JPH06100685B2 - Color filter and manufacturing method thereof - Google Patents

Description

Detailed Description of the Invention [Industrial applications]

The present invention relates to a color filter used in various display devices such as a liquid crystal display device and a method for manufacturing the same, and more specifically, a color filter having high surface strength and smoothness, excellent accuracy, and an efficient method thereof. It relates to an economical manufacturing method.

[Prior art]

The conventional color filter and its manufacturing method are as follows. (A) A polymer film, which is provided on a transparent substrate and has excellent dyeability, is patterned by a photolithography method and left, and then dyed. (B) The same polymer film provided on a transparent substrate and having excellent dyeability, which is partially color-coded and dyed. (C) An inorganic active film layer provided on a transparent substrate, which is partially color-coded and dyed by a photolithography method. The photolithography method here is a method of forming a processing original plate having a required image and forming a resist image on a workpiece by using the original plate, photoresist, and light.

[Problems to be Solved by the Invention]

However, the above-mentioned color filter and the manufacturing method thereof have the following problems, respectively. That is, since the color filter in (a) is a polymer film having a patterned surface, unevenness corresponding to the thickness of the film is generated, and in comparison with an inorganic active film having excellent hardness due to the physical properties of the polymer. Much less strong. Further, in (b), although the color filter dyed by color is excellent in smoothness, the dye easily penetrates not only in the thickness direction of the polymer film but also in the lateral direction, so that bleeding and migration occur. Further, as in the case of (a), the strength of the polymer is poor due to its physical properties. Further, in (c), the photoresist is impregnated into the fine pores of the active film layer in the step of performing the photolithography method, and it takes time and effort to remove unnecessary resist. The residual component becomes an impurity, resulting in a color filter with reduced color purity, insufficient density, and uneven dyeing. Then, this invention aims at solving the said subject.

[Means for Solving the Problems]

The present invention is configured as follows to achieve the above object. That is, the color filter of the present invention is
An inorganic active film layer with fine pores impregnated with a polymer material is provided on a transparent substrate, and both the polymer material and the inorganic active film layer or only the polymer material is dyed into a desired pattern shape by photolithography. It is characterized by being The method for producing the color filter is characterized by having the following steps. (A) A step of forming an inorganic active film layer on a transparent substrate. (B) A step of impregnating the fine pores of the inorganic active film layer with a polymer material having excellent dyeability. (C) A step of dyeing both the polymer material and the inorganic active film layer or only the polymer material into a pattern shape using a photolithography method, and finally peeling and removing a resist image generated by the photolithography method. Hereinafter, the present invention will be described in detail with reference to the drawings. A schematic sectional view showing an embodiment of the color filter of the present invention is shown in FIGS. That is, the transparent substrate 1, the inorganic active film layer 2 formed thereon, the polymeric material 3 contained in a large number of fine pores of the inorganic active film layer 2 and dyed in a pattern shape, and the dyed in a pattern shape. The black mask 4 for shielding the gap between the formed color patterns and the color pattern and the overcoat layer 5 on the inorganic active film layer 2 are shown. Next, a method for manufacturing the color filter of the present invention will be described. First, the inorganic active film layer 2 is formed on the transparent substrate 1 (third embodiment).
(See FIG. (A)). The transparent substrate 1 may be used in various display devices such as a liquid crystal display, and is made of a heat resistant material capable of forming the inorganic active film layer 2 on the surface thereof. For example, a glass plate, a synthetic resin plate, a synthetic resin film, or the like is used, but a glass plate such as soda lime glass, boron silicate glass, or barium borosilicate glass is preferable. Next, on the transparent substrate 1, a transparent inorganic active film layer 2 having a large number of fine pores made of a metal inorganic oxide such as activated alumina, activated silica or a mixture of both is formed. As a method of forming the inorganic active film layer 2 on the transparent substrate 1, the use of the sol-gel method shown below is suitable. That is, the general formula M (OR1) m (OR2) nXpYq ... I (wherein M is selected from the group consisting of magnesium, calcium, zirconium, titanium, hafnium, germanium, yttrium, aluminum, gallium, tin, and silicon) R1 and R2 each represent a hydrogen atom, an alkyl group, or an acyl group, which may be the same or different.
Y represents a hydrogen atom, a chlorine atom or a hydroxyl group,
They may be the same or different. m ・ n ・
p · q is an integer of 0 to 8 and m + n + p + q is equal to the valence of M. ) Is obtained by hydrolyzing an aqueous solution of the compound represented by the formula (1) and then peptizing the obtained sol, and applying the sol to the transparent substrate 1 and baking. General formula I
Examples of the compound represented by are: tetraethyl silicate / aluminum triisopropoxide / titanium tetrabutoxide / zirconium tetrabutoxide or a partial hydrolyzate thereof. The aqueous liquid contains a necessary amount of water, a hydrolysis catalyst such as hydrochloric acid / sulfuric acid / nitric acid / acetic acid, and an alcohol. As a method of applying this sol on the transparent substrate 1, there are methods such as a bar coating method, a roll coating method, a spinner coating method and a dipping method. The inorganic active film layer 2 can be obtained by applying the sol as described above on the transparent substrate 1, drying it, and baking it at a temperature of 300 to 600 ° C. The thickness of the inorganic active film layer 2 is preferably about 1 to 20 μm. Further, it is also possible to use aluminum oxide obtained by anodizing an aluminum thin film provided on a transparent substrate by a sputtering method or a vapor deposition method. The inorganic active membrane layer 2 thus formed has a large number of fine pores on its surface, and the fine pores are impregnated with the polymer material 3 having excellent dyeability (see FIG. 3 (b)). . As the polymer material 3, a polymer material 3 having excellent dyeability such as gelatin, glue, casein, nylon, polyvinyl alcohol, polyvinylpyrrolidone is used. As a method for impregnating the fine pores of the inorganic active film layer 2 with the polymer material 3, a printing method, a spray method, a dipping method, a hand-drawing method, an ink jet method, a spinner method, a roll coating method, or the like can be used. In a film on the
The surface is washed, and the polymer material 3 is impregnated only in the fine pores, and then dried. In this way, the inorganic active film layer 2 in which the polymer material 3 is contained in the micropores is obtained, and the inorganic active film layer 2 is dyed into a pattern shape by a resist image provided by the photolithography method shown below (FIG. 3). (See (c)). First, a processing original plate having a required image pattern designed according to the use of the color filter is made. Polymer material 3
A photoresist is coated on the whole surface of the inorganic active film layer 2 in which is contained by a dipping method, a spray method, a roll coating method or the like and dried, and then a pattern of a color filter is exposed and developed using the processing original plate. This patterns the photoresist and forms a resist image. Next, the unmasked portion of the resist image is firstly treated with an acid dye, an acid mordant dye, a dye for aluminum, a direct dye or an oil-soluble dye by an appropriate method such as a dipping method, a spray method, a printing method or a coating method. After dyeing the color, the resist image that has been the mask is peeled off. Even after the second color, patterning the photoresist like this,
If you perform the steps of dyeing and photoresist removal as many times as necessary,
The color filter consists of multiple colors such as red, green, and blue. As a method for obtaining the pattern-shaped dyed portion, as described below in addition to the above, first, the first surface is dyed on the entire surface of the inorganic active film layer 2 impregnated with the polymer material 3 (FIG. 4 (c)). Form a resist image on the area where the color is required,
Unnecessary parts are decolorized with a decolorizing agent such as nitric acid, sulfuric acid, or sodium hypozincate (see FIG. 4 (d)), and a second color is dyed on the entire surface of the decolorized parts. There is also a method of forming a resist image (see FIG. 4 (e)), repeating each step of decolorization a required number of times, and finally removing the resist image (see FIG. 4). On the inorganic active film layer 2 dyed in the pattern shape obtained by the above method, a black mask 4 for increasing the contrast as a color filter may be provided, if necessary, such as a gap between the color patterns. It is provided at a different portion (see FIG. 3 (d)). The formation method is as follows: electroless plating method or PVD method (evaporation method, sputtering method, ion plating method, etc.) and a method of forming a metal film and etching (see FIG. 1), or photolithography. There is also a method of patterning and dyeing by a method to form a black portion and using it as the black mask 4 (see FIG. 2). The black mask 4 may be provided in a portion where a color pattern is not required before the inorganic active film layer 2 is impregnated with the polymer material 3, or the polymer may be provided in the fine pores of the inorganic active film layer 2. After impregnating the material 3, before the dyeing of the color pattern, the color pattern may be provided in a portion where the color pattern is not required. Further, an overcoat layer 5 may be provided on the inorganic active film layer 2 dyed with a color pattern, if necessary, in order to prevent the dye from scattering, dissipating, and fading due to humidity. The material of the overcoat layer 5 is an acrylic resin,
A hard and highly transparent resin such as a melamine resin, an epoxy resin, a silicon resin, an unsaturated polyester resin, an isocyanate resin, a polyimide, a polysiloxane, or an ultraviolet curable resin can be used. Further, an inorganic material such as lithium silicate or sodium silicate may be coated.

【Example】

First, an active alumina film layer having a thickness of 5 to 10 μm is formed by a sol-gel method on a transparent glass substrate having a thickness of 1.1 mm. Next, after immersing the glass substrate having the activated alumina film layer in a 10% gelatin aqueous solution of a polymer material excellent in dyeability for 10 minutes, washing it with water and drying it in an atmosphere of 80 ° C for 30 minutes to remove gelatin. It was impregnated into the micropores in the activated alumina membrane layer. Next, a photoresist OMR-85 (manufactured by Tokyo Ohka Co., Ltd.) is provided on the entire surface of the activated alumina film layer, a processing original plate having a blue pattern is superposed thereon, and exposed from above to form a resist image having a negative pattern of a blue pattern. To do. Then, it is immersed in a blue dye Sanodal Blue G (manufactured by Sand Co.) for about 10 minutes at a bath temperature of about 60 ° C. to stain a portion of the activated alumina film layer impregnated with the polymer material, which is not covered with the resist image,
It was washed with water and dried. Then, the photoresist was stripped with trichlene. Subsequently, a photoresist OMR-85 is provided on the entire surface of the alumina film layer, and a processing original plate having a green pattern is prepared in the same manner as when the blue pattern is provided, the photoresist is patterned, and the green dye Aluminum Green LWN A bath (manufactured by Sand Co.) was immersed in a bath at a bath temperature of about 40 ° C. for about 10 minutes to dye a portion of the alumina film layer impregnated with the polymer material, which was not covered with the resist image, washed with water and dried. The photoresist was then stripped with trichlene. Then, a negative pattern resist image of a red pattern is formed by the photolithography method in the same manner as above, and a red dye Al is formed.
uminium Red GWN (manufactured by Sando Co.) bath at a bath temperature of approximately 40 ° C approximately 1
After soaking for 0 minute, a portion of the alumina film layer impregnated with the polymer material, which was not covered with the resist image, was dyed, washed with water and dried. The photoresist was then stripped with trichlene. Next, after patterning the resist using a photomask designed so that the resist remains in the required portions of R, G, B, the bath temperature was 40 ° C in black dye TacBlack-SLH (Okuno Pharmaceutical Co., Ltd.). Was soaked for about 30 minutes, and the portion not covered with the resist image was dyed black, washed with water and dried. Then, the resist image was peeled off and removed with trichlene, and a thermosetting melamine resin was coated to a thickness of 0.5 to 1.0 μm to form an overcoat layer, thereby completing a color filter. Example 2 An alumina film layer having a thickness of 5 to 10 μm was formed by a sol-gel method on a transparent glass substrate having a thickness of 1.1 mm. Next, a glass substrate having an alumina film layer was immersed in a 10% gelatin aqueous solution of a polymer material excellent in dyeability for 10 minutes, washed with water, and dried in an atmosphere of 80 ° C for 30 minutes to convert gelatin into alumina. The micropores in the membrane layer were impregnated. A glass substrate having an alumina film layer impregnated with this polymer material is immersed in a blue dye Sanodal Blue G (manufactured by Sand Co.) for about 10 minutes at a bath temperature of about 60 ° C to dye the entire surface of the alumina film layer blue. It was washed with water and dried. Next, a photoresist OMR-85 (manufactured by Tokyo Ohka Co., Ltd.) is provided on the entire surface of the alumina film layer, a processing original plate of a blue pattern is superposed on it, and exposed from above to form a resist image of a positive pattern of a blue pattern. Form. Then, it was immersed in 30% nitric acid at room temperature for 30 seconds to decolorize the blue dye in the part of the alumina film layer not covered with the resist image. Then, the green dye Aluminum Green LWN (Sand)
It was immersed in a bath at a bath temperature of about 40 ° C. for about 10 minutes, the decolorized portion of the alumina film layer was dyed green, washed with water and dried. Next, a resist image was formed on a portion other than the portion to be dyed red, and was immersed in 30% nitric acid at room temperature for 30 seconds to decolorize the green dye in the portion of the alumina film layer not covered with the resist image. Then, it was immersed in a red dye Aluminum Red GWN (manufactured by Sand Co.) for about 10 minutes at a bath temperature of about 40 ° C., the decolorized portion of the alumina membrane layer was dyed red, washed with water and dried. Then, the remaining photoresist was stripped off with trichlene, and then a thermosetting melamine resin was coated to a thickness of 0.5 to 1.0 μm to form an overcoat layer to complete a color filter.

【The invention's effect】

In the color filter of the present invention, an inorganic active film layer impregnated with a polymer material is provided on a transparent substrate, and both the polymer material and the inorganic active film layer or only the polymer material is pattern dyed by a photolithography method. It is characterized by being That is, since the polymer material having excellent dyeability is impregnated into the fine pores of the inorganic active membrane layer in advance, and the dye is applied, the dyed polymer material has excellent physical properties made of an inorganic oxide. Since it is protected by the inorganic active film, the surface is excellent in smoothness and the strength as high as that of the inorganic active film layer can be reproduced. Further, since the dye is impregnated into each independent fine pore in the inorganic active film layer, a bleeding or migration of the dye after dyeing does not occur and a highly accurate pattern can be obtained. In addition, since the polymer material is impregnated in the fine pores of the inorganic active film layer when this color filter manufacturing method is used, the photoresist used in the photolithography method directly penetrates into the active film layer as in the conventional method. Therefore, the photoresist can be easily and completely removed from the inorganic active film layer. Therefore, the process is simplified,
As a product, it is possible to obtain a color filter without uneven dyeing or lack of density.

[Brief description of drawings]

1 and 2 are schematic sectional views showing an embodiment of the color filter of the present invention, and FIGS. 3 (a) to 3 (d).
FIG. 3A is a cross-sectional view showing an example of a manufacturing process of a color filter obtained by the present invention. 4 (a) to (f)
FIG. 6 is a cross-sectional view showing another example of the manufacturing process of the color filter obtained by the present invention. 1 ... Transparent substrate, 2 ... Inorganic active film layer, 3 ... Polymer material, 4
... black mask, 5 ... overcoat layer.

Claims (3)

[Claims] 1. An inorganic active membrane layer (2) having fine pores impregnated with a polymeric material (3) is provided on a transparent substrate (1), and the polymeric material (3) and the inorganic active membrane layer (2) are provided. A color filter, wherein both of 2) or only the polymer material (3) is dyed into a desired pattern shape by a photolithography method. 2. A method of manufacturing a color filter, which comprises sequentially performing the following steps. (A) A step of forming an inorganic active film layer (2) on the transparent substrate (1). (B) A step of impregnating the fine pores of the inorganic active film layer (2) with a polymer material (3) having excellent dyeability. (C) A resist formed by dyeing both the polymer material (3) and the inorganic active film layer (2) or only the polymer material (3) into a pattern shape by using a photolithography method, and finally by a photolithography method. The process of removing an image. 3. The inorganic active film layer (2) has the general formula M (OR1) m (OR2) nXpYq ... I (wherein, M is magnesium, calcium, zirconium, titanium, hafnium, germanium.
At least one element selected from the group consisting of yttrium, aluminum, gallium, tin, and silicon is shown.
R1 and R2 each represent a hydrogen atom, an alkyl group, or an acyl group, and they may be the same or different.
X and Y each represent a hydrogen atom, a chlorine atom or a hydroxyl group, which may be the same or different. m
n · p · q is an integer of 0 to 8 and m + n + p + q is equal to the valence of M. 3. A compound obtained by hydrolyzing an aqueous solution of the compound represented by the formula (1) and then deflocculating the sol, and applying the sol to the transparent substrate 1 and baking the sol. Color filter manufacturing method.