JPH061221B2 - Thin film load cell - Google Patents
Thin film load cellInfo
- Publication number
- JPH061221B2 JPH061221B2 JP10602486A JP10602486A JPH061221B2 JP H061221 B2 JPH061221 B2 JP H061221B2 JP 10602486 A JP10602486 A JP 10602486A JP 10602486 A JP10602486 A JP 10602486A JP H061221 B2 JPH061221 B2 JP H061221B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- coating
- load cell
- insulating coating
- protective
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Non-Metallic Protective Coatings For Printed Circuits (AREA)
- Measurement Of Force In General (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、ストレンゲージ部を薄膜技術により形成した
薄膜ロードセルに関するものである。Description: TECHNICAL FIELD The present invention relates to a thin film load cell in which a strain gauge portion is formed by a thin film technique.
従来の技術 従来、薄膜ロードセルにおいては、薄肉変形部を形成し
たビーム体の一面又は両面に薄膜技術によりストレンゲ
ージを形成しているものであるが、その構成は、ビーム
体の面に絶縁被膜を形成し、その上に抵抗被膜を積層し
てストレンゲージを形成し、さらに、その上に保護被膜
を積層形成しているものである。2. Description of the Related Art Conventionally, in a thin film load cell, a strain gauge is formed on one surface or both surfaces of a beam body having a thin deformed portion by thin film technology. A strain gauge is formed by forming a resistance coating on top of this, a strain gauge is formed thereon, and a protective coating is further formed thereon.
発明が解決しようとする問題点 絶縁被膜と保護被膜とは、一般にポリイミドが使用され
るが、これらの層の密着性はあまり良くない。そのため
に、絶縁被膜と保護被膜との間から湿気が侵入し易く、
ストレンゲージ部分に達してその特性を変化させてしま
い、耐湿特性が悪いものである。Problems to be Solved by the Invention Polyimide is generally used for the insulating coating and the protective coating, but the adhesion between these layers is not so good. Therefore, moisture easily enters between the insulating coating and the protective coating,
It reaches the strain gauge portion and changes its characteristics, resulting in poor moisture resistance.
また、ビーム体のエツジ部において、衝撃により絶縁被
膜や保護被膜にクラツクが発生し易く、このクラツクに
より耐湿特性を劣化させると云う問題もある。Further, in the edge portion of the beam body, a crack is liable to be generated on the insulating coating or the protective coating due to impact, and there is a problem that the moisture resistance is deteriorated by the crack.
問題点を解決するための手段 ビーム体のエツジ部における絶縁被膜と保護被膜との間
に抵抗薄膜を囲むとともに前記絶縁被膜と前記保護被膜
と密着性の良いガード層を形成する。Means for Solving the Problems A resistive thin film is surrounded between an insulating film and a protective film in an edge portion of a beam body, and a guard layer having good adhesion with the insulating film and the protective film is formed.
作用 ガード層は絶縁被膜と保護被膜との両者に対して密着性
が良好であるため、積層面からの湿気の侵入は防止さ
れ、また、ガード層は絶縁被膜と保護被膜との密着性が
良好であるため、これらの絶縁被膜や保護被膜に発生す
るクラツクが内部にまで達するのを防止して耐湿特性を
良好に維持する。Action The guard layer has good adhesion to both the insulating film and the protective film, preventing moisture from entering from the laminated surface, and the guard layer has good adhesion between the insulating film and the protective film. Therefore, cracks generated in these insulating coatings and protective coatings are prevented from reaching the inside to maintain good moisture resistance.
実施例 本発明の一実施例を図面に基づいて説明する。まず、ア
ルミニユウム又は亜鉛合金等の金属により棒状のビーム
１が形成されている。このビーム１の両端には取付孔
２，３が形成され、一端はベース等の固定部分に固定さ
れる固定部４とされ、他端は受皿が連結される可動部５
とされている。そして、中間部には互いに連通した二つ
の孔６が形成され、これらの孔６により四個の薄肉変形
部７が形成されている。これらの薄肉変形部７は平行四
辺形の頂点に位置しているものであり、前記可動部５に
荷重が印加されることにより前記ビーム１は平行四辺形
状に変形するものである。Embodiment An embodiment of the present invention will be described with reference to the drawings. First, the rod-shaped beam 1 is formed of a metal such as aluminum or a zinc alloy. Mounting holes 2 and 3 are formed at both ends of the beam 1, one end is a fixed portion 4 fixed to a fixed portion such as a base, and the other end is a movable portion 5 to which a saucer is connected.
It is said that. Then, two holes 6 communicating with each other are formed in the intermediate portion, and four thin-wall deformable portions 7 are formed by these holes 6. These thin-walled deformation parts 7 are located at the vertices of a parallelogram, and the beam 1 is deformed into a parallelogram when a load is applied to the movable part 5.
ついで、前記ビーム１の一面には前記可動部５と区切ら
れる溝８が形成されているとともにその可動部５を除い
てポリイミド等による絶縁被膜９が均等厚さで塗布され
ている。この絶縁被膜９の上には、ＮｉＣｒＳｉ等によ
る抵抗被膜１０が積層され、この抵抗被膜１０はパター
ニングされて前記薄肉変形部７に位置する四個のストレ
ンゲージ１１が形成されている。また、薄膜技術により
銅による薄膜リード部１２が形成され、この薄膜リード
部１２により前記ストレンゲージ１１はブリツジ回路が
形成されている。Next, a groove 8 is formed on one surface of the beam 1 so as to be separated from the movable portion 5, and an insulating coating 9 made of polyimide or the like is applied to the movable portion 5 in a uniform thickness except the movable portion 5. A resistance coating 10 made of NiCrSi or the like is laminated on the insulation coating 9, and the resistance coating 10 is patterned to form four strain gauges 11 located in the thin deformation portion 7. Further, the thin film lead portion 12 made of copper is formed by the thin film technique, and the strain gauge 11 forms a bridge circuit by the thin film lead portion 12.
このようなブリツジ回路を囲むようにして前記ビーム１
のエツジ部には銅等の金属によるガード層１３が形成さ
れている。The beam 1 is formed so as to surround such a bridge circuit.
A guard layer 13 made of a metal such as copper is formed in the edge portion of.
ついで、前記絶縁被膜９と前記抵抗被膜１０と前記薄膜
リード部１２と前記ガード層１３との表面全体にはポリ
イミド等による保護被膜１４が積層形成されている。Then, a protective coating 14 made of polyimide or the like is laminated on the entire surfaces of the insulating coating 9, the resistive coating 10, the thin film lead portion 12, and the guard layer 13.
このような構成において、絶縁被膜９と保護被膜１４と
の間よりもその絶縁被膜９とガード層１３との間及びそ
のガード層１３と保護被膜１４との間の方が密着性が高
い。そのため、各積層間からの湿気の侵入は、密着性が
高いために極めて少なくなり、耐湿特性が向上してい
る。In such a configuration, the adhesiveness between the insulating coating 9 and the guard layer 13 and between the guard layer 13 and the protective coating 14 is higher than between the insulating coating 9 and the protective coating 14. Therefore, the invasion of moisture from between the laminated layers is extremely small due to the high adhesiveness, and the moisture resistance property is improved.
また、ビーム１のエツジ部には機械的な衝撃が加わり易
いが、絶縁被膜９と保護被膜１４と密着するガード層１
３の存在により、それらの絶縁被膜９と保護被膜１４と
に生じるクラツクが内部までは成長せず、クラツクによ
る耐湿特性の劣化も防止される。Further, a mechanical impact is easily applied to the edge portion of the beam 1, but the guard layer 1 that adheres to the insulating coating 9 and the protective coating 14
Due to the presence of 3, the cracks generated in the insulating coating 9 and the protective coating 14 do not grow to the inside, and the deterioration of the moisture resistance characteristic due to the cracks is also prevented.
発明の効果 本発明は、上述のようにビーム体のエツジ部における絶
縁被膜と保護被膜との間に抵抗薄膜を囲むとともに前記
絶縁被膜と前記保護被膜と密着性の良いガード層を形成
したので、絶縁被膜と保護被膜との間からの湿気の侵入
を有効に防止することができ、また、絶縁被膜と保護被
膜とに発生するクラツクが内部にまで達するのを防止す
ることができ、これにより、耐湿特性を極めて向上させ
ることができるものである。Effect of the Invention Since the present invention forms a guard layer having good adhesion to the insulating coating and the protective coating while surrounding the resistance thin film between the insulating coating and the protective coating in the edge portion of the beam body as described above, Moisture can be effectively prevented from entering between the insulating coating and the protective coating, and cracks generated in the insulating coating and the protective coating can be prevented from reaching the inside. The moisture resistance can be extremely improved.
図面は本発明の一実施例を示すもので、第１図は斜視
図、第２図は一部の断面図である。 １…ビーム体、７…薄肉変形部、９…絶縁被膜、１０…
抵抗薄膜、１１…ストレンゲージ、１３…ガード層、１
４…保護被膜。The drawings show one embodiment of the present invention. FIG. 1 is a perspective view and FIG. 2 is a partial sectional view. DESCRIPTION OF SYMBOLS 1 ... Beam body, 7 ... Thin deformation part, 9 ... Insulating film, 10 ...
Resistive thin film, 11 ... Strain gauge, 13 ... Guard layer, 1
4 ... Protective film.
Claims (1)
面に絶縁被膜を形成し、この絶縁被膜の上にストレンゲ
ージのブリツジ回路をパターニングした抵抗薄膜を積層
形成し、これらの絶縁被膜と抵抗薄膜との表面に保護被
膜を積層形成した薄膜ロードセルにおいて、前記ビーム
体のエツジ部における前記絶縁被膜と前記保護被膜との
間に前記抵抗薄膜を囲むとともに前記絶縁被膜と前記保
護被膜と密着性の良いガード層を形成したことを特徴と
する薄膜ロードセル。1. An insulating coating is formed on one or both surfaces of a beam body having a thin-walled deformable portion, and a resistive thin film formed by patterning a bridge circuit of a strain gauge is laminated on the insulating coating. In a thin film load cell in which a protective coating is laminated on the surface of a resistive thin film, the resistive thin film is surrounded between the insulating coating and the protective coating in the edge portion of the beam body, and the adhesiveness between the insulating coating and the protective coating is high. A thin film load cell characterized in that a good guard layer is formed.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10602486A JPH061221B2 (en) | 1986-05-09 | 1986-05-09 | Thin film load cell |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10602486A JPH061221B2 (en) | 1986-05-09 | 1986-05-09 | Thin film load cell |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62261936A JPS62261936A (en) | 1987-11-14 |
| JPH061221B2 true JPH061221B2 (en) | 1994-01-05 |
Family
ID=14423072
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10602486A Expired - Lifetime JPH061221B2 (en) | 1986-05-09 | 1986-05-09 | Thin film load cell |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH061221B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP7843154B2 (en) * | 2022-02-25 | 2026-04-09 | Tdk株式会社 | Metal components with insulating films and physical quantity sensors |
-
1986
- 1986-05-09 JP JP10602486A patent/JPH061221B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62261936A (en) | 1987-11-14 |
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