JPH0613610B2 - Method for producing crown ether polymer - Google Patents
Method for producing crown ether polymerInfo
- Publication number
- JPH0613610B2 JPH0613610B2 JP11559285A JP11559285A JPH0613610B2 JP H0613610 B2 JPH0613610 B2 JP H0613610B2 JP 11559285 A JP11559285 A JP 11559285A JP 11559285 A JP11559285 A JP 11559285A JP H0613610 B2 JPH0613610 B2 JP H0613610B2
- Authority
- JP
- Japan
- Prior art keywords
- crown ether
- plasma
- crown
- monomer
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 150000003983 crown ethers Chemical class 0.000 title claims description 25
- 229920000642 polymer Polymers 0.000 title claims description 22
- 238000004519 manufacturing process Methods 0.000 title claims description 3
- 238000000034 method Methods 0.000 claims description 20
- -1 crown ether compound Chemical class 0.000 claims description 19
- 238000006116 polymerization reaction Methods 0.000 claims description 19
- 230000003213 activating effect Effects 0.000 claims description 2
- 230000004913 activation Effects 0.000 claims 1
- 239000000178 monomer Substances 0.000 description 26
- 239000010408 film Substances 0.000 description 10
- 238000010438 heat treatment Methods 0.000 description 9
- 229910021645 metal ion Inorganic materials 0.000 description 6
- 239000000758 substrate Substances 0.000 description 6
- 239000012528 membrane Substances 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 229920002301 cellulose acetate Polymers 0.000 description 4
- 238000006243 chemical reaction Methods 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 3
- UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000002633 crown compound Substances 0.000 description 3
- BBGKDYHZQOSNMU-UHFFFAOYSA-N dicyclohexano-18-crown-6 Chemical compound O1CCOCCOC2CCCCC2OCCOCCOC2CCCCC21 BBGKDYHZQOSNMU-UHFFFAOYSA-N 0.000 description 3
- 125000000524 functional group Chemical group 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 230000003100 immobilizing effect Effects 0.000 description 3
- 230000000379 polymerizing effect Effects 0.000 description 3
- 239000000843 powder Substances 0.000 description 3
- 150000003839 salts Chemical class 0.000 description 3
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000002131 composite material Substances 0.000 description 2
- 238000004132 cross linking Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 229910052751 metal Inorganic materials 0.000 description 2
- 239000002184 metal Substances 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 230000003287 optical effect Effects 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- ZNNZYHKDIALBAK-UHFFFAOYSA-M potassium thiocyanate Chemical compound [K+].[S-]C#N ZNNZYHKDIALBAK-UHFFFAOYSA-M 0.000 description 2
- 230000001988 toxicity Effects 0.000 description 2
- 231100000419 toxicity Toxicity 0.000 description 2
- KFBWZNOWOCNKRF-UHFFFAOYSA-N 2,5,12,15,22,25,32,35-octaoxapentacyclo[34.4.0.06,11.016,21.026,31]tetraconta-1(40),6,8,10,16,18,20,26,28,30,36,38-dodecaene Chemical compound O1CCOC2=CC=CC=C2OCCOC2=CC=CC=C2OCCOC2=CC=CC=C2OCCOC2=CC=CC=C21 KFBWZNOWOCNKRF-UHFFFAOYSA-N 0.000 description 1
- AXWCVSOBRFLCJG-UHFFFAOYSA-N 2,5,12,15,22,25-hexaoxatetracyclo[24.4.0.06,11.016,21]triaconta-1(30),6,8,10,16,18,20,26,28-nonaene Chemical compound O1CCOC2=CC=CC=C2OCCOC2=CC=CC=C2OCCOC2=CC=CC=C21 AXWCVSOBRFLCJG-UHFFFAOYSA-N 0.000 description 1
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 1
- KGIGUEBEKRSTEW-UHFFFAOYSA-N 2-vinylpyridine Chemical compound C=CC1=CC=CC=N1 KGIGUEBEKRSTEW-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 description 1
- 238000005727 Friedel-Crafts reaction Methods 0.000 description 1
- WOBHKFSMXKNTIM-UHFFFAOYSA-N Hydroxyethyl methacrylate Chemical compound CC(=C)C(=O)OCCO WOBHKFSMXKNTIM-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- WHNWPMSKXPGLAX-UHFFFAOYSA-N N-Vinyl-2-pyrrolidone Chemical compound C=CN1CCCC1=O WHNWPMSKXPGLAX-UHFFFAOYSA-N 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 229910052786 argon Inorganic materials 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- FNEPSTUXZLEUCK-UHFFFAOYSA-N benzo-15-crown-5 Chemical compound O1CCOCCOCCOCCOC2=CC=CC=C21 FNEPSTUXZLEUCK-UHFFFAOYSA-N 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 230000009918 complex formation Effects 0.000 description 1
- 229940125810 compound 20 Drugs 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229920006037 cross link polymer Polymers 0.000 description 1
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- YSSSPARMOAYJTE-UHFFFAOYSA-N dibenzo-18-crown-6 Chemical compound O1CCOCCOC2=CC=CC=C2OCCOCCOC2=CC=CC=C21 YSSSPARMOAYJTE-UHFFFAOYSA-N 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 229910001873 dinitrogen Inorganic materials 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000000635 electron micrograph Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000008187 granular material Substances 0.000 description 1
- 239000004519 grease Substances 0.000 description 1
- JAXFJECJQZDFJS-XHEPKHHKSA-N gtpl8555 Chemical compound OC(=O)C[C@H](N)C(=O)N[C@@H](CCC(O)=O)C(=O)N[C@@H](C(C)C)C(=O)N[C@@H](C(C)C)C(=O)N1CCC[C@@H]1C(=O)N[C@H](B1O[C@@]2(C)[C@H]3C[C@H](C3(C)C)C[C@H]2O1)CCC1=CC=C(F)C=C1 JAXFJECJQZDFJS-XHEPKHHKSA-N 0.000 description 1
- 229910052736 halogen Inorganic materials 0.000 description 1
- 150000002367 halogens Chemical class 0.000 description 1
- 150000002430 hydrocarbons Chemical group 0.000 description 1
- 239000003622 immobilized catalyst Substances 0.000 description 1
- 230000006698 induction Effects 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 238000004093 laser heating Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000000123 paper Substances 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 229920006254 polymer film Polymers 0.000 description 1
- 229920002223 polystyrene Polymers 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000000926 separation method Methods 0.000 description 1
- 239000000741 silica gel Substances 0.000 description 1
- 229910002027 silica gel Inorganic materials 0.000 description 1
- 239000002904 solvent Substances 0.000 description 1
- 238000001179 sorption measurement Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 230000002522 swelling effect Effects 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Polyethers (AREA)
- Other Resins Obtained By Reactions Not Involving Carbon-To-Carbon Unsaturated Bonds (AREA)
Description
【発明の詳細な説明】 (産業上の利用分野) 本発明はクラウンエーテル重合物の製造方法に関する。TECHNICAL FIELD The present invention relates to a method for producing a crown ether polymer.
(従来の技術) クラウンエーテル化合物は1967年Pederson博士の発
見以来、その特異な性質が次々と見出され、有機化学、
生化学の基礎化学分野及び工業的な分野において非常に
重要なものとなってきている。その重要な性質としては
金属カチオンの選択的補足及びそれに基づく金属イオン
の分離、輸送、及び無機類、アルカリ金属等、通常有機
溶剤へ溶解しないものの有機溶剤溶解性の付与及びクラ
ウンエーテルの立体化学的な面の応用として光学分割剤
への応用がある。特に金属カチオンセンサーとしては非
常に重要である。(Prior Art) Since the discovery of Dr. Pederson in 1967, crown ether compounds have been found to have unique properties one after another.
It has become very important in the fields of basic chemistry and industrial fields of biochemistry. Its important properties are the selective capture of metal cations and the separation and transport of metal ions based on them, and the impartation of solubility to organic solvents such as inorganics and alkali metals, which are not usually dissolved in organic solvents, and stereochemistry of crown ethers. Another application is optical resolution agents. Especially, it is very important as a metal cation sensor.
ところがクラウンエーテルは溶解性、生理作用及び毒性
等問題点が多い。従ってクラウンエーテルの重合化或い
は固定・不溶化等によりこれら問題点を改良する検討も
なされている。However, crown ether has many problems such as solubility, physiological action and toxicity. Therefore, studies have been made to improve these problems by polymerizing or fixing / insolubilizing the crown ether.
クラウンエーテルの重合・固定化・不溶化の方法として
は例えば特開昭56−141312号公報ではクラウン
エーテルにビニル基を付加し、放射線照射により固定化
する方法を示している。又、特開昭56−47405号
公報では芳香族クラウン化合物とクロルメチル化架橋ポ
リスチレンとのフリーデルクラフト型反応による固定化
を提案している。As a method for polymerizing, immobilizing and insolubilizing the crown ether, for example, JP-A-56-141312 discloses a method in which a vinyl group is added to the crown ether and the crown ether is immobilized by irradiation with radiation. Further, JP-A-56-47405 proposes immobilization by an Friedel-Craft reaction of an aromatic crown compound and chloromethylated crosslinked polystyrene.
特開昭52−109600号公報ではクラウン化合物に
アミノ基を導入し、エポキシ基との反応により固定化す
る方法にて提案している。Japanese Unexamined Patent Publication (Kokai) No. 52-109600 proposes a method in which an amino group is introduced into a crown compound and immobilized by a reaction with an epoxy group.
これらの方法ではクラウン化合物への官能基導入という
非常に困難なかつ収率の低いプロセスや官能基を導入し
てもクラウン化合物の高分子化における収率の低さ、及
び未反応物の残存等、前述した問題点が残る。In these methods, it is very difficult to introduce a functional group into the crown compound and the yield is low even if a process or a functional group is introduced. The problems mentioned above remain.
(発明が解決しようとする問題点) 本発明はクラウンエーテル低分子物の種々の問題点を解
決すると同時に、又従来のクラウンエーテルの固定化に
おける問題点を解決するものである。(Problems to be Solved by the Invention) The present invention solves various problems of low-molecular weight crown ethers, and at the same time, solves problems in the conventional immobilization of crown ethers.
本発明の目的はクラウンエーテルの重合・固定化をより
簡単なプロセスで高収率で重合する事及びより広汎な担
体に固定化する方法を提案するにある。An object of the present invention is to propose a method for polymerizing and immobilizing crown ether in a high yield by a simpler process and immobilizing it on a wider range of carriers.
(問題点を解決する為の手段) 本発明方法は、クラウンエーテル化合物を低温プラズマ
中で活性化し重合・不溶化することを特徴とする。(Means for Solving Problems) The method of the present invention is characterized by activating a crown ether compound in low temperature plasma to polymerize and insolubilize it.
本発明に使用するクラウンエーテル化合物にこれまで用
いられているクラウンエーテル化合物ならいずれでもよ
く特に限定されない。例えば下記一般式で示される単
環式クラウンエーテルや一般式で示される複素環式ク
ラウンエーテルのいずれでもよい。The crown ether compound used in the present invention may be any crown ether compound that has been used so far and is not particularly limited. For example, either a monocyclic crown ether represented by the following general formula or a heterocyclic crown ether represented by the general formula may be used.
m1,m2,m3:1以上 R1,R2:H又は炭化水素残基を示す。 m 1, m 2, m 3 : 1 or more R 1, R 2: represents H or a hydrocarbon residue.
上述したクラウンエーテル化合物(以下クラウンエーテ
ル化合物と略称する)はその中にハロゲン元素や、ベン
ゼン環、シクロヘキサン環及びこれらの各種誘導体1個
或いは複数個含有する事も出来る。The above-mentioned crown ether compound (hereinafter abbreviated as crown ether compound) may contain a halogen element, a benzene ring, a cyclohexane ring and one or more of these various derivatives.
例えば従来数多く利用されているジベンゾ18−クラウ
ン−6、ジシクロヘキシル−18−クラウン−6、シク
ロヘキシル12−クラウン−4、ベンゾ15−クラウン
−5、tert−ブチルベンゾ15−クラウン−5、トリベ
ンゾ18−クラウン−6、テトラベンゾ24−クラウン
−8なども使用できる。For example, dibenzo18-crown-6, dicyclohexyl-18-crown-6, cyclohexyl12-crown-4, benzo15-crown-5, tert-butylbenzo15-crown-5, tribenzo18-crown-6, which have been conventionally used in large numbers, are used. 6, tetrabenzo 24-crown-8 and the like can also be used.
又、一般式及びで洗わせないクラウンエーテル化合
物例えば次のものも使用できる。Further, crown ether compounds which cannot be washed by the general formula and, for example, the following compounds can also be used.
本発明で用いるプラズマはいわゆる低温プラズマを指
し、該イオン化ガスプラズマはかかるプラズマを生成す
るための公知方法のいずれによっても生成させることが
できる。例えばJ.R.ホラハン(Hollahan)とA・
T.ベル(Bell)版「プラズマ化学の応用技術」、ワイリ
ー、ニューヨーク1974およびMシエン(Shen)版
「重合体のプラズマ化学」デッカー・ニューヨーク・1
976に記載されている。即ち高周波発生器に連結され
た平行板電極の側にモノマーを真空下で入れ、真空室の
外部又は内部のいずれかの平行板を用いてプラズマを生
成させることが出来る。また外部誘導コイルによって電
場をつくらせ、イオン化ガスのプラズマを発生させても
よく、また反対に荷電した電極に間隔をおいて直接真空
室に入れてプラズマを生成させてもよい。 The plasma used in the present invention refers to so-called low temperature plasma, and the ionized gas plasma can be generated by any known method for generating such plasma. For example, J. R. Hollahan and A.
T. Bell's "Applied Technology of Plasma Chemistry", Wiley, New York 1974 and M. Shen's "Plasma Chemistry of Polymers" Decker New York 1
976. That is, the monomer can be put under vacuum on the side of the parallel plate electrode connected to the high frequency generator, and plasma can be generated using the parallel plate outside or inside the vacuum chamber. An external induction coil may be used to generate an electric field to generate a plasma of ionized gas, or the oppositely charged electrodes may be directly placed in a vacuum chamber with a space therebetween to generate plasma.
クラウンエーテル化合物は分子量、置換基の種類等にも
依存するが、通常高沸点であり、常温では蒸気圧が低
い。The crown ether compound usually has a high boiling point and has a low vapor pressure at room temperature, although it depends on the molecular weight, the kind of the substituent, and the like.
低温プラズマは前述した真空度において効果的にモノマ
ーの活性化及び重合が進むものであり、クラウンエーテ
ルの蒸気圧がこれに満たない場合は、クラウンエーテル
を加熱し、蒸気圧を増大する必要がある。加熱の方法に
は、ヒーター加熱、高周波加熱、遠赤外線加熱或いはレ
ーザー加熱のいずれの方法を用いてもよいが、なるべく
短時間加熱する事が重要である。クラウンエーテルの低
温プラズマによる重合は、プラズマ重合の条件によりグ
リース(液)状−フイルム(膜)状−粒子(粉末)状と
変化する。The low-temperature plasma effectively activates and polymerizes the monomer in the above-mentioned degree of vacuum, and when the vapor pressure of the crown ether is less than this, it is necessary to heat the crown ether to increase the vapor pressure. . As a heating method, any one of heater heating, high frequency heating, far infrared heating and laser heating may be used, but it is important to heat for as short a time as possible. Polymerization of crown ether by low-temperature plasma changes from grease (liquid) state-film (film) state-particle (powder) state depending on plasma polymerization conditions.
プラズマ重合物に、通常、紙、ガラス、シリカゲル、ポ
リマー等のシート、繊維或いは微粒子上に形成させ、重
合・固定化させるがこういった担体を用いないで、直接
電極上へ重合し、生成ポリマーを回収し、それを成形し
てもよい。モノマーと重合物の間の一次(化学)構造の
相関性はモノマーの種類、プラズマ重合条件によって変
化する。The polymer is usually formed on a sheet of paper, glass, silica gel, polymer, etc., fibers or fine particles and polymerized / immobilized, but without using such a carrier, it is directly polymerized on the electrode to produce a polymer. May be collected and molded. The correlation of the primary (chemical) structure between the monomer and the polymer changes depending on the type of the monomer and the plasma polymerization conditions.
クラウンエーテル化合物のプラズマ重合物は、有機溶剤
例えば、アルコール、エーテル、ピリジン、クロロホル
ム、アセトン、ベンゼン、ギ酸、ジメチルホルムアミド
等への溶解性は全くなく、架橋重合物である事がわか
る。It can be seen that the plasma polymerized product of the crown ether compound has no solubility in organic solvents such as alcohol, ether, pyridine, chloroform, acetone, benzene, formic acid and dimethylformamide and is a crosslinked polymer.
但し、有機溶剤に対する膨潤性は、重合条件によって変
化する。プラズマ重合物の構造、化学構造の特定は仲々
困難である。IR、NMR、X線、電顕等での測定、及
び金属イオン吸着性、各種塩との錯体形成能等の測定で
一応の評価が出来るが、モノマーの代表的な化学構造、
例えばエーテル環が大部分残存される条件を選択する事
が必要である。However, the swelling property with respect to the organic solvent changes depending on the polymerization conditions. It is difficult to identify the structure and chemical structure of plasma polymer. IR, NMR, X-ray, electron microscope, and other measurements, and metal ion adsorption, complex formation with various salts, etc. can be used for tentative evaluation, but typical chemical structures of monomers,
For example, it is necessary to select conditions under which most of the ether ring remains.
一般に重合法、光熱等によって化学構造がくずれやすい
モノマーはプラズマ重合によっても同様に、一般構造を
残す事は容易ではない。こういったモノマーでは、例え
ば電極間にモノマーを置き、まずモノマー以外のプラズ
マ例えば、アルゴン、N2、H2、He、CO2等の不活性ガ
スや他の重合モノマー例えばアクリル酸、メタクリル
酸、ビニルピロリドン、ビニルピリジン、2−ヒドロキ
シエチルメタクリレート等の重合しやすいモノマーのプ
ラズマを前もって発生さセ、そのプラズマ中で短時間加
熱を行ない、目的とするモノマーをプラズマ化し、重合
させる。又、プラズマ重合の条件によって水、モノマー
の一次構造の残りやすさは変ってくる。即ち、モノマー
の一次構造を残そうとする場合には、プラズマ照射時間
を下げる。一般にクラウンエーテルのプラズマ重合は、
通常10分以下、好ましくは5分以下であり、又、パル
ス的に高周波を印加する方法も好ましい。プラズマ重合
時間を低下させるとともにプラズマ出力下げる或いは真
空度を下げる或いは基板の温度を下げるといった方法を
併合する事が好ましい。プラズマ出力に関しては出力が
大きいとモノマーの構造がこわれやすいが出力を余り下
げると重合が十分に進行せず、モノマーの残存率が高く
なったり或いは生成物の分子量が十分高くならず溶剤等
に溶解したりする。従って、出力はこれらのかねあいで
決定する事が重要である。クラウンエーテル重合の場合
の高周波出力は通常10〜300W、好ましくは50〜
200Wである尚高周波出力は当然、目的とする用途に
よって適宜選択する必要がある。In general, it is not easy to leave a general structure of a monomer whose chemical structure is likely to be destroyed by a polymerization method, light heat or the like even by plasma polymerization. In such a monomer, for example, a monomer is placed between electrodes, and plasma other than the monomer, for example, an inert gas such as argon, N 2 , H 2 , He, and CO 2 and other polymerized monomers such as acrylic acid and methacrylic acid, Plasma of a monomer such as vinylpyrrolidone, vinyl pyridine, and 2-hydroxyethyl methacrylate, which is easily polymerized, is generated in advance, and heating is performed for a short time in the plasma to plasmanize and polymerize the target monomer. In addition, the susceptibility of the primary structure of water and the monomer is changed depending on the conditions of plasma polymerization. That is, when the primary structure of the monomer is to be left, the plasma irradiation time is reduced. Generally, plasma polymerization of crown ether is
It is usually 10 minutes or less, preferably 5 minutes or less, and a method of applying a high frequency in a pulsed manner is also preferable. It is preferable to combine the method of lowering the plasma polymerization time and the plasma output, the vacuum degree, or the substrate temperature. Regarding the plasma output, if the output is large, the structure of the monomer is easily broken, but if the output is lowered too much, the polymerization will not proceed sufficiently and the residual rate of the monomer will increase or the molecular weight of the product will not increase sufficiently and will dissolve in the solvent etc. To do Therefore, it is important to determine the output based on these tradeoffs. The high frequency output in the case of crown ether polymerization is usually 10 to 300 W, preferably 50 to
Of course, the high frequency output of 200 W needs to be appropriately selected according to the intended use.
真空度も出力と同様の傾向、効果を示し、真空度が低下
すると重合の進行が十分でなく、重合物の物性も十分と
はいえない。一方、真空度を余りにも高くしすぎるとプ
ラズマのエネルギーが高くなりすぎ、モノマーの構造を
殆んど残さない重合物が出来たり、極めて架橋度の高い
フイルム或いは粉末が出来、重合物内部への物質の出入
りが出来にくくなりモノマーの性質を残存していたとし
ても重合物の性能が発現出来ない。真空度は通常10-5
〜100Torr、好ましくは10-4〜10Torr、更に好ま
しくは10-3〜1Torrである。The degree of vacuum also shows the same tendency and effect as the output, and when the degree of vacuum is lowered, the progress of polymerization is not sufficient and the physical properties of the polymer are not sufficient. On the other hand, if the degree of vacuum is too high, the energy of the plasma becomes too high, and a polymer that leaves almost no monomer structure is formed, or a film or powder having an extremely high degree of cross-linking is formed. It is difficult to get in and out of the substance, and the performance of the polymer cannot be expressed even if the properties of the monomer remain. Vacuum is usually 10 -5
˜100 Torr, preferably 10 −4 to 10 Torr, more preferably 10 −3 to 1 Torr.
基板の温度はプラズマ重合の本質的メカニズムとの関連
は少ないが、基板温度が高い時重合生成物の分子量、架
橋が小さい場合は生成物が気化し、放散してしまう。The temperature of the substrate has little relation to the essential mechanism of plasma polymerization, but when the substrate temperature is high, the molecular weight of the polymerization product, and when the crosslinking is small, the product vaporizes and diffuses.
又、基板温度が低い場合は温度勾配による拡散により活
性化されていないモノマーが付着凝固し、重合性の低下
がある。Further, when the substrate temperature is low, unactivated monomer is adhered and solidified due to diffusion due to a temperature gradient, resulting in deterioration of polymerizability.
(発明の効果) 本発明方法は従来その毒性、生理的作用、金属イオン吸
着性等より極めて取扱いや廃棄が難しく又、その高価格
の為に少量のロスでも極めてコストアップであったクラ
ウンエーテル化合物を従来の必ずしも収率の高い方法と
はいえない方法に代ってモノマーを直接的かつ一段でプ
ラズマ重合し、固定化出来たという点で工学的に極めて
有効な方法である。(Effect of the invention) The method of the present invention is extremely difficult to handle and dispose of due to its toxicity, physiological action, metal ion adsorbability, etc., and due to its high price, the crown ether compound has been extremely costly even with a small loss. It is an extremely effective method from an engineering point of view that the monomer can be directly and one-step plasma polymerized and fixed instead of the conventional method which cannot be said to be necessarily high in yield.
又、クラウンエーテル化合物のプラズマ重合物が液状〜
フイルム状〜粉末状になるという点で生成物の形態も任
意に選ぶ事が出来る。特に金属イオンセンサー等に利用
する場合は均一で非常に薄い膜が必要となる為に本発明
方法が特に有効である。In addition, the plasma polymer of the crown ether compound is liquid ~
The form of the product can be arbitrarily selected from the viewpoint of film form to powder form. In particular, the method of the present invention is particularly effective when used for a metal ion sensor or the like because a uniform and very thin film is required.
本発明方法は前述した特徴を持つ為に、膜による金属イ
オンの吸着分離用材料及び金属イオンセンサー、固定化
触媒、光学分割用材料等の製造に極めて有用である。Since the method of the present invention has the above-mentioned characteristics, it is extremely useful for producing a material for adsorbing and separating metal ions by a membrane, a metal ion sensor, an immobilized catalyst, an optical resolution material and the like.
以下実施例を示して本発明を更に詳細に説明する。Hereinafter, the present invention will be described in more detail with reference to examples.
実施例1 第1図には今回使用したプラズマ重合装置を示す。1は
高周波電源(RF電源)でここでは13.56MHzの高
周波電源を使用した。1で発生させられた高周波は19
のマッチングボックスを通じて反応器2内の直径10cm
φの電極3に通じられる。電極3とアースされた対の電
極5との間に高周波が印加されると反応器内部でプラズ
マが発生する。クラウンエーテル化合物20はタスタル
製加熱用容器21に0.1gを入れ、加熱用電源22に
より加熱電圧を変化させる事によりモノマーのプラズマ
中への供給量を変化させる。プラズマを発生させるガス
或いは他のモノマーは16〜18から供給する事が出来
る。ここでは第1表に示すクラウンエーテル化合物を用
いた。Example 1 FIG. 1 shows the plasma polymerization apparatus used this time. Reference numeral 1 is a high frequency power supply (RF power supply), and a high frequency power supply of 13.56 MHz was used here. The high frequency generated in 1 is 19
10cm diameter in the reactor 2 through the matching box
It is communicated with the φ electrode 3. When a high frequency is applied between the electrode 3 and the grounded pair of electrodes 5, plasma is generated inside the reactor. The crown ether compound 20 is charged in a Tastal heating container 21 in an amount of 0.1 g, and the heating power source 22 is used to change the heating voltage to change the supply amount of the monomer into the plasma. The gas or other monomer that generates plasma can be supplied from 16-18. Here, the crown ether compounds shown in Table 1 were used.
反応容器を真空ポンプ9で排気しながら17より窒素ガ
スを供給しながら反応容器の圧力が10-2トールになるよ
うに調節した。重合基板には酢酸セルローズ多孔質膜
(孔径0.45μ)を用いた。The pressure of the reaction vessel was adjusted to 10 -2 torr while supplying nitrogen gas from 17 while evacuating the reaction vessel with a vacuum pump 9. A cellulose acetate porous membrane (pore size 0.45 μ) was used as the polymerization substrate.
高周波電圧を電極に印加し、まず窒素プラズマを発生さ
せる。高周波出力は100Wとした。次いで22の電圧
を上昇させクラウンエーテルを気化した。クラウンエー
テルの気化がおきると同時にプラズマの色が若干青みを
帯びた。クラウンエーテルの気化は3〜5分で完全に終
了させ同時にプラズマ発生をやめた。A high frequency voltage is applied to the electrodes to first generate nitrogen plasma. The high frequency output was 100W. Then, the voltage of 22 was increased to vaporize the crown ether. At the same time as crown ether was vaporized, the plasma color became slightly bluish. The vaporization of crown ether was completely completed in 3 to 5 minutes, and plasma generation was stopped at the same time.
反応器よりクラウンエーテル重合膜を形成させた多孔質
膜を取り出し、エタノール洗浄を行ない未反応のクラウ
ンエーテルを洗い流した後で室内で乾燥させた。The porous film having the crown ether polymerized film formed thereon was taken out from the reactor, washed with ethanol to wash away unreacted crown ether, and then dried indoors.
第2図,第3図にExpNo−6のATR及び走電型電子
顕微鏡真写を示す。第2図よりプラズマ重合物がモノマ
ーの官能基を有している事及び第3図からプラズマ重合
物が平膜状に又一部では粒状で酢酸セリローズ多孔質膜
上へ付加している事及び一部の重合物は粒状を形成して
いる事がわかる。2 and 3 show the ATR of the Expp No-6 and a true copy of a scanning electron microscope. From FIG. 2 that the plasma polymer has a functional group of a monomer, and from FIG. 3 that the plasma polymer is added in the form of a flat film or partially in the form of granules on the serirose acetate porous film, and It can be seen that some of the polymers formed particles.
実施例2 実施例1の複合膜ではクラウンエーテル重合膜が0.0
2g付着しており、KI.KSCN.NH4SCNの各メタノ
ール溶液に該複合膜を浸漬し塩との錯体を形成させた。
各溶液中の塩濃度の減少からクラウンエーテル重合物の
錯体形成能を測定し、KI/重合物=0.6/1(モル
/モル)、KSCN/重合物=0.57/1(モル、モ
ル)、NH4SCN/重合物=0.4/1(モル/モル)の値
が得られる。 Example 2 In the composite film of Example 1, the crown ether polymer film was 0.0
2 g is attached, and KI. KSCN. The composite membrane was dipped in each methanol solution of NH 4 SCN to form a complex with a salt.
The complex-forming ability of the crown ether polymer was measured from the decrease in the salt concentration in each solution, and KI / polymer = 0.6 / 1 (mol / mol), KSCN / polymer = 0.57 / 1 (mol, Mol), NH 4 SCN / polymer = 0.4 / 1 (mol / mol).
第1図は十字管型プラズマ重合装置であり、1は高周波
(RF)電源、2はガラス製反応器、3は上部電極、5
は基板(下部電極)、4はプラズマ重合用試料、21は
モノマー加熱用容器、20はモノマーを示す。第2図は
ATRの結果を示す。Aはジシクロヘキシル18−クラ
ウン−6モノマー、Bは酢酸セルローズ多孔質膜、Cは
ジシクロヘキシル18−クラウン−6のプラズマ重合物
を担持した酢酸セルローズ多孔質膜のATRスペクトル
を示す。第3図(電顕写真)はジシクロヘキシル18−
クラウン−6のプラズマ重合物を担持した酢酸セルロー
ズ多孔質膜の走査型電子顕微鏡写真を示す。(倍率10
00倍)FIG. 1 shows a cross-tube type plasma polymerization apparatus, 1 is a radio frequency (RF) power supply, 2 is a glass reactor, 3 is an upper electrode, 5
Is a substrate (lower electrode), 4 is a sample for plasma polymerization, 21 is a container for heating a monomer, and 20 is a monomer. FIG. 2 shows the results of ATR. A is the dicyclohexyl 18-crown-6 monomer, B is the cellulose acetate porous membrane, and C is the ATR spectrum of the cellulose acetate porous membrane carrying the plasma polymer of dicyclohexyl 18-crown-6. Figure 3 (electron micrograph) shows dicyclohexyl 18-
The scanning electron microscope photograph of the cellulose acetate porous film carrying the plasma polymer of Crown-6 is shown. (Magnification 10
00 times)
Claims (4)
で活性化し重合、不溶化することを特徴とするクラウン
エーテル重合物の製造方法。1. A method for producing a crown ether polymer, which comprises activating a crown ether compound in a low-temperature plasma for polymerization and insolubilization.
ラズマ中へ導入する特許請求の範囲第1項記載の方法。2. The method according to claim 1, wherein the crown ether compound is vaporized and introduced into the low temperature plasma.
導入して活性化する特許請求の範囲第1項又は第2項記
載の方法。3. The method according to claim 1 or 2, wherein vapor of a crown ether compound is introduced between the electrodes for activation.
で発生させる特許請求の範囲第1項記載の方法。4. A low-temperature plasma is supplied at a vacuum degree of 10 -5 to 100 Torr.
The method according to claim 1, which is generated by
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11559285A JPH0613610B2 (en) | 1985-05-29 | 1985-05-29 | Method for producing crown ether polymer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP11559285A JPH0613610B2 (en) | 1985-05-29 | 1985-05-29 | Method for producing crown ether polymer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS61272231A JPS61272231A (en) | 1986-12-02 |
| JPH0613610B2 true JPH0613610B2 (en) | 1994-02-23 |
Family
ID=14666418
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP11559285A Expired - Lifetime JPH0613610B2 (en) | 1985-05-29 | 1985-05-29 | Method for producing crown ether polymer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0613610B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7405115B2 (en) | 2001-02-28 | 2008-07-29 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0794561B2 (en) * | 1991-04-30 | 1995-10-11 | 工業技術院長 | Method for producing polymer ion conductor and method for producing solid electrolyte |
| US6147225A (en) * | 1998-06-02 | 2000-11-14 | Betzdearborn Inc. | Thiacrown ether compound |
| CN114702635B (en) * | 2022-03-28 | 2023-04-07 | 辽宁石油化工大学 | Preparation method of Schiff base crown ether polymer and application of Schiff base crown ether polymer in anion exchange membrane |
-
1985
- 1985-05-29 JP JP11559285A patent/JPH0613610B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7405115B2 (en) | 2001-02-28 | 2008-07-29 | Semiconductor Energy Laboratory Co., Ltd. | Semiconductor device and manufacturing method thereof |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS61272231A (en) | 1986-12-02 |
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