JPH0548529B2 - - Google Patents
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- Publication number
- JPH0548529B2 JPH0548529B2 JP60231657A JP23165785A JPH0548529B2 JP H0548529 B2 JPH0548529 B2 JP H0548529B2 JP 60231657 A JP60231657 A JP 60231657A JP 23165785 A JP23165785 A JP 23165785A JP H0548529 B2 JPH0548529 B2 JP H0548529B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic disk
- magnetic
- head
- sample
- coated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Paints Or Removers (AREA)
- Magnetic Record Carriers (AREA)
Description
【発明の詳細な説明】
(産業上の利用分野)
本発明は磁気的記憶装置(磁気デイスク装置ま
たは磁気ドラム装置など)に用いられる磁気記憶
体に関する。DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to a magnetic storage body used in a magnetic storage device (such as a magnetic disk device or a magnetic drum device).
(従来の技術)
一般に記録再生磁気ヘツド(以下ヘツドと呼
ぶ)と磁気記憶体とを構成部とする磁気記憶装置
の記録再生方法には次のような方法がある。すな
わち操作開始時にヘツドと磁気記憶体面とを接触
状態でセツトした後、磁気記憶体に所要の回転を
与えることによりヘツドと磁気記憶体面の間に空
気層分の空間を作り、この状態で記録再生をする
方法である(コンタクト・スタート・ストツプ方
式、以下CSSと呼ぶ)。この方法では操作終了時
に磁気記憶体の回転が止まり、この時ヘツドと磁
気記憶体面は操作開始時と同様に接触摩擦状態に
ある。(Prior Art) In general, there are the following methods for recording and reproducing a magnetic storage device comprising a recording and reproducing magnetic head (hereinafter referred to as a head) and a magnetic storage body. In other words, at the start of operation, the head and the magnetic storage surface are set in contact, and then a space corresponding to an air layer is created between the head and the magnetic storage surface by giving the magnetic storage the required rotation, and recording and playback are performed in this state. (contact start-stop method, hereinafter referred to as CSS). In this method, at the end of the operation, the magnetic storage body stops rotating, and at this time the head and the magnetic storage body surface are in a frictional state of contact, as at the beginning of the operation.
これらの接触摩擦状態におけるヘツドと磁気記
憶体の間に生じる摩擦力は、ヘツドおよび磁気記
憶体を摩耗させついにはヘツドおよび磁性媒体に
傷を生じせしめることがある。 The frictional force generated between the head and the magnetic storage material under these contact friction conditions can wear out the head and the magnetic storage material and may eventually cause scratches on the head and the magnetic medium.
また前記接触摩擦状態においてヘツドのわずか
な姿勢の変化がヘツドにかかる荷重を不均一にさ
せヘツドおよび磁気記憶体表面に傷を作ることも
ある。 Further, in the contact friction state, a slight change in the posture of the head may cause the load applied to the head to become uneven, causing scratches on the surface of the head and the magnetic storage body.
さらにヘツドと磁気記憶体の長時間の接触によ
り、両者は互いに吸着し離れにくくなる。 Furthermore, if the head and the magnetic storage body are in contact for a long time, they will attract each other and become difficult to separate.
このヘツドとの接触および摺動による磁気記憶
体の破壊および吸着を防止するために、従来特開
昭52−49805号公報に見られるように、磁気記憶
体表面にパーフロロアルキルポリエーテルなどの
潤滑剤を被覆していた。 In order to prevent the magnetic memory from being destroyed or adsorbed due to contact and sliding with the head, a lubricant such as perfluoroalkyl polyether is applied to the surface of the magnetic memory as seen in Japanese Patent Application Laid-Open No. 52-49805. It was covered with a drug.
(発明が解決しようとする問題点)
しかしながらこのような潤滑剤は耐荷重性が悪
くヘツドとの摺動または多数回のCSSの繰り返し
において磁気記憶体の傷の発生を防ぐことが出来
なかつた。また除去された潤滑剤が磁気記憶体と
ヘツドの接触摺動面に厚く局在して吸着し離れな
くなるという欠点もあつた。(Problems to be Solved by the Invention) However, such lubricants have poor load resistance and cannot prevent the occurrence of scratches on the magnetic memory when sliding with the head or repeating CSS many times. Another drawback was that the removed lubricant was thickly localized on the contact sliding surface between the magnetic storage body and the head and was attracted to it, making it difficult to separate.
本発明の目的は、この問題点を解決した磁気記
憶体を提供することにある。 An object of the present invention is to provide a magnetic memory that solves this problem.
(問題を解決するための手段)
本発明の磁気記憶体は、その部分断面図(第1
図)に示すように下地体1の上に磁性媒体2が被
覆され、さらに該媒体上にラダー型ポリシロキサ
ンからなる潤滑剤4が被覆された構造を有する。(Means for solving the problem) The magnetic storage body of the present invention has a partial cross-sectional view (first
As shown in the figure, a magnetic medium 2 is coated on a base body 1, and a lubricant 4 made of ladder-type polysiloxane is further coated on the medium.
下地体1はアルミ合金、チタン合金、またはス
テンレスなどの金属、またはポリエステル、ポリ
イミド、ポリアミドイミド、ポリエーテルサルフ
オン、ポリサルフオン、芳香族ポリエーテル、エ
ポキシ樹脂、尿素樹脂、メラミン樹脂、ポリカー
ボネート、ジアリルフタレート樹脂、アクリル樹
脂、フエノール樹脂、ポリフエニレンサルフアイ
ド、ポリフエニレンエーテル、ポリアセタール樹
脂、ポリブチレンテレフタレート、ビスマレイミ
ドトリアジン樹脂、ポリオキシベンジレン樹脂、
ポリアミノビスマレイミド樹脂、ポリフエニレン
オキサイド、ポリフエニレンサルフアイドなどの
プラスチツク、またはガラス、シリコン、ゲルマ
ニウム、アルミナ、シリカ、ダイアモンドなどの
セラミツクス、または陽極酸化アルマイト被覆ア
ルミ合金あるいは、Ni−Pメツキ膜、Cr、
FeNi、ステンレス、MoまたはWなどの金属また
は前記プラスチツク、前記セラミツクスを被覆し
たアルミ合金、チタン合金、ステンレスなどの積
層合金基板、あるいは前記金属あるいは前記セラ
ミツクスが被覆された前記プラスチツク基板、あ
るいは前記金属または前記プラスチツクが被覆さ
れたセラミツクス基板である。 The base body 1 is made of metal such as aluminum alloy, titanium alloy, or stainless steel, or polyester, polyimide, polyamideimide, polyether sulfon, polysulfon, aromatic polyether, epoxy resin, urea resin, melamine resin, polycarbonate, diallyl phthalate resin. , acrylic resin, phenolic resin, polyphenylene sulfide, polyphenylene ether, polyacetal resin, polybutylene terephthalate, bismaleimide triazine resin, polyoxybenzylene resin,
Plastics such as polyamino bismaleimide resin, polyphenylene oxide, polyphenylene sulfide, ceramics such as glass, silicon, germanium, alumina, silica, diamond, anodized alumite coated aluminum alloy, Ni-P plating film, Cr,
A laminated alloy substrate such as an aluminum alloy, titanium alloy, or stainless steel coated with a metal such as FeNi, stainless steel, Mo, or W, or the above plastic, or the above ceramic, or the above plastic substrate coated with the above metal or the above ceramic, or the above metal or A ceramic substrate coated with the plastic.
次にこの下地体1の上に被覆されるに磁性媒体
2としてFe3O4、γ−Fe2O3、Fe3N4、バリウム
フエライトなどの鉄酸化物または鉄窒化物などの
セラミツクスまたはCo、Co−Ni、Co−Ni−P、
Co−Mn−P、Co−Mn−Ni−P、Co−Re、Co
−Ni−Re、Co−Mn−Re−P、Co−Cr、Co−
Fe−Cr、Co−V、Co−Ru、Co−Os、Co−Pt、
Co−Ni−Pt、Co−Pt−Cr、Co−Pt−V、Co−
Rh、Co−Cr−Rh、Co−Ni−Mo、Co−Ni−
Cr、Co−Ni−W、Co−Sm、などのコバルトを
含む金属またはFe−Mg、Fe−Nd、Fe−Ag、
Fe−Pd、Fe−Tbなどの鉄を含む金属またはMn
−Al、Mn−Cu−Alなどのマンガンを含む金属
が用いられる。 Next, this base body 1 is coated with a magnetic medium 2 made of Fe 3 O 4 , γ-Fe 2 O 3 , Fe 3 N 4 , ceramics such as iron oxide or iron nitride such as barium ferrite, or Co. , Co-Ni, Co-Ni-P,
Co-Mn-P, Co-Mn-Ni-P, Co-Re, Co
−Ni−Re, Co−Mn−Re−P, Co−Cr, Co−
Fe-Cr, Co-V, Co-Ru, Co-Os, Co-Pt,
Co-Ni-Pt, Co-Pt-Cr, Co-Pt-V, Co-
Rh, Co−Cr−Rh, Co−Ni−Mo, Co−Ni−
Metals containing cobalt such as Cr, Co-Ni-W, Co-Sm, or Fe-Mg, Fe-Nd, Fe-Ag,
Metals containing iron such as Fe-Pd, Fe-Tb or Mn
Metals containing manganese such as -Al and Mn-Cu-Al are used.
潤滑剤4は次の一般式で表される。 The lubricant 4 is represented by the following general formula.
ここでR、R′、R″、R、R′′′′、R′′′′
′は−Cn
H2n+1、−CnF2n+1(mは1以上の整数)または
C6H6、C6H6CH2C1、C6H6CH2OOCH3、
C2H4C6H6、C6H6CH3、C6H6Si(CH3)3、−X(X
は−H、−COOH、−NCO、−M(OR)-3oRn(nは
0、1または2、MはSi、Ti、Zr、Ge、Snなど
の金属または半金属)、−CN、−NH2、−NRH、−
NH−、−CH−CH2、−SO3H、−NO、−OH、−
COOR、−NHCONH−、−NHCO−、−NCS、−
SH、−CONH2、−PO(OH)2、=PO(OH)、=PO
−、=P−、−O−、−S−(Rは−CnH2n+1、nは1
以上の整数)、−CH2−O−O−CH2−、−CH=
CH2、−C≡CHなどの官能基)などのいずれかで
ある。 Here R, R′, R″, R, R′′′′, R′′′′
′ is −C n
H 2n+1 , −C n F 2n+1 (m is an integer greater than or equal to 1) or
C 6 H 6 , C 6 H 6 CH 2 C1, C 6 H 6 CH 2 OOCH 3 ,
C2H4C6H6 , C6H6CH3 , C6H6Si ( CH3 ) 3 , -X ( X
is -H, -COOH, -NCO, -M(OR) -3o Rn (n is 0, 1 or 2, M is a metal or metalloid such as Si, Ti, Zr, Ge, Sn), -CN, - NH 2 , −NRH, −
NH−, −CH−CH 2 , −SO 3 H, −NO, −OH, −
COOR, −NHCONH−, −NHCO−, −NCS, −
SH, −CONH 2 , −PO(OH) 2 , =PO(OH), =PO
-, =P-, -O-, -S- (R is -C n H 2n+1 , n is 1
or larger integer), -CH 2 -O-O-CH 2 -, -CH=
CH 2 , -C≡CH, and other functional groups).
第2図は、本発明の別の磁気記憶体の部分断面
図である。第2図において、下地体1および磁性
媒体2、潤滑剤4は第1図と同じであるが磁性媒
体2と潤滑剤4の間に保護膜3が被覆されてい
る。該保護膜3はSiO2、Si3N4、SiCまたは珪酸
重合物などの珪酸化合物またはAl2O3、CoO、
Co3O4、Co2O3、α−Fe2O3、Cr2O3、CrO3、
TiO2、ZrO2、Zno、PbO、NiO、MoO2または
SnO2などの金属酸化物またはTiN、ZrN、CrN、
TaN、BNなどの金属窒化物またはMoS2、WS2、
TaS2などの金属硫化物あるいはTiC、ZrC、
CrC、TaCなどの金属炭化物またはふつ化黒鉛な
どの金属ふつ化物またはW、Cr、Ir、NiB、
NiP、FeCr、NiCr、Sn、Pb、Zn、Tl、Au、
Ag、Cu、Ga、Ru、Rh、Mn、Mo、Osまたは
Taまたはそれらの合金などの金属または合金ま
たはSi、Ge、B、C(非晶質あるいはダイアモン
ド状あるいはその混合物)などの半導体あるいは
ポリテトラフルオロエチレン、フエノール樹脂、
ポリイミドなどのプラスチツクが用いられる。該
保護膜3の上に被覆される表面改質層4は用いら
れる保護膜により最適な物質が決められる。表面
改質層4は第1図のところで説明したような官能
基を含む化合物であり、保護膜3が上記金属の場
合は上記官能基の中で−COOH、−CH−CH2、−
NH2、−CNが最適である。また保護膜3が上記
珪素化合物、金属酸化物、金属窒化物、金属硫化
物、金属炭化物、半導体などのセラミツクスの場
合は、上記官能基の中でも−Si(OR)3-oRnが最
も適している。また保護膜3がプラスチツクの場
合は、−CH−CH2、−NH2、−CN、−CH=CH−、
−C≡C−、−CH2−O−O−CH2−が最適であ
る。 FIG. 2 is a partial cross-sectional view of another magnetic storage body of the present invention. In FIG. 2, the base body 1, magnetic medium 2, and lubricant 4 are the same as in FIG. 1, but a protective film 3 is coated between the magnetic medium 2 and the lubricant 4. The protective film 3 is made of SiO 2 , Si 3 N 4 , SiC, or a silicic acid compound such as a silicic acid polymer, or Al 2 O 3 , CoO,
Co3O4 , Co2O3 , α- Fe2O3 , Cr2O3 , CrO3 ,
TiO2 , ZrO2 , Zno, PbO, NiO, MoO2 or
Metal oxides such as SnO2 or TiN, ZrN, CrN,
Metal nitrides such as TaN, BN or MoS2 , WS2 ,
Metal sulfides such as TaS 2 or TiC, ZrC,
Metal carbides such as CrC, TaC, metal fluorides such as graphite fluoride, or W, Cr, Ir, NiB,
NiP, FeCr, NiCr, Sn, Pb, Zn, Tl, Au,
Ag, Cu, Ga, Ru, Rh, Mn, Mo, Os or
metals or alloys such as Ta or their alloys; semiconductors such as Si, Ge, B, C (amorphous or diamond-like or mixtures thereof); or polytetrafluoroethylene, phenolic resins;
Plastics such as polyimide are used. The most suitable material for the surface modification layer 4 coated on the protective film 3 is determined depending on the protective film used. The surface modification layer 4 is a compound containing functional groups as explained in FIG .
NH2 , -CN is optimal. Furthermore, when the protective film 3 is made of ceramics such as the above-mentioned silicon compounds, metal oxides, metal nitrides, metal sulfides, metal carbides, semiconductors, etc., among the above-mentioned functional groups, -Si(OR) 3-o Rn is most suitable. There is. When the protective film 3 is made of plastic, -CH-CH 2 , -NH 2 , -CN, -CH=CH-,
-C≡C-, -CH2 -O-O- CH2- is optimal.
(作用)
前記潤滑剤4はその分子中に含まれる梯状(ラ
ダー型)のSiO結合のため潤滑剤の耐荷重能が高
く耐摩耗性に優れておりまた耐熱性も高い。また
極性がR、R′、R″、R’、R′′′′、R′′′′
によつ
て遮閉されているため表面張力が低くヘツドと磁
気記憶体との吸着を起こしにくいなどの優れた特
性を有している。(Function) The lubricant 4 has a high load-bearing capacity, excellent wear resistance, and high heat resistance due to the ladder-shaped SiO bonds contained in its molecules. Also, the polarity is R, R', R'', R', R''''', R'''''
Since it is shielded by a magnetic recording medium, it has excellent properties such as low surface tension and resistance to adhesion between the head and the magnetic memory.
(実施例)
以下、実施例により本発明を説明する。ここで
は以下に示す試料と比較試料を作製しその特性を
測定した。(Example) The present invention will be explained below with reference to Examples. Here, the following samples and comparative samples were prepared and their characteristics were measured.
試料1
アルミ合金基板の上にニツケル−燐めつき膜が
被覆され表面粗さ0.02umに鏡面仕上げされた下
地体1の上に、磁性媒体2としてコバルト−ニツ
ケル−燐合金を0.05umの厚さにめつきした。次
にこの磁性媒体2の上に保護膜3として特開昭52
−20804号公報に示されたようなポリ珪酸(珪酸
重合物)を回転塗布法により500Aの厚さに被覆
し250℃で焼成した。次にこの保護膜3の上に潤
滑剤4として一般式(1)中のR、R′、R″、R、
R′′′′およびR′′′′′がCH3であり、nが10〜2
0であ
るラダー型ポリシロキサンを20オングストローム
の厚さに被覆して、磁気デイスクを作つた。Sample 1 A cobalt-nickel-phosphorus alloy with a thickness of 0.05 um was placed as a magnetic medium 2 on the base body 1, which was an aluminum alloy substrate coated with a nickel-phosphorus plating film and mirror-finished to a surface roughness of 0.02 um. I glared. Next, as a protective film 3 on this magnetic medium 2,
Polysilicic acid (silicic acid polymer) as disclosed in Japanese Patent No. 20804 was coated to a thickness of 500A by a spin coating method and baked at 250°C. Next, on this protective film 3, R, R', R'', R, R in general formula (1),
R′′′′ and R′′′′′ are CH 3 and n is 10 to 2
Magnetic disks were made by coating a ladder-type polysiloxane with a thickness of 20 angstroms.
この磁気デイスクを100000回のCSS試験により
耐摩耗性を評価したところヘツドおよび磁気デイ
スクの表面には傷は全く認められなかつた。また
ヘツドと磁気デイスクを70時間放置してその間に
働く吸着力を測定したところ放置しないときに比
べ、1.2倍の増加にとどまつた。 When the wear resistance of this magnetic disk was evaluated by CSS testing 100,000 times, no scratches were observed on the surface of the head or magnetic disk. In addition, when the head and magnetic disk were left for 70 hours and the adsorption force acting during that time was measured, the increase was only 1.2 times compared to when it was not left.
試料2
試料1と同様にして但し潤滑剤4として一般式
(1)中のR、R′、R″、R、R′′′′およびR′′
′′′が
C6H5であり、nが5であるラダー型ポリシロキ
サンを被覆して、磁気デイスクを作つた。Sample 2 Same as sample 1, but with the general formula as lubricant 4.
(1) R, R', R'', R, R''''' and R''
'''but
A magnetic disk was made by coating a ladder type polysiloxane of C 6 H 5 and n=5.
この磁気デイスクを100000回のCSS試験により
耐摩耗性を評価したところヘツドおよび磁気デイ
スクの表面には傷は全く認められなかつた。また
ヘツドと磁気デイスクを70時間放置してその間に
働く吸着力を測定したところ放置しないときに比
べ、1.2倍の増加にとどまつた。 When the wear resistance of this magnetic disk was evaluated by CSS testing 100,000 times, no scratches were observed on the surface of the head or magnetic disk. In addition, when the head and magnetic disk were left for 70 hours and the adsorption force acting during that time was measured, the increase was only 1.2 times compared to when it was not left.
試料3
試料1と同様にして但し磁性媒体2の上に保護
膜3として無電解めつき法によりニツケル−燐を
100A被覆しその上に潤滑剤4として一般式(1)中
のR、RはCH3であり、R′、R′′′′はC2H4C6F13
であり、R′′′′′、R″はCH2COOHであり、nが5
であるラダー型ポリシロキサンを20オングストロ
ームの厚さに被覆して、磁気デイスクを作つた。Sample 3 Same as Sample 1, except that nickel-phosphorus was applied as a protective film 3 on the magnetic medium 2 by electroless plating.
R and R in the general formula (1) are CH 3 and R' and R''''' are C 2 H 4 C 6 F 13
, R′′′′′, R″ is CH 2 COOH, and n is 5
A magnetic disk was made by coating a ladder-type polysiloxane with a thickness of 20 angstroms.
この磁気デイスクを100000回のCSS試験により
耐摩耗性を評価したところヘツドおよび磁気デイ
スクの表面には傷は全く認められなかつた。また
ヘツドと磁気デイスクを70時間放置してその間に
働く吸着力を測定したところ放置しないときに比
べ、1.2倍の増加にとどまつた。 When the wear resistance of this magnetic disk was evaluated by CSS testing 100,000 times, no scratches were observed on the surface of the head or magnetic disk. In addition, when the head and magnetic disk were left for 70 hours and the adsorption force acting during that time was measured, the increase was only 1.2 times compared to when it was not left.
試料4
試料1と同様にして但し磁性媒体2の上に保護
膜として、スパツタ法によりカーボンを200オン
グストローム被覆した後、潤滑剤4として一般式
(1)中のR、RはCH3であり、R、R′′′′は
C2H4C6F13であり、R′′′′′、R″はCH3であり、n
が10であるラダー型ポリシロキサンを被覆して磁
気デイスクを作つた。Sample 4 Same as Sample 1, except that 200 angstroms of carbon was coated as a protective film on the magnetic medium 2 by sputtering method, and then the general formula was applied as lubricant 4.
R and R in (1) are CH 3 , and R and R′′′′ are
C 2 H 4 C 6 F 13 , R′′′′′, R″ is CH 3 , n
A magnetic disk was made by coating it with a ladder-type polysiloxane having a diameter of 10.
この磁気デイスクを100000回のCSS試験により
耐摩耗性を評価したところヘツドおよび磁気デイ
スクの表面には傷は全く認められなかつた。また
ヘツドと磁気デイスクを70時間放置してその間に
働く吸着力を測定したところ放置しないときに比
べ、1.2倍の増加にとどまつた。 When the wear resistance of this magnetic disk was evaluated by CSS testing 100,000 times, no scratches were observed on the surface of the head or magnetic disk. In addition, when the head and magnetic disk were left for 70 hours and the adsorption force acting during that time was measured, the increase was only 1.2 times compared to when it was not left.
試料5
試料1と同様にして但し保護膜3の上に潤滑剤
4として一般式(1)中のR、R、R′、R′′′′は
CH3であり、R′′′′′、R″はHであり、nが20であ
るラダー型ポリシロキサンを被覆して、磁気デイ
スクを作つた。Sample 5 Same as Sample 1, except that R, R, R', and R''''' in general formula (1) are
A magnetic disk was made by coating a ladder-type polysiloxane in which CH 3 was CH 3 , R′′′′′, R″ was H, and n was 20.
この磁気デイスクを100000回のCSS試験により
耐摩耗性を評価したところヘツドおよび磁気デイ
スクの表面には傷は全く認められなかつた。また
ヘツドと磁気デイスクを70時間放置してその間に
働く吸着力を測定したところ放置しないときに比
べ、1.2倍の増加にとどまつた。 When the wear resistance of this magnetic disk was evaluated by CSS testing 100,000 times, no scratches were observed on the surface of the head or magnetic disk. In addition, when the head and magnetic disk were left for 70 hours and the adsorption force acting during that time was measured, the increase was only 1.2 times compared to when it was not left.
試料6
試料1と同様にして但し下地体1としてCrを
NiPめつき層の上にスパツタ法により1umの厚さ
に被覆しその上に磁性媒体2としてCoNi合金を
スパツタ法により0.05umの厚さに被覆しその上
に保護膜として、スパツタ法によりCrを200オン
グストローム被覆した後、潤滑剤4として一般式
(1)中のR、R、R′、R′′′′はCH3であり、R′
′′′′、
R″はCH2NH2であり、nが20であるラダー型ポ
リシロキサンを被覆して、磁気デイスクを作つ
た。Sample 6 Same as sample 1 except that Cr was used as the base body 1.
The NiP plating layer is coated with a thickness of 1 um by a sputtering method, and then a CoNi alloy is coated as a magnetic medium 2 with a thickness of 0.05 um by a sputtering method. After coating 200 angstroms, the general formula as lubricant 4
R, R, R′, R′′′′ in (1) are CH 3 , and R′
′′′′,
R'' is CH 2 NH 2 and a magnetic disk was made by coating a ladder-type polysiloxane with n=20.
この磁気デイスクを100000回のCSS試験により
耐摩耗性を評価したところヘツドおよび磁気デイ
スクの表面には傷は全く認められなかつた。また
ヘツドと磁気デイスクを70時間放置してその間に
働く吸着力を測定したところ放置しないときに比
べ、1.2倍の増加にとどまつた。 When the wear resistance of this magnetic disk was evaluated by CSS testing 100,000 times, no scratches were observed on the surface of the head or magnetic disk. In addition, when the head and magnetic disk were left for 70 hours and the adsorption force acting during that time was measured, the increase was only 1.2 times compared to when it was not left.
試料7
試料1と同様にして但し磁性媒体2の上に保護
膜3として、NiPを無電解めつきにより500オン
グストローム被覆した後、300℃で2時間焼成し
て表面に100オングストロームのNiOを形成させ
その上に潤滑剤4として一般式(1)中のR、R′、
R、R′′′′はCH3であり、R′′′′′、R″はCH
2Si
(OCH3)3であり、nが20であるラダー型ポリシ
ロキサンを被覆して、磁気デイスクを作つた。Sample 7 Same as Sample 1, except that 500 angstroms of NiP was coated on the magnetic medium 2 as a protective film 3 by electroless plating, and then baked at 300°C for 2 hours to form 100 angstroms of NiO on the surface. On top of that, as a lubricant 4, R, R' in general formula (1),
R, R′′′′ is CH 3 , R′′′′′, R″ is CH
2Si
A magnetic disk was made by coating a ladder-type polysiloxane with (OCH 3 ) 3 and n=20.
この磁気デイスクを100000回のCSS試験により
耐摩耗性を評価したところヘツドおよび磁気デイ
スクの表面には傷は全く認められなかつた。また
ヘツドと磁気デイスクを70時間放置してその間に
働く吸着力を測定したところ放置しないときに比
べ、1.2倍の増加にとどまつた。 When the wear resistance of this magnetic disk was evaluated by CSS testing 100,000 times, no scratches were observed on the surface of the head or magnetic disk. In addition, when the head and magnetic disk were left for 70 hours and the adsorption force acting during that time was measured, the increase was only 1.2 times compared to when it was not left.
試料8
試料1と同様にして但し磁性媒体2として
γFe2O3をスパツタ法により0.1umの厚さで被覆
し該磁性媒体の上に、潤滑剤4として一般式(1)中
のR、R″、R、R′′′′、R′′′′はCH3であり
、
R′はOCH3であり、nは20であるラダー型ポリシ
ロキサンを被覆して、磁気デイスクを作つた。Sample 8 Same as Sample 1 except that γFe 2 O 3 was coated as the magnetic medium 2 to a thickness of 0.1 um by sputtering, and R and R in general formula (1) were coated as the lubricant 4 on the magnetic medium. ″, R, R′′″, R′′″ are CH 3 ;
A magnetic disk was made by coating a ladder type polysiloxane where R' is OCH 3 and n is 20.
試料9
試料1と同様にして但し磁性媒体2として
CoCr合金をスパツタ法により0.1umの厚さで被
覆し該磁性媒体の上に、潤滑剤4として一般式(1)
中のR、R″、R、R′′′′、R′′′′′はCH3で
あり、
R′はCH2COOHであり、nが20であるラダー型
ポリシロキサンを被覆して、磁気デイスクを作つ
た。Sample 9 Same as sample 1, but as magnetic medium 2
A CoCr alloy is coated with a thickness of 0.1 um by a sputtering method, and the lubricant 4 is coated on the magnetic medium using the general formula (1).
R, R″, R, R′′′′, R′′′′′ in it are CH 3 ,
A magnetic disk was made by coating a ladder-type polysiloxane in which R' was CH 2 COOH and n was 20.
この磁気デイスクを100000回のCSS試験により
耐摩耗性を評価したところヘツドおよび磁気デイ
スクの表面には傷は全く認められなかつた。また
ヘツドと磁気デイスクを70時間放置してその間に
働く吸着力を測定したところ放置しないときに比
べ、1.2倍の増加にとどまつた。 When the wear resistance of this magnetic disk was evaluated by CSS testing 100,000 times, no scratches were observed on the surface of the head or magnetic disk. In addition, when the head and magnetic disk were left for 70 hours and the adsorption force acting during that time was measured, the increase was only 1.2 times compared to when it was not left.
試料10
試料1と同様にして但し磁性媒体2の上に保護
膜3としてSnを無電解めつき法により0.05umの
厚さで被覆し250℃で焼成してSnO2を形成した
後、該保護膜3の上に、潤滑剤4として一般式(1)
中のR、RはCH3であり、R′、R′′′′は
C2H4CF3であり、R′′′′′、R”はCH2Si(OCH3)3
であり、nが20であるラダー型ポリシロキサンを
被覆して、磁気デイスクを作つた。Sample 10 Same as sample 1, except that Sn was coated on the magnetic medium 2 to a thickness of 0.05 um as a protective film 3 by electroless plating method and baked at 250°C to form SnO 2 . On the film 3, as a lubricant 4, the general formula (1)
R and R are CH 3 , and R′ and R′′′′ are
C 2 H 4 CF 3 and R′′′′′, R” is CH 2 Si(OCH 3 ) 3
A magnetic disk was made by coating a ladder-type polysiloxane with n=20.
この磁気デイスクを100000回のCSS試験により
耐摩耗性を評価したところヘツドおよび磁気デイ
スクの表面には傷は全く認められなかつた。また
ヘツドと磁気デイスクを70時間放置してその間に
働く吸着力を測定したところ放置しないときに比
べ、1.2倍の増加にとどまつた。 When the wear resistance of this magnetic disk was evaluated by CSS testing 100,000 times, no scratches were observed on the surface of the head or magnetic disk. In addition, when the head and magnetic disk were left for 70 hours and the adsorption force acting during that time was measured, the increase was only 1.2 times compared to when it was not left.
試料11
試料1と同様にして但し保護膜3としてBNを
スパツタ法により0.1umの厚さで被覆し該保護膜
の上に、潤滑剤4として一般式(1)中のR、Rは
CH3であり、R′、R′′′′はC2H4CF3であり、R
′′′′′、R″はCH2OOCCH2(CF2)(CF3)CF2O)n
CF3であり、nは20、mは10であるラダー型ポリ
シロキサンを被覆して、磁気デイスクを作つた。Sample 11 Same as sample 1 except that BN was coated as a protective film 3 with a thickness of 0.1 um by sputtering method, and on top of the protective film, R and R in the general formula (1) were used as a lubricant 4.
CH 3 , R′, R′′′′ are C 2 H 4 CF 3 , R
′′′′′, R″ is CH 2 OOCCH 2 (CF 2 ) (CF 3 ) CF 2 O) n
A magnetic disk was made by coating a ladder-type polysiloxane of CF 3 with n=20 and m=10.
この磁気デイスクを100000回のCSS試験により
耐摩耗性を評価したところヘツドおよび磁気デイ
スクの表面には傷は全く認められなかつた。また
ヘツドと磁気デイスクを70時間放置してその間に
働く吸着力を測定したところ放置しないときに比
べ、1.2倍の増加にとどまつた。 When the wear resistance of this magnetic disk was evaluated by CSS testing 100,000 times, no scratches were observed on the surface of the head or magnetic disk. In addition, when the head and magnetic disk were left for 70 hours and the adsorption force acting during that time was measured, the increase was only 1.2 times compared to when it was not left.
試料15
試料1と同様にして但し保護膜3としてTiCを
スパツタ法により0.1umの厚さで被覆し該保護膜
の上に、潤滑剤4として一般式(1)中のR、Rは
CH3であり、R′、R′′′′はC2H4CF3であり、R
′′′′′、R″はCH2OOCCH2(C2F4O)p(CF2O)q
COOHであり、nが20、pは10、qは8である
ラダー型ポリシロキサンを被覆して、磁気デイス
クを作つた。Sample 15 Same as Sample 1 except that TiC was coated with a thickness of 0.1 um as a protective film 3 by a sputtering method, and on top of the protective film, R and R in the general formula (1) were used as a lubricant 4.
CH 3 , R′, R′′′′ are C 2 H 4 CF 3 , R
′′′′′, R″ is CH 2 OOCCH 2 (C 2 F 4 O) p (CF 2 O) q
A magnetic disk was made by coating a ladder-type polysiloxane of COOH with n=20, p=10, and q=8.
この磁気デイスクを100000回のCSS試験により
耐摩耗性を評価したところヘツドおよび磁気デイ
スクの表面には傷は全く認められなかつた。また
ヘツドと磁気デイスクを70時間放置してその間に
働く吸着力を測定したところ放置しないときに比
べ、1.2倍の増加にとどまつた。 When the wear resistance of this magnetic disk was evaluated by CSS testing 100,000 times, no scratches were observed on the surface of the head or magnetic disk. In addition, when the head and magnetic disk were left for 70 hours and the adsorption force acting during that time was measured, the increase was only 1.2 times compared to when it was not left.
比較試料1
試料1と同様にして但し潤滑剤4として下記の
構造を有するパーフロロアルキルポリエーテルを
被覆して、磁気デイスクを作つた。Comparative Sample 1 A magnetic disk was prepared in the same manner as Sample 1 except that a perfluoroalkyl polyether having the following structure was coated as lubricant 4.
パーフロロアルキルポリエーテル
F(C2F4O)p(CF2O)qCF3
この磁気デイスクを20000回のCSS試験により
耐摩耗性を評価したところヘツドおよび磁気デイ
スクの表面に磁性媒体に達する傷が発生した。ま
たヘツドと磁気デイスクを70時間放置してその間
に働く吸着力を測定したところ放置しないときに
比べ、10倍の増加が見られた。Perfluoroalkyl polyether F (C 2 F 4 O) p (CF 2 O) q CF 3The wear resistance of this magnetic disk was evaluated through 20,000 CSS tests, and the magnetic medium reached the surface of the head and magnetic disk. A wound occurred. In addition, when the head and magnetic disk were left for 70 hours and the adhesion force acting during that time was measured, it was found to have increased tenfold compared to when it was not left.
比較試料2
試料3と同様にして但し保護膜3の上に、潤滑
剤4として下記の構造を有するジメチルシリコー
ンオイルを被覆して、磁気デイスクを作つた。Comparative Sample 2 A magnetic disk was fabricated in the same manner as Sample 3, except that dimethyl silicone oil having the following structure was coated on the protective film 3 as a lubricant 4.
ジメチルシリコーンオイル
H3C(Si(CH3)2O)oSi(CH3)3
この磁気デイスクを20000回のCSS試験により
耐摩耗性を評価したところヘツドおよび磁気デイ
スクの表面に磁性媒体に達する傷が発生した。ま
たヘツドと磁気デイスクを70時間放置してその間
に働く吸着力を測定したところ放置しないときに
比べ、15倍の増加が見られた。Dimethyl silicone oil H 3 C (Si (CH 3 ) 2 O) o Si (CH 3 ) 3 When the wear resistance of this magnetic disk was evaluated through 20,000 CSS tests, the magnetic medium reached the surface of the head and magnetic disk. A wound occurred. In addition, when the head and magnetic disk were left for 70 hours and the adsorption force acting during that time was measured, it was found to have increased 15 times compared to when it was not left.
(発明の効果)
以上のように本発明の磁気記憶体は耐摩耗性に
優れ、かつヘツドとデイスクの吸着を生じにくく
磁気デイスクの信頼性を飛躍的に向上できること
が分かつた。(Effects of the Invention) As described above, it has been found that the magnetic storage body of the present invention has excellent wear resistance and is less likely to cause adhesion between the head and the disk, and can dramatically improve the reliability of the magnetic disk.
なお本発明の実施例では磁気デイスクについて
述べたがフロツピーデイスク、磁気テープ、磁気
カードにも本発明が有効であることは明らかであ
る。 In the embodiments of the present invention, magnetic disks have been described, but it is clear that the present invention is also effective for floppy disks, magnetic tapes, and magnetic cards.
第1図および第2図は本発明を示す部分断面図
である。
1……下地体、2……磁性媒体、3……保護
膜、4……潤滑剤である。
1 and 2 are partial cross-sectional views showing the present invention. 1... Base body, 2... Magnetic medium, 3... Protective film, 4... Lubricant.
Claims (1)
媒体上に直接または保護膜を介してラダー型ポリ
シロキサンからなる濡滑剤が被覆されてなる構造
を有することを特徴とする磁気記憶体。1. A magnetic memory having a structure in which a magnetic medium is coated on a base body, and a wetting agent made of ladder-type polysiloxane is further coated on the medium directly or through a protective film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23165785A JPS6289228A (en) | 1985-10-16 | 1985-10-16 | Magnetic storage medium |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP23165785A JPS6289228A (en) | 1985-10-16 | 1985-10-16 | Magnetic storage medium |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6289228A JPS6289228A (en) | 1987-04-23 |
| JPH0548529B2 true JPH0548529B2 (en) | 1993-07-21 |
Family
ID=16926927
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP23165785A Granted JPS6289228A (en) | 1985-10-16 | 1985-10-16 | Magnetic storage medium |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6289228A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0528466A (en) * | 1991-07-22 | 1993-02-05 | Fuji Photo Film Co Ltd | Metal thin film magnetic recording medium |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52140303A (en) * | 1976-05-18 | 1977-11-22 | Sony Corp | Magnetic record medium |
| JPS5613527A (en) * | 1979-07-11 | 1981-02-09 | Fuji Photo Film Co Ltd | Magnetic recording medium |
-
1985
- 1985-10-16 JP JP23165785A patent/JPS6289228A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6289228A (en) | 1987-04-23 |
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