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JPH054773B2 - - Google Patents
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JPH054773B2 - - Google Patents

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Publication number
JPH054773B2
JPH054773B2 JP58004196A JP419683A JPH054773B2 JP H054773 B2 JPH054773 B2 JP H054773B2 JP 58004196 A JP58004196 A JP 58004196A JP 419683 A JP419683 A JP 419683A JP H054773 B2 JPH054773 B2 JP H054773B2
Authority
JP
Japan
Prior art keywords
photoresist layer
layer
water repellent
black matrix
graphite
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58004196A
Other languages
Japanese (ja)
Other versions
JPS59130044A (en
Inventor
Yoshuki Odaka
Koichi Nakazato
Yoshifumi Tomita
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP419683A priority Critical patent/JPS59130044A/en
Publication of JPS59130044A publication Critical patent/JPS59130044A/en
Publication of JPH054773B2 publication Critical patent/JPH054773B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/20Manufacture of screens on or from which an image or pattern is formed, picked up, converted or stored; Applying coatings to the vessel
    • H01J9/22Applying luminescent coatings
    • H01J9/227Applying luminescent coatings with luminescent material discontinuously arranged, e.g. in dots or lines
    • H01J9/2278Application of light absorbing material, e.g. between the luminescent areas

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明はブラツクマトリツクス形カラー受像管
の製造方法、特にそのブラツクマトリツクス膜の
形成方法に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Field of Application of the Invention] The present invention relates to a method for manufacturing a black matrix type color picture tube, and particularly to a method for forming a black matrix film therefor.

〔従来技術〕[Prior art]

この種のカラー受像管のけい光面は、高コント
ラストを得る目的で用いられるものであり、一般
に所定の様式に配列された赤、緑、青色の各色け
い光体のドツトもしくはストライプ相互間の間隙
に黒鉛等の非発光・光吸収性物質からなる光吸収
膜が形成された構造を有している。
The phosphor surface of this type of color picture tube is used for the purpose of obtaining high contrast, and is generally comprised of gaps between dots or stripes of red, green, and blue phosphors arranged in a predetermined manner. It has a structure in which a light-absorbing film made of a non-light-emitting/light-absorbing substance such as graphite is formed on the top.

このようなけい光面を形成する場合、まず、カ
ラー受像管パネルのフエースプレート内面にフオ
トレジスト膜を形成し、これを乾燥した後、シヤ
ドウマスクを介して露光し、現像してマトリツク
ス状のフオトレジスト層を形成する。次に、この
状態のフエースプレート内面に黒鉛を塗布した
後、エツチングを行なつてブラツクマトリツクス
膜を形成する。その後前記ブラツクマトリツクス
膜を含めてフエースプレートの内面を覆うように
水溶性重合体材料の薄い下塗り層を形成する。次
に緑、青、赤色発光用の各けい光体スラリーを塗
布し、各色毎にシヤドウマスクを介して露光した
後、温水による現像により、非露光部を溶解さ
せ、所望の形状のけい光体絵素を被着してけい光
体層を形成する。引き続いてこれらけい光体層上
に有機樹脂膜を形成した後、アルミニウム蒸着膜
を形成する。その後、パネルを焼成して前記有機
樹脂膜を熱分解させてカラー受像管としてのけい
光面を形成する。
When forming such a fluorescent surface, first, a photoresist film is formed on the inner surface of the face plate of the color picture tube panel, and after drying, it is exposed to light through a shadow mask and developed to form a matrix-like photoresist. form a layer. Next, after graphite is applied to the inner surface of the face plate in this state, etching is performed to form a black matrix film. A thin undercoat layer of water-soluble polymeric material is then formed to cover the inner surface of the faceplate, including the black matrix film. Next, each phosphor slurry for green, blue, and red light emission is applied, and after each color is exposed to light through a shadow mask, the non-exposed areas are dissolved by development with hot water, and a phosphor image of the desired shape is created. A phosphor layer is formed by depositing a phosphor layer. Subsequently, an organic resin film is formed on these phosphor layers, and then an aluminum vapor-deposited film is formed. Thereafter, the panel is fired to thermally decompose the organic resin film to form a fluorescent surface as a color picture tube.

しかしながら、前述したブラツクマトリツクス
膜の形成方法によると、その形成工程に、フオト
レジストの塗布−乾燥−露光−フオトレジストの
現像−乾燥−黒鉛塗布−乾燥−エツチング液処理
現像−乾燥と極めて複雑かつ長い工程を必要とす
る。また、エツチング液として次亜鉛素酸ソーダ
や過酸化水素水等の危険な薬品を必要とする等の
問題があつた。
However, according to the above-mentioned method for forming a black matrix film, the formation process is extremely complicated and includes coating of photoresist, drying, exposure, development of photoresist, drying, coating of graphite, drying, treatment with etching solution, development, and drying. Requires a long process. Further, there were other problems such as the need for dangerous chemicals such as sodium hypozinc oxide and hydrogen peroxide as etching solutions.

〔発明の目的〕[Purpose of the invention]

したがつて本発明は、前述した従来の問題点に
鑑みてなされたものであり、その目的のするとこ
ろは、従来必要としていたエツチング工程を省略
し、簡単かつ安全な方法でブラツクマトリツクス
膜を形成可能にしたブラツクマトリツクス形カラ
ー受像管の製造方法が提供することにある。
Therefore, the present invention has been made in view of the above-mentioned conventional problems, and its purpose is to omit the conventionally necessary etching process and to form a black matrix film in a simple and safe manner. An object of the present invention is to provide a method for manufacturing a black matrix type color picture tube.

〔発明の概要〕[Summary of the invention]

このような目的を達成するために本発明は、フ
オトレジスト層の露光硬化部分のみに撥水剤層を
形成して黒鉛をはじかせてブラツクマトリツクス
膜を形成したものである。
In order to achieve this object, the present invention forms a black matrix film by forming a water repellent layer only on the exposed and hardened portion of the photoresist layer to repel graphite.

〔発明の実施例〕[Embodiments of the invention]

次に図面を用いて本発明の実施例を詳細に説明
する。
Next, embodiments of the present invention will be described in detail using the drawings.

第1図ないし第5図は本発明によるブラツクマ
トリツクス形カラー受像管の製造方法に係わるブ
ラツクマトリツクス膜の形成方法の一例を説明す
る要部断面工程図である。これらの図において、
まず第1図に示すようにフエースプレート1の内
面に光硬化性のフオトレジストを均一に塗布し、
乾燥してフオトレジスト層2を形成する。次い
で、第2図に示すようにこのフオトレジスト層2
上に各色のけい光体が発光すべき位置に光3が当
るようにシヤドウマスク4を介して図示しない点
状または線状の光源で所定の位置を露光し、該露
光部のフオトレジスト層2aを硬化させる。この
場合、非露光部のフオトレジスト層2bは硬化さ
れない。引き続き第3図に示すようにフエースプ
レート1の内面全面にシリコン系撥水剤などの撥
水性を有する溶液を塗布して乾燥し、露光後のフ
オトレジスト層2a,2bの上面全面に撥水剤層
5を形成する。次にこのフオトレジスト層2a,
2bとその上面の撥水剤層5を温水によるスプレ
ー現像を行なつて非露光非硬化部のフオトレジス
ト層2bとその上面の撥水剤層のみを除去し、第
4図に示すように各色のけい光体を発光させるべ
き位置の露光硬化部のフオトレジスト層2aとそ
の上面に撥水剤層5aを形成した後、第5図に示
すようにこのフエースプレート1の内面全面に非
発光性吸収物質として黒鉛懸濁液を塗布して乾燥
させ、黒鉛層6を形成し、ブラツクマトリツクス
膜を形成させる。この場合、露光部のフオトレジ
スト層2aの上面には撥水剤層5aが形成されて
いるために水分散液である黒鉛は、露光部には付
着されずに非露光部のフエースプレート面のみに
付着することになる。
FIGS. 1 to 5 are cross-sectional process diagrams illustrating an example of a method for forming a black matrix film in the method for manufacturing a black matrix type color picture tube according to the present invention. In these figures,
First, as shown in FIG. 1, a photocurable photoresist is uniformly applied to the inner surface of the face plate 1.
A photoresist layer 2 is formed by drying. Next, as shown in FIG.
A predetermined position is exposed with a point or linear light source (not shown) through a shadow mask 4 so that the light 3 hits the position where each color phosphor should emit light, and the photoresist layer 2a in the exposed area is exposed. Let it harden. In this case, the photoresist layer 2b in the non-exposed areas is not hardened. Subsequently, as shown in FIG. 3, a water repellent solution such as a silicone water repellent is applied to the entire inner surface of the face plate 1 and dried, and the water repellent is applied to the entire upper surface of the exposed photoresist layers 2a and 2b. Form layer 5. Next, this photoresist layer 2a,
The photoresist layer 2b and the water repellent layer 5 on its upper surface are spray-developed with hot water to remove only the unexposed and uncured portions of the photoresist layer 2b and the water repellent layer 5 on its upper surface, and then the photoresist layer 2b and the water repellent layer 5 on its upper surface are removed. After forming the photoresist layer 2a in the exposed and hardened portion at the position where the phosphor is to emit light and the water repellent layer 5a on its upper surface, a non-luminescent layer is applied to the entire inner surface of the face plate 1 as shown in FIG. A graphite suspension is applied as an absorbing material and dried to form a graphite layer 6, thereby forming a black matrix film. In this case, since the water repellent layer 5a is formed on the upper surface of the photoresist layer 2a in the exposed area, the graphite, which is an aqueous dispersion, is not attached to the exposed area but only on the face plate surface of the non-exposed area. It will adhere to.

以下、具体例を用いて説明する。 This will be explained below using a specific example.

まず、14形カラー受像管パネルのフエースプレ
ート内面に光硬化性のフオトレジスト層を形成す
る。この場合、このフオトレジスト層は後工程の
ベーキングで焼失するような熱分解性を有するも
のであることが望ましく、例えばポリアクリルア
ミドジアセトンアミド(PAD)−ビスアジド系、
ポリビニールアルコール(PVA)重クロム酸ナ
トリウム系またはポリアクリルアミド(PAA)−
ポリビニルピロリドン(PVP)−ビスアジド系の
感光性水溶液を回転塗布機を用いてフエースプレ
ート内面上に約200rpmの回転数で回転塗布し、
赤外線ヒータにより乾燥して厚さ0.5〜1.0μm程
度のフオトレジスト層を形成する。次にシヤドウ
マスクを装着した露光台の上で露光強度約3W/
m2で約25秒間露光し、この露光部分のフオトレジ
スト層のみを硬化させる。次に、このフエースプ
レート内面全面にシリコーン系撥水剤を塗布して
乾燥し、撥水剤層を形成する。この場合、ここで
用いるシリコーン系撥水剤は、ジメチルポリシリ
ロキサン化合物またはメチルハイドロジエンポリ
シロキサン化合物を含むものとして例えば東レシ
リコン製のSH237、PRX305、SH8011、
SD8000、SH7024、BY22−812、SH8701などが
好適である。次にこのフオトレジストおよび撥水
剤層全面に、ノズル径0.5mmのスプレーを用いて
約40℃の温水を約2.5Kg/cm2の圧力で約90秒間射
出して温水現像とする。この場合、露光硬化した
フオトレジスト層とその上面の撥水剤層のみが残
留し、非露光非硬化部は完全に除去されてフエー
スプレート面が露出する。引き続き、残留したこ
のフオトレジスト層および撥水剤層の絵素が残留
したフエースプレート内面全面に、約5wt%の黒
鉛を含む黒鉛懸濁液を0.3〜3.0μmの厚さに塗布
し、赤外線ヒータで約50℃で約2分間加熱乾燥さ
せる。この場合、露光部のフオトレジスト層の上
面には撥水剤層が存在するため、黒鉛ははじか
れ、フエースプレート面の露出した部分のみに付
着してブラツクマトリツクス膜が形成される。
First, a photocurable photoresist layer is formed on the inner surface of the face plate of a 14-inch color picture tube panel. In this case, it is desirable that the photoresist layer is thermally decomposable so as to be burnt out in the subsequent baking process, such as polyacrylamide diacetonamide (PAD)-bisazide,
Polyvinyl alcohol (PVA) sodium dichromate-based or polyacrylamide (PAA) −
A photosensitive aqueous solution of polyvinylpyrrolidone (PVP)-bisazide is applied onto the inner surface of the face plate using a spin coating machine at a rotation speed of approximately 200 rpm.
A photoresist layer having a thickness of about 0.5 to 1.0 μm is formed by drying with an infrared heater. Next, on the exposure table equipped with a shadow mask, the exposure intensity is approximately 3W/
m 2 for about 25 seconds to harden only the exposed portions of the photoresist layer. Next, a silicone water repellent is applied to the entire inner surface of the face plate and dried to form a water repellent layer. In this case, the silicone water repellent used here includes, for example, Toray Silicon SH237, PRX305, SH8011, which contains a dimethylpolysilyloxane compound or a methylhydrodiene polysiloxane compound.
SD8000, SH7024, BY22-812, SH8701, etc. are suitable. Next, hot water at about 40° C. is injected onto the entire surface of the photoresist and water repellent layer at a pressure of about 2.5 kg/cm 2 for about 90 seconds using a sprayer with a nozzle diameter of 0.5 mm to perform hot water development. In this case, only the exposed and hardened photoresist layer and the water repellent layer on its upper surface remain, and the unexposed and unhardened portion is completely removed to expose the face plate surface. Subsequently, a graphite suspension containing approximately 5 wt% graphite was applied to a thickness of 0.3 to 3.0 μm over the entire inner surface of the face plate on which the remaining picture elements of the photoresist layer and the water repellent layer remained, and heated with an infrared heater. Heat and dry at about 50℃ for about 2 minutes. In this case, since a water repellent layer is present on the upper surface of the photoresist layer in the exposed area, the graphite is repelled and adheres only to the exposed portion of the face plate surface, forming a black matrix film.

このような形成方法によれば、黒鉛塗布前のフ
オトレジスト層の非露光非硬化部分のエツチング
工程および黒鉛層のエツチング工程を省略して従
来と同等の諸特性を有するブラツクマトリツクス
膜が得られるので、ブラツクマトリツクス膜の形
成工程が大幅に短縮できるとともに、これに伴な
つて危険なエツチング液の使用が皆無となるの
で、安全性の高い生産が可能となる。
According to such a formation method, a black matrix film having properties equivalent to those of the conventional method can be obtained by omitting the etching process of the unexposed and uncured portion of the photoresist layer before applying graphite and the etching process of the graphite layer. Therefore, the process for forming the black matrix film can be greatly shortened, and there is no need to use dangerous etching solutions, making it possible to achieve highly safe production.

〔発明の効果〕〔Effect of the invention〕

以上説明したように本発明によれば、従来の方
法に比較してエツチング工程が不要となるので、
ブラツクマトリツクス膜の形成工程を大幅に短縮
させ、かつ安全性が高くなり、生産コストが大幅
に低減できるなどの極めて優れた効果が得られ
る。
As explained above, according to the present invention, an etching process is not necessary compared to the conventional method.
The process of forming a black matrix film can be significantly shortened, safety is increased, and production costs can be significantly reduced, which are extremely excellent effects.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図ないし第5図は本発明によるブラツクマ
トリツクス形カラー受像管の製造方法の一例を説
明するための要部断面工程図である。 1……フエースプレート、2……フオトレジス
ト層、2a……露光部のフオトレジスト層、2b
……非露光部のフオトレジスト層、3……光、4
……シヤドウマスク、5……撥水剤層、5a……
露光部の上に残留した撥水剤層、6……黒鉛層。
1 to 5 are cross-sectional process diagrams of essential parts for explaining an example of a method for manufacturing a black matrix type color picture tube according to the present invention. 1...Face plate, 2...Photoresist layer, 2a...Photoresist layer in exposed area, 2b
... Photoresist layer in non-exposed area, 3 ... Light, 4
...Shadow mask, 5...Water repellent layer, 5a...
Water repellent layer remaining on exposed area, 6...Graphite layer.

Claims (1)

【特許請求の範囲】[Claims] 1 カラー受像管パネルのフエースプレート内面
にブラツクマトリツクス膜を形成してなるブラツ
クマトリツクス形カラー受像管の製造方法におい
て、前記フエースプレート内面に厚さ0.5〜1.0μ
mのフオトレジスト層を形成する工程と、前記フ
オトレジスト層にシヤドウマスクを介してけい光
体絵素を形成すべき絵素部を露光硬化する露光工
程と、前記露光工程を経たフオトレジスト層の全
面を覆つてジメチルポリシリロキサン化合物また
はメチルハイドロジエンポリシロキサン化合物の
何れか一方を含むシリコーン系撥水剤層を塗布形
成する工程と、前記フオトレジスト層の絵素部を
除くフオトレジスト層とその上の上記シリコーン
系撥水剤層とを約40℃の温水を約2.5Kg/cm2の圧
力で射出することにより現像除去して露光部のフ
オトレジスト層および撥水剤層からなる絵素部を
形成する工程と、前記フオトレジスト層の絵素が
形成されたフエースプレート内面に約5wt%の黒
鉛を含む黒鉛懸濁液を0.3〜3.0μmの厚さに塗布
し、前記絵素部の撥水剤上の黒鉛のみをはじか
せ、これを乾燥して上記絵素部を除くフエースプ
レート内面に黒鉛被膜を被着することによりブラ
ツクマトリツクス膜を形成する工程とを備えたこ
とを特徴としたブラツクマトリツクス形カラー受
像管の製造方法。
1. A method for manufacturing a black matrix type color picture tube in which a black matrix film is formed on the inner surface of the face plate of a color picture tube panel, in which the inner surface of the face plate has a thickness of 0.5 to 1.0 μm.
a step of forming a photoresist layer of m, an exposure step of exposing and curing the pixel portion on which a phosphor pixel is to be formed on the photoresist layer through a shadow mask, and a step of curing the photoresist layer through a shadow mask; a step of coating and forming a silicone water repellent layer containing either a dimethylpolysilyloxane compound or a methylhydrodienepolysiloxane compound, covering the photoresist layer excluding the picture element portion of the photoresist layer and the photoresist layer thereon; The above-mentioned silicone water repellent layer is developed and removed by injecting warm water at about 40°C at a pressure of about 2.5 kg/cm 2 to remove the picture element area consisting of the photoresist layer and the water repellent layer in the exposed area. A graphite suspension containing about 5 wt% of graphite is applied to the inner surface of the face plate on which the picture elements of the photoresist layer are formed to a thickness of 0.3 to 3.0 μm to make the picture elements water repellent. A black matrix film is formed by forming a black matrix film by repelling only the graphite on the agent, drying it, and depositing a graphite film on the inner surface of the face plate excluding the picture element areas. A method of manufacturing a matrix color picture tube.
JP419683A 1983-01-17 1983-01-17 Manufacture of black matrix type color picture tube Granted JPS59130044A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP419683A JPS59130044A (en) 1983-01-17 1983-01-17 Manufacture of black matrix type color picture tube

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP419683A JPS59130044A (en) 1983-01-17 1983-01-17 Manufacture of black matrix type color picture tube

Publications (2)

Publication Number Publication Date
JPS59130044A JPS59130044A (en) 1984-07-26
JPH054773B2 true JPH054773B2 (en) 1993-01-20

Family

ID=11577921

Family Applications (1)

Application Number Title Priority Date Filing Date
JP419683A Granted JPS59130044A (en) 1983-01-17 1983-01-17 Manufacture of black matrix type color picture tube

Country Status (1)

Country Link
JP (1) JPS59130044A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01248426A (en) * 1988-03-30 1989-10-04 Matsushita Electric Ind Co Ltd Manufacture of screen

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4943827A (en) * 1972-09-01 1974-04-25
JPS5480069A (en) * 1977-12-08 1979-06-26 Mitsubishi Electric Corp Light absorbing film coating method for color picture tube

Also Published As

Publication number Publication date
JPS59130044A (en) 1984-07-26

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