JPH0547526B2 - - Google Patents
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- Publication number
- JPH0547526B2 JPH0547526B2 JP59075551A JP7555184A JPH0547526B2 JP H0547526 B2 JPH0547526 B2 JP H0547526B2 JP 59075551 A JP59075551 A JP 59075551A JP 7555184 A JP7555184 A JP 7555184A JP H0547526 B2 JPH0547526 B2 JP H0547526B2
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Classifications
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/50—Improvements relating to the production of bulk chemicals
- Y02P20/52—Improvements relating to the production of bulk chemicals using catalysts, e.g. selective catalysts
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- Nitrogen Condensed Heterocyclic Rings (AREA)
- Pyrrole Compounds (AREA)
- Indole Compounds (AREA)
- Pyridine Compounds (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Description
本発明は消炎鎮痛作用を有するプロピオン酸誘
導体等の酢酸誘導体の新規な製法に関する。
さらに詳しくは一般式(1)
(式中、Arは置換もしくは非置換アリール基又
は複素環基を示し、Rは水素もしくはアルキル基
を示し、R′およびR2は同一、もしくは異なつて
よく、アルキル基を示すかまたはR′とR2が一体
となつて環状アセタールを形成してもよい)で表
わされる化合物を
(イ) 塩基物質もしくはアミド類及び
(ロ) 一般式(2)もしくは(3)
XSOX′ (2)
XSO2X′ (3)
(式中、X、X′は同一もしくは異なつてよ
くハロゲン原子又はトリフルオロメチル基を
示す)で表される化合物もしくは
二酸化イオウ及びハロゲン
の存在下に転位反応させることを特徴とする一般
式(4)
(式中、ArおよびRは前記と同義を示し、R3は
水素、アルキル基あるいは置換アルキル基を示
す)で表される酢酸誘導体の製法に関する。
Arにおけるアリール基としては炭素数6〜10
のアリール例えばフエニル、ナフチル等が包含さ
れる。置換アリールの置換基としては炭素数1−
5のアルキル例えばメチル、エチル、プロピル、
ブチル、イソブチル、ペンチル等、置換アルキル
(アルキル部分は前記と同義を示し、置換基とし
てはフエニル、ハロゲン、ヒドロキシル、アミノ
等が例示される)、炭素数1−6のアルコキシ例
えばメトキシ、エトキシ、プロポキシ、ブトキ
シ、フエノキシ、ハロゲン例えば塩素原子、フツ
素原子、臭素原子、アリール基例えばフエニル
基、置換フエニル基(置換基はここで定義される
基)、炭素数1−7のアシル基例えばアセチル、
プロピオニル、フエニルカルボニル等、炭素数2
〜7のアシルオキシ基例えばベンゾイルオキシ、
アセチルオキシ等、アシルオキシ基例えばベンゾ
イルオキシ、アセチルオキシ、ヒドロキシル、ア
ミノ、シクロヘキシル、ニトロ、N,O又はSを
含む複素環基等が包含され、複素環基としては酸
素、硫黄又は窒素を含む5〜6員環もしくはこれ
に前記置換アリールの置換基、前記アリール基あ
るいは他の複素環基が結合した基が包含され、さ
らに下記の如き基(前記定義に含まれる基もある
が代表例として示す)もArに包含される。
(R4は水素又はハロゲン原子を示し、R5はフツ
素又は塩素原子、Acはアセチル基を示す)
等が例示される。R1、R2、Rにおけるアルキル
基としては炭素数1〜5のアルキル基例えば、メ
チル、エチル、プロピル、ブチル、ペンチルが例
示される。置換アルキル基の置換基としてはヒド
ロキシル基等が例示される。
以下において一般式(1)、(2)……で表される化合
物を化合物(1)、(2)……という。
化合物(4)は解熱作用あるいは消炎鎮痛作用を有
するきわめて有用な医薬品として知られている。
〔フアルマシア、Vol.11.No.7、515(1975)、東工
試ニユース(化学工業資料)Vol.13、No.4、85
(1975)〕。又化合物(4)の1部は他の化合物(4)の原
料ともなりうる。又ピレスロイド系化合物(殺虫
剤)の酸部分の原料ともなる。
従来より、化合物(4)の製法としては種々の方法
が知られている。
これらの中、化合物(1)を原料として、化合物(4)
を製造する方法は化合物(1)のヒドロキシル基をト
シル化したのち、たとえば、炭酸カルシウム水溶
液中で加熱処理をして、化合物(4)とする方法が知
られているのみである。〔土橋ら、Tetrahedron
Letters、22 No.43、4305(1981)。〕
容易に合成しうる化合物(1)を原料として、前述
のようにトシル化工程を加えることなく、化合物
(4)を得る方法を研究した結果、工業的にきわめて
有利に製造しうる方法が見い出された。
本発明によれば、化合物(1)を(イ)塩基物質あるい
はアミド類及び(ロ)化合物(2)もしくは(3)又は二
酸化イオウとハロゲンの存在下に転位反応させる
ことによつて高収率で化合物(4)を得ることができ
る。この反応は1、2位の全く新規な転位反応で
ある。
本発明の実施に際しては、有機溶媒に溶解した
化合物(1)に塩基物質あるいはアミド類及び化合物
(2)もしくは(3)又は二酸化イオウ及びハロゲンを加
えて反応させて、化合物(1)の転位反応を行わせ
る。
反応に使用される有機溶媒としては反応に不活
性な溶媒がいずれも用いられるが例えばベンゼ
ン、トルエン等の芳香族炭化水素、メチレンクロ
リド、クロロホルム等のハロゲン化化合物等があ
げられる。
塩基物質としてはピリジン、γ−ピコリン、イ
ミダゾール、トリエチルアミン、ジイソプロピル
アミン、イソプロピルアミン等の芳香族あるいは
脂肪族アミンの第1アミン、第2アミン、第3ア
ミン類さらにt−ブトキシカリウム等のアルコキ
シド類や、酢酸カリウム、安息香酸ナトリウム、
安息香酸カルシウム等の有機酸アルカリ金属塩あ
るいはアルカリ土類金属塩類を例示することがで
きる。さらにナトリウムアミド等の金属アミド類
や塩基性レジンたとえば弱塩基性レジンWA−31
(商品名;ダイヤイオン)等も用いられる。
アミド類としてはジメチルホルムアミド、ジメ
チルアセトアミド、ピロリドンあるいはN−ベン
ジルピロリドン等のアミド類を例示することがで
きる。
これらの塩基物質、アミド類の使用量はその種
類により異なるが化合物(1)に対して少なくとも1
倍モル使用するのが好ましい。またその種類によ
つては溶媒としても使用することができる。これ
らは単独で用いてもよく、また混合物として使用
してもよい。
化合物(2)あるいは化合物(3)としてはチオニルブ
ロマイド、チオニルクロライド、スルフリルクロ
ライド、トリフルオロメタンスルホニルクロライ
ド(ClSO2CF3)等が用いられることができる。
工業的にはチオニルクロライド、やスルフリルク
ロライドが有利に使用される。
ハロゲンとしは塩素、臭素等が用いられ、好ま
しくは化合物(1)に対して1〜3倍モル用いられ
る。
反応は−100〜150℃好ましくは−60〜100℃の
範囲で行われる。この温度範囲において反応時間
は一般に1分から20時間である。とくに、スルフ
リルクロライドを用いたときは反応がすみやかに
進行して、短時間で転位反応が終了する。さらに
活性炭等を共存せしめることによつて反応がスム
ースに進行する。
このようにして得られた反応生成物は常法によ
つて単離、生成される。例えばハロゲン化水素酸
と塩基との塩が不溶性の場合は反応液を濾過し
て、これらを除く。これらの塩が溶解していると
きは、そのまま後処理を行う。後処理は、必要で
あれば反応液を濃縮して、溶媒あるいは過剰のア
ミン類、アミド類を除く。残渣に水を加え、生成
物を有機溶媒、例えばクロロホルムで抽出する。
クロロホルム溶液を濃縮し、残渣をシリカゲルク
ロマトグラフイーで目的物質を分画して、高品質
の化合物(4)を高収率で得ることができる。
以下実施例を示す。
実施例 1
α−ヒドロキシ−p−イソブチルプロピオフエ
ノンジメチルアセタール2.52gをピリジン20mlに
溶解し、氷冷下チオニルクロリド1.43gを加え室
温で2時間撹拌した。溶媒を留去し、残渣にクロ
ロホルム20ml、水20mlを加え、分液した。
有機層を無水硫酸ナトリウムで乾燥後、減圧濃
縮した。油状残留物をシリカゲルクロマトグラフ
イー(n−ヘキサン−酢酸エチル系溶媒で展開)
にて精製して、2−(4−イソブチルフエニル)
プロピオン酸メチル1.62gを得た。(収率72%)
実施例 2
α−ヒドロキシ−p−イソブチルプロピオフエ
ノンジメチルアセタール2.52g、トリエチルアミ
ン2.02gを塩化メチレン50mlに溶解し、−50℃で
塩化スルフリル1.75mlを加え、同温度で3時間撹
拌した。ついで飽和炭酸水素ナトリウム水溶液20
mlを加え、分液した。有機層を無水硫酸ナトリウ
ムで乾燥後、減圧濃縮した。油状残留物を実施例
1と同様の操作で精製して、2−(4−イソブチ
ルフエニル)プロピオン酸メチル1.85gを得た。
(収率84%)
実施例 3
α−ヒドロキシ−p−フエニルプロピオフエノ
ンジメチルアセタール2.72gをピリジン25mlと塩
化メチレン25mlの混合溶媒に溶解し、−50℃で塩
化スルフリル1.75mlを加え、同温度で3時間撹拌
した。以下、実施例1と同様の後処理を行い、2
−(4−ビフエニリル)プロピオン酸メチル2.10
gを得た。(収率87.5%)
実施例 4
α−ヒドロキシ−p−イソブチルプロピオフエ
ノンジメチルアセタール250mgおよびジイソプロ
プルアミン200mgを塩化メチレン4mlに溶解した
溶液に、氷冷下、塩化スルフリル300mgを滴下し
た。同温度で1時間撹拌した後、ガスクロマトグ
ラフイーを用いて定量分析を行つたところ、2−
(4−イソブチルフエニル)プロピオン酸メチル
が81%の生成率で生成していた。
ガスクロマトグラフイー条件
カラム 2%DEGS on Gas Chrom Q
3mmφ 1.5m Glass
カラム温度 100→200℃
注入口温度 200℃
また、試料をN,O−ビス(トリメチルシリ
ル)アセトアミド、ヘキサメチルジシラザン、ト
リメチルシリルクロリドを用いてトリメチルシリ
ル化を行つた後、以下の条件でガスクロマトグラ
フイーによる分析を行つたところ、2−(4−イ
ソブチルフエニル)プロピオン酸が生成してい
た。ガスクロマトグラフイー条件
カラム 2%SE−52 on Chromosolb W
3mmφ 3m Glass
カラム温度 165→260℃
注入口温度 270℃
実施例 5
α−ヒドロキシ−p−イソブチルプロピオフエ
ノンジメチルアセタール250mgをトルエン2mlに
溶解し、酢酸カリウム200mgを加えた。この懸濁
液に氷冷下、塩化スルフリル200mgを滴下し、実
施例4と同様に処理したところ、2−(4−イソ
ブチルフエニル)プロピオン酸メチルが78%の生
成率で生成していた。
実施例 6
表に示される原料、条件で反応させて得られた
結果を表に示す。
The present invention relates to a novel method for producing acetic acid derivatives such as propionic acid derivatives that have anti-inflammatory and analgesic effects. For more details, see general formula (1) (In the formula, Ar represents a substituted or unsubstituted aryl group or a heterocyclic group, R represents hydrogen or an alkyl group, R' and R 2 may be the same or different, and represent an alkyl group or R' R 2 may be combined to form a cyclic acetal) A compound represented by (a) a basic substance or amide and (b) general formula (2) or (3) XSOX′ (2) XSO 2 ' (3) (wherein X and X' are the same or different and often represent a halogen atom or a trifluoromethyl group) or a rearrangement reaction in the presence of sulfur dioxide and a halogen. General formula (4) The present invention relates to a method for producing an acetic acid derivative represented by the formula (wherein Ar and R have the same meanings as defined above, and R 3 represents hydrogen, an alkyl group, or a substituted alkyl group). The aryl group in Ar has 6 to 10 carbon atoms.
aryl such as phenyl, naphthyl, and the like. The substituent of substituted aryl has 1-carbon atoms.
5 alkyl such as methyl, ethyl, propyl,
Butyl, isobutyl, pentyl, etc., substituted alkyl (the alkyl moiety has the same meaning as above, examples of substituents include phenyl, halogen, hydroxyl, amino, etc.), alkoxy having 1 to 6 carbon atoms, such as methoxy, ethoxy, propoxy , butoxy, phenoxy, halogen such as chlorine atom, fluorine atom, bromine atom, aryl group such as phenyl group, substituted phenyl group (substituents are defined herein), acyl group having 1 to 7 carbon atoms such as acetyl,
Propionyl, phenylcarbonyl, etc., carbon number 2
-7 acyloxy groups such as benzoyloxy,
Includes acyloxy groups such as acetyloxy, such as benzoyloxy, acetyloxy, hydroxyl, amino, cyclohexyl, nitro, heterocyclic groups containing N, O or S, and heterocyclic groups include 5 to 5 containing oxygen, sulfur or nitrogen. Includes a 6-membered ring or a group to which a substituent of the substituted aryl, the aryl group, or another heterocyclic group is bonded, and the following groups (there are also groups included in the above definition, but these are shown as representative examples) is also included in Ar. (R 4 represents hydrogen or a halogen atom, R 5 represents a fluorine or chlorine atom, and Ac represents an acetyl group). Examples of the alkyl group for R 1 , R 2 , and R include alkyl groups having 1 to 5 carbon atoms, such as methyl, ethyl, propyl, butyl, and pentyl. A hydroxyl group etc. are illustrated as a substituent of a substituted alkyl group. In the following, compounds represented by general formulas (1), (2)... are referred to as compounds (1), (2)... Compound (4) is known as an extremely useful drug having antipyretic or antiinflammatory and analgesic effects.
[Falmacia, Vol.11.No.7, 515 (1975), Tokyo Tech News (Chemical Industry Data) Vol.13, No.4, 85
(1975)]. Further, a part of compound (4) can also be used as a raw material for other compound (4). It also serves as a raw material for the acid part of pyrethroid compounds (insecticides). Conventionally, various methods have been known for producing compound (4). Among these, using compound (1) as a raw material, compound (4)
The only known method for producing compound (4) is to tosylate the hydroxyl group of compound (1) and then heat-treat it in, for example, an aqueous calcium carbonate solution. [Tsuchibashi et al., Tetrahedron
Letters, 22 No.43, 4305 (1981). ] Using easily synthesized compound (1) as a raw material, the compound can be synthesized without adding the tosylation step as described above.
As a result of research into methods for obtaining (4), a method was discovered that could be produced industrially with great advantage. According to the present invention, a high yield can be obtained by rearranging compound (1) in the presence of (a) a basic substance or amide and (b) compound (2) or (3) or sulfur dioxide and a halogen. Compound (4) can be obtained by This reaction is a completely new rearrangement reaction between the 1st and 2nd positions. When carrying out the present invention, basic substances or amides and compounds are added to compound (1) dissolved in an organic solvent.
(2) or (3) or sulfur dioxide and halogen are added and reacted to carry out a rearrangement reaction of compound (1). As the organic solvent used in the reaction, any solvent inert to the reaction can be used, and examples thereof include aromatic hydrocarbons such as benzene and toluene, and halogenated compounds such as methylene chloride and chloroform. Examples of basic substances include primary, secondary, and tertiary amines of aromatic or aliphatic amines such as pyridine, γ-picoline, imidazole, triethylamine, diisopropylamine, and isopropylamine, as well as alkoxides such as potassium t-butoxy. , potassium acetate, sodium benzoate,
Examples include organic acid alkali metal salts or alkaline earth metal salts such as calcium benzoate. Furthermore, metal amides such as sodium amide and basic resins such as weakly basic resin WA-31
(Product name: Diaion) etc. are also used. Examples of amides include dimethylformamide, dimethylacetamide, pyrrolidone, and N-benzylpyrrolidone. The amount of these basic substances and amides to be used varies depending on the type, but at least 1
It is preferable to use twice the molar amount. Depending on the type, it can also be used as a solvent. These may be used alone or as a mixture. As the compound (2) or the compound (3), thionyl bromide, thionyl chloride, sulfuryl chloride, trifluoromethanesulfonyl chloride (ClSO 2 CF 3 ), etc. can be used.
Industrially, thionyl chloride and sulfuryl chloride are advantageously used. As the halogen, chlorine, bromine, etc. are used, preferably in an amount of 1 to 3 times the mole of compound (1). The reaction is carried out at a temperature of -100 to 150°C, preferably -60 to 100°C. In this temperature range, reaction times are generally 1 minute to 20 hours. In particular, when sulfuryl chloride is used, the reaction proceeds quickly and the rearrangement reaction is completed in a short time. Furthermore, by coexisting activated carbon or the like, the reaction proceeds smoothly. The reaction product thus obtained is isolated and produced by a conventional method. For example, if a salt of a hydrohalic acid and a base is insoluble, the reaction solution is filtered to remove them. If these salts are dissolved, post-treatment is performed as is. In the post-treatment, if necessary, the reaction solution is concentrated to remove the solvent or excess amines and amides. Water is added to the residue and the product is extracted with an organic solvent such as chloroform.
High quality compound (4) can be obtained in high yield by concentrating the chloroform solution and fractionating the target substance using silica gel chromatography. Examples are shown below. Example 1 2.52 g of α-hydroxy-p-isobutylpropiophenone dimethyl acetal was dissolved in 20 ml of pyridine, 1.43 g of thionyl chloride was added under ice cooling, and the mixture was stirred at room temperature for 2 hours. The solvent was distilled off, 20 ml of chloroform and 20 ml of water were added to the residue, and the layers were separated. The organic layer was dried over anhydrous sodium sulfate and then concentrated under reduced pressure. The oily residue was subjected to silica gel chromatography (developed with n-hexane-ethyl acetate solvent).
2-(4-isobutylphenyl)
1.62 g of methyl propionate was obtained. (Yield 72%) Example 2 2.52 g of α-hydroxy-p-isobutylpropiophenone dimethyl acetal and 2.02 g of triethylamine were dissolved in 50 ml of methylene chloride, 1.75 ml of sulfuryl chloride was added at -50°C, and the Stir for hours. Then add 20% of saturated sodium bicarbonate aqueous solution.
ml was added and the liquid was separated. The organic layer was dried over anhydrous sodium sulfate and then concentrated under reduced pressure. The oily residue was purified in the same manner as in Example 1 to obtain 1.85 g of methyl 2-(4-isobutylphenyl)propionate.
(Yield 84%) Example 3 2.72 g of α-hydroxy-p-phenylpropiophenone dimethyl acetal was dissolved in a mixed solvent of 25 ml of pyridine and 25 ml of methylene chloride, and 1.75 ml of sulfuryl chloride was added at -50°C. Stirred at temperature for 3 hours. Hereinafter, the same post-processing as in Example 1 was performed, and 2
-(4-biphenylyl)methyl propionate 2.10
I got g. (Yield: 87.5%) Example 4 To a solution in which 250 mg of α-hydroxy-p-isobutylpropiophenone dimethyl acetal and 200 mg of diisopropylamine were dissolved in 4 ml of methylene chloride, 300 mg of sulfuryl chloride was added dropwise under ice cooling. After stirring at the same temperature for 1 hour, quantitative analysis using gas chromatography revealed that 2-
Methyl (4-isobutylphenyl)propionate was produced at a production rate of 81%. Gas chromatography conditions Column 2% DEGS on Gas Chrom Q 3mmφ 1.5m Glass Column temperature 100→200℃ Inlet temperature 200℃ In addition, samples were prepared using N,O-bis(trimethylsilyl)acetamide, hexamethyldisilazane, and trimethylsilyl chloride. After performing trimethylsilylation, analysis by gas chromatography under the following conditions revealed that 2-(4-isobutylphenyl)propionic acid was produced. Gas chromatography conditions Column 2% SE-52 on Chromosolb W 3mmφ 3m Glass Column temperature 165→260℃ Inlet temperature 270℃ Example 5 250mg of α-hydroxy-p-isobutylpropiophenone dimethyl acetal was dissolved in 2ml of toluene. 200 mg of potassium acetate was added. When 200 mg of sulfuryl chloride was added dropwise to this suspension under ice cooling and treated in the same manner as in Example 4, methyl 2-(4-isobutylphenyl)propionate was produced at a production rate of 78%. Example 6 The results obtained by reacting with the raw materials and conditions shown in the table are shown in the table.
【表】【table】
【表】
化合物(2)又は(3)及び塩基の数値は化合物(1)に対
する当量を示し反応はいずれも3時間行わせた。
収率は原料に相当する目的物の収率を示す。
実施例 7
α−ヒドロキシ−p−アセトキシプロピオフエ
ノンジメチルアセタール2.54gをN,N−ジメチ
ルホルムアミド2mlとトルエン20mlの混合溶媒に
溶解し、−50℃に冷却した。ついで、塩化スルフ
リル1.75mlを加え、同温度で3時間撹拌する。反
応終了後、実施例1と同様の後処理を行い、2−
(p−アセトキシフエニル)プロピオン酸メチル
1.78g(80%収率)を得た。これを1N−水酸化
ナトリウム水溶液20ml中、50℃、1時間加熱し
た。のち、濃塩酸を用いてPH3に合わせた。この
溶液をクロロホルム50mlで抽出した。抽出液を減
圧下に濃縮して、2−(p−ヒドロキシフエニル)
プロピン酸1.2g(90%収率)を得た。
m.p. 128.7℃(酢酸〜水系再結晶品)
実施例 8
α−ヒドロキシ−P−イソブチルプロピオフエ
ノンジメチルアセタール2.52gおよびピリジン
2.4gを塩化メチレン25mlに溶解させる。活性炭
0.25g添加し、−40℃に冷却後二酸化イオウ0.96
gおよび塩素1.06g加え同温度で3時間撹拌し
た。
反応終了後は、炭酸水素ナトリウム水溶液で水
洗し、有機層を分液し、有機層を無水硫酸ナトリ
ウムで乾燥後、減圧濃縮した。油状残留物をシリ
カゲルクロマトグラフイー(n−ヘキサン−酢酸
エチル系溶媒で展開)にて精製して、2−(4−
イソブチルフエニル)プロピオン酸メチル1.60g
を得た。これを1N−水酸化ナトリウム水溶液20
ml中50℃1時間加熱した。濃塩酸でPH3にし、ク
ロロホルム50mlで抽出した。抽出液を減圧下で濃
縮して、2−(P−イソブチルフエニル)プロピ
オン酸1.3gを得た。
融点75〜76℃(酢酸〜水系再結晶品)
実施例 9
α−ヒドロキシ−P−イソブチルプロピオフエ
ノンジメチルアセタール2.52g、トリエチルアミ
ン1.5gを塩化メチレン25mlに溶解させた。活性
炭0.25g添加し、−50℃に冷却後に二酸化イオウ
0.96gおよび塩素1.3gを加え同温度で3時間撹
拌した。反応終了液は炭酸水素ナトリウム水溶液
で水洗し有機層を分液した。
有機層を無水硫酸ナトリウムで乾燥後、ガスク
ロマトグラフイーを用いて定量し、2−(4−イ
ソブチルフエニル)プロピオン酸メチルが1.8g
生成していた。
ガスクロマトグラフイー条件
カラム 2% DEGS on Ges chrom Q
3mmφ 1.5m、Glass
カラム温度 100℃→200℃
注入口温度 200℃
また上記水層の濃縮乾固物をN,O−ビス(ト
リメチルシリル)アセトアミド、ヘキサメチルジ
シラザン、トリメチルシリルクロリドを用いてト
リメチルシリル化を行つた後、以下の条件でガス
クロマトグラフイーによる分析を行つたところ、
2−(4−イソブチルフエニル)プロピオン酸が
生成していた。
ガスクロマト条件
カラム 2%SE−52 on chromosorb W
3mmφ 3m、Glass
カラム温度 165℃→260℃
注入口温度 270℃
実施例 10
α−ヒドロキシ−P−イソブチルプロピオフエ
ノンジメチルアセタール0.25g、イソプロピルア
ミン0.18gを塩化メチレン6mlに溶解させた。活
性炭0.03g添加し−20℃に冷却した。二酸化イオ
ウ0.1gおよび塩素0.11g加え同温度で3時間撹
拌した。以下実施例8と同様の後処理を行い、2
−(4−イソブチルフエニル)プロピオン酸メチ
ル0.19gが生成していた。
実施例 11
α−ヒドロキシ−P−イソブチルプロピオフエ
ノンジメチルアセタール2.52gにN,N−ジメチ
ルホルムアミド11gを加え、−50℃で二酸化イオ
ウ18mlおよび塩素1.1g加えた。2時間で10℃ま
で昇温し、20mlのクロロホルムを添加した。以下
実施例8と同様の後処理を行い、2−(4−イソ
ブチルフエニル)プロピオン酸メチル1.1gが生
成していた。
実施例 12
α−ヒドロキシ−p−イソブチルプロピオフエ
ノンジメチルアセタール0.25g、ピリジン0.24g
を塩化メチレンに溶解させた。活性炭0.25gを添
加し、−20℃に冷却した。二酸化イオウ0.96gお
よび臭素0.29g加え、0℃で4時間撹拌した。
以下実施例8と同様の後処理を行い、2−(4
−イソブチルフエニル)プロピオン酸メチル0.12
gが生成していた。
実施例 13
α−ヒドロキシ−P−アセトキシプロピオフエ
ノンジメチルアセタール2.54g、ピリジン2.4g
を塩化メチレン20mlに溶解させた。活性炭0.3g
添加し−50℃に冷却後二酸化イオウ1gおよび塩
素1.2g加え同温度で5時間撹拌した。以下実施
例7と同様の後処理を行い、2−(4−アセトキ
シフエニル)プロピオン酸メチル1.3gを得た。
これを1N−水酸化ナトリウム水溶液20ml中50℃
1時間加熱した。濃塩酸でPH3にし、クロロホル
ム50mlで抽出した。抽出液を減圧下で濃縮して、
2−(P−ヒドロキシフエニル)プロピオン酸0.9
gを得た。
融点128.5℃(酢酸〜水系再結晶品)
実施例 14
α−ヒドロキシ−P−フエニルプロピオフエノ
ンジメチルアセタール2.45g、ピリジン2.4gを
塩化メチレン25mlに溶解させた。活性炭0.3g添
加し、−40℃に冷却後、二酸化イオウ0.96gおよ
び塩素1.1g加え同温度で5時間撹拌した。以下
実施例7と同様の後処理を行い、2−(P−ビフ
エニリル)プロピオン酸メチル2.0g得た。これ
を1N水酸化ナトリウム水溶液20ml中50℃1時間
加熱した。濃塩酸でPH3にし、クロロホルム50ml
で抽出した。抽出液を減圧で濃縮して、2−(P
−ビフエニリル)プロピオン酸1.6gを得た。
融点146〜146.5℃(酢酸〜水系再結晶品)[Table] The numerical values of compound (2) or (3) and base indicate the equivalent amount to compound (1), and the reactions were all carried out for 3 hours.
Yield indicates the yield of the target product corresponding to the raw material. Example 7 2.54 g of α-hydroxy-p-acetoxypropiophenone dimethyl acetal was dissolved in a mixed solvent of 2 ml of N,N-dimethylformamide and 20 ml of toluene and cooled to -50°C. Then, 1.75 ml of sulfuryl chloride was added and stirred at the same temperature for 3 hours. After the reaction was completed, the same post-treatment as in Example 1 was carried out to obtain 2-
Methyl (p-acetoxyphenyl)propionate
1.78g (80% yield) was obtained. This was heated in 20 ml of 1N aqueous sodium hydroxide solution at 50°C for 1 hour. Afterwards, the pH was adjusted to 3 using concentrated hydrochloric acid. This solution was extracted with 50 ml of chloroform. The extract was concentrated under reduced pressure to give 2-(p-hydroxyphenyl)
1.2 g (90% yield) of propynic acid was obtained. mp 128.7°C (acetic acid to water-based recrystallized product) Example 8 2.52 g of α-hydroxy-P-isobutylpropiophenone dimethyl acetal and pyridine
Dissolve 2.4 g in 25 ml of methylene chloride. activated carbon
After adding 0.25g and cooling to -40℃, sulfur dioxide 0.96
g and 1.06 g of chlorine were added and stirred at the same temperature for 3 hours. After the reaction was completed, the mixture was washed with an aqueous sodium bicarbonate solution, the organic layer was separated, and the organic layer was dried over anhydrous sodium sulfate and concentrated under reduced pressure. The oily residue was purified by silica gel chromatography (developed with n-hexane-ethyl acetate) to obtain 2-(4-
Methyl isobutylphenyl)propionate 1.60g
I got it. Add this to 1N sodium hydroxide aqueous solution 20
ml at 50°C for 1 hour. The pH was adjusted to 3 with concentrated hydrochloric acid, and the mixture was extracted with 50 ml of chloroform. The extract was concentrated under reduced pressure to obtain 1.3 g of 2-(P-isobutylphenyl)propionic acid. Melting point: 75-76°C (acetic acid to water-based recrystallized product) Example 9 2.52 g of α-hydroxy-P-isobutylpropiophenone dimethyl acetal and 1.5 g of triethylamine were dissolved in 25 ml of methylene chloride. After adding 0.25g of activated carbon and cooling to -50℃, sulfur dioxide
0.96 g and 1.3 g of chlorine were added and stirred at the same temperature for 3 hours. The reaction-completed solution was washed with an aqueous sodium hydrogen carbonate solution, and the organic layer was separated. After drying the organic layer over anhydrous sodium sulfate, it was quantified using gas chromatography, and 1.8 g of methyl 2-(4-isobutylphenyl)propionate was found.
It was generating. Gas chromatography conditions Column 2% DEGS on Ges chrom Q 3mmφ 1.5m, Glass Column temperature 100℃→200℃ Inlet temperature 200℃ In addition, the concentrated dry product of the above water layer was treated with N,O-bis(trimethylsilyl)acetamide, hexa After performing trimethylsilylation using methyldisilazane and trimethylsilyl chloride, analysis by gas chromatography was performed under the following conditions.
2-(4-isobutylphenyl)propionic acid was produced. Gas chromatography conditions Column 2%SE-52 on chromosorb W 3mmφ 3m, Glass Column temperature 165℃→260℃ Inlet temperature 270℃ Example 10 α-hydroxy-P-isobutylpropiophenone dimethyl acetal 0.25g, isopropylamine 0.18g was dissolved in 6 ml of methylene chloride. 0.03 g of activated carbon was added and the mixture was cooled to -20°C. 0.1 g of sulfur dioxide and 0.11 g of chlorine were added and stirred at the same temperature for 3 hours. Below, the same post-treatment as in Example 8 was carried out, and 2
0.19 g of methyl -(4-isobutylphenyl)propionate was produced. Example 11 11 g of N,N-dimethylformamide was added to 2.52 g of α-hydroxy-P-isobutylpropiophenone dimethyl acetal, and 18 ml of sulfur dioxide and 1.1 g of chlorine were added at -50°C. The temperature was raised to 10°C over 2 hours, and 20ml of chloroform was added. Thereafter, the same post-treatment as in Example 8 was carried out, and 1.1 g of methyl 2-(4-isobutylphenyl)propionate was produced. Example 12 α-hydroxy-p-isobutylpropiophenone dimethyl acetal 0.25g, pyridine 0.24g
was dissolved in methylene chloride. 0.25 g of activated carbon was added and cooled to -20°C. 0.96 g of sulfur dioxide and 0.29 g of bromine were added, and the mixture was stirred at 0°C for 4 hours. Afterwards, the same post-processing as in Example 8 was carried out, and 2-(4
-Methyl isobutylphenyl)propionate 0.12
g was produced. Example 13 2.54 g of α-hydroxy-P-acetoxypropiophenone dimethyl acetal, 2.4 g of pyridine
was dissolved in 20 ml of methylene chloride. Activated carbon 0.3g
After cooling to -50°C, 1 g of sulfur dioxide and 1.2 g of chlorine were added and stirred at the same temperature for 5 hours. Thereafter, the same post-treatment as in Example 7 was performed to obtain 1.3 g of methyl 2-(4-acetoxyphenyl)propionate.
This was heated at 50°C in 20ml of 1N sodium hydroxide aqueous solution.
Heated for 1 hour. The pH was adjusted to 3 with concentrated hydrochloric acid, and the mixture was extracted with 50 ml of chloroform. The extract was concentrated under reduced pressure.
2-(P-hydroxyphenyl)propionic acid 0.9
I got g. Melting point: 128.5°C (acetic acid to water-based recrystallized product) Example 14 2.45 g of α-hydroxy-P-phenylpropiophenone dimethyl acetal and 2.4 g of pyridine were dissolved in 25 ml of methylene chloride. 0.3 g of activated carbon was added, and after cooling to -40°C, 0.96 g of sulfur dioxide and 1.1 g of chlorine were added, and the mixture was stirred at the same temperature for 5 hours. Thereafter, the same post-treatment as in Example 7 was performed to obtain 2.0 g of methyl 2-(P-biphenylyl)propionate. This was heated at 50° C. for 1 hour in 20 ml of a 1N aqueous sodium hydroxide solution. Adjust the pH to 3 with concentrated hydrochloric acid and add 50ml of chloroform.
Extracted with. The extract was concentrated under reduced pressure to obtain 2-(P
1.6 g of -biphenylyl)propionic acid were obtained. Melting point: 146-146.5℃ (acetic acid to water-based recrystallized product)
Claims (1)
は複素環基を示し、Rは水素もしくはアルキル基
を示し、R′およびR2は同一もしくは異なつてよ
く、アルキル基を示すかまたはR′とR2が一体と
なつて環状アセタールを形成してもよい) で表される化合物を (イ) 塩基物質もしくはアミド類及び (ロ) 一般式(2)もしくは(3) XSOX′ (2) XSO2X′ (3) (式中X、X′は同一もしくは異なつてよく
ハロゲン原子もしくはトリフルオロメチル基
を示す) で表される化合物もしくは 二酸化イオウ及びハロゲン の存在下に転位反応させることを特徴とする一般
式(4) (式中、ArおよびRは前記と同義を示し、R3は
水素、アルキル基あるいは置換アルキル基を示
す)で表される酢酸誘導体の製法。[Claims] 1 (In the formula, Ar represents a substituted or unsubstituted aryl group or a heterocyclic group, R represents hydrogen or an alkyl group, R′ and R 2 may be the same or different, and represent an alkyl group, or R′ and R 2 may be combined to form a cyclic acetal) A compound represented by (a) a basic substance or amide and (b) general formula (2) or (3) XSOX′ (2) XSO 2 ' (3) (wherein X and X' are the same or different and often represent a halogen atom or a trifluoromethyl group) or a general compound characterized by carrying out a rearrangement reaction in the presence of sulfur dioxide and a halogen. Formula (4) A method for producing an acetic acid derivative represented by the formula (wherein Ar and R have the same meanings as above, and R 3 represents hydrogen, an alkyl group, or a substituted alkyl group).
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59075551A JPS60218332A (en) | 1984-04-14 | 1984-04-14 | Production of acetic acid derivative |
| US06/722,833 US4649213A (en) | 1984-04-14 | 1985-04-12 | Process for producing an α-aromatic group substituted alkanoic acid derivative |
| DE8585104309T DE3566534D1 (en) | 1984-04-14 | 1985-04-12 | Process for producing an alpha-aromatic group substituted alkanoic acid derivative |
| EP85104309A EP0160241B1 (en) | 1984-04-14 | 1985-04-12 | Process for producing an alpha-aromatic group substituted alkanoic acid derivative |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59075551A JPS60218332A (en) | 1984-04-14 | 1984-04-14 | Production of acetic acid derivative |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60218332A JPS60218332A (en) | 1985-11-01 |
| JPH0547526B2 true JPH0547526B2 (en) | 1993-07-19 |
Family
ID=13579432
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59075551A Granted JPS60218332A (en) | 1984-04-14 | 1984-04-14 | Production of acetic acid derivative |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60218332A (en) |
-
1984
- 1984-04-14 JP JP59075551A patent/JPS60218332A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60218332A (en) | 1985-11-01 |
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