JPH0618171B2 - Aperture aperture - Google Patents

Description

The present invention relates to an aperture diaphragm, and more particularly to an aperture diaphragm that defines a cross-sectional shape of an electron beam in an electron beam exposure apparatus.

[Common technology]

Electron beam exposure apparatus, in particular, in the so-called variable area exposure type apparatus that variably controls and exposes the rectangular cross-sectional shape of the electron beam, because the rectangular cross-sectional shape of the electron beam is defined and exposed by the opening portion of the aperture stop, If there is an error in the aperture size of the aperture stop, the rectangular shape of the exposure pattern may be distorted or the connection of the rectangular patterns may become poor.

FIG. 3 shows the structure of a variable area exposure type electron beam exposure apparatus. The electron beam 101 emitted from the electron gun 100 passes through the blanking electrode 102 and the irradiation lens 103, and is irradiated onto the upper surface of the first aperture diaphragm 104 of the two aperture diaphragms 104 and 107 having rectangular openings. This first
Only the electron beam 101 passing through the opening of the aperture diaphragm 104 irradiates the upper surface of the second aperture diaphragm 107. When the direction of the electron beam 101 is controlled by the shaping deflector 105 and the shaping lens 106 placed between the first and second aperture diaphragms 104 and 107, an image of the electron beam 101 projected on the second aperture diaphragm 107 is obtained. , The manner in which the second aperture stop 107 overlaps with the opening portion changes, and an electron beam 101 having a rectangular cross section with a desired area is obtained. After the electron beam 101 is reduced and projected by the reduction lens 108 and the projection lens 109, the positioning deflector 110
An exposure pattern is formed on the material 111 at an arbitrary position.

As described above, the rectangular cross-sectional shape of the electron beam is defined by the narrow angles of the two sides of the first aperture diaphragm and the two angles defined by the relative rotation angles of the first and second aperture diaphragms.

Here, the length of each of the two sides determined by the first and second aperture diaphragms can be adjusted by the shaping deflector, and the first and second aperture diaphragms can be adjusted.
The two angles determined by the relative rotation angle of the second aperture diaphragm can be adjusted by relatively rotating the first and second aperture diaphragms.

However, the two narrow angles determined by the first and second aperture diaphragms themselves cannot be adjusted. Further, the straightness error on each of the four sides of the rectangular cross section is reduced by reducing the electron beam in proportion to the reduction ratio.
Regarding the squareness error of the side, the error does not become small no matter how much the electron beam is reduced. Above all, since the squareness determined by the aperture diaphragm itself cannot be adjusted, it is a factor that must be formed with the highest precision among the machining accuracy of the aperture diaphragm.

[Conventional technology]

As a conventional technique, for example, there is a conventional aperture stop structure disclosed in JP-A-61-19040.

The structure of a conventional aperture stop is shown in FIGS. 4 (a) to 4 (c).
As shown in FIGS. 4 (a) and 4 (b), the blade portions of the blade plate made of molybdenum are opposed to each other to form the upper blade plate pair 201 and the lower blade plate pair 202. Next, as shown in FIG. 4 (c), two pairs of blade plates 201 and 202 were superposed from above and below and welded to form the aperture of the aperture stop.

[Problems to be solved by the invention]

In the conventional aperture diaphragm structure described above, it is possible to obtain an aperture diaphragm having an accurate squareness due to the squareness setting error of the blade plate during welding assembly, the angular deviation due to welding, and the measurement error during squareness inspection. Had the drawback of being extremely difficult.

Further, when the obtained aperture diaphragm is mounted on the electron beam exposure apparatus and the actually exposed rectangular pattern is not an accurate right angle due to various factors, what is necessary is to set the aperture diaphragm so that the exposed rectangular pattern becomes an accurate right angle. There was a drawback that you had to exchange and select again.

[Means for solving problems]

The aperture diaphragm of the present invention comprises a rectangular parallelepiped fixed member, two prismatic movable members arranged in parallel, and a notch that connects one surface of the fixed member and one end of the two movable members. The two blades fixed to the opposite ends of the two movable members so that the two elastically deformable hinges and the two blade-shaped portions have overlapping portions like the blades of scissors and the angle formed by the two blade-shaped portions is a right angle. And a screw for swinging each of the two movable members by a minute angle.

〔Example〕

Next, embodiments of the present invention will be described in detail with reference to the drawings.

FIG. 1 is a perspective view showing an embodiment of the present invention, and FIG.
It is a partially broken plan view of the aperture stop shown in the figure.

The rectangular parallelepiped fixed member 1 is provided with a mounting hole 2 for fixing, and two end portions 5 and 6 of two prismatic movable members 3 and 4 arranged in parallel have elastically deformable hinges having arcuate notches. 7,
It is connected to the fixing member 1 by 8 and integrated.

The two blade-shaped plates 9 and 10 have overlapping portions like scissors blades, and the opposite ends 13 of the movable members 3 and 4 are arranged so that the angle formed by the two blade-shaped portions 1 and 12 is substantially right angle. It is fixed to 14 respectively.

The movable member 3 has a through hole 15 and the movable member 4 has a screw hole 16. This through hole 15 and screw hole 1
A screw 19 having two large-diameter portions 17 and 18 for swinging the movable members 3 and 4 by a small angle is inserted and fixed to the screw 6. Therefore, if the screw 19 is turned in the direction of the arrow 20, the angle formed by the two blade-shaped portions 11 and 12 can be decreased, and if turned in the direction of the arrow 21, the angle can be increased.

The rectangular pattern actually exposed by mounting the aperture diaphragm of this embodiment on the electron beam exposure apparatus is not the right angle, but the first pattern.
Alternatively, when it is desired to adjust the squareness of the second aperture stop, the screw 19 may be rotated to adjust the squareness of the aperture stop. By this squareness adjustment, the position of the intersection 22 of the two blade-shaped portions 11 and 12 moves and the length of each side of the rectangular pattern changes, but the shaping deflector 105 placed between the first and second aperture stops. Can be easily modified by.

Further, when the aperture diaphragm in this embodiment is used as the first aperture diaphragm, a rectangular cross-sectional shape can be obtained in one step if two aperture diaphragms are used so as to face each other.

〔The invention's effect〕

In the aperture stop of the present invention, two blade plates for obtaining an electron beam having a rectangular cross section are not welded and fixed as in the conventional case, but the angle formed by the blade portions can be changed by a minute amount.
The effect is that the squareness can be adjusted without changing the aperture diaphragm.

For this reason, it is not necessary to repeatedly replace and select the aperture diaphragm so that the exposed rectangular pattern becomes a right angle, and it is possible to save a great deal of labor and time.

Further, there is an effect that the production of the aperture diaphragm does not need to be performed at a right angle, and the yield is dramatically improved.

[Brief description of drawings]

FIG. 1 is a perspective view showing an embodiment of the present invention, and FIG.
FIG. 3 is a partially cutaway plan view of the aperture stop shown in FIG. 3, FIG. 3 is a configuration diagram of an electron beam exposure apparatus using a variable area exposure system, and FIG.
(A)-(c) is a perspective view which shows an example of the prior art. 1 ... Fixed member, 3, 4 ... Movable member, 7, 8 ... Elastically deformable hinge, 9, 10 ... Blade plate, 19 ... Screw, 10
1 ... Electron beam, 104 ... First aperture stop, 105
...... Shaping deflector, 107 …… Second aperture stop, 20
1 ... Upper blade pair, 202 ... Lower blade pair.

Claims (1)

[Claims] 1. A rectangular parallelepiped fixing member and 2 arranged in parallel.
Number of prismatic movable members, two elastically deformable hinges formed by notches that connect one surface of the fixed member and one ends of the two movable members, and partially overlapping portions like scissors blades And two blade-shaped plates respectively fixed to the opposite ends of the two movable members so that the angle formed by the two blade-shaped portions becomes a right angle, and each of the two movable members is rocked by a small angle. An aperture diaphragm including a screw.