JPH0565969B2 - - Google Patents
Info
- Publication number
- JPH0565969B2 JPH0565969B2 JP61039846A JP3984686A JPH0565969B2 JP H0565969 B2 JPH0565969 B2 JP H0565969B2 JP 61039846 A JP61039846 A JP 61039846A JP 3984686 A JP3984686 A JP 3984686A JP H0565969 B2 JPH0565969 B2 JP H0565969B2
- Authority
- JP
- Japan
- Prior art keywords
- electron beam
- yoke
- magnetic
- magnetic flux
- irradiated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000010894 electron beam technology Methods 0.000 claims description 31
- 230000004907 flux Effects 0.000 claims description 21
- 230000035699 permeability Effects 0.000 claims description 10
- 230000000694 effects Effects 0.000 description 2
- 230000005684 electric field Effects 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 239000006249 magnetic particle Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
Description
【発明の詳細な説明】 (産業上の利用分野) この発明は電子線照射装置に関する。[Detailed description of the invention] (Industrial application field) The present invention relates to an electron beam irradiation device.
(従来の技術)
電子線照射装置において、これから放射される
電子線を被照射物に照射するとき、その電子線ビ
ームの幅を任意に変更したい場合がある。従来で
はそのために電子銃内の電界を調整することによ
つて変更するようにしているが、電子線ビームが
帯状であるような場合は、電界による調整は極め
て困難である。(Prior Art) In an electron beam irradiation device, when an object to be irradiated is irradiated with an electron beam to be emitted, there are cases where it is desired to arbitrarily change the width of the electron beam. Conventionally, this has been done by adjusting the electric field within the electron gun, but if the electron beam is band-shaped, adjustment using the electric field is extremely difficult.
(発明が解決しようとする問題点)
この発明は、電子線ビームが帯状である場合で
も簡単にその幅を自在に制御できるようにするこ
とを目的とする。(Problems to be Solved by the Invention) An object of the present invention is to easily control the width of the electron beam even when the electron beam is band-shaped.
(問題点を解決するための手段)
この発明は被照射物に垂直磁場配向処理を施す
とき、これに使用する磁界を利用するようにした
もので、被照射物の表面に先端が対向する垂直磁
場配向用の磁極の側面を、被照射物に向かう電子
線ビームの通過路と向い合うように配置するとと
もに、前記磁極の側面に、任意の比透磁率のヨー
クを設置したことを特徴とする。(Means for Solving the Problems) This invention utilizes the magnetic field used when performing vertical magnetic field alignment treatment on an object to be irradiated. The side surface of the magnetic pole for magnetic field orientation is arranged so as to face the passage of the electron beam toward the irradiated object, and a yoke of arbitrary relative magnetic permeability is installed on the side surface of the magnetic pole. .
(作用)
磁極およびヨークの先端が被照射物の表面に対
向しているので、磁極およびヨークからの磁束は
被照射物に垂直に通過し、これによつて被照射物
は垂直に磁場配向処理される。このとき磁極の側
面に設置されてあるヨークの側面から磁束の一部
が漏洩磁束となつて、電子線ビームの通過路内に
入る。(Function) Since the tips of the magnetic pole and yoke face the surface of the object to be irradiated, the magnetic flux from the magnetic pole and yoke passes perpendicularly to the object to be irradiated, so that the object to be irradiated is vertically aligned by the magnetic field. be done. At this time, part of the magnetic flux leaks from the side surface of the yoke installed on the side surface of the magnetic pole and enters the path of the electron beam.
このためこの漏洩磁束は電子線ビームの幅方向
に沿つて前記した漏洩磁束が交差するようにな
る。この交差によつて電子線ビームは集束あるい
は発散される。このときの集束あるいは発散の程
度は前記漏洩磁束の量に応じて変更される。 Therefore, this leakage magnetic flux crosses the above-mentioned leakage magnetic flux along the width direction of the electron beam. The electron beam is focused or diverged by this intersection. The degree of convergence or divergence at this time is changed depending on the amount of the leakage magnetic flux.
一方この漏洩磁束はヨークの比透磁率によつて
変化する。したがつて調整したい電子線ビームの
幅に応じて選択された比透磁率のヨークを利用す
るようにすれば、所望の幅をもつ電子線ビームを
被照射物に照射することができるようになる。 On the other hand, this leakage magnetic flux changes depending on the relative magnetic permeability of the yoke. Therefore, by using a yoke with a relative magnetic permeability selected according to the width of the electron beam to be adjusted, it becomes possible to irradiate the object with an electron beam having the desired width. .
なお比透磁率の異なるヨークを使用するのに代
えて、コイルに流す電流を変更して磁極からの磁
束を調整することも考えられる。しかし被照射物
の垂直磁場配向処理のためには、その被照射物に
よつて磁束量が定まつているので、電子線ビーム
に作用する集束あるいは発散用の磁束を調整する
ために、コイルに流す電流を調整することは実際
には不可能である。 Note that instead of using yokes with different relative magnetic permeabilities, it is also possible to adjust the magnetic flux from the magnetic poles by changing the current flowing through the coil. However, in order to orient the irradiated object with a vertical magnetic field, the amount of magnetic flux is determined depending on the irradiated object. It is practically impossible to adjust the current flowing.
(実施例)
この発明を図によつて説明する。1は電子線発
生源で、これは真空容器2を主体とし、その周壁
の一部に照射窓2Aが設けてあり、ここから外部
に向かつて電子線が放出される。内部には電子銃
3が設置されている。これは例えばパイプからな
る電極4と、その内部に電子線を発生するフイラ
メント5と、グリツド6とによつて主として構成
されている。(Example) This invention will be explained with reference to the drawings. Reference numeral 1 denotes an electron beam generation source, which is mainly composed of a vacuum container 2, and has an irradiation window 2A provided in a part of its peripheral wall, from which an electron beam is emitted toward the outside. An electron gun 3 is installed inside. This is mainly composed of an electrode 4 made of, for example, a pipe, a filament 5 inside which generates an electron beam, and a grid 6.
7は磁石装置で、磁性媒体たとえば磁気テープ
類のような被照射物Aの通路Pをはさんで配置さ
れた一対の電磁石8,9によつて構成されてい
る。各電磁石は磁極10をもつコア11と、これ
に巻回されてあるコイル12とにより構成されて
ある。このコア11の中央には窓13が形成され
てある。そして上段の電磁石8の窓13には照射
窓2Aが挿入されるように設置されてある。 A magnet device 7 is composed of a pair of electromagnets 8 and 9 placed across a path P of an irradiated object A such as a magnetic medium such as a magnetic tape. Each electromagnet is composed of a core 11 having a magnetic pole 10 and a coil 12 wound around the core 11. A window 13 is formed in the center of this core 11. The irradiation window 2A is inserted into the window 13 of the upper electromagnet 8.
また上段の電磁石8の窓13に向い合うよう
に、磁極10の側面にヨーク14が設置されてあ
る。このヨーク14は電子線ビームを所望の幅と
するのに必要な比透磁率のものが、選択的に設置
されている。このようにして磁極10、ヨーク1
4の先端は通路Pを通過する被照射物Aの表面に
向い合うとともに、ヨーク14の側面は被照射物
Aに向かつて進む電子線ビームの側面に向い合う
ようになる。なお図中実線で示す矢印は、被照射
物Aの移送方向を示す。 Further, a yoke 14 is installed on the side surface of the magnetic pole 10 so as to face the window 13 of the upper electromagnet 8. This yoke 14 is selectively provided with a relative magnetic permeability necessary to make the electron beam a desired width. In this way, the magnetic pole 10, the yoke 1
The tip of the yoke 14 faces the surface of the object A passing through the passage P, and the side surface of the yoke 14 faces the side surface of the electron beam traveling toward the object A. Note that the arrow shown by a solid line in the figure indicates the direction in which the object A to be irradiated is transported.
以上の構成において、電子線発生源1からの電
子線は照射窓2Aより被照射物Aに照射されると
ともに、この被照射物Aに磁石装置7の磁極1
0、ヨーク14からの磁束が垂直に通過する。こ
れによつて被照射物Aは磁性粒子が垂直磁場配向
された状態で電子線照射により、表面に塗布され
ている磁性塗料が硬化処理される。このような作
用は通常の磁気テープ類の製造工程と特に相違す
るところはない。 In the above configuration, the electron beam from the electron beam source 1 is irradiated onto the irradiated object A through the irradiation window 2A, and the magnetic pole 1 of the magnet device 7 is applied to the irradiated object A.
0, the magnetic flux from the yoke 14 passes vertically. As a result, the magnetic paint applied to the surface of the irradiated object A is cured by electron beam irradiation with the magnetic particles oriented in a vertical magnetic field. Such an operation is not particularly different from the manufacturing process of ordinary magnetic tapes.
このときヨーク14に向かう磁束の一部は、窓
13の中を通る漏洩磁束Lとなる。そしてこの漏
洩磁束Lの量はヨーク14の比透磁率によつて変
化する。すなわち比透磁率が小さければ小さい程
漏洩磁束Lの量は多くなる。 At this time, a part of the magnetic flux directed toward the yoke 14 becomes leakage magnetic flux L passing through the window 13. The amount of this leakage magnetic flux L changes depending on the relative magnetic permeability of the yoke 14. That is, the smaller the relative magnetic permeability, the greater the amount of leakage magnetic flux L.
一方この窓13には被照射物Aに向かう電子線
ビーム(これを第3図中Bで示す。)は存在して
いる。したがつて漏洩磁束Lは電子線ビームと交
差し、この交差によつて電子線ビームの幅が集束
あるいは発散される。このためヨーク14として
任意の比透磁率の材質のものを選択して漏洩磁束
Lを変更すれば、電子線ビームの幅は任意に調整
されるようになる。 On the other hand, an electron beam (indicated by B in FIG. 3) directed toward the irradiated object A exists in this window 13. Therefore, the leakage magnetic flux L intersects with the electron beam, and the width of the electron beam is focused or diverged by this intersection. Therefore, by selecting a material with an arbitrary relative magnetic permeability as the yoke 14 and changing the leakage magnetic flux L, the width of the electron beam can be adjusted arbitrarily.
なお以上の説明ではヨーク14を磁極10の側
面に設置したものとしているが、このヨーク14
を照射窓2Aの側面に位置するように真空容器2
に取り付けるようにしてもよい。またこのヨーク
14を取外し自在としておくと、調整幅に応じて
取替えが可能となり都合がよい。 In the above explanation, it is assumed that the yoke 14 is installed on the side surface of the magnetic pole 10, but this yoke 14
Place the vacuum container 2 so that it is located on the side of the irradiation window 2A.
It may also be attached to. Furthermore, it is convenient if the yoke 14 is made removable, since it can be replaced depending on the adjustment width.
(発明の効果)
以上詳述したようにこの発明によれば、垂直磁
場配向処理のための磁束の一部を、被照射物に向
かう電子線ビームと交差する漏洩磁束とし、しか
もこの漏洩磁束は磁極の側面に位置するヨークの
比透磁率によつて変更されるところから、このヨ
ークの材質を適宜設定して漏洩磁束を任意に調整
すれば、簡単にかつ自在に電子線ビームの幅が調
整可能となるといつた効果を奏する。(Effects of the Invention) As described in detail above, according to the present invention, a part of the magnetic flux for vertical magnetic field alignment processing is made into a leakage magnetic flux that intersects with the electron beam directed toward the irradiated object, and furthermore, this leakage magnetic flux is Since it is changed by the relative magnetic permeability of the yoke located on the side of the magnetic pole, the width of the electron beam can be easily and freely adjusted by appropriately setting the material of this yoke and adjusting the leakage magnetic flux as desired. When it becomes possible, it produces great effects.
第1図はこの発明の一実施例を示すもので、正
面を断面とした斜視図、第2図は一部の拡大断面
図、第3図は同じく一部の平面図である。
1……電子線発生源、2A……照射窓、7……
磁石装置、8,9……電磁石、10……磁極、1
4……ヨーク、P……通路、A……被照射物。
FIG. 1 shows an embodiment of the present invention, in which the front is a perspective view in section, FIG. 2 is a partially enlarged sectional view, and FIG. 3 is a partially plan view. 1... Electron beam source, 2A... Irradiation window, 7...
Magnet device, 8, 9... Electromagnet, 10... Magnetic pole, 1
4... Yoke, P... Passage, A... Irradiated object.
Claims (1)
束を発生する磁石装置の磁極の先端を、通路に沿
つて移送される被照射物の表面に対向せしめると
ともに、前記の磁極の側面を前記被照射物に向か
う電子線ビームの通過路と向い合せ、かつ前記磁
極の側面に、任意の比透磁率のヨークを、これか
らの漏洩磁束が前記電子線ビームと交差するよう
に設置した電子線照射装置。1. The tip of the magnetic pole of a magnet device that generates magnetic flux for subjecting the irradiated object to vertical magnetic field alignment processing is made to face the surface of the irradiated object that is transported along the path, and the side surface of the magnetic pole is placed so as to face the surface of the irradiated object that is transported along the path. An electron beam irradiation device in which a yoke with a desired relative magnetic permeability is installed facing the passage of the electron beam toward the irradiation object and on the side surface of the magnetic pole so that leakage magnetic flux from the yoke intersects with the electron beam. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61039846A JPS62198044A (en) | 1986-02-24 | 1986-02-24 | Electron beam radiating device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61039846A JPS62198044A (en) | 1986-02-24 | 1986-02-24 | Electron beam radiating device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62198044A JPS62198044A (en) | 1987-09-01 |
| JPH0565969B2 true JPH0565969B2 (en) | 1993-09-20 |
Family
ID=12564326
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61039846A Granted JPS62198044A (en) | 1986-02-24 | 1986-02-24 | Electron beam radiating device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62198044A (en) |
-
1986
- 1986-02-24 JP JP61039846A patent/JPS62198044A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62198044A (en) | 1987-09-01 |
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