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JPH0579270B2 - - Google Patents
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JPH0579270B2 - - Google Patents

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Publication number
JPH0579270B2
JPH0579270B2 JP16255888A JP16255888A JPH0579270B2 JP H0579270 B2 JPH0579270 B2 JP H0579270B2 JP 16255888 A JP16255888 A JP 16255888A JP 16255888 A JP16255888 A JP 16255888A JP H0579270 B2 JPH0579270 B2 JP H0579270B2
Authority
JP
Japan
Prior art keywords
resin
insulating layer
weight
parts
epoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP16255888A
Other languages
Japanese (ja)
Other versions
JPH0214269A (en
Inventor
Hisakazu Nakamura
Masahiro Takeuchi
Tomoyoshi Yanagida
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Bakelite Co Ltd
Original Assignee
Sumitomo Bakelite Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Bakelite Co Ltd filed Critical Sumitomo Bakelite Co Ltd
Priority to JP16255888A priority Critical patent/JPH0214269A/en
Publication of JPH0214269A publication Critical patent/JPH0214269A/en
Publication of JPH0579270B2 publication Critical patent/JPH0579270B2/ja
Granted legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/22Secondary treatment of printed circuits
    • H05K3/28Applying non-metallic protective coatings
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00Apparatus or processes for manufacturing printed circuits
    • H05K3/46Manufacturing multilayer circuits
    • H05K3/4644Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4673Application methods or materials of intermediate insulating layers not specially adapted to any one of the previous methods of adding a circuit layer
    • H05K3/4676Single layer compositions

Landscapes

  • Compositions Of Macromolecular Compounds (AREA)
  • Epoxy Resins (AREA)
  • Paints Or Removers (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Organic Insulating Materials (AREA)

Description

【発明の詳細な説明】[Detailed description of the invention]

[産業上の利用分野] 本発明は、誘電率(以下εと略す)が低く、回
路基板及び多層回路基板中の接着剤層・厚さ調整
層・オーバーレイ層等に用いる、絶縁層形成用ペ
ースト組成物に関する。 [従来技術] 近年、エレクトロニクス分野でプラスチツク絶
縁層は導体層と組み合わせて回路基板等極めて広
範囲の用途に使用され、要求特性も多岐にわたつ
ている。これらのうち、信号の伝搬速度を高速化
することを目的としてεの低い絶縁層の開発が必
要とされ、特に最近はεが3以下であることが要
求されている。絶縁層を形成する方法として熱硬
化性樹脂ペースト組成物から絶縁層を形成する方
法が従来からあつたが、絶縁層のεは樹脂そのも
のの有するεが大きく影響し、従来の熱硬化性樹
脂を用いた場合εを低くすることはできない。 εの低いプラスチツク絶縁層を形成する手段と
しては、フツ素樹脂、ポリエチレン樹脂、ポリブ
タジエン樹脂、ポリスルホン樹脂等εの低い熱可
塑性樹脂をフイルム状として使用する方法が検討
されている。しかしこのような絶縁層多層成形
性、寸法変化、ドリル加工性、耐熱性等が劣り、
信頼性の高いものが得られていなかつた。 [発明が解決しようとする課題] 本発明は、εが3以下の低εであり、他の層と
の密着性・耐熱性・耐湿耐水性等に優れた信頼性
を有する絶縁層を形成でき、かつ回路基板に加工
することが可能なペースト組成物を提供すること
を課題とする。 [課題を解決するための手段] 本発明は、エポキシ変性ポリブタジエンと、エ
ポキシ樹脂と、カルボン酸、無水物とラジカル重
合開始剤とを主成分とする熱硬化性樹脂ワニスに
この樹脂成分100重量部に対して最大粒子径が
50μm以下でありプラズマ表面処理を行つたフツ
素樹脂粉末を10〜200重量部添加して混合するこ
とによる。 エポキシ変性ポリブタジエンは、ポリブタジエ
ンの主鎖及び末端にエポキシ基を付与したいずれ
であつてもよく、エポキシ樹脂は、ビスフエノー
ルAタイプ、脂環式タイプなどの汎用エポキシ樹
脂やテトラブロモビスフエノールAタイプ、ジブ
ロモビスフエノールAタイプなどの難燃化エポキ
シ樹脂があげられる。 カルボン酸無水物は、クロレンド酸無水物、メ
チルブテニルテトラヒドロ無水フタル酸、アルケ
ニルコハク酸無水物、5−(2.5−ジオキソテトラ
ヒドロフリル)−3メチル3シクロヘキセン−1,
2ジカルボン酸無水物などがあげられ、ラジカル
重合開始剤としては、ジクシルパーオキサイド、
t−ブチルパーベンゾエート、t−ブチルパーオ
キシラウレート、ベンゾイルパーオキサイド等の
有機過酸化物があげられる。これらをワニスとす
るためにジメチルホルムアミド、メチルイソブチ
ルケトン、メチルセロソルブ等の有機溶媒が一種
または2種以上使用する。 本発明に用いるフツ素樹脂粉末としては、4フ
ツ化エチレン樹脂、4フツ化エチレン−6フツ化
プロピレン共重合体樹脂、4フツ化エチレン・パ
ーフルオロアルキルビニルエーテル共重合体樹脂
の粉末等がありこれらをプラズマ処理したものを
用いる。 プラズマ処理の方法としては、電極と反応器の
位置関係から外部電極・内部電極の方法があり、
電力の供給形式では容量結合・誘導結合・導波管
を用いる方法があり、電源周波数では直流からG
Hz帯までの範囲があり、いずれの方法でも可能で
ある。反応器内に仕込んだ粉末全体を一様にプラ
ズマ処理するために、処理中粉末が反応器内で攪
拌していることが必要である。 本発明のペーストを用いて作製した絶縁層を含
む回路基板をドリル加工したときスルホールの内
壁の粗さの点でフツ素樹脂粉末の最大粒子径は
50μm以下が好ましく、更には20μm以下が望ま
しい。 フツ素樹脂粉末の粒子径が大きいとスルホール
時の該絶縁層の内壁粗さが大きくなる。スルホー
ルの内壁粗さが大きいと耐薬品性、耐メツキ性更
に電気特性に悪影響を及ぼす。 プラズマ処理済フツ素樹脂粉末を樹脂ワニス中
に添加する際の組成としては、未硬化樹脂混合物
100重量部に対してプラズマ処理済フツ素樹脂粉
末は10〜200重量部である。10重量部以下では低
ε化の効果が薄く、200重量部以上では結合材と
しての熱硬化性樹脂の機能が低下し、強度・外観
等が悪くなる。特に50〜180重量部が好ましい。 フツ素樹脂粉末を樹脂の混合物からなるワニス
中に均一分散させることが重要である。得られた
ペーストの塗布方法としては、ロールコーター・
バーコータースクリーン印刷等の方法があり、そ
の後大気圧または真空中で加熱のみまたは加熱加
圧して樹脂を硬化させ、絶縁層を形成する。 [作用] ポリブタジエンは低εであるが着色性・耐熱性
が劣つている。この主鎖及び末端にエポキシ基を
付与したエポキシ変性ポリブタジエンを使用する
こと、及びエポキシ樹脂を混合することにより、
低εの性質は保持しつつ接着性、耐熱性が改良さ
れる。エポキシ樹脂は臭素化物を用いて難燃化で
き、フツ素樹脂粉末を添加することにより低ε化
は一層促進され、εを3以下にすることができ
る。フツ素樹脂は無極性なのでこれを添加するこ
とによりペーストは接着性が低下する。この低下
を抑えるためフツ素樹脂粉末をプラズマ処理し表
面を活性化しておく。 〈実施例〉 実施例 1 1,2結合が90%、エポキシ当量550のエポキ
シ変性ポリブタジエン、臭素化ビスフエノールA
型エポキシ樹脂、5−(2、5−ジオキソテトラ
フリル)−3−メチル3−シクロヘキセン−1、
2−ジカルボン酸無水物、ジクミルパーオキサイ
ドを第1表に示される組成でメチルイソブチルケ
トンとジメチルホルムアミドに混合溶解して樹脂
含有量58.3重量%のワニスを調整した。
[Industrial Application Field] The present invention relates to a paste for forming an insulating layer, which has a low dielectric constant (hereinafter abbreviated as ε) and is used for adhesive layers, thickness adjustment layers, overlay layers, etc. in circuit boards and multilayer circuit boards. Regarding the composition. [Prior Art] In recent years, in the field of electronics, plastic insulating layers have been used in combination with conductive layers for an extremely wide range of applications such as circuit boards, and the required properties have also become more diverse. Among these, there is a need to develop an insulating layer with a low ε for the purpose of increasing the signal propagation speed, and in particular, recently it has been required that ε be 3 or less. Conventionally, there has been a method of forming an insulating layer from a thermosetting resin paste composition, but the ε of the insulating layer is greatly influenced by the ε of the resin itself, and it is difficult to use conventional thermosetting resins. If used, ε cannot be lowered. As a means of forming a plastic insulating layer with a low ε, a method of using a thermoplastic resin with a low ε such as a fluororesin, a polyethylene resin, a polybutadiene resin, a polysulfone resin, etc. in the form of a film is being considered. However, such insulating layer multilayer formability, dimensional change, drilling workability, heat resistance, etc. are inferior,
I have not been able to obtain anything highly reliable. [Problems to be Solved by the Invention] The present invention is capable of forming an insulating layer that has a low ε of 3 or less and has excellent reliability in adhesion with other layers, heat resistance, moisture resistance, water resistance, etc. An object of the present invention is to provide a paste composition that can be processed into a circuit board. [Means for Solving the Problems] The present invention provides a thermosetting resin varnish containing epoxy-modified polybutadiene, an epoxy resin, a carboxylic acid, an anhydride, and a radical polymerization initiator as main components, and 100 parts by weight of this resin component. The maximum particle size for
By adding and mixing 10 to 200 parts by weight of fluororesin powder having a particle size of 50 μm or less and subjected to plasma surface treatment. The epoxy-modified polybutadiene may be polybutadiene with epoxy groups added to the main chain and terminals, and the epoxy resin may include general-purpose epoxy resins such as bisphenol A type and alicyclic type, tetrabromobisphenol A type, Examples include flame-retardant epoxy resins such as dibromobisphenol A type. Carboxylic acid anhydrides include chlorendic anhydride, methylbutenyltetrahydrophthalic anhydride, alkenylsuccinic anhydride, 5-(2.5-dioxotetrahydrofuryl)-3methyl-3cyclohexene-1,
Examples include dicarboxylic acid anhydride, and examples of radical polymerization initiators include dicyl peroxide,
Examples include organic peroxides such as t-butyl perbenzoate, t-butyl peroxylaurate, and benzoyl peroxide. To make these into varnishes, one or more organic solvents such as dimethylformamide, methyl isobutyl ketone, and methyl cellosolve are used. Examples of the fluororesin powder used in the present invention include powders of tetrafluoroethylene resin, tetrafluoroethylene-hexafluoropropylene copolymer resin, and tetrafluoroethylene/perfluoroalkyl vinyl ether copolymer resin. Use one that has been plasma treated. Plasma treatment methods include external electrode and internal electrode methods, depending on the positional relationship between the electrode and the reactor.
There are methods to supply power using capacitive coupling, inductive coupling, and waveguides, and the power supply frequency ranges from DC to G
There is a range up to the Hz band, and either method is possible. In order to uniformly plasma-treat the entire powder charged in the reactor, it is necessary that the powder be stirred in the reactor during treatment. When a circuit board containing an insulating layer prepared using the paste of the present invention is drilled, the maximum particle size of the fluororesin powder is determined by the roughness of the inner wall of the through hole.
The thickness is preferably 50 μm or less, more preferably 20 μm or less. If the particle size of the fluororesin powder is large, the inner wall roughness of the insulating layer during through-hole formation becomes large. If the inner wall roughness of the through hole is large, it will adversely affect chemical resistance, plating resistance, and electrical properties. When adding plasma-treated fluororesin powder to resin varnish, the composition is an uncured resin mixture.
The amount of plasma-treated fluororesin powder is 10 to 200 parts by weight per 100 parts by weight. If it is less than 10 parts by weight, the effect of lowering ε will be weak, and if it is more than 200 parts by weight, the function of the thermosetting resin as a binder will deteriorate, and the strength, appearance, etc. will deteriorate. Particularly preferred is 50 to 180 parts by weight. It is important to uniformly disperse the fluororesin powder in the varnish made of the resin mixture. The paste obtained can be applied using a roll coater or
There are methods such as bar coater screen printing, and then the resin is cured by heating alone or by heating and pressurizing at atmospheric pressure or vacuum to form an insulating layer. [Function] Although polybutadiene has a low ε, it has poor colorability and heat resistance. By using epoxy-modified polybutadiene with epoxy groups added to the main chain and ends, and by mixing epoxy resin,
Adhesion and heat resistance are improved while maintaining low ε properties. Epoxy resins can be made flame retardant using bromides, and by adding fluororesin powder, the reduction in ε can be further promoted and ε can be made 3 or less. Since fluororesin is non-polar, adding it reduces the adhesiveness of the paste. In order to suppress this decrease, the fluororesin powder is treated with plasma to activate its surface. <Example> Example 1 Epoxy-modified polybutadiene with 90% 1,2 bonds and epoxy equivalent of 550, brominated bisphenol A
type epoxy resin, 5-(2,5-dioxotetrafuryl)-3-methyl 3-cyclohexene-1,
A varnish having a resin content of 58.3% by weight was prepared by mixing and dissolving 2-dicarboxylic acid anhydride and dicumyl peroxide in the composition shown in Table 1 in methyl isobutyl ketone and dimethylformamide.

【表】 該ワニスにプラズマ処理した最大粒子径20μの
4フツ化エチレン樹脂粉末58.3重量部、メチルセ
ロソルブ21重量部を加え、市販のホモジナイザー
で10000rpm5分間混合し、ペースト状組成物を得
た。 4フツ化エチレン樹脂粉末のプラズマ処理は、
13.56MHzの電源を使用、外部電極方式でArをガ
スとし0.01トルの真空度、100Wの電力、60分間
行つた。尚プラズマ処理中反応器内は攪拌装置を
使い攪拌した。 この組成物は、35μm厚銅箔にスクリーン印刷
し、100℃10分乾燥後、銅箔/塗布層のシートを
塗布層が内側になる様2枚合わせて温度170℃圧
力30Kg/mm3、時間2時間30分でプレスし総厚
170μmの両面銅張板を得た。 (比較例 1) 4フツ化エチレン樹脂粉末をプラズマ処理しな
い他は、実施例1と同様にして両面銅張板を得
た。 (比較例 2) 4フツ化エチレン樹脂粉末処理を加えず樹脂ワ
ニスだけで試料を作製した。 (比較例 3) 4フツ化エチレン樹脂粉末を8重量部添加し、
溶剤のメチルセロソルブは添加しなかつた他は実
施例1と実様にして試料を作製した。 (比較例 4) 4フツ化エチレン樹脂粉末を220重量部添加し、
溶剤のメチルセロソルブを40重量部添加した他は
実施例1と同様にして試料を作製した。 誘電率、誘電正接、ピール強度、半田耐熱の評
価はJIS C6486に準拠した。(D−48/50:50℃
の温水48時間処理) 実施例、比較例の評価結果を第2表に示す。
[Table] 58.3 parts by weight of plasma-treated tetrafluoroethylene resin powder having a maximum particle size of 20 μm and 21 parts by weight of methyl cellosolve were added to the varnish and mixed for 5 minutes at 10,000 rpm using a commercially available homogenizer to obtain a paste composition. Plasma treatment of tetrafluoroethylene resin powder is
Using a 13.56 MHz power source, using an external electrode method with Ar gas as a gas, a vacuum of 0.01 Torr, power of 100 W, and 60 minutes. During the plasma treatment, the interior of the reactor was stirred using a stirring device. This composition was screen printed on a 35 μm thick copper foil, dried for 10 minutes at 100°C, and then two sheets of copper foil/coated layer were put together with the coated layer on the inside at a temperature of 170°C and a pressure of 30 Kg/mm 3 for a period of time. Pressed in 2 hours and 30 minutes to achieve total thickness
A double-sided copper clad plate of 170 μm was obtained. (Comparative Example 1) A double-sided copper-clad board was obtained in the same manner as in Example 1, except that the tetrafluoroethylene resin powder was not subjected to plasma treatment. (Comparative Example 2) A sample was prepared using only resin varnish without adding tetrafluoroethylene resin powder treatment. (Comparative Example 3) Adding 8 parts by weight of tetrafluoroethylene resin powder,
A sample was prepared in the same manner as in Example 1 except that the solvent methyl cellosolve was not added. (Comparative Example 4) 220 parts by weight of tetrafluoroethylene resin powder was added,
A sample was prepared in the same manner as in Example 1 except that 40 parts by weight of methyl cellosolve as a solvent was added. Evaluation of dielectric constant, dielectric loss tangent, peel strength, and solder heat resistance was based on JIS C6486. (D-48/50: 50℃
(48-hour treatment with hot water) The evaluation results of Examples and Comparative Examples are shown in Table 2.

【表】 * 試料ワレ
〈発明の効果〉 本発明の絶縁層形成用ペースト組成物から得ら
れる絶縁層は、従来のペースト状組成物からなる
絶縁層に比べて、低εであり、加えてフツ素樹脂
の量や種類を変えることにより、任意にεを調整
できる。 更に本発明の絶縁層形成用ペースト状組成物は
接着性や耐水性が非常に優れたものである。 本発明の絶縁層形成用ペースト組成物からなる
絶縁層を含む回路基板は通常の積層板からなる基
板と同様、穴明け、メツキ・エツチング・半田処
理等が可能である。 また、エポキシ樹脂のうち、臭素化されたもの
を用いれば、ペースト組成物により形成された絶
縁層に難燃性を付与することができる。 従つて本発明の絶縁層形成用ペースト状組成物
は、例えば信号回路を含むような内層面に塗布乾
燥して、半硬化として絶縁層を形成し、これを複
数枚か又はその他の外層を形成する層とを組み合
わせて積層し、加熱加圧して多層回路基板を得た
時、該絶縁層が厚み調整層となるような用途に最
適である。
[Table] * Sample cracks <Effects of the invention> The insulating layer obtained from the paste composition for forming an insulating layer of the present invention has a lower ε than an insulating layer made of a conventional paste composition, and in addition, By changing the amount and type of base resin, ε can be adjusted as desired. Furthermore, the paste composition for forming an insulating layer of the present invention has very excellent adhesiveness and water resistance. A circuit board containing an insulating layer made of the paste composition for forming an insulating layer of the present invention can be subjected to drilling, plating, etching, soldering, etc. in the same way as a board made of a normal laminate. Furthermore, if a brominated epoxy resin is used, flame retardancy can be imparted to the insulating layer formed from the paste composition. Therefore, the paste-like composition for forming an insulating layer of the present invention can be coated and dried on the surface of an inner layer containing a signal circuit, for example, to form an insulating layer as a semi-cured material, and then a plurality of insulating layers or other outer layers can be formed. It is most suitable for applications where the insulating layer becomes a thickness adjustment layer when a multilayer circuit board is obtained by laminating a combination of layers and applying heat and pressure.

Claims (1)

【特許請求の範囲】[Claims] 1 エポキシ変性ポリブタジエンと、エポキシ樹
脂と、カルボン酸無水物と、ラジカル重合開始剤
とを主成分とする熱硬化性樹脂ワニスに、前記樹
脂成分100重量部に対して、最大粒子径が50μm
以下でありプラズマ表面処理を行つたフツ素樹脂
粉末を10〜200重量部添加して混合した絶縁層形
成用ペースト組成物。
1 A thermosetting resin varnish whose main components are epoxy-modified polybutadiene, epoxy resin, carboxylic acid anhydride, and radical polymerization initiator has a maximum particle size of 50 μm based on 100 parts by weight of the resin component.
A paste composition for forming an insulating layer, which is prepared by adding and mixing 10 to 200 parts by weight of fluororesin powder which is as follows and has been subjected to plasma surface treatment.
JP16255888A 1988-07-01 1988-07-01 Paste composition for firming insulation layer Granted JPH0214269A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16255888A JPH0214269A (en) 1988-07-01 1988-07-01 Paste composition for firming insulation layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16255888A JPH0214269A (en) 1988-07-01 1988-07-01 Paste composition for firming insulation layer

Publications (2)

Publication Number Publication Date
JPH0214269A JPH0214269A (en) 1990-01-18
JPH0579270B2 true JPH0579270B2 (en) 1993-11-01

Family

ID=15756871

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16255888A Granted JPH0214269A (en) 1988-07-01 1988-07-01 Paste composition for firming insulation layer

Country Status (1)

Country Link
JP (1) JPH0214269A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002012650A (en) * 2000-06-30 2002-01-15 Dainippon Ink & Chem Inc Epoxy resin composition for low dielectric materials
JP5547456B2 (en) * 2009-11-10 2014-07-16 スリーエム イノベイティブ プロパティズ カンパニー One-pack type epoxy resin composition and bonding method using the same

Also Published As

Publication number Publication date
JPH0214269A (en) 1990-01-18

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