JPH0587933B2 - - Google Patents

Description

DETAILED DESCRIPTION OF THE INVENTION (Field of Industrial Application) The present invention relates to an ion beam apparatus for ion beam implantation, ion beam etching, ion beam deposition, etc.

(Prior Art) As shown in the explanatory diagram of FIG. 6, a conventional ion beam device accelerates ions emitted by an ion source 1 with an ion accelerating electrode 2 to form an ion beam 3. An electrostatic lens 4 was provided to control the ion beam 3. This electrostatic lens 4 consists of two annular electrode plates 4-1 and 4-2, and a predetermined voltage V is applied to these two electrode plates 4-1 and 4-2 to create an electrostatic field E. was generated to form an electrostatic lens. The ion beam 3 is controlled to have a constant profile using this electrostatic lens, and is irradiated onto the workpiece 5 fixed to the substrate table 6 to perform processing and formation.

(Problem to be Solved by the Invention) In the above-mentioned ion beam device, the inner peripheral area of the electrodes of the electrostatic lens, the interval between each electrode, the applied voltage, and the position of the electrostatic lens are fixed, so the irradiation area of the ion beam 3 is limited. Therefore, it is impossible to irradiate any part of the workpiece 5.

Furthermore, since there are many fixed elements as described above, it is difficult to control the trajectory of the ion beam 3.

SUMMARY OF THE INVENTION An object of the present invention is to solve the above-mentioned problems and provide an ion beam device that allows easy orbit control and easy changes in irradiation area and partial irradiation.

(Means for solving the problem) In order to achieve the above-mentioned object, in an ion beam apparatus provided with an ion source 1, an accelerating electrode 2, and an electrostatic lens 7, a front electrode 7-1 and a rear electrode 7-2 are provided.
An electrostatic lens 7 is provided movably along the ion traveling direction, and a front electrode 7-1 and a rear electrode 7-2 of the electrostatic lens 7 are provided along a plane perpendicular to the ion traveling direction. The blade 9 is configured such that one end of the blade 9 is pivotally supported by a rotation shaft 10 so as to be rotatable along the above-mentioned plane.

(Function) As described above, the present invention achieves
It is possible to change the cross-sectional area of the ion beam extracted from the ion accelerating electrode. It is also possible to change the irradiation position on the workpiece by rotating only the position of the electrostatic lens and a part of the blade of the electrode.

Furthermore, by completely squeezing all the blades,
It can be used as a temporary shutter.

(Example) FIG. 1 is a layout diagram of main parts of an ion beam apparatus of the present invention. An ion accelerating electrode 2 is provided on the ion emitting surface of an ion source 1 held on a base (not shown), and a front electrode 7-1 and a rear electrode 7 of an electrostatic lens 7 are sequentially arranged on the same center line as the ion source 1. −
2 is held slidably in the direction of the center line, and a workpiece 5 is disposed on the center line on the opposite side from the ion source 1. Second
The figure shows the structure of the electrode part of the electrostatic lens 7. A is when all the links 12 are attached so that all the blades 9 rotate uniformly, B is when there is only one link 12, and the other links are 12 is removed. Each arc-shaped blade 9 is rotatably supported at one end by a rotation shaft 10 arranged at equal intervals on the same circumference of the frame 15, and the tip of the blade 9 is rotatably supported at one end thereof. Frame 15 above on the side
It is connected by a link 12 to a movable ring 11 provided on the outside of the holder. Above movable ring 1
Reference numeral 1 denotes a drive motor 13 provided outside the frame 15, which is slidably held on the frame 15 so as to be rotatable in either forward or reverse directions. Frame 15 above
is held by an arm 14 on a base (not shown) so as to be slidable in the direction of the center line.

Next, the operation of the ion beam apparatus of the present invention will be explained.

First, the operations of the front electrode 7-1 and rear electrode 7-2 of the electrostatic lens 7 will be explained. The solid line in FIG. 2A is for the maximum diameter. When the movable ring 11 is rotated counterclockwise from this state, the blades 9 are pushed by the link 12 and rotated about the rotation shaft 10 in the direction of the center line. Since each blade 9 rotates in the same way, the area of the inner diameter portion surrounded by each blade 9 is reduced as shown by the chain line.

The figure shows a case where only one link 12 is left and the other links 12 are removed. In this case, the center position 16' of the opening can be moved to the outside from the center position 16 in case A. It is.

Next, the operation in the case shown in FIG. 2A will be explained.
In this case, as shown in the explanatory diagram of FIG. 3, each electrode is symmetrically focused on the center line, and the front electrode 7-1 is operated with a large aperture, and the rear electrode is operated with a small aperture. The ion beam 3 that has passed through the ion accelerating electrode 2 is converged in the direction of the center line by the front electrode 7-1, shaped parallel to the center line by the rear electrode 7-2, and received as a controlled ion beam 8 with a small diameter. Irradiate the workpiece 5.

In the case of FIG. 2B, as shown in the explanatory diagram of FIG. 4, the front electrode 7-1 is narrowed symmetrically to the center line, as in the case of A, and has a large aperture as described above. The rear electrode 7-2 is connected to the blade 9 as shown in FIG.
Of these, only one or a few adjacent ones are selected. As a result, the ion beam 3 that has passed through the ion accelerating electrode 2 is converged in the center line direction at the front electrode 7-1, and then shifted at the rear electrode 7-2 to form a new center line (center position 16'). ) The workpiece 5 is partially irradiated with an ion beam 8' controlled along the ion beam 8'.

Furthermore, as another method of use, as shown in FIG. It was used as a temporary shutter.

(Effects of the Invention) As described above, the present invention provides the position of the electrostatic lens 7,
The irradiation range and irradiation position of the workpiece can be adjusted by adjusting the aperture size and center position of the front electrode 7-1 and rear electrode 7-2, and the voltage applied between both electrodes 7-1 and 7-2. Control can be performed easily.

It can also be used as a temporary shutter.

[Brief explanation of drawings]

Figure 1 is a layout diagram of the main parts of the ion beam device of the present invention, Figure 2 is a structural diagram of the electrode part of an electrostatic lens, A is a state diagram in which all blades rotate uniformly, and B is a diagram in which all blades rotate uniformly. Fig. 3 is an explanatory diagram of the operation in the case of Fig. 2 A, Fig. 4 is an explanatory diagram of the operation in the case of Fig. 2 B, and Fig. 5 is an explanation of the operation as a shutter. 6 are explanatory diagrams of the operation of a conventional ion beam device. 1...Ion source, 2...Ion acceleration electrode, 7...
...Electrostatic lens, 7-1... Front electrode, 7-2...
Rear electrode, 9... blade, 10... rotating shaft, 11...
...Movable ring, 12...link.

Claims (1)

[Claims] 1. In an ion beam device that includes an ion source, an acceleration electrode that accelerates ions emitted from the ion source, and an electrostatic lens that shapes the accelerated ion beam, an electrostatic lens that includes a front electrode and a rear electrode. is provided movably along the ion traveling direction, and the front and rear electrodes of the electrostatic lens are composed of a plurality of blades provided along a plane perpendicular to the ion traveling direction, one end of which is rotatable. An ion beam device that is rotatably supported on a shaft along the above-mentioned plane.