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JPH0572040B2 - - Google Patents
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JPH0572040B2 - - Google Patents

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Publication number
JPH0572040B2
JPH0572040B2 JP61050423A JP5042386A JPH0572040B2 JP H0572040 B2 JPH0572040 B2 JP H0572040B2 JP 61050423 A JP61050423 A JP 61050423A JP 5042386 A JP5042386 A JP 5042386A JP H0572040 B2 JPH0572040 B2 JP H0572040B2
Authority
JP
Japan
Prior art keywords
power supply
circuit
chip
potential
reference potential
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP61050423A
Other languages
Japanese (ja)
Other versions
JPS62208496A (en
Inventor
Yasushi Sakui
Tatsuo Igawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toshiba Corp
Toshiba Electronic Device Solutions Corp
Original Assignee
Toshiba Corp
Toshiba Microelectronics Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toshiba Corp, Toshiba Microelectronics Corp filed Critical Toshiba Corp
Priority to JP61050423A priority Critical patent/JPS62208496A/en
Publication of JPS62208496A publication Critical patent/JPS62208496A/en
Publication of JPH0572040B2 publication Critical patent/JPH0572040B2/ja
Granted legal-status Critical Current

Links

Description

【発明の詳細な説明】 〔発明の技術分野〕 本発明は、チツプ内にソース電源電圧変換回路
を設けたダイナミツクRAM(DRAM)等に好適
なMOS集積回路に関する。
DETAILED DESCRIPTION OF THE INVENTION [Technical Field of the Invention] The present invention relates to a MOS integrated circuit suitable for a dynamic RAM (DRAM) or the like in which a source power supply voltage conversion circuit is provided within the chip.

〔発明の技術的背景とその問題点〕[Technical background of the invention and its problems]

MOS集積回路、特にメモリにおいては、その
高集積化、大容量化が急速に進んでいる。
MOS integrated circuits, especially memories, are rapidly becoming more highly integrated and larger in capacity.

これに伴ない、使用デバイスの微細化が行なわ
れている。このためシデバイスの耐圧、信頼性等
が問題となつており、プロセス的にはLDD
(Lightly Doped Drain)構造等の工夫が為され
て来たが、デバイスの耐圧、信頼性には限界があ
り、回路設計的には低電圧化技術が必須の技術と
なつている。たとえばダイナミツクRAM
(DRAM)の場合、外部入力の供給電圧として
5V単一電源方式が64KDRAMから採用され、
256K、1Mもこの方式で製品化されている。
DRAMを使用する側のユーザーも4M、16Mに対
してもこの5V単一電源方式を強く希望している。
このため、4MDRAMでは前述したデバイスの耐
性、信頼性等を考慮してチツプ内部に降圧回路を
設け、5Vの外部電源電圧を3V程度に降圧して内
部ドレイン電圧としてチツプ内部の各回路に供給
する方式が試されている。
Along with this, the devices used are being miniaturized. For this reason, the voltage resistance and reliability of the device have become problems, and from a process perspective, LDD
(Lightly Doped Drain) Structures and other improvements have been made, but there are limits to device breakdown voltage and reliability, and low voltage technology has become essential for circuit design. For example, dynamic RAM
(DRAM), as the external input supply voltage
5V single power supply system is adopted from 64KDRAM,
256K and 1M are also commercialized using this method.
DRAM users also strongly desire this 5V single power supply system for 4M and 16M.
For this reason, in 4MDRAM, considering the durability and reliability of the device mentioned above, a step-down circuit is installed inside the chip to step down the external power supply voltage of 5V to approximately 3V and supply it to each circuit inside the chip as an internal drain voltage. The method is being tested.

しかし、降圧回路を組込む方式では、チツプ内
に降圧回路と基板バイアス変換回路の両者を有す
ることとなり、高集積化を妨げ、消費電流も増大
する。更にチツプ動作時のノイズによつて両者の
出力が変動すると回路の誤動作につながる恐れが
ある。この問題はメモリセルが大容量化されるに
つれ顕著となる。それは、チツプ動作時の過渡電
流が大容量化に伴なつて増大し、配線幅の減少か
らチツプ内部のインダクタンスLも増大する傾向
にあるからである。
However, in the method of incorporating a step-down circuit, both a step-down circuit and a substrate bias conversion circuit are included in the chip, which hinders high integration and increases current consumption. Furthermore, if the outputs of both circuits fluctuate due to noise during chip operation, this may lead to malfunction of the circuit. This problem becomes more noticeable as the capacity of memory cells increases. This is because the transient current during chip operation increases as the capacity increases, and the inductance L inside the chip tends to increase as the wiring width decreases.

〔発明の目的〕[Purpose of the invention]

本発明は上記問題に鑑みてなされたもので、デ
バイスの耐圧と信頼性を考慮する一方、電源ノイ
ズによる回路誤動作が起こり難く安定した動作が
可能なMOS集積回路を提供する事を目的とする。
The present invention has been made in view of the above problems, and an object of the present invention is to provide a MOS integrated circuit that is less susceptible to circuit malfunctions due to power supply noise and is capable of stable operation while taking into account the withstand voltage and reliability of the device.

〔発明の概要〕[Summary of the invention]

本発明は、ソース電源電圧変換回路がチツプ内
部に内蔵され、その出力がチツプ内部のソース電
源電圧として入力し、チツプ外部のソース電源電
圧はチツプの基板バイアスとして入力し、チツプ
外部のドレイン電源電圧は、チツプ内部のドレイ
ン電源電圧として直接用いる事を骨子とする。そ
して、前記ソース電源電圧変換回路は低電位(例
えば、接地電圧Vss)と高電位(例えば、電源電
圧Vcc)との間の所定の基準電位を設定し、この
基準電位とこの基準電位がチツプ内部ソース基準
電位として出力されるようにした電源電圧変換回
路からの前記出力電圧とを増幅回路により比較・
検知し、前記基準電位を前記チツプ内部回路のソ
ース電源電圧として供給する構成となつている。
In the present invention, a source power supply voltage conversion circuit is built inside the chip, its output is inputted as the source power supply voltage inside the chip, the source power supply voltage outside the chip is inputted as the substrate bias of the chip, and the drain power supply voltage outside the chip is inputted as the source power supply voltage inside the chip. The main idea is to use it directly as the drain power supply voltage inside the chip. The source power voltage conversion circuit sets a predetermined reference potential between a low potential (for example, ground voltage Vss) and a high potential (for example, power supply voltage Vcc), and this reference potential and this reference potential are set inside the chip. The output voltage from the power supply voltage conversion circuit, which is output as the source reference potential, is compared by an amplifier circuit.
The reference potential is detected and the reference potential is supplied as the source power supply voltage of the internal circuit of the chip.

〔発明の効果〕〔Effect of the invention〕

本発明によれば、ソース電源電圧変換回路を用
いてチツプ内部のソース電源電圧を例えば0Vか
ら2Vに高め相対的にデバイスに加わる電圧が低
下でき、デバイスの耐圧、信頼性を十分保証する
ことができる。
According to the present invention, the source power supply voltage inside the chip can be raised from 0V to 2V using a source power supply voltage conversion circuit, and the voltage applied to the device can be relatively reduced, and the withstand voltage and reliability of the device can be sufficiently guaranteed. can.

また、この様にデバイスに加れる電圧を低下さ
せる一方、チツプ外部のソース電源電圧を直接チ
ツプの基板バイアスとして用いるため、従来チツ
プ内部に内蔵されていた基板バイアス発生回路が
不要となり、これによりチツプ面積の減少、待期
時消費電流の削減が可能となる。
In addition, while reducing the voltage applied to the device in this way, the source power supply voltage outside the chip is used directly as the substrate bias for the chip, which eliminates the need for a substrate bias generation circuit that was conventionally built inside the chip. It is possible to reduce the area and the current consumption during standby.

また、DRAMでは、アドレスバツフア回路等
の参照電位(Vref)の変動が大きな問題である
が、基板バイアスの安定化を図ることができその
誤動作防止に大きな効果がある。
Furthermore, in DRAM, fluctuations in the reference potential (Vref) of address buffer circuits and the like are a major problem, but stabilization of the substrate bias can be achieved, which is highly effective in preventing malfunctions.

〔発明の実施例〕[Embodiments of the invention]

以下本発明の実施例を図面を用いて説明する。
第1図はDRAMのシステムブロツク図を概略的
に示す。
Embodiments of the present invention will be described below with reference to the drawings.
FIG. 1 schematically shows a system block diagram of a DRAM.

ICパツケージの台座101は表面に導体層が
コートされ、裏面にこれが接してDRAMチツプ
102が搭載されている。チツプのドレイン電源
電圧パツド103とソース電源電圧パツド104
には、チツプ外部の供給電源105からドレイン
外部電源電圧(VccExt)106と、ソース外部
電源電圧(VssExt)107が夫々入力する。1
08はブロツキングコンデンサであり、またここ
ではVccExtは5V、VssExtは0Vである。
The surface of the pedestal 101 of the IC package is coated with a conductive layer, and the DRAM chip 102 is mounted on the back surface in contact with the conductive layer. Chip drain power supply voltage pad 103 and source power supply voltage pad 104
A drain external power supply voltage (VccExt) 106 and a source external power supply voltage (VssExt) 107 are respectively input from a power supply 105 external to the chip. 1
08 is a blocking capacitor, and here VccExt is 5V and VssExt is 0V.

VccExtは直接チツプ内部の内部回路109の
内部ドレイン電源電圧(Vcc Int.)110として
入力する。内部回路109は基本クロツク発生回
路111とDRAM回路112から構成され、
DRAM回路112は更にDRAMメモリセル、セ
ンスアンプ等のコア回路113とプリチヤージ回
路、デコーダ回路、アドレスバツフア回路、I/
O回路等の周辺回路114から構成されている。
VccExt is directly input as the internal drain power supply voltage (Vcc Int.) 110 of the internal circuit 109 inside the chip. The internal circuit 109 consists of a basic clock generation circuit 111 and a DRAM circuit 112.
The DRAM circuit 112 further includes core circuits 113 such as DRAM memory cells, sense amplifiers, precharge circuits, decoder circuits, address buffer circuits, I/O circuits, etc.
It is composed of peripheral circuits 114 such as O circuits.

一方、VssExtはチツプ内部の電源電圧変換回
路115により2Vまで昇圧され、VssInt.116
として内部回路109に入力する。また、チツプ
外部のこのVssExt.107は導電性表面のパツケ
ージ台座101に接続され、チツプ102の基板
電位VBB117として働く。
On the other hand, VssExt is boosted to 2V by the power supply voltage conversion circuit 115 inside the chip, and VssInt.
The signal is input to the internal circuit 109 as follows. Further, this VssExt. 107 outside the chip is connected to the package base 101 with a conductive surface, and serves as the substrate potential V BB 117 of the chip 102.

ソース電源電圧変換回路115は第2図に示す
ブロツク構成である。201は基準電位発生回
路、202は誤差増幅回路、203は内部ソース
電位負荷回路である。チツプ内部ソース電位
VssInt.116と、基準電位発生回路201によ
り設定された基準電位204の電位差を誤差増幅
回路202で増幅し、内部ソース電位負荷回路2
03により、内部回路109の消費電流を制御し
てチツプ内部ソース電位VssInt.を安定化してい
る。
The source power supply voltage conversion circuit 115 has a block configuration shown in FIG. 201 is a reference potential generation circuit, 202 is an error amplification circuit, and 203 is an internal source potential load circuit. Chip internal source potential
The potential difference between VssInt.116 and the reference potential 204 set by the reference potential generation circuit 201 is amplified by the error amplification circuit 202, and the internal source potential load circuit 2
03, the current consumption of the internal circuit 109 is controlled to stabilize the chip internal source potential VssInt.

第3図は第2図の実際の回路図である。即ち、
VccExt.,VssExt.の5V,0Vを抵抗R1,R2で分
割して基準電位204が与えられる。誤差増幅回
路202はp−chMOSFET Q1〜Q3及びn−
chMOSFET Q4,Q5であり、カレントミラー型
の誤差増幅回路を構成している。Q6はチツプ内
部ソース電位出力負荷用のn−chMOSFETであ
る。
FIG. 3 is an actual circuit diagram of FIG. That is,
A reference potential 204 is provided by dividing 5V and 0V of VccExt. and VssExt. by resistors R 1 and R 2 . The error amplification circuit 202 includes p-ch MOSFETs Q 1 to Q3 and n-
The chMOSFETs Q 4 and Q 5 constitute a current mirror type error amplification circuit. Q6 is an n-ch MOSFET for chip internal source potential output load.

第3図ではCMOS構成であるが、第4図に示
すようにn−chMOSFETで構成する事も可能で
ある。ここで、Q1〜Q3はDタイプ、Q4〜Q6はE
タイプのMOSFETである。
Although FIG. 3 shows a CMOS configuration, it is also possible to configure an n-ch MOSFET as shown in FIG. 4. Here, Q 1 to Q 3 are D type, and Q 4 to Q 6 are E type.
It is a type of MOSFET.

第3図、第4図では抵抗分割によりチツプ内部
ソース基準電位204を設定したが、第5図に示
す様に、例えばn−chMOSFET Q7〜Q10を用い
ても良い。
In FIGS. 3 and 4, the chip internal source reference potential 204 is set by resistance division, but as shown in FIG. 5, for example, n-ch MOSFETs Q 7 to Q 10 may be used.

第6図は上述したアドレスバツフア回路の回路
図を示している。即ち、TTLレベルの微小振幅
のアドレス入力信号Ainを抵抗分割で得た前記振
幅の中間電位に設定された参照電位Vrefと比較
してAinがHかLかを検知し、これを増幅して内
部アドレス信号Aout、これと相補信号のAoutを
得るものである。
FIG. 6 shows a circuit diagram of the address buffer circuit described above. That is, it compares the address input signal Ain with a small amplitude at the TTL level with a reference potential Vref set to an intermediate potential of the amplitude obtained by resistor division, detects whether Ain is H or L, and amplifies it to internally The address signal Aout and its complementary signal Aout are obtained.

従来、基板バイアス回路を用いたものでは、ビ
ツト線充放電時にビツト線にコンタクトするメモ
リセルの拡散層の接合容量により基板電位VBB
変動し易く、これと基板表面の酸化膜を介して対
向する、Vrefラインに変動を与え、アドレスバ
ツフア回路が誤動作するという問題があつた。
Conventionally, in circuits using a substrate bias circuit, the substrate potential V BB tends to fluctuate due to the junction capacitance of the diffusion layer of the memory cell that contacts the bit line during charging and discharging of the bit line. However, there was a problem in that the Vref line fluctuated, causing the address buffer circuit to malfunction.

第7図は第6図のアドレスバツフア回路の動作
波形図を示すもので以下、動作を簡単に説明す
る。
FIG. 7 shows an operational waveform diagram of the address buffer circuit of FIG. 6, and the operation will be briefly explained below.

まずクロツク信号φ1,φ2,φ3,φ4がそれぞれ
“H”“H”“L”“L”とすると(“H”=5V、
“L”=2V)、MOSFETQ13,Q14は導通状態にな
り、ノードN1はアドレス入力端子レベルに、ノ
ードN2は参照電位に充電される。一方、
MOSFET 21,Q22,Q23も導通状態になりノー
ドN5,N6は“H”に充電されMOSFET Q17
Q18,Q26,Q27も導通状態になり、φ3,φ4
“L”のため、N3,N4,Aout,Aoutはすべて
“L”となる。
First, let us assume that the clock signals φ 1 , φ 2 , φ 3 , and φ 4 are respectively “H”, “H”, “L”, and “L” (“H”=5V,
"L" = 2V), MOSFETs Q 13 and Q 14 become conductive, node N 1 is charged to the address input terminal level, and node N 2 is charged to the reference potential. on the other hand,
MOSFETs 21 , Q 22 and Q 23 also become conductive, nodes N 5 and N 6 are charged to “H”, and MOSFETs Q 17 and
Q 18 , Q 26 , and Q 27 also become conductive, and since φ 3 and φ 4 are “L”, N 3 , N 4 , Aout, and Aout all become “L”.

次にクロツク信号φ1,φ2が“H”レベルから
“L”レベルに変化し、引続いてクロツク信号φ3
が“L”から“H”になる。すると、MOSFET
Q17,Q18に夫々ノードN3,N4へφ3のレベルを転
送しようとする。ところがノードN1,N2
MOSFET Q11,Q12を導通させるのに充分なレ
ベルであり、また、ノードN1とノードN2にはレ
ベル差があるためMOSFET Q11とQ12にコンダ
クタンスの差が生ずるためノードN3とN4にはレ
ベル差が生じる。ここではAin=“H”のためN4
“H”、N3“L”となる。この電位差をMOSFET
Q15,Q16からなるフリツプフロツプが増幅し、
それと同時にMOSFET Q19,Q20がノードN5
N6へノードN3,N4の状態を転送する。N4“H”,
N3“L”であるからMOSFETQ19は非導通、Q20
は導通し、ノードN5“H”のまま、ノードN6
“H”から“L”となる。ノードN5,N6はそれ
ぞれQ18,Q17のゲードに夫々接続されているた
め、ノードN6“L”となるとMOSFET Q17のコ
ンダクタンスが下がりN3“L”,N4“H”のレベ
ル差が大きくなるのを助長する。以上の様なフイ
ードバツク系によりN3,N6は“L”レベルとな
りN4,N5は“H”となる。
Next, the clock signals φ 1 and φ 2 change from the “H” level to the “L” level, and then the clock signal φ 3 changes from the “H” level to the “L” level.
changes from “L” to “H”. Then, the MOSFET
An attempt is made to transfer the level of φ 3 to nodes N 3 and N 4 at Q 17 and Q 18 , respectively. However, nodes N 1 and N 2 are
This is a sufficient level to make MOSFETs Q 11 and Q 12 conductive, and since there is a level difference between node N 1 and node N 2 , there is a difference in conductance between MOSFETs Q 11 and Q 12 , so node N 3 and There are level differences in N4 . Here, N 4 because Ain="H"
“H”, N 3 “L”. This potential difference is applied to the MOSFET
The flip-flop consisting of Q 15 and Q 16 amplifies,
At the same time, MOSFETs Q 19 and Q 20 are connected to node N 5 ,
Transfer the states of nodes N 3 and N 4 to N 6 . N 4 “H”,
Since N 3 is “L”, MOSFET Q 19 is non-conducting, Q 20
conducts, node N 5 remains “H”, node N 6
It changes from “H” to “L”. Since nodes N 5 and N 6 are connected to the gates of Q 18 and Q 17 , respectively, when node N 6 becomes “L”, the conductance of MOSFET Q 17 decreases, and N 3 “L” and N 4 “H” Encourage the level difference to grow. Due to the feedback system as described above, N 3 and N 6 become "L" level, and N 4 and N 5 become "H" level.

次にクロツク信号φ4が“L”から“H”へと
変化するとN5,N6が夫々“H”,“L”であるた
めMOSFET Q26は導通、Q27は非導通であるた
めAoutへφ4のレベルが転送され、更にAoutが
“H”であるためMOSFET Q15が導通状態とな
りAousは“L”となり、アドレス信号Aout
“H”、Aout“L”が出力される。参照電位Vrefは
基準電位発生回路601で作られる。この基準電
位発生回路601は、ポリシリコン膜による抵抗
体R3,R4を用いた抵抗分割回路で構成され、ま
た、各アドレスバツフアに入力するまでに長い
VrefAl配線があり、半導体基板との間で大きい
容量結合がある。この値は配線同志の容量より一
般に大きい。従つて従来の如く基板バイアス発生
回路を用いたものでは前記ビツト線の充放電時に
VBBがゆらぐ問題があり、これがVrefの変動をも
たらしてマージンの小さいアドレスバツフア回路
の誤動作を引起す問題があつた。これはビツト線
充放電後、カラムアドレスやロウアドレス指定の
ためのAin入力時の誤動作として表わされるもの
である。
Next, when the clock signal φ 4 changes from "L" to "H", MOSFET Q 26 is conductive because N 5 and N 6 are "H" and "L", respectively, and Aout is because Q 27 is non-conductive. The level of φ4 is transferred to φ4 , and since Aout is “H”, MOSFET Q 15 becomes conductive, Aous becomes “L”, and the address signal Aout
“H” and Aout “L” are output. Reference potential Vref is generated by reference potential generation circuit 601. This reference potential generation circuit 601 is composed of a resistance divider circuit using resistors R 3 and R 4 made of polysilicon film, and also has a long
There is VrefAl wiring, and there is large capacitive coupling between it and the semiconductor substrate. This value is generally larger than the capacitance between interconnects. Therefore, in a conventional circuit using a substrate bias generation circuit, when charging and discharging the bit line,
There was a problem that V BB fluctuated, which caused Vref to fluctuate, causing malfunction of the address buffer circuit with a small margin. This is manifested as a malfunction when inputting Ain to specify a column address or row address after charging and discharging the bit line.

しかして本発明では、VBBは電源容量の大きい
Vssext.をVBBとして用いるのでかかる問題が大
幅に改善される。また、ビツト線充放電時には、
その過大な電流によりVcc,Vssが変動するとい
う問題もあるが、第1図、第6図に示すように、
電源容量の大きいVccExt,VssExtを直接抵抗分
割すれば良いのでVrefの安定化は著しく達成さ
れる。また、基板バイアスも含めて電源電圧変換
回路は1系統であるので、アドレスバツフア回路
本体を含め内部回路109はノイズに対して強
い。
However, in the present invention, V BB has a large power supply capacity.
Since Vssext. is used as V BB , this problem is greatly improved. Also, when charging and discharging the bit line,
There is also the problem that Vcc and Vss fluctuate due to the excessive current, but as shown in Figures 1 and 6,
Since VccExt and VssExt, which have large power supply capacities, can be directly divided by resistance, Vref can be significantly stabilized. Furthermore, since there is only one power supply voltage conversion circuit including the substrate bias, the internal circuit 109 including the address buffer circuit itself is resistant to noise.

第1図において、602はAinの信号入力パツ
ドである。尚、基準電位発生回路601は第5図
に示した様にMOSFETで構成してもよい。
In FIG. 1, 602 is a signal input pad for Ain. Incidentally, the reference potential generation circuit 601 may be constituted by a MOSFET as shown in FIG.

以上説明した様に、本発明によれば、デバイス
耐圧、信頼性向上を図ると共に、電源回路の小型
化、低消費電力化が可能となり、また、チツプの
ノイズ誤動作を大幅に改善する事ができるもので
ある。
As explained above, according to the present invention, it is possible to improve device breakdown voltage and reliability, downsize the power supply circuit and reduce power consumption, and significantly improve chip noise malfunction. It is something.

その他本発明は上記実施例に限定されることな
く、種々変形して実施する事ができる。
In addition, the present invention is not limited to the above embodiments, and can be implemented with various modifications.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明の実施例を示すシステムブロツ
ク図、第2図はソース電源電圧変換回路のブロツ
ク図、第3図、第4図、第5図はその回路図、第
6図はアドレスバツフア回路の回路図、第7図は
その動作のタイミングチヤート図である。 図において、105……外部電源、115……
ソース電圧変換回路、109……内部回路。
Figure 1 is a system block diagram showing an embodiment of the present invention, Figure 2 is a block diagram of a source power voltage conversion circuit, Figures 3, 4, and 5 are circuit diagrams thereof, and Figure 6 is an address buffer. The circuit diagram of the FAR circuit, FIG. 7, is a timing chart of its operation. In the figure, 105...external power supply, 115...
Source voltage conversion circuit, 109...internal circuit.

Claims (1)

【特許請求の範囲】 1 2種の外部電源のうち高電位の外部電源をチ
ツプの内部回路のドレイン電源電圧とし、低電位
の外部電源を基板バイアスとすると共に前記外部
電源の前記高電位と低電位との間の所定の基準電
位を設定し、この基準電位とこの基準電位がチツ
プ内部ソース基準電位として出力されるようにし
た電源電圧変換回路からの前記出力電位とを増幅
回路により比較・検知し、前記基準電位を前記チ
ツプの内部回路のソース電源電圧として供給する
ようにしたことを特徴とするMOS集積回路。 2 前記チツプは、ダイナミツクRAMチツプで
ある事を特徴とする前記特許請求の範囲第1項記
載のMOS集積回路。 3 2種の外部電源は夫々5V,0Vであり、電源
電圧変換回路の出力は2Vである事を特徴とする
前記特許請求の範囲第1項記載のMOS集積回路。 4 アドレスバツフア回路を備えてなる事を特徴
とする前記特許請求の範囲第1項又は第2項記載
のMOS集積回路。 5 アドレスバツフア回路の参照電位が外部電源
の電源電圧と分割して得られる事を特徴とする前
記特許請求の範囲第4項記載のMOS集積回路。
[Claims] 1. Among the two types of external power supplies, the high potential external power supply is used as the drain power supply voltage of the internal circuit of the chip, and the low potential external power supply is used as the substrate bias, and the high potential and low potential of the external power supply A predetermined reference potential is set between the potential and the reference potential, and an amplifier circuit compares and detects this reference potential with the output potential from the power supply voltage conversion circuit, which outputs this reference potential as the chip internal source reference potential. A MOS integrated circuit characterized in that the reference potential is supplied as a source power supply voltage of an internal circuit of the chip. 2. The MOS integrated circuit according to claim 1, wherein the chip is a dynamic RAM chip. 3. The MOS integrated circuit according to claim 1, wherein the two types of external power supplies are 5V and 0V, respectively, and the output of the power supply voltage conversion circuit is 2V. 4. The MOS integrated circuit according to claim 1 or 2, characterized in that it comprises an address buffer circuit. 5. The MOS integrated circuit according to claim 4, wherein the reference potential of the address buffer circuit is obtained by dividing the power supply voltage of an external power supply.
JP61050423A 1986-03-10 1986-03-10 Mos integrated circuit Granted JPS62208496A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61050423A JPS62208496A (en) 1986-03-10 1986-03-10 Mos integrated circuit

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61050423A JPS62208496A (en) 1986-03-10 1986-03-10 Mos integrated circuit

Publications (2)

Publication Number Publication Date
JPS62208496A JPS62208496A (en) 1987-09-12
JPH0572040B2 true JPH0572040B2 (en) 1993-10-08

Family

ID=12858456

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61050423A Granted JPS62208496A (en) 1986-03-10 1986-03-10 Mos integrated circuit

Country Status (1)

Country Link
JP (1) JPS62208496A (en)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5297097A (en) 1988-06-17 1994-03-22 Hitachi Ltd. Large scale integrated circuit for low voltage operation
USRE40132E1 (en) 1988-06-17 2008-03-04 Elpida Memory, Inc. Large scale integrated circuit with sense amplifier circuits for low voltage operation
JP3569310B2 (en) * 1993-10-14 2004-09-22 株式会社ルネサステクノロジ Semiconductor storage device

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61131617A (en) * 1984-11-30 1986-06-19 Toshiba Corp Mos type semiconductor device

Also Published As

Publication number Publication date
JPS62208496A (en) 1987-09-12

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