JPH0556669B2 - - Google Patents
Info
- Publication number
- JPH0556669B2 JPH0556669B2 JP59164626A JP16462684A JPH0556669B2 JP H0556669 B2 JPH0556669 B2 JP H0556669B2 JP 59164626 A JP59164626 A JP 59164626A JP 16462684 A JP16462684 A JP 16462684A JP H0556669 B2 JPH0556669 B2 JP H0556669B2
- Authority
- JP
- Japan
- Prior art keywords
- light
- receiving surface
- electrode
- receiving
- infrared
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10F—INORGANIC SEMICONDUCTOR DEVICES SENSITIVE TO INFRARED RADIATION, LIGHT, ELECTROMAGNETIC RADIATION OF SHORTER WAVELENGTH OR CORPUSCULAR RADIATION
- H10F77/00—Constructional details of devices covered by this subclass
- H10F77/20—Electrodes
Landscapes
- Light Receiving Elements (AREA)
Description
【発明の詳細な説明】
(イ) 利用分野
この発明は、近赤外領域の光に対して高感度を
示す近赤外線受光素子に関する。DETAILED DESCRIPTION OF THE INVENTION (a) Field of Application This invention relates to a near-infrared light receiving element that exhibits high sensitivity to light in the near-infrared region.
(ロ) 従来技術およびこの発明が解決するための問
題点
光導伝効果を利用して光を検出する受光素子と
してPbS(硫化鉛)、CdS(硫化カドミウム)等の
薄膜半導体受光素子が市販されているほか、単結
晶を使用する受光素子も知られている。(b) Prior art and problems to be solved by this invention Thin-film semiconductor light-receiving elements such as PbS (lead sulfide) and CdS (cadmium sulfide) are commercially available as light-receiving elements that detect light using the photoconductive effect. In addition, light receiving elements using single crystals are also known.
しかしながら、前記受光素子は可視光域及び赤
外光域にわたつて光感度を有している。したがつ
て、これら受光素子を赤外線受光素子として自然
光又は室内光の環境下で使用する場合には外乱光
である可視光を雑音として受光する。このため、
市販されているGaAs(ガリウム砒素)赤外線発
光ダイオードから出光する赤外線を前記受光素子
によつて受光する場合には、室内光遮断用のフイ
ルタを必要としている。このフイルタを受光素子
に設ければ伝搬する媒質の誘電率が不連続になる
から赤外線の強度を弱める結果となり、受光回路
に増幅器を設けるなど信号処理を複雑、高価にす
る。 However, the light receiving element has photosensitivity over the visible light region and the infrared light region. Therefore, when these light-receiving elements are used as infrared light-receiving elements in an environment of natural light or indoor light, visible light, which is disturbance light, is received as noise. For this reason,
When the light receiving element receives infrared light emitted from a commercially available GaAs (gallium arsenide) infrared light emitting diode, a filter for blocking indoor light is required. If this filter is provided in the light-receiving element, the dielectric constant of the propagating medium becomes discontinuous, resulting in a weakening of the intensity of the infrared rays, making signal processing such as providing an amplifier in the light-receiving circuit complicated and expensive.
さらに、可視光を外乱光として受光する問題は
Pn接合又はpin接合構造のホトダイオードにも同
様に存在していた。 Furthermore, the problem of receiving visible light as disturbance light is
It also existed in photodiodes with Pn junction or pin junction structures.
この発明の目的は、近赤外線の特定の領域にだ
け高感度を示す安価な近赤外線受光素子を提供す
ることである。 An object of the present invention is to provide an inexpensive near-infrared receiving element that exhibits high sensitivity only in a specific region of near-infrared rays.
(ハ) 問題点を解決するための手段
前述の問題を解決するため、この発明は半絶縁
性のGaAs単結晶を使用し、その受光面に対して
直角又は鋭角をなしかつ受光面の面積よりも大き
く電極面を形成している。さらに受光面をラツプ
面にするか、または電極面のうち受光面に隣接す
る面に該受光面の稜線から少なくとも1マイクロ
メータ以上の幅の非電極面を形成している。(c) Means for solving the problem In order to solve the above-mentioned problem, the present invention uses a semi-insulating GaAs single crystal, and the angle is perpendicular or acute to the light-receiving surface, and the angle is smaller than the area of the light-receiving surface. It also forms a large electrode surface. Furthermore, the light-receiving surface is made into a lap surface, or a non-electrode surface having a width of at least 1 micrometer or more from the ridgeline of the light-receiving surface is formed on a surface of the electrode surface adjacent to the light-receiving surface.
(ニ) 作用
常温で半絶縁性を示す高純度のGaAs単結晶は
禁止帯中央部にエネルギー準位が存在し、その吸
収係数が一般に数センチメータ分の1であり、約
0.7eVから約1.4eVの近赤外線の光エネルギー域
に自由電子励起の外因性光吸収現象を有する。こ
のGaAs単結晶の性質を利用すると共に、受光面
積に比して電極面積を大きくして高い光電流が得
られるようにして近赤外線を高感度に受光でき
る。(d) Effect A high-purity GaAs single crystal that exhibits semi-insulating properties at room temperature has an energy level in the central part of the forbidden band, and its absorption coefficient is generally 1/several centimeters, approximately
It has an extrinsic light absorption phenomenon due to free electron excitation in the near-infrared light energy range from 0.7eV to approximately 1.4eV. By utilizing the properties of this GaAs single crystal and increasing the electrode area compared to the light receiving area to obtain a high photocurrent, near-infrared rays can be received with high sensitivity.
(ホ) 実施例
第1図はこの発明の第1実施例を示し、同図1
は半絶縁性のGaAs単結晶1を示している。この
GaAs単結晶1は直方体に成形され、その一面は
受光面1aとなつている。この受光面1aはミラ
ー面に研磨されている。受光面1aの長さ方向に
対して直角をなす2つの平行な面は電極面を形成
しており、この電極面に電極2がオーム接触によ
つて設けられている。この電極2の面積は受光面
1aの面積よりも大きく形成されている。(E) Embodiment FIG. 1 shows a first embodiment of this invention.
indicates a semi-insulating GaAs single crystal 1. this
GaAs single crystal 1 is formed into a rectangular parallelepiped, one surface of which serves as a light-receiving surface 1a. This light receiving surface 1a is polished to a mirror surface. Two parallel surfaces perpendicular to the length direction of the light-receiving surface 1a form electrode surfaces, and the electrodes 2 are provided on these electrode surfaces by ohmic contact. The area of this electrode 2 is larger than the area of the light receiving surface 1a.
第2図は第1図のように構成された近赤外線受
光素子の受光面1aに光を照射した場合の分光特
性図を示している。第2図は、低光エネルギー
(長波長)側から高光エネルギー(短波長)側へ
移行する場合、約0.7eVから約1.4eVまでは連続
して光電流が増加し、約1.4eVを経過すると急に
光電流が低下することを示している。したがつ
て、前記受光素子は可視光(1.6eV以上)に対し
て低感度を示し、近赤外線に対しては高感度を示
すことが分る。例えば、市販のGaAs赤外線発光
ダイオードでは約1.3eVに最大発光強度を有する
のでその光に対して高感度を示す。 FIG. 2 shows a spectral characteristic diagram when light is irradiated onto the light receiving surface 1a of the near-infrared light receiving element configured as shown in FIG. Figure 2 shows that when moving from low optical energy (long wavelength) to high optical energy (short wavelength), the photocurrent increases continuously from approximately 0.7 eV to approximately 1.4 eV, and after approximately 1.4 eV. This shows that the photocurrent suddenly decreases. Therefore, it can be seen that the light-receiving element exhibits low sensitivity to visible light (1.6 eV or more) and high sensitivity to near-infrared rays. For example, commercially available GaAs infrared light emitting diodes have a maximum emission intensity of about 1.3 eV, and therefore exhibit high sensitivity to that light.
また、前記受光素子の電極2の面積は受光面1
aの面積に比して大きいから、電極2に低電圧を
印加した場合でも大きい光電流を取り出すことが
できる。 Further, the area of the electrode 2 of the light receiving element is the light receiving surface 1
Since it is large compared to the area of a, a large photocurrent can be extracted even when a low voltage is applied to the electrode 2.
第3図は第1図のGaAs単結晶1の受光面1a
をミラー面とする替わりにラツプ面に研磨した場
合の分光特性の変化を示す図である。第3図に示
されるように、赤外線域ではラツプ面とミラー面
とでは入射光に対する光電流の感度差が現われな
いのに対し、可視光域ではラツプ面入射の方がミ
ラー面入射に比して光電流の感度が著るしく低下
する。従つて、GaAs単結晶1の受光面1aをラ
ツプ面に研磨することにより、可視光を遮蔽する
効果がより顕著になる。 Figure 3 shows the light-receiving surface 1a of the GaAs single crystal 1 in Figure 1.
FIG. 4 is a diagram showing changes in spectral characteristics when polished to a lap surface instead of a mirror surface. As shown in Figure 3, in the infrared region, there is no difference in photocurrent sensitivity to incident light between the lap surface and the mirror surface, whereas in the visible light region, the incidence on the lap surface is higher than that on the mirror surface. photocurrent sensitivity is significantly reduced. Therefore, by polishing the light-receiving surface 1a of the GaAs single crystal 1 into a lap surface, the effect of shielding visible light becomes more pronounced.
第4図はこの発明の第2実施例を示している。
この実施例の場合、第1図のGaAs単結晶1と同
大同形状のGaAs単結晶3の受光面3aの長さ方
向に対して直角をなす2つの平行な面には、受光
面3aの2つの長さ方向の稜線から少なくともほ
ぼ1マイクロメータ以上の幅だけ電極が設けられ
ない非電極面4が設けられ、その残りの面は電極
面となつて電極5がオーム接触によつて形成され
ている。この各電極5の面積は受光面3aの面積
よりも大きく、ミラー面に研磨されている。 FIG. 4 shows a second embodiment of the invention.
In this embodiment, two parallel planes perpendicular to the length direction of the light-receiving surface 3a of the GaAs single crystal 3 having the same shape as the GaAs single crystal 1 shown in FIG. A non-electrode surface 4 is provided on which no electrode is provided by a width of at least approximately 1 micrometer from one longitudinal ridgeline, and the remaining surface serves as an electrode surface on which an electrode 5 is formed by ohmic contact. There is. The area of each electrode 5 is larger than the area of the light receiving surface 3a, and is polished to a mirror surface.
常温で半絶縁性を示す高純度のGaAs単結晶
(市販されている)は直接遷移半導体に属し、禁
止帯幅以上の光エネルギーを有する入射光を受光
表面において反射するか、又は受光面から1マイ
クロメータ以内で吸収する性質を有する。また、
GaAs単結晶は常温において禁止帯幅が1.4eVで
あり、これは近赤外線光エネルギー域にある。し
たがつて、前記GaAs単結晶に約1.4eV以上の光
エネルギーを有する可視光を照射しても受光面か
ら1マイクロメータ以上の距離には光は到達しな
い。 High-purity GaAs single crystals (commercially available) that exhibit semi-insulating properties at room temperature belong to direct transition semiconductors, and reflect incident light with optical energy greater than the forbidden band width at the light-receiving surface, or It has the property of absorbing within a micrometer. Also,
GaAs single crystal has a forbidden band width of 1.4 eV at room temperature, which is in the near-infrared light energy range. Therefore, even if the GaAs single crystal is irradiated with visible light having a light energy of about 1.4 eV or more, the light will not reach a distance of 1 micrometer or more from the light receiving surface.
第5図は第4図のように構成された近赤外線受
光素子の受光面3aに光を照射した場合の分光特
性図を示している。第5図に示されているよう
に、第4図の受光素子は第1図の受光素子に比べ
て可視光域の光エネルギーに対して著るしく低い
感度を示す。このため、GaAs単結晶3に非電極
面4を設ける簡単な構造により、1.4eV以上の高
エネルギー域の光を確実に遮蔽することができ
る。 FIG. 5 shows a spectral characteristic diagram when light is irradiated onto the light receiving surface 3a of the near-infrared light receiving element configured as shown in FIG. As shown in FIG. 5, the light-receiving element of FIG. 4 exhibits significantly lower sensitivity to light energy in the visible light range than the light-receiving element of FIG. 1. Therefore, a simple structure in which the non-electrode surface 4 is provided on the GaAs single crystal 3 can reliably block light in a high energy range of 1.4 eV or more.
第6図はこの発明の第3実施例を示している。
この実施例の場合、半絶縁性のGaAs単結晶6の
受光面6aに対して数度傾けた鋭角をなして一方
の電極面が形成され、この電極面に電極7がオー
ム接触により設けられている。また、電極7と対
向する受光面6aと直角の電極面にも電極8が設
けられている。この電極7,8の各面積は受光面
6aの面積よりも大きく、かつ光の進行方向に大
きく設けられている。 FIG. 6 shows a third embodiment of the invention.
In the case of this embodiment, one electrode surface is formed at an acute angle inclined by several degrees with respect to the light-receiving surface 6a of the semi-insulating GaAs single crystal 6, and the electrode 7 is provided on this electrode surface by ohmic contact. There is. Furthermore, an electrode 8 is also provided on an electrode surface that is perpendicular to the light-receiving surface 6a that faces the electrode 7. The area of each of the electrodes 7 and 8 is larger than the area of the light-receiving surface 6a, and is provided larger in the direction in which light travels.
受光面6aに対して電極面7を傾けることによ
り、入射光に伴う光電流が電極面全体にわたつて
生じることになり、受光面6aから電極面に離れ
ることに伴い光の照射効果が減少する現象を除去
し得て、より良好な光電流の検出を行うことが可
能となる。 By tilting the electrode surface 7 with respect to the light-receiving surface 6a, a photocurrent accompanying incident light is generated across the entire electrode surface, and the light irradiation effect decreases as the electrode surface moves away from the light-receiving surface 6a. This phenomenon can be removed and it becomes possible to perform better photocurrent detection.
第7図は前述した近赤外線受光素子を使用した
具体的な回路構成図の一例を示している。例えば
第4図のように構成されたGaAs単結晶3の受光
面3aを赤外線発光ダイオード9からの赤外線が
垂直に入射されるように配置する。このGaAs単
結晶3の一方の電極4に電源10の正端子を接続
し、他方の電極には抵抗を介して接地されてい
る。さらにGaAs単結晶3の二つの側面には遮光
膜11によつて被膜され、入射光は受光面3aに
のみ制限される。このように構成することによ
り、特に近赤外線にGaAs単結晶自体が感知して
光電流の出力を得ることができる。 FIG. 7 shows an example of a specific circuit configuration diagram using the above-mentioned near-infrared light receiving element. For example, the light-receiving surface 3a of the GaAs single crystal 3 constructed as shown in FIG. 4 is arranged so that the infrared rays from the infrared light emitting diode 9 are perpendicularly incident thereon. A positive terminal of a power source 10 is connected to one electrode 4 of this GaAs single crystal 3, and the other electrode is grounded via a resistor. Further, two side surfaces of the GaAs single crystal 3 are coated with a light shielding film 11, so that incident light is restricted only to the light receiving surface 3a. With this configuration, the GaAs single crystal itself can sense near-infrared light to obtain a photocurrent output.
(ホ) 効果
この発明は、近赤外線域に高感度を有し、可視
光に対して低感度を示すよう素子自体の特性と形
状の組合せによつて得られた近赤外線受光素子を
提供したから、従来必要とされた可視光を遮断す
るためのフイルタが不要となる。しかも、フイル
タを使用しないから光検出信号の微弱化を防ぐこ
とができ、光検出信号の処理にノイズフイルタ等
の付属回路を備えなくてもよく、安価であると共
に信号処理が容易になる。(E) Effect This invention provides a near-infrared light receiving element that is obtained by combining the characteristics and shape of the element itself so as to have high sensitivity in the near-infrared region and low sensitivity to visible light. , there is no need for a filter to block visible light, which was required in the past. Furthermore, since no filter is used, it is possible to prevent the photodetection signal from weakening, and there is no need to provide an auxiliary circuit such as a noise filter for processing the photodetection signal, making it inexpensive and easy to process the signal.
さらに、本発明は受光面をラツプ面に形成して
いるから、可視光に対しての感度が著しく低下
し、可視光を確実に遮断することができる。ま
た、他の本発明によれば、受光面の稜線から少な
くとも1マイクロメータ以上の幅の非電極面を形
成したから可視光は電極面には到達できず可視光
に対する感度を著しく低下することができ近赤外
線を感度良く検出することができる。 Furthermore, since the light-receiving surface of the present invention is formed as a lap surface, the sensitivity to visible light is significantly reduced, and visible light can be reliably blocked. Further, according to another aspect of the present invention, since the non-electrode surface is formed with a width of at least 1 micrometer from the ridgeline of the light receiving surface, visible light cannot reach the electrode surface and the sensitivity to visible light is significantly reduced. It can detect near-infrared rays with high sensitivity.
第1図はこの発明の実施例を示す斜視図、第2
図は第1図の素子の分光特性図、第3図は第1図
の素子の受光面をミラー面、ラツプ面とした場合
の比較を示す分光特性図、第4図はこの発明の第
2実施例を示す斜視図、第5図は第4図の素子の
分光特性図、第6図はこの発明の第3実施例を示
す斜視図、第7図はこの発明の近赤外受光素子を
使用した具体的回路構成の一例を示す図である。
1,3,6……GaAs単結晶、1a,3a,6
a……受光面、2,5,7,8……電極、4……
非電極面、9……赤外線発光ダイオード、10…
…電源、11……遮光膜。
Fig. 1 is a perspective view showing an embodiment of the present invention;
The figure is a spectral characteristic diagram of the device shown in FIG. 1, FIG. 3 is a spectral characteristic diagram showing a comparison when the light-receiving surface of the device shown in FIG. FIG. 5 is a spectral characteristic diagram of the device shown in FIG. 4, FIG. 6 is a perspective view showing a third embodiment of the present invention, and FIG. 7 is a near-infrared light-receiving device of the present invention. FIG. 3 is a diagram showing an example of a specific circuit configuration used. 1, 3, 6...GaAs single crystal, 1a, 3a, 6
a... Light receiving surface, 2, 5, 7, 8... Electrode, 4...
Non-electrode surface, 9... Infrared light emitting diode, 10...
...power supply, 11...light-shielding film.
Claims (1)
のGaAs単結晶の受光面に対して直角たは鋭角を
なして前記受光面の面積よりも大きい電極面を形
成し、前記受光面をラツプ面としたことを特徴と
する近赤外線受光素子。 2 近赤外線を高感度で検出するため、半絶縁性
のGaAs単結晶の受光面に対して直角たは鋭角を
なして前記受光面の面積より大きい電極面を形成
し、前記電極面のうち前記受光面に隣接する面に
該受光面の稜線から少なくとも1マイクロメータ
以上の幅の非電極面を形成したことを特徴とする
近赤外線受光素子。[Claims] 1. In order to detect near-infrared rays with high sensitivity, an electrode surface is formed at a right angle or an acute angle to the light-receiving surface of a semi-insulating GaAs single crystal and has a larger area than the light-receiving surface. . A near-infrared light-receiving element, characterized in that the light-receiving surface is a wrap surface. 2. In order to detect near-infrared rays with high sensitivity, an electrode surface is formed at a right angle or an acute angle to the light-receiving surface of the semi-insulating GaAs single crystal and has a larger area than the light-receiving surface. A near-infrared light-receiving element, characterized in that a non-electrode surface having a width of at least 1 micrometer or more from the ridgeline of the light-receiving surface is formed on a surface adjacent to the light-receiving surface.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59164626A JPS6142973A (en) | 1984-08-06 | 1984-08-06 | Near-infrared receiving element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59164626A JPS6142973A (en) | 1984-08-06 | 1984-08-06 | Near-infrared receiving element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6142973A JPS6142973A (en) | 1986-03-01 |
| JPH0556669B2 true JPH0556669B2 (en) | 1993-08-20 |
Family
ID=15796771
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59164626A Granted JPS6142973A (en) | 1984-08-06 | 1984-08-06 | Near-infrared receiving element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6142973A (en) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8258632B1 (en) | 2005-10-24 | 2012-09-04 | Lawrence Livermore National Security, Llc | Optically-initiated silicon carbide high voltage switch with contoured-profile electrode interfaces |
| JP5376951B2 (en) * | 2005-10-24 | 2013-12-25 | ローレンス リヴァーモア ナショナル セキュリティ,エルエルシー | Optically initiated silicon carbide high voltage switch |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5833717A (en) * | 1981-08-25 | 1983-02-28 | Toshiba Corp | Operating signal converter for process |
-
1984
- 1984-08-06 JP JP59164626A patent/JPS6142973A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6142973A (en) | 1986-03-01 |
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