JPH0578366B2 - - Google Patents
Info
- Publication number
- JPH0578366B2 JPH0578366B2 JP60266349A JP26634985A JPH0578366B2 JP H0578366 B2 JPH0578366 B2 JP H0578366B2 JP 60266349 A JP60266349 A JP 60266349A JP 26634985 A JP26634985 A JP 26634985A JP H0578366 B2 JPH0578366 B2 JP H0578366B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- purification
- line
- valve
- regeneration
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 238000000746 purification Methods 0.000 claims description 57
- 230000008929 regeneration Effects 0.000 claims description 34
- 238000011069 regeneration method Methods 0.000 claims description 34
- 239000007789 gas Substances 0.000 description 81
- 239000000047 product Substances 0.000 description 14
- 238000010926 purge Methods 0.000 description 10
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 9
- 229910001873 dinitrogen Inorganic materials 0.000 description 9
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 6
- 238000001179 sorption measurement Methods 0.000 description 5
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 4
- 239000001301 oxygen Substances 0.000 description 4
- 229910052760 oxygen Inorganic materials 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- 229910002092 carbon dioxide Inorganic materials 0.000 description 3
- 239000001569 carbon dioxide Substances 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 230000001172 regenerating effect Effects 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 230000006866 deterioration Effects 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 229930195733 hydrocarbon Natural products 0.000 description 2
- 150000002430 hydrocarbons Chemical class 0.000 description 2
- 238000000034 method Methods 0.000 description 2
- 239000012264 purified product Substances 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- VUZPPFZMUPKLLV-UHFFFAOYSA-N methane;hydrate Chemical compound C.O VUZPPFZMUPKLLV-UHFFFAOYSA-N 0.000 description 1
- -1 moisture Substances 0.000 description 1
- 239000002808 molecular sieve Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
- Y02C20/00—Capture or disposal of greenhouse gases
- Y02C20/40—Capture or disposal of greenhouse gases of CO2
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P20/00—Technologies relating to chemical industry
- Y02P20/151—Reduction of greenhouse gas [GHG] emissions, e.g. CO2
Landscapes
- Separation Of Gases By Adsorption (AREA)
Description
【発明の詳細な説明】
［産業上の利用分野］
本発明は窒素ガス等の製品ガスを純化するため
の純化装置に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial Field of Application] The present invention relates to a purification device for purifying a product gas such as nitrogen gas.
［従来の技術］
集積回路の製造工程では、純化装置を通して酸
素、メタンガス、水分、二酸化炭素等の不純物を
充分に除去した高純度の窒素ガスが多量に使用さ
れる。この純化装置は、脱酸筒、吸着筒等を含む
二組の純化ラインを並列に設けてなり、一方の純
化ラインで製品ガスの純化を行なうと同時に、他
方の純化ラインは再生ガスによる再生を行なうこ
とができるようになつている。[Prior Art] In the manufacturing process of integrated circuits, a large amount of high-purity nitrogen gas is used, which has been passed through a purification device to sufficiently remove impurities such as oxygen, methane gas, moisture, and carbon dioxide. This purification device has two sets of purification lines, including a deoxidation cylinder, an adsorption cylinder, etc., installed in parallel.One purification line purifies the product gas, while the other purification line performs regeneration using regeneration gas. I am now able to do it.
最近LSI技術の革新によりさらに純度の高いい
わゆる超高純度ガスが要求されるようになつた
が、従来の純化装置では純化ラインの再生に使用
される再生ガス例えば水素ガスが配管中に残留し
て製品ガスの純度を下げることが多く、所望の超
高純度ガスを得ることができなかつた。 Recently, due to innovations in LSI technology, there has been a demand for even higher purity gases, so-called ultra-high purity gases, but with conventional purification equipment, the regeneration gas used to regenerate the purification line, such as hydrogen gas, remains in the piping. The purity of the product gas was often lowered, making it impossible to obtain the desired ultra-high purity gas.
［発明が解決しようとする問題点］
この発明は、上記従来の純化装置における再生
ガス残留による純度低下の問題点を解決すること
を目的としている。[Problems to be Solved by the Invention] The present invention aims to solve the above-mentioned problem of purity deterioration due to residual regeneration gas in the conventional purification apparatus.
［問題点を解決するための手段］
上記問題点を解決するため、本発明は次のよう
な構成を採用した。[Means for Solving the Problems] In order to solve the above problems, the present invention employs the following configuration.
すなわち、本発明にかかるガス純化装置は、二
組の純化ラインを並列に設け、いずれか一方の純
化ラインに製品ガスを流すことにより該製品ガス
の純化を行なうとともに、他方の純化ラインは再
生ガスを流通させて再生を行なうことができるよ
うにしたガス純化装置において、前記二組の純化
ラインの製品ガス出口側に再生ガス導入用の再生
ガス供給ラインを接続し、該ラインには再生ガス
をいずれか一方の純化ラインに選択的に供給する
ためのバルブを設けるとともに、該バルブよりも
再生ガス供給源側の部分に、稼働中の純化ライン
によつて純化された製品ガスの一部を再生中の純
化ラインに導入することのできる自己ガス供給ラ
インを接続したことを特徴としている。 That is, the gas purification apparatus according to the present invention has two sets of purification lines arranged in parallel, and purifies the product gas by flowing the product gas through one of the purification lines, while the other purification line is used to purify the product gas. In the gas purification apparatus, a regeneration gas supply line for introducing regeneration gas is connected to the product gas outlet side of the two sets of purification lines, and the regeneration gas is supplied to the line. A valve is provided to selectively supply one of the purification lines, and a part of the product gas purified by the purification line in operation is regenerated to the part closer to the regeneration gas supply source than the valve. It is characterized by a self-gas supply line that can be introduced into the purification line inside.
［作用］
再生すべき純化ラインに先ず再生ガスを通し、
しかる後再生ガスを止めて、稼働中の純化ライン
によつて純化された製品ガスの一部すなわち自己
ガスを流通させる。これによつて休止中の純化ラ
インの再生が行なわれ、該ラインの内部が純度の
高い製品ガスで置換される。この純化装置では、
再生ガスを純化ラインに選択的に導入するための
バルブよりも再生ガス供給源側の部分に自己ガス
導入用の配管が接続されているので、該バルブ内
等の再生ガスが残留せず、したがつて、再生され
たラインで製品ガスの純化を行なうときに、残留
ガスによる純度低下の問題が生じない。[Operation] First, the regeneration gas is passed through the purification line to be regenerated,
Thereafter, the regeneration gas is stopped, and a part of the product gas purified by the purification line in operation, that is, the own gas, is allowed to flow. This regenerates the idle purification line and replaces the interior of the line with highly purified product gas. In this purification device,
Since the pipe for self-gas introduction is connected to the part closer to the regeneration gas supply source than the valve for selectively introducing the regeneration gas into the purification line, the regeneration gas does not remain in the valve, etc. Therefore, when product gas is purified using the regenerated line, there is no problem of deterioration in purity due to residual gas.
［実施例］
第１図は、本発明の１実施例をあらわす配管系
統図であつて、このガス純装置１は、原料である
窒素ガスの入口のバルブ２、圧力計３、予熱器
４、反応筒５、クーラー６、バルブ７、フイルタ
８、マスフロメータ９、バルブ１０、放出バルブ
１１およびバルブ１２，１３を有するバイパス１
４をそなえた共通流路Ａと、二組の純化ライン
Ｂ，Ｃ、出口側配管Ｄ、および再生ガス供給ライ
ンＥからなる。[Embodiment] FIG. 1 is a piping system diagram showing one embodiment of the present invention, and this gas purification device 1 includes a valve 2 at the inlet of nitrogen gas, which is a raw material, a pressure gauge 3, a preheater 4, Bypass 1 with reaction tube 5, cooler 6, valve 7, filter 8, mass flow meter 9, valve 10, discharge valve 11 and valves 12, 13
4, two sets of purification lines B and C, an outlet pipe D, and a regeneration gas supply line E.
純化ラインＢ，Ｃの入口と出口には、流路切換
え用のバルブ１７，１８，１９，２０が設けら
れ、入口側のバルブ１７，１８の直後にはバルブ
２２，２３をそなえた放出路Ｆが接続されてい
る。放出路Ｆはバルブ２２，２３のうちのいずれ
かを通つて純化ラインから送り出された再生ガス
または自己ガスを、逆止弁２５、パージメータ２
６を通して外部へ放出するようになつている。 Valves 17, 18, 19, 20 for switching the flow paths are provided at the inlets and outlets of the purification lines B and C, and a discharge path F with valves 22, 23 is provided immediately after the valves 17, 18 on the inlet side. is connected. The discharge path F receives regeneration gas or self-gas sent out from the purification line through either of the valves 22 and 23, and passes through the check valve 25 and the purge meter 2.
6 to the outside.
同一構成になる二組の純化ラインＢ，Ｃは、脱
酸筒３０，３１、チラー３２，３３、吸着筒３
４，３５、バルブ３６，３７、フイルタ３８，３
９および放出バルブ４０，４１をそなえ、並列に
配置されている。そして、出口側のバルブ１９，
２０は１本の取出し管４３に接続され、そこから
圧力センサ４５、バルブ４６を経て外部に接続さ
れている。再生ガス供給ラインＥは、ダイヤフラ
ム弁５０，５１、電動弁５２および二つの分岐路
Ｍ，Ｎにそれぞれ設けられた供給路切換え用のバ
ルブ５４，５５をそなえ、前記分岐路Ｍ，Ｎはそ
れぞれ純化ラインＢ，Ｃの出口バルブ１９，２０
よりも内側の位置に接続されている。また、再生
ガス供給ラインＥの前記電動弁５２と分岐路Ｍ，
Ｎの間の部分には、電動バルブ６０、ダイヤフラ
ム弁６１および逆止弁６２をそなえた自己ガス流
路Ｇが接続されている。図中、ｈはヒータであ
る。 Two sets of purification lines B and C having the same configuration include deoxidizing cylinders 30 and 31, chillers 32 and 33, and adsorption cylinder 3.
4, 35, valves 36, 37, filters 38, 3
9 and discharge valves 40, 41, which are arranged in parallel. And the valve 19 on the outlet side,
20 is connected to one take-out pipe 43, which is connected to the outside via a pressure sensor 45 and a valve 46. The regeneration gas supply line E includes diaphragm valves 50, 51, an electric valve 52, and valves 54, 55 for switching supply paths provided in two branch paths M, N, respectively, and the branch paths M, N are purified, respectively. Outlet valves 19, 20 for lines B and C
It is connected in a more medial position. Further, the electric valve 52 of the regeneration gas supply line E and the branch path M,
A self-gas flow path G equipped with an electric valve 60, a diaphragm valve 61, and a check valve 62 is connected to the portion between N. In the figure, h is a heater.
このガス純化装置の使用に際しては、入口側か
らバルブ２を通して供給された原料ガスすなわ
ち、純化前の製品ガス（窒素ガスN2）が、予熱
器４によつて予熱され、反応筒５に送られる。反
応筒５内に触媒が収容されており、窒素ガス中の
炭化水素（殆んどメタンガス）と酸素が次の反応
によつて二酸化炭素と水に変えられる。 When using this gas purification device, the raw material gas, that is, the product gas (nitrogen gas N 2 ) before purification, supplied from the inlet side through the valve 2 is preheated by the preheater 4 and sent to the reaction column 5. . A catalyst is housed in the reaction column 5, and hydrocarbons (mostly methane gas) and oxygen in the nitrogen gas are converted into carbon dioxide and water through the following reaction.
CH4＋2O2→CO2＋2H2O
反応筒５を出たガスはクーラー６によつて冷却
され、二つの純化ラインＢ，Ｃのうちのいずれか
一方に供給される。例えば、純化ラインＢを稼働
させるときはバルブ１７と１９が開かれ、バルブ
１８と２０が閉じられる。 CH 4 +2O 2 →CO 2 +2H 2 O The gas exiting the reaction column 5 is cooled by a cooler 6 and supplied to either one of the two purification lines B and C. For example, when operating purification line B, valves 17 and 19 are opened and valves 18 and 20 are closed.
純化ラインＢまたはＣに供給されたガス中の酸
素は、ニツケルを内蔵する脱酸筒３０，３１内に
次式によつてガス中から除去される。 Oxygen in the gas supplied to the purification line B or C is removed from the gas in the deoxidizing cylinders 30 and 31 containing nickel according to the following formula.
Ni＋O2→NiO2
脱酸されたガスはチラー３２，３３によつて０
〜５℃まで冷却され、モレキユラーシーブ等の吸
着剤と内蔵する吸着筒３４，３５内で水分と二酸
化炭素の除去が行なわれる。このようにして純化
されたガスは出口側配管Ｄを通つて取り出され、
純化ガス（Ｐ−N2）として送り出される。 Ni+O 2 →NiO 2 The deoxidized gas is brought to zero by chillers 32 and 33.
It is cooled to ~5°C, and moisture and carbon dioxide are removed in adsorption cylinders 34 and 35 containing an adsorbent such as a molecular sieve. The gas purified in this way is taken out through the outlet pipe D,
It is sent out as purified gas (P- N2 ).
このガス純化装置を使用して窒素ガスの純化を
行なえば、例えばO2、CO2、H2、ハイドロカー
ボンの含有量がいずれも0.005PPM以下で、露点
が−90℃以下の超高純度ガスを得ることも可能で
ある。 If you use this gas purification device to purify nitrogen gas, you can produce ultra-high purity gas with a dew point of -90°C or less and a content of O 2 , CO 2 , H 2 , and hydrocarbons of 0.005 PPM or less. It is also possible to obtain
つぎに、純化ラインＢを稼働し、純化ラインＣ
を再生する場合を例にとつて純化ラインの再生法
について説明する。この場合は、バルブ１７，１
９が開き、１８，２０が閉じた状態となつてい
る。 Next, operate purification line B, and then operate purification line C.
A method for regenerating a purification line will be explained using an example of regenerating a purification line. In this case, valve 17,1
9 is open, and 18 and 20 are closed.
先ずバルブ２３，５２，５５を開き、再生ガス
（この場合はH2ガス）を純化ラインＣに逆向きに
流して、還元処理を行なう。このとき脱酸筒３１
と吸着筒３５のヒータｈはONとなつている。こ
の処理により、吸着筒に吸着されていたH2O、
CO2等の不純物が放出されるとともに、脱酸筒３
１内で次式の反応が生じて酸素が水分として放出
される。 First, the valves 23, 52, and 55 are opened, and the regeneration gas (in this case, H 2 gas) is allowed to flow in the opposite direction to the purification line C to perform the reduction process. At this time, the deoxidizing cylinder 31
And the heater h of the suction tube 35 is turned on. Through this process, the H 2 O that had been adsorbed in the adsorption column,
While impurities such as CO 2 are released, the deoxidizer cylinder 3
The reaction of the following formula occurs within 1, and oxygen is released as water.
NiO＋H2→Ni＋H2O
所定の時間T1が経過したら、バルブ５２を閉
めて、再生ガスの流通を止めるとともに、バルブ
６０を開いて自己ガス（純化ラインＢによつて純
化された窒素ガス）を再生ガス供給ラインＥに供
給する。すると、高純度の窒素ガスによる水素ガ
スのパージが行なわれる。この連続的なパージ
（連続パージと呼ぶ）を所定の時間T2行なつた
後、バルブ６０を閉める。さらにT3時間後にバ
ルブ２３を閉じ、バルブ６０を開いて再度自己ガ
スを導入し、T4時間経過後に今度はバルブ６０
を閉じるとともにバルブ２３を開いてライン内の
自己ガスを放出する。自己ガスを貯めては放出す
るこの回分パージを10回以上繰り返すことによつ
て、純化ライン内の再生ガス（水素ガス）は完全
に追い出される。回分パージを所定数繰り返した
ら、バルブ２３を閉じ、バルブ６０を開く。そし
て、T3時間経過した後にバルブ５５とバルブ６
０を閉じる。これによつて、休止中の純化ライン
Ｃ内に高純度の製品ガスが充満された状態に保た
れる。 NiO+H 2 →Ni+H 2 O When the predetermined time T1 has elapsed, close the valve 52 to stop the flow of regeneration gas, and open the valve 60 to regenerate the self-gas (nitrogen gas purified by purification line B). Supplied to gas supply line E. Then, the hydrogen gas is purged with high-purity nitrogen gas. After this continuous purge (referred to as continuous purge) has been carried out for a predetermined time T2 , the valve 60 is closed. Furthermore, after T3 hours, valve 23 is closed, valve 60 is opened to introduce self-gas again, and after T4 hours, this time valve 60 is opened.
is closed and the valve 23 is opened to release the self-gas in the line. By repeating this batch purge of storing and releasing self-gas ten or more times, the regeneration gas (hydrogen gas) in the purification line is completely purged. After repeating the batch purge a predetermined number of times, the valve 23 is closed and the valve 60 is opened. Then, after T3 time has elapsed, valve 55 and valve 6
Close 0. As a result, the idle purification line C is kept filled with high-purity product gas.
なお、上記時間T1、T2、T3、T4は、設計流
量、ガス純度、筒外形寸法等によつて最適なもの
とする。反対側の純化ラインＢの再生を行なうと
きも上記と同様な操作を当該ラインに適用すれば
よい。 Note that the above times T1, T2, T3, and T4 are optimal depending on the design flow rate, gas purity, cylinder external dimensions, etc. When regenerating the purified line B on the opposite side, the same operation as described above may be applied to the line.
このガス純化装置は、パージガスである自己ガ
スを再生ガスの切換え供給用のバルブ５４，５５
よりも再生ガス供給源側で再生ガス供給ラインＥ
内に導入するので、パージガスによつて追放され
ないデツドスペースが少なく、製品ガスの純化を
行なう場合に再生ガスが不純物として混入するこ
とが効果的に防止される。しかも上記のような連
続パージと回分パージとを併用することにより、
再生ガスの追放をほぼ完全に行なうことができる
のである。 This gas purification device has valves 54 and 55 for switching and supplying self-gas, which is purge gas, to regeneration gas.
Regeneration gas supply line E on the regeneration gas supply source side
Since the purge gas is introduced into the tank, there is less dead space that is not purged by the purge gas, and when purifying the product gas, it is effectively prevented that the regeneration gas is mixed in as an impurity. Moreover, by using continuous purge and batch purge as described above,
The regeneration gas can be almost completely expelled.
なお、純化ラインは３ライン以上並設しておい
てもよく、このガス純化装置を窒素ガス以外のガ
スの純化に使用してもよいことは明らかである。 Note that three or more purification lines may be arranged in parallel, and it is clear that this gas purification apparatus may be used to purify gases other than nitrogen gas.
［発明の効果］
以上の説明から明らかなように、本発明にかか
るガス純化装置は、純化ラインの再生に使用した
再生ガスの追い出しを効果的に行なうことがで
き、高純度の製品ガスを得ることのできるすぐれ
たものとなつた。[Effects of the Invention] As is clear from the above description, the gas purification device according to the present invention can effectively expel the regeneration gas used for regeneration of the purification line, and can obtain highly purified product gas. It has become an excellent product.
第１図は、本発明の１実施例をあらわす配管系
統図である。
１……ガス純化装置、４……予熱器、５……反
応筒、６……クーラー、３０，３１……脱酸筒、
３２，３３……チラー、３４，３５……吸着筒、
Ｂ，Ｃ……純化ライン、Ｅ……再生ガス供給ライ
ン。
FIG. 1 is a piping system diagram showing one embodiment of the present invention. 1... Gas purifier, 4... Preheater, 5... Reaction column, 6... Cooler, 30, 31... Deoxidation column,
32, 33... Chiller, 34, 35... Adsorption cylinder,
B, C...purification line, E...regeneration gas supply line.
Claims (1)
方の純化ラインに製品ガスを流すことにより該製
品ガスの純化を行なうとともに、他方の純化ライ
ンは再生ガスを流通させて再生を行なうことがで
きるようにしたガス純化装置において、前記二組
の純化ラインの製品ガス出口側に再生ガス導入用
の再生ガス供給ラインを接続し、該ラインには再
生ガスをいずれか一方の純化ラインに選択的に供
給するためのバルブを設けるとともに、該バルブ
よりも再生ガス供給源側の部分に、稼働中の純化
ラインによつて純化された製品ガスの一部を再生
中の純化ラインに導入することのできる自己ガス
供給ラインを接続したことを特徴とするガス純化
装置。1 Two sets of purification lines are installed in parallel, and the product gas is purified by flowing it through one of the purification lines, and the other purification line is regenerated by flowing regeneration gas. In the gas purification apparatus, a regeneration gas supply line for introducing regeneration gas is connected to the product gas outlet side of the two sets of purification lines, and the regeneration gas is selectively supplied to one of the purification lines. In addition to providing a valve for supplying the gas, part of the product gas purified by the purification line in operation can be introduced into the purification line during regeneration at a portion closer to the regeneration gas supply source than the valve. A gas purification device characterized in that it is connected to its own gas supply line.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60266349A JPS62125820A (en) | 1985-11-27 | 1985-11-27 | Purifying apparatus for gas |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60266349A JPS62125820A (en) | 1985-11-27 | 1985-11-27 | Purifying apparatus for gas |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62125820A JPS62125820A (en) | 1987-06-08 |
| JPH0578366B2 true JPH0578366B2 (en) | 1993-10-28 |
Family
ID=17429701
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60266349A Granted JPS62125820A (en) | 1985-11-27 | 1985-11-27 | Purifying apparatus for gas |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62125820A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0441716U (en) * | 1990-07-31 | 1992-04-09 | ||
| JP5573296B2 (en) * | 2010-03-31 | 2014-08-20 | ダイキン工業株式会社 | Air conditioner |
| KR102018939B1 (en) * | 2012-08-30 | 2019-09-05 | 인핸스드 에너지 그룹 엘엘씨 | Cycle piston engine power system |
-
1985
- 1985-11-27 JP JP60266349A patent/JPS62125820A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62125820A (en) | 1987-06-08 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |