JPH0582469B2 - - Google Patents

Description

[Detailed Description of the Invention] [Field of Industrial Application] The present invention relates to an electron gun having a vertically long evaporation crucible, an electron beam deflection section using a fan-shaped magnetic field, and an electron gun having a vertically long evaporation crucible sandwiched between magnetic pole pieces. A magnetic pole piece to form a horizontal magnetic pole formed by a magnetic pole piece on the side and a magnetic pole piece at the rear when viewed from the electron gun, and a magnetic field trap above the evaporation crucible formed by the horizontal magnetic field of these magnetic pole pieces. The electron beam deflected from the electron gun is first incident into this magnetic field trap with various deflection phases relative to the magnetic pole piece, and then the electron beam on the electron gun side of the magnetic pole piece forming this magnetic field trap is The present invention relates to an electron beam-linear vapor deposition system in which the electron beam is incident on the crucible at a constant angle of incidence through the gaps between the pieces.

The vapor deposition apparatus according to the present invention is useful for vapor deposition of materials with poor heat resistance in the form of wide strips or other shapes that are transported perpendicular to the longitudinal axis of the evaporation crucible.

An excellent field of application for this invention is in the deposition processing of thin synthetic foils and papers where backscattered electrons can be accompanied by unacceptably high heating and/or electrostatic charging.

[Conventional technology]

Electron beam linear evaporation devices are known, characterized in that the electron beam is deflected along a line onto the surface of an elongated evaporation crucible. Furthermore, it is known to provide a magnetic field trap between the evaporation crucible and the material. This magnetic field trap serves to isolate backscattered electrons in the material to be deposited from the material to be deposited. As a magnetic field trap, generally a horizontal magnetic field is used, in which the incident electron beam as well as the backscattered electrons are deflected. In this case, the electron beam is directed approximately perpendicular to the direction of the magnetic field lines (German Democratic Republic Patent Publications Nos. 54154 and 64107) or obliquely to the magnetic field lines (German Democratic Republic Patent Publications No. 64107).
No. 204947) Injected into a horizontal magnetic field.

Although the method of incidence almost perpendicular to the lines of magnetic force is an extremely simple method, no consideration is given to effective protection against electrons that are backscattered during the process of stacking extremely wide layers of material to be deposited. This is because the primary electron beam is limited in that only a relatively small field strength is allowed to pass through the expanded magnetic field.

The incidence in a direction oblique to the magnetic field lines takes place via two pole pieces of a horizontal magnetic field, which allows the use of substantially stronger magnetic fields and thus ensures reliable protection of the material against backscattered electrons. is guaranteed. The problem with achieving such a highly acting magnetic field with oblique incidence is that when trying to form a straight line of deflection, the electron beam is forced into the magnetic field lines at various deflection phases of the electron beam. This means that the beam must be incident on the horizontal magnetic field at a certain angle to the magnetic field.

To solve this problem, it has been proposed to provide a magnetic fan field between the electron gun and the horizontal magnetic field (German Democratic Republic Patent Publication No.
No. 204947). In this case, the magnetic field strength and the position of the entrance edge of the magnetic sector are selected such that the electron beam exits the magnetic sector at a constant angle in each deflection phase and enters the horizontal magnetic field. In order to further expand the range of application of this magnetic field for layering extremely wide materials, it has been proposed to provide a shielding chamber between the electron gun and the fan-shaped magnetic field (German Democratic Republic Patent Publication No. 208955). . Such a method improves the vacuum behavior in the electron beam region and also avoids incorrect deflection due to scattering magnetic fields of the electron beam.

To achieve highly effective magnetic field trapping,
Previously proposed solutions with oblique incidence of the electron beam across this magnetic fan field have been proposed to reduce the field strength of this magnetic fan field in order to form a straight deflection line onto the evaporation crucible. It has the disadvantage that it must have a high constant. This condition is not fully satisfied if the fan-shaped magnetic field has a large spatial extent. This is because this fan-shaped magnetic field is about 10 times weaker than the adjacent horizontal magnetic field, and the non-uniform scattered magnetic field of the horizontal magnetic field affects this fan-shaped magnetic field.
As a result, the deflection lines are distorted depending on the scattered magnetic field, and this distortion leads to non-uniform distribution of the vapor flow over the width of the strip of material.

[Problem that the invention seeks to solve]

The object of the invention is to avoid the disadvantages of the known technology and to provide an electron beam with a highly effective magnetic field trap, which guarantees a high precision of the deflection line and with this also a high degree of uniformity of the layer thickness. The goal is to create a beam-linear evaporator.

The problem underlying the present invention is that a deflected electron beam is introduced into a horizontal magnetic field of a magnetic field trap through a path between two magnetic pole pieces in one of the magnetic pole pieces, and the incident angle of the electron beam is However, even if an irregular and time-varying interference magnetic field occurs between the magnetic fields parallel to the electron gun, the magnetic field can be adjusted so that electron beams of various deflection phases are incident on the horizontal magnetic field at a constant angle. An object of the present invention is to provide an electron beam-linear evaporator with a trap.

[Means for solving problems]

The above-mentioned problem has been solved by the present invention, which has an electron beam equipped with a vertically elongated evaporation crucible, an electron gun equipped with an electron beam deflection section, a magnetic pole piece for forming a horizontal magnetic field, and a magnetic field trap provided above the evaporation crucible. - in a linear vapor deposition apparatus, to create a vertical magnetic field that varies locally and temporally along the pole pieces between the pole pieces through which the deflected beam is incident on the horizontal magnetic field; This problem is solved by providing means for

This makes it possible to arbitrarily control the angle of incidence of the electron beam into the horizontal magnetic field along the evaporation crucible, and to keep this angle of incidence always within the evaporation crucible despite local and temporal irregularities. It becomes possible to adjust the deflection line so that a straight deflection line along the center line of the plane can be obtained.

A vertical magnetic field that is locally and temporally variable within the space between the magnetic pole pieces is created by installing horizontal magnetic pole pieces at the top and bottom of the space between the magnetic pole pieces, and connecting these magnetic pole pieces to the excitation coil. Suitably, it is formed by coupling to the other pole pieces via a number of soft magnetic yokes wound around. The yokes for the upper and lower pole pieces are located exactly one above the other. Equal currents flow in the same direction through the excitation coils wound around two yokes that are located above and below each other. It is amazing that it is possible to create spatially different perpendicular magnetic fields between the pole piece plates even though the pole piece plates are not separated by and are consistent. That's true.
This is achieved by configuring the coils that are one above the other to carry equal currents, and the coils that are next to each other to carry different currents. In this way, it is also possible to reverse the magnetic pole direction within the same pole piece plate. Furthermore, by suitably changing the coil current when a time-varying interfering magnetic field occurs, it is also possible to always form a straight deflection line along the same center line of the evaporation crucible.

In order to avoid undesirable deflection or distortion of the electron beam when passing between the pole pieces, the electron beam should be at least 60° and 90° to the boundary edge in all its deflection phases.
It is advantageous to align and form the boundary edge between the pole pieces in the direction of the electron gun such that the angle between the pole pieces is incident on the electron gun at the following angle:

〔Example〕

The invention will be explained in more detail below with reference to exemplary embodiments illustrated in the accompanying drawings.

FIG. 1 shows the path of an electron beam 1 which is deflected with different polarization phases from a horizontally mounted electron gun 2 through a field 3 between pole pieces 4 onto the surface of an evaporation crucible 5. A second pole piece 6 is provided on the opposite side of the evaporation crucible 5 for forming a horizontal magnetic field 7 of the magnetic field trap. In this embodiment, the electron gun 2 is installed perpendicularly to the longitudinal axis of the evaporation crucible 5, but it can also be installed at an angle to the longitudinal axis. This arrangement of the electron gun ensures that the electron beam 1 is at an angle β of 60° to 90° with respect to the boundary edge 14 in all its deflection phases (if the trajectory of the electron beam is projected onto a plane parallel to the rutivo, angle between the trajectory shadow and the boundary edge of the magnetic pole piece)
The beam is selected so that it is incident within 〓3 between the magnetic pole pieces.

2 and 3, the upper pole piece plate 9,
The formation of locally different perpendicular magnetic fields 8 within the space between the pole pieces 3 by the lower pole piece plate 10, the soft magnetic yoke 11 and the excitation coil 12 wound around the soft magnetic yoke is illustrated. The yokes 11 for the upper and lower pole pieces 9, 10 are arranged exactly one above the other. The excitation coils 12 provided on two yokes 11 located above and below each other are electrically connected one after the other, and equal currents flow through them in the same direction. As a result, without having to divide the pole piece plates 9, 10 along the sides, the magnetic field strength value can be changed from one region to the other in the regions of the individual yokes 11, which are provided with the excitation coil 12 and are located above and below each other. It is possible to generate vertical magnetic fields 8 of different strengths that vary continuously. The two excitation coils 12, which are located one above the other, are excited by a separate power supply in such a way that the electron beam 1 is deflected in the horizontal plane with the desired intensity in the area of these excitation coils. In this way, the electron beam 1 with various deflection phases is appropriately deflected within the area of each excitation coil pair, and the electron beam 1 is deflected at a certain angle α (if the trajectory of the electron beam is projected onto a plane parallel to the crucible, the trajectory The light beam enters the horizontal magnetic field 7 at an angle (the angle between the shadow and a plane perpendicular to the crucible center axis), and a straight deflection line 13 along the center line of the evaporation crucible 5 is formed. When interference deflection occurs due to the magnetic scattering field between the electron gun 2 and the evaporation crucible 5, or when its temporal change occurs, the distortion of the deflection line 13 caused by this is similarly changed by changing the coil current. This allows for correction.

[Brief explanation of drawings]

Figure 1 is a horizontal cross-sectional view of an electron beam-linear evaporation device using a magnetic field trap, which is equipped with an electron gun installed perpendicularly to the longitudinal direction of the evaporation crucible. The electron beam according to FIG. 1 is a vertical cross-sectional view of the linear vapor deposition apparatus, viewed in the vertical direction; FIG. 3 shows the electron beam according to FIG.
FIG. 2 is a vertical cross-sectional view of a pole piece of a linear deposition apparatus. The symbols in the figure are 1...electron beam, 2...electron gun, 3...between electrode pieces, 4...magnetic pole piece, 5...evaporation crucible, 6...magnetic pole piece, 7...horizontal magnetic field, 8
...Vertical magnetic field, 9,10...Pole piece plate, 11...
... Yoke, 12 ... Excitation coil, 13 ... Deflection line. 14... Boundary edge.

Claims (1)

[Claims] 1. A vertically elongated evaporation crucible 5, an electron gun 2 equipped with an electron beam deflection section using a fan-shaped magnetic field, a magnetic pole piece 4 on the side of the electron gun 2 having a space between the magnetic pole pieces that sandwich the elongated evaporating crucible 5, and electrons. The magnetic pole pieces 4 and 6 form a horizontal magnetic field with the magnetic pole piece 6 located at the rear when viewed from the gun 2, and the magnetic field formed above the evaporation crucible by the horizontal magnetic field of these magnetic pole pieces 4 and 6. The electron beam deflected from the electron gun is first incident into this magnetic field trap with various deflection phases relative to the magnetic pole piece 4, and then the electrode pieces 4, 6 forming this magnetic field trap are In an electron beam-linear evaporation apparatus in which the electron beam is incident at a constant angle of incidence to the crucible through the magnetic pole pieces 4 on the electron gun 2 side, the magnetic pole Electron beam-linear vapor deposition apparatus, characterized in that means are provided for creating a locally and temporally variable perpendicular magnetic field 8 along the strip 4. 2 Between the pole pieces = 3 There is provided one consistent pole piece plate 9, 10 respectively above and below to form a variable vertical magnetic field 8, and these two pole piece plates 9, Each of 10 is an excitation coil 1
2. An electron beam according to claim 1, which is magnetically coupled to a magnetic pole piece 4 of a horizontal magnetic field 7 through a number of wound soft magnetic yokes 11.
Linear vapor deposition equipment. 3. Soft-magnetic yokes 11 for the upper and lower pole pieces 9, 10 are arranged exactly above and below each other, and an excitation coil 12 is wound around these two yokes 11 that are above and below each other. 3. The electron beam linear evaporation apparatus according to claim 1 or 2, wherein the electron beam linear evaporation apparatus is configured so that equal currents flow in the same direction. 4 The excitation coil pair 12 wound around the soft magnetic yoke 11 along the magnetic pole pieces 〓 3 generates a horizontal magnetic field 7 from the magnetic pole pieces 〓 3 in any deflection phase of the electron beam 1.
An electron beam-linear vapor deposition apparatus according to any one of claims 1 to 3, which is configured to be excited such that the electron beam is incident at a constant angle (α) within the electron beam. . 5 The magnetic pole pieces 〓 3 is in the direction of the electron gun 2 so that the electron beam 1 enters the magnetic pole pieces 〓 3 at an angle β of 60° or more and 90° or less with respect to the boundary edge 14 in all its deflection phases. Claim 1 adjusted to
The electron beam-linear evaporation apparatus according to any one of items 1 to 4.