JPH0584566B2 - - Google Patents
Info
- Publication number
- JPH0584566B2 JPH0584566B2 JP4575186A JP4575186A JPH0584566B2 JP H0584566 B2 JPH0584566 B2 JP H0584566B2 JP 4575186 A JP4575186 A JP 4575186A JP 4575186 A JP4575186 A JP 4575186A JP H0584566 B2 JPH0584566 B2 JP H0584566B2
- Authority
- JP
- Japan
- Prior art keywords
- magnetic
- substrate
- film
- electron beam
- soft magnetic
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000000758 substrate Substances 0.000 claims description 26
- 229910002796 Si–Al Inorganic materials 0.000 claims description 8
- 238000001704 evaporation Methods 0.000 claims description 8
- 230000008020 evaporation Effects 0.000 claims description 8
- 238000005566 electron beam evaporation Methods 0.000 claims description 7
- 239000000463 material Substances 0.000 claims description 7
- 238000000034 method Methods 0.000 claims description 6
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 2
- 229910052742 iron Inorganic materials 0.000 claims description 2
- 239000010703 silicon Substances 0.000 claims description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims 2
- 239000010408 film Substances 0.000 description 18
- 239000011162 core material Substances 0.000 description 8
- 230000004907 flux Effects 0.000 description 7
- 230000035699 permeability Effects 0.000 description 7
- 238000010894 electron beam technology Methods 0.000 description 5
- 239000013078 crystal Substances 0.000 description 3
- 238000000151 deposition Methods 0.000 description 3
- 230000008021 deposition Effects 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000007740 vapor deposition Methods 0.000 description 3
- 238000002441 X-ray diffraction Methods 0.000 description 2
- 229910045601 alloy Inorganic materials 0.000 description 2
- 239000000956 alloy Substances 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 239000000203 mixture Substances 0.000 description 2
- 239000011347 resin Substances 0.000 description 2
- 229920005989 resin Polymers 0.000 description 2
- 229910000702 sendust Inorganic materials 0.000 description 2
- 239000012790 adhesive layer Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000003247 decreasing effect Effects 0.000 description 1
- 239000000428 dust Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 230000005415 magnetization Effects 0.000 description 1
- 238000010791 quenching Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910000859 α-Fe Inorganic materials 0.000 description 1
Landscapes
- Magnetic Heads (AREA)
- Thin Magnetic Films (AREA)
Description
【発明の詳細な説明】
<技術分野>
本発明は電子ビーム蒸着法等の蒸着技術を用い
て形成した磁気ヘツドコアの製造方法に関するも
のである。DETAILED DESCRIPTION OF THE INVENTION <Technical Field> The present invention relates to a method of manufacturing a magnetic head core formed using a vapor deposition technique such as electron beam vapor deposition.
<従来技術>
近年、磁気記録技術の分野において、情報の多
様化に伴い記録密度の増大を求める要求が強まつ
ている。磁気記録の高密度化の一つの方法として
記録媒体の高保磁力化があり、それに対応すべく
高飽和磁束密度、高透磁率を有する磁気ヘツドコ
ア材料の開発が必要となつてきた。この様な材料
としては、フエライトには飽和磁束密度に限界が
あるため、合金系材料が適している。センダスト
合金は良く知られているようにSi9.5wt%,
Al5.5wt%、残部Feを中心とした組成において、
高透磁率、高飽和磁束密度を有する材料である
が、磁気ヘツドコア作製において、バルクセンダ
ストはもろいため、精密加工が困難であり、ま
た、VTR等へ応用する場合には20μm程度のコア
厚が必要となり、その場合に高周波特性が不十分
である等の欠点がある。また、超急冷法によるセ
ンダンスト薄帯をヘツドコアとして用いる場合、
コア材を樹脂接着により非磁性基板で挾み込んで
いるが、樹脂接着は接着層の制御が困難である。
又、バルク部材やリボン薄帯から切削加工によつ
てトラツク幅を形成する場合、トラツク幅の制御
等は狭トラツクになる程困難になる。このため高
周波特性の優れたトラツク幅に相当するセンダス
ト薄膜を非磁性基板表面上にスパツタ法、あるい
は蒸着法により狭トラツク磁気ヘツドを作製する
方法が提案されている。<Prior Art> In recent years, in the field of magnetic recording technology, there has been an increasing demand for increased recording density due to the diversification of information. One way to increase the density of magnetic recording is to increase the coercive force of a recording medium, and in order to cope with this, it has become necessary to develop magnetic head core materials having high saturation magnetic flux density and high magnetic permeability. As such a material, since ferrite has a limit in saturation magnetic flux density, an alloy-based material is suitable. As is well known, Sendust alloy contains 9.5wt% Si.
In a composition centered on Al5.5wt% and the balance Fe,
Although it is a material with high magnetic permeability and high saturation magnetic flux density, it is difficult to precisely process bulk sender dust when making magnetic head cores because it is brittle, and a core thickness of about 20 μm is required when applied to VTRs, etc. In that case, there are drawbacks such as insufficient high frequency characteristics. In addition, when using Sendanst ribbon made by ultra-quenching method as a head core,
The core material is sandwiched between nonmagnetic substrates by resin adhesion, but it is difficult to control the adhesive layer with resin adhesion.
Furthermore, when the track width is formed by cutting from a bulk member or ribbon, control of the track width becomes more difficult as the track becomes narrower. For this reason, a method has been proposed in which a narrow track magnetic head is fabricated by sputtering or vapor deposition a Sendust thin film having excellent high frequency characteristics and corresponding to the track width on the surface of a nonmagnetic substrate.
<発明の目的>
本発明は電子ビーム蒸着法等による蒸着による
軟磁性膜形成時の下地基板温度を変化させ、磁気
特性の良好な結晶構造を得て加工性の良好な磁気
ヘツドコアを提供することを目的とする。<Object of the invention> The present invention provides a magnetic head core with good workability by changing the base substrate temperature during the formation of a soft magnetic film by evaporation using an electron beam evaporation method or the like to obtain a crystal structure with good magnetic properties. With the goal.
<実施例>
第1図は本発明の一実施例の説明に供する電子
ビーム蒸着装置の模式構成図である。<Example> FIG. 1 is a schematic diagram of an electron beam evaporation apparatus for explaining an example of the present invention.
真空ベルジヤ1内の上方には、蒸着用基板を蒸
着温度に加熱保持するためのヒータ2と蒸着膜が
形成される結晶化ガラス、セラミツク、感光性結
晶化ガラス、ガラス等から成る非磁性基板3が配
置されている。この非磁性基板3と蒸着源との間
には蒸着気流の通過を制御するシヤツタ4が介設
されている。また下方の蒸着源位置には電子ビー
ム発生用フイラメント5とフイラメント5で発生
した電子ビーム6の照射方向に配設されたるつぼ
(ハース)7があり、るつぼ7内には鉄60〜70wt
%、アルミニウム3〜6wt%、硅素20〜30wt%の
割合で構成した蒸着源材料8が載置されている。
電子ビーム6が蒸着源材料8に照射されるとその
部分の元素が蒸気流となつて飛翔し、シヤツタ4
の開成期間中シヤツタ4を通過して非磁性基板3
に被着し、蒸着膜が形成される。 Above the vacuum bellgear 1 are a heater 2 for heating and maintaining the deposition substrate at the deposition temperature, and a non-magnetic substrate 3 made of crystallized glass, ceramic, photosensitive crystallized glass, glass, etc. on which the deposition film is formed. is located. A shutter 4 is interposed between the nonmagnetic substrate 3 and the evaporation source to control the passage of the evaporation air flow. Further, at the lower evaporation source position, there is a filament 5 for generating an electron beam and a crucible (hearth) 7 arranged in the irradiation direction of the electron beam 6 generated by the filament 5.
%, aluminum in a proportion of 3 to 6 wt %, and silicon in a proportion of 20 to 30 wt %.
When the electron beam 6 is irradiated onto the evaporation source material 8, the elements in that area become a vapor flow and fly away, causing the shutter 4
The non-magnetic substrate 3 passes through the shutter 4 during the opening period.
A vapor deposited film is formed.
ここで電子ビーム蒸着法による軟磁性膜形成時
の下地基板温度の違いが、その上に成膜される軟
磁性膜の特性に及ぼす影響を調べるために、前記
蒸着源材料を用い100〜400℃の範囲で非磁性基板
温度を変化させ、その表面上に膜厚5μmのFe−
Si−Al系軟磁性膜を形成した。膜組成は走査型
電子顕微鏡のエネルギー分散型分析により測定し
たところFe86.0wt%,Si9.5wt%,Al4.5wt%で
あつた。この膜を600℃、6時間真空中で熱処理
を行つた後1MHzでの実効透磁率μ′、保磁力Hc、
飽和磁束密度Bs及び電気比抵抗ρを測定し、基
板温度との関係を調べた結果を第2図に示す。ま
た磁化曲線の応力の変化から判断すると磁歪λs
は正であつた。基板温度200℃〜350℃の非磁性基
板表面上に形成されたFe−Si−Al系軟磁性膜は
1MHzの実効透磁率が1800以上、保磁力1Oe以下、
飽和磁束密度11500G以上、電気比抵抗70μΩcm、
ビツカース硬度600を有する非常に優れた磁気特
性、耐摩耗性を有することが判明した。中でも基
板温度300℃で非磁性基板表面上に形成されたFe
−Si−Al系軟磁性膜は1MHzの実効透磁率が
3800、保磁力0.6Oe、飽和磁束密度12000Gを有す
る非常に優れた磁気特性を有するものであつた。
また基板温度100℃以下の非磁性基板表面上に形
成したFe−Si−Al系軟磁性膜は磁性膜を基板と
の密着性が悪く剥離した。次にX線回折による結
晶構造の基板温度依存性を第3図に示した。基板
温度の高温側で磁性膜は(100)配向となり磁気
特性が低下し、基板温度300℃(022)面のピーク
強度が強く磁気特性が最も優れていた。 Here, in order to investigate the influence of the difference in base substrate temperature during the formation of a soft magnetic film by electron beam evaporation on the characteristics of the soft magnetic film formed thereon, we used the above-mentioned evaporation source material and heated it to 100 to 400°C. The temperature of the nonmagnetic substrate was varied within the range of
A Si-Al based soft magnetic film was formed. The film composition was determined by energy dispersive analysis using a scanning electron microscope and was found to be 86.0 wt% Fe, 9.5 wt% Si, and 4.5 wt% Al. After heat-treating this film at 600℃ for 6 hours in vacuum, the effective magnetic permeability μ' at 1MHz, the coercive force Hc,
The saturation magnetic flux density Bs and electrical resistivity ρ were measured and the relationship with the substrate temperature was investigated. The results are shown in FIG. Also, judging from the change in stress in the magnetization curve, magnetostriction λs
was correct. The Fe-Si-Al soft magnetic film formed on the surface of a non-magnetic substrate at a substrate temperature of 200°C to 350°C is
Effective magnetic permeability at 1MHz is over 1800, coercive force is under 1Oe,
Saturation magnetic flux density 11500G or more, electrical resistivity 70μΩcm,
It was found to have excellent magnetic properties and wear resistance, with a Vickers hardness of 600. Among them, Fe formed on the surface of a nonmagnetic substrate at a substrate temperature of 300°C.
-Si-Al based soft magnetic film has an effective magnetic permeability of 1MHz.
3800, coercive force 0.6 Oe, and saturation magnetic flux density 12000 G. It had very excellent magnetic properties.
In addition, in the case of a Fe-Si-Al soft magnetic film formed on the surface of a non-magnetic substrate at a substrate temperature of 100° C. or less, the magnetic film had poor adhesion to the substrate and peeled off. Next, FIG. 3 shows the dependence of the crystal structure on the substrate temperature by X-ray diffraction. On the high side of the substrate temperature, the magnetic film became (100) oriented and its magnetic properties decreased, and the peak intensity at the (022) plane at a substrate temperature of 300°C was strongest and the magnetic properties were the best.
<発明の効果>
以上詳細に説明した如く、電子ビーム蒸着法に
よりFe−Si−Al系軟磁性膜を作成する際、基板
温度を200〜350℃に選択することにより、磁気特
性の良好な軟磁性膜が形成され、コアの透磁率が
改善出来、ひいては磁気ヘツド効率改善を図るこ
とが可能となる。<Effects of the Invention> As explained in detail above, when creating a Fe-Si-Al soft magnetic film by electron beam evaporation, by selecting the substrate temperature between 200 and 350°C, a soft magnetic film with good magnetic properties can be obtained. A magnetic film is formed, and the magnetic permeability of the core can be improved, thereby making it possible to improve the efficiency of the magnetic head.
第1図は本発明の一実施例の説明に供する電子
ビーム蒸着装置の模式構成図、第2図は基板温度
の異なる非磁性基板表面上に電子ビーム蒸着法に
より作製したFe−Si−Al系軟磁性膜の1MHzでの
実効透磁率、保磁力、飽和磁束密度及び電気比抵
抗の関係図、第3図は基板温度の異なる非磁性基
板表面上に電子ビーム蒸着法により作製したFe
−Si−Al系軟磁性膜のX線回折による結晶構造
の関係図である。
図中、1……真空ベルジヤ、2……ヒータ、3
……非磁性基板、4……シヤツタ、5……フイラ
メント、6……電子ビーム、7……るつぼ(ハー
ス)、8……蒸着源材料。
Fig. 1 is a schematic configuration diagram of an electron beam evaporation apparatus used to explain one embodiment of the present invention, and Fig. 2 shows a Fe-Si-Al system fabricated by electron beam evaporation on the surface of a non-magnetic substrate with different substrate temperatures. Figure 3 shows the relationship between the effective magnetic permeability, coercive force, saturation magnetic flux density, and electrical resistivity of soft magnetic films at 1MHz.
FIG. 2 is a relationship diagram of the crystal structure of a -Si—Al based soft magnetic film obtained by X-ray diffraction. In the figure, 1...vacuum bellgear, 2...heater, 3
... Nonmagnetic substrate, 4 ... Shutter, 5 ... Filament, 6 ... Electron beam, 7 ... Crucible (hearth), 8 ... Evaporation source material.
Claims (1)
電子ビーム蒸着法によりFe−Si−Al系軟磁性膜
を、前記非磁性基板表面温度を200℃〜350℃の条
件のもとで成膜することを特徴とする磁気ヘツド
コアの製造方法。 2 前記軟磁性膜の蒸着源材料が鉄60〜70wt%、
アルミニウム3〜6wt%、硅素20〜30wt%の割合
で構成されていることを特徴とする特許請求の範
囲第1項に記載の磁気ヘツドコアの製造方法。[Claims] 1. To form a soft magnetic film on a non-magnetic substrate,
A method for manufacturing a magnetic head core, characterized in that a Fe-Si-Al based soft magnetic film is formed by electron beam evaporation under the condition that the surface temperature of the non-magnetic substrate is 200°C to 350°C. 2. The evaporation source material of the soft magnetic film is 60 to 70 wt% iron,
2. The method of manufacturing a magnetic head core according to claim 1, wherein the magnetic head core is comprised of 3 to 6 wt% of aluminum and 20 to 30 wt% of silicon.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4575186A JPS62202307A (en) | 1986-02-28 | 1986-02-28 | Production of magnetic head core |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4575186A JPS62202307A (en) | 1986-02-28 | 1986-02-28 | Production of magnetic head core |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62202307A JPS62202307A (en) | 1987-09-07 |
| JPH0584566B2 true JPH0584566B2 (en) | 1993-12-02 |
Family
ID=12728009
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4575186A Granted JPS62202307A (en) | 1986-02-28 | 1986-02-28 | Production of magnetic head core |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS62202307A (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0744110B2 (en) * | 1988-09-02 | 1995-05-15 | 松下電器産業株式会社 | High saturation magnetic flux density soft magnetic film and magnetic head |
-
1986
- 1986-02-28 JP JP4575186A patent/JPS62202307A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62202307A (en) | 1987-09-07 |
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