JPH06104057B2 - Temperature control method for culture device - Google Patents
Temperature control method for culture deviceInfo
- Publication number
- JPH06104057B2 JPH06104057B2 JP63312036A JP31203688A JPH06104057B2 JP H06104057 B2 JPH06104057 B2 JP H06104057B2 JP 63312036 A JP63312036 A JP 63312036A JP 31203688 A JP31203688 A JP 31203688A JP H06104057 B2 JPH06104057 B2 JP H06104057B2
- Authority
- JP
- Japan
- Prior art keywords
- temperature
- heater
- control
- hot water
- water
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Apparatus Associated With Microorganisms And Enzymes (AREA)
- Measuring Or Testing Involving Enzymes Or Micro-Organisms (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は培養装置の温度制御方法に係り、特に培養装置
における温水の温度や、複数の培養槽における培養液温
度の制御方法に関するものである。Description: TECHNICAL FIELD The present invention relates to a temperature control method for a culture apparatus, and more particularly to a method for controlling the temperature of hot water in a culture apparatus and the temperature of a culture solution in a plurality of culture tanks. .
従来の温度制御は、それぞれの培養槽にスチームやヒー
ターなどの加熱源と、冷却水によるON−OFF制御、また
はPID制御（Ｐ（比例成分）、Ｉ（積分成分）およびＤ
（微分成分）に基づく制御）等の帰還制御が行なわれて
いた。なお、この種の装置として関連するものには例え
ば特公昭60−16226号が挙げられる。Conventional temperature control involves heating sources such as steam and heaters in each culture tank and ON / OFF control by cooling water, or PID control (P (proportional component), I (integral component) and D
Feedback control such as (control based on (differential component)) was performed. A device related to this kind of device is, for example, Japanese Patent Publication No. 60-16226.
上記従来技術は、培養装置の起動時と定格運転時の負荷
変動や、温度制御性の点について配慮がされておらず、
槽内温度が不安定となる欠点があった。The above-mentioned conventional technology does not consider load fluctuations during start-up and rated operation of the culture device, and temperature controllability,
There was a drawback that the temperature inside the tank became unstable.
本発明の目的は、培養装置の起動時と定格運転時の負荷
変動に追従し、高精度の温度制御ができる培養装置の温
度制御方法を提供するものである。An object of the present invention is to provide a temperature control method for a culture device, which can follow a load change at the time of start-up of the culture device and at the time of rated operation and can perform highly accurate temperature control.
さらに、本発明の他の目的は、複数の培養槽の温度を高
精度に制御できる培養装置の温度制御方法を提供するも
のである。Further, another object of the present invention is to provide a temperature control method for a culture device, which can control the temperature of a plurality of culture tanks with high accuracy.
上記目的を達成するために、コントロールヒーターとベ
ースヒーターおよび冷却水弁とを設け、コントロールヒ
ーターの帰還制御とベースヒーターのON−OFF制御の組
合せにより、高精度の温度制御を行なえるようにしたも
のである。In order to achieve the above object, a control heater, a base heater, and a cooling water valve are provided, and high-precision temperature control can be performed by combining feedback control of the control heater and ON-OFF control of the base heater. Is.
さらに、上記他の目的を達成するために、複数の培養槽
に温度検出器と温度調節計をそれぞれ設け、温度調節の
出力でもって、複数培養槽の温水流量制御を行ない、高
精度の温度制御を行なえるようにしたものである。Furthermore, in order to achieve the above-mentioned other objects, a temperature detector and a temperature controller are provided in each of the plurality of culture tanks, and the hot water flow rate control of the plurality of culture tanks is performed by the output of the temperature control, thereby achieving highly accurate temperature control. It is designed to be able to do.
コントロールヒーターは温度調節計の帰還制御の設定値
により連続制御を行ない、また、ベースヒーターは温度
調節計の下限設定値によりON−OFF制御し、温度調節計
の上限設定値により冷却水弁を開閉操作することによっ
て、大きな負荷変動に対し、高精度の温度制御が可能で
ある。The control heater performs continuous control according to the feedback control setting value of the temperature controller, and the base heater performs ON-OFF control according to the temperature controller lower limit setting value, and the cooling water valve opens and closes according to the temperature controller upper limit setting value. By operating it, it is possible to control the temperature with high accuracy even when there is a large load change.
さらに、他の手段の作用を以下に示す。温水の流量は、
培養槽の温度調節計の偏差値によりそれぞれ制御され、
設定値より温度が高い場合は、温水流量を減少させ、設
定値により温度が低くなると温水流量を増加させること
により温度制拝を行なうものである。Furthermore, the operation of other means will be described below. The flow rate of hot water is
Each is controlled by the deviation value of the temperature controller of the culture tank,
When the temperature is higher than the set value, the hot water flow rate is decreased, and when the temperature is lowered by the set value, the hot water flow rate is increased to perform temperature control.
以下、本発明の一実施例を第１図〜第４図により説明す
る。An embodiment of the present invention will be described below with reference to FIGS.
第１図は培養装置の温度制御の全体システムを示す一実
施例で、１は培養槽、２は温水を培養槽１に送り込む循
環ポンプ、３は温水を貯蔵する温水槽、4,5は加熱ヒー
ターで、温度調節計８の信号により帰還制御を行なうコ
ントロールヒーター４とON−OFF制御を行なうベースヒ
ーター５である。６は冷却水供給用の冷却水弁、７は温
度検出器、８は温度調節計である。FIG. 1 is an embodiment showing an entire temperature control system of a culture apparatus, 1 is a culture tank, 2 is a circulation pump for feeding hot water to the culture tank 1, 3 is a hot water tank for storing hot water, and 4 and 5 are heating. A heater is a control heater 4 that performs feedback control according to a signal from the temperature controller 8 and a base heater 5 that performs ON-OFF control. 6 is a cooling water valve for supplying cooling water, 7 is a temperature detector, and 8 is a temperature controller.
第２図は本発明による温度制御の動作図を示すもので、
培養装置が起動すると、コントロールヒーター4,ベース
ヒーター５に電源が入り温度は徐々に上昇する。該温度
が上昇し、温度調節計８の設定値に近くなると、コント
ロールヒーター４は温度調節計８の帰還出力によりヒー
ター容量が連続制御される。培養槽１の必要熱量が減少
し、温水槽３の温度が上昇し、該上昇した温度が温度調
節計８の上限設定値になると、ベースヒーター５はOFF
となり、同時に冷却水弁６が開となり温水槽３に冷却水
が供給され、温水温度が下がり、コントロールヒーター
４の帰還制御により温度制御が行なわれる。また、培養
槽１の必要熱量が増大し、温水槽３の温度が低下し、該
低下した温度が温度調節計８の下限認定値になると、ペ
ースヒーター５がONされ、ベースヒーター５とコントロ
ールヒーター４により温度制御が行なわれる。FIG. 2 shows an operation diagram of temperature control according to the present invention.
When the culture device is activated, the control heater 4 and the base heater 5 are turned on and the temperature gradually rises. When the temperature rises and approaches the set value of the temperature controller 8, the heater capacity of the control heater 4 is continuously controlled by the feedback output of the temperature controller 8. When the required amount of heat of the culture tank 1 decreases and the temperature of the hot water tank 3 rises, and the raised temperature reaches the upper limit set value of the temperature controller 8, the base heater 5 is turned off.
At the same time, the cooling water valve 6 is opened to supply the cooling water to the warm water tank 3, the temperature of the warm water is lowered, and the temperature is controlled by the feedback control of the control heater 4. When the required amount of heat of the culture tank 1 increases and the temperature of the hot water tank 3 decreases, and the decreased temperature reaches the lower limit certified value of the temperature controller 8, the pace heater 5 is turned on and the base heater 5 and the control heater 5 are turned on. The temperature control is performed by 4.
第３図はヒーターの電源系統図を示すもので、９はコン
トロールヒーター４の電力を連続制御するサイスタユニ
ット,10はヒーター4,5の電源を入，切をする電磁接触器
である。FIG. 3 is a power supply system diagram of the heater. Reference numeral 9 is a thyristor unit for continuously controlling the electric power of the control heater 4, and 10 is an electromagnetic contactor for turning on / off the power of the heaters 4 and 5.
第４図は制御回路を示すもので、11は切換スイッチ、12
が温度調節計８の下限接点、13が温度調節計８の上限接
点、14はヒーターの加熱防止用接点を示すものである。
切換スイッチ11を自動の位置にすると、ベースヒーター
５は、温度調節計８の下限接点12により電磁接触器10が
ON−OFFされ、ベースヒーター５の電源がON−OFF制御さ
れる。コントロールヒーター４は温度調節計８の帰還制
御出力がサイリスタユニット９に入力され、コントロー
ルヒーター４の電力は連続制御される。また、ヒーター
4,5は加熱防止器の接点14により、加熱保護を行なうも
のである。冷却水弁６は温度調節計８の上限接点13によ
りリレー15がON−OFFされ、冷却水弁６の電磁弁がON−O
FF制御される。FIG. 4 shows a control circuit, 11 is a changeover switch, 12
Is a lower limit contact of the temperature controller 8, 13 is an upper limit contact of the temperature controller 8, and 14 is a contact for preventing heating of the heater.
When the changeover switch 11 is set to the automatic position, the base heater 5 causes the magnetic contactor 10 to move by the lower limit contact 12 of the temperature controller 8.
It is turned on and off, and the power source of the base heater 5 is turned on and off. In the control heater 4, the feedback control output of the temperature controller 8 is input to the thyristor unit 9, and the power of the control heater 4 is continuously controlled. Also a heater
Reference numerals 4 and 5 provide heat protection by the contact 14 of the heat protector. The relay 15 of the cooling water valve 6 is turned on and off by the upper limit contact 13 of the temperature controller 8, and the solenoid valve of the cooling water valve 6 is turned on and off.
FF controlled.
さらに、第５図は温度検出器７を培養槽１に設けた全体
システムを示したもので、第１図と同様な温度制御が行
なわれるものである。Further, FIG. 5 shows the entire system in which the temperature detector 7 is provided in the culture tank 1, and the same temperature control as in FIG. 1 is performed.
本発明によれば、コントロールヒーターの帰還制御とベ
ースヒーターのON−OFF制御により、起動時と定格運転
時の大巾な負荷変動に、温度制御が追従でき高精度の温
度制御が可能となる。According to the present invention, the feedback control of the control heater and the ON-OFF control of the base heater enable the temperature control to follow wide load fluctuations at the time of start-up and rated operation, thereby enabling highly accurate temperature control.
第１図は本発明の一実施例の培養システムの全体構成
図、第２図は第１図の動作説明図、第３図は第１図のヒ
ーターの電源系統図、第４図は第２図の制御回路図、第
５図は本発明の他の実施例を示す培養システムの全体構
成図である。 1,1A,1B……培養槽、3,3A……温水槽、４……コントロ
ールヒーター、５……ベースヒーター、６……冷却水
弁、７……温度検出器、８……温度調節計FIG. 1 is an overall configuration diagram of a culture system according to an embodiment of the present invention, FIG. 2 is an operation explanatory diagram of FIG. 1, FIG. 3 is a power supply system diagram of the heater of FIG. 1, and FIG. FIG. 5 is a control circuit diagram of the figure, and FIG. 5 is an overall configuration diagram of a culture system showing another embodiment of the present invention. 1,1A, 1B …… Culturing tank, 3,3A …… Hot water tank, 4 …… Control heater, 5 …… Base heater, 6 …… Cooling water valve, 7 …… Temperature detector, 8 …… Temperature controller
Claims (1)
て使用する培養装置の温度制御方法において、 上記温水の温度を検出する温度検出器と、 上記温水器中の温水を連続的に加熱するコントロールヒ
ーターと、 上記温水器中の温水を断続的に加熱するベースヒーター
と、 上記温水器に対して供給される冷却水を断続する冷却水
自動弁と、 上記温度検出器からの検出信号に応じて上記コントロー
ルヒーター、ベースヒーターおよび冷却水自動弁を制御
して上記温水の温度を調節する温度調節手段とを設け、 上記コントロールヒーターを上記温度調節手段に設定さ
れた設定値により連続制御し、 上記ベースヒーターを上記温度調節手段に設定された下
限設定値によりオン−オフ制御し、 上記冷却水自動弁を上記温度調節手段に設定された上限
設定値によりオン−オフ制御する ことを特徴とする培養装置の温度制御方法。1. A temperature control method for a hot water tank and a culture device for circulating hot water from the hot water tank for use, wherein a temperature detector for detecting the temperature of the hot water and hot water in the water heater are continuously connected. Control heater that heats the hot water in the water heater intermittently, a base heater that intermittently heats the hot water in the water heater, an automatic cooling water valve that intermittently supplies the cooling water supplied to the water heater, and a detection from the temperature detector. A temperature adjusting means for adjusting the temperature of the hot water by controlling the control heater, the base heater and the automatic cooling water valve according to a signal is provided, and the control heater is continuously controlled by the set value set in the temperature adjusting means. Then, the base heater is on / off controlled by the lower limit set value set in the temperature adjusting means, and the cooling water automatic valve is set in the temperature adjusting means. On the limit setpoint - temperature control method of a culture apparatus characterized by off control.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63312036A JPH06104057B2 (en) | 1988-12-12 | 1988-12-12 | Temperature control method for culture device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP63312036A JPH06104057B2 (en) | 1988-12-12 | 1988-12-12 | Temperature control method for culture device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH02156878A JPH02156878A (en) | 1990-06-15 |
| JPH06104057B2 true JPH06104057B2 (en) | 1994-12-21 |
Family
ID=18024450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP63312036A Expired - Lifetime JPH06104057B2 (en) | 1988-12-12 | 1988-12-12 | Temperature control method for culture device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH06104057B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20000037112A (en) * | 2000-04-07 | 2000-07-05 | 장규호 | Fermenter with air-cooling temperature control system |
| JP4378909B2 (en) * | 2002-02-20 | 2009-12-09 | 株式会社日立プラントテクノロジー | Biological cell culture control method, culture apparatus control apparatus, and culture apparatus |
| JP4670439B2 (en) * | 2004-06-03 | 2011-04-13 | ダイキン工業株式会社 | Temperature control method and temperature control apparatus |
| JP5954079B2 (en) | 2012-09-25 | 2016-07-20 | ソニー株式会社 | Culture observation apparatus and culture observation method |
| JP6414142B2 (en) * | 2016-06-16 | 2018-10-31 | ソニー株式会社 | Culture temperature control device, culture observation device, and culture temperature control method |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS4928872A (en) * | 1972-07-12 | 1974-03-14 | ||
| JPS5323945B2 (en) * | 1972-07-17 | 1978-07-18 |
-
1988
- 1988-12-12 JP JP63312036A patent/JPH06104057B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH02156878A (en) | 1990-06-15 |
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