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JPH0577986B2 - - Google Patents
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JPH0577986B2 - - Google Patents

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Publication number
JPH0577986B2
JPH0577986B2 JP61240427A JP24042786A JPH0577986B2 JP H0577986 B2 JPH0577986 B2 JP H0577986B2 JP 61240427 A JP61240427 A JP 61240427A JP 24042786 A JP24042786 A JP 24042786A JP H0577986 B2 JPH0577986 B2 JP H0577986B2
Authority
JP
Japan
Prior art keywords
gravity
cantilever
free end
semiconductor
acceleration sensor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP61240427A
Other languages
Japanese (ja)
Other versions
JPS6395360A (en
Inventor
Hirohito Shiotani
Toshitaka Yamada
Masato Imai
Chiaki Mizuno
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Denso Corp
Original Assignee
NipponDenso Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NipponDenso Co Ltd filed Critical NipponDenso Co Ltd
Priority to JP61240427A priority Critical patent/JPS6395360A/en
Publication of JPS6395360A publication Critical patent/JPS6395360A/en
Publication of JPH0577986B2 publication Critical patent/JPH0577986B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G01MEASURING; TESTING
    • G01PMEASURING LINEAR OR ANGULAR SPEED, ACCELERATION, DECELERATION, OR SHOCK; INDICATING PRESENCE, ABSENCE, OR DIRECTION, OF MOVEMENT
    • G01P15/00Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration
    • G01P15/02Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses
    • G01P15/08Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values
    • G01P2015/0805Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration
    • G01P2015/0822Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass
    • G01P2015/0825Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass
    • G01P2015/0828Measuring acceleration; Measuring deceleration; Measuring shock, i.e. sudden change of acceleration by making use of inertia forces using solid seismic masses with conversion into electric or magnetic values being provided with a particular type of spring-mass-system for defining the displacement of a seismic mass due to an external acceleration for defining out-of-plane movement of the mass for one single degree of freedom of movement of the mass the mass being of the paddle type being suspended at one of its longitudinal ends

Landscapes

  • Pressure Sensors (AREA)

Description

【発明の詳細な説明】 〔産業上の利用分野〕 本発明は、半導体式加速度センサの取付け構造
に関する。
DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a mounting structure for a semiconductor acceleration sensor.

〔従来の技術〕[Conventional technology]

従来、振動や加速度を検知するのに一般的に用
いられている構造としては、第4図の斜視図に示
すように半導体基板20に半導体歪ゲージの形成
される薄肉状のダイヤフラム部21を形成し、一
方の厚肉部である支持体22を台座30に接着固
定し、他方の厚肉部を自由端23として、半導体
歪ゲージの抵抗値変化に応じて被測定力を検知す
るカンチレバー型の半導体式加速度センサ等が知
られている。尚、第4図では自由端23の質量を
増して慣性を大きくするために自由端23に負荷
24が接着されている。又、被検出力の方向は矢
印40の方向である。
Conventionally, as a structure generally used to detect vibrations and acceleration, a thin diaphragm part 21 on which a semiconductor strain gauge is formed is formed on a semiconductor substrate 20, as shown in the perspective view of FIG. One thick part of the support body 22 is adhesively fixed to the pedestal 30, and the other thick part is used as a free end 23 to detect the force to be measured according to the change in the resistance value of the semiconductor strain gauge. Semiconductor type acceleration sensors and the like are known. In FIG. 4, a load 24 is bonded to the free end 23 in order to increase the mass of the free end 23 and increase its inertia. Further, the direction of the detected force is the direction of the arrow 40.

〔発明が解決しようとする問題点〕[Problem that the invention seeks to solve]

そして上記のような半導体式加速度センサを第
4図に示すように、その長手方向が重力の加わる
方向(重力方向)、すなわち大地に対する鉛直方
向に平行になるように固定した場合、ダイヤフラ
ム部21を通る長手方向における軸x1と自由端2
3と負荷24との重心から重力の加わる方向に伸
びた軸x2との間には距離lだけのずれがあり、半
導体式加速度センサに大地に対する鉛直方向の振
動が加わるとモーメントが働き、自由端23が矢
印40の方向に変位し、ダイヤフラム部21が曲
がつてしまい、被検出力だけによる真の変位分に
誤差が加わり、その誤差に応じた電気信号がノイ
ズとして検出され、半導体式加速度センサのS
(Signal)/N(Noise)比が悪化してしまう。
As shown in FIG. 4, when the semiconductor acceleration sensor described above is fixed so that its longitudinal direction is parallel to the direction in which gravity is applied (gravitational direction), that is, the vertical direction with respect to the earth, the diaphragm portion 21 Axis in the longitudinal direction passing through x 1 and free end 2
There is a difference of distance l between the center of gravity of load 24 and the axis x2 extending in the direction of gravity, and when vibration in the vertical direction relative to the ground is applied to the semiconductor acceleration sensor, a moment acts and the free The end 23 is displaced in the direction of the arrow 40, the diaphragm portion 21 is bent, an error is added to the true displacement due only to the detected force, and an electrical signal corresponding to the error is detected as noise, resulting in semiconductor acceleration. Sensor S
(Signal)/N (Noise) ratio deteriorates.

そこで本発明は、上記の点に鑑みなされたもの
であつて、半導体式加速度センサに重力方向の振
動が加わつた場合に、その影響を極力低減し、
S/N比の向上を目的としている。
Therefore, the present invention has been made in view of the above points, and when vibration in the direction of gravity is applied to a semiconductor acceleration sensor, the influence of the vibration is reduced as much as possible,
The purpose is to improve the S/N ratio.

〔問題点を解決するための手段〕[Means for solving problems]

上記の目的を達成する為に本発明は、半導体歪
ゲージがそのゲージ配置面に配置された薄肉状の
ダイヤフラム部と、該ダイヤフラム部の一端に形
成された厚肉部である支持部と、該ダイヤフラム
部の他端に形成された厚肉部である自由端とを有
するカンチレバーを備え、前記ダイヤフラム部を
通る前記カンチレバーの長手方向における軸と、
前記自由端における重心から重力が加わる方向に
伸びた軸との間に所定の距離だけずれがあるよう
に形成された半導体式加速度センサであつて、前
記カンチレバーの長手方向が重力方向に対して垂
直な方向であり、且つ、前記ダイヤフラム部のゲ
ージ配置面が重力方向と平行となるように前記支
持部を被検出体に固定し、前記カンチレバーの長
手方向に対して垂直な方向であつて且つ重力方向
に対して垂直な方向における該被検出体の加速度
を検出する事を特徴とする半導体式加速度センサ
を採用している。
In order to achieve the above object, the present invention provides a semiconductor strain gauge that includes a thin-walled diaphragm portion disposed on the gauge placement surface, a thick-walled support portion formed at one end of the diaphragm portion, and a thick-walled support portion formed at one end of the diaphragm portion. a cantilever having a free end that is a thick wall portion formed at the other end of a diaphragm part, and an axis in the longitudinal direction of the cantilever passing through the diaphragm part;
The semiconductor acceleration sensor is formed such that a center of gravity at the free end is offset by a predetermined distance from an axis extending in a direction in which gravity is applied, and the longitudinal direction of the cantilever is perpendicular to the direction of gravity. The support part is fixed to the object to be detected so that the gauge arrangement surface of the diaphragm part is parallel to the direction of gravity, and the direction is perpendicular to the longitudinal direction of the cantilever and the direction of gravity is parallel to the direction of gravity. A semiconductor type acceleration sensor is used, which is characterized by detecting the acceleration of the object to be detected in a direction perpendicular to the direction.

〔実施例〕〔Example〕

以下、本発明を図面に示す実施例を用いて説明
する。
Hereinafter, the present invention will be explained using embodiments shown in the drawings.

第1図は本発明の一実施例であり、同図aにそ
の上面図、同図bに同図aにおけるB−B線断面
図を示す。図において、100は厚膜印刷基板で
あり、後述する電気素子200、カンチレバー4
aと台座6とから成るセンサエレメント等をその
基板上に設置し、それらを電気的に配線してい
る。600はセラミツクキヤツプであり、接着剤
等により厚膜印刷基板100に気密性良く接着さ
れ、そのセラミツクキヤツプ600内には厚膜印
刷基板100上に設置したセンサエレメント、端
子500、端子500とカンチレバー4aの後述
するパツド部11b2との電気接続をするために
ワイヤボンデイングされるワイヤ線300、ダン
ピング液400を備えている。ダンピング液40
0はシリコンオイル等から成り、粘性抵抗力によ
る減衰作用を利用して機械的なハイカツトフイル
タとして用いている。ここで、温度変化によるダ
ンピング液400の膨張・収縮を吸収するために
セラミツクキヤツプ600内には空気900を同
封してあり、又、ダンピング液400の波立ちに
よる悪影響を低減するためにセラミツクキヤツプ
600には隔壁601が設けられている。
FIG. 1 shows an embodiment of the present invention, and FIG. 1A shows a top view thereof, and FIG. 1B shows a cross-sectional view taken along the line B--B in FIG. In the figure, 100 is a thick film printed substrate, an electric element 200, which will be described later, and a cantilever 4.
A sensor element consisting of a and a pedestal 6 is installed on the substrate, and these are electrically wired. A ceramic cap 600 is airtightly adhered to the thick film printed circuit board 100 with an adhesive or the like, and inside the ceramic cap 600 are a sensor element, a terminal 500, a terminal 500 and a cantilever 4a installed on the thick film printed circuit board 100. A damping liquid 400 and a wire wire 300 to be wire-bonded are provided for electrical connection with a pad portion 11b2 which will be described later. Damping liquid 40
0 is made of silicone oil or the like, and is used as a mechanical high-cut filter by utilizing the damping effect of viscous resistance. Here, air 900 is enclosed in the ceramic cap 600 in order to absorb expansion and contraction of the damping liquid 400 due to temperature changes. A partition wall 601 is provided.

次に、カンチレバー4a及び台座6により成る
センサエレメントについて、第2図aに示すその
上面図、及び第2図bに示す同図aにおけるA−
A線断面図を用いて説明する。図において、4a
は例えばN型シリコン単結晶基板から成るカンチ
レバーであり、薄肉状のダイヤフラム部7、自由
端1、自由端1を保護する為に自由端1の周りに
配置するガード部4a1、支持体8とから成る。
尚、自由端1とガード部4a1との間隙4a2を
形成する為のスクライブはカンチレバー4aを両
面エツチングする事により行われ、例えば、カン
チレバー4aのスクライブする箇所の表面(第2
図bにおける上面)を予め溝堀りエツチングして
おき、その後のダイヤフラム部7の形成時に裏面
よりエツチングを行なう事でダイヤフラム部7の
形成とスクライブとを同時に行なう。
Next, regarding the sensor element consisting of the cantilever 4a and the pedestal 6, the top view shown in FIG. 2a and the A--A in FIG.
This will be explained using an A-line sectional view. In the figure, 4a
is a cantilever made of, for example, an N-type silicon single crystal substrate, and includes a thin diaphragm portion 7, a free end 1, a guard portion 4a1 arranged around the free end 1 to protect the free end 1, and a support member 8. Become.
Incidentally, the scribing for forming the gap 4a2 between the free end 1 and the guard portion 4a1 is performed by etching both sides of the cantilever 4a.
The formation of the diaphragm part 7 and the scribing are performed simultaneously by trenching and etching the upper surface (in FIG.

支持体8及びガード部4a1の所定領域の表面
にはNi層等をめつき又は蒸着した下地層3bが
形成されており、同じく下地層3bの形成されて
いる台座6と半田層5bを介して接着している。
尚、台座6にはカンチレバー4aが被測定加速度
に応じて変位できるように、又、過度の変位によ
つて破損しないようにカンチレバー4aと相対す
る面に所定の深さの凹部6aが形成されており、
又、その凹部6aはダンピング液400がセンサ
エレメントを自由に出入りする事ができるように
一方の端面から他方の端面にわたつて形成されて
いる。
A base layer 3b in which a Ni layer or the like is plated or vapor-deposited is formed on the surface of a predetermined region of the support 8 and the guard portion 4a1, and the base layer 3b is formed on the base 6 on which the base layer 3b is also formed, via the solder layer 5b. It's glued.
Incidentally, a recess 6a of a predetermined depth is formed on the surface of the pedestal 6 facing the cantilever 4a so that the cantilever 4a can be displaced in accordance with the acceleration to be measured and to prevent damage due to excessive displacement. Ori,
Further, the recess 6a is formed from one end surface to the other end surface so that the damping liquid 400 can freely enter and exit the sensor element.

自由端1の一主面(接着面)2には複数箇所
(図では7箇所)に下地層3aが形成されており、
その下地層3aを介して負荷としての半田層5a
を接着している。ここで、本例のように半田層5
aを複数箇所に形成する事により半田の垂れ、片
寄りは抑制される。尚、下地層3a及び半田層5
aは、支持体8又はガード部4a1の表面上に形
成される下地層3b及び半田層5bとそれぞれ同
時に同じ工程で形成可能である。
A base layer 3a is formed at multiple locations (seven locations in the figure) on one main surface (adhesive surface) 2 of the free end 1.
The solder layer 5a as a load is passed through the base layer 3a.
is glued. Here, as in this example, the solder layer 5
By forming a at multiple locations, solder dripping and misalignment can be suppressed. In addition, the base layer 3a and the solder layer 5
a can be formed at the same time and in the same process as the base layer 3b and solder layer 5b formed on the surface of the support 8 or the guard portion 4a1.

ダイヤフラム部7内あるいはダイヤフラム部7
上(図は前者)には公知の半導体加工技術、例え
ばボロン等のP型不純物を熱拡散又はイオン注入
する事によりダイヤフラム部7内に導入し、形成
した4個の半導体歪ゲージ9が存在しており、P
型不純物を高濃度で導入して形成した配線層11
a、及びAl蒸着膜等から成る配線部材11bに
より各々の半導体歪ゲージ9は互いに電気的接続
されておりフルブリツジを構成している。尚、配
線層11aは万一ダイヤフラム部7が破損した場
合に半導体式加速度センサの出力として異常信号
を出せるように自由端1にまで延在して形成され
ており、又、図中10はシリコン酸化膜等の保護
膜、11b1は配線層11aと配線部材11bと
のコンタクト部、11b2はパツド部である。
Inside the diaphragm part 7 or the diaphragm part 7
At the top (the former shown in the figure), there are four semiconductor strain gauges 9 formed by introducing a P-type impurity such as boron into the diaphragm part 7 by thermal diffusion or ion implantation using a known semiconductor processing technique. and P
Wiring layer 11 formed by introducing type impurities at high concentration
The semiconductor strain gauges 9 are electrically connected to each other by a wiring member 11b made of an Al vapor deposited film or the like, thereby forming a full bridge. The wiring layer 11a is formed to extend to the free end 1 so that an abnormal signal can be output as an output of the semiconductor acceleration sensor in the event that the diaphragm part 7 is damaged. A protective film such as an oxide film, 11b1 is a contact portion between the wiring layer 11a and the wiring member 11b, and 11b2 is a pad portion.

そして、上記のセンサエレメントは、自由端1
に加速度を加えるとダイヤフラム部7に歪を生
じ、加速度の大きさに応じて半導体歪ゲージ9の
抵抗値が変化し、ブリツジ回路に予め電圧を印加
しておくことによりブリツジ出力として不平衡電
圧を生じ、その電圧値に応じて被検出加速度を検
知するものであり、半田等により厚膜印刷基板1
00に台座6をその長手方向が第1図中矢印方向
に直交するように接着する事によつて固定してい
る。
And the above sensor element has a free end 1
When acceleration is applied to the diaphragm section 7, the resistance value of the semiconductor strain gauge 9 changes depending on the magnitude of the acceleration. By applying a voltage to the bridge circuit in advance, an unbalanced voltage is generated as the bridge output. The acceleration to be detected is detected according to the voltage value, and the thick film printed circuit board 1 is
00 by gluing the pedestal 6 so that its longitudinal direction is perpendicular to the direction of the arrow in FIG.

第1図において、200は電気素子であり、セ
ンサエレメントからの電気信号を増幅する高利得
増幅回路を構成しており、端子500、厚膜印刷
基板100上のパツド部101と電気的に接続し
ている。800は金属製のケースであり、センサ
エレメント、高利得増幅回路等をEMI(電磁障
害)等から保護している。又、ケース800には
貫通孔が開けられており、その貫通孔にリード端
子700がガラス等を介してケース800との電
気的絶縁を保ちつつ気密性良く存在している。
又、リード端子700とパツド部101とはワイ
ヤ線300により電気的接続されており、ケース
800外部との電気的接続をこのリード端子70
0により行つている。そして、第1図中矢印方向
を上方向、すなわち大地に対する鉛直方向として
例えば自動車等における装置に組み付け、第1図
において紙面に垂直な方向の加速度を検出する。
In FIG. 1, 200 is an electric element, which constitutes a high gain amplification circuit that amplifies the electric signal from the sensor element, and is electrically connected to the terminal 500 and the pad portion 101 on the thick film printed circuit board 100. ing. 800 is a metal case that protects the sensor element, high gain amplifier circuit, etc. from EMI (electromagnetic interference). Further, a through hole is formed in the case 800, and the lead terminal 700 exists in the through hole with good airtightness while maintaining electrical insulation from the case 800 via glass or the like.
Further, the lead terminal 700 and the pad portion 101 are electrically connected by a wire line 300, and the electrical connection with the outside of the case 800 is made through the lead terminal 70.
It is done by 0. Then, it is assembled into a device such as an automobile, with the arrow direction in FIG. 1 pointing upward, that is, perpendicular to the ground, and the acceleration in the direction perpendicular to the plane of the paper in FIG. 1 is detected.

そこで上記実施例によると、第3図の第1図に
おけるカンチレバー4aの要部拡大斜視図に示す
ように、大地に対する水平方向yにカンチレバー
4aの長手方向が等しくなつており、又、大地に
対する鉛直方向xにカンチレバー4aの幅方向が
等しくなるように配置している。尚、本発明の言
う長手方向とは支持体8からダイヤフラム部7、
自由端1に向かう方向、あるいはその逆方向の事
であり、幅方向とはカンチレバー4aをその長手
方向に垂直な平面で切つた場合に、その断面四辺
形の長辺の向く方向である。つまり、カンチレバ
ー4aの長手方向が水平方向yとされ、そのダイ
ヤフラム部7の半導体歪ゲージ9の形成面が鉛直
方向xと平行な面とされている。又、本発明の言
う水平方向、鉛直方向は大地を基準として考えて
いる。
Therefore, according to the above embodiment, as shown in the enlarged perspective view of the main part of the cantilever 4a in FIG. 1 of FIG. 3, the longitudinal direction of the cantilever 4a is equal to the horizontal direction y with respect to the earth, and The cantilevers 4a are arranged so that the width direction of the cantilevers 4a is equal to the direction x. Note that the longitudinal direction in the present invention refers to the direction from the support body 8 to the diaphragm portion 7,
This refers to the direction toward the free end 1 or the opposite direction, and the width direction is the direction in which the long sides of the quadrilateral cross section face when the cantilever 4a is cut along a plane perpendicular to its longitudinal direction. In other words, the longitudinal direction of the cantilever 4a is the horizontal direction y, and the surface of the diaphragm portion 7 on which the semiconductor strain gauge 9 is formed is parallel to the vertical direction x. Further, the horizontal direction and vertical direction referred to in the present invention are considered with the earth as a reference.

そして、上記のようにカンチレバー4aが配置
する事により、例えば自動車が凸凹道を通り、カ
ンチレバー4aが大地に対する鉛直方向xに振動
を受けた場合、ダイヤフラム部7を通る長手方向
における軸y1と、自由端1と負荷としての半田層
5aとの重心から重力の加わる方向に伸びた軸x3
とはある間隔をもつて垂直な関係となつている。
その為、鉛直方向xの振動によつてダイヤフラム
部7の受ける応力は自由端1のT方向のねじれに
よる力となる。ここで、同じ力を加えた場合、曲
げとねじれではねじれの方が図中Z方向(被検出
加速度の加わる方向)における変位が当然小さく
なるので、従来と比較して本実施例は大地に対す
る鉛直方向xに振動を受けたとしても、その影響
は低減される事がわかる。
By arranging the cantilever 4a as described above, for example, when a car passes through a bumpy road and the cantilever 4a receives vibration in the direction x perpendicular to the ground, the axis y1 in the longitudinal direction passing through the diaphragm part 7, An axis x 3 extending in the direction of gravity from the center of gravity between the free end 1 and the solder layer 5a as a load
and have a perpendicular relationship with a certain interval.
Therefore, the stress that the diaphragm portion 7 receives due to the vibration in the vertical direction x becomes a force due to the twisting of the free end 1 in the T direction. Here, when the same force is applied, the displacement in the Z direction in the figure (the direction in which the detected acceleration is applied) is naturally smaller in bending and twisting than in bending. It can be seen that even if vibration is received in the direction x, its influence is reduced.

又、本実施例によると同一の厚膜印刷基板10
0上にセンサエレメント及び高利得増幅回路が設
置されており、従来では各々の基板あるいはケー
スに設置し、その両者の接続をプリント板等によ
つて行つていたのに対し、そのプリント板を不用
にし、小型の半導体式加速度センサを提供でき
る。
Also, according to this embodiment, the same thick film printed substrate 10
The sensor element and high gain amplifier circuit are installed on the 0. Conventionally, they were installed on each board or case, and the connection between the two was made using a printed board. This eliminates the need for a compact semiconductor acceleration sensor.

次に、第5図を用いて本発明者らの実験結果を
示す。第5図aの斜視図に半導体式加速度センサ
を台座30に取り付けた状態を示す。尚、半導体
式加速度センサとしては第4図に示す従来のもの
と同様のものであり、その取り付け角度を台座3
0の一主面31に対する鉛直方向x4を0゜として、
その軸からの半導体式加速度センサのずれ角度を
θ゜とし、その時に鉛直方向x4に1Gの加速度を加
えた際の半導体式加速度センサの出力の大きさを
検出した。ただし、θ゜=0゜で図中矢印方向41
(被測定加速度の方向に相応する)に1Gの加速度
を加えたときの出力の大きさを100%としている。
第5図bがその結果を示すグラフであり、従来
(θ゜=0゜)では約18%(0.18G)の出力(この値は
ノイズに相応する)がでてしまうのに対し、本発
明(θ゜=90゜,270゜)では約3%(0.03G)だけの
出力がでる事になり、S/N比が6倍向上した事
を示している。
Next, the experimental results of the present inventors will be shown using FIG. The perspective view of FIG. 5a shows the state in which the semiconductor acceleration sensor is attached to the pedestal 30. The semiconductor acceleration sensor is similar to the conventional one shown in Figure 4, and its mounting angle is
Assuming that the vertical direction x 4 with respect to one principal surface 31 of 0 is 0°,
The deviation angle of the semiconductor acceleration sensor from the axis was set as θ°, and the magnitude of the output of the semiconductor acceleration sensor was detected when an acceleration of 1G was applied in the vertical direction x 4 at that time. However, when θ゜=0゜, the arrow direction 41 in the figure
The magnitude of the output when 1G of acceleration is added to (corresponding to the direction of the measured acceleration) is taken as 100%.
Figure 5b is a graph showing the results.While the conventional method (θ゜=0゜) produces an output of approximately 18% (0.18G) (this value corresponds to noise), the present invention (θ° = 90°, 270°), the output is only about 3% (0.03G), indicating that the S/N ratio has improved six times.

尚、本発明は上記実施例に限定される事なく、
その主旨を逸脱しない限り種々変形可能であり、
例えば、第1図における実施例では自由端1に負
荷としての半田層5aが接着しているが、半田以
外の他の負荷を接着してもよい。
Note that the present invention is not limited to the above embodiments,
Various modifications are possible as long as they do not deviate from the main idea.
For example, in the embodiment shown in FIG. 1, a solder layer 5a as a load is bonded to the free end 1, but a load other than solder may be bonded.

〔発明の効果〕〔Effect of the invention〕

以上述べたように本発明によると、半導体式加
速度センサの長手方向が大地に対して水平方向
(重力方向に対して垂直な方向)であり、且つ、
その幅方向が鉛直方向(重力方向)となるように
支持体を固定しているので、大地に対して鉛直方
向(重力方向)の振動が加わつた場合に、自由端
はねじりによつて変位するだけであるので、その
影響を低減できるという効果がある。
As described above, according to the present invention, the longitudinal direction of the semiconductor acceleration sensor is horizontal to the earth (direction perpendicular to the direction of gravity), and
Since the support is fixed so that its width direction is vertical (direction of gravity), the free end will be torsionally displaced when vibration is applied to the ground in the vertical direction (direction of gravity). Therefore, there is an effect that the influence can be reduced.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図aは本発明の一実施例の上面図、第1図
bは同図aにおけるB−B線断面図、第2図aは
第1図におけるセンサエレメントの上面図、第2
図bは同図aにおけるA−A線断面図、第3図は
第1図におけるカンチレバーの要部拡大斜視図、
第4図は従来技術の半導体式加速度センサの斜視
図、第5図aは本発明者らが行つた実験を説明す
るための半導体式加速度センサの斜視図、第5図
bは実験結果を示すグラフである。 1…自由端、4a…カンチレバー、5a…半田
層、6…台座、7…ダイヤフラム部、8…支持
体、9…半導体歪ゲージ。
FIG. 1a is a top view of an embodiment of the present invention, FIG. 1b is a sectional view taken along line B-B in FIG.
Figure b is a sectional view taken along the line A-A in Figure a, Figure 3 is an enlarged perspective view of the main part of the cantilever in Figure 1,
Fig. 4 is a perspective view of a conventional semiconductor acceleration sensor, Fig. 5a is a perspective view of a semiconductor acceleration sensor for explaining the experiment conducted by the present inventors, and Fig. 5b shows the experimental results. It is a graph. DESCRIPTION OF SYMBOLS 1... Free end, 4a... Cantilever, 5a... Solder layer, 6... Pedestal, 7... Diaphragm part, 8... Support body, 9... Semiconductor strain gauge.

Claims (1)

【特許請求の範囲】 1 半導体歪ゲージがそのゲージ配置面に配置さ
れた薄肉状のダイヤフラム部と、該ダイヤフラム
部の一端に形成された厚肉部である支持部と、該
ダイヤフラム部の他端に形成された厚肉部である
自由端とを有するカンチレバーを備え、前記ダイ
ヤフラム部を通る前記カンチレバーの長手方向に
おける軸と、前記自由端における重心から重力が
加わる方向に伸びた軸との間に所定の距離だけず
れがあるように形成された半導体式加速度センサ
であつて、前記カンチレバーの長手方向が重力方
向に対して垂直な方向であり、且つ、前記ダイヤ
フラム部のゲージ配置面が重力方向と平行となる
ように前記支持部を被検出体に固定し、前記カン
チレバーの長手方向に対して垂直な方向であつて
且つ重力方向に対して垂直な方向における該被検
出体の加速度を検出する事を特徴とする半導体式
加速度センサ。 2 上記自由端は、負荷を接着したものである特
許請求の範囲第1項記載の半導体式加速度セン
サ。
[Scope of Claims] 1. A thin diaphragm portion on which a semiconductor strain gauge is disposed on the gauge placement surface, a support portion which is a thick portion formed at one end of the diaphragm portion, and the other end of the diaphragm portion. between an axis in the longitudinal direction of the cantilever passing through the diaphragm part and an axis extending in the direction in which gravity is applied from the center of gravity at the free end; The semiconductor acceleration sensor is formed to be deviated by a predetermined distance, and the longitudinal direction of the cantilever is perpendicular to the direction of gravity, and the gauge arrangement surface of the diaphragm portion is aligned with the direction of gravity. fixing the support part to the object to be detected so as to be parallel to the object, and detecting the acceleration of the object in a direction perpendicular to the longitudinal direction of the cantilever and perpendicular to the direction of gravity; A semiconductor acceleration sensor featuring: 2. The semiconductor acceleration sensor according to claim 1, wherein the free end has a load bonded to it.
JP61240427A 1986-10-09 1986-10-09 Semiconductor type acceleration sensor Granted JPS6395360A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP61240427A JPS6395360A (en) 1986-10-09 1986-10-09 Semiconductor type acceleration sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP61240427A JPS6395360A (en) 1986-10-09 1986-10-09 Semiconductor type acceleration sensor

Publications (2)

Publication Number Publication Date
JPS6395360A JPS6395360A (en) 1988-04-26
JPH0577986B2 true JPH0577986B2 (en) 1993-10-27

Family

ID=17059321

Family Applications (1)

Application Number Title Priority Date Filing Date
JP61240427A Granted JPS6395360A (en) 1986-10-09 1986-10-09 Semiconductor type acceleration sensor

Country Status (1)

Country Link
JP (1) JPS6395360A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3489273B2 (en) * 1995-06-27 2004-01-19 株式会社デンソー Manufacturing method of semiconductor dynamic quantity sensor

Also Published As

Publication number Publication date
JPS6395360A (en) 1988-04-26

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