JPH0588904B2 - - Google Patents
Info
- Publication number
- JPH0588904B2 JPH0588904B2 JP30965787A JP30965787A JPH0588904B2 JP H0588904 B2 JPH0588904 B2 JP H0588904B2 JP 30965787 A JP30965787 A JP 30965787A JP 30965787 A JP30965787 A JP 30965787A JP H0588904 B2 JPH0588904 B2 JP H0588904B2
- Authority
- JP
- Japan
- Prior art keywords
- epoxy resin
- weight
- filler
- test
- resin composition
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 22
- 239000003822 epoxy resin Substances 0.000 claims description 20
- 229920000647 polyepoxide Polymers 0.000 claims description 20
- 239000000203 mixture Substances 0.000 claims description 16
- 239000000945 filler Substances 0.000 claims description 14
- 239000000843 powder Substances 0.000 claims description 12
- 239000000377 silicon dioxide Substances 0.000 claims description 9
- 239000003795 chemical substances by application Substances 0.000 claims description 7
- 239000002245 particle Substances 0.000 claims description 5
- 238000012360 testing method Methods 0.000 description 18
- 229910000679 solder Inorganic materials 0.000 description 12
- 239000012778 molding material Substances 0.000 description 8
- 229920003986 novolac Polymers 0.000 description 7
- 238000007789 sealing Methods 0.000 description 7
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 6
- 229920005989 resin Polymers 0.000 description 6
- 239000011347 resin Substances 0.000 description 6
- 238000005476 soldering Methods 0.000 description 6
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 6
- ADCOVFLJGNWWNZ-UHFFFAOYSA-N antimony trioxide Chemical compound O=[Sb]O[Sb]=O ADCOVFLJGNWWNZ-UHFFFAOYSA-N 0.000 description 4
- 230000007423 decrease Effects 0.000 description 4
- 239000005350 fused silica glass Substances 0.000 description 4
- 230000008642 heat stress Effects 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 239000011342 resin composition Substances 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 3
- 125000003700 epoxy group Chemical group 0.000 description 3
- 238000002156 mixing Methods 0.000 description 3
- 230000035882 stress Effects 0.000 description 3
- KXGFMDJXCMQABM-UHFFFAOYSA-N 2-methoxy-6-methylphenol Chemical compound [CH]OC1=CC=CC([CH])=C1O KXGFMDJXCMQABM-UHFFFAOYSA-N 0.000 description 2
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 2
- 239000000654 additive Substances 0.000 description 2
- 239000006229 carbon black Substances 0.000 description 2
- 230000000052 comparative effect Effects 0.000 description 2
- XXBDWLFCJWSEKW-UHFFFAOYSA-N dimethylbenzylamine Chemical compound CN(C)CC1=CC=CC=C1 XXBDWLFCJWSEKW-UHFFFAOYSA-N 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 229920001568 phenolic resin Polymers 0.000 description 2
- 239000005011 phenolic resin Substances 0.000 description 2
- 239000003566 sealing material Substances 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 1
- 239000004593 Epoxy Substances 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 1
- 235000013869 carnauba wax Nutrition 0.000 description 1
- 239000004203 carnauba wax Substances 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 239000003086 colorant Substances 0.000 description 1
- 238000013329 compounding Methods 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- -1 curing accelerator Substances 0.000 description 1
- 125000000113 cyclohexyl group Chemical class [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003063 flame retardant Substances 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 1
- CAYGQBVSOZLICD-UHFFFAOYSA-N hexabromobenzene Chemical compound BrC1=C(Br)C(Br)=C(Br)C(Br)=C1Br CAYGQBVSOZLICD-UHFFFAOYSA-N 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- 229920001296 polysiloxane Polymers 0.000 description 1
- 238000011417 postcuring Methods 0.000 description 1
- 229920002545 silicone oil Polymers 0.000 description 1
- 229920002379 silicone rubber Polymers 0.000 description 1
- 229920001187 thermosetting polymer Polymers 0.000 description 1
- 238000001721 transfer moulding Methods 0.000 description 1
Landscapes
- Compositions Of Macromolecular Compounds (AREA)
- Epoxy Resins (AREA)
Description
(産業上の利用分野)
本発明は、耐半田ストレス性に優れた、電子部
品等の封止用エポキシ樹脂組成物に関するもので
ある。
(従来技術)
従来、ダイオード、トランジスタ、集積回路等
の電子部品を熱硬化性樹脂で封止しているが、特
に集積回路では耐熱性、耐湿性に優れたo−クレ
ゾールノボラツクエポキシ樹脂をノボラツク型フ
エノール樹脂で硬化させたエポキシ樹脂が用いら
れている。
ところが近年、集積回路の高集積化に伴いチツ
プがだんだん大型化し、かつパツケージは従来の
DIPタイプから表面実装化された小型、薄型のフ
ラツトパツケージ、SOP、SOJ、PLCCに変わつ
てきている。
即ち大型チツプを小型で薄いパツケージに封入
することになり、応力によるクラツク発生、これ
らのクラツクによる耐湿性の低下等の問題が大き
くクローズアツプされてきている。
特に半田づけの工程において急激に200℃以上
の高温にさらされることによりパツケージの割れ
や樹脂とチツプの剥離により耐湿性が劣化してし
まうといつた問題点がでてきている。
これらの大型チツプを封止するのに適した、信
頼性の高い封止用樹脂成物の開発が望まれてきて
いる。
(発明の目的)
本発明の目的とするところは、半田熱ストレス
によるクラツク発生をおさえ、耐湿性に優れた信
頼性の高い封止用樹脂組成物を提供するにある。
(発明の構成)
本発明はエポキシ樹脂、硬化剤、硬化促進剤及
び充填剤からなるエポキシ樹脂組成物において、
全組成物中に充填剤を50〜90重量%含み、該充填
中に平均粒径が5〜40μm、見掛け密度0.1〜0.6
g/c.c.であり、かつ比表面積が5〜20m2/gであ
る多孔質のシリカ粉末を10〜100重量%含むこと
を特徴とするエポキシ樹脂組成物に関するもので
ある。
本発明のエポキシ樹脂組成物は従来の封止用樹
脂組成物に比べて非常に優れた耐半田熱ストレス
性を有したものである。
本発明に用いるエポキシ樹脂としては、その分
子中にエポキシ基をすくなくとも2個以上有する
化合物であれば分子構造、分子量などは特に制限
はなく、一般に封止用材料として使用されている
ものであり、例えばノボラツク系エポキシ樹脂、
ビスフエノール型の芳香族系、シクロヘキサン誘
導体の脂環式系、更には多官能系、シリコン変性
樹脂系があげられ、これらのエポキシ樹脂は1種
又は2種以上混合して用いられる。
又硬化剤としてはノボラツク型フエノール樹脂
系およびこれらの変性樹脂であり、例えばフエノ
ールノボラツク、o−クレゾールノボラツクの他
アルキル変性したフエノールノボラツク樹脂等が
あげられ、これらは単独もしくは2種以上混合し
て使用しても差し支えがない。
エポキシ樹脂と硬化剤の配合比はエポキシ樹脂
のエポキシ基と硬化剤の水酸基との当量比が0.5
〜5の範囲内に有ることが望ましい。
当量比が0.5未満又は5を越えたものは耐湿性、
成形作業性及び硬化物の電気特性が悪くなるので
好ましくない。
本発明に使用される硬化促進剤はエポキシ基と
フエノール性水酸基との反応を促進するものであ
ればよく、一般に封止用材料に使用されているも
のを広く使用することができ、例えばジアザビシ
クロウデセン(DBU)、トリフエニルホスフイン
(TPP)、ジメチルベンジルアミン(BDMA)や
2メチルイミダゾール(2MZ)等が単独もしく
は2種以上混合して用いられる。
本発明に用いられる充填剤としては、平均粒径
が5〜40μmであり、見掛け密度が0.1〜0.6g/c.c.
であり、かつ比表面積が5〜20m2/gである多孔
質シリカ粉末を、使用する充填剤量の10〜100重
量%の範囲で使用する。
多孔質シリカ粉末は、その平均粒径が5μm未
満、又は40μmを越えると流動性が低下し、いず
れの場合も好ましくない。
又見掛け密度が0.6g/c.c.を越えると半田熱ス
トレスによるクラツクが発生し易くなり、耐湿性
が低下してしまい好ましくない。
さらに比表面積が5m2/g未満であると半田づ
け工程でクラツクが発生し易く、耐湿性が低下し
てしまう。又20m2/g以上となれば流動性がいち
ぢるしく低下してしまい好ましくない。
さらに多孔質シリカ粉末が、使用充填剤の量の
10重量%以下であれば半田づけ工程でクラツクが
発生しやすくなり、耐湿性が低下し、その目的と
する特性が得られない。
これらの充填剤は全体として樹脂組成物の50〜
90重量%配合する事が望ましい。その配合量が50
%未満であれば耐熱性、機械的特性および耐湿性
が劣り、90%以上であれば流動性が低下し、成形
性が悪くなり実用には適さない。
又、多孔質シリカ粉末以外の充填剤としては通
常のシリカ粉末やアルミナ等があげられ、とくに
熔融シリカ粉末が好ましい。
本発明の封止用エポキシ樹脂組成物はエポキシ
樹脂、硬化剤、硬化促進剤及び多孔質シリカ粉末
充填剤を必須成分とするが、これ以外に必要に応
じてシランカツプリング剤、ブロム化エポキシ樹
脂、三酸化アンチモン、ヘキサブロムベンゼン等
の難燃剤、カーボンブラツク、ベンガラ等の着色
剤、天然ワツクス、合成ワツクス等の離型剤及び
シリコンオイル、ゴム等の低応力添加剤等の種々
の添加剤を適宜配合しても差し支えがない。
又、本発明の封止用エポキシ樹脂組成物を成形
材料として製造するには、エポキシ樹脂、硬化
剤、硬化促進剤、充填剤、その他の添加剤をミキ
サー等によつて十分に均一に混合した後、さらに
熱ロールまたはニーダー等で熔融混練し、冷却後
粉砕して成形材料とすることができる。これらの
成形材料は電子部品あるいは電気部品の封止、被
覆、絶縁等に適用することができる。
(発明の効果)
本発明のエポキシ樹脂組成物は半田づけ工程に
よる急激な温度変化による熱ストレスを受けたと
きの耐クラツク性に非常に優れ、耐湿性の良い組
成物であり、電子、電気部品の封止用、被覆用、
絶縁用等に用いた場合、特に表面実装パツケージ
に搭載された高集積大型チツプICにおいて信頼
性が非常に高い製品を得ることができる。
(実施例)
実施例 1
o−クレゾールノボラツクエポキシ樹脂(軟化
点65℃、エポキシ当量200) 100重量部
フエノールノボラツク樹脂 50重量部
トリフエニルホスフイン 1重量部
三酸化アンチモン粉末 18重量部
カルナバワツクス 2重量部
カーボンブラツク 2重量部
熔融シリカ粉末 328重量部
多孔質シリカ粉末
(平均粒径15μm、見掛け密度0.3g/c.c.、比表
面積7m2/g) 43重量部
γ−グリシドメトキシシラン 3重量部
をリボンブレンダーで常温で混合し、70〜100℃
で2軸ロールにより混練し、冷却後粉砕し成形材
料とした。
得られた成形材料をタブレツト化し、低圧トラ
ンスフアー成形機にて175℃、70Kg/cm2、120秒の
条件で半田クラツク試験用として6×6mmのチツ
プを52pパツケージに封止し、又半田耐湿性試験
用として3×6mmのチツプを16pSOPパツアケー
ジに封止した。
封止したテスト用素子について、175℃、8時
間ポストキユア後下記の半田クラツク試験及び半
田耐湿性試験をおこなつた。
半田クラツク試験:封止したテスト用素子を85
℃、85%RHの環境下で24Hrおよび48Hr処理し、
その後260℃の半田槽に10秒間浸漬後顕微鏡で外
部クラツクを観察した。
半田耐湿性試験:封止したテスト用素子を85
℃、85%RHの環境下で72Hr処理し、その後260
℃の半田槽に10秒間浸漬後プレツシヤークツカー
試験(125℃、100%RH)を行い回路のオープン
不良を測定した。
試験結果を第1表に示す。
実施例 2〜4
第1表の処方に従つて配合し、実施例1と同様
にして成形材料を得て、この成形材料で試験用の
封止したものを得た。この成形材料を用いて実施
例1と同様にテスト用素子を封止して半田クラツ
ク試験及び半田耐湿性試験を行つた。
試験結果を第1表に示す。
比較例 1
実施例1において充填剤をすべて熔融シリカと
し
(Field of Industrial Application) The present invention relates to an epoxy resin composition for sealing electronic components and the like, which has excellent solder stress resistance. (Prior art) Conventionally, electronic components such as diodes, transistors, and integrated circuits have been encapsulated with thermosetting resin, but especially for integrated circuits, o-cresol novolac epoxy resin, which has excellent heat resistance and moisture resistance, has been encapsulated. Epoxy resin cured with type phenolic resin is used. However, in recent years, as integrated circuits have become more highly integrated, chips have become larger and larger, and packages have become smaller than conventional ones.
The DIP type has been replaced by small, thin, surface-mounted flat packages, SOP, SOJ, and PLCC. That is, a large chip is enclosed in a small and thin package, and problems such as the occurrence of cracks due to stress and a decrease in moisture resistance due to these cracks are becoming more and more important. Particularly in the soldering process, rapid exposure to high temperatures of 200°C or higher has caused problems such as cracking of the package and deterioration of moisture resistance due to peeling of the resin and chip. It has been desired to develop a highly reliable encapsulating resin composition suitable for encapsulating these large chips. (Objective of the Invention) An object of the present invention is to provide a highly reliable sealing resin composition which suppresses the occurrence of cracks due to soldering heat stress and has excellent moisture resistance. (Structure of the Invention) The present invention provides an epoxy resin composition comprising an epoxy resin, a curing agent, a curing accelerator, and a filler.
The total composition contains 50 to 90% by weight of filler, and the filling has an average particle size of 5 to 40 μm and an apparent density of 0.1 to 0.6.
The present invention relates to an epoxy resin composition characterized by containing 10 to 100% by weight of porous silica powder having a specific surface area of 5 to 20 m 2 /g. The epoxy resin composition of the present invention has extremely superior solder heat stress resistance compared to conventional sealing resin compositions. The epoxy resin used in the present invention is not particularly limited in molecular structure, molecular weight, etc. as long as it is a compound having at least two or more epoxy groups in its molecule, and is generally used as a sealing material. For example, novolak epoxy resin,
Examples include bisphenol type aromatic type, alicyclic type of cyclohexane derivative, polyfunctional type, and silicone modified resin type, and these epoxy resins may be used alone or in combination of two or more types. The curing agent may be a novolak type phenolic resin or a modified resin thereof, such as phenol novolak, o-cresol novolak, or alkyl-modified phenol novolak resin, which may be used alone or in combination of two or more. There is no problem in using it. The compounding ratio of the epoxy resin and the curing agent is that the equivalent ratio of the epoxy group of the epoxy resin to the hydroxyl group of the curing agent is 0.5.
It is desirable that it be within the range of ~5. If the equivalence ratio is less than 0.5 or more than 5, it is moisture resistant.
This is not preferable because it deteriorates molding workability and the electrical properties of the cured product. The curing accelerator used in the present invention may be one that promotes the reaction between epoxy groups and phenolic hydroxyl groups, and a wide variety of those commonly used in sealing materials can be used, such as diaza. Bicycloudecene (DBU), triphenylphosphine (TPP), dimethylbenzylamine (BDMA), 2methylimidazole (2MZ), etc. are used alone or in combination of two or more. The filler used in the present invention has an average particle size of 5 to 40 μm and an apparent density of 0.1 to 0.6 g/cc.
A porous silica powder having a specific surface area of 5 to 20 m 2 /g is used in an amount of 10 to 100% by weight of the filler used. If the average particle size of the porous silica powder is less than 5 μm or more than 40 μm, the fluidity will decrease, and either case is not preferable. Moreover, if the apparent density exceeds 0.6 g/cc, cracks due to soldering heat stress are likely to occur, and moisture resistance will decrease, which is undesirable. Further, if the specific surface area is less than 5 m 2 /g, cracks are likely to occur during the soldering process and moisture resistance will be reduced. Moreover, if it exceeds 20 m 2 /g, the fluidity will drop significantly, which is not preferable. In addition, porous silica powder can reduce the amount of filler used.
If it is less than 10% by weight, cracks tend to occur during the soldering process, moisture resistance decreases, and the desired characteristics cannot be obtained. These fillers collectively account for 50 to 50% of the resin composition.
It is desirable to mix 90% by weight. Its blending amount is 50
If it is less than 90%, the heat resistance, mechanical properties and moisture resistance will be poor, and if it is more than 90%, the fluidity will be reduced and the moldability will be poor, making it unsuitable for practical use. In addition, examples of fillers other than porous silica powder include ordinary silica powder and alumina, with fused silica powder being particularly preferred. The epoxy resin composition for sealing of the present invention contains an epoxy resin, a curing agent, a curing accelerator, and a porous silica powder filler as essential components. , flame retardants such as antimony trioxide and hexabrombenzene, colorants such as carbon black and red iron, mold release agents such as natural wax and synthetic wax, and low stress additives such as silicone oil and rubber. There is no problem in appropriately blending them. Furthermore, in order to produce the epoxy resin composition for sealing of the present invention as a molding material, the epoxy resin, curing agent, curing accelerator, filler, and other additives are thoroughly and uniformly mixed using a mixer or the like. Thereafter, the mixture is further melt-kneaded using a hot roll or a kneader, cooled, and then crushed to obtain a molding material. These molding materials can be applied to sealing, covering, insulating, etc. electronic or electrical components. (Effects of the Invention) The epoxy resin composition of the present invention has excellent crack resistance when subjected to heat stress due to sudden temperature changes during the soldering process, and is a composition with good moisture resistance. For sealing, coating,
When used for insulation purposes, products with extremely high reliability can be obtained, especially in highly integrated large chip ICs mounted on surface mount packages. (Example) Example 1 o-Cresol novolak epoxy resin (softening point 65°C, epoxy equivalent 200) 100 parts by weight Phenol novolak resin 50 parts by weight Triphenylphosphine 1 part by weight Antimony trioxide powder 18 parts by weight Carnauba wax Tuxus 2 parts by weight Carbon black 2 parts by weight Fused silica powder 328 parts by weight Porous silica powder (average particle size 15 μm, apparent density 0.3 g/cc, specific surface area 7 m 2 /g) 43 parts by weight γ-glycidomethoxysilane 3 parts by weight Mix the parts with a ribbon blender at room temperature and heat to 70-100℃.
The mixture was kneaded using twin-screw rolls, cooled, and then ground to obtain a molding material. The obtained molding material was made into a tablet, and a 6 x 6 mm chip was sealed in a 52p package for a solder crack test using a low-pressure transfer molding machine at 175°C, 70 kg/cm 2 and 120 seconds, and solder moisture resistant. A 3 x 6 mm chip was sealed in a 16 pSOP package for performance testing. After post-curing the sealed test device at 175° C. for 8 hours, the following solder crack test and solder moisture resistance test were conducted. Solder crack test: 85 times the sealed test element
℃, 24Hr and 48Hr treatment under 85%RH environment,
After that, it was immersed in a solder bath at 260°C for 10 seconds, and external cracks were observed using a microscope. Solder moisture resistance test: 85 times the sealed test element
℃, 72Hr treatment under 85%RH environment, then 260℃
After being immersed in a solder bath at ℃ for 10 seconds, a pressure vacuum test (125℃, 100% RH) was performed to measure open defects in the circuit. The test results are shown in Table 1. Examples 2 to 4 Molding materials were obtained in the same manner as in Example 1 by blending according to the formulations in Table 1, and sealed products for testing were obtained with this molding material. Using this molding material, a test element was sealed in the same manner as in Example 1, and a solder crack test and a solder moisture resistance test were conducted. The test results are shown in Table 1. Comparative Example 1 In Example 1, all the fillers were fused silica.
【表】【table】
【表】
た以外はすべて実施例1と同様にし試験を行つた
結果を第1表に示す。
比較例 2
実施例4の充填剤を総て熔融シリカとし、あと
は実施例4と同様にし、試験を行つた結果を第1
表に示す。[Table] Table 1 shows the results of a test conducted in the same manner as in Example 1 except for the following. Comparative Example 2 The filler in Example 4 was all fused silica, the rest was carried out in the same manner as in Example 4, and the results of the test were shown in the first example.
Shown in the table.
Claims (1)
剤からなるエポキシ樹脂組成物において、全組成
物中に充填剤を50〜90重量%含み、該充填剤中に
平均粒径が5〜40μm、見掛け密度0.1〜0.6g/c.c.
であり、かつ比表面積が5〜20m2/gである多孔
質のシリカ粉末を10〜100重量%含むことを特徴
とするエポキシ樹脂組成物。1. In an epoxy resin composition consisting of an epoxy resin, a curing agent, a curing accelerator, and a filler, the total composition contains 50 to 90% by weight of the filler, and the filler has an average particle size of 5 to 40 μm and an apparent Density 0.1~0.6g/cc
An epoxy resin composition comprising 10 to 100% by weight of porous silica powder having a specific surface area of 5 to 20 m 2 /g.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30965787A JPH01152151A (en) | 1987-12-09 | 1987-12-09 | Epoxy resin composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP30965787A JPH01152151A (en) | 1987-12-09 | 1987-12-09 | Epoxy resin composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01152151A JPH01152151A (en) | 1989-06-14 |
| JPH0588904B2 true JPH0588904B2 (en) | 1993-12-24 |
Family
ID=17995693
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP30965787A Granted JPH01152151A (en) | 1987-12-09 | 1987-12-09 | Epoxy resin composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01152151A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH062799B2 (en) * | 1988-04-20 | 1994-01-12 | 住友ベークライト株式会社 | Epoxy resin composition for semiconductor encapsulation |
| ATE226222T1 (en) * | 1999-06-17 | 2002-11-15 | Arakawa Chem Ind | EPOXY RESIN COMPOSITION AND METHOD FOR PRODUCING SILANE-MODIFIED EPOXY RESINS |
| JP2002363384A (en) * | 2001-06-13 | 2002-12-18 | Sumitomo Bakelite Co Ltd | Epoxy resin composition and semiconductor device |
| JP4866056B2 (en) * | 2005-10-26 | 2012-02-01 | 吉川工業株式会社 | Epoxy resin composition |
| JP2008144784A (en) | 2006-12-06 | 2008-06-26 | Nok Corp | Packing and sealing system |
-
1987
- 1987-12-09 JP JP30965787A patent/JPH01152151A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01152151A (en) | 1989-06-14 |
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