JPH0549355B2 - - Google Patents
Info
- Publication number
- JPH0549355B2 JPH0549355B2 JP16630489A JP16630489A JPH0549355B2 JP H0549355 B2 JPH0549355 B2 JP H0549355B2 JP 16630489 A JP16630489 A JP 16630489A JP 16630489 A JP16630489 A JP 16630489A JP H0549355 B2 JPH0549355 B2 JP H0549355B2
- Authority
- JP
- Japan
- Prior art keywords
- cleaning
- processing chamber
- solvent
- communication port
- tank
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Landscapes
- Cleaning By Liquid Or Steam (AREA)
- Cleaning And De-Greasing Of Metallic Materials By Chemical Methods (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は洗浄装置に係るものであつて、機械部
品、電子部品、医療用具その他種々の被洗浄物を
液洗浄または蒸気洗浄した後、被洗浄物に付着し
た溶剤を外部に拡散する事なく、確実に処理する
事を目的とする。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to a cleaning device, which cleans mechanical parts, electronic parts, medical instruments, and various other objects by liquid or steam cleaning. The purpose is to reliably dispose of the solvent that has adhered to it without dispersing it to the outside.
従来の技術
従来被洗浄物を載置する洗浄台を、移動機構に
接続して位置移動自在に形成したものには、実公
昭59−28714号公報記載の考案が存在する。BACKGROUND ART Conventionally, there is an idea described in Japanese Utility Model Publication No. 59-28714, in which a washing table on which an object to be washed is placed is connected to a moving mechanism so as to be movable.
この考案に於いて、洗浄作業の完了した被洗浄
物は、洗浄槽から外部に持ち出された後に、被洗
浄物に付着した溶剤を、別個に設けた処理装置で
乾燥処理するものである。そのため、乾燥処理に
多くの手数を要するばかりでなく、処理装置に移
動するときに外気と接触し、溶剤がトリクロルエ
チレン、トリクロロトリフルオロエタン等の大気
中への拡散が好ましくないものである場合には、
健康被害、大気汚染等を生じるものとなる。 In this invention, after the cleaning work has been completed, the cleaning target is taken out from the cleaning tank, and then the solvent adhering to the cleaning target is dried in a separate processing device. Therefore, not only does the drying process require a lot of effort, but it also comes into contact with the outside air when being transferred to the processing equipment, and if the solvent is trichlorethylene, trichlorotrifluoroethane, etc., which is undesirable for diffusion into the atmosphere, teeth,
This will cause health damage, air pollution, etc.
また、特公昭59−9228号公報記載の発明のごと
く、開閉可能な扉を介して洗浄槽と被洗浄物の収
納室を接続し、この収納室に溶剤ガスの処理装置
を接続したものが存在する。 Furthermore, as in the invention described in Japanese Patent Publication No. 59-9228, there is an invention in which a cleaning tank and a storage chamber for the objects to be cleaned are connected through an openable/closable door, and a solvent gas processing device is connected to this storage chamber. do.
また、実開昭59−110003号公報記載の考案のご
とく、溶剤ガスを冷却凝縮する凝縮装置に収納室
を接続し、この凝縮装置と収納室との間を、循環
して溶剤ガスを除去しようとするものが存在す
る。 Also, as proposed in Japanese Utility Model Application Publication No. 59-110003, the storage chamber is connected to a condensing device that cools and condenses the solvent gas, and the solvent gas is removed by circulating between the condensing device and the storage chamber. There is something that does.
発明が解決しようとする問題点
しかし、特公昭59−9228号公報記載の発明は、
開閉可能な扉を介して洗浄槽と被洗浄物の収納室
を接続し、この収納室に、溶剤ガスの処理装置を
接続するが、溶剤ガスを含んだ気体を処理装置に
一回だけ通過させ、後は大気中に放出してしまう
ものであるため、多くの溶剤ガスが未処理状態で
外部に放出され、確実な有害物質除去は困難なも
のであつた。Problems to be solved by the invention However, the invention described in Japanese Patent Publication No. 59-9228
The cleaning tank and the storage chamber for the objects to be cleaned are connected through an openable/closable door, and a solvent gas processing device is connected to this storage chamber, but the gas containing the solvent gas is allowed to pass through the processing device only once. After that, it is released into the atmosphere, so much of the solvent gas is released to the outside in an untreated state, making it difficult to reliably remove harmful substances.
また、実開昭59−110003号公報記載の考案は、
溶剤ガスを冷却凝縮する凝縮装置に収納室を接続
し、この凝縮装置と収納室との間を、循環して溶
剤ガスを除去するものであるが、溶剤ガスの凝縮
による除去に限界が有るため、多量の溶剤ガスを
未処理状態で外部に放出させてしまうものとなつ
ていた。 In addition, the invention described in Utility Model Application Publication No. 59-110003 is
The storage chamber is connected to a condensing device that cools and condenses the solvent gas, and the solvent gas is circulated between the condensation device and the storage chamber to remove the solvent gas, but there is a limit to the amount of solvent gas that can be removed by condensation. However, a large amount of solvent gas was released to the outside in an untreated state.
即ち、上記方法は溶剤ガスを冷却し凝縮させる
ことによつて除去するものである。そして、通常
の冷却凝縮温度の0〜20℃程度では一定の蒸気圧
を保つものとなる。そのため、例えば沸点が47.6
℃のフロンを10℃に冷却した場合、蒸気圧は0.25
Kgf/cm2・absと成り、250000ppmの濃度を保
つものとなる。従つて、10℃に冷却凝縮した場合
の上記フロン濃度は、250000ppm以下に下げるこ
とはできない。 That is, the above method removes the solvent gas by cooling and condensing it. A constant vapor pressure is maintained at the normal cooling and condensing temperature of about 0 to 20°C. Therefore, for example, the boiling point is 47.6
When CFC is cooled to 10℃, the vapor pressure is 0.25
Kgf/cm2・abs, which maintains a concentration of 250,000 ppm. Therefore, the above concentration of fluorocarbons when cooled and condensed at 10° C. cannot be lowered to 250,000 ppm or less.
そのため、冷却凝縮装置を循環流通し得る循環
路の中に位置し、溶剤ガスを複数回循環してもそ
の濃度を低下できず、被洗浄物の出入のために収
納室を開放すれば、上記の例では250000ppmの溶
剤ガスが外部に放出されるものとなる。 Therefore, if the cooling condensing device is located in a circulation path that can circulate the solvent gas, and even if the solvent gas is circulated multiple times, the concentration cannot be lowered, and if the storage chamber is opened to take in and out the items to be cleaned, In this example, 250,000 ppm of solvent gas will be released to the outside.
また、上述のごとき従来の処理装置は、洗浄槽
と別個に形成しているため、大型で複雑な機構と
成り、溶剤の回収コストを高価なものとしてい
た。 Further, since the conventional processing apparatus described above is formed separately from the cleaning tank, it becomes a large and complicated mechanism, which increases the cost of recovering the solvent.
本発明は上述のごとき問題点を解決しようとす
るものであつて、被洗浄物を液洗浄または蒸気洗
浄した後の、被洗浄物に付着した溶剤の処理を、
洗浄装置内で手数を要する事なく行う。また、外
部に有害な物質を拡散しないようにする事を、簡
略な機構で廉価に行おうとするものである。 The present invention is an attempt to solve the above-mentioned problems.The present invention is aimed at solving the above-mentioned problems, and includes the following steps:
This can be done within the cleaning equipment without any hassle. Furthermore, it is an attempt to prevent harmful substances from being diffused to the outside using a simple mechanism at a low cost.
問題点を解決するための手段
本発明は上述のごとき問題点を解決するため、
被洗浄物を載置する洗浄台を、移動機構に接続し
て位置移動自在に形成することにより、洗浄台に
載置した被洗浄物を、洗浄槽の上部をケーシング
で被覆して設けた処理室と洗浄槽の間で、連通口
を介して往復移動可能とし、この処理室と洗浄槽
とを、遮蔽体により遮蔽可能とするとともにケー
シングの外周に、一定間隔を介して被覆体を設
け、この被覆体の内面とケーシングの外面との間
に循環路を形成し、この循環路内に、活性炭によ
り構成した溶剤を処理する処理機構を位置して成
るものである。Means for Solving the Problems The present invention solves the above problems by:
A cleaning process in which the washing table on which the items to be cleaned are placed is connected to a moving mechanism so that the position can be moved freely, and the upper part of the washing tank is covered with a casing. The processing chamber and the cleaning tank can be moved back and forth between the chamber and the cleaning tank through a communication port, the processing chamber and the cleaning tank can be shielded by a shielding body, and covering bodies are provided at regular intervals around the outer periphery of the casing. A circulation path is formed between the inner surface of the covering and the outer surface of the casing, and a treatment mechanism for treating a solvent made of activated carbon is located within the circulation path.
また、活性炭は、カセツト状に形成し、循環路
から交換可能としたものであつても良い。 Further, the activated carbon may be formed in a cassette shape and made exchangeable from the circulation path.
また、処理機構は、加熱部と冷却部を設け、活
性炭に吸着した溶剤を加熱分離するとともに冷却
部で冷却凝縮し、溶剤を回収し得るようにしたも
のであつても良い。 Further, the processing mechanism may be provided with a heating section and a cooling section, so that the solvent adsorbed on the activated carbon is separated by heating, and the solvent is cooled and condensed in the cooling section, so that the solvent can be recovered.
また、遮蔽体は、処理室と洗浄槽を連通する連
通口よりも大きな直径に洗浄台を形成し、この洗
浄台を、洗浄台の移動に伴う被洗浄物の処理室収
納時に、処理室と洗浄槽の連通口外周に押圧係合
して、連通口を密閉することにより、処理室と洗
浄槽とを遮蔽するものであつても良い。 In addition, the shield forms a cleaning table with a diameter larger than the communication port that communicates the processing chamber and the cleaning tank, and the cleaning table is connected to the processing chamber when the cleaning table is moved and the object to be cleaned is stored in the processing chamber. The processing chamber and the cleaning tank may be shielded by pressingly engaging the outer periphery of the communication port of the cleaning tank and sealing the communication port.
また、遮蔽体は、外部操作により処理室と洗浄
槽との連通口を開放または遮蔽するものであつて
も良い。 Further, the shielding body may be one that opens or shields the communication port between the processing chamber and the cleaning tank by an external operation.
作 用
本発明は上述のごとく構成したものであるか
ら、移動機構を作動して、被洗浄物を載置した洗
浄台を洗浄槽中に挿入し、液洗浄、蒸気洗浄等を
行う。この液洗浄、蒸気洗浄の完了後は再び移動
機構を作動して、洗浄台に載置した被洗浄物を、
洗浄槽に接続して設けた処理室に収納する。この
収納後、または収納と同時に、処理室と洗浄槽と
を遮蔽体により遮蔽し、被洗浄物に付着した溶剤
を除去するための処理機構を作動する。Function Since the present invention is configured as described above, the moving mechanism is operated to insert the cleaning table on which the object to be cleaned is placed into the cleaning tank, and perform liquid cleaning, steam cleaning, etc. After completing this liquid cleaning and steam cleaning, the moving mechanism is operated again to move the object placed on the cleaning stand.
It is stored in a processing chamber connected to the cleaning tank. After or simultaneously with the storage, the processing chamber and the cleaning tank are shielded by a shielding body, and a processing mechanism for removing the solvent adhering to the object to be cleaned is activated.
この処理機構は、気体が循環流通し得る循環路
内に活性炭を設けたものであるから、処理室内の
気体は反復して連続的に活性炭に接触することが
可能となる。そのため、被洗浄物に付着した有機
溶剤等を確実に除去するまで、溶剤の除去作業を
繰り返し行うことが出来る。この処理後に、被洗
浄物を処理室から取り出せば、有害な気体を大気
中に拡散したり、作業者が吸引することも無く、
完全な洗浄作業を可能とする。 Since this treatment mechanism has activated carbon in a circulation path through which gas can circulate, the gas in the treatment chamber can repeatedly and continuously come into contact with the activated carbon. Therefore, the solvent removal operation can be repeated until the organic solvent and the like adhering to the object to be cleaned are reliably removed. After this treatment, if the object to be cleaned is taken out of the treatment chamber, harmful gases will not be diffused into the atmosphere and will not be inhaled by the operator.
Enables complete cleaning work.
また、溶剤の付着した被洗浄物は、洗浄装置か
ら外部に出る事なく洗浄槽から処理室に収納さ
れ、付着溶剤の処理を行うものである。そのた
め、従来のごとく、処理機構への被洗浄物の移送
手数を要しないばかりでなく、溶剤を拡散したり
することも無い。 Further, the object to be cleaned with the solvent attached thereto is stored in the processing chamber from the cleaning tank without leaving the cleaning device, and the attached solvent is treated. Therefore, unlike the conventional method, not only is there no need for transferring the object to be cleaned to the processing mechanism, but there is also no need to diffuse the solvent.
また、循環路は、ケーシングの外周に、一定間
隔を介して被覆体を設け、この被覆体の内面とケ
ーシングの外面との間に循環路を形成し、この循
環路の内部に処理機構を位置したものである。そ
のため、装置を小型化し簡略で廉価な溶剤処理を
可能とするものである。 In addition, the circulation path includes a coating provided at regular intervals around the outer circumference of the casing, a circulation path formed between the inner surface of the coating and the outer surface of the casing, and a processing mechanism located inside the circulation path. This is what I did. Therefore, the apparatus can be downsized and simple and inexpensive solvent treatment can be performed.
実施例
以下本発明の一実施例を図面に於いて説明すれ
ば、1は洗浄台で、被洗浄物2を上面に載置する
とともにエアシリンダー、オイルシリンダー、チ
エーン装置等の適宜の移動機構3に接続して上下
方向に位置移動自在に形成している。この洗浄台
1は、移動機構3を作動させることにより、上面
に載置した被洗浄物2を、洗浄槽4の上部に連通
口7を介して接続し、処理室5と洗浄槽4との間
で、往復移動可能にする。また、この処理室5と
洗浄槽4とを、遮蔽体6により遮蔽可能としてい
る。Embodiment An embodiment of the present invention will be described below with reference to the drawings. Reference numeral 1 denotes a washing table on which an object to be washed 2 is placed, and an appropriate moving mechanism 3 such as an air cylinder, an oil cylinder, or a chain device. It is connected to and is formed to be movable in the vertical direction. By operating the moving mechanism 3, this washing table 1 connects the object 2 placed on the upper surface to the upper part of the washing tank 4 through the communication port 7, and connects the processing chamber 5 and the washing tank 4. Allows for round-trip movement between the two locations. Further, the processing chamber 5 and the cleaning tank 4 can be shielded by a shielding body 6.
また、この遮蔽は、第1図、第2図に示すごと
く、処理室5と洗浄槽4を連通する連通口7より
も大きな直径に洗浄台1を形成して行う。即ち、
この洗浄台1を、洗浄台1の移動に伴う被洗浄物
2の処理室5への収納時に、2点鎖線で示すごと
く、処理室5と洗浄槽4の連通口7外周に押圧係
合する。そして、連通口7を密閉することによ
り、処理室5と洗浄槽4とを遮蔽するもので、遮
蔽体6と洗浄台1とを兼用するものである。 Further, this shielding is achieved by forming the cleaning platform 1 to have a diameter larger than that of the communication port 7 that communicates the processing chamber 5 and the cleaning tank 4, as shown in FIGS. 1 and 2. That is,
When the cleaning table 1 is moved and the object 2 to be cleaned is stored in the processing chamber 5, the cleaning table 1 is pressed into engagement with the outer periphery of the communication port 7 between the treatment chamber 5 and the cleaning tank 4, as shown by the two-dot chain line. . By sealing the communication port 7, the processing chamber 5 and the cleaning tank 4 are shielded, and the shield 6 and the cleaning table 1 are also used.
また、洗浄槽4と処理室5との連通口7は、特
別の固定手段を持たない蓋体10を処理室5側に
位置することにより被覆している。そして、被洗
浄物2が洗浄槽4内に位置する時は、常時、連通
口7を閉止している。また、洗浄台1の上昇時に
は、洗浄台1の上面に突出した支持棒11によつ
て、2点鎖線で示すごとく蓋体10を持ち上げ開
放するものである。 Further, the communication port 7 between the cleaning tank 4 and the processing chamber 5 is covered by a lid 10 that does not have any special fixing means and is placed on the processing chamber 5 side. When the object 2 to be cleaned is located in the cleaning tank 4, the communication port 7 is always closed. Further, when the washing table 1 is raised, the cover body 10 is lifted and opened by the support rod 11 protruding from the upper surface of the washing table 1 as shown by the two-dot chain line.
また、上記の処理室5は洗浄槽4の上部をケー
シング8で被覆することにより形成している。ま
た、このケーシングの外周に、一定間隔を介して
被覆体を設け、この被覆体の内面とケーシングの
外面との間に循環路を形成している。 Further, the processing chamber 5 is formed by covering the upper part of the cleaning tank 4 with a casing 8. Furthermore, covering bodies are provided on the outer periphery of the casing at regular intervals, and a circulation path is formed between the inner surface of the covering body and the outer surface of the casing.
また、この循環路12内に、被洗浄物2に付着
した溶剤を除去するための処理機構13を位置し
ている。この処理機構13は、溶剤を吸着し得る
活性炭14を固定的またはカセツト状に形成し、
交換可能としている。 Further, a processing mechanism 13 for removing the solvent adhering to the object 2 to be cleaned is located within the circulation path 12 . This treatment mechanism 13 forms activated carbon 14 that can adsorb a solvent in a fixed or cassette shape,
It is exchangeable.
また循環路12には、処理室5と接続する導入
口15に、循環路12へ強制的に溶剤ガスを導入
するための、フアン16を設けている。そしてま
た、導入口15に対向する位置の処理室5には、
循環路12の排出口17を開口し、溶剤ガスの強
制循環を可能としている。 Further, the circulation path 12 is provided with a fan 16 at an inlet 15 connected to the processing chamber 5 for forcibly introducing solvent gas into the circulation path 12. Furthermore, in the processing chamber 5 located opposite the introduction port 15,
The outlet 17 of the circulation path 12 is opened to enable forced circulation of the solvent gas.
上述のごとく構成したものに於いて、被洗浄物
2を、液洗浄または蒸気洗浄するには、移動機構
3を作動して、被洗浄物2を載置した洗浄台1を
洗浄槽4中に下降挿入する。そして、液洗浄また
は蒸気洗浄若しくはその双方の洗浄を行う。この
液洗浄、蒸気洗浄の完了後は、移動機構3を洗浄
台1の上昇方向に作動して、洗浄台1に載置した
被洗浄物2を、洗浄槽4の上部に設けた処理室5
に収納し、洗浄槽4と処理室5とを遮蔽する。 In the structure as described above, in order to perform liquid cleaning or steam cleaning on the object 2 to be cleaned, the moving mechanism 3 is operated to move the cleaning table 1 on which the object 2 to be cleaned is placed into the cleaning tank 4. Insert downward. Then, liquid cleaning, steam cleaning, or both cleaning is performed. After completion of this liquid cleaning and steam cleaning, the moving mechanism 3 is operated in the upward direction of the cleaning platform 1, and the object to be cleaned 2 placed on the cleaning platform 1 is moved to the processing chamber provided at the upper part of the cleaning tank 4.
The cleaning tank 4 and the processing chamber 5 are sealed off.
この遮蔽は、洗浄台1を連通口7よりも大きな
直径に形成しているから、この洗浄台1が被洗浄
物2を処理室5に収納すれば、第1図、第2図の
2点鎖線に示すごとく、連通口7の下面外周に洗
浄台1の上面が押圧される。そして、連通口7を
密閉することができ、処理室5と洗浄槽4とを遮
蔽するものとなる。 In this shielding, the cleaning table 1 is formed to have a larger diameter than the communication port 7, so if the cleaning table 1 accommodates the object 2 to be cleaned in the processing chamber 5, the two points shown in FIGS. As shown by the chain line, the upper surface of the washing table 1 is pressed against the outer periphery of the lower surface of the communication port 7. Then, the communication port 7 can be sealed, and the processing chamber 5 and the cleaning tank 4 can be shielded.
この遮蔽を行つた後、フアン16を作動すれ
ば、処理室5内の空気は、溶剤ガスとともに強制
的に循環路12に流入し、活性炭14によつて溶
剤ガスを吸着除去することができる。 After this shielding is performed, when the fan 16 is operated, the air in the processing chamber 5 is forced to flow into the circulation path 12 together with the solvent gas, and the activated carbon 14 adsorbs and removes the solvent gas.
そして、この吸着除去は、気体が循環流通し得
る循環路12から排出口17、処理室5を介して
導入口15に導入される。そのため、処理室5内
の気体は、溶剤ガスが完全に除去されるまで、反
復して連続的に処理機構13で処理する事が可能
となり、被洗浄物2に付着した有機溶剤等を確実
に除去することが出来る。 Then, this adsorption/removal gas is introduced into the inlet 15 from the circulation path 12 through which the gas can circulate, via the outlet 17 and the processing chamber 5 . Therefore, the gas in the processing chamber 5 can be repeatedly and continuously processed by the processing mechanism 13 until the solvent gas is completely removed, and the organic solvent etc. adhering to the object to be cleaned 2 can be reliably removed. It can be removed.
この処理後に、被洗浄物2を処理室5から取り
出せば、有害な気体を大気中に拡散したり、作業
者が吸引することも無く、完全な洗浄作業を可能
とする。 If the object to be cleaned 2 is taken out from the treatment chamber 5 after this treatment, a complete cleaning operation can be performed without the need for harmful gases to be diffused into the atmosphere or inhaled by the operator.
また、処理機構13を構成する活性炭14をカ
セツト状にすれば、活性炭14の交換を簡易に行
うことができ、常に優れた溶剤ガスの吸着効率を
得ることができる。 Moreover, if the activated carbon 14 constituting the processing mechanism 13 is made into a cassette shape, the activated carbon 14 can be easily replaced, and excellent solvent gas adsorption efficiency can always be obtained.
また溶剤の付着した被洗浄物2は、洗浄装置か
ら外部に出る事なく処理室5に収納され、付着し
た溶剤の除去処理を行うものであるから、従来の
ごとく処理機構13への被洗浄物2の移送手数を
要しないばかりでなく、溶剤を拡散したりするこ
とも無いものである。 Further, since the object 2 to be cleaned with the solvent attached thereto is stored in the processing chamber 5 without exiting from the cleaning device and the attached solvent is removed, the object 2 to be cleaned is not transferred to the processing mechanism 13 as in the conventional case. Not only does it not require the number of transfer steps described above, but it also does not cause the solvent to diffuse.
また、上記実施例に於いては、遮蔽体6を洗浄
台1と兼用したが、他の異なる実施例では、第3
図、第4図に示すごとく、一対の平板状の遮蔽体
6を、洗浄台1の下面両側に支持軸18で開閉自
在に軸支する。そして、この支持軸18の外方に
係合部20を突出する。この係合部20を、洗浄
台1の移動に伴う被洗浄物2の処理室5への収納
時に、処理室5と洗浄槽4の連通口7外周に係合
する。そして、支持軸18を支点にして遮蔽体6
を回動し、遮蔽体6を密閉することにより、処理
室5と洗浄槽4とを遮蔽するものである。 Further, in the above embodiment, the shield 6 was also used as the washing table 1, but in other different embodiments, the third
As shown in FIG. 4, a pair of flat shields 6 are supported by support shafts 18 on both sides of the lower surface of the washing table 1 so as to be openable and closable. Then, the engaging portion 20 projects outward from the support shaft 18 . This engaging portion 20 is engaged with the outer periphery of the communication port 7 between the processing chamber 5 and the cleaning tank 4 when the object 2 to be cleaned is stored in the processing chamber 5 as the washing table 1 moves. The shield 6 is then rotated using the support shaft 18 as a fulcrum.
By rotating the shielding member 6 and sealing the shielding body 6, the processing chamber 5 and the cleaning tank 4 are shielded.
この遮蔽は、洗浄台1の上昇に伴い、遮蔽体6
の側面に突出した係合部20を、連通口7の洗浄
槽4側の外周に突出した係合枠21に係合する。
そして、支持軸18を支点にして、遮蔽体6を回
動密閉することにより、処理室5と洗浄槽4とを
遮蔽するものである。 This shielding is performed by the shielding body 6 as the washing table 1 rises.
The engaging portion 20 protruding from the side surface is engaged with the engaging frame 21 protruding from the outer periphery of the communication port 7 on the cleaning tank 4 side.
The processing chamber 5 and the cleaning tank 4 are shielded by rotating and sealing the shielding body 6 using the support shaft 18 as a fulcrum.
また、遮蔽体6による遮蔽方法は、必ずしも上
記方法による必要はなく、任意の方法を選択する
ことが可能であり、遮蔽体6は、外部操作により
処理室5と洗浄槽4との連通口7を、シヤツター
等の任意の方法で開放または遮蔽するものであつ
ても良い。 Furthermore, the shielding method using the shielding body 6 does not necessarily have to be the above-mentioned method, and any method can be selected. may be opened or shielded by any method such as a shutter.
また、被洗浄物2の処理室5への収納を、適宜
のセンサーで感知し、シヤツター等の遮蔽体6で
処理室5と洗浄槽4とを遮蔽するもので有つても
良い。 Further, the storage of the object 2 to be cleaned in the processing chamber 5 may be detected by an appropriate sensor, and the processing chamber 5 and the cleaning tank 4 may be shielded with a shield 6 such as a shutter.
また、前記実施例では処理機構13を、活性炭
14に溶剤ガスを吸着させ、カセツト状等に形成
して適宜交換し得るように構成した。しかし、他
の異なる実施例では活性炭14を交換しなくとも
良いように、処理機構13を構成している。 Further, in the embodiment described above, the processing mechanism 13 is configured such that the activated carbon 14 adsorbs the solvent gas and is formed into a cassette shape or the like so that it can be replaced as needed. However, in other different embodiments, the treatment mechanism 13 is configured so that the activated carbon 14 does not need to be replaced.
即ち、第2図に示すごとく、活性炭14を適宜
間隔で充填した循環路12内に、ボイラー等の加
熱手段22に配管23を接続した加熱部24を儲
ける。この加熱部24は、活性炭14の充填間隔
に各々位置し、この加熱部24で活性炭14に吸
着された溶剤を加熱して、ガス化する。そして、
循環路12末端の排出口17近くに、冷却水タン
ク25と配管23で接続した冷却部26を設け、
る。そして、活性炭14に吸着した溶剤を加熱分
離するとともに冷却部26で冷却凝縮し、回収容
器27に回収し得るようにしている。この加熱に
よる溶剤の回収は、洗浄作業の完了後に一定の時
間をかけて行うのが望ましい。 That is, as shown in FIG. 2, a heating section 24 is provided in which a piping 23 is connected to a heating means 22 such as a boiler in a circulation path 12 filled with activated carbon 14 at appropriate intervals. The heating sections 24 are located at intervals between the filled activated carbons 14, and heat the solvent adsorbed on the activated carbon 14 to gasify it. and,
A cooling part 26 connected to a cooling water tank 25 by piping 23 is provided near the outlet 17 at the end of the circulation path 12,
Ru. Then, the solvent adsorbed on the activated carbon 14 is separated by heating, cooled and condensed in a cooling section 26, and can be recovered in a recovery container 27. It is desirable to recover the solvent by heating over a certain period of time after the cleaning operation is completed.
発明の効果
本発明は、上述のごとく構成したものであるか
ら、洗浄した後の、被洗浄物に付着した溶剤を、
洗浄装置内に位置したまま行い、外部に有害な溶
剤を拡散することがない。Effects of the Invention Since the present invention is constructed as described above, the solvent attached to the object to be cleaned after cleaning can be removed.
It is carried out while remaining inside the cleaning equipment, and no harmful solvents are spread outside.
また、溶剤ガスの処理は活性炭により行い、気
体が循環流通し得る循環路を介して収納室に処理
機構を接続するから、活性炭を通過する度に溶剤
ガスは吸着され減少する。そして、収納室内の有
機溶剤等を確実に除去するまで、繰り返して溶剤
の除去作業を行うことが出来る。 Furthermore, since the treatment of the solvent gas is performed using activated carbon and the treatment mechanism is connected to the storage chamber via a circulation path through which the gas can circulate, the solvent gas is adsorbed and reduced each time it passes through the activated carbon. Then, the solvent removal operation can be repeated until the organic solvent and the like in the storage chamber are reliably removed.
この処理は、溶剤ガスが循環流通し得る循環路
を介して繰り返し行うものであるから、処理機構
の能力を小さなものとしても、高度の溶剤ガスの
処理能力を有するものとなる。そのため、小型で
廉価な処理機構を得ることが可能となる。 Since this treatment is carried out repeatedly through a circulation path through which the solvent gas can circulate, even if the treatment mechanism has a small capacity, it will have a high level of solvent gas treatment capacity. Therefore, it is possible to obtain a small and inexpensive processing mechanism.
また、循環路は、処理室のケーシングの外周
に、一定間隔を介して被覆体を設け、この被覆体
の内面とケーシングの外面との間に循環路を形成
し、たものであるから、機構を小型で簡略化でき
廉価な溶剤処理を可能とする。 Furthermore, the circulation path is constructed by providing a covering at regular intervals around the outer periphery of the casing of the processing chamber, and forming a circulation path between the inner surface of the covering and the outer surface of the casing. It is small and simple, and enables inexpensive solvent treatment.
図面は本発明の一実施例を示すもので、第1図
は断面図、第2図は吸着物質に吸着した溶剤の回
収機構を設けた異なる実施例の断面図、第3図は
遮蔽体の異なる実施例を示すもので被洗浄物の洗
浄状態を示す断面図、第4図は第3図の実施例に
於ける溶剤除去状態の断面図である。
1……洗浄台、2……被洗浄物、3……移動機
構、4……洗浄槽、5……処理室、6……遮蔽
体、7……連通口、12……循環路、13……処
理機構、14……吸着物質、24……加熱部、2
6……冷却部。
The drawings show one embodiment of the present invention; FIG. 1 is a cross-sectional view, FIG. 2 is a cross-sectional view of a different embodiment provided with a recovery mechanism for the solvent adsorbed on the adsorbent, and FIG. 3 is a cross-sectional view of a shielding body. FIG. 4 is a cross-sectional view showing a state in which the object to be cleaned is cleaned, showing a different embodiment. FIG. 4 is a cross-sectional view showing a state in which the solvent is removed in the embodiment of FIG. DESCRIPTION OF SYMBOLS 1...Cleaning table, 2...Object to be cleaned, 3...Movement mechanism, 4...Cleaning tank, 5...Processing chamber, 6...Shielding body, 7...Communication port, 12...Circulation path, 13 ...Treatment mechanism, 14...Adsorption substance, 24...Heating section, 2
6...Cooling section.
Claims (1)
続して位置移動自在に形成することにより、洗浄
台に載置した被洗浄物を、洗浄槽の上部をケーシ
ングで被覆して設けた処理室と洗浄槽の間で、連
通口を介して往復移動可能とし、この処理室と洗
浄槽とを、遮蔽体により遮蔽可能とするとともに
ケーシングの外周に、一定間隔を介して被覆体を
設け、この被覆体の内面とケーシングの外面との
間に循環路を形成し、この循環路内に、活性炭に
より構成した溶剤を処理する処理機構を位置した
事を特徴とする洗浄装置。 2 活性炭は、カセツト状に形成し、循環路から
交換可能としたものであることを特徴とする請求
項1記載の洗浄装置。 3 処理機構は、加熱部と冷却部を設け、活性炭
に吸着した溶剤を加熱分離するとともに冷却部で
冷却凝縮し、溶剤を回収し得るようにしたことを
特徴とする請求項1または2記載の洗浄装置。 4 遮蔽体は、処理室と洗浄槽を連通する連通口
よりも大きな直径に洗浄台を形成し、この洗浄台
を、洗浄台の移動に伴う被洗浄物の処理室収納時
に、処理室と洗浄槽の連通口外周に押圧係合し
て、連通口を密閉することにより、処理室と洗浄
槽とを遮蔽するものであることを特徴とする請求
項1記載の洗浄装置。 5 遮蔽体は、外部操作により処理室と洗浄槽と
の連通口を開放または遮蔽するものであることを
特徴とする請求項1記載の洗浄装置。[Scope of Claims] 1. By connecting the washing stand on which the object to be cleaned is placed and making it movable in position by connecting it to a moving mechanism, the object to be washed placed on the washing stand can be moved by moving the upper part of the washing tank to the casing. It is possible to reciprocate through a communication port between the processing chamber and the cleaning tank, which are covered with A coating is provided through the casing, a circulation path is formed between the inner surface of the coating and the outer surface of the casing, and a processing mechanism for treating a solvent made of activated carbon is located within the circulation path. cleaning equipment. 2. The cleaning device according to claim 1, wherein the activated carbon is formed in a cassette shape and is replaceable from the circulation path. 3. The treatment mechanism according to claim 1 or 2, characterized in that the treatment mechanism is provided with a heating section and a cooling section, so that the solvent adsorbed on the activated carbon is separated by heating, and the solvent is cooled and condensed in the cooling section, so that the solvent can be recovered. cleaning equipment. 4. The shield forms a cleaning table with a diameter larger than the communication port that communicates the processing chamber and the cleaning tank, and when the cleaning table is moved and the items to be cleaned are stored in the processing chamber, the cleaning table is connected to the processing chamber and the cleaning tank. 2. The cleaning device according to claim 1, wherein the processing chamber and the cleaning tank are shielded by pressingly engaging the outer periphery of the communication port of the tank and sealing the communication port. 5. The cleaning device according to claim 1, wherein the shield opens or blocks the communication port between the processing chamber and the cleaning tank by an external operation.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16630489A JPH0330881A (en) | 1989-06-28 | 1989-06-28 | Washing apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16630489A JPH0330881A (en) | 1989-06-28 | 1989-06-28 | Washing apparatus |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0330881A JPH0330881A (en) | 1991-02-08 |
| JPH0549355B2 true JPH0549355B2 (en) | 1993-07-26 |
Family
ID=15828860
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16630489A Granted JPH0330881A (en) | 1989-06-28 | 1989-06-28 | Washing apparatus |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0330881A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH10321580A (en) * | 1997-05-15 | 1998-12-04 | Tokyo Electron Ltd | Substrate cleaning unit and cleaning system |
| JP2017170425A (en) * | 2016-03-18 | 2017-09-28 | 株式会社クリンビー | Workpiece cleaning method and workpiece cleaning device |
-
1989
- 1989-06-28 JP JP16630489A patent/JPH0330881A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0330881A (en) | 1991-02-08 |
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