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JPH059841B2 - - Google Patents
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JPH059841B2 - - Google Patents

Info

Publication number
JPH059841B2
JPH059841B2 JP58099701A JP9970183A JPH059841B2 JP H059841 B2 JPH059841 B2 JP H059841B2 JP 58099701 A JP58099701 A JP 58099701A JP 9970183 A JP9970183 A JP 9970183A JP H059841 B2 JPH059841 B2 JP H059841B2
Authority
JP
Japan
Prior art keywords
head
comb teeth
monitor
pattern
film magnetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP58099701A
Other languages
Japanese (ja)
Other versions
JPS59223919A (en
Inventor
Takao Yamano
Masaru Doi
Yoshiaki Shimizu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sanyo Electric Co Ltd
Original Assignee
Sanyo Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sanyo Electric Co Ltd filed Critical Sanyo Electric Co Ltd
Priority to JP9970183A priority Critical patent/JPS59223919A/en
Publication of JPS59223919A publication Critical patent/JPS59223919A/en
Publication of JPH059841B2 publication Critical patent/JPH059841B2/ja
Granted legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G11INFORMATION STORAGE
    • G11BINFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
    • G11B5/00Recording by magnetisation or demagnetisation of a record carrier; Reproducing by magnetic means; Record carriers therefor
    • G11B5/127Structure or manufacture of heads, e.g. inductive
    • G11B5/31Structure or manufacture of heads, e.g. inductive using thin films
    • G11B5/3163Fabrication methods or processes specially adapted for a particular head structure, e.g. using base layers for electroplating, using functional layers for masking, using energy or particle beams for shaping the structure or modifying the properties of the basic layers
    • G11B5/3166Testing or indicating in relation thereto, e.g. before the fabrication is completed

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Magnetic Heads (AREA)

Description

【発明の詳細な説明】 (イ) 産業上の利用分野 本発明は薄膜磁気ヘツドの製造方法に関し、特
にギヤツプ・デプスを正確に規定することが出来
るようにしたものである。
DETAILED DESCRIPTION OF THE INVENTION (a) Field of Industrial Application The present invention relates to a method for manufacturing a thin film magnetic head, and in particular to a method that allows the gap depth to be defined accurately.

(ロ) 従来技術 第1図は薄膜磁気ヘツドの基本構造を示し、基
板1に下部のヘツドコア・パターン2を形成し、
その上に第1絶縁体層3を形成し、次いでこの第
1絶縁体層3上にコイル・パターン4を形成した
後第2絶縁体層5を形成し、その上に上部のヘツ
ドコア・パターン6を形成して構成されている。
そして、この様な薄膜磁気ヘツドにおいてもその
製造最終工程においてバルク型ヘツド(例えばビ
デオ・ヘツド)と同様にテープ対接面側の研摩を
行なう必要があり、その際バルク型ヘツドと異な
る点は各パターン形成後接着されるシールド兼用
保護板の存在によりギヤツプ・デプスを直接観察
出来ないという謂うことである。更に、高密度記
録を目的としている薄膜磁気ヘツドではそのギヤ
ツプ・デプスの要求精度も厳しくなり時間制御に
よる研摩では不十分であつた。そのため、第2図
に示す如くヘツドコアの両側に三角形状のモニタ
ーパターン7,7′を別途形成して、テープ対接
面側の研摩時(例えばA−A′線まで研摩した時)
に研摩面側に露出した部分の長さlを測定するこ
とでギヤツプ・デプスを算出してその研摩量を制
御したり、第3図に示す如くモニターパターン
8,8′を夫々長さの異なる複数の櫛歯状に形成
してテープ対接面側の研摩時(例えばB−B′線
で研摩した時)に研摩面側に露出した櫛歯数にて
ギヤツプ・デプスを規定し研摩量を制御する方法
がとられており、特に後者の場合は研摩量(即
ち、ギヤツプ・デプス)をデジタル的に知ること
が出来、研摩面からの観察が容易で且つ測定誤差
が少なく歩留りを向上させることが出来る。尚、
9はシールド兼用保護板、10は接着層である。
ところが、斯る場合においても問題があり、具体
的にはデプス・エンドから夫々異なるギヤツプ・
デプス長を規定しているモニターパターンの各櫛
歯部が細く且つそれに対する膜厚が比較的厚いた
め、またレジストの密着不足等にもよつて斯るパ
ターン形成時に各櫛歯部の先端部分が第4図実線
で示す形状に(即ち、サイドエツジが大きく)な
り、設計形状である第4図点線形状との間に誤差
αを生じ、ギヤツプ・デプスを正確に規定するこ
とが出来なかつた。
(b) Prior art Figure 1 shows the basic structure of a thin film magnetic head, in which a lower head core pattern 2 is formed on a substrate 1,
A first insulating layer 3 is formed thereon, a coil pattern 4 is formed on this first insulating layer 3, a second insulating layer 5 is formed, and an upper head core pattern 6 is formed thereon. It is composed of the following.
In the final manufacturing process of such a thin-film magnetic head, it is necessary to polish the tape-contacting surface in the same way as for bulk-type heads (such as video heads). This is because the gap depth cannot be directly observed due to the presence of a protective plate that also serves as a shield and is bonded after pattern formation. Furthermore, thin-film magnetic heads intended for high-density recording require strict gap and depth accuracy, and time-controlled polishing is insufficient. Therefore, as shown in Fig. 2, triangular monitor patterns 7 and 7' are separately formed on both sides of the head core, so that when polishing the surface facing the tape (for example, when polishing up to line A-A'),
By measuring the length l of the part exposed on the polishing surface side, the gap depth can be calculated and the amount of polishing can be controlled. It is formed into a plurality of comb teeth, and when polishing the tape contacting surface side (for example, when polishing along the B-B' line), the gear depth is determined by the number of comb teeth exposed on the polishing surface side, and the amount of polishing is determined. In particular, in the latter case, the amount of polishing (i.e., gap depth) can be known digitally, making it easy to observe from the polished surface, reducing measurement errors, and improving yield. I can do it. still,
Reference numeral 9 indicates a protection plate which also serves as a shield, and 10 indicates an adhesive layer.
However, even in such a case, there is a problem;
Because each comb tooth portion of the monitor pattern that defines the depth length is thin and the film thickness is relatively thick, the tip of each comb tooth portion may become thinner during pattern formation due to lack of resist adhesion. The shape is shown by the solid line in FIG. 4 (that is, the side edges are large), and an error α occurs between the shape and the design shape shown by the dotted line in FIG. 4, making it impossible to accurately define the gap depth.

(ハ) 発明の目的 本発明は斯る点に鑑み成されたもので、上記し
た問題点を解決し所望のギヤツプ・デプスを精度
よく得ることが出来る薄膜磁気ヘツドの製造方法
を提供しようとするものである。
(c) Purpose of the Invention The present invention has been made in view of the above points, and aims to provide a method for manufacturing a thin film magnetic head that can solve the above-mentioned problems and obtain a desired gap depth with high precision. It is something.

(ニ) 発明の構成 即ち、本発明は上記した目的を達成するべく基
板上にヘツドコア並びにコイル用等の各パターン
を夫々形成して薄膜磁気ヘツドを構成する際に、
1つ若しくは複数のヘツドコアの両側にギヤツ
プ・デプスを規定するためのモニターパターンを
形成し、該モニターパターンはヘツドコアのテー
プ対接面側とは反対側に夫々深さの異なる複数の
櫛歯が形成されており、而してテープ対接面側の
研摩時に研摩面側に露出したモニターパターンの
欠落櫛歯数にてギヤツプ・デプスを規定するよう
にしたものである。
(d) Structure of the Invention That is, in order to achieve the above-mentioned object, the present invention provides a method for constructing a thin-film magnetic head by forming patterns for a head core, a coil, etc. on a substrate, respectively.
A monitor pattern for defining the gap depth is formed on both sides of one or more head cores, and the monitor pattern includes a plurality of comb teeth each having a different depth formed on the side of the head core opposite to the tape facing surface. The gap depth is defined by the number of missing comb teeth in the monitor pattern exposed on the polished surface side during polishing of the surface facing the tape.

(ホ) 実施例 以下、本発明の一実施例について図面と共に説
明する。尚、従来と同一構成要素については同一
図番を附すと共にその説明を省略する。
(E) Embodiment An embodiment of the present invention will be described below with reference to the drawings. Note that the same drawing numbers are given to the same components as in the prior art, and the explanation thereof will be omitted.

即ち、本発明に依れば第5図に示す如き形状の
モニターパターン11,11′をコイル用パター
ンの形成と同時に蒸着或いはスパツタ等の薄膜作
成技術及び写真蝕技術により形成したものであ
り、斯るモニターパターン11,11′はヘツド
コア6のテープ対接面側とは反対側に深さの異な
る複数の櫛歯11a1…11a1′…が形成されてお
り、テープ対接面側と同一線上に位置した一側端
11b,11b′側から段階的に変わる各櫛歯の深
さを規定する切欠部11c1…11c1′…までの距
離にて研摩量を規制するようにしている。
That is, according to the present invention, the monitor patterns 11, 11' having the shape shown in FIG. 5 are formed simultaneously with the formation of the coil pattern by a thin film forming technique such as vapor deposition or sputtering, and by a photoetching technique. The monitor patterns 11, 11' are formed with a plurality of comb teeth 11a1 ... 11a1 '...of different depths on the opposite side of the head core 6 from the tape contacting surface, and are arranged on the same line as the tape contacting surface. The amount of polishing is regulated by the distance from the one side ends 11b , 11b' located at the notches 11c 1 .

即ち、テープ対接面側の研摩時(例えばC−
C′線まで研摩した時)に光学顕微鏡による光学的
観察にて研摩面側に露出したモニターパターンの
欠落櫛歯数を数えることによつて残余のギヤツ
プ・デプスを知ることが出来る。
That is, when polishing the tape contacting surface (for example, C-
The remaining gap depth can be determined by counting the number of missing comb teeth of the monitor pattern exposed on the polished surface side through optical observation using an optical microscope.

また、第6図は斯るモニターパターンを用いて
ギヤツプ・デプスを光学的にではなく電気的に測
定するようにした他の実施例を示し、具体的には
モニターパターン11,11′の各櫛歯11a1
11a1′…に対応して夫々電気的に接続される接
続パターン12,12′を別途形成したものであ
る。尚、接続パターン12,12′はモニターパ
ターン11,11′と同時形成することが工程上
望ましい。この様にすれば接続パターン12,1
2′のa−bi、a′−bi′(=1、2、…7)間の電
気的導通の正否によつてギヤツプ・デプスを把握
することが出来、例えばa−b4、a′−b4′まで導
通、a−b5、a′−b5′以後断線の状態では研摩は第
6図のD−D′線まで進んでいることが判る。尚、
この様な電気的測定方法ではターミナルへの接続
の手間および断線直前の確認等による微細な測定
が困難等の欠点はあるが、研摩治具への装填等に
よりレンズ系を近付け得ず光学的観察の不可能な
場合に非常に有効となる。
Further, FIG. 6 shows another embodiment in which the gap depth is measured electrically rather than optically using such a monitor pattern. Specifically, FIG. Teeth 11a 1 ...
Connection patterns 12, 12' are separately formed to be electrically connected to each other in correspondence with 11a 1 '. Incidentally, it is desirable for the process to form the connection patterns 12, 12' at the same time as the monitor patterns 11, 11'. In this way, connection pattern 12,1
The gap depth can be determined by checking the electrical continuity between a-bi and a'-b i ′ (=1, 2,...7) of 2'. For example, a-b 4 , a' It can be seen that the polishing has progressed to the line D-D' in FIG. 6 in a state where the wire is electrically conductive up to -b 4 ' and disconnected after a-b 5 and a'-b 5 '. still,
Although this electrical measurement method has drawbacks such as the trouble of connecting to the terminal and the difficulty of making minute measurements due to checking immediately before disconnection, etc., the lens system cannot be brought close due to loading the polishing jig, etc., making it difficult to perform optical observation. It is very effective in impossible cases.

(ヘ) 発明の効果 上述した如く本発明に依れば1つ若しくは複数
のヘツドコアの両側に形成されるモニターパター
ンに、ヘツドコアのテープ対接面側とは反対側に
夫々深さの異なる複数の櫛歯を形成して、斯る櫛
歯部の根本部分にてギヤツプ・デプスを規制(即
ち、テープ対接面側から櫛歯部の根本までの距離
にて規制)するようにしているため、レジストの
密着不足等により設計形状との間に誤差を生じる
櫛歯部の先端部分をギヤツプ・デプスの規定にも
ちいていた従来方法に比べて、所望のギヤツプ・
デプスを精度よく得ることが出来る。
(F) Effects of the Invention As described above, according to the present invention, a monitor pattern formed on both sides of one or more head cores has a plurality of monitor patterns having different depths on the side opposite to the tape facing surface of the head core. Since comb teeth are formed and the gap depth is regulated at the base of the comb teeth (i.e., regulated by the distance from the tape facing surface to the base of the comb teeth), Compared to the conventional method, which uses the tip of the comb teeth to define the gap depth, which causes errors with the designed shape due to insufficient adhesion of the resist, it is easier to obtain the desired gap depth.
Depth can be obtained with high accuracy.

【図面の簡単な説明】[Brief explanation of the drawing]

第1図は薄膜磁気ヘツドの基本構造例を示す外
観斜視図、第2図a,bが従来のモニターパター
ン形成例を示す平面図とそのA−A′断面図、第
3図a,bはその他のモニターパターン形成例を
示す平面図とそのB−B′断面図、第4図はその
要部拡大図、第5図a,bは本考案の一実施例で
あるモニターパターン形成例を示す平面図とその
C−C′断面図、第6図は他の実施例を示す平面図
である。 1…基板、2…下部ヘツドコア、6…上部ヘツ
ドコア、11,11′…モニターパターン、11
11〜118,11a1′〜11a8′…櫛歯。
Fig. 1 is an external perspective view showing an example of the basic structure of a thin film magnetic head, Figs. A plan view and a sectional view taken along line B-B' of another example of forming a monitor pattern, FIG. 4 is an enlarged view of the main part thereof, and FIGS. A plan view and a sectional view taken along the line C-C', and FIG. 6 is a plan view showing another embodiment. DESCRIPTION OF SYMBOLS 1... Board, 2... Lower head core, 6... Upper head core, 11, 11'... Monitor pattern, 11
11 to 11 8 , 11a 1 ′ to 11a 8 ′...Comb teeth.

Claims (1)

【特許請求の範囲】 1 基板上にヘツドコア並びにコイル用等の各パ
ターンを夫々形成して薄膜磁気ヘツドを構成する
際に、1つ若しくは複数のヘツドコアの両側にギ
ヤツプ・デプスを規定するためのモニターパター
ンを形成し、該モニターパターンはヘツドコアの
テープ対接面側とは反対側に夫々深さの異なる複
数の櫛歯が形成されるとともに、ヘツドコアのテ
ープ対接面側において前記複数の櫛歯の端が直線
上に連設されており、而してテープ対接面側の研
摩時に研摩面側に露出したモニターパターンの欠
落櫛歯数にてギヤツプ・デプスを規定する事を特
徴とした薄膜磁気ヘツドの製造方法。 2 前記基板上に前記モニターパターンの各櫛歯
に対応して夫々電気的に接続される接続パターン
を形成し、該接続パターンの電気的導通状態によ
つて前記ギヤツプ・デプスを把握することを特徴
とする特許請求の範囲第1項記載の薄膜磁気ヘツ
ドの製造方法。
[Claims] 1. A monitor for defining the gap depth on both sides of one or more head cores when forming a thin film magnetic head by forming patterns for head cores, coils, etc. on a substrate. The monitor pattern includes a plurality of comb teeth having different depths formed on the opposite side of the head core from the tape contacting surface, and a plurality of comb teeth having different depths on the tape contacting surface of the head core. A thin film magnetic film whose ends are arranged in a straight line, and the gear depth is determined by the number of missing comb teeth of the monitor pattern exposed on the polished surface during polishing of the tape contact surface. Head manufacturing method. 2. A connection pattern is formed on the substrate to be electrically connected to each comb tooth of the monitor pattern, and the gap depth is determined based on the electrical continuity state of the connection pattern. A method of manufacturing a thin film magnetic head according to claim 1.
JP9970183A 1983-06-03 1983-06-03 Production for thin film magnetic head Granted JPS59223919A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP9970183A JPS59223919A (en) 1983-06-03 1983-06-03 Production for thin film magnetic head

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP9970183A JPS59223919A (en) 1983-06-03 1983-06-03 Production for thin film magnetic head

Publications (2)

Publication Number Publication Date
JPS59223919A JPS59223919A (en) 1984-12-15
JPH059841B2 true JPH059841B2 (en) 1993-02-08

Family

ID=14254355

Family Applications (1)

Application Number Title Priority Date Filing Date
JP9970183A Granted JPS59223919A (en) 1983-06-03 1983-06-03 Production for thin film magnetic head

Country Status (1)

Country Link
JP (1) JPS59223919A (en)

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5629832A (en) * 1979-08-10 1981-03-25 Nec Corp Manufacture for thin film magnetic head
JPS5794923A (en) * 1980-12-05 1982-06-12 Hitachi Ltd Polishing method for thin-film ceramic head
JPS57162115A (en) * 1981-03-30 1982-10-05 Nec Corp Thin-film magnetic head element
JPS5852631U (en) * 1981-10-02 1983-04-09 松下電器産業株式会社 Thin film magnetic head connection device

Also Published As

Publication number Publication date
JPS59223919A (en) 1984-12-15

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