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JPH0552019B2 - - Google Patents
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JPH0552019B2 - - Google Patents

Info

Publication number
JPH0552019B2
JPH0552019B2 JP2861184A JP2861184A JPH0552019B2 JP H0552019 B2 JPH0552019 B2 JP H0552019B2 JP 2861184 A JP2861184 A JP 2861184A JP 2861184 A JP2861184 A JP 2861184A JP H0552019 B2 JPH0552019 B2 JP H0552019B2
Authority
JP
Japan
Prior art keywords
electrodes
grid
electron
auxiliary electrode
electrode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP2861184A
Other languages
Japanese (ja)
Other versions
JPS60175342A (en
Inventor
Shigeo Takenaka
Eiji Kanbara
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Original Assignee
Tokyo Shibaura Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Tokyo Shibaura Electric Co Ltd filed Critical Tokyo Shibaura Electric Co Ltd
Priority to JP2861184A priority Critical patent/JPS60175342A/en
Priority to DE8585101706T priority patent/DE3561781D1/en
Priority to EP85101706A priority patent/EP0152933B1/en
Priority to US06/702,725 priority patent/US4712043A/en
Publication of JPS60175342A publication Critical patent/JPS60175342A/en
Publication of JPH0552019B2 publication Critical patent/JPH0552019B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J29/00Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
    • H01J29/46Arrangements of electrodes and associated parts for generating or controlling the ray or beam, e.g. electron-optical arrangement
    • H01J29/48Electron guns
    • H01J29/50Electron guns two or more guns in a single vacuum space, e.g. for plural-ray tube
    • H01J29/503Three or more guns, the axes of which lay in a common plane
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00Details of cathode ray tubes or electron beam tubes
    • H01J2229/48Electron guns
    • H01J2229/4844Electron guns characterised by beam passing apertures or combinations
    • H01J2229/4848Aperture shape as viewed along beam axis
    • H01J2229/4858Aperture shape as viewed along beam axis parallelogram
    • H01J2229/4865Aperture shape as viewed along beam axis parallelogram rectangle
    • H01J2229/4868Aperture shape as viewed along beam axis parallelogram rectangle with rounded end or ends
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00Details of cathode ray tubes or electron beam tubes
    • H01J2229/48Electron guns
    • H01J2229/4844Electron guns characterised by beam passing apertures or combinations
    • H01J2229/4848Aperture shape as viewed along beam axis
    • H01J2229/4872Aperture shape as viewed along beam axis circular
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00Details of cathode ray tubes or electron beam tubes
    • H01J2229/48Electron guns
    • H01J2229/4844Electron guns characterised by beam passing apertures or combinations
    • H01J2229/4848Aperture shape as viewed along beam axis
    • H01J2229/4875Aperture shape as viewed along beam axis oval
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00Details of cathode ray tubes or electron beam tubes
    • H01J2229/48Electron guns
    • H01J2229/4844Electron guns characterised by beam passing apertures or combinations
    • H01J2229/4848Aperture shape as viewed along beam axis
    • H01J2229/4879Aperture shape as viewed along beam axis non-symmetric about field scanning axis
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00Details of cathode ray tubes or electron beam tubes
    • H01J2229/48Electron guns
    • H01J2229/4844Electron guns characterised by beam passing apertures or combinations
    • H01J2229/4848Aperture shape as viewed along beam axis
    • H01J2229/4896Aperture shape as viewed along beam axis complex and not provided for
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2229/00Details of cathode ray tubes or electron beam tubes
    • H01J2229/96Circuit elements other than coils, reactors or the like, associated with the tube
    • H01J2229/966Circuit elements other than coils, reactors or the like, associated with the tube associated with the gun structure

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は少なくとも1本、好ましくはそれ以上
の電子ビームを集束するための陰極線管用電子銃
に関し、特にその静電レンズ構体と電極支持構造
に関するものである。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to an electron gun for a cathode ray tube for focusing at least one, preferably more, electron beams, and in particular to its electrostatic lens structure and electrode support structure. It is.

〔発明の技術的背景と問題点〕[Technical background and problems of the invention]

陰極線管は少なくとも1本の電子銃を具備して
おり、この電子銃によつて所定のターゲツト上に
電子ビームスポツトを形成させるものである。こ
の電子銃に関して陰極線管の性能を決定する極め
て重要な因子の1つに上記ターゲツト上における
電子ビームのスポツト径がある。ターゲツト上で
のスポツト径が小さなもの程望ましいのは当然で
あるが、このスポツト径は電子銃の性能によつて
決定される。一般に電子銃は電子ビームを発生さ
せる部分とこの電子ビームを加速集束させる主レ
ンズ部より成り、電子銃の性能を向上させる有効
な手段の一つは主レンズ部の性能を向上させるこ
とである。
A cathode ray tube is equipped with at least one electron gun, which forms an electron beam spot on a predetermined target. One of the extremely important factors that determines the performance of the cathode ray tube in this electron gun is the spot diameter of the electron beam on the target. It goes without saying that a smaller spot diameter on the target is more desirable, but this spot diameter is determined by the performance of the electron gun. Generally, an electron gun consists of a part that generates an electron beam and a main lens part that accelerates and focuses the electron beam.One effective means of improving the performance of an electron gun is to improve the performance of the main lens part.

前記主レンズ部の多くは静電レンズで、開孔を
有する複数個の電極を同軸上に配置し所定の電位
を印加することによつて形成される。この様な静
電レンズは電極構成の違いによりいくつかの種類
があるが、基本的には電極開孔径を大きくし大口
径レンズを形成させるか、または電極間距離を長
くして緩やかな電位変化とし長焦点レンズを形成
させることによつてレンズ性能を向上させること
ができる。しかし、陰極線管用電子銃は一般にネ
ツクと称する細いガラス円筒内に封入されて使用
されるため、まず電極の開孔即ちレンズ口径が物
理的に制限され、次いで電極間に形成される集束
電界が他の電界の影響を受けない様にするために
電極間距離が制限される。特にカラー受像管の如
く複数本の電子銃を一列に並べて使用する場合に
は電子銃間隔Sgが小さなもの程複数本ビームを集
中(コンバーゼンス)させ易いし偏向電力的にも
有利である。従つて電極の開孔はさらに小さくせ
ざるを得ない。
Most of the main lens parts are electrostatic lenses, which are formed by arranging a plurality of electrodes having openings coaxially and applying a predetermined potential. There are several types of such electrostatic lenses depending on the electrode configuration, but basically, the electrode aperture diameter is increased to form a large-diameter lens, or the distance between the electrodes is increased to create a gradual potential change. By forming a long focal length lens, lens performance can be improved. However, since electron guns for cathode ray tubes are generally used while being enclosed in a thin glass cylinder called a net, firstly the aperture of the electrodes, that is, the diameter of the lens, is physically limited, and secondly, the focused electric field formed between the electrodes is The distance between the electrodes is limited in order to avoid being affected by the electric field. Particularly when a plurality of electron guns are used in a line, such as in a color picture tube, the smaller the electron gun spacing S g is, the easier it is to converge the plurality of beams, and it is advantageous in terms of deflection power. Therefore, the openings in the electrodes have to be made even smaller.

そこで電子銃間隔Sgは小さくしたまま電極開孔
は製作可能な限り大きくし電極間距離を十分広
げ、その電極間部に補助電極を設け、ネツク内壁
の不所望な電界の影響を遮蔽する構造の電子銃が
考えられる。この様な電子銃では補助電極の電界
の影響をもなくすためには補助電極の開孔径を十
分大きく設定しなければならない。従つて補助電
極の開孔径をネツク内壁と同等程度に大きくして
電極間距離を十分広くし高性能の電子銃としたい
が、実際には補助電極の開孔径はネツク内壁と同
程度に大きくすることができず、このため電極間
距離は十分に広くとれない。これは電極を支持す
るための絶縁支持体が電極と同様にネツク内に封
入されているためで、実際にはこの絶縁支持体間
距離によつて前記補助電極の開孔径は制限されて
しまう。
Therefore, while keeping the electron gun spacing S g small, the electrode aperture is made as large as possible to widen the distance between the electrodes, and an auxiliary electrode is provided between the electrodes to shield the influence of the undesired electric field on the inner wall of the network. An electron gun is considered. In such an electron gun, the aperture diameter of the auxiliary electrode must be set sufficiently large in order to eliminate the influence of the electric field of the auxiliary electrode. Therefore, we would like to make the aperture diameter of the auxiliary electrode as large as the inner wall of the neck to make the distance between the electrodes sufficiently wide and create a high-performance electron gun, but in reality, the aperture diameter of the auxiliary electrode should be made as large as the inner wall of the neck. Therefore, the distance between the electrodes cannot be made sufficiently wide. This is because the insulating supports for supporting the electrodes are enclosed in the neck like the electrodes, and the aperture diameter of the auxiliary electrode is actually limited by the distance between the insulating supports.

〔発明の目的〕[Purpose of the invention]

本発明は前記構造の陰極線管用電子銃におい
て、補助電極の開孔径をネツク内壁によつて制限
される開孔径まで大きくすることができるように
し、従つて電極間距離を十分大きくし主レンズの
レンズ性能を向上させ所定のターゲツト上に集束
されるスポツト径をより小さくすることを目的と
するものである。
The present invention provides an electron gun for a cathode ray tube having the above structure, in which the aperture diameter of the auxiliary electrode can be increased up to the aperture diameter limited by the inner wall of the neck, and the distance between the electrodes is sufficiently increased to allow the lens of the main lens to The purpose is to improve performance and reduce the diameter of the spot focused on a given target.

〔発明の概要〕[Summary of the invention]

本発明の陰極線管用電子銃は前記構造の電子銃
の前記補助電極を境に電極支持用絶縁支持体が二
分された構造とすることによつて上記目的を達成
するものである。
The electron gun for a cathode ray tube of the present invention achieves the above object by having an electron gun having the above structure in which the insulating support for supporting the electrode is divided into two parts with the auxiliary electrode as a border.

〔発明の実施例〕[Embodiments of the invention]

以下図面を参照しつつ本発明を詳細に説明す
る。第1図は本発明を実施したカラー受像管用電
子銃の一例であり、第2図aは第1図のY−Z軸
断面図であり、第2図bはX−Z軸断面図であ
る。
The present invention will be described in detail below with reference to the drawings. Fig. 1 shows an example of an electron gun for a color picture tube embodying the present invention, Fig. 2a is a sectional view along the Y-Z axis of Fig. 1, and Fig. 2b is a sectional view along the X-Z axis. .

第1図、第2図a及び第2図bにおいて、電子
銃1は後述する複数個の電極と、これらを支える
複数の絶縁支持体2a,2bを有する。前記複数
個の電極はターゲツトとなる螢光面の赤、緑、青
各色の螢光体層(図示せず)を射突する3本の電
子ビーム3a,3b,3cを発生するための3個
のヒータ6a,6b,6cを内装する一列配設さ
れた陰極9a,9b,9cと、この3個の陰極に
対する位置にそれぞれ所定の電子ビーム通過孔部
が突設され一体化構造を有する第1グリツド1
1、第2グリツド12、第3グリツド13、第4
グリツド14、コンバーゼンス電極15と、前記
第3グリツド13と第4グリツド14の間にあつ
て1個の大きな開孔を有する補助電極16から成
り、前記絶縁支持体2a,2bに植設固定支持さ
れている。第1グリツド11と第2グリツド12
は近設配置された平板状電極であり、第3グリツ
ド13は第2グリツド12に近接配置され接合さ
れた2個のカツプ状電極23a,23bより成
り、第4グリツド14は前記第3グリツド13か
ら所定距離離れて配置され接合された2個のカツ
プ状電極24a,24bより成り、コンバーゼン
ス電極15は第4グリツド14に溶接固定した1
個のカツプ状電極25aより成る。前記各グリツ
ド電極及びコンバーゼンス電極のそれぞれカツプ
状電極の底部面及び平板状電極にはそれぞれ各電
子ビームに整合した3個の円形状の電子ビーム通
過孔部が設けられている。第1グリツド11及び
第2グリツド12の電子ビーム通過孔は比較的小
さく、第3グリツド13の第2グリツド12に面
する側の電子ビーム通過孔33a,33b,33
cはそれより大きく、第3グリツド13の第4グ
リツド14に面する側の電子ビーム通過孔43
a,43b,43c及び第4グリツド14の電子
ビーム通過孔34a,34b,34c,44a,
44b,44cは同径で比較的大きい径であり、
コンバーゼンス電極15の電子ビーム通過孔35
a,35b,35cはそれより小さい。前記補助
電極16は2個の円筒状電極26a,26bより
成り、これらの電極はそれぞれ第3グリツド1
3、第4グリツド14のカツプ状電極23b,2
4aを包含しているこの様な補助電極の1つを第
6図に示す。また前記コンバーゼンス電極15に
は図示しない陽極端子に印加される約25KVの高
電圧を加えるバルプスペーサ17が取付けられて
いる。この様な電子銃は細いガラス円筒のネツク
18内に封入されていて、ネツク下部にはステム
ピン19が配置されている。このステムピン19
は電子銃1を支持固定すると共にコンバーゼンス
電極15、第4グリツト14以外の各電極電位を
ステムピン19を通して外部より供給できるよう
になつている。
In FIG. 1, FIG. 2a, and FIG. 2b, the electron gun 1 has a plurality of electrodes, which will be described later, and a plurality of insulating supports 2a and 2b that support them. The plurality of electrodes are three electrodes for generating three electron beams 3a, 3b, and 3c that impinge on the red, green, and blue phosphor layers (not shown) of the phosphor surface as targets. A first cathode having an integrated structure includes cathodes 9a, 9b, 9c arranged in a row containing heaters 6a, 6b, 6c, and predetermined electron beam passage holes protruding from positions relative to these three cathodes. grid 1
1, 2nd grid 12, 3rd grid 13, 4th grid
It consists of a grid 14, a convergence electrode 15, and an auxiliary electrode 16 located between the third grid 13 and the fourth grid 14 and having one large opening, and is implanted and fixedly supported by the insulating supports 2a and 2b. ing. First grid 11 and second grid 12
is a flat plate-shaped electrode arranged close to the second grid 12, the third grid 13 is made up of two cup-shaped electrodes 23a and 23b arranged close to the second grid 12 and joined together, and the fourth grid 14 is composed of the third grid 13 The convergence electrode 15 consists of two cup-shaped electrodes 24a and 24b which are arranged and joined at a predetermined distance from the fourth grid 14.
It consists of two cup-shaped electrodes 25a. Three circular electron beam passage holes aligned with each electron beam are provided on the bottom surface of the cup-shaped electrode and the plate-shaped electrode of each of the grid electrodes and the convergence electrode, respectively. The electron beam passing holes of the first grid 11 and the second grid 12 are relatively small, and the electron beam passing holes 33a, 33b, 33 of the third grid 13 facing the second grid 12 are relatively small.
c is larger than that, and the electron beam passage hole 43 on the side of the third grid 13 facing the fourth grid 14
a, 43b, 43c and the electron beam passage holes 34a, 34b, 34c, 44a of the fourth grid 14,
44b and 44c have the same diameter and relatively large diameter,
Electron beam passage hole 35 of convergence electrode 15
a, 35b, and 35c are smaller than that. The auxiliary electrode 16 consists of two cylindrical electrodes 26a, 26b, each of which is connected to the third grid 1.
3. Cup-shaped electrodes 23b, 2 of the fourth grid 14
One such auxiliary electrode containing 4a is shown in FIG. Further, a bulb spacer 17 is attached to the convergence electrode 15 to apply a high voltage of about 25 KV to an anode terminal (not shown). Such an electron gun is enclosed within a narrow glass cylinder neck 18, and a stem pin 19 is arranged at the bottom of the neck. This stem pin 19
supports and fixes the electron gun 1, and is adapted to be able to supply each electrode potential other than the convergence electrode 15 and the fourth grit 14 from the outside through a stem pin 19.

以上の電極構成において、ヒーターから第3グ
リツド13及び補助電極の1つの電極26aまで
は1対の絶縁支持体2aに植設固定支持されてお
り、補助電極のもう1つの電極26bと第4グリ
ツド14はもう1対の絶縁支持体2bに植設固定
支持されていて、補助電極の2つの電極26a,
26bはそのフランジ部30a,30bにおいて
接合していて、その接合部は溶接固定され電子銃
1を構成している。従つて第1図に示す様に補助
電極16の径は1対の絶縁支持体の径DBに制限
されることなくネツク18の内壁径DNによつて
制限されるまで最大限に大きくすることが可能と
なる。
In the above electrode configuration, the parts from the heater to the third grid 13 and one of the auxiliary electrodes 26a are implanted and fixedly supported on a pair of insulating supports 2a, and the other electrode 26b of the auxiliary electrodes and the fourth grid 14 is implanted and fixedly supported by another pair of insulating supports 2b, and two auxiliary electrodes 26a,
26b is joined at its flange portions 30a and 30b, and the joined portion is fixed by welding to constitute the electron gun 1. Therefore, as shown in FIG. 1, the diameter of the auxiliary electrode 16 is not limited by the diameter DB of the pair of insulating supports, but can be maximized until it is limited by the inner wall diameter DN of the neck 18. It becomes possible.

さて上記電子銃の動作は例えば以下の様にな
る。陰極9は約150Vのカツトオフ電圧に保たれ
これにそれぞれ変調信号が加えられる。第1グリ
ツド11は接地電位が、第2グリツド12は約
700Vが印加され、第3グリツド13には約
6.5KVが、第4グリツド14には約25KVの陽極
高電圧が印加され、補助電極16には第3グリツ
ド13電位と第4グリツド14電位の略中間電位
である約16KVが印加される。主レンズ部におい
てこの様な電極構造を有する電子レンズではその
等電位分布が第3図a、第3図bに示す様にな
る。第3図aは第2図aに、第3図bは第2図b
にそれぞれ対応する図で等電位線20を示してお
り、それぞれこの電子銃の主レンズ部を説明する
ために簡略化した電極構造で示している。第3図
a、第3図bから判る様に電子レンズの径を決定
する第3グリツド13、第4グリツド14の開孔
部と略同等の部分では(図中点線内部)電位分布
はほとんど乱れず、第4図に示す様に2個の円筒
電極の電極間距離を単純に大きくしたときの周囲
電界の影響を受けない状態と同等になる。従つて
軸上電位分布は第5図に示す様にかなり緩かなも
のとなり、この電子レンズによる電子光学的倍率
は減少し、且つ球面収差係数も減少するのでレン
ズ性能は著しく向上する。
Now, the operation of the above electron gun is as follows, for example. The cathode 9 is kept at a cut-off voltage of approximately 150V, to which a modulation signal is respectively applied. The first grid 11 is at ground potential and the second grid 12 is at approximately
700V is applied to the third grid 13, and approximately
An anode high voltage of about 25 KV is applied to the fourth grid 14, and about 16 KV, which is approximately an intermediate potential between the third grid 13 potential and the fourth grid 14 potential, is applied to the auxiliary electrode 16. In an electron lens having such an electrode structure in the main lens portion, the equipotential distribution is as shown in FIGS. 3a and 3b. Figure 3a is Figure 2a, Figure 3b is Figure 2b
The equipotential lines 20 are shown in the diagrams corresponding to the respective figures, and the electrode structure is shown in a simplified manner in order to explain the main lens portion of the electron gun. As can be seen from Figures 3a and 3b, the potential distribution is almost disordered in the areas approximately equivalent to the openings of the third grid 13 and fourth grid 14 that determine the diameter of the electron lens (inside the dotted line in the figure). First, as shown in FIG. 4, the state is equivalent to the state in which the distance between the two cylindrical electrodes is simply increased, without being affected by the surrounding electric field. Therefore, the axial potential distribution becomes quite gentle as shown in FIG. 5, the electro-optical magnification by this electron lens is reduced, and the spherical aberration coefficient is also reduced, so that the lens performance is significantly improved.

第4図に示す様に単純に2つの電極の電極間距
離を大きくすることは実際には前述した様にネツ
ク内の他の電界の影響を受け電位分布が乱される
ので実用化することはできないが、本発明の如く
電子レンズ口径よりかなり大きな径を有する少な
くとも1個の補助電極を2つの電極の間に配置さ
せ、この補助電極に2つの電極電位の略中間の電
位を印加することによつて、ネツク内の他の不所
望な電界を遮蔽し且つ必要な電子レンズ部の電界
を乱さない様にできるので、第4図に示す様な単
純に2つの電極間距離を大きくしたときと同等の
高性能の電子レンズを形成させることができる。
このとき補助電極の開孔は1つの大きな開孔とす
れば良く、他の電極の如く3個の電子ビーム通過
孔は必要ないので3個の開孔部を中心間距離は変
えずにそれぞれ大きくできなくとも電極間距離を
大きくすることによつて極めて容易に電子レンズ
の性能を向上させることができる。
Simply increasing the distance between the two electrodes as shown in Figure 4 is not practical because, as mentioned above, the potential distribution will be disturbed by the influence of other electric fields within the network. However, as in the present invention, at least one auxiliary electrode having a diameter considerably larger than the electron lens aperture is disposed between two electrodes, and a potential approximately halfway between the two electrode potentials is applied to this auxiliary electrode. Therefore, it is possible to shield other undesired electric fields within the network and to not disturb the necessary electric field of the electron lens section, so it is possible to simply increase the distance between the two electrodes as shown in Fig. 4. An electronic lens with equivalent high performance can be formed.
At this time, the hole in the auxiliary electrode only needs to be one large hole, and unlike the other electrodes, three electron beam passing holes are not required, so the three holes are each made larger without changing the center distance. Even if this is not possible, the performance of the electron lens can be improved very easily by increasing the distance between the electrodes.

前記実施例のカラー受像管用電子銃ではシヤド
ウマスク又はスクリーン(ターゲツト)上の一点
において3本の電子ビームをコンバーゼンスさせ
ねばならないが、このためにはいくつかの方法が
知られている。即ち両側の電子銃自体を傾けて配
置させる方法や、両側の主レンズ又は他の電子レ
ンズを傾けて形成させる方法や、非対称レンズを
形成させる方法などがある。本発明においてもこ
れらの従来の方法はそのまま使用できるが、本発
明では補助電極の構造によつても前記コンバーゼ
ンスを達成できる。即ち、第7図a、第7図bに
示す如く、補助電極の第4グリツド側のX方向径
DX4を第3グリツド側のX方向径DX3より小
さくすることによつて、両側の電子ビームをそれ
ぞれ中央の電子ビーム側へ僅かに偏向させ、コン
バーゼンスを達成するものである。これはX−Z
軸断面において、第4グリツド側の補助電極の電
位が第3グリツド側の補助電極の電位より電子レ
ンズ部へ大きく侵入していき、この電位がその位
置での平均的電位より低いため両側の電子ビーム
3a,3cは内側へ力を受けるからである。或い
は第8図a、第8図bに示す如く、補助電極のフ
ランジ部30a,30bに絶縁体60を接着固定
した2つの補助電極16−1,16−2を用い、
これら補助電極には第3グリツド13電位と第4
グリツド14電位の略中間電位を印加するもの
の、第4グリツド14側の補助電極16−2の電
位を第3グリツド13側の補助電極16−1の電
位より僅かに低くすることによつても同じ理由に
より上記コンバーゼンスは達成できる。このとき
2個の補助電極の電極長も適当に可変させて調整
してもよい。
In the color picture tube electron gun of the above embodiment, three electron beams must be converged at one point on the shadow mask or screen (target), and several methods are known for this purpose. That is, there are a method of tilting and arranging the electron guns themselves on both sides, a method of tilting the main lenses or other electron lenses on both sides, and a method of forming an asymmetric lens. Although these conventional methods can be used as they are in the present invention, the convergence can also be achieved by the structure of the auxiliary electrode in the present invention. That is, as shown in FIGS. 7a and 7b, the diameter of the auxiliary electrode in the X direction on the fourth grid side
By making DX4 smaller than the X-direction diameter DX3 on the third grid side, the electron beams on both sides are slightly deflected toward the central electron beam, thereby achieving convergence. This is X-Z
In the axial cross section, the potential of the auxiliary electrode on the fourth grid side penetrates into the electron lens part more than the potential of the auxiliary electrode on the third grid side, and since this potential is lower than the average potential at that position, the electrons on both sides This is because the beams 3a and 3c receive force inward. Alternatively, as shown in FIGS. 8a and 8b, two auxiliary electrodes 16-1 and 16-2 are used, in which an insulator 60 is adhesively fixed to the flange portions 30a and 30b of the auxiliary electrodes,
These auxiliary electrodes have a third grid potential and a fourth grid potential.
The same result can be obtained by applying a potential approximately midway between the potentials of the grid 14, but by making the potential of the auxiliary electrode 16-2 on the fourth grid 14 side slightly lower than the potential of the auxiliary electrode 16-1 on the third grid 13 side. The above convergence can be achieved for a reason. At this time, the electrode lengths of the two auxiliary electrodes may also be appropriately varied and adjusted.

上記絶縁体60としてはセラミツクス板が好適
であり、接着剤としては耐熱性、耐電圧性に優れ
たポリイミド系の接着剤が好適である。尚、第7
図a及び第8図aは第2図と同じくY−Z軸断面
を、第7図b及び第8図bはX−Z軸断面をそれ
ぞれ示す。
A ceramic plate is suitable as the insulator 60, and a polyimide adhesive with excellent heat resistance and voltage resistance is suitable as the adhesive. Furthermore, the seventh
Figures a and 8a show Y-Z axis cross-sections as in Figure 2, and Figures 7b and 8b show X-Z axis cross-sections, respectively.

前記実施例では補助電極の電位をステムピンを
通じ外部から供給しているが本発明はこれらに限
らず抵抗分割により供給してもよい。例えば第9
図に示す様に薄板状のセラミツク基板50に抵抗
材51及び接続部52を配置し、ガラスコート5
3した抵抗体54を第10図の如く電子銃1の各
電極を支える絶縁支持体2a,2bの背後にそれ
ぞれ設置し、第4グリツド14側の絶縁支持体2
bの背後に設置した抵抗体54bは一方をコンバ
ーゼンス電極15に接続して陽極高電圧Ebを印
加し、一方を補助電極26b側に接続し、且つ第
3グリツド13側の絶縁支持体2aの背後に設置
した抵抗体54aは一方を補助電極26aに接続
し、一方をステムピン19に接続した外部にて接
地電圧55又は低電圧源56又は抵抗体57に接
続し、適当な位置を補助電極に接続する。この様
な構成にすると電気的には第11図に示す様にな
り補助電極及び第3グリツドには陽極高電圧Eb
の抵抗体による分割電圧が供給される。
In the embodiment described above, the potential of the auxiliary electrode is supplied from the outside through the stem pin, but the present invention is not limited to this, and the potential may be supplied by resistance division. For example, the 9th
As shown in the figure, a resistive material 51 and a connecting portion 52 are arranged on a thin ceramic substrate 50, and a glass coat 5
As shown in FIG. 10, the three resistors 54 are installed behind the insulating supports 2a and 2b that support each electrode of the electron gun 1, and the insulating supports 2 on the fourth grid 14 side are
One side of the resistor 54b installed behind the convergence electrode 15 is connected to apply the anode high voltage Eb, the other side is connected to the auxiliary electrode 26b side, and the resistor 54b is installed behind the insulating support 2a on the third grid 13 side. The resistor 54a installed at do. With this configuration, the electrical configuration will be as shown in Figure 11, and the auxiliary electrode and third grid will be connected to the anode high voltage Eb.
A divided voltage is supplied by the resistor.

この様な抵抗体54a,54bとしてはカラー
受像管において静電コンバーゼンス調整用電極の
電極電位を供給する方法として使用されている抵
抗体が好適である。
As such resistors 54a and 54b, resistors used as a method for supplying the electrode potential of the electrostatic convergence adjustment electrode in color picture tubes are suitable.

第10図に示した実施例では抵抗体を1本の板
状として絶縁支持体の背後に設置しているが、本
発明はこれに限らず絶縁支持体の背後に直接抵抗
材を塗布してもいいし、絶縁支持体自体を抵抗体
として使用してもいいことは言う迄もない。
In the embodiment shown in FIG. 10, the resistor is in the form of a single plate and is installed behind the insulating support, but the present invention is not limited to this, and the resistive material can be applied directly behind the insulating support. Needless to say, the insulating support itself may be used as a resistor.

以上の如く補助電極電位を抵抗分割によつて供
給する様にすればステム部において中高圧の補助
電極電位を供給する必要はなくステム部周辺での
耐圧信頼性が向上し、実用性に富んだ陰極線管を
提供できる。さらには第3グリツド電位をも抵抗
分割により供給するようにすればステム部周辺で
の耐圧信頼性はさらに向上するし、第3グリツド
電位をステムピンを介し低電圧でコントロールで
きるので動的に電子レンズの集束状態を調整する
ことが容易となる。
As described above, if the auxiliary electrode potential is supplied by resistor division, there is no need to supply a medium-high voltage auxiliary electrode potential at the stem part, and the withstand voltage reliability around the stem part is improved, making it highly practical. We can provide cathode ray tubes. Furthermore, if the third grid potential is also supplied by resistor division, the withstand voltage reliability around the stem part will be further improved, and since the third grid potential can be controlled with a low voltage via the stem pin, it will be possible to dynamically control the electron lens. It becomes easy to adjust the focusing state.

また上記実施例の主レンズ部では第3グリツド
と第4グリツドの2個の電極から成るバイポテン
シヤル形レンズを基本とし、その電極間に大開孔
を有する補助電極を配置した構成となつている
が、本発明はこれに限らず第12図aに示す様に
ユニポテンシヤル形レンズを基本としてもいい
し、第12図bに示す様にクオドラポテンシヤル
形レンズを基本としてもいいし、第12図cに示
す様にペリオデイツクポテンシヤル形レンズを基
本としてもいいし、その他トライポテンシヤル形
レンズを基本としても本発明の本質が変わるもの
ではない。第12図a〜第12図cは主レンズ部
の概略構成図を示すものであり、それぞれ電子レ
ンズを形成させる部分にすべて補助電極を配し本
発明を適用しているが、主要な電子レンズ部だけ
に本発明を適用してもよいことは言うまでもな
い。特に第12図b、第12図cに示すレンズ系
では第3グリツドG3の電圧を約8〜9KVに設定
できるので物点形成部からの電子ビームの質を最
良の状態で使用でき、総合的な電子銃の性能はさ
らに良くなる。
Furthermore, the main lens portion of the above embodiment is basically a bipotential lens consisting of two electrodes, a third grid and a fourth grid, and an auxiliary electrode having a large aperture is arranged between the electrodes. The present invention is not limited to this, but may be based on a unipotential lens as shown in FIG. 12a, or may be based on a quadrapotential lens as shown in FIG. The essence of the present invention does not change even if a periodic potential type lens as shown in c is used as the basis, or other tripotential type lenses are used as the basis. Figures 12a to 12c show schematic configuration diagrams of the main lens part, and the present invention is applied by arranging auxiliary electrodes in all the parts where the electron lens is formed. It goes without saying that the present invention may be applied only to this section. In particular, in the lens systems shown in Figures 12b and 12c, the voltage of the third grid G3 can be set to about 8 to 9KV, so the quality of the electron beam from the object point formation part can be used in the best condition, and the overall The performance of standard electron guns will be even better.

また前記実施例では3本の電子銃を横方向一列
に一体化した構造となつているが本発明はこれに
限らず正三角形状に3本の電子銃を配置した構造
のものや、その他多数本の電子銃を配置したもの
や、或いは1本の電子銃構造のものでも本発明が
適用できることは言う迄もない。
Further, although the above embodiment has a structure in which three electron guns are integrated in a row in the horizontal direction, the present invention is not limited to this, and the present invention can also be applied to a structure in which three electron guns are arranged in an equilateral triangle shape, and many other structures. It goes without saying that the present invention can be applied to a structure in which multiple electron guns are arranged or a single electron gun structure.

〔発明の効果〕〔Effect of the invention〕

以上の如く本発明によれば、対向する2つの電
極の間にこれらの電極より大きな1つの補助電極
を配し、補助電極と上記2つの電極はそれぞれ絶
縁支持体により固定保持され、この絶縁支持体は
補助電極部で2分されていて、上記2つの電極は
補助電極を介して固定されている構造の陰極線管
用電子銃とすることによつて、補助電極部の開孔
径をネツク内径によつて制限されるまで十分大き
くすることができる。またこれに対向する2つの
電極の中間電位を印加することによつて上記対向
する2つの電極間距離を十分大きく設定すること
ができ、実質的に電極間距離の長い長焦点レンズ
を実用上問題なく形成させることができる。本発
明の陰極線管用電子銃は構造が簡単なので製造が
容易であり従つて実用性に富んだ高性能の陰極線
管用電子銃を提供することができるものである。
As described above, according to the present invention, one auxiliary electrode larger than these electrodes is arranged between two opposing electrodes, and the auxiliary electrode and the two electrodes are each fixedly held by an insulating support, and this insulating support By using a cathode ray tube electron gun with a structure in which the body is divided into two parts by an auxiliary electrode part, and the two electrodes are fixed via the auxiliary electrode, the aperture diameter of the auxiliary electrode part can be adjusted according to the inner diameter of the neck. It can be made large enough until it is limited. In addition, by applying an intermediate potential between the two opposing electrodes, the distance between the two opposing electrodes can be set sufficiently large, making it practical to create a long focal length lens with a long distance between the electrodes. It can be formed without any problem. The cathode ray tube electron gun of the present invention has a simple structure and is easy to manufacture, making it possible to provide a highly practical and high performance electron gun for cathode ray tubes.

また本発明の電子銃では複数個の電子ビームの
ビーム間隔即ち電子ビーム通過孔間距離を大きく
することなく高性能の電子銃を得ることができる
のでカラー受像管においては偏向電力の少ない且
つコンバーゼンス品位の良好な高性能電子銃とし
て使用することができる。
In addition, in the electron gun of the present invention, a high-performance electron gun can be obtained without increasing the beam spacing between multiple electron beams, that is, the distance between the electron beam passing holes, so that it is possible to obtain a high-performance electron gun with less deflection power and high convergence quality in a color picture tube. It can be used as a good high performance electron gun.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の一実施例を示すものでカラー
受像管用電子銃の側断面図、第2図a及び第2図
bは第1図のY−Z軸及びX−Z軸断面図、第3
図a、第3図b及び第4図は本発明を説明するた
めの等電位分線布図で、第3図a及び第3図bは
第2図a及び第2図bにそれぞれ対応する断面
図、第4図は同軸円筒レンズの断面図、第5図は
第4図における軸上電位分布図、第6図は第1図
の実施例に使用されている電極の斜視図、第7図
a、第7図b及び第8図a、第8図bは本発明の
他の実施例を示すもので第7図a及び第8図a、
第7図b及び第8図bはそれぞれY−Z軸、X−
Z軸での断面図、第9図は抵抗体の一部を示す断
面図、第10図は第9図の抵抗体を使用したとき
の本発明の実施例、第11図は第10図の電気的
構成図、第12図a、第12図b、第12図cは
本発明の他の実施例を示す側断面図である。 1……電子銃、2a,2b……絶縁支持体、3
a,3b,3c……電子ビーム、13……第3グ
リツド、14……第4グリツド、15……コンバ
ーゼンス電極、16……補助電極、54a,54
b……抵抗体。
FIG. 1 shows an embodiment of the present invention, and is a side sectional view of an electron gun for a color picture tube, FIGS. 2a and 2b are sectional views along the Y-Z axis and the X-Z axis of FIG. Third
Figure a, Figure 3 b, and Figure 4 are equipotential distribution diagrams for explaining the present invention, and Figure 3 a and Figure 3 b correspond to Figure 2 a and Figure 2 b, respectively. 4 is a sectional view of the coaxial cylindrical lens, FIG. 5 is an axial potential distribution diagram in FIG. 4, FIG. 6 is a perspective view of the electrode used in the embodiment of FIG. 1, and FIG. Figures a, 7b, 8a and 8b show other embodiments of the present invention; Figures 7a and 8a,
Figures 7b and 8b are Y-Z axes and X-axes, respectively.
9 is a sectional view showing a part of the resistor, FIG. 10 is an embodiment of the present invention using the resistor shown in FIG. 9, and FIG. 11 is a cross-sectional view showing a part of the resistor. The electrical configuration diagrams, FIG. 12a, FIG. 12b, and FIG. 12c are side sectional views showing other embodiments of the present invention. 1... Electron gun, 2a, 2b... Insulating support, 3
a, 3b, 3c...Electron beam, 13...Third grid, 14...Fourth grid, 15...Convergence electrode, 16...Auxiliary electrode, 54a, 54
b...Resistor.

Claims (1)

【特許請求の範囲】[Claims] 1 少なくとも電子ビーム発生部とこの電子ビー
ムを所定のターゲツト上に集束させる主レンズ部
より成る電子銃であつて、前記主レンズ部がそれ
ぞれ電子ビーム通過孔を有する少なくとも対向す
る2つの電極と少なくとも一部がこれらの電極の
間に位置してこれらの電極が有する電子ビーム通
過孔より大きな開孔を有した少なくとも1つの補
助電極を具備し、前記各電極は絶縁支持体によつ
て固定保持されていて、前記対向する2つの電極
には相対的に低位の電位と相対的に高位の電位が
印加され、前記補助電極には相対的に中位の電位
が印加された構造の主レンズ部からなり、前記絶
縁支持体が電子ビームの進行方向に沿つて前記補
助電極を境に二分されていることを特徴とする陰
極線管用電子銃。
1 An electron gun comprising at least an electron beam generating section and a main lens section for focusing the electron beam onto a predetermined target, the main lens section having at least two opposing electrodes each having an electron beam passing hole, The part is provided with at least one auxiliary electrode located between these electrodes and having an opening larger than the electron beam passing hole of these electrodes, and each of the electrodes is fixedly held by an insulating support. The main lens portion has a structure in which a relatively low potential and a relatively high potential are applied to the two opposing electrodes, and a relatively intermediate potential is applied to the auxiliary electrode. An electron gun for a cathode ray tube, characterized in that the insulating support body is divided into two along the traveling direction of the electron beam with the auxiliary electrode as a border.
JP2861184A 1984-02-20 1984-02-20 Electron gun for cathode-ray tube Granted JPS60175342A (en)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2861184A JPS60175342A (en) 1984-02-20 1984-02-20 Electron gun for cathode-ray tube
DE8585101706T DE3561781D1 (en) 1984-02-20 1985-02-15 Electron gun
EP85101706A EP0152933B1 (en) 1984-02-20 1985-02-15 Electron gun
US06/702,725 US4712043A (en) 1984-02-20 1985-02-19 Electron gun with large aperture auxiliary electrode

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2861184A JPS60175342A (en) 1984-02-20 1984-02-20 Electron gun for cathode-ray tube

Publications (2)

Publication Number Publication Date
JPS60175342A JPS60175342A (en) 1985-09-09
JPH0552019B2 true JPH0552019B2 (en) 1993-08-04

Family

ID=12253361

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2861184A Granted JPS60175342A (en) 1984-02-20 1984-02-20 Electron gun for cathode-ray tube

Country Status (1)

Country Link
JP (1) JPS60175342A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150072059A (en) * 2013-12-19 2015-06-29 한국세라믹기술원 Method for wet oxidation curing polycarbosilane and method for manufcaturing silicon carbide comprising the same

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR20150072059A (en) * 2013-12-19 2015-06-29 한국세라믹기술원 Method for wet oxidation curing polycarbosilane and method for manufcaturing silicon carbide comprising the same

Also Published As

Publication number Publication date
JPS60175342A (en) 1985-09-09

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