JPH0583086B2 - - Google Patents
Info
- Publication number
- JPH0583086B2 JPH0583086B2 JP3721988A JP3721988A JPH0583086B2 JP H0583086 B2 JPH0583086 B2 JP H0583086B2 JP 3721988 A JP3721988 A JP 3721988A JP 3721988 A JP3721988 A JP 3721988A JP H0583086 B2 JPH0583086 B2 JP H0583086B2
- Authority
- JP
- Japan
- Prior art keywords
- film
- polymer
- light
- acid
- irradiated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000001875 compounds Chemical class 0.000 claims description 16
- 150000002148 esters Chemical class 0.000 claims description 11
- 238000004519 manufacturing process Methods 0.000 claims description 6
- 239000002253 acid Substances 0.000 claims description 5
- 230000001678 irradiating effect Effects 0.000 claims description 4
- 239000000203 mixture Substances 0.000 claims description 3
- 239000010408 film Substances 0.000 description 50
- 229920000642 polymer Polymers 0.000 description 29
- 230000001186 cumulative effect Effects 0.000 description 16
- 239000010409 thin film Substances 0.000 description 16
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 15
- 239000000243 solution Substances 0.000 description 15
- 238000010521 absorption reaction Methods 0.000 description 13
- 238000000034 method Methods 0.000 description 11
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 10
- YKYOUMDCQGMQQO-UHFFFAOYSA-L cadmium dichloride Chemical compound Cl[Cd]Cl YKYOUMDCQGMQQO-UHFFFAOYSA-L 0.000 description 10
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 8
- 238000000862 absorption spectrum Methods 0.000 description 8
- VKOBVWXKNCXXDE-UHFFFAOYSA-N icosanoic acid Chemical compound CCCCCCCCCCCCCCCCCCCC(O)=O VKOBVWXKNCXXDE-UHFFFAOYSA-N 0.000 description 8
- 230000007423 decrease Effects 0.000 description 7
- 239000000463 material Substances 0.000 description 7
- 238000006243 chemical reaction Methods 0.000 description 6
- 239000003960 organic solvent Substances 0.000 description 6
- 239000010453 quartz Substances 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000002835 absorbance Methods 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 5
- 239000010410 layer Substances 0.000 description 5
- 239000007787 solid Substances 0.000 description 5
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 5
- 125000001140 1,4-phenylene group Chemical group [H]C1=C([H])C([*:2])=C([H])C([H])=C1[*:1] 0.000 description 4
- VETQOAKOAPHEOL-UHFFFAOYSA-N 5-[4-(4-carboxy-4-cyanobuta-1,3-dienyl)phenyl]-2-cyanopenta-2,4-dienoic acid Chemical compound OC(=O)C(C#N)=CC=CC1=CC=C(C=CC=C(C#N)C(O)=O)C=C1 VETQOAKOAPHEOL-UHFFFAOYSA-N 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 238000007598 dipping method Methods 0.000 description 4
- 238000005227 gel permeation chromatography Methods 0.000 description 4
- 239000012528 membrane Substances 0.000 description 4
- 238000001953 recrystallisation Methods 0.000 description 4
- 229910052724 xenon Inorganic materials 0.000 description 4
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- GOQYKNQRPGWPLP-UHFFFAOYSA-N heptadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCO GOQYKNQRPGWPLP-UHFFFAOYSA-N 0.000 description 3
- 125000001165 hydrophobic group Chemical group 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- WQEPLUUGTLDZJY-UHFFFAOYSA-N pentadecanoic acid Chemical compound CCCCCCCCCCCCCCC(O)=O WQEPLUUGTLDZJY-UHFFFAOYSA-N 0.000 description 3
- 239000000126 substance Substances 0.000 description 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 3
- OCOCSIDEWXUOQN-UHFFFAOYSA-N 2-cyanopenta-2,4-dienoic acid Chemical compound OC(=O)C(C#N)=CC=C OCOCSIDEWXUOQN-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- 239000003431 cross linking reagent Substances 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000000539 dimer Substances 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 125000000524 functional group Chemical group 0.000 description 2
- KEMQGTRYUADPNZ-UHFFFAOYSA-N heptadecanoic acid Chemical compound CCCCCCCCCCCCCCCCC(O)=O KEMQGTRYUADPNZ-UHFFFAOYSA-N 0.000 description 2
- BXWNKGSJHAJOGX-UHFFFAOYSA-N hexadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCO BXWNKGSJHAJOGX-UHFFFAOYSA-N 0.000 description 2
- IPCSVZSSVZVIGE-UHFFFAOYSA-N hexadecanoic acid Chemical compound CCCCCCCCCCCCCCCC(O)=O IPCSVZSSVZVIGE-UHFFFAOYSA-N 0.000 description 2
- BTFJIXJJCSYFAL-UHFFFAOYSA-N icosan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCCCO BTFJIXJJCSYFAL-UHFFFAOYSA-N 0.000 description 2
- 238000001393 microlithography Methods 0.000 description 2
- 239000000178 monomer Substances 0.000 description 2
- XGFDHKJUZCCPKQ-UHFFFAOYSA-N nonadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCCO XGFDHKJUZCCPKQ-UHFFFAOYSA-N 0.000 description 2
- ISYWECDDZWTKFF-UHFFFAOYSA-N nonadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCCC(O)=O ISYWECDDZWTKFF-UHFFFAOYSA-N 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- REIUXOLGHVXAEO-UHFFFAOYSA-N pentadecan-1-ol Chemical compound CCCCCCCCCCCCCCCO REIUXOLGHVXAEO-UHFFFAOYSA-N 0.000 description 2
- 229920006395 saturated elastomer Polymers 0.000 description 2
- 235000003441 saturated fatty acids Nutrition 0.000 description 2
- 150000004671 saturated fatty acids Chemical class 0.000 description 2
- 239000002356 single layer Substances 0.000 description 2
- 239000000758 substrate Substances 0.000 description 2
- KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
- HLZKNKRTKFSKGZ-UHFFFAOYSA-N tetradecan-1-ol Chemical compound CCCCCCCCCCCCCCO HLZKNKRTKFSKGZ-UHFFFAOYSA-N 0.000 description 2
- SZHOJFHSIKHZHA-UHFFFAOYSA-N tridecanoic acid Chemical compound CCCCCCCCCCCCC(O)=O SZHOJFHSIKHZHA-UHFFFAOYSA-N 0.000 description 2
- XFRVVPUIAFSTFO-UHFFFAOYSA-N 1-Tridecanol Chemical compound CCCCCCCCCCCCCO XFRVVPUIAFSTFO-UHFFFAOYSA-N 0.000 description 1
- 235000021314 Palmitic acid Nutrition 0.000 description 1
- 235000021355 Stearic acid Nutrition 0.000 description 1
- 238000012644 addition polymerization Methods 0.000 description 1
- 229960000541 cetyl alcohol Drugs 0.000 description 1
- 238000012790 confirmation Methods 0.000 description 1
- 238000006352 cycloaddition reaction Methods 0.000 description 1
- 125000001995 cyclobutyl group Chemical group [H]C1([H])C([H])([H])C([H])(*)C1([H])[H] 0.000 description 1
- LQZZUXJYWNFBMV-UHFFFAOYSA-N dodecan-1-ol Chemical compound CCCCCCCCCCCCO LQZZUXJYWNFBMV-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920006158 high molecular weight polymer Polymers 0.000 description 1
- 239000008204 material by function Substances 0.000 description 1
- 229940043348 myristyl alcohol Drugs 0.000 description 1
- QIQXTHQIDYTFRH-UHFFFAOYSA-N octadecanoic acid Chemical compound CCCCCCCCCCCCCCCCCC(O)=O QIQXTHQIDYTFRH-UHFFFAOYSA-N 0.000 description 1
- OQCDKBAXFALNLD-UHFFFAOYSA-N octadecanoic acid Natural products CCCCCCCC(C)CCCCCCCCC(O)=O OQCDKBAXFALNLD-UHFFFAOYSA-N 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 239000008117 stearic acid Substances 0.000 description 1
- 239000001384 succinic acid Substances 0.000 description 1
- TUNFSRHWOTWDNC-HKGQFRNVSA-N tetradecanoic acid Chemical compound CCCCCCCCCCCCC[14C](O)=O TUNFSRHWOTWDNC-HKGQFRNVSA-N 0.000 description 1
- 229940087291 tridecyl alcohol Drugs 0.000 description 1
Landscapes
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Polymerisation Methods In General (AREA)
Description
産業上の利用分野
本発明は新規な薄膜状重合体の製造方法に関す
るものである。さらに詳しくいえば、本発明は架
橋剤や感光性材料、電子デバイス材料、ミクロリ
ングラフイーにおける電子線レジスト材料などと
して有用な薄膜状重合体を、容易に製造する方法
に関するものである。
従来の技術
5,5′−(1,4−フエニレン)−ビス(2−シ
アノ−2,4−ペンタジエノイツク酸)ジアルキ
ルエステルは、その分子構造から、薄膜状の重合
体を製造することができれば、各種機能性材料の
素材などとして利用が可能である。
しかしながら、このものは、結晶状態で光によ
り重合して、結晶性ポリマーを生成するが、該ポ
リマーは加工が困難で薄膜状に成膜しにくく、通
常、結晶又は粉末として取り扱われており、した
がつて、電子デバイスなどへの利用は困難であつ
た。
ところで、一定の分子配列を有し、かつオング
ストロームオーダーで一定の厚さをもつた薄膜の
調製方法としては、ラングミユアーブロジエツト
法が知られている。この方法を用いて薄膜を調製
する場合には、単分子膜の形成可能な化学構造を
有する化合物、すなわち、分子内に親水基と疎水
基とを有する両親媒性化合物を用いる必要があ
る。
したがつて、電子デバイスなどに利用可能な機
械的強度に優れた薄膜状重合体を、このラングミ
ユアーブロジエツト法により作製するには、重合
性官能基を有する両親媒性化合物を用いて累積膜
を作製し、これを重合すればよい。しかしなが
ら、重合性官能基を有する両親媒性化合物の合成
は必ずしも容易ではなく、また該化合物は、その
化学構造によつては、必ずしも単分子膜は形成さ
れない。
発明が解決しようとする課題
本発明は、合成が比較的容易で光反応性化合物
である5,5′−(1,4−フエニレン)−ビス(2
−シアノ−2,4−ペンタジエノイツク酸)ジア
ルキルエステルを用い、その薄膜重合体を容易に
製造する方法を提供するものである。
課題を解決するための手段
本発明者らは、該ジアルキルエステルの薄膜重
合体を容易に製造する方法を開発するために鋭意
研究を重ねた結果、該ジアルキルエステルは、エ
ステルを形成しているアルキル基の炭素数が多い
とそれ自体単分子膜を形成し、一方アルキル基の
炭素数が少ない場合には、適当な両親媒性化合物
と混合することにより単子膜の形成が可能であ
り、これらの単分子膜は石英板などの基板上に累
積が可能であつて、光重合性を有しているので、
この累積膜に光を照射することにより、薄膜重合
体が容易に得られることを見い出し、この知見に
基づいて本発明を完成するに至つた。
すなわち、本発明は、一般式
INDUSTRIAL APPLICATION FIELD The present invention relates to a method for producing a novel thin film polymer. More specifically, the present invention relates to a method for easily producing a thin film polymer useful as a crosslinking agent, a photosensitive material, an electronic device material, an electron beam resist material in microphosphorography, and the like. Conventional technology Due to its molecular structure, 5,5'-(1,4-phenylene)-bis(2-cyano-2,4-pentadienoic acid) dialkyl ester can be produced into a thin film-like polymer. If possible, it can be used as a material for various functional materials. However, this polymer is polymerized by light in a crystalline state to produce a crystalline polymer, but this polymer is difficult to process and form into a thin film, and is usually handled as a crystal or powder. Therefore, it has been difficult to use it in electronic devices. Incidentally, the Langmuir-Blodget method is known as a method for preparing a thin film having a certain molecular arrangement and a certain thickness on the order of angstroms. When preparing a thin film using this method, it is necessary to use a compound having a chemical structure capable of forming a monomolecular film, that is, an amphiphilic compound having a hydrophilic group and a hydrophobic group in the molecule. Therefore, in order to produce thin film-like polymers with excellent mechanical strength that can be used in electronic devices, etc., by using the Langmuir-Blodget method, it is necessary to use amphiphilic compounds having polymerizable functional groups. What is necessary is to produce a membrane and polymerize it. However, it is not always easy to synthesize amphiphilic compounds having polymerizable functional groups, and depending on the chemical structure of the compound, a monomolecular film is not necessarily formed. Problems to be Solved by the Invention The present invention is directed to 5,5'-(1,4-phenylene)-bis(2), which is a photoreactive compound that is relatively easy to synthesize.
The present invention provides a method for easily producing a thin film polymer using dialkyl (cyano-2,4-pentadienoic acid) ester. Means for Solving the Problems As a result of intensive research to develop a method for easily producing a thin film polymer of the dialkyl ester, the present inventors found that the dialkyl ester is If the group has a large number of carbon atoms, it will itself form a monolayer, whereas if the alkyl group has a small number of carbon atoms, it is possible to form a monolayer by mixing it with an appropriate amphipathic compound. The monomolecular film of can be accumulated on a substrate such as a quartz plate and has photopolymerizability, so
The inventors have discovered that a thin film polymer can be easily obtained by irradiating this cumulative film with light, and have completed the present invention based on this knowledge. That is, the present invention provides the general formula
【化】
(式中のRは炭素数5〜20の飽和アルキル基で
ある)
で表わされる5,5′−(1,4−フエニレン)−ビ
ス(2−シアノ−2,4−ペンタジエノイツク
酸)ジアルキルエステル又はこのものと両親媒性
化合物との混合物から成る累積膜を調製し、次い
でこれに光を照射することを特徴とする薄膜状重
合体の製造方法を提供するものである。
以下、本発明を詳細に説明する。
本発明において単量体として用いる5,5′−
(1,4−フエニレン)−ビス(2−シアノ−2,
4−ペンタジエノイツク酸)ジアルキルエステル
は、一般式()で示される構造を有し、式中の
Rは炭素数5〜20の飽和アルキル基である。この
ものは分子内に疎水基を有するが、強い親水基が
ないので単分子膜を形成しないと考えられていた
が、アルキル鎖の長い5,5′−(1,4−フエニ
レン)−ビス(2−シアノ−2,4−ペンタジエ
ノイツク酸)ジ−n−ドデシルエステルなどは単
独で単分子膜を形成する。また、アルキル基の炭
素数の少ない5,5′−(1,4−フエニレン)−ビ
ス(2−シアノ−2,4−ペンタジエノイツク
酸)ジアルキルエステルは、適当な両親媒性化合
物と混合することにより、水面上や塩化カドミウ
ム水溶液などの液面上で安定な単分子膜を形成す
る。このような単分子膜の形成は、表面圧−占有
面積曲線において、固体凝縮相の存在が確認され
たことから明らかである。
本発明でいう両親媒性化合物とは、分子中に親
水基と疎水基を併有する化合物であつて、このよ
うなものとしては、通常アルキル基の炭素数が12
〜20の長鎖飽和脂肪酸や長鎖飽和アルコールが用
いられる。長鎖飽和脂肪酸としては、例えばトリ
デシル酸、ミリスチン酸、ペンタデシル酸、パル
ミチン酸、ヘプタデシル酸、ステアリン酸、ノナ
デカン酸、アラキン酸などが挙げられる。長鎖飽
和アルコールとしては、例えばラウリルアルコー
ル、トリデシルアルコール、ミリスチルアルコー
ル、ペンタデシルアルコール、セチルアルコー
ル、ヘプタデシルアルコール、ステアリルアルコ
ール、ノナデシルアルコール、エイコシルアルコ
ールなどが挙げられる。これらの両親媒性化合物
は、それぞれ単独で用いてもよいし、2種以上を
組み合わせて用いてもよい。
次に、該累積膜の好適な調製方法の1例につい
て説明すると、まず、5,5′−(1,4−フエニ
レン)−ビス(2−シアノ−2,4−ペンタジエ
ノイツク酸)ジアルキルエステル単独、又はこの
ものと適当な両親媒性化合物とを通常モル比1:
5ないし1:1の割合で、クロロホルムなどの有
機溶媒に溶解したのち、この溶液を蒸留水や塩化
カドミウム水溶液などの液面上に徐々に滴下後、
圧縮し、該液面上に、5,5′−(1,4−フエニ
レン)−ビス(2−シアノ−2,4−ペンタジエ
ノイツク酸)ジアルキルエステル、又はこのもの
と両親媒性化合物との混合物から成る単分子膜を
形成させ、次いでこの単分子膜を石英板などの基
板上に移しとる操作を繰り返して、累積膜を作成
する。
このようにして作成された累積膜の吸収スペク
トルは、360nmに吸収極大が存在し、結晶又は溶
液のそれ(吸収極大400nm)とは異なつており、
該累積膜は結晶や溶液と異なつた分子配列である
ことが分かる。
このようにして作製された累積膜に、キセノン
ランプなどにより光照射を行うと、容易に付加重
合が起こり、薄膜状の重合体が得られる。例え
ば、10層累積した膜に420nm以上の光を照射する
と、紫外吸収スペクトルにおいて、吸光度が徐々
に減少し、一方赤外吸収スペクトルでは、二重結
合(1610cm-1)の吸収が減少し、二重結合間で反
応が生じたことが分かる。
このような光照射により得られた薄膜は、テト
ラヒドロフランに可溶であり、かつゲルパーミエ
ーシヨンクロマトグラフイーにより測定した分子
量は1000〜300程度である。これらのことから、
該薄膜は、二重結合の環化付加反応により生成し
たシクロブタン環をもつた2〜5量体の低重合体
であることが分かる。この低重合体薄膜に、
320nm以上の光を照射すると吸光度は減少し、
360nmの吸収極大はほとんど消失する。これは二
重結合の反応がさらに進行し、高重合体となつた
ためと考えられ、得られた薄膜は、一般の有機溶
媒には溶けにくくなる。この高重合体膜は290nm
以下の光を照射すると、解重合を起して低重合体
となり、またこの低重合体に320nm以上の光を照
射すると再び高分子量の重合体となる。
このことは、本発明の製造方法による薄膜重合
体は光による可逆解重合性を有するものであるこ
とを示す。該薄膜重合体は、このような性質を有
すると共に機械的強度が高いことなどから、電子
デバイスの作製やミクロリソグラフイーにおける
レジスト材料などとして利用可能である。
発明の効果
本発明方法によると、5,5′−(1,4−フエ
ニレン)−ビス(2−シアノ−2,4−ペンタジ
エノイツク酸)ジアルキルエステルを単量体とし
て用い、その累積膜に光照射することにより、薄
膜状重合体を容易に製造することができる。
本発明方法により、得られた薄膜重合体は、光
による可逆解重合性を有し、かつ機械的強度も良
好であるので、例えば電子デバイスの作製、ミク
ロリソグラフイーにおけるレジスト材料、あるい
は架橋剤や感光性材料などとして有用である。
実施例
次に実施例により本発明をさらに詳細に説明す
るが、本発明はこれらの例によつてなんら限定さ
れるものではない。
実施例 1
アセトンから数回再結晶により精製した5,
5′−(1,4−フエニレン)−ビス(2−シアノ−
2,4−ペンタジエノイツク酸)ジ−n−ドデシ
ルエステルのクロロホルム溶液(0.89×10-3M)
を、塩化カドミウム水溶液(10-3M)の液面上に
徐々に滴下して展開後、圧縮し単分子膜を形成さ
せた。
表面圧−占有面積曲線から20〜30dyn/cmで固
体凝縮相の存在が確認されたので、表面圧を
25dyn/cmに設定して、単分子膜を形成させた。
次にこのようにして形成された単分子膜を垂直浸
せき法により石英板に移しとり、単分子膜10層
から成る累積膜を作製した。この累積膜は360nm
に吸収極大を有し、これにキセノンランプを用い
て照射すると、吸収極大は徐々に減少し、照射し
た膜の赤外吸収スペクトルでは二重結合の吸収
(1610cm-1)の減少がみられ、二重結合間で反応
していることが示された。15分間光照射した膜
は、ほとんど一般の有機溶媒に不溶であるが、短
時間、例えば1分間照射した膜はテトラヒドロフ
ランに可溶であり、ゲルパーミエーシヨンクロマ
トグラフイーで調べた分子量は1200〜3000(2〜
5量体)であつた。
実施例 2
アセトンから再結晶により精製した5,5′−
(1,4−フエニレン)−ビス(2−シアノ−2,
4−ペンタジエノイツク酸)ジ−n−ヘキシルエ
ステルのクロロホルム溶液(0.89×10-3M)とア
ラキン酸のクロロホルム溶液(0.89×10-3M)を
モル比1:5の割合で混合し、この溶液を塩化カ
ドミウム水溶液(10-3M)の液面上に徐々に滴下
し展開後、表面圧−占有面積曲線を測定した。こ
の曲線に固体凝縮相の存在が観察されたので、単
分子膜の形成が確認された。そこで、表面圧を
25dyn/cmに設定し、単分子膜を形成させた。次
にこのようにして形成された単分子膜を垂直浸せ
き法により、石英板に移しとり、単分子膜10層
から成る累積膜を作製した。この累積膜の吸収ス
ペクトルは360nmに吸光極大を有し、これにキセ
ノンランプを光源とし、フイルター(コーニング
3−72)を用いて420nm以上の光照射を行うと、
吸光度は除々に減少していくが860nmに吸収極大
は存在する。3分間照射後の累積膜をテトラヒド
ロフランに溶解し、ゲルパーミエーシヨンクロマ
トグラフイーで分子量を調べてみると2〜5量体
であることが分かつた。この低重合体にさらに
320nm以上の光を照射すると吸収極大は減少しほ
とんど消失した。この膜は一般の有機溶媒に不溶
で高重合体である。この高重合体に短波長の光
(λ<290nm)を照射すると、次第に360nmの吸
収極大があらわれ、低重合体への解重合が示され
た。この低重合体に320nm以上の光を照射すると
再び高重合体となり、高重合体から低重合体の変
換は光により可逆的に進行する。
実施例 3
アセトンから再結晶により精製した5,5′−
(1,4−フエニレン)−ビス(2−シアノ−2,
4−ペンタジエノイツク酸)ジ−n−ドデシルエ
ステルのクロロホルム溶液(0.89×10-3M)とア
ラキン酸のクロロホルム溶液(0.89×10-3M)を
モル比1:2の割合で混合し、この溶液を蒸留水
の液面上に一定量滴下し展開後、除々に圧縮する
ことにより、表面圧−占有面積曲線を測定した。
この曲線に固体凝縮相の存在がみられ、単分子膜
の形成が確認された。そこで表面圧を30dyn/cm
に設定し、単分子膜を形成させた。次にこのよう
にして形成された単分子膜を垂直浸せき法によ
り、石英板に移しとり、単分子膜10層から成る
累積膜を作製した。この累積膜の吸収スペクトル
は360nmに吸収極大を有し、これにキセノンラン
プを光源とし、フイルター(コーニング0−52)
を用いて300nm以上の光照射を行うと、吸光度は
除々に減少していき、またこの照射した膜の赤外
吸収スペクトルでは二重結合の吸収(1610cm-1)
の減少がみられ、二重結合間で反応が起つたこと
が分かつた。10〜15分間光照射した膜はほとんど
一般の有機溶媒には不溶であるが、短時間、例え
ば2分間照射した膜はテトラヒドロフランに可溶
であり、ゲルパーミエーシヨンクロマトグラフイ
ーで調べた分子量は1200〜2500(2〜4量体)で
あつた。
実施例 4
アセトンから再結晶により精製した5,5′−
(1,4−フエニレン)−ビス(2−シアノ−2,
4−ペンタジエノイツク酸)ジ−n−アミルエス
テルのクロロホルム溶液(0.89×10-3M)とアラ
キン酸のクロロホルム溶液(0.89×10-3M)をモ
ル比1:5の割合で混合し、この溶液を塩化カド
ミウム水溶液(10-3M)の液面上に除々に滴下し
展開後、徐々に圧縮することにより、表面圧−占
有面積曲線を測定した。この曲線に固体凝縮相の
存在が見られ、単分子膜の形成が確認された。そ
こで表面圧を30dyn/cmに設定し、単分子膜を形
成させた。次にこの単分子膜を垂直浸せき法によ
り、石英板に移しとり、単分子膜6層から成る累
積膜を作製した。この混合累積膜の吸収スペクト
ルは360nmに吸収極大を有し、これにキセノンラ
ンプを光源とし、フイルター(コーニング0−
52)を用いて300nm以上の光照射を行うと吸光度
は徐々に減少した。この光照射した膜の赤外吸収
スペクトルでは二重結合の吸収(1610cm-1)の減
少がみられ、二重結合間で反応が起つたことが分
かつた。10〜15分間照射した膜はほとんど一般の
有機溶媒に不溶であるが、短時間、例えば2分間
照射した膜はテトラヒドロフランに可溶であり、
分子量は950〜2500(2〜4量体)であつた。5,5'-(1,4-phenylene)-bis(2-cyano-2,4-pentadieno The present invention provides a method for producing a thin film polymer, which comprises preparing a cumulative film made of a dialkyl ester of succinic acid or a mixture of this and an amphipathic compound, and then irradiating the film with light. The present invention will be explained in detail below. 5,5′- used as a monomer in the present invention
(1,4-phenylene)-bis(2-cyano-2,
The (4-pentadienoic acid) dialkyl ester has a structure represented by the general formula (), in which R is a saturated alkyl group having 5 to 20 carbon atoms. Although this substance has a hydrophobic group in its molecule, it was thought that it would not form a monomolecular film because it does not have a strong hydrophilic group. 2-cyano-2,4-pentadienoic acid) di-n-dodecyl ester forms a monomolecular film by itself. In addition, 5,5'-(1,4-phenylene)-bis(2-cyano-2,4-pentadienoic acid) dialkyl ester, which has a small number of carbon atoms in the alkyl group, can be mixed with an appropriate amphipathic compound. By doing so, a stable monomolecular film is formed on the surface of water or a liquid such as a cadmium chloride aqueous solution. The formation of such a monomolecular film is evident from the confirmation of the presence of a solid condensed phase in the surface pressure-occupied area curve. The amphiphilic compound as used in the present invention is a compound that has both a hydrophilic group and a hydrophobic group in its molecule, and such compounds usually have an alkyl group with 12 carbon atoms.
~20 long chain saturated fatty acids and long chain saturated alcohols are used. Examples of long-chain saturated fatty acids include tridecylic acid, myristic acid, pentadecylic acid, palmitic acid, heptadecylic acid, stearic acid, nonadecanoic acid, and arachidic acid. Examples of long-chain saturated alcohols include lauryl alcohol, tridecyl alcohol, myristyl alcohol, pentadecyl alcohol, cetyl alcohol, heptadecyl alcohol, stearyl alcohol, nonadecyl alcohol, and eicosyl alcohol. These amphiphilic compounds may be used alone or in combination of two or more. Next, one example of a suitable method for preparing the cumulative film will be explained. The ester alone or this and a suitable amphipathic compound are usually mixed in a molar ratio of 1:
After dissolving in an organic solvent such as chloroform at a ratio of 5 to 1:1, this solution is gradually dropped onto the surface of a liquid such as distilled water or an aqueous cadmium chloride solution.
5,5′-(1,4-phenylene)-bis(2-cyano-2,4-pentadienoic acid) dialkyl ester, or this and an amphiphilic compound, are compressed and placed on the liquid surface. A cumulative film is created by repeating the steps of forming a monomolecular film consisting of a mixture of the above and then transferring this monomolecular film onto a substrate such as a quartz plate. The absorption spectrum of the cumulative film created in this way has an absorption maximum at 360 nm, which is different from that of a crystal or solution (absorption maximum of 400 nm).
It can be seen that the cumulative film has a molecular arrangement different from that of crystals or solutions. When the cumulative film thus produced is irradiated with light using a xenon lamp or the like, addition polymerization easily occurs and a thin film-like polymer is obtained. For example, when a 10-layer film is irradiated with light of 420 nm or more, the absorbance in the ultraviolet absorption spectrum gradually decreases, while in the infrared absorption spectrum, the absorption of double bonds (1610 cm -1 ) decreases and It can be seen that a reaction occurred between the heavy bonds. The thin film obtained by such light irradiation is soluble in tetrahydrofuran, and has a molecular weight of about 1000 to 300 as measured by gel permeation chromatography. from these things,
It can be seen that the thin film is a dimer to pentamer low polymer having a cyclobutane ring produced by a cycloaddition reaction of double bonds. In this low polymer thin film,
When irradiated with light of 320 nm or more, the absorbance decreases,
The absorption maximum at 360 nm almost disappears. This is thought to be because the double bond reaction progresses further and becomes a high polymer, and the resulting thin film becomes difficult to dissolve in common organic solvents. This high polymer film is 290nm
When irradiated with the following light, depolymerization occurs and becomes a low polymer, and when this low polymer is irradiated with light of 320 nm or more, it becomes a high molecular weight polymer again. This indicates that the thin film polymer produced by the production method of the present invention has reversible depolymerizability by light. Since the thin film polymer has such properties and high mechanical strength, it can be used as a resist material in the production of electronic devices and microlithography. Effects of the Invention According to the method of the present invention, 5,5'-(1,4-phenylene)-bis(2-cyano-2,4-pentadienoic acid) dialkyl ester is used as a monomer, and the cumulative film is By irradiating with light, a thin film-like polymer can be easily produced. The thin film polymer obtained by the method of the present invention is reversibly depolymerizable by light and has good mechanical strength, so it can be used, for example, in the production of electronic devices, as a resist material in microlithography, or as a crosslinking agent. It is useful as a photosensitive material. Examples Next, the present invention will be explained in more detail with reference to Examples, but the present invention is not limited to these Examples in any way. Example 1 5, purified by several recrystallizations from acetone
5'-(1,4-phenylene)-bis(2-cyano-
Chloroform solution of di-n-dodecyl ester (2,4-pentadienoitsuccinic acid) (0.89×10 -3 M)
was gradually dropped onto the surface of an aqueous cadmium chloride solution (10 -3 M), expanded, and then compressed to form a monomolecular film. The presence of a solid condensed phase was confirmed from the surface pressure-occupied area curve at 20 to 30 dyn/cm, so the surface pressure was
A monomolecular film was formed by setting at 25 dyn/cm.
Next, the monomolecular film thus formed was transferred to a quartz plate by a vertical dipping method to produce a cumulative film consisting of 10 monomolecular film layers. This cumulative film is 360nm
It has an absorption maximum at It was shown that the reaction occurred between double bonds. A film irradiated with light for 15 minutes is almost insoluble in common organic solvents, but a film irradiated for a short time, for example 1 minute, is soluble in tetrahydrofuran, and the molecular weight determined by gel permeation chromatography is 1200~ 3000 (2~
pentamer). Example 2 5,5'- purified by recrystallization from acetone
(1,4-phenylene)-bis(2-cyano-2,
A chloroform solution of di-n-hexyl ester (4-pentadienoitsuccinic acid) (0.89 x 10 -3 M) and a chloroform solution of arachidic acid (0.89 x 10 -3 M) were mixed at a molar ratio of 1:5. This solution was gradually dropped onto the surface of a cadmium chloride aqueous solution (10 -3 M) and developed, and the surface pressure-occupied area curve was measured. The presence of a solid condensed phase was observed in this curve, confirming the formation of a monomolecular film. Therefore, the surface pressure
A monomolecular film was formed by setting at 25 dyn/cm. Next, the monomolecular film thus formed was transferred onto a quartz plate by a vertical dipping method to produce a cumulative film consisting of 10 monomolecular film layers. The absorption spectrum of this cumulative film has an absorption maximum at 360 nm, and when it is irradiated with light of 420 nm or more using a xenon lamp as a light source and a filter (Corning 3-72),
The absorbance gradually decreases, but there is an absorption maximum at 860 nm. The accumulated film after irradiation for 3 minutes was dissolved in tetrahydrofuran, and the molecular weight was examined by gel permeation chromatography, and it was found to be a dimer to pentamer. In addition to this low polymer
When irradiated with light above 320 nm, the absorption maximum decreased and almost disappeared. This membrane is insoluble in common organic solvents and is a high polymer. When this high polymer was irradiated with short wavelength light (λ < 290 nm), an absorption maximum at 360 nm gradually appeared, indicating depolymerization to a low polymer. When this low polymer is irradiated with light of 320 nm or more, it becomes a high polymer again, and the conversion from high polymer to low polymer proceeds reversibly by light. Example 3 5,5'- purified by recrystallization from acetone
(1,4-phenylene)-bis(2-cyano-2,
A chloroform solution of di-n-dodecyl ester (4-pentadienoitsuccinic acid) (0.89 x 10 -3 M) and a chloroform solution of arachidic acid (0.89 x 10 -3 M) were mixed at a molar ratio of 1:2. A fixed amount of this solution was dropped onto the surface of distilled water, developed, and then gradually compressed to measure the surface pressure-occupied area curve.
The presence of a solid condensed phase was observed in this curve, confirming the formation of a monomolecular film. Therefore, the surface pressure was set to 30dyn/cm.
was set to form a monomolecular film. Next, the monomolecular film thus formed was transferred onto a quartz plate by a vertical dipping method to produce a cumulative film consisting of 10 monomolecular film layers. The absorption spectrum of this cumulative film has an absorption maximum at 360 nm, and a xenon lamp is used as a light source, and a filter (Corning 0-52)
When irradiated with light of 300 nm or more, the absorbance gradually decreases, and the infrared absorption spectrum of the irradiated film shows double bond absorption (1610 cm -1 ).
A decrease was observed, indicating that a reaction occurred between double bonds. A film irradiated with light for 10 to 15 minutes is almost insoluble in common organic solvents, but a film irradiated for a short time, for example 2 minutes, is soluble in tetrahydrofuran, and the molecular weight determined by gel permeation chromatography is It was 1200-2500 (dimer-tetramer). Example 4 5,5'- purified by recrystallization from acetone
(1,4-phenylene)-bis(2-cyano-2,
A chloroform solution of di-n-amyl ester (4-pentadienoitsuccinic acid) (0.89 x 10 -3 M) and a chloroform solution of arachidic acid (0.89 x 10 -3 M) were mixed at a molar ratio of 1:5. This solution was gradually dropped onto the surface of a cadmium chloride aqueous solution (10 -3 M), developed, and then gradually compressed to measure the surface pressure-occupied area curve. The presence of a solid condensed phase was observed in this curve, confirming the formation of a monomolecular film. Therefore, the surface pressure was set to 30 dyn/cm to form a monomolecular film. Next, this monomolecular film was transferred to a quartz plate by a vertical dipping method to produce a cumulative film consisting of six monomolecular film layers. The absorption spectrum of this mixed cumulative film has an absorption maximum at 360 nm, and a xenon lamp is used as a light source, and a filter (Corning 0-
When irradiated with light of 300 nm or more using 52), the absorbance gradually decreased. The infrared absorption spectrum of the irradiated film showed a decrease in double bond absorption (1610 cm -1 ), indicating that a reaction occurred between double bonds. Membranes irradiated for 10 to 15 minutes are almost insoluble in common organic solvents, but membranes irradiated for a short time, for example 2 minutes, are soluble in tetrahydrofuran.
The molecular weight was 950-2500 (dimer-tetramer).
Claims (1)
ある) で表わされる5,5′−(1,4−フエニレン)−ビ
ス(2−シアノ−2,4−ペンタジエノイツク
酸)ジアルキルエステル又はこのものと両親媒性
化合物との混合物から成る累積膜を調製し、次い
でこれに光を照射することを特徴とする薄膜状重
合体の製造方法。[Claims] 1 5,5'-(1,4-phenylene)-bis(2- cyano-2,4-pentadienoitsuccinic acid) dialkyl ester or a mixture of this and an amphiphilic compound, and then irradiating the film with light. Production method.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3721988A JPH01213321A (en) | 1988-02-19 | 1988-02-19 | Production of novel thin film polymer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3721988A JPH01213321A (en) | 1988-02-19 | 1988-02-19 | Production of novel thin film polymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01213321A JPH01213321A (en) | 1989-08-28 |
| JPH0583086B2 true JPH0583086B2 (en) | 1993-11-24 |
Family
ID=12491479
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3721988A Granted JPH01213321A (en) | 1988-02-19 | 1988-02-19 | Production of novel thin film polymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01213321A (en) |
-
1988
- 1988-02-19 JP JP3721988A patent/JPH01213321A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01213321A (en) | 1989-08-28 |
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