JPH06100406B2 - Entrance / exit structure of constant temperature bath - Google Patents
Entrance / exit structure of constant temperature bathInfo
- Publication number
- JPH06100406B2 JPH06100406B2 JP22039685A JP22039685A JPH06100406B2 JP H06100406 B2 JPH06100406 B2 JP H06100406B2 JP 22039685 A JP22039685 A JP 22039685A JP 22039685 A JP22039685 A JP 22039685A JP H06100406 B2 JPH06100406 B2 JP H06100406B2
- Authority
- JP
- Japan
- Prior art keywords
- constant temperature
- pipe
- temperature bath
- shutter
- entrance
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 4
- 230000008014 freezing Effects 0.000 description 4
- 238000007710 freezing Methods 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000002411 adverse Effects 0.000 description 2
- 239000007789 gas Substances 0.000 description 2
- 230000008407 joint function Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 229910052757 nitrogen Inorganic materials 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 238000007664 blowing Methods 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 210000000078 claw Anatomy 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 230000007246 mechanism Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000000452 restraining effect Effects 0.000 description 1
Description
【発明の詳細な説明】 〔発明の利用分野〕 本発明は、ICハンドラに設けられる低温恒温槽の入口、
及び出口の構造に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Use of the Invention] The present invention relates to an inlet of a low temperature oven provided in an IC handler,
And the structure of the outlet.
〔発明の背景〕 ICハンドラは、多数のICを順次に搬送してこれを測定用
ソケットに装着し、離脱せしめた後、測定結果に基づい
て該多数のICを分類・搬出する自動機である。[Background of the Invention] An IC handler is an automatic machine that sequentially conveys a large number of ICs, attaches the ICs to a measurement socket, detaches the ICs, and then sorts and ejects the ICs based on the measurement results. .
上記の測定条件は、被測定物であるICの仕様に基づいて
定められる。そして、測定の温度条件に関しては常温に
比して高温の場合(例えば160℃)も有り、常温の場合
もあり、低温(例えば−40℃)の場合も有る。この為、
ICハンドラには通常、高温若しくは低温の恒温槽が設け
られる。The above measurement conditions are determined based on the specifications of the IC to be measured. Regarding the temperature condition for measurement, there are cases where the temperature is higher than room temperature (for example, 160 ° C.), there are cases where it is room temperature, and there are cases where it is low temperature (for example −40 ° C.). Therefore,
The IC handler is usually provided with a high or low temperature constant temperature bath.
ICハンドラ内におけるICの搬送にはシュートレールが多
く用いられる。また、取扱い対象のICには、厚形,薄
形,PLCC型など各種のICが含まれる。第5図は厚形IC1を
シュートレールで搬送している状態の斜視図、第6図は
薄形IC1′を搬送している状態の斜視図、第7図はPLCC
型IC1″を搬送している状態の斜視図である。A chute rail is often used for IC transportation in the IC handler. The ICs to be handled include various types such as thick type, thin type and PLCC type. Fig. 5 is a perspective view of a thick IC1 being transported by a chute rail, Fig. 6 is a perspective view of a thin IC1 'being transported, and Fig. 7 is a PLCC.
FIG. 9 is a perspective view showing a state where the mold IC1 ″ is being conveyed.
上記のシュートレールは一般に傾斜を付して設置し、IC
を重力で滑走させる場合が多いが、垂直に設置される場
合や水平に設置される場合も有る。シュートレールを水
平に設置した場合は、例えば爪送り手段など、適宜の搬
送駆動手段が設けられる。The above shoot rails are generally installed with an inclination, and
In many cases, it is slid by gravity, but it may be installed vertically or horizontally. When the chute rail is installed horizontally, an appropriate transport driving unit such as a claw feeding unit is provided.
第4図は、従来一般に用いられている低温恒温槽の1例
を示し、その入口付近の断面を描いてある。FIG. 4 shows an example of a low temperature constant temperature bath generally used conventionally and shows a cross section near the inlet.
恒温槽2内には、パイプ3から液化窒素を送入し、槽内
を−40℃に保つ。Liquefied nitrogen is fed into the constant temperature bath 2 through a pipe 3 to keep the temperature of the bath at -40 ° C.
シュートレール4は、恒温槽2の端部の壁2aに設けられ
た入口開口2bを通過するように設置されており、多数の
IC1a,1b〜1fを矢印a,b,cの如く案内する。The chute rail 4 is installed so as to pass through the inlet opening 2b provided in the wall 2a at the end of the constant temperature bath 2,
Guide ICs 1a, 1b to 1f as shown by arrows a, b, c.
5は、入口開口2bを覆って設置されたシャッタで、ICが
通過する時のみ開かれ、ICが通過しないときは閉じられ
る。このシャッタ5の開閉駆動は、ICの通過を検出する
センサ(図示せず)の出力信号に基づいて自動制御機構
(図示せず)によって行われる。Reference numeral 5 denotes a shutter installed so as to cover the entrance opening 2b, which is opened only when the IC passes and closed when the IC does not pass. The opening / closing drive of the shutter 5 is performed by an automatic control mechanism (not shown) based on the output signal of a sensor (not shown) that detects passage of the IC.
恒温槽2内に外気が流入しないよう、恒温槽2内は僅か
に正圧(例えば大気よりも数ミリバール高圧)に保たれ
る。The inside of the constant temperature bath 2 is kept at a slightly positive pressure (for example, several mbar higher than the atmospheric pressure) so that the outside air does not flow into the constant temperature bath 2.
このため、シャッタ5を設けた個所から矢印dの如く僅
かな気体漏洩を生じることは避け難い。For this reason, it is inevitable that a slight gas leak will occur from the location where the shutter 5 is provided, as indicated by the arrow d.
上記の漏洩気体は−40℃であるため、シャッタ5に霜が
付着してその開閉作動を妨げる虞れが有る。こうした問
題は、恒温槽2を貫通しているシュートレール4の出口
付近においても発生する。Since the leaked gas has a temperature of -40 [deg.] C., frost may adhere to the shutter 5 to hinder its opening / closing operation. Such a problem also occurs near the exit of the shoot rail 4 penetrating the constant temperature bath 2.
本発明は上述の事情に鑑みて為されたもので、恒温槽出
入口のシャッタに霜が付着して凍りつく虞れの無い、更
にはシャッタを省略することも出来る出入口構造を提供
しようとするものである。The present invention has been made in view of the above circumstances, and is intended to provide an entrance / exit structure in which there is no risk of frost adhering to the shutter of the entrance and exit of the constant temperature tank and freezing, and further the shutter can be omitted. is there.
上記の目的を達成する為、本発明の出入口構造は、常温
よりも低温の恒温槽を貫通してICの搬送路を設けたICハ
ンドラにおいて、前記搬送路が恒温槽の壁を貫通してい
る個所に設けられた開口部の上縁に沿ってパイプを配設
するとともに、該パイプにエアーを噴出するノズル孔を
設け、かつ前記のパイプを中心軸の回りに回動可能に支
承すると共に該パイプ内にドライエアーを圧送する手段
を設けたことを特徴とする。In order to achieve the above object, the entrance / exit structure of the present invention is an IC handler in which a carrier path for an IC is provided by penetrating a thermostat at a temperature lower than room temperature, and the carrier path penetrates a wall of the thermostat. A pipe is provided along the upper edge of an opening provided at a location, a nozzle hole for ejecting air is provided in the pipe, and the pipe is rotatably supported about a central axis and It is characterized in that means for pumping dry air is provided in the pipe.
次に、本発明の1実施例を第1図乃至第3図について説
明する。Next, one embodiment of the present invention will be described with reference to FIGS.
第1図は本発明の恒温槽出入口構造の1実施例を示す断
面図である。FIG. 1 is a cross-sectional view showing one embodiment of the constant temperature bath inlet / outlet structure of the present invention.
第2図は第1図のII−II断面図、第3図は同じくIII部
拡大詳細図である。2 is a sectional view taken along the line II-II of FIG. 1, and FIG. 3 is an enlarged detailed view of the same section III.
この実施例は、第4図に示した従来例に本発明を適用し
て改良したもので、第4図と同一の図面参照番号を付し
たIC1a〜1f、恒温槽2、パイプ3、及びシュートレール
4は従来例におけると同様乃至類似の構成部材である。
本実施例においてはシャッタ5を設けていない。This embodiment is obtained by applying the present invention to the conventional example shown in FIG. 4 to improve it. ICs 1a to 1f, a constant temperature chamber 2, a pipe 3 and a chute having the same drawing reference numbers as in FIG. The rail 4 is a component similar to or similar to that in the conventional example.
In this embodiment, the shutter 5 is not provided.
第2図に示すように、本実施例においては5本のシュー
トレール4-5,4-2〜4-5を平行に設置してある。1a-1〜1
a-5は上記それぞれのシュートレールによって搬送され
ているICである。As shown in FIG. 2, in this embodiment, five chute rails 4 -5 , 4 -2 to 4 -5 are installed in parallel. 1a -1 ~ 1
a- 5 is an IC carried by each of the above chute rails.
第1図に示すように、入口開口2bの上縁に沿ってパイプ
6を配設する。7,7′は上記パイプ6を回動可能に支承
している軸受である(第2,第3図参照)。上記のパイプ
6にはエアーを噴出させる為の透孔(ノズル孔)6aを列
設してある。As shown in FIG. 1, the pipe 6 is arranged along the upper edge of the inlet opening 2b. Reference numerals 7 and 7'indicate bearings that rotatably support the pipe 6 (see FIGS. 2 and 3). The pipe 6 is provided with through holes (nozzle holes) 6a for ejecting air.
第3図に示した矢印Aはエアーの噴出方向を表わしてい
る。パイプ6を軸受7に対して回動させるとエアー噴出
方向矢印Aを自在に調節することができる。図示を省略
するが前記の軸受7にはパイプ6の回動を拘束する手段
を設けている。The arrow A shown in FIG. 3 represents the air ejection direction. When the pipe 6 is rotated with respect to the bearing 7, the air ejection direction arrow A can be freely adjusted. Although not shown, the bearing 7 is provided with means for restraining the rotation of the pipe 6.
図示を省略するが前記の軸受7はパイプ6に対してスイ
ベルジョイント機能を備えており、これを介して上記の
パイプ6内にドライエアーを圧送し得るように構成して
あり、上記ドライエアーの圧力調節手段を設けてある。Although not shown, the bearing 7 has a swivel joint function with respect to the pipe 6, and is configured so that dry air can be pressure-fed into the pipe 6 via the swivel joint function. Pressure adjusting means is provided.
従来装置(第4図)においても、シャッタ5の霜による
凍りつきを防止するため、該シャッタ5にドライエアー
を吹きつける試みは為されていたが、従来技術における
ドライエアーの吹きつけは、その方向及び圧力、特に方
向を調節する手段を備えていない為、該シャッタ5を開
いてICを通過させる際はドライエアーの吹きつけを停止
しなければならなかった。その理由は、ドライエアーの
吹きつけを継続しつつICの搬送(恒温槽2内への搬入)
を行おうとすると、風圧でICを吹き戻したり吹き飛ばし
たりする虞れが有ったからである。Even in the conventional apparatus (FIG. 4), an attempt was made to blow dry air to the shutter 5 in order to prevent the shutter 5 from freezing due to frost. Also, since there is no means for adjusting the pressure, especially the direction, the blowing of dry air had to be stopped when the shutter 5 was opened to pass the IC. The reason is that the IC is transported while it continues to be blown with dry air (carrying into the constant temperature chamber 2).
This is because there is a risk that the IC blows back or is blown away by the wind pressure.
本発明者の実験によれば、噴出するドライエアーの流
速,流量を適正に選ぶと共に、その噴出方向を適宜に調
節すると、ドライエアー流によってICの搬送を妨げない
状態を探り当てることが出来る。上記の適正条件は、実
験的に求めておけば容易に再現せしめることができる。According to the experiments conducted by the inventor of the present invention, it is possible to find a state in which the IC is not conveyed by the dry air flow by appropriately selecting the flow velocity and flow rate of the dry air to be jetted and adjusting the jetting direction appropriately. The appropriate conditions described above can be easily reproduced by experimentally obtaining them.
特に、ICの型式が変わったとき(形状,寸法,重量が変
わったとき)、ドライエアーの噴出方向の調節によって
対応し得ることが実験によって確認された。In particular, experiments have confirmed that when the IC type changes (when the shape, size, and weight change), adjustment can be made by adjusting the direction of the dry air ejection.
本発明の実施例(第1図,第2図)を使用するには、パ
イプ3から恒温槽2内へ液化窒素を供給して該恒温槽2
内を−40℃に保ちつつ、パイプ6の透孔(ノズル孔)6a
からドライエアーを噴出させ、その噴出方向矢印AをIC
の型式に応じた適正方向に調節する。In order to use the embodiment of the present invention (FIGS. 1 and 2), liquefied nitrogen is supplied from the pipe 3 into the constant temperature bath 2 to bring the constant temperature bath 2 into consideration.
While maintaining the inside at -40 ℃, the through hole (nozzle hole) 6a of the pipe 6
The dry air is ejected from the IC, and the ejection direction arrow A is applied to the IC.
Adjust in the proper direction according to the model.
上記の状態においてはICの搬送が妨げられず、しかも、
ドライエアーの噴出流のエアーカーテン効果により恒温
槽2内と大気とが遮断される。このため、恒温槽の出入
口付近に結露したり、凍りついたりする虞れが無く、恒
温槽2内が目標温度に保たれる。更に、前述のエアーカ
ーテン効果により、本実施例の如くシャッタ5を省略し
ても恒温槽2内の条件保持に悪影響を及ぼさない。In the above state, the IC transportation is not hindered, and moreover,
Due to the air curtain effect of the jet stream of dry air, the inside of the thermostatic chamber 2 and the atmosphere are shut off. Therefore, there is no risk of dew condensation or freezing near the inlet / outlet of the constant temperature bath, and the inside of the constant temperature bath 2 is maintained at the target temperature. Further, due to the above-mentioned air curtain effect, even if the shutter 5 is omitted as in the present embodiment, the condition keeping in the constant temperature bath 2 is not adversely affected.
第1図乃至第3図から明らかなように、本実施例の入口
構造は極めて簡単であり、従って製造コストも安い。そ
の上、ドライエアーは止めたり噴出させたりといった制
御を必要とせず、同一条件でも連続的に噴出させておけ
ば良いので制御が容易である。As is clear from FIGS. 1 to 3, the inlet structure of this embodiment is extremely simple and therefore the manufacturing cost is low. In addition, the dry air does not require control such as stopping or jetting, and the jetting can be performed continuously even under the same conditions, so control is easy.
搬送されているICの型式が変更されると、パイプ6を回
動させて迅速・容易に順応することが出来る。When the type of IC being transported is changed, the pipe 6 can be rotated to adapt quickly and easily.
本実施例(第1図)は、恒温槽2の入口構造について述
べたがICの搬送方向矢印a,b,cを左右反転して考える
と、これをこの儘で恒温槽2の出口について適用するこ
とができる(この場合、図の入口開口2bは出口開口と呼
称されることになる。In the present embodiment (FIG. 1), the inlet structure of the thermostatic chamber 2 is described. However, when the IC carrying direction arrows a, b, and c are reversed left and right, this is applied to the outlet of the thermostatic chamber 2 at this time. (In this case, the inlet opening 2b in the figure will be referred to as the outlet opening.
以上詳述したように、本発明を適用すると低温恒温槽出
入口部のシャッタに霜が付着して凍りつく虞れが無く、
更には、恒温槽の機能に悪影響を及ぼさずにシャッタの
設置を省略することも可能である。シャッタの省略によ
って該シャッタの駆動,制御系統も省略されるので構造
が著しく簡単になり、設備コスト低減や保守整備工数の
低減に貢献するのみならず、シャッタの作動に関するト
ラブルを未然に防止してICハンドラの信頼性向上に貢献
するところ多大である。As described in detail above, when the present invention is applied, there is no risk of frost adhering to the shutter of the low temperature constant temperature bath inlet / outlet portion and freezing,
Furthermore, it is possible to omit the installation of the shutter without adversely affecting the function of the constant temperature bath. By omitting the shutter, the drive and control system of the shutter is also omitted, so the structure is remarkably simplified, which not only contributes to the reduction of equipment costs and maintenance and maintenance man-hours but also prevents troubles related to the operation of the shutter. It greatly contributes to the reliability improvement of the IC handler.
第1図は本発明の1実施例を示す断面図である。第2図
は第1図のII−II断面図、第3図は同じくIII部拡大詳
細図である。 第4図は従来の恒温槽出入口構造を示す断面図である。
第5図乃至第7図はそれぞれICをシュートレールで搬送
している状態を示す斜視図である。 2……恒温槽、2b……入口開口部、4……シュートレー
ル、5……シャッタ、6……パイプ、6a……ノズル孔、
7,7′……軸受。FIG. 1 is a sectional view showing one embodiment of the present invention. 2 is a sectional view taken along the line II-II of FIG. 1, and FIG. 3 is an enlarged detailed view of the same section III. FIG. 4 is a sectional view showing a conventional constant temperature tank inlet / outlet structure.
5 to 7 are perspective views showing a state in which the ICs are being conveyed by the chute rails. 2 ... Constant temperature bath, 2b ... Entrance opening, 4 ... Shoot rail, 5 ... Shutter, 6 ... Pipe, 6a ... Nozzle hole,
7,7 ′ …… Bearing.
Claims (1)
うに複数列の平行なICシュートレールを設けたICハンド
ラの恒温槽において、上記のシュートレールが恒温槽の
壁を貫通する個所に設けられた開口部の上縁に沿ってパ
イプを配設するとともに、該パイプにエアーを噴出する
ノズル孔を設け、かつ前記のパイプを中心軸の回りに回
動可能に支承すると共に該パイプ内にドライエアーを圧
送する手段を設けたことを特徴とする恒温槽の出入口構
造。1. A constant temperature tank for an IC handler, which is provided with a plurality of rows of parallel IC chute rails so as to pass through a constant temperature tank at a temperature lower than room temperature. A pipe is provided along the upper edge of the opened opening, a nozzle hole for ejecting air is provided in the pipe, and the pipe is rotatably supported around a central axis and is provided in the pipe. An inlet / outlet structure for a thermostatic chamber, characterized by being provided with means for feeding dry air.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22039685A JPH06100406B2 (en) | 1985-10-04 | 1985-10-04 | Entrance / exit structure of constant temperature bath |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22039685A JPH06100406B2 (en) | 1985-10-04 | 1985-10-04 | Entrance / exit structure of constant temperature bath |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6280476A JPS6280476A (en) | 1987-04-13 |
| JPH06100406B2 true JPH06100406B2 (en) | 1994-12-12 |
Family
ID=16750458
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22039685A Expired - Lifetime JPH06100406B2 (en) | 1985-10-04 | 1985-10-04 | Entrance / exit structure of constant temperature bath |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06100406B2 (en) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5145097B2 (en) | 2008-03-28 | 2013-02-13 | 本田技研工業株式会社 | Powder molding apparatus and stator manufacturing method |
-
1985
- 1985-10-04 JP JP22039685A patent/JPH06100406B2/en not_active Expired - Lifetime
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5145097B2 (en) | 2008-03-28 | 2013-02-13 | 本田技研工業株式会社 | Powder molding apparatus and stator manufacturing method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6280476A (en) | 1987-04-13 |
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