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JPH0548615B2 - - Google Patents
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JPH0548615B2 - - Google Patents

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Publication number
JPH0548615B2
JPH0548615B2 JP59277538A JP27753884A JPH0548615B2 JP H0548615 B2 JPH0548615 B2 JP H0548615B2 JP 59277538 A JP59277538 A JP 59277538A JP 27753884 A JP27753884 A JP 27753884A JP H0548615 B2 JPH0548615 B2 JP H0548615B2
Authority
JP
Japan
Prior art keywords
reflecting mirror
drive mechanism
synchrotron
vacuum
reflector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59277538A
Other languages
Japanese (ja)
Other versions
JPS61154034A (en
Inventor
Junichi Iizuka
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
Original Assignee
Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP59277538A priority Critical patent/JPS61154034A/en
Publication of JPS61154034A publication Critical patent/JPS61154034A/en
Publication of JPH0548615B2 publication Critical patent/JPH0548615B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10PGENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P95/00Generic processes or apparatus for manufacture or treatments not covered by the other groups of this subclass

Landscapes

  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、シンクロトロンから放射されるX線
ビームを反射鏡の振動で掃引するX線露光装置に
係り、特に、該反射鏡を振動させる駆動機構の構
成に関する。
[Detailed Description of the Invention] [Industrial Application Field] The present invention relates to an X-ray exposure apparatus that sweeps an X-ray beam emitted from a synchrotron by vibrating a reflecting mirror, and particularly relates to an This relates to the configuration of the drive mechanism.

半導体装置製造などのウエーハプロセスに使用
されるリソグラフイ技術において、露光に使用さ
れる照射ビームは、パターンの微細化に伴つて可
視光から遠紫外線へと短波長化してきており、更
にX線の採用が研究されている。
In lithography technology used in wafer processes such as semiconductor device manufacturing, the wavelength of the irradiation beam used for exposure has been shortened from visible light to deep ultraviolet rays as patterns become finer, and X-rays are also becoming shorter in wavelength. Recruitment is being studied.

このX線源には、シンクロトロンの回転してい
る電子から接線方向に放射される放射線、所謂
SOR(Synchrotron Orbit Radiation)光が、鋭
い指向性、レーザ光に匹敵する平行性、広い波長
範囲(0.1Å〜数1000Å)に亙る連続的なスペク
トル分布などの優れた特徴を有することから、最
有力視されている。
This X-ray source contains radiation emitted tangentially from the rotating synchrotron electrons, the so-called
SOR (Synchrotron Orbit Radiation) light has excellent characteristics such as sharp directivity, parallelism comparable to laser light, and continuous spectral distribution over a wide wavelength range (0.1 Å to several thousand Å), making it the most promising. being watched.

しかしながら第3図に示すように、SOR光の
X線ビーム1は、電子の回転軌道2の面に平行な
a方向には所望の大きさの幅を得ることが出来る
が、該面に対して直角なb方向の幅が極めて小さ
いため、露光に使用する場合には、一つの方法と
して、ビーム1の光路の途中に反射鏡3を配置し
これをc方向に振動させてビーム1をb方向に掃
引し、所望の露光領域を形成している。
However, as shown in FIG. 3, the X-ray beam 1 of the SOR light can obtain a desired width in the a direction parallel to the plane of the electron rotational orbit 2; Since the width in the perpendicular b direction is extremely small, when using it for exposure, one method is to place a reflector 3 in the middle of the optical path of beam 1 and vibrate it in the c direction to direct the beam 1 in the b direction. to form the desired exposure area.

反射鏡3は、白金(Pt)や金(Au)などの金
属で形成される反射面にビーム1が入射すると、
大気中の炭化水素などの焼きつきによる反射率の
低下を生ずるので、これを防ぐため、通常、回転
軌道2が形成される真空室に連通した真空中に配
置される。
When the beam 1 is incident on the reflecting surface of the reflecting mirror 3, which is made of metal such as platinum (Pt) or gold (Au),
Since the reflectance decreases due to burn-in of hydrocarbons in the atmosphere, in order to prevent this, the rotary track 2 is usually placed in a vacuum communicating with a vacuum chamber in which the rotating orbit 2 is formed.

一方、シンクロトロンX線源を使用した露光装
置は、シンクロトロンが高価であるため、一つの
シンクロトロンに複数の露光部を設けてコストパ
ーフオマンスを高めることが考えられている。
On the other hand, since the synchrotron in an exposure apparatus using a synchrotron X-ray source is expensive, it has been considered to increase cost efficiency by providing a single synchrotron with a plurality of exposure sections.

この場合、回転軌道2が形成される真空室の真
空度劣化は、露光装置全体を稼働不能にして影響
が大きいため、反射鏡3を配設する真空領域にお
いても気密不良になる恐れのない構成にすること
が重要である。
In this case, deterioration of the degree of vacuum in the vacuum chamber in which the rotating orbit 2 is formed has a large effect, rendering the entire exposure apparatus inoperable, so the configuration is such that there is no risk of poor airtightness even in the vacuum area where the reflecting mirror 3 is installed. It is important to

〔従来の技術〕[Conventional technology]

第4図は上述のX線露光装置において、反射鏡
を振動させる従来の駆動機構の構成を示す側断面
模式図である。
FIG. 4 is a schematic side sectional view showing the configuration of a conventional drive mechanism for vibrating a reflecting mirror in the above-mentioned X-ray exposure apparatus.

ちなみにこの駆動機構は、例えば文献
“Journal of Vacuum Science Technology,
B,Vol.1、No.4、1984、P.1271”に示されたも
のと同類のものである。
By the way, this drive mechanism is described in the document “Journal of Vacuum Science Technology,” for example.
B, Vol. 1, No. 4, 1984, P. 1271".

第4図において、1と3はそれぞれ第3図図示
のX線ビームと反射鏡、4は反射鏡3の配設領域
を真空に保つ反射鏡室、5はシンクロトロンから
のビーム1をは反射鏡3に導入するビーム導入
管、6は反射鏡3で反射したビーム1を図示され
ない露光部に導出するビーム導出管、7はビーム
1を透過させる材料例えばベリリウム(Be)な
どからなり反射鏡室4を外気から隔絶して真空に
保つためビーム導出管6に設けられた窓である。
In Fig. 4, 1 and 3 are the X-ray beam and reflecting mirror shown in Fig. 3, respectively, 4 is a reflecting mirror room that keeps the area where the reflecting mirror 3 is placed in a vacuum, and 5 is the reflecting mirror that reflects the beam 1 from the synchrotron. A beam introducing tube 6 introduces the beam into the mirror 3, a beam guiding tube 6 guides the beam 1 reflected by the reflecting mirror 3 to an exposure section (not shown), and a reflecting mirror chamber 7 is made of a material such as beryllium (Be) that transmits the beam 1. This is a window provided in the beam extraction tube 6 to isolate the beam from the outside air and keep it in a vacuum.

また、8は反射鏡3をc方向に揺動可能にその
一端部(図上右側)を支持する支持棒、9は反射
鏡3の他端部(図上左側)を支持し反射鏡3をc
方向に振動させる駆動棒、10は反射鏡室4の外
にあり駆動棒9を駆動する加振機、11は反射鏡
室4を外気から隔絶して真空に保つため駆動棒9
の中間と反射鏡室4とに接合されて駆動棒9の移
動に追随して伸縮可能なベローズであつて、駆動
棒9と加振機10とベローズ11とで反射鏡3を
振動させる駆動機構12を形成している。
Further, 8 is a support rod that supports one end (right side in the figure) of the reflector 3 so as to be able to swing in the c direction, and 9 is a support rod that supports the other end (left side in the figure) of the reflector 3 and supports the reflector 3. c.
A drive rod 10 is located outside the reflector chamber 4 and drives the drive rod 9. Reference numeral 11 is a drive rod 9 that isolates the reflector chamber 4 from the outside air and keeps it in a vacuum.
The bellows is connected to the middle of the mirror chamber 4 and the mirror chamber 4 and is expandable and contractible following the movement of the drive rod 9, and is a drive mechanism that vibrates the reflector 3 using the drive rod 9, the vibrator 10, and the bellows 11. 12 is formed.

ビーム導入管5を通り反射鏡3に入射したビー
ム1は、ビーム導出管6を通り露光部に向けて反
射する際に反射鏡3の振動によりb方向に掃引さ
れ、先に述べたように露光部において所望の露光
領域を形成する。
The beam 1 that has passed through the beam introduction tube 5 and entered the reflection mirror 3 is swept in the b direction by the vibration of the reflection mirror 3 when it passes through the beam extraction tube 6 and is reflected toward the exposure section, and as described above, the beam 1 enters the reflection mirror 3. A desired exposure area is formed in the section.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

この構成のX線露光装置において、ベローズ1
1は、一般に軟弱であつて、反射鏡3の振動が重
なると駆動棒9の移動に追随する変形の繰り返し
疲労により破壊するに至り、反射鏡室4に外気が
漏れて反射鏡3が劣化し、更にはシンクロトロン
が作動不能になる。
In the X-ray exposure apparatus with this configuration, the bellows 1
1 is generally weak, and when the vibrations of the reflector 3 overlap, it will break due to repeated fatigue of deformation following the movement of the drive rod 9, and external air will leak into the reflector chamber 4, causing the reflector 3 to deteriorate. , and even the synchrotron becomes inoperable.

この故障は、特に複数の露光部を有する場合、
全露光部の作動を不能にさせるので、生産上大き
な被害をもたらす問題である。
This failure is particularly important when having multiple exposed areas.
This is a problem that causes major damage to production because it disables the operation of all exposure sections.

〔問題点を解決するための手段〕[Means for solving problems]

上記問題点は、反射鏡を振動させる駆動機構に
おける該反射鏡に係合する可動部分の全てが該反
射鏡を設ける空域内に配設されて、シンクロトロ
ンから放射されるX線ビームを該反射鏡の振動で
掃引する本発明のX線露光装置によつて解決され
る。
The above problem is that all of the movable parts that engage with the reflecting mirror in the drive mechanism that vibrates the reflecting mirror are disposed within the air space where the reflecting mirror is installed, and the X-ray beam emitted from the synchrotron is reflected by the mirror. This problem is solved by the X-ray exposure apparatus of the present invention, which sweeps by vibration of a mirror.

本発明によれば、上記駆動機構は上記可動部分
が摺動する個所を有しないものにするのが望まし
い。
According to the present invention, it is desirable that the drive mechanism has no portion on which the movable part slides.

〔作用〕[Effect]

上記構成により、反射鏡を振動させる従来の駆
動機構に必要としていたベローズが不要になつ
て、反射鏡の振動を重ねることにより疲労破壊し
て外気を漏らせる部分がなくなり、真空度劣化の
発生確率が低減する。
With the above configuration, the bellows required in the conventional drive mechanism that vibrates the reflector is no longer necessary, and there is no longer a part that causes fatigue failure due to repeated vibrations of the reflector and leaks outside air, which increases the probability of vacuum deterioration. is reduced.

そして本駆動機構を、反射鏡に係合する可動部
分が摺動する個所を有しないもの例えばリニヤモ
ータ若しくは圧電素子などの駆動体にしたものに
することにより、真空中に配設した際に発生する
問題例えば潤滑に伴う問題などを回避することが
出来る。
In addition, by using a driving body such as a linear motor or a piezoelectric element that does not have a sliding part for the movable part that engages with the reflecting mirror, this drive mechanism can be used to prevent the occurrence of problems when installed in a vacuum. Problems such as those associated with lubrication can be avoided.

かくして、シンクロトロンが作動不能になる確
率が低減して、特に複数の露光部を有する場合に
おいても露光部の作動を従来より安定して確保す
ることが可能になる。
In this way, the probability that the synchrotron becomes inoperable is reduced, and it becomes possible to ensure the operation of the exposure section more stably than before, especially in the case of having a plurality of exposure sections.

〔実施例〕〔Example〕

以下反射鏡を振動させる本発明による駆動機構
の二つの実施例について、その構成をそれぞれ示
す第1図および第2図の側断面模式図により説明
する。全図を通じ同一符号は同一対象物を示す。
Two embodiments of a drive mechanism according to the present invention for vibrating a reflecting mirror will be described below with reference to schematic side cross-sectional views of FIGS. 1 and 2 showing their configurations, respectively. The same reference numerals indicate the same objects throughout the figures.

第1図は第4図に対応する図であり、第1図図
示のX線露光装置においては、反射鏡3を振動さ
せる駆動機構12aの全てが反射鏡室4内に配設
されている。
FIG. 1 is a diagram corresponding to FIG. 4, and in the X-ray exposure apparatus shown in FIG.

即ち、9aが9に対応する駆動棒、10aが1
0に対応する加振機で、駆動棒9aと加振機10
aとで12に対応する駆動機構12aを形成して
いる。
That is, 9a corresponds to the drive rod 9, and 10a corresponds to 1.
0, the drive rod 9a and the vibrator 10
a forms a drive mechanism 12a corresponding to 12.

加振機10aの駆動体は例えばリニヤモータ若
しくは圧電素子などであつて、駆動機構12a
は、駆動棒9aを含む可動部分に摺動する個所が
ないように形成されている。従つて、真空中に配
設されて発生する問題例えば潤滑に伴う問題など
は回避されている。
The driving body of the vibrator 10a is, for example, a linear motor or a piezoelectric element, and the driving mechanism 12a is
is formed so that there are no sliding parts in the movable parts including the drive rod 9a. Therefore, problems that arise when placed in a vacuum, such as problems with lubrication, are avoided.

この駆動機構12aによる反射鏡3の振動は、
従来の駆動機構12による場合と全く同様にな
り、ビーム1の掃引は第4図図示の場合と変らな
い。然も駆動機構12aには、反射鏡3の振動を
重ねるために発生する疲労破壊により外気を漏ら
す第4図図示のベローズ11のような部分がない
ので、反射鏡室4の真空度が劣化してシンクロト
ロンが作動不能になる確率が低減する。
The vibration of the reflecting mirror 3 caused by this drive mechanism 12a is
This is exactly the same as in the case using the conventional drive mechanism 12, and the sweeping of the beam 1 is the same as in the case shown in FIG. However, since the drive mechanism 12a does not have a part such as the bellows 11 shown in FIG. 4, which leaks outside air due to fatigue failure caused by repeated vibrations of the reflector 3, the degree of vacuum in the reflector chamber 4 deteriorates. This reduces the probability that the synchrotron will become inoperable.

第2図は第4図に対応する図であり、第2図図
示のX線露光装置においては、反射鏡3を振動さ
せる駆動機構12bにおける可動部分の全てが反
射鏡室4内に配設されている。
FIG. 2 is a diagram corresponding to FIG. 4, and in the X-ray exposure apparatus shown in FIG. ing.

即ち、9bが9に対応する駆動棒、10bが1
0に対応する加振機、11bがベローズ11に対
応する隔壁で、駆動棒9aと加振機10aと隔壁
11bとで12に対応する駆動機構12bを形成
している。
That is, 9b is the drive rod corresponding to 9, and 10b is 1
The vibration exciter 11b corresponds to the bellows 11, and the drive rod 9a, the vibration exciter 10a, and the partition 11b form a drive mechanism 12b corresponding to the vibration exciter 12.

駆動機構12bにおいて、加振機10bの駆動
体は例えばリニヤモータであつて、加振機10b
の例えばコイルからなる可動部10baは反射室
4の中に配設され、加振機10bの例えば電磁石
からなる固定部10bbは反射室4の外に配設さ
れている。また、可動部10baと固定部10bb
との間には例えば非磁性の材料からなり反射室4
に接合された隔壁11bが配設されて反射鏡室4
の真空を保持している。
In the drive mechanism 12b, the driver of the vibrator 10b is, for example, a linear motor, and the vibrator 10b is a linear motor.
A movable part 10ba made of, for example, a coil is disposed within the reflection chamber 4, and a fixed part 10bb of the vibrator 10b made of, for example, an electromagnet is disposed outside the reflection chamber 4. In addition, the movable part 10ba and the fixed part 10bb
A reflection chamber 4 made of, for example, a non-magnetic material is provided between the
A partition wall 11b joined to the reflecting mirror chamber 4 is provided.
maintains a vacuum.

そして、駆動棒9bと可動部10baとからな
る駆動機構12bの可動部分は、摺動する個所が
ないように形成されている。従つて、該可動部分
が真空中に配設されて発生する問題例えば潤滑に
伴う問題などは回避されている。
The movable portion of the drive mechanism 12b consisting of the drive rod 9b and the movable portion 10ba is formed so that there is no sliding portion. Problems that arise when the moving parts are arranged in a vacuum, such as problems with lubrication, are thus avoided.

この駆動機構12bによる反射鏡3の振動も、
従来の駆動機構12による場合と全く同様にな
り、ビーム1の掃引は第4図図示の場合と変わら
ない。然も隔壁11bは、反射鏡3の振動に際し
てベローズ11のように変形することがないので
破壊の恐れがなく、隔壁11bに起因して反射鏡
室4の真空度が劣化しシンクロトロンが作動不能
になる確率は低減する。
The vibration of the reflecting mirror 3 caused by this drive mechanism 12b also
This is exactly the same as in the case using the conventional drive mechanism 12, and the sweeping of the beam 1 is the same as in the case shown in FIG. However, since the partition wall 11b does not deform like the bellows 11 when the reflecting mirror 3 vibrates, there is no risk of destruction, and the degree of vacuum in the reflecting mirror chamber 4 deteriorates due to the partition wall 11b, making the synchrotron inoperable. The probability of

なお駆動機構12bの構成は、駆動機構が大型
になる場合に都合がよい。
Note that the configuration of the drive mechanism 12b is convenient when the drive mechanism is large-sized.

〔発明の効果〕〔Effect of the invention〕

以上説明したように、本発明の構成によれば、
シンクロトロンから放射されるX線ビームを反射
鏡の振動で掃引するX線露光装置において、シン
クロトロンが作動不能になる確率が低減して、特
に複数の露光部を有する場合においても露光部の
作動を従来より安定して確保することを可能にさ
せる効果がある。
As explained above, according to the configuration of the present invention,
In an X-ray exposure device that sweeps the X-ray beam emitted from a synchrotron by the vibration of a reflecting mirror, the probability that the synchrotron will become inoperable is reduced, and the exposure section can be operated even when the synchrotron has multiple exposure sections. This has the effect of making it possible to secure more stably than before.

【図面の簡単な説明】[Brief explanation of the drawing]

図面において、第1図は反射鏡を振動させる本
発明による駆動機構の一実施例の構成を示す側断
面模式図、第2図は同じく他の実施例の構成を示
す側断面模式図、第3図はSOR光と反射鏡の振
動によるビームの掃引とを説明する斜視図、第4
図は反射鏡を振動させる従来の駆動機構の構成を
示す側断面模式図である。 また、図中において、1はX線ビーム、2は電
子の回転軌道、3は反射鏡、4は反射鏡室、5は
ビーム導入管、6はビーム導出管、7は窓、8は
支持棒、9,9a,9bは駆動棒、10,10
a,10bは加振機、10baは可動部、10bb
は固定部、11はベローズ、11bは隔壁、1
2,12a,12bは駆動機構、をそれぞれ示
す。
In the drawings, FIG. 1 is a schematic side sectional view showing the structure of one embodiment of the drive mechanism according to the present invention for vibrating a reflecting mirror, FIG. 2 is a schematic side sectional view showing the structure of another embodiment, and FIG. The figure is a perspective view explaining the SOR light and the beam sweep caused by the vibration of the reflecting mirror.
The figure is a schematic side cross-sectional view showing the configuration of a conventional drive mechanism for vibrating a reflecting mirror. Also, in the figure, 1 is an X-ray beam, 2 is a rotating orbit of electrons, 3 is a reflecting mirror, 4 is a reflecting mirror chamber, 5 is a beam introduction tube, 6 is a beam exit tube, 7 is a window, and 8 is a support rod. , 9, 9a, 9b are drive rods, 10, 10
a, 10b are vibration exciters, 10ba is a moving part, 10bb
1 is a fixed part, 11 is a bellows, 11b is a partition wall, 1
2, 12a, and 12b indicate drive mechanisms, respectively.

Claims (1)

【特許請求の範囲】 1 反射鏡を振動させる駆動機構における該反射
鏡に係合する可動部分の全てが該反射鏡を設ける
空域内に配設されて、シンクロトロンから放射さ
れるX線ビームを該反射鏡の振動で掃引すること
を特徴とするX線露光装置。 2 上記駆動機構は上記可動部分が摺動する個所
を有しないものであることを特徴とする特許請求
の範囲第1項記載のX線露光装置。
[Scope of Claims] 1. All of the movable parts that engage with the reflecting mirror in the drive mechanism that vibrates the reflecting mirror are disposed within an air space in which the reflecting mirror is provided, and the X-ray beam emitted from the synchrotron is An X-ray exposure apparatus characterized in that sweeping is performed by vibration of the reflecting mirror. 2. The X-ray exposure apparatus according to claim 1, wherein the drive mechanism does not have a portion on which the movable part slides.
JP59277538A 1984-12-26 1984-12-26 X-ray exposuring apparatus Granted JPS61154034A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59277538A JPS61154034A (en) 1984-12-26 1984-12-26 X-ray exposuring apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59277538A JPS61154034A (en) 1984-12-26 1984-12-26 X-ray exposuring apparatus

Publications (2)

Publication Number Publication Date
JPS61154034A JPS61154034A (en) 1986-07-12
JPH0548615B2 true JPH0548615B2 (en) 1993-07-22

Family

ID=17584946

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59277538A Granted JPS61154034A (en) 1984-12-26 1984-12-26 X-ray exposuring apparatus

Country Status (1)

Country Link
JP (1) JPS61154034A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2725295B2 (en) * 1988-08-02 1998-03-11 日本電気株式会社 Synchrotron radiation exposure system
JP2742122B2 (en) * 1989-12-28 1998-04-22 キヤノン株式会社 Illumination system and X-ray exposure apparatus

Also Published As

Publication number Publication date
JPS61154034A (en) 1986-07-12

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