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JPH0579462B2 - - Google Patents
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JPH0579462B2 - - Google Patents

Info

Publication number
JPH0579462B2
JPH0579462B2 JP57126175A JP12617582A JPH0579462B2 JP H0579462 B2 JPH0579462 B2 JP H0579462B2 JP 57126175 A JP57126175 A JP 57126175A JP 12617582 A JP12617582 A JP 12617582A JP H0579462 B2 JPH0579462 B2 JP H0579462B2
Authority
JP
Japan
Prior art keywords
polishing
abrasive grains
crystal
pitch
pbmoo
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP57126175A
Other languages
Japanese (ja)
Other versions
JPS5919664A (en
Inventor
Michio Ishikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Corp
Original Assignee
Nippon Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nippon Electric Co Ltd filed Critical Nippon Electric Co Ltd
Priority to JP57126175A priority Critical patent/JPS5919664A/en
Publication of JPS5919664A publication Critical patent/JPS5919664A/en
Publication of JPH0579462B2 publication Critical patent/JPH0579462B2/ja
Granted legal-status Critical Current

Links

Classifications

    • BPERFORMING OPERATIONS; TRANSPORTING
    • B24GRINDING; POLISHING
    • B24BMACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING; DRESSING OR CONDITIONING OF ABRADING SURFACES; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
    • B24B37/00Lapping machines or devices; Accessories
    • B24B37/04Lapping machines or devices; Accessories designed for working plane surfaces

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • Grinding And Polishing Of Tertiary Curved Surfaces And Surfaces With Complex Shapes (AREA)
  • Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)

Description

【発明の詳細な説明】 本発明は、超音波光偏向器などの音響光学素子
に用いられる軟質結晶例えばモリブデン酸鉛
(PbMoO4)単結晶(以下PbMoO4結晶と略す)
の表面をスクラツチのない光学的平滑面すなわち
鏡面に仕上げるための研摩方法に関するものであ
る。
Detailed Description of the Invention The present invention provides soft crystals such as lead molybdate (PbMoO 4 ) single crystal (hereinafter abbreviated as PbMoO 4 crystal) used in acousto-optic devices such as ultrasonic optical deflectors.
The present invention relates to a polishing method for finishing the surface of a mirror to an optically smooth surface without scratches, that is, a mirror surface.

PbMoO4結晶を音響光学素子として使用するた
めには、レーザ光の透過や超音波発振に対して支
障のないスクラツチフリーの鏡面が要求されてい
るが、PbMoO4結晶は人工的に開発されてから日
がまだ浅いため、鏡面加工技術の研究はほとんど
みあたらない。PbMoO4結晶と性質の似かよつた
光学素子用結晶例えばTeO2の研摩方法として、
従来ラツピング工程とピツチ研摩工程を組合せた
方法が行なわれている。すなわち、Al2O3やSiC
などの砥粒と水や油などの液体を混合したラツプ
剤を用いてガラスや鋳鉄などの板上で機械的に研
摩し寸法や平坦度を修正するラツピング工程と
CeO2やFe2O3などの砥粒と、水や油などの液体
を混合したポリシ剤を用いてピツチ板上で鏡面加
工するポリシング工程である。これらの研摩方法
のうち、水を用いた加工方法をPbMoO4結晶に適
用したところ、ラツピング工程は何ら支障なく行
なわれたが、ポリシング工程ではスクラツチのな
い鏡面が得られなかつた。
In order to use PbMoO 4 crystal as an acousto-optic device, a scratch-free mirror surface that does not interfere with laser light transmission or ultrasonic oscillation is required, but PbMoO 4 crystal has not been artificially developed. Since it has only been a short time since then, there has been little research on mirror finishing technology. As a polishing method for crystals for optical elements, such as TeO 2 , which have similar properties to PbMoO 4 crystals,
Conventionally, a method combining a lapping process and a pitch polishing process has been used. That is, Al 2 O 3 and SiC
The lapping process involves mechanically polishing a glass or cast iron plate using a lapping agent that is a mixture of abrasive grains such as and a liquid such as water or oil to correct the dimensions and flatness.
This is a polishing process in which a mirror finish is created on a pitch board using a polishing agent that is a mixture of abrasive grains such as CeO 2 and Fe 2 O 3 and liquids such as water and oil. Among these polishing methods, when the processing method using water was applied to PbMoO 4 crystals, the wrapping process was carried out without any problems, but a scratch-free mirror surface could not be obtained in the polishing process.

この原因は、明らかではないが、結晶の潮解性
や融点の差により加工メカニズムが異なつている
と考えられる。即ち、TeO2結晶の場合は、潮解
性があるため結晶表面における硬さは結晶自体の
硬さ(モース硬度:5)よりもかなり軟かくなつ
ており、結晶と同程度の硬さを有するCeO2やFe2
O3砥粒(モース硬度:6)でも塑性流動作用に
よる加工が進行するのに対して、PbMoO4結晶
(モース硬度:3)の場合は、潮解性もなく融点
も1060℃(TeO2の融点は733℃)とかなり高いた
め、塑性流動現象が生じないので鏡面が得られな
いと推察される。
Although the reason for this is not clear, it is thought that the processing mechanism differs due to the difference in deliquescent properties and melting points of the crystals. In other words, in the case of TeO 2 crystal, the hardness at the crystal surface is considerably softer than the hardness of the crystal itself (Mohs hardness: 5) due to its deliquescent property; 2 or Fe 2
Even with O 3 abrasive grains (Mohs hardness: 6), processing proceeds due to plastic flow action, whereas PbMoO 4 crystals (Mohs hardness: 3) are not deliquescent and have a melting point of 1060°C (the melting point of TeO 2 Since the temperature is quite high (733℃), it is assumed that a mirror surface cannot be obtained because no plastic flow phenomenon occurs.

なお油を用いた加工方法は、スクラツチのない
鏡面が得られるが、加工後の結晶の洗浄やポリシ
剤の廃棄など作業性が悪い欠点がある。
Processing methods using oil can provide mirror surfaces without scratches, but they have the disadvantage of poor workability, such as cleaning of crystals after processing and disposal of polishing agents.

本発明の目的は、上記事情に鑑みてなされたも
ので、硬度の高いダイヤモンド砥粒の先端による
微小切削作用によりスクラツチのない鏡面が容易
に得られる軟質結晶の研摩方法を提供することに
ある。
The object of the present invention was made in view of the above circumstances, and it is an object of the present invention to provide a method for polishing soft crystals in which a scratch-free mirror surface can be easily obtained by the micro-cutting action of the tips of highly hard diamond abrasive grains.

以下、本発明による実施例をPbMoO4結晶につ
いて説明する。
Examples according to the present invention will be described below regarding PbMoO 4 crystals.

実施例 1 PbMoO4結晶素材を例えば内周刃切断砥石によ
り10×20×30mmの寸法のブロツク体に切断する。
このブロツク体の各表面における切断歪層と表面
の凹凸をラツピングにより約60μm除去し、表面
あらさ1.0μm程度の平坦な梨地面にする。このラ
ツピングは例えば粒径5μmのSiC砥粒と水を混合
したラツプ剤を用いてSn板上で行なう。ラツピ
ングにより生じた表面あらさをダイヤモンド1μm
砥粒を純水に1.3%(重量比)程度混合したポリ
シ剤を用いて、同心円溝付Sn板上でポリシング
して約20μm除去する。ポリシング面は目視では
表面あらさ0.01〜0.02μmの鏡面になるが微小なス
クラツチが無数に存在している。次にポリシング
面に生じているスクラツチをダイヤモンド1μm砥
粒を純水で1.3%に希釈したポリシ剤を用いて、
例えば格子溝付K−3ピツチ板上で研摩し約4μm
除去する。この後、ダイヤモンド砥粒を含んだポ
リシ剤の供給を停止して、純水のみを供給しなが
ら上記K−3ピツチ板上で研摩し、約1〜2μm除
去する。このときの表面は、微小なスクラツチが
全くない鏡面が達成され、音響光学素子の加工面
として最良の表面が得られた。また前述のダイヤ
モンド砥粒によるピツチ研摩の加工量を6μmとし
た場合でも純水のみによるピツチ研摩をさらに行
なうことによりスクラツチが全くない鏡面が達成
された。
Example 1 A PbMoO 4 crystal material is cut into blocks with dimensions of 10 x 20 x 30 mm using, for example, an internal cutting wheel.
Approximately 60 μm of the cutting strain layer and surface irregularities on each surface of this block body are removed by wrapping to create a flat matte surface with a surface roughness of approximately 1.0 μm. This wrapping is performed on the Sn plate using a lapping agent that is a mixture of SiC abrasive grains with a grain size of 5 μm and water, for example. Diamond 1μm surface roughness caused by wrapping
Using a polishing agent containing about 1.3% (weight ratio) of abrasive grains in pure water, remove approximately 20 μm by polishing on a Sn board with concentric grooves. Visually, the polished surface has a mirror surface with a surface roughness of 0.01 to 0.02 μm, but there are countless minute scratches. Next, use a polishing agent containing 1μm diamond abrasive grains diluted to 1.3% with pure water to remove scratches that have occurred on the polished surface.
For example, polish it on a K-3 pitch plate with lattice grooves to approximately 4 μm.
Remove. Thereafter, the supply of the polishing agent containing diamond abrasive grains is stopped, and polishing is carried out on the K-3 pitch plate described above while supplying only pure water to remove approximately 1 to 2 μm. At this time, a mirror surface with no minute scratches was achieved, and the best surface for processing an acousto-optic element was obtained. Furthermore, even when the pitch polishing with the aforementioned diamond abrasive grains was processed to a depth of 6 μm, a mirror surface with no scratches was achieved by further performing pitch polishing with pure water only.

上記実施例においては、PbMoO4結晶の両方位
については何も触れなかつたが(100),(010),
(001)面はもちろん他の面についても同様に鏡面
加工が達成されている。
In the above example, nothing was mentioned about both positions of the PbMoO 4 crystal, (100), (010),
Mirror finishing has been achieved not only on the (001) surface but also on other surfaces.

また、上記実施例においては、PbMoO4結晶の
場合を述べたが、他の軟質結晶材料に対しても本
発明は応用できる可能性がある。
Further, in the above embodiment, the case of PbMoO 4 crystal was described, but the present invention may be applicable to other soft crystal materials.

以上述べたように本発明によれば、従来の研摩
技術では困難であつたPbMoO4結晶の鏡面加工が
容易に達成されると共にPbMoO4結晶と類似した
組成や性質の結晶材料を用いた音響光学素子の製
作にとつて極めて有効な研摩技術である。
As described above, according to the present invention, mirror polishing of PbMoO 4 crystal, which was difficult with conventional polishing techniques, can be easily achieved, and an acousto-optical process using a crystal material having a composition and properties similar to PbMoO 4 crystal can be achieved. This is an extremely effective polishing technique for manufacturing devices.

Claims (1)

【特許請求の範囲】 1 結晶素材から所定形状に切断された後に、機
械的にラツピング仕上げされたブロツク結晶体の
表面を、下記の工程(1),(2),(3)の順に従つて鏡面
加工することを特徴とする軟質結晶の研磨方法。 (1) 軟質金属のポリツシヤと、ダイヤモンド砥粒
を純水に混合したポリシング剤の組合わせを用
いたポリシング工程。 (2) ピツチポリシヤと、ダイヤモンド砥粒を純水
に混合したポリシング剤の組合わせを用いたピ
ツチ研磨工程。 (3) (2)の工程のダイヤモンド砥粒が残つたピツチ
ポリシヤと純水の組合わせを用いた水研磨工
程。
[Claims] 1. After cutting a crystal material into a predetermined shape, the surface of a mechanically wrapped block crystal is subjected to the following steps (1), (2), and (3) in order. A method for polishing soft crystals characterized by mirror finishing. (1) A polishing process that uses a combination of a soft metal polisher and a polishing agent made by mixing diamond abrasive grains with pure water. (2) A pitch polishing process using a combination of pitch polisher and a polishing agent made by mixing diamond abrasive grains with pure water. (3) Water polishing process using a combination of pitch polisher with diamond abrasive grains left in step (2) and pure water.
JP57126175A 1982-07-20 1982-07-20 Soft crystal polishing method Granted JPS5919664A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP57126175A JPS5919664A (en) 1982-07-20 1982-07-20 Soft crystal polishing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP57126175A JPS5919664A (en) 1982-07-20 1982-07-20 Soft crystal polishing method

Publications (2)

Publication Number Publication Date
JPS5919664A JPS5919664A (en) 1984-02-01
JPH0579462B2 true JPH0579462B2 (en) 1993-11-02

Family

ID=14928532

Family Applications (1)

Application Number Title Priority Date Filing Date
JP57126175A Granted JPS5919664A (en) 1982-07-20 1982-07-20 Soft crystal polishing method

Country Status (1)

Country Link
JP (1) JPS5919664A (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61252060A (en) * 1985-04-30 1986-11-10 Matsushita Electric Ind Co Ltd Polishing method

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS597556A (en) * 1982-07-07 1984-01-14 Agency Of Ind Science & Technol Transparent optical component for carbon dioxide gas laser

Also Published As

Publication number Publication date
JPS5919664A (en) 1984-02-01

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