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JPH0576759B2 - - Google Patents
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JPH0576759B2 - - Google Patents

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Publication number
JPH0576759B2
JPH0576759B2 JP60037463A JP3746385A JPH0576759B2 JP H0576759 B2 JPH0576759 B2 JP H0576759B2 JP 60037463 A JP60037463 A JP 60037463A JP 3746385 A JP3746385 A JP 3746385A JP H0576759 B2 JPH0576759 B2 JP H0576759B2
Authority
JP
Japan
Prior art keywords
electrode
plastic tube
side electrode
voltage application
hollow truncated
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60037463A
Other languages
Japanese (ja)
Other versions
JPS61197638A (en
Inventor
Masahiro Takeuchi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP60037463A priority Critical patent/JPS61197638A/en
Publication of JPS61197638A publication Critical patent/JPS61197638A/en
Publication of JPH0576759B2 publication Critical patent/JPH0576759B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B01PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
    • B01JCHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOID CHEMISTRY; THEIR RELEVANT APPARATUS
    • B01J19/00Chemical, physical or physico-chemical processes in general; Their relevant apparatus
    • B01J19/08Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor
    • B01J19/087Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy
    • B01J19/088Processes employing the direct application of electric or wave energy, or particle radiation; Apparatus therefor employing electric or magnetic energy giving rise to electric discharges
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B29WORKING OF PLASTICS; WORKING OF SUBSTANCES IN A PLASTIC STATE IN GENERAL
    • B29CSHAPING OR JOINING OF PLASTICS; SHAPING OF MATERIAL IN A PLASTIC STATE, NOT OTHERWISE PROVIDED FOR; AFTER-TREATMENT OF THE SHAPED PRODUCTS, e.g. REPAIRING
    • B29C59/00Surface shaping of articles, e.g. embossing; Apparatus therefor
    • B29C59/14Surface shaping of articles, e.g. embossing; Apparatus therefor by plasma treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Toxicology (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明はプラスチツク管内面を均一にプラズマ
処理するための装置及び方法に関するものであ
る。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to an apparatus and method for uniformly plasma treating the inner surface of a plastic tube.

プラスチツク管は、種々の用途に巾広く用いら
れており、更に表面特性を改良する為に各種の表
面処理が施こされているが本願発明は特に長尺の
細いプラスチツク管の内面を容易に、高速で均一
にプラズマ処理をするための装置及びその方法に
関するものである。
Plastic pipes are widely used for a variety of purposes, and various surface treatments are applied to improve their surface properties.The present invention particularly allows the inner surface of long, thin plastic pipes to be easily treated. The present invention relates to an apparatus and method for uniformly performing plasma processing at high speed.

[従来技術] プラスチツク管内面のプラズマ処理するために
種々の装置及び方法が提案されている。
[Prior Art] Various apparatuses and methods have been proposed for plasma treating the inner surface of plastic tubes.

本願発明者もプラスチツク管内に2本の棒状電
極を挿入した状態でグロー放電させる方法を提唱
しており、この方法は放電条件が設定でき、放電
に必要なエネルギーが少なく、低周波(例えば
5KHz)でも可能であるなどのメリツトがあるが、
内部電極方式であるため、処理できるプラスチツ
ク管の径及びその処理可能の長さなども制限され
るという欠点を有している。
The inventor of this application has also proposed a method of glow discharge with two rod-shaped electrodes inserted into a plastic tube. This method allows setting of discharge conditions, requires less energy for discharge, and uses low frequency (e.g.
Although it has the advantage of being possible even at 5KHz),
Since it is an internal electrode method, it has the disadvantage that the diameter of plastic tubes that can be treated and the length that can be treated are limited.

一方、外部電極方式はエネルギー変換効率が低
く、設備費が高などの欠点はあるが特開昭55−
29505号公報に報告されている。
On the other hand, the external electrode method has drawbacks such as low energy conversion efficiency and high equipment costs;
It is reported in Publication No. 29505.

しかしながら、これらの装置及び方法では追試
の結果、内径4mmのプラスチツク管では30cm、内
径1mmのプラスチツク管では7cmの放電長さしか
得られなかつた。又該公報の明細書によれば、一
般に細管の放電長さを大きくすることはむずかし
く、この方法ではいずれの条件でも放電長さは最
大50〜60cmと記されている。
However, as a result of additional tests using these devices and methods, it was possible to obtain a discharge length of only 30 cm for a plastic tube with an inner diameter of 4 mm, and 7 cm for a plastic tube with an inner diameter of 1 mm. Furthermore, according to the specification of the publication, it is generally difficult to increase the discharge length of a thin tube, and in this method, the maximum discharge length is 50 to 60 cm under any conditions.

一定長さのプラスチツク管の処理時間は、放電
長さに反比例する。例えば放電長さが2倍になれ
ば、処理時間を1/2にすることができる。
The processing time for a given length of plastic tube is inversely proportional to the length of the discharge. For example, if the discharge length is doubled, the processing time can be halved.

[発明の目的] 本願発明は、従来得られなかつた細い径のプラ
スチツク管の内面の放電長を長くし処理時間を短
縮して処理コストダウンを計りながら、均一に安
定した処理をし表面特性、例えば接着性、水濡れ
性、帯電性、可塑剤の移行性及び抗血栓性などを
改良するための簡易なプラズマ処理装置及びその
方法を提供するにある。
[Objective of the Invention] The present invention lengthens the discharge length on the inner surface of a plastic tube with a small diameter, which could not be obtained conventionally, shortens the processing time and reduces processing costs, while achieving uniform and stable processing and improving surface characteristics. For example, it is an object of the present invention to provide a simple plasma treatment apparatus and method for improving adhesion, water wettability, chargeability, plasticizer transferability, antithrombotic property, and the like.

[発明の構成] 本発明は、接地側電極が円筒状であり、該電極
上に絶縁層を有し、この上にプラスチツク管を巻
き付け、該プラスチツク管の両端開口部を真空排
気系及びガス供給系ボツクスに気密接続し、この
接地側電極の外周部にプラスチツク管の真空排気
系側の径が大きく、ガス供給系の径が小さい中空
截頭円錐状の電圧印加側の電極を有するプラズマ
処理装置であり、円筒状の接地側電極及びこれに
巻き付けた被処理プラスチツク管と、その外周部
の中空截頭円錐状の電圧印加電極のうち少なくと
も一方を移動させながら、プラスチツク管に低圧
ガスを流し両電極で電場を形成してプラスチツク
管の内面をプラズマ処理をすることを特徴とする
プラズマ処理装置及びその方法である。
[Structure of the Invention] In the present invention, the ground side electrode is cylindrical, has an insulating layer on the electrode, a plastic tube is wrapped around this, and both end openings of the plastic tube are connected to a vacuum exhaust system and a gas supply system. A plasma processing apparatus that is airtightly connected to a system box, and has a hollow truncated cone-shaped electrode on the voltage application side with a large diameter on the evacuation system side of a plastic tube and a small diameter on the gas supply system on the outer periphery of this ground side electrode. While moving at least one of the cylindrical ground side electrode, the treated plastic tube wrapped around it, and the hollow truncated cone-shaped voltage application electrode on its outer periphery, low-pressure gas is passed through the plastic tube and both sides are moved. A plasma processing apparatus and method characterized in that an electric field is formed with an electrode to perform plasma processing on the inner surface of a plastic tube.

以下図に基いて説明する。 This will be explained below based on the figures.

第1図は本発明の装置によりプラスチツク管内
面をプラズマ処理をする概略を示しているもので
ある。1のプラスチツク管は2の真空排気系ボツ
クスと3のガス供給ボツクスにそれぞれ気密に接
続されており、円筒状の4の接地側電極に5の絶
縁層を介して巻き付けられており、その外周部に
6の中空截頭円錐状電圧印加側電極を配してあ
る。7は電源である。
FIG. 1 schematically shows plasma treatment of the inner surface of a plastic tube using the apparatus of the present invention. The plastic tube 1 is airtightly connected to the vacuum evacuation system box 2 and the gas supply box 3, and is wrapped around the cylindrical ground electrode 4 via the insulating layer 5, and its outer periphery is 6 hollow truncated cone-shaped voltage application side electrodes are arranged on the side. 7 is a power source.

第2図は円筒状の接地側電極及び絶縁層部の詳
細図であり4は導電層よりなる電極、5は薄い絶
縁層であり、8の部分は中空、絶縁物、又は導電
物のいずれでも良く、又円筒状の接地側電極4及
び絶縁層5等を冷却するための装置を内蔵しても
良く、冷却することによつて処理されるプラスチ
ツク管に加わる熱を抑えることも可能である。
Figure 2 is a detailed view of the cylindrical ground side electrode and insulating layer part, 4 is an electrode made of a conductive layer, 5 is a thin insulating layer, and the part 8 is either hollow, insulating material, or conductive material. Alternatively, a device for cooling the cylindrical ground electrode 4, the insulating layer 5, etc. may be incorporated, and by cooling it, it is possible to suppress the heat applied to the plastic tube being processed.

第3図は電圧印加側電極の詳細を示す図であり
6aは真空排気側となり、6bはガス供給側とな
る様にセツトされる、6cはテーパーとなつてい
る。このテーパーは30°以内が好ましく10°位が特
に望ましくこれ以上であれば均一な放電状態が得
られなくなり、均一な処理が困難となる。
FIG. 3 is a diagram showing details of the voltage application side electrode, in which 6a is set to be on the evacuation side, 6b is set to be on the gas supply side, and 6c is tapered. This taper is preferably within 30°, and particularly desirably about 10°; if it is larger than this, a uniform discharge state cannot be obtained and uniform processing becomes difficult.

本装置によるプラスチツク管内面にプラズマ処
理方法について説明する。
A method of plasma treatment on the inner surface of a plastic tube using this apparatus will be explained.

まずプラスチツク管1を接地側電極円筒4及び
5に巻き付けておき、その外周に中空截頭円錐状
電圧印加側電極6を接しさせる。
First, the plastic tube 1 is wound around the ground side electrode cylinders 4 and 5, and the hollow truncated conical voltage application side electrode 6 is brought into contact with the outer periphery of the plastic tube 1.

プラスチツク管1の巻き付け方は疎密、直斜等
あるがいずれも問わない。円筒状態接地側電極と
中空截頭円錐状電圧印加側電極は相対位置が精度
よく設置でき、双方のいずれかが精度よく移動で
きるようになつている。(図示せず)。
The plastic tube 1 may be wound in a loose manner, in a diagonal manner, or in any other manner. The cylindrical ground side electrode and the hollow truncated conical voltage application side electrode can be installed in relative positions with high precision, and either one of them can be moved with high precision. (not shown).

次にプラスチツク管の一端を、中空截頭円錐状
電圧印加側電極の径の大きい側は真空排気系ボツ
クスに、他端はガス供給系ボツクスに接続する。
この状態で通常のプラズマ処理装置と同様の手順
でプラスチツク管内を処理すべきガスを低圧で流
しながら、各電極間に電源7から高周波の電磁波
を発振させる。ガス圧は真空排気系ボツクスで
0.01〜10Torrの範囲、0.1Torr程が望ましい。電
源の周波数は低周波(例えば10KHz以下)では効
果なく、高周波(例えば100KHz以上)が好まし
い。円筒状接地側電極又は中空截頭円錐状電圧印
加側電極のうち少なくともいずれか一方を移動さ
せながらグロー放電処理をする。
Next, one end of the plastic tube, the larger diameter side of the hollow truncated conical voltage application side electrode, is connected to a vacuum evacuation system box, and the other end is connected to a gas supply system box.
In this state, high-frequency electromagnetic waves are oscillated from the power source 7 between each electrode while the gas to be treated is flowing through the plastic tube at low pressure in the same manner as in a normal plasma processing apparatus. Gas pressure is controlled by a vacuum pump box.
The range is 0.01 to 10 Torr, preferably about 0.1 Torr. As for the frequency of the power supply, a low frequency (for example, 10KHz or less) is not effective, and a high frequency (for example, 100KHz or more) is preferable. Glow discharge treatment is performed while moving at least one of the cylindrical ground side electrode and the hollow truncated conical voltage application side electrode.

本発明の装置において絶縁層5は中空截頭円錐
状電圧印加側電極と円筒状接地側電極の間に高電
圧が印加された際スポツト放電を防止する役割を
果している。スポツト放電が発生するとプラスチ
ツク管の該当部分が変形・損傷・炭化等を起こ
し、処理が中断する。
In the device of the present invention, the insulating layer 5 serves to prevent spot discharge when a high voltage is applied between the hollow truncated conical voltage application side electrode and the cylindrical ground side electrode. When a spot discharge occurs, the corresponding part of the plastic tube is deformed, damaged, carbonized, etc., and the process is interrupted.

次に中空截頭円錐状電圧印加側電極のテーパー
であるが、これがグロー放電長さを長くする役割
を果している。本発明者の実験によれば、プラス
チツク管のグロー放電は一般に真空排気側から発
生する。これはプラスチツク管を真空排気すると
コンダクタンスにより圧力差を生じるためであ
る。本装置ではこの圧力差を中空截頭円錐状の電
圧印加側電極で真空排気系側6aとガス供給系側
6bとの径差により相殺しているため、中空截頭
円錐状電圧印加側電極全面にわたりグロー放電を
発生させることができ、放電長さを長くすること
ができる。その他放電長さを長くするためには電
圧印加側電極の巾を大きく方法があるが、巾が大
きくなればなるほど放電に要する電力が多く必要
であり、更に外部電極方式に特有の熱ロスが大き
くなりプラスチツク管への影響があるため、あま
り巾を大きくすることはできない。
Next is the taper of the hollow truncated conical voltage application side electrode, which plays the role of increasing the glow discharge length. According to the inventor's experiments, glow discharge in a plastic tube generally occurs from the evacuation side. This is because when a plastic tube is evacuated, a pressure difference is created due to conductance. In this device, this pressure difference is offset by the diameter difference between the vacuum evacuation system side 6a and the gas supply system side 6b with the hollow truncated conical voltage application side electrode, so the hollow truncated conical voltage application side electrode is A glow discharge can be generated over a long period of time, and the discharge length can be increased. Another way to lengthen the discharge length is to increase the width of the voltage application side electrode, but the larger the width, the more power is required for discharge, and the heat loss that is unique to the external electrode method increases. It is not possible to increase the width too much because it will affect the plastic tube.

電圧印加により発生する熱を抑えるため円筒状
接地側電極の8の部分に冷却装置を内蔵させたり
又中空截頭円錐状電圧印加側電極に冷風を吹きつ
ける頭の対策をとることは有効である。
In order to suppress the heat generated by voltage application, it is effective to incorporate a cooling device into the cylindrical ground side electrode at part 8, or to take measures to blow cold air onto the hollow truncated conical voltage application side electrode. .

[発明の効果] 本発明の装置及び方法によれば細径のプラスチ
ツク管を簡便な装置で放電長さを従来技術より長
くした状態でプラズマ処理を均一に安定して行な
うことができる。
[Effects of the Invention] According to the apparatus and method of the present invention, plasma treatment can be performed uniformly and stably on a small-diameter plastic tube with a simple apparatus and with a discharge length longer than that of the prior art.

又本装置によれば、最初の排気量が細径のプラ
スチツク管の内容積しかなく、少ないので真空ポ
ンプの容量も小さくて済み、排気時間も短かい。
Furthermore, according to this device, the initial volume of evacuation is limited to the internal volume of a small-diameter plastic tube, which is small, so the capacity of the vacuum pump is also small, and the evacuation time is short.

更に長い管を処理する際、円筒状接地側電極に
巻き付けてあるため、プラスチツク管の長さ(l)全
体にわたり電極を移動する必要がなく、概略l/
πD(D:円筒状接地側電極の外径)の移動で良
く、装置を簡便かつコンパクトにすることができ
る。
When processing longer tubes, the cylindrical ground electrode does not require moving the electrode over the entire length (l) of the plastic tube;
It is sufficient to move by πD (D: outer diameter of the cylindrical ground side electrode), and the device can be made simple and compact.

[実施例] 本装置において長さ50cm、外径48mmのポリ塩化
ビニル製パイプに厚さ100μのアルミ箔を巻き一
端を接続端子とした接地側電極としこの上に厚さ
100μのポリエーテルサルホンフイルムを巻き絶
縁層とした。
[Example] In this device, a polyvinyl chloride pipe with a length of 50 cm and an outer diameter of 48 mm is wrapped in aluminum foil with a thickness of 100 μm, and one end is used as a connection terminal, and a ground side electrode is placed on top of this.
A 100μ polyether sulfone film was wound as an insulating layer.

中空截頭円錐状電圧印加側電極として厚さ
100μのアルミ箔より巾12mm、テーパー8°に作製し
た。
Thickness as hollow truncated conical voltage application side electrode
It was made from 100μ aluminum foil with a width of 12mm and a taper of 8°.

高周波電源は、日本電子(株)製高周波発振器
JEH−005D(発振周波数13.56MHz)、及び自動整
合装置AST−08を使用した。
The high frequency power source is a high frequency oscillator manufactured by JEOL Ltd.
JEH-005D (oscillation frequency 13.56MHz) and automatic matching device AST-08 were used.

プラスチツク管は外径1.6mm、内径1.0mm、長さ
10mのニチアス(株)製テフロン樹脂管を両端各々15
cm程残して円筒状接地側電極に巻き付けた。真空
排気、ガス供給系は市販品を使用した。
The plastic tube has an outer diameter of 1.6 mm, an inner diameter of 1.0 mm, and a length
10 m long Teflon resin pipe made by Nichias Co., Ltd., 15 on each end.
It was wrapped around the cylindrical ground side electrode, leaving about a cm. Commercially available products were used for the vacuum exhaust and gas supply systems.

ガスはアルゴン、真空度0.1Torrとし出力を
徐々に上げ、150Wで中空截頭円錐状電圧印加側
電極の帯域全体がグロー放電し、移動させながら
プラズマ処理を行つた。中空截頭円錐状接地側電
極にカバーされたプラスチツク管の長さ、すなわ
ち放電長は97cmであつた。
The gas was argon, the vacuum level was 0.1 Torr, the output was gradually increased, and the entire band of the hollow truncated conical electrode on the voltage application side was glow-discharged at 150 W, and plasma treatment was performed while moving the electrode. The length of the plastic tube covered by the hollow truncated conical ground electrode, that is, the discharge length, was 97 cm.

比較例 1 電圧印加側電極をテーパーのない単なる円筒状
として実施例と同様の処理を行つたところ、電圧
印加側電極のうち、プラスチツク管の真空排気系
側しかグロー放電せず、放電長は30cmしか得られ
なかつた。
Comparative Example 1 When the voltage application side electrode was simply cylindrical without a taper and the same treatment as in the example was performed, glow discharge occurred only on the evacuation system side of the plastic tube among the voltage application side electrodes, and the discharge length was 30 cm. All I could get was that.

比較例 2 円筒状接地側電極において絶縁層としてのポリ
エーテルサルホンフイルムを除いた状態で他は実
施例と同様に処理したところ、スポツト放電を生
じテフロン樹脂管に穴があき処理が不可能となつ
た。
Comparative Example 2 When the cylindrical ground side electrode was treated in the same manner as in Example except that the polyether sulfone film as an insulating layer was removed, spot discharge occurred and holes formed in the Teflon resin tube, making treatment impossible. Summer.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は本発明による装置の概略図である。第
2図は円筒状接地側電極部の正面図、側面図であ
る。第3図は中空截頭円錐状電圧印加側電極の正
面図、側面図である。 図中、1……被処理プラスチツク管、2……真
空排気系ボツクス、3……ガス供給系ボツクス、
4……円筒状接地側電極、5……絶縁層、6……
中空截頭円錐状電圧印加側電極、6a……該電極
の真空排気側径、6b……該電極のガス供給側
径、6c……該電極のテーパー、7……電源、8
……円筒状接地側電極の中空部を示す。
FIG. 1 is a schematic diagram of a device according to the invention. FIG. 2 is a front view and a side view of the cylindrical ground side electrode part. FIG. 3 is a front view and a side view of a hollow truncated conical voltage application side electrode. In the figure, 1... plastic tube to be treated, 2... vacuum evacuation system box, 3... gas supply system box,
4...Cylindrical ground side electrode, 5...Insulating layer, 6...
Hollow truncated conical voltage application side electrode, 6a...Evacuation side diameter of the electrode, 6b...Gas supply side diameter of the electrode, 6c...Taper of the electrode, 7...Power source, 8
...Indicates the hollow part of the cylindrical ground side electrode.

Claims (1)

【特許請求の範囲】 1 接地側電極が円筒状であり、該電極上に絶縁
層を有し、この上にプラスチツク管を巻きつける
構造となつており、この外周部の電圧印加側の電
極は一方の径が他方の径より大きい中空截頭円錐
状の電極よりなり、この一対の電極は各電極に対
し互いに平行に移動することが可能である構造と
なつていることを特徴とするプラズマ処理装置。 2 被処理プラスチツク管を円筒状の接地側電極
に絶縁層を介して巻き付け、該プラスチツク管の
端部を真空排気系ボツクスとガス供給系ボツクス
に接続し、低圧ガスを流しながら、真空排気系ボ
ツクス側の径が大きい中空截頭円錐状の電圧印加
側電極により電場を形成しながら接地側電極又は
印加側電極を平行方向に移動させることによりプ
ラスチツク管の内面を連続的にプラズマ処理をす
る方法。
[Claims] 1. The ground side electrode is cylindrical, has an insulating layer on the electrode, and has a structure in which a plastic tube is wound around the electrode, and the voltage application side electrode on the outer periphery is cylindrical. Plasma processing characterized by comprising hollow truncated conical electrodes, one diameter of which is larger than the other, and the pair of electrodes is structured to be able to move parallel to each other with respect to each electrode. Device. 2. Wrap the plastic tube to be treated around a cylindrical ground electrode via an insulating layer, connect the ends of the plastic tube to a vacuum evacuation system box and a gas supply system box, and while flowing low pressure gas, wrap the plastic tube around the evacuation system box. A method of continuously plasma-treating the inner surface of a plastic tube by moving the grounding side electrode or the applying side electrode in a parallel direction while forming an electric field using a hollow truncated conical voltage applying side electrode with a large side diameter.
JP60037463A 1985-02-28 1985-02-28 Method and apparatus for carrying out plasma treatment Granted JPS61197638A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60037463A JPS61197638A (en) 1985-02-28 1985-02-28 Method and apparatus for carrying out plasma treatment

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60037463A JPS61197638A (en) 1985-02-28 1985-02-28 Method and apparatus for carrying out plasma treatment

Publications (2)

Publication Number Publication Date
JPS61197638A JPS61197638A (en) 1986-09-01
JPH0576759B2 true JPH0576759B2 (en) 1993-10-25

Family

ID=12498216

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60037463A Granted JPS61197638A (en) 1985-02-28 1985-02-28 Method and apparatus for carrying out plasma treatment

Country Status (1)

Country Link
JP (1) JPS61197638A (en)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01296600A (en) * 1988-05-23 1989-11-29 Nissin Electric Co Ltd Plasma generating source
US6780464B2 (en) 1997-08-11 2004-08-24 Torrex Equipment Thermal gradient enhanced CVD deposition at low pressure
US6167837B1 (en) * 1998-01-15 2001-01-02 Torrex Equipment Corp. Apparatus and method for plasma enhanced chemical vapor deposition (PECVD) in a single wafer reactor
US6352594B2 (en) 1997-08-11 2002-03-05 Torrex Method and apparatus for improved chemical vapor deposition processes using tunable temperature controlled gas injectors
US7393561B2 (en) 1997-08-11 2008-07-01 Applied Materials, Inc. Method and apparatus for layer by layer deposition of thin films
US6352593B1 (en) 1997-08-11 2002-03-05 Torrex Equipment Corp. Mini-batch process chamber
JP7001258B2 (en) * 2017-10-25 2022-01-19 泉工業株式会社 Tube surface treatment equipment and plasma treatment equipment

Also Published As

Publication number Publication date
JPS61197638A (en) 1986-09-01

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