JPH0566322B2 - - Google Patents
Info
- Publication number
- JPH0566322B2 JPH0566322B2 JP60206571A JP20657185A JPH0566322B2 JP H0566322 B2 JPH0566322 B2 JP H0566322B2 JP 60206571 A JP60206571 A JP 60206571A JP 20657185 A JP20657185 A JP 20657185A JP H0566322 B2 JPH0566322 B2 JP H0566322B2
- Authority
- JP
- Japan
- Prior art keywords
- hydrogen
- gas
- cathode
- anode
- thin film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B21/00—Nitrogen; Compounds thereof
- C01B21/04—Purification or separation of nitrogen
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02E—REDUCTION OF GREENHOUSE GAS [GHG] EMISSIONS, RELATED TO ENERGY GENERATION, TRANSMISSION OR DISTRIBUTION
- Y02E60/00—Enabling technologies; Technologies with a potential or indirect contribution to GHG emissions mitigation
- Y02E60/30—Hydrogen technology
- Y02E60/36—Hydrogen production from non-carbon containing sources, e.g. by water electrolysis
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Analytical Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Hydrogen, Water And Hydrids (AREA)
- Electrolytic Production Of Non-Metals, Compounds, Apparatuses Therefor (AREA)
Description
【発明の詳細な説明】
〔産業上の利用分野〕
本発明は水素ガスの除去方法に関し、さらに詳
細には水素含有ガスから水素ガスを電気化学的手
段を用いて選択的に除去する方法に関する。水素
含有ガスから水素ガスを選択的に除去すること
は、ガスの精製分離、反応条件の制御、雰囲気ガ
スの制御のほか、分析感度の向上など広い技術、
産業分野で利用しうるものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a method for removing hydrogen gas, and more particularly to a method for selectively removing hydrogen gas from a hydrogen-containing gas using electrochemical means. Selective removal of hydrogen gas from hydrogen-containing gas requires a wide range of techniques, including gas purification and separation, control of reaction conditions, atmospheric gas control, and improvement of analytical sensitivity.
It can be used in the industrial field.
〔従来の技術および発明が解決しようとする問題
点〕
従来、混合ガス中の水素ガスを分離、除去する
代表的な方法としては水素を吸収する金属に水素
ガスを吸着または吸収させて分離する方法、高分
子膜または微細な孔を有するセラミツクス膜など
を用いる方法、およびパラジウムまたはパラジウ
ム合金の膜を用いる方法などが知られている。[Prior art and problems to be solved by the invention] Conventionally, a typical method for separating and removing hydrogen gas from a mixed gas is to adsorb or absorb hydrogen gas on a metal that absorbs hydrogen. , a method using a polymer membrane or a ceramic membrane having fine pores, and a method using a palladium or palladium alloy membrane are known.
水素ガスを水素吸蔵金属で分離する方法として
はチタン、ジルコニウム、ニオブなどの金属単体
のほか、チタン鉄、ランタンニツケル、チタンマ
ンガン、マグネシウムニツケル、ランタンコバル
ト、ジルコニウムマンガンチタンモリブデンなど
の合金に水素ガスを含む混合気体を接触させ水素
ガスのみを吸収分離する方法である。しかしなが
らこの方法は水素吸蔵金属中に吸収された水素濃
度とガス中の水素ガス分圧との間に定まつた平衡
濃度以上に水素を吸蔵することができないため、
水素吸蔵金属中の水素濃度が平衡濃度に近い値に
達した時点で加熱または減圧などにより一旦吸蔵
された水素を吐き出させ、再生する必要がある。
また水素ガスを含むガス中に酸素、炭酸ガス、一
酸化炭素、水などが含有される場合には、これら
の成分が水素吸蔵金属と反応し、吸蔵金属を劣化
させるなどの問題点を有している。さらにこの方
法では、定期的に水素吸蔵金属の交換または再生
が必要なため連続的な水素ガスの分離は行なえな
いという問題点もあつた。 Methods of separating hydrogen gas using hydrogen storage metals include not only single metals such as titanium, zirconium, and niobium, but also alloys such as titanium iron, lanthanum nickel, titanium manganese, magnesium nickel, lanthanum cobalt, and zirconium manganese titanium molybdenum. In this method, a mixed gas containing hydrogen gas is brought into contact with the hydrogen gas, and only hydrogen gas is absorbed and separated. However, this method cannot store hydrogen above the equilibrium concentration determined between the hydrogen concentration absorbed in the hydrogen storage metal and the hydrogen gas partial pressure in the gas.
When the hydrogen concentration in the hydrogen storage metal reaches a value close to the equilibrium concentration, it is necessary to discharge the previously stored hydrogen by heating or reducing pressure, and regenerate it.
Additionally, if oxygen, carbon dioxide, carbon monoxide, water, etc. are contained in a gas containing hydrogen gas, these components may react with the hydrogen storage metal, causing problems such as deterioration of the storage metal. ing. Furthermore, this method has the problem that it is not possible to continuously separate hydrogen gas because it requires periodic replacement or regeneration of the hydrogen storage metal.
一方、高分子膜を用いて水素ガスを分離する方
法としてはポリスルホン、ポリフツ化ビニル、ポ
リイミドなどの高分子膜の各種ガスに対する透過
速度の差を利用して水素含有ガスから水素ガスを
分離する方法が知られている。しかしながら高分
子膜を用いた場合には膜透過の選択性は低く、水
素ガスのみを選択的に分離、除去することが出来
ないという問題点がある。 On the other hand, as a method for separating hydrogen gas using a polymer membrane, hydrogen gas is separated from a hydrogen-containing gas by utilizing the difference in permeation rate for various gases of polymer membranes such as polysulfone, polyvinyl fluoride, and polyimide. It has been known. However, when a polymer membrane is used, the selectivity of membrane permeation is low, and there is a problem that only hydrogen gas cannot be selectively separated and removed.
このほか微細孔を有するセラミツクス製のフイ
ルター状物なども高分子膜と同様に検討されてい
るが、これらも水素ガスのみを選択的に分離除去
しうるものではなく、使用温度、ガス濃度につい
ても制約があつた。 In addition, filter-like materials made of ceramics with micropores are being investigated in the same way as polymer membranes, but these are not capable of selectively separating and removing only hydrogen gas, and there are also differences in operating temperature and gas concentration. There were restrictions.
一方、パラジウムまたはパラジウム合金は水素
のみを選択的に透過する性質を有することから、
これらの金属の薄膜を用いることにより、水素含
有ガスから水素ガスのみを分離、または除去する
ことができる。この特性を利用し、水素ガスを超
高純度にする方法が工業的に行なわれている。 On the other hand, since palladium or palladium alloy has the property of selectively permeating only hydrogen,
By using a thin film of these metals, only hydrogen gas can be separated or removed from hydrogen-containing gas. Industrial methods are being used to utilize this property to make hydrogen gas ultra-high purity.
しかしながらパラジウムまたはパラジウム合金
の膜は低い温度では水素透過能力が小さいことか
ら通常は300〜500℃で用いられる。またこれらの
温度範囲であつても水素の透過量は膜の両面間の
水素分圧の差によつて異なることから、水素分圧
の低い系、または低い温度条件下では水素ガスを
除去することは出来なかつた。 However, membranes made of palladium or palladium alloys have low hydrogen permeability at low temperatures, so they are usually used at temperatures of 300 to 500°C. Furthermore, even in these temperature ranges, the amount of hydrogen permeation varies depending on the difference in hydrogen partial pressure between both sides of the membrane, so hydrogen gas must be removed in systems with low hydrogen partial pressure or under low temperature conditions. I couldn't do it.
本発明者らはこれら従来技術の問題点を解消
し、比較的低温で、また低い水素分圧においても
水素含有ガスから水素ガスのみを実用的な速度で
選択的に、しかも連続して除去する方法を得るべ
く鋭意研究を続けた結果、パラジウムまたはパラ
ジウム合金を薄膜を水電解槽の陽極に用いること
によつてこれらの目的が達成しうることを見出し
本発明を完成した。
The present inventors solved the problems of these conventional techniques and selectively and continuously removed only hydrogen gas from a hydrogen-containing gas at a practical speed even at a relatively low temperature and low hydrogen partial pressure. As a result of intensive research in order to find a method, it was discovered that these objects could be achieved by using a thin film of palladium or palladium alloy as an anode of a water electrolyzer, and the present invention was completed.
すなわち本発明は、パラジウムまたはパラジウ
ム合金の薄膜を陽極とし、水電解液としてアルカ
リ金属水酸化物の0.1〜20%水溶液が満たされた
水電解装置を使用し、該水電解液を40〜100℃の
範囲で所定の温度に保ちながら、該パラジウムま
たはパラジウム合金の薄膜の電解面の裏面に接し
て水素含有ガスを流すとともに、電流密度が0.01
〜2A/cm2になるように0.2〜10voltの範囲から選
択された設定電圧をかけることにより、該水素含
有ガスから水素ガスを選択的に除去することを特
徴とする水素ガスの除去方法である。機械的強度
などから実用上、通常は0.001〜5mm、好ましく
は0.01〜1mmとされる。また薄膜の材質としては
パラジウム単独でもよくパラジウム合金でもよい
が、薄膜の塑性変形を生じ難いパラジウム合金が
好ましい。これらの合金としてはパラジウムと
銀、金、ロジウム、ルテニウムおよびイツトリウ
ムなどとの合金が好ましく、たとえばパラジウム
と銀5〜50%からなる合金、パラジウムと銀5〜
40%および金1〜20%からなる合金、ならびにパ
ラジウムと銀5〜40%、ロジウムまたはイツトリ
ウム2〜10%からなる合金などが好適に用いられ
る。またこれらの薄膜はそのまゝ用いられてもよ
いが少くとも水素含有ガスが流れる側の面にパラ
ジウム黒、白金黒を付着させたもの、あるいは苛
性ソーダ、苛性カリなどの溶融アルカリで活性化
処理されたものが好ましい。 That is, the present invention uses a water electrolysis device that uses a thin film of palladium or palladium alloy as an anode and is filled with a 0.1 to 20% aqueous solution of an alkali metal hydroxide as a water electrolyte, and heats the water electrolyte at 40 to 100°C. While maintaining a predetermined temperature in the range of
A hydrogen gas removal method characterized in that hydrogen gas is selectively removed from the hydrogen-containing gas by applying a set voltage selected from a range of 0.2 to 10 volts so as to achieve ~2A/ cm2 . . In practical terms, the thickness is usually 0.001 to 5 mm, preferably 0.01 to 1 mm, from the viewpoint of mechanical strength. Further, the material for the thin film may be palladium alone or a palladium alloy, but a palladium alloy that does not easily cause plastic deformation of the thin film is preferable. As these alloys, alloys of palladium and silver, gold, rhodium, ruthenium, yttrium, etc. are preferable, such as alloys of palladium and 5 to 50% silver, palladium and 5 to 50% silver, etc.
An alloy consisting of 40% gold and 1 to 20% gold, and an alloy consisting of palladium and 5 to 40% silver, and 2 to 10% rhodium or yttrium are preferably used. These thin films may be used as they are, but they may be coated with palladium black or platinum black on the side where hydrogen-containing gas flows, or activated with molten alkali such as caustic soda or caustic potash. Preferably.
本発明において水電解槽自体が陰極とされても
よく、これに加えて槽内にも金属棒または板など
を設け両者併せて陰極とされてもよく、また水電
解槽自体は陰極とせず槽内に設けられた金属棒ま
たは板のみが陰極とされてもよい。また陽極の水
電解面と相対する陰極の面までの間隔がなるべく
等距離になるよう陽極および陰極が配置されるこ
とが好ましい。 In the present invention, the water electrolytic cell itself may be used as a cathode, and in addition, a metal rod or plate may be provided inside the tank and both may be used as a cathode, or the water electrolytic cell itself may not be used as a cathode. Only the metal rod or plate provided therein may serve as the cathode. Further, it is preferable that the anode and the cathode be arranged so that the distance between the water electrolytic surface of the anode and the opposing surface of the cathode is as equal as possible.
陰極の材質には特に制限はないが、電気化学的
に耐蝕性があり、かつ水素発生の際、過電圧の低
い金属が好ましく、たとえばニツケル、ニツケル
合金およびニツケルクロム鋼などがあげられる。 The material of the cathode is not particularly limited, but metals that are electrochemically resistant to corrosion and have low overvoltage during hydrogen generation are preferred, such as nickel, nickel alloys, and nickel chrome steel.
電解質の水溶液としては導電率が高く水電解が
選択的に起う組成であること、かつ電極材質、電
解装置の構成材質に対し電気化学的に腐蝕作用の
低い溶液である水酸化ナトリウム、水酸化カリウ
ムなどのアルカリ金属の水酸化物の0.1〜20%水
溶液が用いられる。本発明において水電解槽の水
溶液は40〜100℃の範囲で所定の温度に保たれ、
また水電解槽内の圧は通常は常圧乃至5Kg/cm2G
とされる。 The aqueous electrolyte solution must have a high conductivity and a composition that allows water electrolysis to occur selectively, and sodium hydroxide and hydroxide are solutions that have low electrochemical corrosive effects on the electrode materials and the constituent materials of the electrolytic device. A 0.1-20% aqueous solution of an alkali metal hydroxide such as potassium is used. In the present invention, the aqueous solution in the water electrolyzer is maintained at a predetermined temperature in the range of 40 to 100°C,
Also, the pressure inside the water electrolyzer is usually normal pressure to 5 kg/cm 2 G.
It is said that
本発明においては水素含有ガスを流すとともに
電圧をかける。ここでかける電圧は水素含有ガス
を流した状態で電流が流れるに必要な電圧であ
る。本発明において、水素含有ガスを流さない状
態で水の電解が起る電圧よりも若干低い電圧を印
加しても電流は生じず従つて水素ガスも酸素ガス
も発生しない。 In the present invention, a hydrogen-containing gas is caused to flow and a voltage is applied. The voltage applied here is the voltage required for current to flow in a state where hydrogen-containing gas is flowing. In the present invention, even if a voltage slightly lower than the voltage at which water electrolysis occurs without flowing hydrogen-containing gas is applied, no current is generated, and therefore neither hydrogen gas nor oxygen gas is generated.
一方この電圧下に薄膜(陽極)の電解面の裏面
に接して水素含有ガスを流すことにより電流を生
ずるとともに水素含有ガス中の水素が薄膜を拡散
透過して除去される。このときこれに相当する量
の水素ガスが陰極から発生するが陽極からは酸素
ガスはほとんど発生しない。従つて除去すべき水
素ガスが存在するときにのみ電力が消費され、こ
の場合には除去された水素の電気化学当量に相当
する電気量すなわち1グラム当量の水素の除去に
対してほゞ1フアラデー(96500クローン)の電
気量のみが消費される。また、水素含有ガスを流
しながら通常の水電解が起る電圧を印加した場合
には水の電解が行われると同時に水素含有ガス中
の水素が優先的に除去され、陰極からは消費され
た電気量に相当する電気化学当量の水素ガスが発
生し、陽極からは水素含有ガスからの水素の除去
に要した電気量を差引いた電気量に相当する電気
化学当量の酸素ガスのみが発生する。 On the other hand, by flowing a hydrogen-containing gas under this voltage in contact with the back side of the electrolytic surface of the thin film (anode), a current is generated and the hydrogen in the hydrogen-containing gas is removed by diffusing and passing through the thin film. At this time, a corresponding amount of hydrogen gas is generated from the cathode, but almost no oxygen gas is generated from the anode. Electricity is therefore consumed only when there is hydrogen gas to be removed, in which case an amount of electricity corresponding to the electrochemical equivalent of hydrogen removed, ie approximately 1 faraday for the removal of 1 gram equivalent of hydrogen. (96500 clones) of electricity is consumed. In addition, when a voltage that causes normal water electrolysis is applied while flowing hydrogen-containing gas, water electrolysis occurs and at the same time hydrogen in the hydrogen-containing gas is preferentially removed, and the consumed electricity is removed from the cathode. An electrochemical equivalent of hydrogen gas corresponding to the amount of hydrogen gas is generated, and only oxygen gas of an electrochemical equivalent equivalent to the amount of electricity obtained by subtracting the amount of electricity required to remove hydrogen from the hydrogen-containing gas is generated from the anode.
陽極および陰極間に印加される電圧としては電
極の材質、電解液の濃度、温度、両極間の距離お
よび電流密度などにより、0.2〜10voltの範囲で
設定される。 The voltage applied between the anode and the cathode is set in the range of 0.2 to 10 volts depending on the material of the electrode, the concentration of the electrolyte, the temperature, the distance between the two electrodes, the current density, etc.
また、陽極面の電流密度については電流密度が
過小の場合には陽極の単位面積当りに対する水素
除去量が少なく実用的でなく、また過大の場合に
は印加する電圧を高くしなければならないため電
力効率が低下することなどから、電流密度が0.01
〜2A/cm2となるように印加電圧が前記の範囲内
で設定される。陽極と陰極間の距離についても電
圧、電流密度、電解槽の形状、大きさなどによつ
て異るが通常は0.5〜100mm、好ましくは0.5〜50
mmとされる。 Regarding the current density on the anode surface, if the current density is too low, the amount of hydrogen removed per unit area of the anode is too small to be practical, and if it is too high, the applied voltage must be increased, so the power The current density is 0.01 because efficiency decreases.
The applied voltage is set within the above range so that it is ~2 A/cm 2 . The distance between the anode and cathode also varies depending on the voltage, current density, shape and size of the electrolytic cell, etc., but is usually 0.5 to 100 mm, preferably 0.5 to 50 mm.
It is assumed to be mm.
次に本発明を図面によつて具体的に説明する。 Next, the present invention will be specifically explained with reference to the drawings.
第1図は本発明において使用される水電解装置
の一例を示した縦断端面図である。 FIG. 1 is a longitudinal sectional end view showing an example of a water electrolysis device used in the present invention.
第1図において上端が閉じられ下端が開口さ
れ、開口の周囲に陰極の端子を兼ねたフランジ1
を有する金属製の円筒容器が水電解槽2とされ、
またこの水電解槽2は陰極ともされている。水電
解槽(陰極)2の上部側壁には発生した水素ガス
や酸素ガスを抜き出すための放出管3が設けら
れ、また水電解槽(陰極)2の下端の開口部は円
板状でかつ絶縁性を有するガスケツト4で閉じら
れている。下部開口端の周囲に陽極端子を兼ねた
フランジ5が取付けられたパラジウム合金製の薄
膜管(陽極)6が水電解槽(陰極)2の下部から
ガスケツト4の中央を貫通して挿入され、その上
端は水電解槽(陰極)2の上部を貫通して設けら
れた水素含有ガス供給用の絶縁チユーブ7に接続
されている。薄膜管(陽極)6の下部のフランジ
5はその下にさらにリング状でかつ絶縁性を有す
るガスケツト8を介し、ガス抜出管9を有するフ
ランジ10と水電解槽(陰極)2のフランジ1と
の間で絶縁性を有するボルト11,…,11によ
つて絞め付けられて固定されている。絶縁チユー
ブ7およびガス抜出管9には流量計12および1
3がそれぞれ配設されている。水電解槽(陰極)
2の内部空間には電解液14が満たされている。
また水電解槽(陰極)2の周囲にはヒーター15
が設けられている。直流電源16のプラス側は薄
膜管(陽極)6のフランジ5に、またマイナス側
は水電解槽(陰極)2のフランジ1にそれぞれ配
設され、配線の途中には電圧計17および電流計
18がそれぞれ配設されている。 In Figure 1, the upper end is closed and the lower end is open, and around the opening is a flange 1 that also serves as a cathode terminal.
A metal cylindrical container having
The water electrolyzer 2 also serves as a cathode. The upper side wall of the water electrolyzer (cathode) 2 is provided with a discharge pipe 3 for extracting generated hydrogen gas and oxygen gas, and the opening at the lower end of the water electrolyzer (cathode) 2 is disc-shaped and insulated. It is closed with a gasket 4 having a property. A thin film tube (anode) 6 made of palladium alloy, with a flange 5 that also serves as an anode terminal attached around the lower open end, is inserted from the bottom of the water electrolyzer (cathode) 2 through the center of the gasket 4. The upper end is connected to an insulating tube 7 for supplying hydrogen-containing gas, which is provided through the upper part of the water electrolyzer (cathode) 2 . The lower flange 5 of the thin film tube (anode) 6 is further connected to a flange 10 having a gas vent pipe 9 and a flange 1 of the water electrolytic cell (cathode) 2 via a ring-shaped insulating gasket 8 below. They are tightened and fixed by insulating bolts 11, . . . , 11 between them. Flowmeters 12 and 1 are installed in the insulating tube 7 and the gas vent tube 9.
3 are arranged respectively. Water electrolyzer (cathode)
The internal space of 2 is filled with an electrolytic solution 14.
Also, a heater 15 is placed around the water electrolyzer (cathode) 2.
is provided. The positive side of the DC power supply 16 is installed on the flange 5 of the thin film tube (anode) 6, and the negative side is installed on the flange 1 of the water electrolyzer (cathode) 2, and a voltmeter 17 and an ammeter 18 are installed in the middle of the wiring. are arranged respectively.
水素ガスの除去操作時には直流電源16によつ
て薄膜管(陽極)6および水電解槽(陰極)2の
フランジとの間に電圧が印加され、絶縁チユーブ
7から薄膜管(陽極)6内部に水素含有ガスが流
されることにより、水素含有ガス中の水素のみが
選択的に薄膜管(陽極)6の内側から外側(電解
液と接する面)への拡散透過し、除去されるとと
もに陰極からは水素ガスが発生する。印加される
電圧が通常の水電解が生ずる電圧よりも低い場合
には水素含有ガス中の水素ガスが除去されるとと
もに水電解槽(陰極)2の面からは通じた電気量
に相当する水素ガスのみが発生し、薄膜管(陽
極)6の外面からの酸素ガスの発明はみられな
い。また、印加される電圧が通常の水電解を生ず
る電圧の場合には、水素含有ガス中の水素が優先
的に除去され水電解槽(陰極)2からは流れた電
気量に相当する電気化学当量の水素ガスが発生し
薄膜管(陽極)6の外面からは水素含有ガスから
の水素の除去に要した電気量を差引いた電気量に
相当する電気化学当量の酸素ガスが発生し、それ
ぞれのガスは放出管3を経て外部に抜き出され
る。この間、電解液14はヒーター15によつて
適宜加温調節される。水素含有ガス中の水素ガス
除去量は絶縁チユーブ7およびガス抜出管9に設
けられた流量計12および13が示す流量の差か
ら求められる。 During the hydrogen gas removal operation, a voltage is applied between the thin film tube (anode) 6 and the flange of the water electrolyzer (cathode) 2 by the DC power supply 16, and hydrogen is transferred from the insulating tube 7 into the thin film tube (anode) 6. By flowing the containing gas, only the hydrogen in the hydrogen-containing gas selectively diffuses and permeates from the inside of the thin film tube (anode) 6 to the outside (the surface in contact with the electrolyte) and is removed, while the hydrogen is removed from the cathode. Gas is generated. When the applied voltage is lower than the voltage at which normal water electrolysis occurs, hydrogen gas in the hydrogen-containing gas is removed and hydrogen gas equivalent to the amount of electricity passed from the surface of the water electrolyzer (cathode) 2 is released. Oxygen gas is not generated from the outer surface of the thin film tube (anode) 6. In addition, when the applied voltage is a voltage that causes normal water electrolysis, hydrogen in the hydrogen-containing gas is preferentially removed, and the electrochemical equivalent equivalent to the amount of electricity flowing from the water electrolyzer (cathode) 2 is of hydrogen gas is generated, and from the outer surface of the thin film tube (anode) 6, oxygen gas with an electrochemical equivalent equivalent to the amount of electricity after subtracting the amount of electricity required to remove hydrogen from the hydrogen-containing gas is generated, and each gas is extracted to the outside through the discharge pipe 3. During this time, the temperature of the electrolytic solution 14 is adjusted appropriately by the heater 15. The amount of hydrogen gas removed from the hydrogen-containing gas is determined from the difference in the flow rates indicated by the flow meters 12 and 13 provided in the insulating tube 7 and the gas extraction tube 9.
本発明の方法は次のような多くの優れた効果を
有している。
The method of the present invention has many excellent effects as follows.
1 水素含有ガス流中の水素ガスのみを選択的に
しかも連続的に除去することができる。1 Only hydrogen gas in a hydrogen-containing gas stream can be selectively and continuously removed.
2 比較的低温で、また低い水素分圧においても
操作することができ、特に高温加熱や、加圧を
必要としない。2. It can be operated at relatively low temperatures and at low hydrogen partial pressures, and does not require particularly high temperature heating or pressurization.
3 水電解が生ずる電圧よりも若干低い電圧で操
作した場合には電力効率をほゞ100%に維持す
ることができるなどエネルギー効率が高い。3. High energy efficiency, as power efficiency can be maintained at nearly 100% when operated at a voltage slightly lower than that at which water electrolysis occurs.
4 比較的簡単な装置で実施することができると
ともに操作および装置の保守も容易である。4. It can be carried out using relatively simple equipment, and operation and maintenance of the equipment are also easy.
5 水素ガス濃度に関係なく、操作が可能であ
り、水素の除去によるガスの精製のほか、反応
や分析などに使用されるガス中の水素濃度の調
節など産業上の用途は広い。5. It can be operated regardless of the hydrogen gas concentration, and has a wide range of industrial uses, such as purifying gas by removing hydrogen and adjusting the hydrogen concentration in gas used for reactions and analysis.
実施例 1
第1図で示したと同様な装置において、内径12
mm長さ260mmの円筒状のニツケル製電解槽を陰極
とし、この電解槽の中心部分に外径1.6mm、肉厚
0.08mm、長さ200mmでパラジウム70%、銀20%、
金10%からなり、内、外面ともにパラジウム黒を
付した合金の薄膜管を陽極として配置した。
Example 1 In a device similar to that shown in FIG.
A cylindrical nickel electrolytic cell with a length of 260 mm is used as the cathode, and the center part of this electrolytic cell has an outer diameter of 1.6 mm and a wall thickness of 1.6 mm.
0.08mm, length 200mm, 70% palladium, 20% silver,
An alloy thin-film tube made of 10% gold and coated with black palladium on both the inner and outer surfaces was placed as an anode.
なお本実施例で用いたガス流量計は(株)エステツ
ク製精密膜流量計SF−11〔L〕、電圧計はタケダ
理研製デジタル電圧計 TR−6320、電流計は横
河北辰(株)製精密電流計 TYPE 2012である。ま
た、直流電源には協立理工製のスライドレギユレ
ーター付のものを用いた。水電解槽内部には電解
液として4%水酸化ナトリウム水溶液を入れた。
水電解槽の外面はヒーターにより65℃に保つよう
加温した。 The gas flowmeter used in this example was a precision membrane flowmeter SF-11 [L] manufactured by Estec Co., Ltd., the voltmeter was a digital voltmeter TR-6320 manufactured by Takeda Riken, and the ammeter was manufactured by Yokogawa Hokushin Co., Ltd. Precision ammeter TYPE 2012. In addition, a DC power supply with a slide regulator manufactured by Kyoritsu Riko was used. A 4% aqueous sodium hydroxide solution was placed inside the water electrolytic cell as an electrolyte.
The outer surface of the water electrolyzer was heated to maintain it at 65°C using a heater.
室温24℃下において薄膜管内の上部から下部へ
向けて水素ガスを常圧で毎分17.40ml流すととも
に薄膜管を陽極、電解槽を陰極として電極端子間
に1Aの電流が流れるように直流電圧を印加調節
したところ、陰極表面から水素ガスが連続的に発
生した。一方、陽極からの酸素の発生は見られな
かつた。この時の端子電圧は0.84Voltであつた。
また薄膜管下部からの出口ガス流量は毎分9.80ml
であり、入口ガス流量に比べ毎分7.6ml減少して
いた。このガス流量の減少量と電流値から電力量
に対する水素除去量を計算すると1フアラデー
(96500クローン)当り1グラム当量の水素が除か
れたことになり、100%の電流効率で水素が除か
れていたことがわかつた。 At a room temperature of 24°C, hydrogen gas was flowed at 17.40 ml per minute at normal pressure from the top to the bottom inside the thin film tube, and a DC voltage was applied so that a current of 1A would flow between the electrode terminals, with the thin film tube as the anode and the electrolytic cell as the cathode. When the application was adjusted, hydrogen gas was continuously generated from the cathode surface. On the other hand, no generation of oxygen from the anode was observed. The terminal voltage at this time was 0.84 Volt.
In addition, the outlet gas flow rate from the bottom of the thin film tube is 9.80ml per minute.
This was a decrease of 7.6ml per minute compared to the inlet gas flow rate. Calculating the amount of hydrogen removed relative to the amount of electricity from this reduction in gas flow rate and current value, it means that 1 gram equivalent of hydrogen was removed per Fara day (96500 clones), which means that hydrogen was removed with 100% current efficiency. I found out that
比較例
薄膜管内部に流すガスを実施例1の水素ガスの
代りに窒素ガスに変えたところ、両極端子間に
0.84Voltの電圧をかけても、電流は0.0001Aしか
流れず、水電解反応は認められなかつた。Comparative example When the gas flowing inside the thin film tube was changed to nitrogen gas instead of the hydrogen gas in Example 1, a
Even when a voltage of 0.84 Volt was applied, a current of only 0.0001 A flowed, and no water electrolysis reaction was observed.
実施例 2
実施例1と同じ水電解装置を用い、室温20℃、
水電解槽の温度65℃において同様の方法で容積比
で水素ガス24.9%を含む窒素ガスを毎分121.0ml
の割合で流すとともに、両極端子間に電流値が
2.0Aとなるように電圧を調整しながら印加した。
このときの電圧は0.88〜0.91Voltであつた。この
場合にも陰極からは水素ガスが発生したが陽極か
らの酸素ガスの発生はほとんど見られなかつた。
このとき薄膜管出口のガス流量は毎分106.1mlで
あり、減少したガス量がすべて、水素が除去され
たことによるものとして計算すると99.6%の電流
効率で除去されていたこととなる。Example 2 Using the same water electrolysis device as in Example 1, the room temperature was 20°C,
Using the same method at a water electrolyzer temperature of 65°C, 121.0 ml of nitrogen gas containing 24.9% hydrogen gas by volume was produced per minute.
At the same time, the current value between the two pole terminals is
The voltage was applied while adjusting it to be 2.0A.
The voltage at this time was 0.88 to 0.91 Volt. In this case as well, hydrogen gas was generated from the cathode, but almost no oxygen gas was observed from the anode.
At this time, the gas flow rate at the outlet of the thin film tube was 106.1 ml per minute, and if we calculated that all of the reduced gas amount was due to the removal of hydrogen, it would have been removed with a current efficiency of 99.6%.
実施例 3
実施例1と同じ水電解装置を用い、室温20℃、
水電解槽の温度65℃において容積比で水素10%を
含む窒素ガスを毎分51.70mlで流しながら、電流
が1.0Aとなるように端子電圧を調整した。この
時の端子電圧は1.83Voltであつた。また薄膜管出
口のガス流量は毎分46.5mlであり、このガス中に
は水素ガスが認められず、ほゞ完全に除去されて
いることが解つた。また本実施例の場合は陰極か
らの水素ガスの発生とともに薄膜管(陽極)の電
解面からは酸素ガスの発明が認められた。Example 3 Using the same water electrolysis device as in Example 1, the room temperature was 20°C,
The terminal voltage was adjusted so that the current was 1.0 A while flowing nitrogen gas containing 10% hydrogen by volume at a rate of 51.70 ml per minute at a water electrolyzer temperature of 65°C. The terminal voltage at this time was 1.83 Volt. Furthermore, the gas flow rate at the outlet of the thin film tube was 46.5 ml per minute, and no hydrogen gas was observed in this gas, indicating that it was almost completely removed. In addition, in the case of this example, hydrogen gas was generated from the cathode, and oxygen gas was also generated from the electrolytic surface of the thin film tube (anode).
第1図は本発明において使用される水電解装置
の一例を示した縦断端面図である。
図において、1,5および10……フランジ、
2……水電解槽(陰極)、3……放出管、4およ
び8……ガスケツト、6……薄膜管(陽極)、7
……絶縁チユーブ、9……ガス抜出管、11……
ボルト、12および13……流量計、14……電
解液、15……ヒーター、16……直流電源、1
7……電圧計ならびに18……電流計である。
FIG. 1 is a longitudinal sectional end view showing an example of a water electrolysis device used in the present invention. In the figure, 1, 5 and 10... flange,
2...Water electrolyzer (cathode), 3...Discharge tube, 4 and 8...Gasket, 6...Thin film tube (anode), 7
...Insulation tube, 9...Gas vent pipe, 11...
Volts, 12 and 13...flow meter, 14...electrolyte, 15...heater, 16...DC power supply, 1
7... voltmeter and 18... ammeter.
Claims (1)
極とし、水電解液としてアルカリ金属水酸化物の
0.1〜20%水溶液が満たされた水電解装置を使用
し、該水電解液を40〜100℃の範囲で所定の温度
に保ちながら、該パラジウムまたはパラジウム合
金の薄膜の電解面の裏面に接して水素含有ガスを
流すとともに、電流密度が0.01〜2A/cm2になる
ように0.2〜10voltの範囲から選択された設定電
圧をかけることにより、該水素含有ガスから水素
ガスを選択的に除去することを特徴とする水素ガ
スの除去方法。1 A thin film of palladium or palladium alloy is used as the anode, and alkali metal hydroxide is used as the water electrolyte.
Using a water electrolyzer filled with a 0.1-20% aqueous solution, the aqueous electrolyte is kept at a predetermined temperature in the range of 40-100°C while contacting the back side of the electrolytic surface of the palladium or palladium alloy thin film. Selectively removing hydrogen gas from the hydrogen-containing gas by flowing the hydrogen-containing gas and applying a set voltage selected from the range of 0.2 to 10 volts so that the current density is 0.01 to 2 A/cm2. A method for removing hydrogen gas, characterized by:
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60206571A JPS6270203A (en) | 1985-09-20 | 1985-09-20 | Removal of hydrogen gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60206571A JPS6270203A (en) | 1985-09-20 | 1985-09-20 | Removal of hydrogen gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6270203A JPS6270203A (en) | 1987-03-31 |
| JPH0566322B2 true JPH0566322B2 (en) | 1993-09-21 |
Family
ID=16525602
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60206571A Granted JPS6270203A (en) | 1985-09-20 | 1985-09-20 | Removal of hydrogen gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6270203A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6248221B1 (en) | 1995-12-26 | 2001-06-19 | Randolph R. Davis | Electrolysis apparatus and electrodes and electrode material therefor |
| CN1756860B (en) * | 2003-03-05 | 2010-05-26 | 出光兴产株式会社 | Hydrotreating device for organic compound, and method for hydrotreating organic compound |
| JP5872788B2 (en) * | 2011-04-26 | 2016-03-01 | Dowaエコシステム株式会社 | Lithium carbonate manufacturing method and lithium carbonate manufacturing apparatus |
| US10465302B2 (en) | 2014-08-07 | 2019-11-05 | Marathon Systems, Inc. | Modular gaseous electrolysis apparatus with actively-cooled header module, co-disposed heat exchanger module and gas manifold modules therefor |
| EP3879006A4 (en) * | 2018-11-05 | 2021-12-29 | Asahi Kasei Kabushiki Kaisha | Method for manufacturing hydrogen |
-
1985
- 1985-09-20 JP JP60206571A patent/JPS6270203A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6270203A (en) | 1987-03-31 |
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