JPH0556569B2 - - Google Patents
Info
- Publication number
- JPH0556569B2 JPH0556569B2 JP59070229A JP7022984A JPH0556569B2 JP H0556569 B2 JPH0556569 B2 JP H0556569B2 JP 59070229 A JP59070229 A JP 59070229A JP 7022984 A JP7022984 A JP 7022984A JP H0556569 B2 JPH0556569 B2 JP H0556569B2
- Authority
- JP
- Japan
- Prior art keywords
- heating
- optical recording
- recording member
- light
- temperature
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/002—Recording, reproducing or erasing systems characterised by the shape or form of the carrier
- G11B7/0037—Recording, reproducing or erasing systems characterised by the shape or form of the carrier with discs
Landscapes
- Manufacturing Optical Record Carriers (AREA)
Description
【発明の詳細な説明】
産業上の利用分野
本発明は、データ信号、音響信号、映像信号な
どの情報信号を光学的に記録するメモリ部材、例
えば、光デイスクメモリ、光カードメモリ等の基
板上に形成さた記録薄膜にレーザ光を照射するこ
とにより、照射部の光学的な変化を信号として再
生を行う光学記録部材の評価装置に関するもので
ある。DETAILED DESCRIPTION OF THE INVENTION Field of Industrial Application The present invention relates to memory members that optically record information signals such as data signals, audio signals, and video signals, such as optical disc memories, optical card memories, etc. The present invention relates to an evaluation device for an optical recording member that performs reproduction by irradiating a recording thin film formed on a laser beam with a laser beam and using an optical change in the irradiated portion as a signal.
従来例の構成とその問題点
光メモリ部材は、記録薄膜にレーザ光を集光し
て照射し、照射部を加熱することにより記録状態
を得る。また記録薄膜の評価についても、同様に
レーザ光を集光して直接記録を行い、薄膜の光学
的変化を観測する方法で行つている。しかるに光
学記録部材の感度、例えば記録開始に必要なレー
ザパワーは、記録部材の熱的な変化温度と密接な
相関がある。ここで、変化温度とは次のように定
義される。すなわちある一定の高温雰囲気中に記
録部材を放置した場合、記録部材の光学状態に変
化が生じるが、その変化を与える最低の雰囲気温
度を記録部材の変化温度とする。例えばこの変化
温度が低い程、実用時の薄膜にレーザ光を集光し
て記録を行う際にレーザ光パワーが低くて済み、
一般に高感度となる。また、逆に変化温度が低過
ぎた場合、薄膜の安定性が悪くなるという相関が
ある。従つてこの変化温度を測定することによつ
て、デイスク状、カード状のメモリ部材にレーザ
光を照射して記録する場合の特性が推定できる。
この方法は、例えばTeOX(0<x<2)で表わ
されるTe−O系薄膜、カルコゲン系化合物薄膜、
その他Teを主成分とする薄膜を光学記録部材等、
ヒートモード記録を行なう薄膜全般に適用でき
る。この場合、測定サンプルとしては、基板に光
学的に透明かつ均質であり、温度変化に対し安定
なもの、例えば石英ガラス、硬質二級ガラス、ソ
ーダガラスのようなものを用いて、この基材にメ
モリ部材薄膜を設けたものを試料とし、前記試料
を加熱した後の光学的な変化を測定する。しか
し、従来前記変化温度を測定するには、試料をあ
る一定温度に保たれた加熱ヒータで加熱し、その
後に反射率、透過率等の光学特性を測定し、次に
ヒータ温度を変え新しい試料を用いて同様の測定
を繰り返す必要があつた。この方法では、多数の
同一試料を必要とし、長い測定時間を要した。ま
た、変化温度の正確な把握のためには、ヒータの
設定温度をさらに細かく変化させ、多くの測定回
数と手間を要した。Conventional Structure and Problems The optical memory member obtains a recorded state by condensing and irradiating a recording thin film with laser light and heating the irradiated portion. In addition, recording thin films are also evaluated using a method in which direct recording is performed by condensing laser light and observing optical changes in the thin film. However, the sensitivity of an optical recording member, such as the laser power required to start recording, has a close correlation with the thermal change temperature of the recording member. Here, the changing temperature is defined as follows. That is, when a recording member is left in a certain high-temperature atmosphere, a change occurs in the optical state of the recording member, and the lowest atmospheric temperature that causes this change is defined as the change temperature of the recording member. For example, the lower this temperature change is, the lower the laser light power will be needed when recording by focusing the laser light on a thin film in practical use.
Generally high sensitivity. On the other hand, if the changing temperature is too low, there is a correlation that the stability of the thin film deteriorates. Therefore, by measuring this temperature change, it is possible to estimate the characteristics when a disk-shaped or card-shaped memory member is irradiated with laser light and recorded.
This method is applicable to, for example, a Te-O thin film represented by TeO x (0<x<2), a chalcogen compound thin film,
Other thin films mainly composed of Te are used for optical recording materials, etc.
It can be applied to all thin films that perform heat mode recording. In this case, as a measurement sample, use a substrate that is optically transparent, homogeneous, and stable against temperature changes, such as quartz glass, hard second-class glass, or soda glass. A sample provided with a memory member thin film is used, and optical changes after heating the sample are measured. However, conventionally, in order to measure the temperature change, a sample is heated with a heater that is kept at a certain temperature, then optical properties such as reflectance and transmittance are measured, and then the heater temperature is changed and a new sample is heated. It was necessary to repeat similar measurements using This method required a large number of identical samples and required a long measurement time. In addition, in order to accurately grasp the changing temperature, the set temperature of the heater was changed more precisely, which required a large number of measurements and a lot of effort.
発明の構成
本発明は、光メモリ部材の昇温時における光学
特性に温度による変化過程を短時間、かつ簡便に
さらに正確に測定することを目的とする。Structure of the Invention An object of the present invention is to easily and more accurately measure the temperature-induced change process in the optical properties of an optical memory member when the temperature is increased.
発明の目的
本発明は、透明な基板上に設けられた薄膜から
なる試料をある一定速度で昇温させる加熱手段
と、光源と、前記光源からの光を薄膜に照射する
手段と、前記薄膜からの反射光と透過光の少なく
ともいずれかを検出する手段から構成される。OBJECTS OF THE INVENTION The present invention provides heating means for raising the temperature of a sample made of a thin film provided on a transparent substrate at a certain constant rate, a light source, means for irradiating the thin film with light from the light source, and The device comprises means for detecting at least one of reflected light and transmitted light.
実施例の説明
以下、本光学記録部材の評価装置の実施例の構
成を図面を参照して説明する。この評価装置は、
加熱部3、光源4、光検出器5,6、ハーフミラ
ー7よりなつている。被測定試料は、基板1およ
びその上に設けられた記録薄膜2からなつてい
る。DESCRIPTION OF EMBODIMENTS Hereinafter, the configuration of an embodiment of the present optical recording member evaluation apparatus will be described with reference to the drawings. This evaluation device is
It consists of a heating section 3, a light source 4, photodetectors 5 and 6, and a half mirror 7. The sample to be measured consists of a substrate 1 and a recording thin film 2 provided thereon.
加熱部3は、基板1と記録薄膜2の熱容量に対
し、十分に大きな熱容量をもつ熱源を持ち、基板
1の下に基板保持も兼ねて設ける。加熱部は、試
料の基板1と接触する箇所に平面性、熱伝導性、
かつ耐熱性のよい金属平板からなる加熱用基板を
設け、この加熱用基板を加熱し、基板1との接触
面からの熱伝導を利用して試料を昇温させる構造
とする。加熱用基板の加熱方法には、ニクロム
線、タングステン線等を使用したヒータ加熱や、
大出力レーザ、ランプ光源を用いた光加熱等が適
用できる。 The heating section 3 has a heat source having a sufficiently large heat capacity with respect to the heat capacity of the substrate 1 and the recording thin film 2, and is provided under the substrate 1 to also serve as a substrate support. The heating part has flatness, thermal conductivity,
A heating substrate made of a flat metal plate with good heat resistance is provided, and the heating substrate is heated to raise the temperature of the sample using heat conduction from the contact surface with the substrate 1. Heating methods for heating substrates include heater heating using nichrome wire, tungsten wire, etc.
Optical heating using a high-output laser or a lamp light source can be applied.
光学特性測定用の光源4としては、光束が平行
に近づけ易く、発光波長巾の狭い単色の光源をモ
ニター光として用いる、例えば、発光ダイオー
ド、半導体レーザ、ガスレーザ等が使用できる。
なお発光ダイオード、半導体レーザは、出射光が
一定の広がりをもつため、発光部直後にレンズを
設け平行光束とする。光検出器5,6としては、
フオトセル、フオトダイオード等が使用できる。
ハーフミラー7としては、光源4の発光波長の光
を一部透過し、一部反射する平板であればよく、
例えばガラス板の上に金属薄膜をコーテンイング
したもの等が使用できる。 As the light source 4 for measuring optical characteristics, a monochromatic light source whose luminous flux is easily parallelized and whose emission wavelength width is narrow can be used as a monitor light, such as a light emitting diode, a semiconductor laser, a gas laser, etc.
Note that since light emitting diodes and semiconductor lasers emit light with a certain spread, a lens is provided immediately after the light emitting part to form a parallel beam of light. As the photodetectors 5 and 6,
A photocell, photodiode, etc. can be used.
The half mirror 7 may be any flat plate that partially transmits and partially reflects the light of the emission wavelength of the light source 4.
For example, a glass plate coated with a metal thin film can be used.
本評明価装置の光学系は、光源4からの平行光
が基板1上の記録薄膜2に垂直に入射する構成と
し、記録薄膜からの透過光を光検出器5により検
出し、透過率を測定する。また記録薄膜からの反
射光を入射光路上に設けたハーフミラー7を介し
て、光検出器6により検出し、反射率を測定す
る。 The optical system of this evaluation device has a structure in which parallel light from a light source 4 enters the recording thin film 2 on the substrate 1 perpendicularly, and the transmitted light from the recording thin film is detected by a photodetector 5 to calculate the transmittance. Measure. Further, the reflected light from the recording thin film is detected by a photodetector 6 via a half mirror 7 provided on the incident optical path, and the reflectance is measured.
前記光学系において、加熱部3の温度を徐々に
上昇させ、加熱部3、基板1、記録薄膜2と接触
部の熱伝導により、記録薄膜2を昇温させる。薄
膜の昇温過程における温度、透過率、反射率を測
定し、その結果をペンレコーダ等を用いて記録す
ることにより、記録薄膜の熱的な光学特性の変位
が連続的に観測可能となる。 In the optical system, the temperature of the heating section 3 is gradually increased, and the temperature of the recording thin film 2 is increased by heat conduction between the heating section 3, the substrate 1, the recording thin film 2, and the contact portion. By measuring the temperature, transmittance, and reflectance during the heating process of the thin film and recording the results using a pen recorder or the like, it becomes possible to continuously observe the displacement of the thermal optical properties of the recording thin film.
光源4には、He−Neレーザ、λ=632.8nmを
用いる。光検出器5,6には、シリコンフオトセ
ルを用いる。ハーフミラー7には、ガラス基板上
に金属薄膜をコーテイングしたものを用い、レー
ザ光に対し45°の角度で設ける。 As the light source 4, a He-Ne laser with λ=632.8 nm is used. Silicon photocells are used for the photodetectors 5 and 6. The half mirror 7 is made of a glass substrate coated with a metal thin film, and is provided at an angle of 45° with respect to the laser beam.
加熱部3の断面の構造について、第2図をもと
に説明する。加熱用基盤8は、耐熱性の良いステ
レンス鋼平板を用い、中央にレーザ光スポツトと
同等の面積をもつ小孔20を設ける。また、小孔
位置より2〜3mmの箇所から外向けに細い溝21
を設ける。前記溝21の中に添つて、基板1の温
度検出用の熱電対9を設ける。なお、小孔20の
大きさは、熱電対9の出力の示す温度と、試料上
の測定用モニター光の当たる点の温度の差と密接
に関係する。例えば、基板1の厚さ0.5mm、直径
10mmの円板状硬質二級ガラスを用い、前記基板と
小孔の面積比が10:5の場合、円板上のモニター
光照射部A点の温度と熱電対9の指示温度の差
は、室温から300℃まで昇温した場合に最大20℃、
面積比が10:3の場合は同様の範囲で最大8℃、
面積比が10:1の場合は同様の範囲で最大2℃以
下となる。これより、測定試料の面積に対し小孔
20の面積が10%以下であれば、試料温度の正
確、かつ安定な測定が可能となる。加熱用基板8
の熱源としてヒータ線10をコイル状に巻き、加
熱用基板8と近接して設ける。基板1の温度が一
定速度で上昇するように、熱電対9の出力をフイ
ードバツクし、ヒータ線に加える電圧を制御す
る。また、昇温速度は、同様に印加電圧の制御に
より可変となる。 The cross-sectional structure of the heating section 3 will be explained based on FIG. 2. The heating base 8 is made of a stainless steel flat plate with good heat resistance, and has a small hole 20 in the center having the same area as the laser beam spot. In addition, a thin groove 21 extends outward from a point 2 to 3 mm from the small hole position.
will be established. A thermocouple 9 for detecting the temperature of the substrate 1 is provided along the groove 21 . Note that the size of the small hole 20 is closely related to the difference between the temperature indicated by the output of the thermocouple 9 and the temperature at the point on the sample that is hit by the measuring monitor light. For example, the thickness of substrate 1 is 0.5 mm, the diameter
When a 10 mm disc-shaped hard secondary glass is used and the area ratio of the substrate to the small hole is 10:5, the difference between the temperature at point A of the monitor light irradiation part on the disc and the temperature indicated by the thermocouple 9 is: Maximum temperature is 20℃ when the temperature is raised from room temperature to 300℃,
When the area ratio is 10:3, the maximum temperature is 8℃ in the same range,
If the area ratio is 10:1, the maximum temperature will be 2°C or less within the same range. Accordingly, if the area of the small holes 20 is 10% or less of the area of the measurement sample, accurate and stable measurement of the sample temperature is possible. Heating substrate 8
As a heat source, a heater wire 10 is wound into a coil and placed close to the heating substrate 8. The output of the thermocouple 9 is fed back and the voltage applied to the heater wire is controlled so that the temperature of the substrate 1 rises at a constant rate. Further, the temperature increase rate is similarly variable by controlling the applied voltage.
第3図に本評価装置の実施例の全体構成を示
す。記録材料の加熱時における雰囲気の影響を調
べるため、加熱部3の周囲を密閉する容器底部1
1の側面に気体導入口22を設け、容器上部12
の中央に気体放出口と光源からの光束の通過を兼
ねた穴23を設ける。測定するサンプルには、加
熱すると雰囲気によつて影響をうける場合があ
る。例えば空気中の酸素により酸化されることが
ある。このような場合、装置全体を不活性雰囲気
に置くことが考えられるが、多量の不活性ガスを
必要とし、装置の気密性も良くしなければならな
い。しかし本実施例の構造を用いれば、気体放出
口からわずかの不活性ガスを流し出しながら、こ
の放出口を通して光を導入することにより、加熱
用基板およびその周辺のみを不活性雰囲気にしな
がら測定することが可能である。さらに特殊な雰
囲気中での特性の測定にも適用できる。雰囲気と
して導入する気体には、N2、Ar、He、O2等が
ある。 FIG. 3 shows the overall configuration of an embodiment of this evaluation device. In order to examine the influence of the atmosphere during heating of the recording material, the bottom of the container 1 is sealed around the heating section 3.
A gas inlet 22 is provided on the side surface of the container upper part 12.
A hole 23 is provided in the center of the hole 23, which serves as a gas discharge port and a passage for the light beam from the light source. The sample to be measured may be affected by the atmosphere when heated. For example, it may be oxidized by oxygen in the air. In such a case, it is conceivable to place the entire apparatus in an inert atmosphere, but this requires a large amount of inert gas and the apparatus must be airtight. However, if the structure of this example is used, a small amount of inert gas is flowed out from the gas outlet and light is introduced through the outlet, making it possible to perform measurements while creating an inert atmosphere only in the heating substrate and its surroundings. Is possible. Furthermore, it can also be applied to measuring characteristics in special atmospheres. Gases introduced as the atmosphere include N 2 , Ar, He, O 2 and the like.
評価の初期設定として加熱基板を冷却するため
に、ノズル13を介して圧縮気体(例N2、Ar
等)を当てる。これは、測定サイクルを向上させ
る。 As an initial setting for the evaluation, compressed gas (e.g. N 2 , Ar
etc.). This improves the measurement cycle.
本装置の外乱光による測定誤差を低減させるた
めに、光学系全体を外箱14と扉15を設ける。
また扉15とモニター光の遮へい板16を連動さ
せ、扉が開いた状態では試料にモニター光が入射
しない構造とし、試料からの反射光等から測定者
の目を保護する効果がある。 In order to reduce measurement errors due to disturbance light of this device, the entire optical system is provided with an outer box 14 and a door 15.
In addition, the door 15 and the monitor light shielding plate 16 are interlocked so that the monitor light does not enter the sample when the door is open, which has the effect of protecting the eyes of the measurer from reflected light from the sample.
本装置により材料評価を行う前に、光源からの
モニター光を記録薄膜のない状態で光検出器5で
受け、透過率100%を校正する。また、記録薄膜
の代わりに反射率が既知の反射板を設け、反射率
を校正する。昇温時のモニター光のパワー変動
は、光路上のハーフミラー7を介して、光検出器
17により常時観測できる。 Before material evaluation is performed using this apparatus, the photodetector 5 receives monitor light from a light source without a recording thin film, and the transmittance is calibrated to 100%. Furthermore, a reflector whose reflectance is known is provided in place of the recording thin film, and the reflectance is calibrated. The power fluctuation of the monitor light during temperature rise can be constantly observed by the photodetector 17 via the half mirror 7 on the optical path.
以上のような構成をもつ本評価装置により、記
録薄膜の昇温過程における光学測定したのが、第
4図である。なお昇温速度は、2℃/secである。
曲線Bは透過率変化であり、曲線Cは記録薄膜側
からの反射率変化である。また曲線Dは記録薄膜
2と基板1を逆にし、光源側に基板が面した場合
の反射率変化である。 FIG. 4 shows optical measurements taken during the heating process of the recording thin film using this evaluation apparatus having the above-described configuration. Note that the temperature increase rate was 2° C./sec.
Curve B is a change in transmittance, and curve C is a change in reflectance from the recording thin film side. Curve D shows the change in reflectance when the recording thin film 2 and substrate 1 are reversed and the substrate faces the light source side.
本実施例では、透過光あるいは反射光を2個の
光検出器により測定する例であつたが、第4図の
曲線はほぼ同じ温度が変化していることから、い
ずれか一方の光を検出する方法においても薄膜の
温度変化を測定することが可能である。 In this example, transmitted light or reflected light was measured using two photodetectors, but since the curves in Figure 4 show almost the same temperature changes, either one of the light is detected. It is also possible to measure temperature changes in a thin film using this method.
このように、薄膜の光学特性の温度変化が連続
的に測定することができ、また測定時間も常温か
ら300℃まで約2〜3分で測定することが可能で
あつた。 In this way, temperature changes in the optical properties of the thin film could be measured continuously, and the measurement time was also about 2 to 3 minutes from room temperature to 300°C.
得られる情報としては、変化前の透過率、反射
率、変化後の透過率、反射率、そして変化温度で
ある。また昇温速度を変えることにより、変化を
活性化過程として、とらえた場合の活性化エネル
ギーも推定できる。このような結果をもとに、記
録感度、再生信号の大きさ、および信頼性の面か
ら材料を評価できる。 The information obtained includes transmittance and reflectance before change, transmittance and reflectance after change, and temperature change. Furthermore, by changing the heating rate, the activation energy can be estimated when the change is considered as an activation process. Based on such results, materials can be evaluated in terms of recording sensitivity, reproduction signal magnitude, and reliability.
発明の効果
以上のように、本発明による材料評価装置は、
光メモリ部材の温度に対する光学特性を短時間、
かつ簡便に、さらに正確に測定することができ、
薄膜の光記録感度や熱的な安定性を予測すること
が可能となつた。また、測定結果より得られる薄
膜の変化温度や光学定数は、材料組成や製法と密
接に関係し、材料特性の解析に役立ち、薄膜形成
時の再現性の評価等にも有効である。Effects of the Invention As described above, the material evaluation device according to the present invention has the following features:
In a short period of time, the optical characteristics of optical memory components relative to temperature can be measured.
and can be easily and accurately measured.
It has become possible to predict the optical recording sensitivity and thermal stability of thin films. Furthermore, the temperature change and optical constants of the thin film obtained from the measurement results are closely related to the material composition and manufacturing method, and are useful for analyzing material properties and for evaluating reproducibility during thin film formation.
第1図は本発明の光学記録部材の評価装置の一
実施例の要部構成を示す断面図、第2図は加熱部
の断面図、第3図は同評価装置の実施例の構成を
示す断面図、第4図は、同評価装置を用いた温度
に対する記録薄膜の光学特性の測定例を示す図で
ある。
1……基板、2……記録薄膜、3……加熱部、
4……光源、5,6……光検出器、7……ハーフ
ミラー、8……加熱用基板、9……熱電対、10
……ヒータ線、11……容器底部、12……容器
上部、13……ノズル、14……外箱、15……
扉、16……遮へい板。
FIG. 1 is a cross-sectional view showing the configuration of essential parts of an embodiment of the optical recording member evaluation device of the present invention, FIG. 2 is a cross-sectional view of a heating section, and FIG. 3 is a configuration of an embodiment of the same evaluation device. The cross-sectional view, FIG. 4, is a diagram showing an example of measurement of the optical characteristics of the recording thin film with respect to temperature using the same evaluation apparatus. 1... Substrate, 2... Recording thin film, 3... Heating section,
4... Light source, 5, 6... Photodetector, 7... Half mirror, 8... Heating substrate, 9... Thermocouple, 10
... Heater wire, 11 ... Container bottom, 12 ... Container top, 13 ... Nozzle, 14 ... Outer box, 15 ...
Door, 16...shielding board.
Claims (1)
材を、一定の昇温速度で昇温する加熱部と、前記
光学記録部材を照射する光源と、その照射した光
の反射光と透過光の少なくともいずれかの光を検
出するための光検出器を有する光学記録部材の評
価装置。 2 加熱部が、光学記録部材の加熱用基板とその
加熱用基板を加熱する熱源と温度検出器から構成
され、その加熱用基板に光源からの光を通過させ
るための小孔を有する特許請求の範囲第1項記載
の光学記録部材の評価装置。 3 小孔の開口面積が、記録部材の面積1/10以下
である特許請求の範囲第2項記載の光学記録部材
の評価装置。 4 加熱部の昇温速度が、熱源への入力を可変す
ることにより自由に設定できる特許請求の範囲第
1項記載の光学記録部材の評価装置。 5 加熱部を収納する容器と、その容器に設けら
れた気体導入部と気体放出部と、その気体放出部
とその加熱部の延長線上に設けた光源とを有する
特許請求の範囲第1項記載の光学記録部材の評価
装置。 6 加熱部と光検出器を収納する箱と、その箱に
設けられた扉と、その扉と連動する光の遮へい板
とを有する特許請求の範囲第1項記載の光学記録
部材の評価装置。[Scope of Claims] 1. A heating unit that heats up an optical recording member having a recording thin film on a transparent substrate at a constant heating rate, a light source that irradiates the optical recording member, and a light source that irradiates the optical recording member. An evaluation device for an optical recording member, which includes a photodetector for detecting at least one of reflected light and transmitted light. 2. The heating unit is composed of a heating substrate of an optical recording member, a heat source for heating the heating substrate, and a temperature detector, and the heating substrate has a small hole for passing light from a light source. An evaluation device for an optical recording member according to scope 1. 3. The optical recording member evaluation device according to claim 2, wherein the opening area of the small holes is 1/10 or less of the area of the recording member. 4. The optical recording member evaluation device according to claim 1, wherein the temperature increase rate of the heating section can be freely set by varying the input to the heat source. 5. Claim 1, which comprises a container for storing a heating part, a gas introduction part and a gas discharge part provided in the container, and a light source provided on an extension of the gas discharge part and the heating part. An evaluation device for optical recording members. 6. An evaluation device for an optical recording member according to claim 1, comprising a box for storing a heating section and a photodetector, a door provided on the box, and a light shielding plate interlocked with the door.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59070229A JPS60212842A (en) | 1984-04-09 | 1984-04-09 | Evaluating device of optical recording member |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59070229A JPS60212842A (en) | 1984-04-09 | 1984-04-09 | Evaluating device of optical recording member |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60212842A JPS60212842A (en) | 1985-10-25 |
| JPH0556569B2 true JPH0556569B2 (en) | 1993-08-19 |
Family
ID=13425519
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59070229A Granted JPS60212842A (en) | 1984-04-09 | 1984-04-09 | Evaluating device of optical recording member |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS60212842A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6126949A (en) * | 1984-07-18 | 1986-02-06 | Matsushita Electric Ind Co Ltd | Optical information recording member |
-
1984
- 1984-04-09 JP JP59070229A patent/JPS60212842A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60212842A (en) | 1985-10-25 |
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