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JPH0613963B2 - Surface defect inspection method - Google Patents
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JPH0613963B2 - Surface defect inspection method - Google Patents

Surface defect inspection method

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Publication number
JPH0613963B2
JPH0613963B2 JP59186325A JP18632584A JPH0613963B2 JP H0613963 B2 JPH0613963 B2 JP H0613963B2 JP 59186325 A JP59186325 A JP 59186325A JP 18632584 A JP18632584 A JP 18632584A JP H0613963 B2 JPH0613963 B2 JP H0613963B2
Authority
JP
Japan
Prior art keywords
inspected
phase
optical system
light
detected
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP59186325A
Other languages
Japanese (ja)
Other versions
JPS6165107A (en
Inventor
秀明 土井
▲靖▼彦 原
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP59186325A priority Critical patent/JPH0613963B2/en
Publication of JPS6165107A publication Critical patent/JPS6165107A/en
Publication of JPH0613963B2 publication Critical patent/JPH0613963B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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  • Microscoopes, Condenser (AREA)
  • Length Measuring Devices By Optical Means (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)

Description

【発明の詳細な説明】 〔発明の利用分野〕 本発明は、特に光学的に透明な被検査物体上にある微小
凹凸欠陥と異物欠陥とを弁別して検査するのに好適な表
面欠陥検査方法に関するものである。
Description: FIELD OF THE INVENTION The present invention relates to a surface defect inspection method particularly suitable for discriminating and inspecting minute unevenness defects and foreign matter defects on an optically transparent object to be inspected. It is a thing.

〔発明の背景〕[Background of the Invention]

光学的に透明な物体表面の微小な凹凸を測定する手段と
して、光の干渉を用いるものがある。この一例として第
5図に示すようなマイケルソン干渉計と呼ばれるものが
ある。マイケルソン干渉計は例えば岩波書店発行(昭和
34年)久保田広著「応用光学」第98頁から第100頁ま
でに記載されているが、第5図を用いて、この原理を説
明する。
As a means for measuring minute irregularities on the surface of an optically transparent object, there is one that uses light interference. As an example of this, there is a so-called Michelson interferometer as shown in FIG. The Michelson interferometer is, for example, published by Iwanami Shoten (Showa
34) Hiroshi Kubota, "Applied Optics", pages 98 to 100. This principle will be explained with reference to FIG.

レーザ光線等のコヒーレント光源1から出た光線がビー
ムスプリッタ2によって二つの光束に分けられ、その一
方の光束は対物レンズ3を通して被検査物体4の表面に
投影され、他方の光束は一般に対物レンズ3と等しい倍
率を持つ対物レンズ5を通して参照鏡6に投影される。
参照鏡6は対物レンズ5の視野内において、高い平面精
度を有する鏡面である。被検査物体4および参照鏡6か
らの反射光はそれぞれ対物レンズ3および5によって集
光され、ビームスプリッタ2で合成され、干渉像を像面
7に結像する。
A light beam emitted from a coherent light source 1 such as a laser beam is divided into two light beams by a beam splitter 2, one light beam of which is projected on a surface of an object 4 to be inspected through an objective lens 3, and the other light beam is generally an objective lens 3. Is projected on the reference mirror 6 through the objective lens 5 having a magnification equal to.
The reference mirror 6 is a mirror surface having high plane accuracy in the field of view of the objective lens 5. The reflected lights from the object 4 to be inspected and the reference mirror 6 are condensed by the objective lenses 3 and 5, respectively, are combined by the beam splitter 2, and an interference image is formed on the image plane 7.

この場合の干渉原理は、ビームスプリッタ2の反射面上
の点Oと被検査物体4上の点Q1の距離OQ1と、点Oと参
照鏡6上の点Q2の距離OQ2の差△xが、使用する光線の
波長をλとして、1/4λの奇数倍であれば、干渉によっ
て被検査物体4からの反射光と参照鏡6からの反射光は
互いに弱めあい、一方、△xが1/4λの偶数倍であれ
ば、両反射光は互に強めあうというものである。すなわ
ち、参照鏡6の位置を光軸方向に移動すると、像面7は
明暗を繰り返し、前記△xが1/4λの整数倍になる毎
に、像面7は明るさの極大値となる。
This interference principle in this case, the distance OQ 1 point to Q 1 on the point O and the object to be inspected 4 on the reflective surface of the beam splitter 2, the difference between the distance OQ 2 points Q 2 on the reference mirror 6 and a point O If Δx is an odd multiple of 1 / 4λ, where λ is the wavelength of the light beam used, the reflected light from the inspected object 4 and the reflected light from the reference mirror 6 weaken each other due to interference, while Δx If is an even multiple of 1 / 4λ, both reflected lights will strengthen each other. That is, when the position of the reference mirror 6 is moved in the optical axis direction, the image plane 7 repeats bright and dark, and the image plane 7 becomes the maximum value of the brightness every time Δx becomes an integral multiple of 1 / 4λ.

本原理によって、被検査試料4上の凹凸は、その凹凸量
に応じて1/4λを周期として明暗となって像面7で観測
される。
According to this principle, the unevenness on the inspected sample 4 becomes bright and dark with a period of 1 / 4λ according to the amount of the unevenness, and is observed on the image plane 7.

このような、光の干渉を用いて光学的に透明な物体表面
の微小な凹凸を検出する方法は、例えば、特開昭57-120
805号公報に記載されている。この公知例では、前記マ
イケルソン干渉計の参照鏡6を光軸に対して僅かに傾け
て、検出範囲内に必ず明暗1対以上の干渉縞を生じるよ
うにして背景の干渉条件を変化させ、被検査物体上の微
小凹凸欠陥をコントラスト良く検出できる条件が得られ
るようになっている。
Such a method of detecting minute irregularities on the surface of an optically transparent object by using light interference is disclosed in, for example, JP-A-57-120.
It is described in Japanese Patent No. 805. In this known example, the reference mirror 6 of the Michelson interferometer is slightly tilted with respect to the optical axis to change the background interference condition so that one or more pairs of bright and dark interference fringes always occur in the detection range. The conditions are such that minute irregularities on the object to be inspected can be detected with good contrast.

しかし、これら公知例に述べられている方法は、被検査
物体4あるいは参照鏡6からの反射を考えているだけ
で、対物レンズ3や対物レンズ5等の光路中に挿入され
ている物体からの反射光については配慮されていない。
特に対物レンズ3,5等に、通常、収差を補正するため
に複数のレンズを組みあわせた、例えば第6図に示すプ
ラン対物レンズ等の組合わせレンズを用いる必要があ
り、各レンズ表面からの反射光q1,q2,qn等と参照鏡6か
らの反射光等、種々の光が互いに干渉し、像面7上でバ
ックグランドノイズとして検出されるため、被検査物体
4上の微小な凹凸による像面7上の干渉像の認識が困難
となる課題があった。
However, the methods described in these publicly known examples only consider reflection from the object 4 to be inspected or the reference mirror 6, and the object 3 or the objective 5 inserted from the object inserted in the optical path. No consideration is given to reflected light.
In particular, it is usually necessary to use a combination lens such as a plan objective lens shown in FIG. 6 in which a plurality of lenses are combined in order to correct aberrations in the objective lenses 3 and 5, etc. Since various lights such as the reflected lights q 1 , q 2 , and q n and the reflected light from the reference mirror 6 interfere with each other and are detected as background noise on the image plane 7, minute amounts on the inspected object 4 are detected. There is a problem that it is difficult to recognize an interference image on the image surface 7 due to such unevenness.

また、被検査物体4上の埃等の異物の反射率が高い場
合、この異物からの反射光と同位相の被検査物からの反
射光とは区別することができず、一方、異物の反射率が
低い場合には像面7上に干渉像は得られないが、像面7
上で異物近傍の背景が明るいと、被検査物体4上の凹凸
欠陥と同様に観測されるので、被検査物体上の凹凸欠陥
のみを精度良く検出することはできないという課題があ
った。
Further, when the reflectance of foreign matter such as dust on the inspected object 4 is high, the reflected light from the foreign matter and the reflected light from the inspected object in the same phase cannot be distinguished from each other. When the ratio is low, an interference image cannot be obtained on the image plane 7, but the image plane 7
If the background in the vicinity of the foreign matter is bright, the uneven defects on the inspected object 4 are observed as in the above case, so that there is a problem that only the uneven defects on the inspected object cannot be accurately detected.

〔発明の目的〕[Object of the Invention]

本発明の目的は、上記従来技術の課題を解決すべく、位
相差顕微鏡光学系のみでは識別不可能な被検査物体上に
存在する微小凹凸欠陥と埃等の異物欠陥とを画像信号と
して弁別して検査できるようにした表面欠陥検査方法を
提供することにある。
The object of the present invention is to solve the above-mentioned problems of the prior art by discriminating, as an image signal, a minute unevenness defect existing on an inspected object that cannot be identified only by a phase contrast microscope optical system and a foreign matter defect such as dust. An object of the present invention is to provide a surface defect inspection method capable of inspecting.

〔発明の概要〕[Outline of Invention]

本発明は、上記目的を達成するために、位相差顕微鏡光
学系と顕微鏡光学系とを同一の検出光軸を有して配置
し、前記位相差顕微鏡光学系を用いて被検査物体によっ
て位相変調された回折光と前記被検査物体によって振幅
変調された直接光とを位相板を通して干渉させて光電変
換手段で受光して前記被検査物体からの位相差量に応じ
て少なくとも被検査物体上の微小凹凸欠陥を顕在化した
第1の2次元濃淡画像信号を検出し、前記顕微鏡光学系
を用いて前記被検査物体と被検査物体上の異物欠陥とか
らの反射率または透過率の相違に基づいて前記被検査物
体からの反射光または透過光を光電変換手段で受光して
前記反射率または透過率に応じて被検査物体上の異物欠
陥を顕在化した第2の2次元濃淡画像信号を検出し、前
記同一の検出光軸に基づいて同一の座標系で検出される
第1の2次元濃淡画像信号と第2の2次元濃淡画像信号
とを比較して被検査物体上の微小凹凸欠陥と異物欠陥と
を弁別して検査することを特徴とする表面欠陥検査方法
である。
In order to achieve the above object, the present invention arranges a phase-contrast microscope optical system and a microscope optical system with the same detection optical axis, and uses the phase-contrast microscope optical system to perform phase modulation by an object to be inspected. The diffracted light and the direct light amplitude-modulated by the inspected object interfere with each other through the phase plate and are received by the photoelectric conversion means, and at least a minute amount on the inspected object is received according to the phase difference amount from the inspected object. A first two-dimensional gray-scale image signal that reveals the uneven defect is detected, and based on the difference in reflectance or transmittance between the object to be inspected and the foreign matter defect on the object to be inspected by using the microscope optical system. The reflected light or the transmitted light from the inspected object is received by the photoelectric conversion means, and the second two-dimensional grayscale image signal in which the foreign matter defect on the inspected object is revealed according to the reflectance or the transmittance is detected. , On the same detection optical axis Then, the first two-dimensional gray image signal and the second two-dimensional gray image signal detected in the same coordinate system are compared with each other to discriminate between the minute irregularity defect and the foreign matter defect on the inspected object and inspect them. Is a surface defect inspection method.

〔発明の実施例〕Example of Invention

先ず、本発明の原理について第2図〜第4図に基づいて
説明する。第2図に位相差顕微鏡の光学系の一例を示す
が、被検査物体14の透過率によって変調される直接光8
を背景強とし、被検査物体の屈折率変化あるいは厚みの
変化によって位相変調される回折光9に位相板16を用い
て直接光と干渉するように位相変化を与え、被検査物体
14による位相変化を明暗コントラストで像面17を観察で
きるようにしたものである。こゝで、10は光源、11はコ
レクタレンズ、12はリングスリット、13はコンデンサレ
ンズ、15は対物レンズである。直接光8と回折光9が干
渉するように、振幅の大きい直接光8は吸収膜18によっ
て減衰させるが、位相差顕微鏡の主たる用途からいっ
て、被検査物体14の忠実度を大きく損なわないように、
吸収膜18の吸収率は90%程度までである。
First, the principle of the present invention will be described with reference to FIGS. FIG. 2 shows an example of the optical system of the phase contrast microscope. Direct light 8 modulated by the transmittance of the object 14 to be inspected is shown.
As a background strength, the phase change is applied to the diffracted light 9 that is phase-modulated by the change in the refractive index or the change in the thickness of the object to be inspected so as to directly interfere with the light,
The phase change caused by 14 can be observed on the image plane 17 with a contrast of light and dark. Here, 10 is a light source, 11 is a collector lens, 12 is a ring slit, 13 is a condenser lens, and 15 is an objective lens. The direct light 8 having a large amplitude is attenuated by the absorption film 18 so that the direct light 8 and the diffracted light 9 interfere with each other. However, from the main use of the phase contrast microscope, the fidelity of the inspected object 14 is not greatly impaired. To
The absorption rate of the absorption film 18 is up to about 90%.

本発明の目的からいって、位相差の有無を検出すればよ
いので、直接光8をさらに減少させるか、あるいは全く
通過させずに、主として回折光9を検出すれば、被検査
物体14による低位相差、すなわち、被検査物体14の微小
な凹凸を高感度に検出することができる。
For the purpose of the present invention, it suffices to detect the presence or absence of a phase difference. Therefore, if the diffracted light 9 is mainly detected without further reducing the direct light 8 or letting the direct light 8 pass through at all, a low level due to the inspected object 14 is detected. The phase difference, that is, the minute unevenness of the inspected object 14 can be detected with high sensitivity.

位相板16による直接光8と回折光9の干渉のさせ方によ
って、すなわち、両光線の位相関係が同位相のとき、直
接光8による背景コントラスト19は明るいものとなり、
逆位相のときに暗いものとなる。ところで、埃等の異物
が被検査物体14上にあるとき、異物は像面17に暗部とし
て検出されるが、背景コントラスト19が暗いときは検出
することができず、逆に背景コントラスト19が明るいと
きは検出できる。しかし、この検出された異物を被検査
物体14上に微小凹凸欠陥と識別することは困難である。
一方、例えば、通常の透過照明あるいは落射照明を用い
る場合には、微小凹凸欠陥を検出することはできない
が、異物等は容易に検出することができる。
Depending on how the direct light 8 and the diffracted light 9 are caused to interfere with each other by the phase plate 16, that is, when the phase relationship between both light beams is the same, the background contrast 19 due to the direct light 8 becomes bright,
It becomes dark at the opposite phase. By the way, when a foreign matter such as dust is present on the inspected object 14, the foreign matter is detected as a dark portion on the image plane 17, but when the background contrast 19 is dark, it cannot be detected, and on the contrary, the background contrast 19 is bright. When can be detected. However, it is difficult to identify the detected foreign matter as a minute unevenness defect on the inspected object 14.
On the other hand, for example, when normal transmitted illumination or epi-illumination is used, minute irregularity defects cannot be detected, but foreign matters can be easily detected.

そこで、位相差顕微鏡光学系と、例えばリングスリット
12を除去した透過照明(通常顕微鏡)とを併用し、第3
図のように位相差顕微鏡光学系による像面19の背景コン
トラストが明るいとき(a)に示す検出された欠陥20,21の
うち、通常顕微鏡でも同様に検出される欠陥21は異物で
あり、検出されない欠陥20は被検査物体14上の微小凹凸
欠陥であると識別できる。第4図のように、位相差顕微
鏡光学系による像面19の背景コントラストが暗いとき
(a)に示す検出された欠陥20は被検査物体上の微小凹凸
欠陥であり、通常顕微鏡によって検出される欠陥は異物
であると識別できる。第3図および第4図中ハッチング
が施された部分は視野中暗い部分を表わす。
Therefore, a phase contrast microscope optical system and, for example, a ring slit
Use with transmitted illumination (normal microscope) with 12 removed,
Of the detected defects 20 and 21 shown in (a) when the background contrast of the image plane 19 by the phase contrast microscope optical system is bright as shown in the figure, the defect 21 that is also detected in the normal microscope is a foreign matter, and is detected. The defect 20 that is not identified can be identified as a fine uneven defect on the inspected object 14. As shown in Fig. 4, when the background contrast of the image plane 19 by the phase contrast microscope optical system is dark
The detected defect 20 shown in (a) is a fine concavo-convex defect on the inspected object, and the defect usually detected by the microscope can be identified as a foreign substance. The hatched area in FIGS. 3 and 4 represents a dark area in the visual field.

以下に、図面を参照しながら、実施例を用いて本発明を
一層詳細に説明するが、それらは例示に過ぎず、本発明
の枠を越えることなしにいろいろな変形や改良があり得
ることは勿論である。
Hereinafter, the present invention will be described in more detail using examples with reference to the drawings, but these are merely examples, and various modifications and improvements may be made without departing from the scope of the present invention. Of course.

第1図を参照すれば、透過照明光源10より発せられた透
過照明光25はコレクタレンズ11,リングスリット12,コ
ンデンサレンズ13を通って被検査物体14(磁気バブルメ
モリはGd3G95O12等の光学的に透明なウエハ上にY3Fe5O
12等の磁性ガーネット透明薄膜をこの液相成長させたも
のを基板として作成する。磁気バブルメモリの特性確保
のため、この透明基の凹凸を測定する必要がある。)を
照明する。透明照明光25によって、被検査物体14から、
被検査物体の透過率によって主として振幅変調される直
接光29と被検査物体の厚さあるいは屈折率によって主と
して位相変調される回折光26が発せられる。直接光29
は、位相板16によってλ/4あるいは−λ/4の位相変化を
受け、吸収膜18によって減衰させられて、回折光26と干
渉できるように変換される。これにより、テレビカメラ
23の像面上に被検査物体の位相差量に応じた2次元濃淡
画像信号(第3図(a)または第4図(a)に示す。)を検出
することができる。
Referring to FIG. 1, the transmitted illumination light 25 emitted from the transmitted illumination light source 10 passes through a collector lens 11, a ring slit 12 and a condenser lens 13, and an object 14 to be inspected (the magnetic bubble memory is Gd 3 G 95 O 12 Y 3 Fe 5 O on an optically transparent wafer such as
A magnetic garnet transparent thin film such as 12 is prepared by this liquid phase growth as a substrate. In order to secure the characteristics of the magnetic bubble memory, it is necessary to measure the unevenness of this transparent base. ). From the inspected object 14 by the transparent illumination light 25,
Direct light 29 that is amplitude-modulated mainly by the transmittance of the object to be inspected and diffracted light 26 that is phase-modulated mainly by the thickness or refractive index of the object to be inspected are emitted. Direct light 29
Undergoes a phase change of λ / 4 or −λ / 4 by the phase plate 16, is attenuated by the absorption film 18, and is converted so as to interfere with the diffracted light 26. This allows the TV camera
It is possible to detect a two-dimensional grayscale image signal (shown in FIG. 3 (a) or FIG. 4 (a)) according to the phase difference amount of the object to be inspected on the 23 image planes.

一方、落射照明光源24による落射照明光28はハーフミラ
ー22によって光軸を曲げられ、対物レンズ15を通して、
被検査物体14を落射照明する。これによる被検査物体14
の反射率に応じた振幅を与えられた反射光27は、テレビ
カメラ(上記位相差顕微鏡光学系と同一検出光軸を有す
る。)23によって検出され、同一の位置座標を持った
2次元濃淡画像信号(第3図(b)または第4図(b)に示
す。)が得られる。
On the other hand, the epi-illumination light 28 from the epi-illumination light source 24 has its optical axis bent by the half mirror 22, passes through the objective lens 15, and
The inspected object 14 is illuminated by epi-illumination. Object to be inspected 14
The reflected light 27 given an amplitude according to the reflectance of the is detected by a television camera (having the same detection optical axis as the phase difference microscope optical system) 23 and is a two-dimensional grayscale image having the same position coordinates. A signal (shown in FIG. 3 (b) or FIG. 4 (b)) is obtained.

被検査物体14への照明は透過照明光源10と落射照明光源
24を切り換えることによっていずれかによって行なわ
れ、透明照明光源25を用いた場合には位相差顕微鏡照明
光学系を、落射照明光源22を用いた場合には、通常の顕
微鏡照明法を得ることができる。
Illumination of the object 14 to be inspected is through illumination light source 10 and epi-illumination light source.
It is performed by switching 24, and a phase contrast microscope illumination optical system can be obtained when the transparent illumination light source 25 is used, and a normal microscope illumination method can be obtained when the epi-illumination light source 22 is used. .

位相板16の選び方によって、背景の明るい前記第3図あ
るいは背景の暗い前記第4図のような画像をテレビカメ
ラ23で検出できる。第3図の場合には、位相差顕微鏡光
学系で得られる第3図(a)と通常顕微鏡の照明で得られ
る第3図(b)とを比較することにより両者に存在する特
異点21は埃等の異物であり、(a)のみに存在する特異点2
0は微小凹凸欠陥であると判定できる。第4図の場合に
は、位相差顕微鏡光学系で得られる特異点(a)は、微小
凹凸欠陥であり、通常顕微鏡の照明で得られる特異点
(b)は埃等の異物である、と判定できる。
Depending on how the phase plate 16 is selected, the television camera 23 can detect an image as shown in FIG. 3 with a bright background or as shown in FIG. 4 with a dark background. In the case of FIG. 3, by comparing FIG. 3 (a) obtained by the phase contrast microscope optical system with FIG. 3 (b) obtained by the illumination of a normal microscope, the singularity 21 existing in both is found. Singularity 2 which is a foreign substance such as dust and exists only in (a)
It can be judged that 0 is a minute unevenness defect. In the case of FIG. 4, the singular point (a) obtained by the phase contrast microscope optical system is a minute unevenness defect, and the singular point obtained by ordinary microscope illumination.
It can be determined that (b) is a foreign substance such as dust.

以上の実施例では位相差顕微鏡照明と通常顕微鏡の落射
照明とを組み合わせたが、位相差顕微鏡照明と組み合わ
せる通常顕微鏡の照明法は他の照明法でもよく、例えば
透過照明あるいは暗視野照明あるいは微分干渉顕微鏡と
の組み合わせであってもよい。
In the above embodiments, the phase contrast microscope illumination and the episcopic illumination of the ordinary microscope are combined, but the illumination method of the ordinary microscope combined with the phase difference microscope illumination may be another illumination method, for example, transmitted illumination or dark field illumination or differential interference. It may be combined with a microscope.

〔発明の効果〕〔The invention's effect〕

以上説明したように、本発明によれば、位相差顕微鏡光
学系のみでは識別不可能な被検査物体上の微小凹凸欠陥
と埃等の異物欠陥とを2次元画像信号から画像信号とし
て弁別して検査することができる効果を奏する。
As described above, according to the present invention, it is possible to discriminate a minute unevenness defect on an object to be inspected and a foreign matter defect such as dust which cannot be identified only by a phase contrast microscope optical system from a two-dimensional image signal as an image signal for inspection. There is an effect that can be.

【図面の簡単な説明】[Brief description of drawings]

第1図は本発明による表面欠陥検査方法を実施するため
の装置の図式図、第2図は位相差顕微鏡光学系の構成を
示す図式図、第3図(a),(b)および第4図(a),(b)はそ
れぞれ位相差顕微鏡光学系および通常顕微鏡で観察され
る像を示す図、第5図は従来の表面欠陥検査方法で使用
されている干渉光学系の構成を示す図式図、第6図は第
5図に示す光学系の中で使用される対物レンズの模式図
である。 10…透過照明光源、11…コンタクトレンズ、12…リング
スリット、13…コンデンサレンズ、14…被検査物体、15
…対物レンズ、16…位相板、17…像面、18…吸収膜、19
…背景コントラスト、20…微小凹凸欠陥の像、21…埃な
どの異物の像、22…ハーフミラー、23…テレビカメラ、
24…落射照明光源、25…透過照明光、26…回折光、27…
反射光、28…落射照明光、29…直接光。
FIG. 1 is a schematic diagram of an apparatus for carrying out a surface defect inspection method according to the present invention, FIG. 2 is a schematic diagram showing a configuration of a phase contrast microscope optical system, FIGS. 3 (a), (b) and 4 Figures (a) and (b) are images showing images observed with a phase contrast microscope optical system and a normal microscope, respectively. Figure 5 is a schematic diagram showing the structure of an interference optical system used in a conventional surface defect inspection method. 6 and 6 are schematic views of the objective lens used in the optical system shown in FIG. 10 ... Transmitted illumination light source, 11 ... Contact lens, 12 ... Ring slit, 13 ... Condenser lens, 14 ... Inspected object, 15
… Objective lens, 16… Phase plate, 17… Image plane, 18… Absorption film, 19
… Background contrast, 20… Image of minute unevenness defect, 21… Image of foreign matter such as dust, 22… Half mirror, 23… TV camera,
24 ... Epi-illumination light source, 25 ... Transmitted illumination light, 26 ... Diffracted light, 27 ...
Reflected light, 28 ... Epi-illumination light, 29 ... Direct light.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】位相差顕微鏡光学系と顕微鏡光学系とを同
一の検出光軸を有して配置し、前記位相差顕微鏡光学系
を用いて被検査物体によって位相変調された回折光と前
記被検査物体によって振幅変調された直接光とを位相板
を通して干渉させて光電変換手段で受光して前記被検査
物体からの位相差量に応じて少なくとも被検査物体上の
微小凹凸欠陥を顕在化した第1の2次元濃淡画像信号を
検出し、前記顕微鏡光学系を用いて前記被検査物体と被
検査物体上の異物欠陥とからの反射率または透過率の相
違に基づいて前記被検査物体からの反射光または透過光
を光電変換手段で受光して前記反射率または透過率に応
じて被検査物体上の異物欠陥を顕在化した第2の2次元
濃淡画像信号を検出し、前記同一の検出光軸に基づいて
同一の座標系で検出される第1の2次元濃淡画像信号と
第2の2次元濃淡画像信号とを比較して被検査物体上の
微小凹凸欠陥と異物欠陥とを弁別して検査することを特
徴とする表面欠陥検査方法。
1. A phase-contrast microscope optical system and a microscope optical system are arranged with the same detection optical axis, and diffracted light phase-modulated by an object to be inspected using the phase-contrast microscope optical system and the object to be detected. The direct light amplitude-modulated by the inspection object is made to interfere through the phase plate and is received by the photoelectric conversion means, and at least minute irregularity defects on the inspection object are revealed according to the phase difference amount from the inspection object. The two-dimensional gray-scale image signal of No. 1 is detected, and the reflection from the inspected object is performed based on the difference in the reflectance or the transmittance between the inspected object and the foreign matter defect on the inspected object using the microscope optical system. Light or transmitted light is received by a photoelectric conversion means, a second two-dimensional grayscale image signal in which a foreign matter defect on an object to be inspected is revealed according to the reflectance or the transmittance, and the same detection optical axis is detected. Based on the same coordinate system Comparing the first two-dimensional gray image signal with the second two-dimensional gray image signal, and discriminating the fine unevenness defect and the foreign matter defect on the inspected object and inspecting the surface defect inspection method. .
JP59186325A 1984-09-07 1984-09-07 Surface defect inspection method Expired - Lifetime JPH0613963B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59186325A JPH0613963B2 (en) 1984-09-07 1984-09-07 Surface defect inspection method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59186325A JPH0613963B2 (en) 1984-09-07 1984-09-07 Surface defect inspection method

Publications (2)

Publication Number Publication Date
JPS6165107A JPS6165107A (en) 1986-04-03
JPH0613963B2 true JPH0613963B2 (en) 1994-02-23

Family

ID=16186363

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59186325A Expired - Lifetime JPH0613963B2 (en) 1984-09-07 1984-09-07 Surface defect inspection method

Country Status (1)

Country Link
JP (1) JPH0613963B2 (en)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS636854A (en) * 1986-06-27 1988-01-12 Hitachi Ltd Foreign object inspection device
JPS636442A (en) * 1986-06-27 1988-01-12 Hitachi Ltd Method and device for foreign matter inspection
JPH0646182B2 (en) * 1986-06-27 1994-06-15 株式会社日立製作所 Apparatus and method for inspecting foreign matter on mask
JPH0752156B2 (en) * 1986-06-27 1995-06-05 株式会社日立製作所 Foreign matter inspection device
JP6095382B2 (en) * 2013-01-28 2017-03-15 横浜リーディングデザイン合資会社 Optical system, phase plate used in optical system, and method of manufacturing optical system

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5767844A (en) * 1980-10-15 1982-04-24 Nippon Kogaku Kk <Nikon> Surface inspecting device

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
大越諄「表面アラサ検査方法」(昭34−6−17)株式会社コロナ社P.65

Also Published As

Publication number Publication date
JPS6165107A (en) 1986-04-03

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