manufacturing process, and electroplating, displacement plating, etc. have been conventionally employed in this plating step. All of these plating methods include a method in which the wire material is immersed while running in a treatment solution, or a method in which a coiled wire material is immersed in the treatment solution. For example, in the case of welding wire, the surface of the steel wire is plated with copper to improve conductivity, wear resistance of the power supply chip, feedability, rust resistance, etc., as is well known. Copper content is considered harmful to welding quality as it can cause cracks in the welded area, and it is preferable to keep the amount as small as possible as long as the above conditions are met. Conventionally, cyanide bath electroplating has been generally used as a plating method for this purpose, but in recent years, copper sulfate bath substitution plating has also been used due to cost considerations including pollution control. (Problems to be Solved by the Invention) The steps of these plating methods are as shown in FIG. 14 (electroplating) and FIG.
As illustrated in Fig. 5 (replacement plating), the wire 1 wound around the bobbin 2 is pulled out by a payout device, and the surface is pickled in a pickling tank 3 and a water washing tank 4 to remove scale, etc. After activating the surface of the wire, the wire is generally plated by being immersed in a plating bath 5 filled with a plating solution, washed with water in a washing bath 6, dried, and then wound up. However, the former method requires a long processing tank because it is necessary to ensure the immersion energization time, and on the other hand, it makes it difficult to increase the wire running speed, making it impossible to improve productivity. Naturally, electric plating inevitably increases the complexity and size of the electrical control system including the rectifier path 7, and the latter type of immersion displacement plating does not require a rectifier, but the required plating thickness (approximately 0.2 to 1.0μ)
A large treatment tank is essential to ensure the time required to complete the replacement. Furthermore, since a large amount of processing liquid is required, a large amount of cost is required for the main equipment, environmental protection equipment, etc., and in terms of plating quality, adhesion and
It is easy to cause unevenness in plating film thickness, etc., and requires careful management. One of the reasons for this is that in such a plating method, unless the plating liquid in the tank is stirred, the plating liquid 8 in the tank does not move as shown in FIG. Since a high concentration of iron ions remains, the adhesion of copper to the continuously fed wire is extremely reduced and the adhesion of the plating quality is impaired. However, in reality, this replacement progresses because the liquid around the wire is replaced to some extent by vibrations of the running wire and convection due to heat, but the difference is shown in Figure 16 to a greater or lesser extent. A cylindrical region 9 (within the dotted line) where the reaction rate is slow occurs or tends to occur around the wire. In any case, similar problems occur not only in welding wire but also in the above-mentioned plating method for other wire materials. The present invention was made in order to solve the problems of the prior art described above, and relates to a substitution plating method that is simpler than the electroplating method. The object of the present invention is to provide an economical method for surface treatment of a wire material, which can ensure good quality such as uniform plating film thickness, and which requires simple equipment. (Means for Solving the Problems) In order to achieve the above object, the present inventors have proposed that in both the conventional electroplating method and the displacement plating method, the periphery of the wire, including the deep concave part of the wire surface, As a result of extensive experimental research focusing on the important point of how quickly and efficiently the plating solution can be replaced, the present invention was achieved by discovering a new and efficient replacement plating method.
In short, the present invention uses a high-pressure pump to apply a jet-like jet flow of displacement plating liquid from a nozzle to a wire material running in a floating state when the impact pressure per unit area is 0.05 Kg/cm 2 or more. It is intended to be sprayed on a target and not to be plated. The present invention will be explained in detail below based on examples. As mentioned above, in the method of the present invention, for a wire material (hereinafter referred to as wire) running in space at a predetermined speed,
The plating liquid supplied under pressure by a high-pressure pump or the like is sprayed continuously at high speed through a nozzle, and as a result, the liquid that has completed the substitution reaction is not stagnated around the wire, but is blown away by a high-speed jet or a jet jet. In addition, the cleaning and replacement of the deep concave portions of the wire surface is performed with shockingly fresh plating liquid. The cleaning and replacement effect is very large, and plating with good adhesion is completed instantly. In this regard, in the conventional immersion-type displacement plating method, for example, in the case of relatively inexpensive copper sulfate bath displacement plating applied to welding wire, the precipitated plating layer tends to be relatively coarse crystal grains, and the plating does not adhere tightly. Due to its inferior properties, there were problems in practical use. For this reason, attempts have been made for a long time to add various organic compounds such as gelatin, thiourea, phenols, and amino acids to make the precipitate particles denser, but concentration control is complicated and no definitive solution has been achieved. was not obtained. In contrast, the present invention succeeded in making the precipitate particles denser and improving the adhesion of plating by bringing the displacement plating liquid into contact with the wire at high speed and impact using the above plating liquid injection method. It is something. Furthermore, when performing displacement plating, it is desirable that the plating solution concentration is higher because the plating efficiency improves, but it is known that the higher the concentration, the more the adhesion tends to deteriorate. Taking copper substitution plating as an example, since the reduction rate of Cu 2+ is extremely high, the rate of iron eluting at the same time is also extremely high, and the resulting high concentration of Fe ++ diffuses into the solution. The precipitate (FeSO 4 ,
This is because the metal becomes Fe 2 O 3 ) and becomes trapped inside the copper, and the metal, including such precipitates, has a very rough structure, cannot form a strong bond with the underlying iron, and is easily peeled off. (“Metal surface technology”)
(See Vol. 26, No. 12 (1975), p. 595). However, according to the present invention, since the above-mentioned tendency is alleviated, the applicable concentration range can be expanded more than before, and the plating efficiency is also improved. Next, the process conditions of the method of the present invention will be specifically explained using displacement copper plating as an example. FIG. 1 shows an example of a displacement plating device used in carrying out the present invention, in which 1 is a wire running at an appropriate speed;
Reference numeral 10 denotes a nozzle for injecting a displacement plating liquid onto the wire, and one or more nozzles are arranged in the running direction of the running wire 1, and one or two or more nozzles are arranged at a predetermined angle in the radial direction. There is. 11 is a high pressure (for example, 0.5Kg/cm 2 or more) applied through a pipe 11' so that the plating liquid sprayed from the nozzle 10 collides with the wire surface with a necessary impact pressure of 0.05Kg/cm 2 or more.
This is a pump that supplies the plating liquid at a rate of at least 2 cm2), and circulates the plating liquid 8 that is normally stored in the lower part of the processing tank 5. In addition, 12 is a nozzle for washing or washing arranged in the washing tank 6, and a pump 13
water is sprayed onto the wire 1 immediately after plating. The direction of injection from the nozzle 10 is that of the running wire 1
Various aspects are possible depending on the running direction of the
The angle θ of the injection direction with respect to the wire running direction is 0°≦
It can be arbitrarily determined at θ≦180° (Fig. 2),
When 90°<θ≦180°, it can be said to be forward direction (same direction nozzle method), and when 0°≦θ<90°, it can be said to be reverse direction (counterflow nozzle method). It can be said that times are intersecting directions. In order to apply an effective impact force to the wire surface with the plating liquid, it is best to use the perpendicular direction (θ = 90°), and the relative speed can be increased by using a counterflow nozzle method that sprays the plating liquid in the opposite direction to the wire running direction. Therefore, the angle θ may be appropriately selected depending on the wire properties, feeding method, etc. It goes without saying that in the forward direction, the fuel is injected with a relative speed difference from the wire traveling speed. In addition, the nozzle is set at 1° in the wire running direction depending on the plating conditions such as the wire running speed and the predetermined plating thickness.
One or two or more can be appropriately selected and arranged in the wire radial direction. When arranging a plurality of nozzles in the radial direction of the wire, the nozzles can be selected in various directions such as two or three directions relative to the wire diameter, taking into consideration the cross-sectional shape of the wire. When there are two nozzles, the angle δ formed by each direction is approximately δ = 180° (the third
(Figure 4), when there are three pieces, approximately δ 1 , δ 2 , δ 3 = 120° (Figure 4)
It is desirable to arrange the wires so that they form the same or substantially the same angle as shown in FIG. 4, so that the plating liquid can efficiently hit the entire surface of the wire as shown in FIG. In addition, regarding the wire running method, the above example shows a case where the wire runs straight, but the seventh
As shown in Figures a and b, in the case of a method in which a plurality of turn rollers 14 are arranged in the plating tank 5 to change the direction of the wire 1 multiple times, the plating liquid is sprayed onto the front and back surfaces of the wire. Multiple nozzles 1
In this case, the length of the plating tank 5 can be reduced. Furthermore, as shown in FIG. 8, it is also possible to run the wire 1 in a spiral pattern and inject the plating liquid from the nozzle 10 at the top, bottom, etc. of the spiral trajectory. The processing length in the direction of movement can be reduced. Note that the nozzle shown in the above nozzle wiring mode is an example in which the nozzle is placed on the outside of the running wire, and can be called a jet nozzle system. method is also possible. That is, as shown in FIG. 5, a pipe-shaped nozzle 10'
By passing the wire 1 through the center of the wire and increasing the relative speed by injecting the plating liquid 8 in the opposite direction (counterflow) to the running direction of the wire, it is possible to prevent the accumulation of iron ions and to always maintain a fresh plating liquid. This is a supply method. In addition, if one or more nozzles are provided so that the plating liquid is sprayed in the same direction as the wire running direction (forward flow), the spraying direction will be in the forward direction, so there will be a difference in speed relative to the wire running speed. It is best to inject it. In the case of a forward direction nozzle arrangement of such a nozzle center wire traveling method or in the case of a counterflow nozzle arrangement, the effect is smaller than that of the jet nozzle method. This is because the plating liquid injected from the nozzle forms a laminar flow that is almost parallel to the wire surface, so the agitation of the plating liquid is poor, activation of the wire surface and ion diffusion of the plating liquid are small, and it is not as effective as the jet nozzle method. Although it is difficult to obtain sufficient effects,
It is much superior to the conventional immersion plating method. In the case of the above-mentioned nozzle-centered wire traveling method, a pair of pipe-shaped nozzles 10' are arranged symmetrically opposite each other as shown in FIG. 6 in relation to the jetting direction of the plating liquid and the number of nozzles. A modified method is possible in which the wire 1 is run and the plating liquid 8 is sprayed in intersecting directions. In this case, the plating liquid is injected at high speed from each nozzle, and a completely turbulent flow (turbulent region 16) occurs at the part where the laminar region 15 of the opposing flow (downstream nozzle) and forward flow (upstream nozzle) collide, and the wire An instantaneous exchange of plating liquid is achieved over the entire circumference of the surface. As the ejected flows in both directions collide in this manner, the impact force activates the wire surface, and the generated turbulence increases the ion diffusion of the plating solution, resulting in high-speed and efficient plating. However, in the case of the nozzle-centered wire running system, it is necessary to provide a gap in the nozzle for the wire to pass through smoothly. is likely to intervene, so compared to the jet nozzle method, the plating efficiency tends to be lower than that of the jet nozzle method, or the plating efficiency tends to decrease due to oxidation of the wire base and deterioration of the plating solution. Since the wire runs in a narrow gap, the precipitated metal copper may grow on the nozzle end and cause flaws in the wire, so this point must be kept in mind. Furthermore, depending on the state of the nozzle arrangement, the injected plating liquid may reach a long distance and turn into mist, which may worsen the environment. Next, regarding the impact pressure of the plating liquid on the wire in each injection mode of the present invention, the higher the impact pressure is, the better, in order to achieve each effect of the above-mentioned injection, and 0.05
A value of Kg/ cm2 or higher is desirable. The higher the impact pressure, the better the plating adhesion. Depending on this impact pressure, the supply pressure, flow rate, etc. of the plating liquid by the pump are determined. Furthermore, when the present invention is applied to displacement copper plating such as welding wire, preferably CuSO 4 .5H 2 O is
A plating liquid having a specific gravity of <1.8 and a specific gravity of <1.8 is appropriately selected. This is because if the amount of CuSO 4 .5H 2 O is less than 5 g/l, the plating precipitation rate is too slow, and if the specific gravity is 1.8 or more, there is a risk of reprecipitation of dissolved salts. (Example) Next, an example of the present invention will be shown. Note that it goes without saying that the present invention is not limited only to this example. Example 1 In order to clarify the difference between the method of the present invention and the conventional method regarding displacement copper plating, displacement plating was carried out using the experimental method and conditions shown below. Note that the plating pre-treatment and post-plating treatment before and after plating were performed under the same conditions. The apparatus used in the experiment had the conventional apparatus configuration shown in FIG. 15, and a conventional immersion plating method (conventional method) was first performed. Thereafter, after draining the plating liquid from the plating bath 5 shown in the same figure, the nozzle 10' shown in FIG.
The nozzle center wire traveling method (method 1 of the present invention) was used as an example, and instead of the nozzle shown in FIG. Another example of the method of the present invention, the jet nozzle method (method 2 of the present invention), was carried out using a high-pressure pump. The experimental setting conditions for the conventional method and methods 1 and 2 of the present invention are shown in the following table.

【表】 (注) * メツキ液中に浸漬している長さ
** 噴射メツキ液のワイヤ方向長さ
供試被メツキワイヤはJISYCWに該当する2.0
mmφの鋼ワイヤを用い、供試メツキ液は比重1.5
の硫酸銅メツキ液を用いた。メツキ所要時間は上
記メツキ液接触長さlに実質的に接触している時
間(実質メツキ有効時間)とし、ワイヤ線速(3
〜250m/min)をLとするとき、 l/Lで計算し、ワイヤ走行速度を変えることに
よつて種々設定した。 以上の条件で従来法及び本発明法1、2を実施
し、メツキ所要時間を変更したときに得られたメ
ツキワイヤについてメツキ厚みを測定し、また各
メツキ測定サンプルについてメツキ密着性を測定
した。その結果を第2表、第9図及び第10図に
示す。なお、メツキ密着性の評価は、サンプルワ
イヤを第11図に示すように自径巻きにし、巻き
付けたワイヤの表面のメツキ剥離状況を倍率20倍
程度に拡大して観察し、以下の剥離程度に応じた
判定レベルで評価した。 (判定レベル) ×× 視野中の15%超で剥離が発生 × 〃 8% 〃 △ 〃 4% 〃 〇 剥離の痕跡が認められる ◎ 無欠陥
[Table] (Note) * Length immersed in the plating liquid ** Length of the sprayed plating liquid in the wire direction The test wire to be plated is 2.0 which corresponds to JISYCW.
A steel wire of mmφ was used, and the plating liquid used had a specific gravity of 1.5.
Copper sulfate plating solution was used. The required plating time is the time during which the plating liquid is in contact with the above-mentioned plating liquid contact length l (substantially effective plating time), and the wire line speed (3
~250m/min) was calculated in l/L, and various settings were made by changing the wire running speed. The conventional method and methods 1 and 2 of the present invention were carried out under the above conditions, and the plating thickness was measured for the plating wire obtained when the plating time was changed, and the plating adhesion was measured for each plating measurement sample. The results are shown in Table 2, FIGS. 9 and 10. The plating adhesion was evaluated by winding the sample wire around its own radius as shown in Figure 11, and observing the peeling of the plating on the surface of the wound wire at a magnification of about 20 times. Evaluation was made at the appropriate judgment level. (Judgment level) ×× Peeling occurs in more than 15% of the visual field × 〃 8% 〃 △ 〃 4% 〃 〇 Traces of peeling are observed ◎ No defects

【表】【table】

【表】 第2表及び第9図より明らかなとうり、本発明
法1、2のいずれも所定のメツキ厚みを得るのに
要するメツキ所要時間が従来法よりも短かくてメ
ツキ効率がよく、特に本発明法2(ジエツトノズ
ル方式)は優れており、短時間内で厚くメツキす
ることができる。またメツキ密着性も本発明法の
いずれも優れており、特に本発明法2は相当のメ
ツキ厚みまで密着性の良好なメツキが可能であ
る。従来法の浸漬メツキ方式でもメツキ厚みが
0.1〜0.2μmならば密着性のよいものが得られる
が、このような薄メツキでは耐錆性が劣るので望
ましくない。またメツキは化学反応であるために
メツキスピードに自ずと制約があるが、太径のワ
イヤにメツキした後に伸線すると一般的に全体の
ラインスピードを上げることができる。例えば、
4.0〜8.0mmφの太径でメツキする場合、伸線によ
つてメツキ層が薄くなることを考慮すると、仕上
げ径が1.0〜2.0mmφであるときはメツキ厚みを約
2〜3μmにしておく必要がある。このような場
合、本発明法2は非常に有利である。なお、本発
明法2の場合、メツキ厚みが2.4μmを超える近傍
よりメツキ密着性が良好とは云えなくなつている
が、このメツキ厚み以下ならば実質メツキ有効時
間が4秒以下と極めて短時間で、能率的にメツキ
が可能であり、更にノズルの形状配置、メツキ液
の噴射圧、吐出流量等々を変更すれば一層厚くメ
ツキすることが可能である。 実施例 2 本発明法の場合、既述の如く、ワイヤへのメツ
キ液の衝撃圧力はメツキ密着性の向上の点から高
いほど好ましいことである。そのため、衝撃圧力
とメツキ密着性の関係を調べるべく以下の実験を
行つた。 第12図に示すように、ワイヤ表面から垂直距
離aだけ離れて配置したノズルからスプレー開き
角αでメツキ液を噴射した場合、スプレー中心線
のワイヤに対する傾き角をθ(0<θ<90゜)、ス
プレー中心線の衝撃圧力をf、ノズルからワイヤ
表面までの垂直距離a上の仮想平面におけるスプ
レー断面積をA(cm2)とすると、単位面積衝撃圧
力F(Kg/cm2)は、 F=fy/A=f sinθ/A となり、所定噴射圧力をP(Kg/cm2)、流量をQ
(m3/sec)とすると、次式のように表わすことが
できる。 F=45.176CvCeQ√γ√Psinθ/A ここで、Cυ:大気中の流速減退係数 Ce:スプレー形状による衝撃減退係数 γ:単位体積の流体の質量(Kg/m3) なお、Cυ及びCeは実験による検定で求められ
るが、一例を示すと、Cυはθ=90゜のときのノズ
ルからワイヤ表面までの垂直距離aによつて変化
し、次表のようになり、ノズルから噴射されたメ
ツキ液は空気抵抗により流速が低下する。
[Table] As is clear from Table 2 and Figure 9, both methods 1 and 2 of the present invention have a shorter plating time and better plating efficiency than the conventional method to obtain a predetermined plating thickness. In particular, method 2 of the present invention (jet nozzle method) is excellent and allows thick plating to be achieved within a short period of time. In addition, all of the methods of the present invention have excellent plating adhesion, and in particular, method 2 of the present invention allows plating with good adhesion up to a considerable plating thickness. Even with the conventional immersion plating method, the plating thickness is
If it is 0.1 to 0.2 μm, good adhesion can be obtained, but such thin plating is not desirable because it has poor rust resistance. Furthermore, since plating is a chemical reaction, the plating speed is naturally limited, but if a large diameter wire is plated and then drawn, the overall line speed can generally be increased. for example,
When plating with a large diameter of 4.0 to 8.0 mmφ, considering that the plating layer becomes thinner due to wire drawing, if the finished diameter is 1.0 to 2.0 mmφ, the plating thickness should be approximately 2 to 3 μm. be. In such cases, method 2 of the present invention is very advantageous. In the case of method 2 of the present invention, the plating adhesion cannot be said to be good as the plating thickness exceeds 2.4 μm, but if the plating thickness is less than this, the effective plating time is extremely short, 4 seconds or less. This enables efficient plating, and further thicker plating can be achieved by changing the shape and arrangement of the nozzle, the injection pressure of the plating liquid, the discharge flow rate, etc. Example 2 In the case of the method of the present invention, as described above, it is preferable that the impact pressure of the plating liquid on the wire be as high as possible from the viewpoint of improving plating adhesion. Therefore, the following experiment was conducted to investigate the relationship between impact pressure and plating adhesion. As shown in Fig. 12, when plating liquid is injected at a spray opening angle α from a nozzle placed a vertical distance a from the wire surface, the inclination angle of the spray center line with respect to the wire is θ (0 < θ < 90°). ), the impact pressure on the spray center line is f, and the spray cross-sectional area in the virtual plane on the vertical distance a from the nozzle to the wire surface is A (cm 2 ), then the unit area impact pressure F (Kg/cm 2 ) is: F=fy/A=f sinθ/A, the predetermined injection pressure is P (Kg/cm 2 ), and the flow rate is Q.
(m 3 /sec), it can be expressed as follows. F=45.176CvCeQ√γ√Psinθ/A Where, Cυ: Flow velocity reduction coefficient in the atmosphere Ce: Impact reduction coefficient due to spray shape γ: Mass of unit volume of fluid (Kg/m 3 ) Note that Cυ and Ce are experimental As an example, Cυ changes depending on the vertical distance a from the nozzle to the wire surface when θ = 90°, as shown in the following table, and the plating liquid sprayed from the nozzle The flow velocity decreases due to air resistance.

【表】 また、Ceはスプレー断面形状とスプレー開き
角αにより決定される衝撃力の減退係数で、一例
を示すと次表に示す関係にある。
[Table] In addition, Ce is the impact force attenuation coefficient determined by the spray cross-sectional shape and the spray opening angle α, and an example of the relationship is shown in the following table.

【表】 さて、上記式において、実施例1の本発明法2
に用いたノズル1ケ当り、a=3.5cm、α=100゜、
θ=90゜、A=8cm×0.5cm=4cm2となるように設
定し、ワイヤ走行速度を一定にし、第5表に示す
如く噴射圧力及び流量を変更して単位面積衝撃圧
力Fを種々設定し、置換銅メツキを実施した。な
お、大気中の流速減退係数Cυについてはノズル
からワイヤ表面までの垂直距離a=3.5cmよりCυ
=1とし、またスプレー形状による衝撃力減退係
数Ceについてはフラツトスプレーでスプレー開
き角α=100゜よりCe=0.87とした。
[Table] Now, in the above formula, the present invention method 2 of Example 1
per nozzle used, a=3.5cm, α=100°,
Set θ = 90°, A = 8 cm x 0.5 cm = 4 cm 2 , keep the wire running speed constant, and vary the unit area impact pressure F by changing the injection pressure and flow rate as shown in Table 5. Then, substitution copper plating was carried out. In addition, the flow velocity attenuation coefficient Cυ in the atmosphere is calculated from the vertical distance a = 3.5 cm from the nozzle to the wire surface.
= 1, and the impact force attenuation coefficient Ce due to the spray shape was set to Ce = 0.87 based on the spray opening angle α = 100° for flat spray.

【表】 本例で得られた各メツキワイヤサンプルについ
てメツキ密着性を調べた。その際、前述の第10
図からも明らかなように、メツキ厚みが厚くなる
ほどメツキ密着性が劣化する。そこで単位面積衝
撃圧力Fとメツキ密着性との関係をより明確にす
るため、メツキ厚みが厚い側で試験を行つた。第
13図はメツキ厚みが2.4μmとなる条件で試験し
た結果を示している。評価基準は第10図の場合
と同じである。第13図において、メツキ厚みが
2.4μmと非常に厚い場合でも、単位面積衝撃圧力
Fが0.05Kg/cm2のときはメツキ密着性が良好とは
いえないものの、Fをこれよりも大きくするほど
メツキ密着性を向上できることがわかる。衝撃圧
力Fがこの値未満であると、メツキは付着してい
るものの剥離し易く、例えば、溶接用ワイヤの場
合、ワイヤ送給時にメツキが剥離して通電チツプ
内に削粉が溜まり、送給抵抗が増加すると共に通
電性が劣化し、実用上問題が生ずる。またビード
ワイヤの場合、タイヤの振動などによりゴムとワ
イヤが剥離し易くなり、ゴムによつて遮断されて
いた水分などの腐食因子がワイヤに接触するよう
になり、ワイヤが錆びて耐久性を劣化させるので
望ましくない。なお、F=0Kg/cm2と仮定した場
合は従来の浸漬メツキ状態と同じ条件になり、第
10図中の従来法に示すとおり、このような厚い
メツキ厚み(2.4μm)は時間をかけても得ること
が困難であり(第9図参照)、しかもメツキ密着
性が劣る。 以上の実施例からも明らかなとうり、本発明に
おいては、必要なメツキは瞬時に完了し、メツキ
密着性の優れたワイヤを得ることが可能となる
が、メツキ後にメツキ液がワイヤ周辺に滞留する
と不要なメタル銅が成長するので、これを防止す
るためには、工程可能な限りメツキ後に、時間的
にはメツキ直後に液切り或いは洗浄することが好
ましく、特に溶接用ワイヤにおいては要求される
密着性の良好なメツキが得られる。そのための一
例を示すならば、第1図に示したジエツトノズル
方式の場合、メツキ槽5の出口側に洗浄槽6を設
け、該槽内に同様のノズル10′を1個乃至2個
以上配置して、ワイヤ性状に適合した圧力、流量
等でジエツト水洗することにより、メツキ完了直
後にワイヤ洗浄を行えば、不要なメタル銅の成長
を防止することができる。なお、実験では最後メ
ツキ液吹き付け後、3秒以内に水洗すれば所定の
メツキ密着性が得られることが確認されている。 なお、以下の付加的条件について実験したとこ
ろ、そのような範囲であれば同様の効果が得られ
ることが確認された。 すなわち、メツキ液には、薬品、ワイヤ、工業
用水、装置材料等々からの各種の不純物が含まれ
得るが、それら不純物量を5g/以下にするの
が望ましい。薬品(CuSO4、FeSO4、H2SO4)か
らの不純物としてはNi、Pb、Zn、As、Mn、
Ti、Se、Hg及び各種のリン酸塩、硝酸塩、アン
モニウム化合物、硫酸塩、窒素化合物などがあ
る。ワイヤからの不純物としてはワイヤ化学成分
のMn、Si、Al、Ti、Cr、Ni及び油脂類などの
表面付着物がある。工業用水からの不純物として
はCa、Mg、Na、K、Fe、Mnなどのケイ酸塩、
硫酸塩、塩化物、炭酸塩、炭酸水素塩及び硝酸塩
並びにAlのケイ酸塩、硫酸塩、塩化物及び硝酸
塩等の無機化合物、或いはO2、CO2、N2等のガ
スがある。装置材料からの不純物としては装置材
料であるステンレス鋼、樹脂、ゴム等から溶解し
てくるものがある。 また、メツキ液中のFe3+は50g/以下が望ま
しい。この値を超えるとメツキの密着性が悪くな
る傾向にあり、酸化防止用の雰囲気を流す等によ
り上記値にコントロールすればよい。Fe3+の分
析法はJIS M 8853O−フエナントロリン吸光光
度法による。 メツキ液の比重は1.05〜1.35(20℃)、粘度は
1.30〜3.50cp(20℃)、PHは1.5以下(20℃)が望ま
しい。 更にまた、ワイヤとしては、引張強さ(TS)
が30〜300Kgf/mm2のもの、或いはメツキ前ワイ
ヤの脱炭深さ、粒界酸化深さが共に0.50mm以下の
ものに対して適用しても同様の効果が得られる。 また、スプレー部長さl(スプレーの液が直接
当るワイヤ長さ)と非スプレー部長さL(スプレ
ーは直接当らないが液が付着又は浸漬状態にある
ワイヤ長さ)が次式 0.005≦l/L+l≦1 を満たす関係にあるのが望ましい。なお、メツキ
量と線速の関係でL+lはいくらでも長くするこ
とができるが、L+l≦200mであれば同様の効
果が得られる。 また、上記説明では主として溶接用ワイヤにつ
き置換銅メツキの場合を例にとつたが、置換銅メ
ツキに限らず、置換スズメツキや硫酸銅と硫酸ス
ズの両方を含むような2種以上の金属を析出する
場合も同様の効果が得られる。また、溶接用ワイ
ヤとしてもソリツドワイヤのみならず、フラツク
ス入りワイヤであつてもよいことは云うまでもな
く、更に溶接用ワイヤに限らず、ビードワイヤ或
いはカツパーコートワイヤを使用する家具用スプ
リング、ダンボール止め金等々の様々な用途の線
条材に適用できることは云うまでもなく、したが
つて、様々な形状(円形、帯状、角状等や、ワイ
ヤの他、フープ、パイプ等)、寸法(0.2〜6.4mm
φ)、材質の線条材に対しても適用できる。材質
の一例としては、JIS Z 3312(軟鋼及び高張力
鋼マグ溶接用ソリツドワイヤ)、3351(炭素鋼及び
低合金鋼用サブマージアーク溶接用ワイヤ)、
3316(軟鋼及び低合金鋼のテイグ溶接用鋼棒及び
ワイヤ)、3317(モリブデン鋼及びクロムモリブデ
ン鋼用マグ溶接ソリツドワイヤ)、JIS G 3502
(ピアノ線材)、3505(軟鋼線材)、3506(硬鋼線材)
などが挙げられる。 (発明の効果) 以上詳述したように、本発明によれば、走行す
る線条材に吹き付けるメツキ液の高速噴流乃至ジ
エツトの圧力によつて全面的、瞬間的に置換メツ
キを行い、密着性が優れ均一な膜厚のメツキが短
時間で得られるので、従来の浸漬メツキのような
長大な走備が不要となり、必要以上のメツキ液を
使わず、高速化ができて経済的である。特に
0.2μm以上の膜厚のメツキの場合に上記効果が顕
著である。就中、メツキ液のジエツト噴流をワイ
ヤ走行方向に交叉する方向で吹き付ける方式によ
れば、メツキ液のない空間でワイヤを走行させる
ので作業能率が飛躍的に向上し、作業環境もよい
ので維持、管理が容易である。本発明は特に溶接
用ワイヤをはじめとしてビードワイヤ等々の線条
材の置換銅メツキ等に好適である。
[Table] Each plating wire sample obtained in this example was examined for plating adhesion. In that case, the above-mentioned 10th
As is clear from the figure, the thicker the plating, the worse the plating adhesion. Therefore, in order to clarify the relationship between unit area impact pressure F and plating adhesion, a test was conducted on the side where the plating thickness was thicker. FIG. 13 shows the results of a test under the condition that the plating thickness was 2.4 μm. The evaluation criteria are the same as in the case of FIG. In Figure 13, the plating thickness is
It can be seen that even when the thickness is as large as 2.4 μm, the plating adhesion is not good when the unit area impact pressure F is 0.05 Kg/cm 2 , but the plating adhesion can be improved as F becomes larger than this. . If the impact pressure F is less than this value, the plating is likely to peel off even though it is attached. For example, in the case of welding wire, the plating will peel off when the wire is fed, and shavings will accumulate inside the current-carrying tip, causing the wire to be fed. As the resistance increases, the conductivity deteriorates, causing practical problems. In addition, in the case of bead wire, the rubber and wire tend to separate due to tire vibrations, etc., and corrosive factors such as moisture that are blocked by the rubber come into contact with the wire, causing the wire to rust and deteriorate its durability. Therefore, it is undesirable. If we assume that F = 0 Kg/cm 2 , the conditions will be the same as in the conventional immersion plating state, and as shown in the conventional method in Figure 10, such a thick plating thickness (2.4 μm) will increase over time. It is also difficult to obtain the same (see Fig. 9), and the plating adhesion is poor. As is clear from the above examples, in the present invention, the necessary plating can be completed instantly and it is possible to obtain a wire with excellent plating adhesion, but the plating liquid remains around the wire after plating. This will cause unnecessary metal copper to grow, so in order to prevent this, it is preferable to drain or clean the metal after plating as much as possible during the process, and immediately after plating, which is especially required for welding wire. A plating with good adhesion can be obtained. To give an example of this, in the case of the jet nozzle method shown in FIG. 1, a cleaning tank 6 is provided on the outlet side of the plating tank 5, and one or more similar nozzles 10' are arranged in the tank. If the wire is washed with jet water at a pressure, flow rate, etc. appropriate to the properties of the wire, and the wire is washed immediately after plating is completed, unnecessary growth of metal copper can be prevented. In addition, it has been confirmed in experiments that a predetermined plating adhesion can be obtained by washing with water within 3 seconds after spraying the final plating solution. In addition, when experiments were conducted under the following additional conditions, it was confirmed that similar effects could be obtained within such ranges. That is, the plating solution may contain various impurities from chemicals, wires, industrial water, equipment materials, etc., but it is desirable that the amount of these impurities be 5 g/or less. Impurities from chemicals (CuSO 4 , FeSO 4 , H 2 SO 4 ) include Ni, Pb, Zn, As, Mn,
These include Ti, Se, Hg, and various phosphates, nitrates, ammonium compounds, sulfates, and nitrogen compounds. Impurities from the wire include wire chemical components Mn, Si, Al, Ti, Cr, Ni, and surface deposits such as oils and fats. Impurities from industrial water include silicates such as Ca, Mg, Na, K, Fe, and Mn;
Inorganic compounds such as sulfates, chlorides, carbonates, bicarbonates and nitrates, silicates, sulfates, chlorides and nitrates of Al, or gases such as O2 , CO2 , N2 . Impurities from equipment materials include those dissolved from equipment materials such as stainless steel, resin, and rubber. Further, the Fe 3+ content in the plating solution is preferably 50 g/or less. If this value is exceeded, the adhesion of plating tends to deteriorate, and it may be controlled to the above value by, for example, flowing an atmosphere for preventing oxidation. The Fe 3+ analysis method is based on JIS M 8853O-phenanthroline absorption spectrophotometry. The specific gravity of the plating liquid is 1.05 to 1.35 (20℃), and the viscosity is
1.30-3.50cp (20℃), PH is preferably 1.5 or less (20℃). Furthermore, as a wire, the tensile strength (TS)
Similar effects can be obtained even when applied to wires with a decarburization depth of 30 to 300 Kgf/mm 2 or wires before plating where both the depth of decarburization and the depth of grain boundary oxidation are 0.50 mm or less. In addition, the length of the spray part L (the length of the wire that is directly hit by the spray liquid) and the length of the non-spray part L (the length of the wire that is not directly hit by the spray but is attached or immersed in the liquid) is calculated by the following formula: 0.005≦l/L+l It is desirable that the relationship satisfies ≦1. Note that L+l can be made as long as desired depending on the relationship between the amount of plating and the linear speed, but the same effect can be obtained as long as L+l≦200 m. In addition, although the above explanation mainly takes the case of displacement copper plating for welding wire as an example, it is not limited to displacement copper plating. A similar effect can be obtained if Furthermore, it goes without saying that welding wires may be not only solid wires but also flux-cored wires.Furthermore, welding wires are not limited to welding wires, but also furniture springs and cardboard fasteners that use bead wires or cutper coated wires. Needless to say, it can be applied to wire materials for various purposes such as gold, etc., and therefore, it can be applied to various shapes (circular, band-shaped, square, etc., as well as wire, hoop, pipe, etc.) and dimensions (0.2~ 6.4mm
φ), it can also be applied to wire material. Examples of materials include JIS Z 3312 (solid wire for mag welding of mild steel and high-strength steel), 3351 (wire for submerged arc welding of carbon steel and low alloy steel),
3316 (steel rods and wires for Teig welding of mild steel and low alloy steel), 3317 (solid wire for MAG welding of molybdenum steel and chromium molybdenum steel), JIS G 3502
(piano wire), 3505 (mild steel wire), 3506 (hard steel wire)
Examples include. (Effects of the Invention) As described in detail above, according to the present invention, displacement plating is performed instantly on the entire surface using the high-speed jet of plating liquid sprayed onto the running wire material or the pressure of the jet, thereby improving the adhesion. Since plating with excellent film thickness and uniform thickness can be obtained in a short time, there is no need for a long run like in conventional immersion plating, and it is economical because it can speed up the process without using more plating solution than necessary. especially
The above effect is remarkable in the case of plating with a film thickness of 0.2 μm or more. In particular, according to the method of spraying a jet jet of plating liquid in a direction that intersects with the direction in which the wire runs, the wire is run in a space where there is no plating liquid, which dramatically improves work efficiency, and the work environment is also good, so it is easy to maintain. Easy to manage. The present invention is particularly suitable for displacement copper plating of wire materials such as welding wires and bead wires.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一態様であるジエツトノズル
方式を実施するためのメツキ装置の一例を示す説
明図、第2図はノズルよりの噴射方向とワイヤ走
行方向のなす角θを示す説明図、第3図及び第4
図はノズルが2個又は3個の場合の噴射方向のな
す角δを示す説明図、第5図及び第6図は本発明
の一態様であるノズル中心ワイヤ走行方式のため
のノズル及びその配置を示す説明図、第7図a,
bはターンローラを用いたワイヤ走行の場合のノ
ズル配置例を示す図で、aは平面図、bは側面図
であり、第8図はワイヤを螺旋状に走行させる場
合のノズル配置例を示す説明図、第9図及び第1
0図は本発明法1(ノズル中心ワイヤ走行方式)
及び本発明法2(ジエツトノズル方式)と従来法
(浸漬メツキ方式)とにおけるメツキ時間とメツ
キ厚み、メツキ密着性の関係を示す図、第11図
はメツキ密着性判定に用いたワイヤ巻き状態を示
す説明図、第12図a,bは本発明におけるメツ
キ液噴射の衝撃圧力の求め方を説明する図で、a
は側面図、bは平面図であり、第13図は本発明
における単位面積衝撃圧力とメツキ密着性の関係
を示す図、第14図乃至第16図は従来のメツキ
方式を説明する図で、第14図は電気メツキの場
合、第15図は浸漬メツキの場合、第16図はワ
イヤ周辺の液状態を示している。 1…線条材(ワイヤ)、5…メツキ槽、6…水
洗槽、8…メツキ液、10…ジエツトノズル、1
0′…パイプ状ノズル、11,13…ポンプ、1
1′…パイプ、12…水洗用ジエツトノズル、1
4…ターンローラ、15…層流域、16…乱流
域。
FIG. 1 is an explanatory diagram showing an example of a plating device for implementing the jet nozzle method which is one aspect of the present invention, FIG. 2 is an explanatory diagram showing the angle θ between the jetting direction from the nozzle and the wire running direction, Figures 3 and 4
The figure is an explanatory diagram showing the angle δ formed by the injection direction when there are two or three nozzles, and Figures 5 and 6 are nozzles and their arrangement for the nozzle center wire running system, which is an embodiment of the present invention. An explanatory diagram showing FIG. 7a,
b is a diagram showing an example of nozzle arrangement when the wire is run using turn rollers, a is a plan view, b is a side view, and FIG. 8 is a diagram showing an example of nozzle arrangement when the wire is run in a spiral shape. Explanatory diagram, Figure 9 and 1st
Figure 0 shows the invention method 1 (nozzle center wire running method)
Figure 11 shows the relationship between plating time, plating thickness, and plating adhesion between method 2 of the present invention (jet nozzle method) and conventional method (immersion plating method), and Fig. 11 shows the wire winding state used for determining plating adhesion. Explanatory diagrams, Figures 12a and 12b are diagrams illustrating how to determine the impact pressure of plating liquid injection in the present invention.
is a side view, b is a plan view, FIG. 13 is a diagram showing the relationship between unit area impact pressure and plating adhesion in the present invention, and FIGS. 14 to 16 are diagrams explaining the conventional plating method, FIG. 14 shows the case of electroplating, FIG. 15 shows the case of immersion plating, and FIG. 16 shows the state of the liquid around the wire. DESCRIPTION OF SYMBOLS 1... Line material (wire), 5... Plating tank, 6... Washing tank, 8... Plating liquid, 10... Jet nozzle, 1
0'... Pipe-shaped nozzle, 11, 13... Pump, 1
1'...pipe, 12...jet nozzle for water washing, 1
4... Turn roller, 15... Laminar region, 16... Turbulent region.

Claims (1)

【特許請求の範囲】 1 浮遊状態で走行する線条材に対し、高圧ポン
プを使用してノズルより、所定の置換メツキ液
を、単位面積当りの衝撃圧力が0.05Kg/cm2以上で
衝撃的に噴射させることを特徴とする線条材表面
処理方法。 2 前記噴射は線条材の走行方向に交叉する方向
に行う特許請求の範囲第1項記載の方法。 3 前記噴射は線条材の走行方向と噴射方向との
なす角θが0≦θ≦180゜となるように行う特許請
求の範囲第2項記載の方法。 4 前記噴射は線条材径の2方向から行い、か
つ、2方向のなす角がほゞ180゜となるように行う
特許請求の範囲第2項記載の方法。 5 前記噴射は線条材径の3方向から行い、か
つ、3方向のなす角がそれぞれほゞ120゜である特
許請求の範囲第2項記載の方法。 6 前記噴射は線条材の走行方向に対して平行す
る方向に行う特許請求の範囲第1項記載の方法。 7 前記噴射は線条材の走行方向に対して少なく
とも逆方向に行う特許請求の範囲第6項記載の方
法。 8 前記噴射は線条材の走行方向に対し平行する
方向で、かつ、順方向と逆方向の両方向を含む方
向に行う特許請求の範囲第7項記載の方法。 9 前記置換メツキ液は硫酸銅を含むもので、
CuSO4・5H2O>5g/で、比重<1.8である特
許請求の範囲第1項記載の方法。 10 前記線条材は溶接用ワイヤである特許請求
の範囲第1項乃至第9項のいずれかの項に記載の
方法。
[Scope of Claims] 1 A high-pressure pump is used to apply a specified displacement plating liquid from a nozzle to a wire material running in a suspended state at an impact pressure of 0.05 Kg/cm 2 or more per unit area. A method for surface treatment of a wire material, characterized by spraying the surface of the wire material. 2. The method according to claim 1, wherein the injection is performed in a direction intersecting the running direction of the wire material. 3. The method according to claim 2, wherein the injection is performed such that the angle θ between the running direction of the wire material and the injection direction satisfies 0≦θ≦180°. 4. The method according to claim 2, wherein the injection is performed from two directions of the diameter of the wire material, and the injection is performed so that the angle between the two directions is approximately 180 degrees. 5. The method according to claim 2, wherein the injection is performed from three directions of the diameter of the wire material, and the angles formed by the three directions are approximately 120 degrees. 6. The method according to claim 1, wherein the injection is performed in a direction parallel to the running direction of the wire material. 7. The method according to claim 6, wherein the injection is performed at least in a direction opposite to the running direction of the wire material. 8. The method according to claim 7, wherein the injection is performed in a direction parallel to the running direction of the wire material and in a direction including both forward and reverse directions. 9. The displacement plating solution contains copper sulfate,
The method according to claim 1, wherein CuSO 4 .5H 2 O > 5 g/ and specific gravity < 1.8. 10. The method according to any one of claims 1 to 9, wherein the wire material is a welding wire.
JP28492586A 1986-11-29 1986-11-29 Surface treatment of wire material Granted JPS63137175A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP28492586A JPS63137175A (en) 1986-11-29 1986-11-29 Surface treatment of wire material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP28492586A JPS63137175A (en) 1986-11-29 1986-11-29 Surface treatment of wire material

Publications (2)

Publication Number Publication Date
JPS63137175A JPS63137175A (en) 1988-06-09
JPH0542511B2 true JPH0542511B2 (en) 1993-06-28

Family

ID=17684832

Family Applications (1)

Application Number Title Priority Date Filing Date
JP28492586A Granted JPS63137175A (en) 1986-11-29 1986-11-29 Surface treatment of wire material

Country Status (1)

Country Link
JP (1) JPS63137175A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20180119286A1 (en) * 2016-11-01 2018-05-03 Catepillar Inc. Friction burnish for alloy plating

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4896214U (en) * 1972-02-18 1973-11-15
JPS59150079A (en) * 1983-02-16 1984-08-28 Oki Electric Ind Co Ltd Electroless plating method
JPS6038673U (en) * 1983-08-25 1985-03-18 服部 計馬 Guard Lee Chip

Also Published As

Publication number Publication date
JPS63137175A (en) 1988-06-09

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