JPH0619263B2 - Surface roughness measuring device - Google Patents
Surface roughness measuring deviceInfo
- Publication number
- JPH0619263B2 JPH0619263B2 JP61016621A JP1662186A JPH0619263B2 JP H0619263 B2 JPH0619263 B2 JP H0619263B2 JP 61016621 A JP61016621 A JP 61016621A JP 1662186 A JP1662186 A JP 1662186A JP H0619263 B2 JPH0619263 B2 JP H0619263B2
- Authority
- JP
- Japan
- Prior art keywords
- image
- subject
- light
- electronic shutter
- interference pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 230000003746 surface roughness Effects 0.000 title claims description 4
- 230000003287 optical effect Effects 0.000 claims description 17
- 238000000034 method Methods 0.000 description 11
- 238000007689 inspection Methods 0.000 description 4
- 238000004439 roughness measurement Methods 0.000 description 4
- 238000001514 detection method Methods 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 238000012546 transfer Methods 0.000 description 3
- 241001422033 Thestylus Species 0.000 description 2
- 238000003384 imaging method Methods 0.000 description 2
- 238000005305 interferometry Methods 0.000 description 2
- 239000000047 product Substances 0.000 description 2
- 230000000630 rising effect Effects 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 230000001427 coherent effect Effects 0.000 description 1
- 230000001066 destructive effect Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 239000013067 intermediate product Substances 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000010297 mechanical methods and process Methods 0.000 description 1
- 230000035945 sensitivity Effects 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
Landscapes
- Length Measuring Devices By Optical Means (AREA)
Description
【発明の詳細な説明】 イ.産業上の利用分野 本発明は光干渉法を用いた表面粗さ測定装置に関する。Detailed Description of the Invention a. TECHNICAL FIELD The present invention relates to a surface roughness measuring device using optical interferometry.
ロ.従来の技術 表面粗さ測定には触針を用いる機械的な方法と非接触的
な光学的方法とが用いられている。触針を用いる方法は
被測定物の材質によっては触針によるきずがつくので破
壊検査となり、製品或は中間製品の検査には使用できな
い場合が多い。光学的な方法は非破壊的であるから、製
品検査、中間検査等には触針法より優れている。B. 2. Description of the Related Art For measuring surface roughness, a mechanical method using a stylus and a non-contact optical method are used. The method using a stylus is a destructive test because flaws are created by the stylus depending on the material of the object to be measured, and in many cases it cannot be used for inspection of products or intermediate products. Since the optical method is nondestructive, it is superior to the stylus method for product inspection, intermediate inspection, etc.
光学的な粗さ測定法としてよく用いられるのは光切断法
とレーザ光が物体表面で反射されてスクリーン上に照射
されるとき現れるスペックルパターンを利用する方法で
あるが、これらの方法は被検体の動きにきわめて敏感で
あるので、製造現場での使用は困難である。The optical cutoff method and the method that utilizes the speckle pattern that appears when the laser light is reflected on the object surface and radiated onto the screen are often used as the optical roughness measurement method. Since it is extremely sensitive to the movement of the sample, it is difficult to use it on the manufacturing site.
ハ.発明が解決しようとする問題点 本発明は光学的な粗さ測定法の非接触性非破壊性の長所
を活かし、被検体の動きに影響されない光学的粗さ測定
装置を提供しようとするものである。C. DISCLOSURE OF THE INVENTION Problems to be Solved by the Invention The present invention is intended to provide an optical roughness measuring device that is not affected by the movement of a subject by taking advantage of the noncontact and nondestructive advantages of the optical roughness measuring method. is there.
ニ.問題点解決のための手段 被検体表面の像と基準面或は被検体自身の表面の像とを
可干渉的に重ねて形成する光学的手段と、上記二つの像
の重なりによって形成される干渉パターンを被検面の瞬
間露光によって撮像するテレビ撮像手段と、この撮像手
段によって得られた画像データに解析を加えて粗さ対応
値を算出するデータ処理手段とにより粗さ測定装置を構
成した。D. Means for Solving Problems Optical means for coherently forming an image of the surface of the subject and an image of the reference surface or the surface of the subject itself, and interference formed by the overlapping of the two images. The roughness measuring device is constituted by a television image pickup means for picking up an image of the pattern by instantaneous exposure of the surface to be inspected and a data processing means for calculating the roughness corresponding value by analyzing the image data obtained by the image pickup means.
そして瞬間露光の方法として、電子シャッタの閃光放電
管を用い、電子シャッタの閉動作開始と閃光放電管の始
動とを連動させるようにした。As a method of instantaneous exposure, a flash discharge tube of an electronic shutter is used, and the start of the closing operation of the electronic shutter and the start of the flash discharge tube are linked.
ホ・作用 テレビカメラは受光面の露光によって生じる光電流を画
素毎に蓄積保持し、この蓄積作用で電荷量に変換された
画像データを走査手段によって順次読出す構成であるか
ら、試料面を瞬間的に露光することで、その瞬間の干渉
パターンを撮像することが可能で、例えば露光時間を1
μSとすれば、秒速10cmで移送される被検体を停止さ
せないで撮像してもその間の被検体の移動量は0.1μ
mであり、これは被検体表面の像を形成する光学系の分
解能より充分に小さい。そして露光方法として電子シャ
ッタと閃光放電管を用い、電子シャッタの聞時特性域と
閃光放電管の発光の立上り域とを重ねることで、閃光発
光の立上り中に光を遮断でき、電子シャッタ或は閃光放
電管単独では実現できない短時間露光が可能となってい
る。干渉法による粗さ測定では光学系の光軸即ち被検体
表面に垂直の方向の分解能はきわめて高くÅのオーダで
あるので、このオーダの粗さ測定に適している。移送中
の物品の上下動は移送装置の振動によって生じるが、1
000Hzで振幅0.01mmの振動(移送装置のフレ
ームに物が当ってカンと云う稍高い音が測定位置に伝わ
って来たような場合)を考えると、1μSの間の上下動
は最大で約600Åであり、0.1μm程度の粗さ測定
が可能である、更に被検体の表面像に同じ被検体の表面
像をずらせて重ね干渉を起させるシャリンダ干渉を用い
ると被検体の上下動があっても二つの像は完全に同じ動
きをするので干渉パターンは全く影響を受けず、粗さ測
定の感度は飛躍的に向上する。E. Action The television camera is configured to store and hold the photocurrent generated by the exposure of the light receiving surface for each pixel and to sequentially read the image data converted into the charge amount by this storing action by the scanning means, so that the sample surface is instantaneously read. Exposure, it is possible to capture an image of the interference pattern at that moment.
If μS, the amount of movement of the subject during that time is 0.1μ even if imaging is performed without stopping the subject transferred at a speed of 10 cm per second.
m, which is sufficiently smaller than the resolution of the optical system that forms an image of the surface of the subject. Then, by using an electronic shutter and a flash discharge tube as an exposure method, and by overlapping the listening characteristic range of the electronic shutter and the rising range of the light emission of the flash discharge tube, it is possible to block the light during the rising of the flash light emission, and the electronic shutter or It enables short-time exposure that cannot be achieved with a flash discharge tube alone. In the roughness measurement by the interferometry, the resolution in the direction perpendicular to the optical axis of the optical system, that is, the surface of the subject is extremely high and is on the order of Å. Therefore, it is suitable for the roughness measurement of this order. Up and down movement of articles during transfer is caused by the vibration of the transfer device.
Considering a vibration with an amplitude of 0.01 mm at 000 Hz (when a high-pitched sound such as a can is transmitted to the measurement position due to an object hitting the frame of the transfer device), the maximum vertical movement during 1 μS is approximately It is 600 Å, and it is possible to measure the roughness of about 0.1 μm. Furthermore, when Sharinda interference is used that causes the surface image of the same object to be overlapped with the surface image of the same object, vertical movement of the object may occur. However, since the two images move exactly the same, the interference pattern is not affected at all, and the sensitivity of roughness measurement is dramatically improved.
ヘ.実施例 第1図は本発明の一実施例を示す。1は被検体でコンベ
アCにより矢印方向に移送されている。2は対物レンズ
で被検体1の表面の拡大像をCCDセル10の受光面に
形成する。3は対物レンズ2と被検体1の表面との間に
対物レンズ2の光軸に直交するように挿入された平面半
透明鏡であり、対物レンズ2の下面中央は高反射率被膜
4が形成してある。従って光源6の光は半透明鏡3で上
下に分割され、上向きに反射された光は対物レンズ2の
下面中央で反射され、再度半透明鏡3で上向きに反射さ
れる。この構成によってCCD10の受光面には対物レ
ンズ2の下面中央部の像も形成される。つまり図示の干
渉計は対物レンズ2の下面を基準面として、被検体1の
表面の像と基準面の像とをCCD10の受光面上に可干
渉的に重ねて形成するものである。F. Embodiment FIG. 1 shows an embodiment of the present invention. Reference numeral 1 is a subject, which is transported by the conveyor C in the direction of the arrow. An objective lens 2 forms an enlarged image of the surface of the subject 1 on the light receiving surface of the CCD cell 10. Reference numeral 3 denotes a plane semi-transparent mirror that is inserted between the objective lens 2 and the surface of the subject 1 so as to be orthogonal to the optical axis of the objective lens 2. A high reflectance coating 4 is formed at the center of the lower surface of the objective lens 2. I am doing it. Therefore, the light of the light source 6 is divided into upper and lower parts by the semitransparent mirror 3, and the light reflected upward is reflected at the center of the lower surface of the objective lens 2 and again reflected upward by the semitransparent mirror 3. With this configuration, an image of the central portion of the lower surface of the objective lens 2 is also formed on the light receiving surface of the CCD 10. That is, the interferometer shown in the figure forms the image of the surface of the subject 1 and the image of the reference surface on the light receiving surface of the CCD 10 in a coherent manner with the lower surface of the objective lens 2 as the reference surface.
6は光源のストロボ閃光管で発光時間は1.5μSであ
る。光源6の光はフィルタFを通り集光レンズ8で絞り
7上に集光されビームスプリッタ5によって対物レンズ
2の光軸方向に反射される。12は被検体検出器で反射
型光電式スイッチであり、被検体の通過を検出して検出
信号をCPUに送る。CPUはこの検出信号を受けると
光源6の電源回路9に指令信号を送り、光源の閃光管6
を発光させる。このようにしてCCDセル10は被検体
1表面と対物レンズ2下面の基準面4との干渉パターン
を電荷信号として保持する。光源6の発光終了後CPU
はCCDセル10に走査信号を送り、干渉パターンの画
像データをA/D変換器を介してメモリ11に送り出し
同メモリに記憶させ、次の被検体が送られて来るまでの
間にメモリ11内のデータを読出してデータ処理を行い
粗さ表示値を算出してプリンタ12に出力し印字する。Reference numeral 6 is a strobe flash tube as a light source, and the light emission time is 1.5 μS. The light from the light source 6 passes through the filter F, is condensed on the diaphragm 7 by the condenser lens 8, and is reflected by the beam splitter 5 in the optical axis direction of the objective lens 2. An object detector 12 is a reflective photoelectric switch, which detects passage of the object and sends a detection signal to the CPU. When the CPU receives this detection signal, it sends a command signal to the power supply circuit 9 of the light source 6, and the flash tube 6 of the light source.
Light up. In this way, the CCD cell 10 holds the interference pattern between the surface of the subject 1 and the reference surface 4 below the objective lens 2 as a charge signal. CPU after the light source 6 has finished emitting light
Sends a scanning signal to the CCD cell 10, sends the image data of the interference pattern to the memory 11 via the A / D converter and stores it in the same memory, and the memory 11 is stored until the next object is sent. Data is read out, data processing is performed, a roughness display value is calculated, and output to the printer 12 for printing.
第2図は被検体面露光時間を特に短縮するための構成の
実施例である。光学系は第1図と同じでよいので図では
省略してある。101はイメージチューブでaは光電面
であり、この面に干渉パターンが形成される。イメージ
チューブは光電面aで光の像を光電子像に変換し、この
光電子を加速して蛍光面bに再結像させて光電子像を再
び光像に変換するもので、この光像を撮像管10Cで電
気信号に変換する。イメージチューブ101内には電子
シャッタ電極cが封入されており、この電子シャッタの
シャッタ速度は最高10μSである。第3図はこの電子
シャッタの開閉と光源6の閃光発光との関係を示すグラ
フである。CPUは第1図の被検体検出器12からの検
出信号を受取ると電子シャッタを10μSの間開く。そ
してシャッタcが閉じるのと同時に光源の閃光管を発光
させる。このようにして閃光管の有効発光は斜線を入れ
た面積となり、閃光の半価幅は0.5μS程度となる。
電子シャッタ閉じと閃光発光とのタイミングの設定で露
光時間は調節可能である。FIG. 2 shows an embodiment of a structure for particularly shortening the exposure time on the subject surface. The optical system may be the same as that shown in FIG. 1 and is omitted in the figure. 101 is an image tube and a is a photocathode on which an interference pattern is formed. The image tube converts a light image into a photoelectron image on the photocathode a, accelerates the photoelectrons to reimage them on the fluorescent screen b, and converts the photoelectron image into a photoimage again. Converted to electrical signals at 10C. An electronic shutter electrode c is enclosed in the image tube 101, and the shutter speed of this electronic shutter is 10 μS at maximum. FIG. 3 is a graph showing the relationship between the opening and closing of the electronic shutter and the flash emission of the light source 6. When the CPU receives the detection signal from the object detector 12 in FIG. 1, the CPU opens the electronic shutter for 10 μS. Then, at the same time when the shutter c is closed, the flash tube of the light source is caused to emit light. In this way, the effective light emission of the flash tube has an area with diagonal lines, and the half-value width of the flash light is about 0.5 μS.
The exposure time can be adjusted by setting the timing of closing the electronic shutter and flashing.
第4図は干渉計にマッハツェンダー型の顕微干渉計を用
いた実施例で鎖線Mで囲んだ部分が同干渉計であり、分
割された2光束の一方に平行平面板Pを入れ、像面にお
いて同じ被検体1表面の像をずらせて重ね相互に干渉さ
せるようになっている。その他第1図の実施例と対応す
る部分には同じ符号をつけてあるので、夫々の説明は省
略する。この実施例では被検体表面からの反射光を二つ
に分けて結像させ、これらの像を重ねて干渉を起させる
ので、被検体の移動によって干渉パターンが変化せず、
被検体の動きの影響を受け難い性質を有する。FIG. 4 shows an embodiment in which a Mach-Zehnder type microscopic interferometer is used as an interferometer, and the portion surrounded by a chain line M is the same interferometer. A parallel plane plate P is inserted into one of the two divided light beams to form an image plane. In the above, the same image of the surface of the subject 1 is shifted and overlapped so as to interfere with each other. The other parts corresponding to those of the embodiment shown in FIG. 1 are designated by the same reference numerals, and the description thereof will be omitted. In this embodiment, reflected light from the surface of the subject is divided into two images, and these images are overlapped to cause interference, so that the interference pattern does not change due to movement of the subject,
It has the property of being less susceptible to the movement of the subject.
本発明において干渉パターンは一つの線に沿って撮像す
れば充分である。また二つの像は相互にわずか傾けて重
ね干渉縞を形成するようにし、干渉縞の上に被検面の凹
凸による干渉パターンが重なるようにしておく方が装置
の調整が楽である。このためには第1図の実施例では対
物レンズ2の光軸を被検面に対し垂直よりわずかに傾け
ておく。第4図の実施例では一方の光束の光路にガラス
板Gを入れておく。干渉パターンの画像データを処理し
て粗さ表示値を得る解析手法は任意であるが、その一例
は本件特許出願人の出願になる特願昭60−19408
9号に示されている。In the present invention, it is sufficient to image the interference pattern along one line. Further, it is easier to adjust the apparatus if the two images are slightly inclined to each other to form overlapping interference fringes and the interference pattern due to the unevenness of the surface to be inspected overlaps the interference fringes. For this purpose, in the embodiment shown in FIG. 1, the optical axis of the objective lens 2 is slightly tilted with respect to the surface to be inspected. In the embodiment shown in FIG. 4, the glass plate G is placed in the optical path of one light beam. The analysis method for processing the image data of the interference pattern to obtain the roughness display value is arbitrary, but an example thereof is Japanese Patent Application No. 60-19408 filed by the present applicant.
No. 9 is shown.
ト.効果 本発明粗さ測定装置は上述したような構成で、干渉方式
であるから面の凹凸の高さ方向の分解能が高く、極短時
間露光で干渉パターンを撮像するので、被検体が動いて
いても測定可能であり、工程中で移送されている物品を
一々停止させないで表面検査が可能となる。G. Effect Since the roughness measuring device of the present invention has the above-mentioned configuration and is of the interference type, the resolution in the height direction of the unevenness of the surface is high, and the interference pattern is imaged by the exposure for an extremely short time. Therefore, the subject is moving. Can be measured, and surface inspection can be performed without stopping the articles being transferred in the process one by one.
第1図は本発明の一実施例の側面図、第2図は他の実施
例の干渉パターン撮像部の側面図、第3図は上記実施例
における電子シャッタ動作及び光源発光のタイムチャー
ト、第4図は本発明の第3の実施例の側面図である。FIG. 1 is a side view of an embodiment of the present invention, FIG. 2 is a side view of an interference pattern imaging unit of another embodiment, and FIG. 3 is a time chart of the electronic shutter operation and light emission of the light source in the above embodiment. FIG. 4 is a side view of the third embodiment of the present invention.
Claims (1)
表面の像とを可干渉的に重ねて形成する光学的手段と、
上記二つの像の重なりによって形成される干渉パターン
を被検体表面の瞬間的露光によって撮像して電気的画像
信号に変換する手段と、この変換手段により得られた干
渉パターンの画像データを解析して粗さ表示値を算出す
るデータ処理手段とよりなり、上記瞬間的露光の手段
を、電子シャッタと被検体を照明する閃光放電管と、電
子シャッタの閉動作の開始と閃光管の発光の開始とを連
動させる手段とにより構成したことを特徴とする表面粗
さ測定装置。1. Optical means for coherently forming an image of the surface of the subject and an image of the reference surface or the surface of the subject itself.
Means for capturing an interference pattern formed by the superposition of the two images by instantaneous exposure of the surface of the subject and converting it into an electric image signal, and analyzing the image data of the interference pattern obtained by this converting means. And a flash discharge tube for illuminating the electronic shutter and the subject, start of the closing operation of the electronic shutter and start of light emission of the flash tube. And a surface roughness measuring device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61016621A JPH0619263B2 (en) | 1986-01-28 | 1986-01-28 | Surface roughness measuring device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61016621A JPH0619263B2 (en) | 1986-01-28 | 1986-01-28 | Surface roughness measuring device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS62174610A JPS62174610A (en) | 1987-07-31 |
| JPH0619263B2 true JPH0619263B2 (en) | 1994-03-16 |
Family
ID=11921409
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61016621A Expired - Lifetime JPH0619263B2 (en) | 1986-01-28 | 1986-01-28 | Surface roughness measuring device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0619263B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006349534A (en) * | 2005-06-16 | 2006-12-28 | Fujinon Corp | Interferometer device for moving object measurement and optical interference measuring method for moving object measurement |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS59214706A (en) * | 1983-05-20 | 1984-12-04 | Citizen Watch Co Ltd | Surface shape measuring device by optical heterodyne interference method |
| JPS6118804A (en) * | 1984-07-06 | 1986-01-27 | Hitachi Ltd | Optical surface roughness meter |
-
1986
- 1986-01-28 JP JP61016621A patent/JPH0619263B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS62174610A (en) | 1987-07-31 |
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