JPH0621293B2 - Rolling method for high silicon iron plate - Google Patents
Rolling method for high silicon iron plateInfo
- Publication number
- JPH0621293B2 JPH0621293B2 JP61177571A JP17757186A JPH0621293B2 JP H0621293 B2 JPH0621293 B2 JP H0621293B2 JP 61177571 A JP61177571 A JP 61177571A JP 17757186 A JP17757186 A JP 17757186A JP H0621293 B2 JPH0621293 B2 JP H0621293B2
- Authority
- JP
- Japan
- Prior art keywords
- rolling
- rolled
- silicon iron
- iron plate
- high silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C21—METALLURGY OF IRON
- C21D—MODIFYING THE PHYSICAL STRUCTURE OF FERROUS METALS; GENERAL DEVICES FOR HEAT TREATMENT OF FERROUS OR NON-FERROUS METALS OR ALLOYS; MAKING METAL MALLEABLE, e.g. BY DECARBURISATION OR TEMPERING
- C21D8/00—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment
- C21D8/12—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties
- C21D8/1216—Modifying the physical properties of ferrous metals or ferrous alloys by deformation combined with, or followed by, heat treatment during manufacturing of articles with special electromagnetic properties characterised by the working steps
- C21D8/1227—Warm rolling
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Electromagnetism (AREA)
- Mechanical Engineering (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Metal Rolling (AREA)
- Manufacturing Of Steel Electrode Plates (AREA)
- Soft Magnetic Materials (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は無方向性珪素鉄板の圧延方法に関する。The present invention relates to a method for rolling a non-oriented silicon iron sheet.
従来、Si 含有量が4tw %未満の珪素鉄板は、その製造
方法により方向性珪素鉄板、無方向性珪素鉄板に区別さ
れ、主として各種電磁誘導機器用の積層鉄芯や巻鉄芯或
いは電気シールド用のケース等に加工成形され、実用に
供されている。Conventionally, a silicon iron plate having a Si content of less than 4 tw% is classified into a directional silicon iron plate and a non-oriented silicon iron plate depending on the manufacturing method, and is mainly used for laminated iron cores, wound iron cores or electric shields for various electromagnetic induction devices. It is processed and molded into a case, etc. for practical use.
しかしながら、近年、省資源、省エネルギーの観点から
電磁電子部品の小型化や高効率化が強く要請され、軟磁
気特性、とりわけ鉄損特性の優れた材料が要求されてい
る。珪素鉄板の軟磁気特性は Si の添加量とともに向上
し、特に6.6wt %付近で最高の透磁率を示し、さらに固
有電気抵抗も高いことから、鉄損も小さくなることが知
られている。However, in recent years, there has been a strong demand for miniaturization and high efficiency of electromagnetic electronic components from the viewpoint of resource saving and energy saving, and materials having excellent soft magnetic characteristics, particularly iron loss characteristics, have been demanded. It is known that the soft magnetic properties of a silicon iron plate improve with the addition amount of Si, show the highest magnetic permeability especially near 6.6 wt%, and have a high specific electric resistance, so that the iron loss is small.
しかし、珪素鉄板は Si 含有量が4.0wt %以上となると
加工性が急激に劣化し、このため従来では圧延法により
高珪素鉄板を工業的規模で製造することは不可能である
とされていた。However, the workability of the silicon iron plate rapidly deteriorates when the Si content exceeds 4.0 wt%, and thus it was conventionally impossible to manufacture a high silicon iron plate on an industrial scale by the rolling method. .
このような圧延法に対し、近年超急冷凝固法と称される
方法が研究開発されているが、この方法により製造され
る高珪素箔帯は表面性状や表面の平坦度が劣り、また厚
さや板幅が限定されてしまい、加えて生産性が劣り生産
コストも高くつく等、工業規模で実施する上で多くの問
題点を有している。In contrast to such a rolling method, a method called an ultra-rapid solidification method has been researched and developed in recent years. However, the high silicon foil strip produced by this method is inferior in surface properties and surface flatness, and has a large thickness and thickness. The plate width is limited, and in addition, the productivity is low and the production cost is high.
このようなことから、本発明者等は無方向性高珪素鉄板
を圧延法により製造すべく、高珪素鉄合金の冷間圧延性
について検討を重ね、この結果、熱間圧延で得られる高
珪素鉄熱延板のSi含有量及び結晶組織に合せて圧延条件
を選択することにより、高珪素鉄熱延板を冷間若しくは
温間で圧延(以下、低・温間圧延と称す)し得ることを
見い出した。Therefore, the present inventors have repeatedly studied the cold rolling property of the high silicon iron alloy in order to manufacture the non-oriented high silicon iron plate by the rolling method, and as a result, the high silicon obtained by the hot rolling is obtained. High-silicon iron hot-rolled sheet can be cold-rolled or warm-rolled (hereinafter referred to as low-warm rolling) by selecting the rolling conditions according to the Si content and crystal structure of the iron hot-rolled sheet. Found out.
すなわち、本発明はSi を4.0〜7.0wt %含有する鉄合金
スラブを熱間圧延し、得られた熱延板を脱スケール後、
圧延、焼鈍して高珪素鉄板を製造するに当り、上記脱ス
ケール後の圧延を、400℃以下の圧延温度(板温)で、
しかも該圧延温度T(℃)と1パス当りの圧下率R(%)と
が、 但し、λ:圧延素材の板厚方向平均結晶粒径(mm) X:Si 含有量(wt %) を満足するようにして行うことをその基本的特徴とす
る。That is, the present invention hot-rolls the iron alloy slab containing Si 4.0 ~ 7.0 wt%, after descaling the hot rolled sheet obtained,
In producing a high silicon iron plate by rolling and annealing, rolling after descaling is performed at a rolling temperature (plate temperature) of 400 ° C. or lower.
Moreover, the rolling temperature T (° C.) and the rolling reduction R (%) per pass are However, the basic feature is that λ: average grain size in the plate thickness direction of rolled material (mm) X: Si content (wt%) is satisfied.
以下、本発明を詳細に説明する。Hereinafter, the present invention will be described in detail.
第1図ないし第3図は、高珪素鉄合金の圧延性に及ぼす
圧延温度及び1パス当りの圧下率の影響を4.5wt %、5.
5wt %及び6.5wt %の各含有率の珪素鉄合金について調
べたものである。これらは、熱間圧延条件を変化させる
ことにより結晶組織の細かさを変えた圧延素材を作り、
これを圧延温度(板温、以下同様)、1パス当りの圧下
率を変えて圧延したときの圧延可能と不可能の境界線を
示したものである。なお、結晶組織の細かさは板厚方向
平均粒界間隔で表わしてある。板厚方向平均粒界間隔と
は板厚方向に測定した平均粒径であり、層状または繊維
状組織の場合には、板厚方向の平均粒径であり、等軸組
織の場合には、通常の粒と一致する。Figures 1 to 3 show the effects of rolling temperature and rolling reduction per pass on the rollability of high silicon iron alloys at 4.5 wt%, 5.
This is an examination of silicon-iron alloys with respective contents of 5 wt% and 6.5 wt%. These are made by rolling material with different fineness of crystal structure by changing hot rolling conditions,
The drawing shows the boundary line between possible and impossible rolling when the rolling temperature (sheet temperature, the same applies hereinafter) is changed by changing the rolling reduction per pass. The fineness of the crystal structure is represented by the average grain boundary spacing in the plate thickness direction. The plate thickness direction average grain boundary spacing is an average particle size measured in the plate thickness direction, in the case of a layered or fibrous structure, the average particle size in the plate thickness direction, in the case of an equiaxed structure, usually Match the grain of.
第1図ないし第3図によれば、圧延素材のSi含有量及び
組織の細かさに合せて圧延条件を選定すれば高珪素鉄板
の低・温間圧延が可能であり、しかも、圧延素材の状態
と圧延可能となる圧延条件との間には、定量的な関係が
あることが判る。According to FIGS. 1 to 3, if the rolling conditions are selected according to the Si content of the rolled material and the fineness of the structure, low and warm rolling of high silicon steel sheet is possible, and It can be seen that there is a quantitative relationship between the state and the rolling conditions that enable rolling.
そして、圧延素材の状態を表わすパラメータとして、 100λ+48X−360 但し、λ:板厚方向平均粒界間隔(mm) X:Si 含有量(wt %) を、また圧延条件を表わすパラメータとして、 但し、T:圧延温度(℃) R:1パス当りの圧下率(%) を選び、第1図ないし第3図の結果をプロツトすると、
第4図のように圧延可能な範囲と不可能な範囲は原点を
通る傾き+1の直線で分けることができる。すなわち、 の条件を満足させることにより低・温間圧延が可能とな
る。この(1)式の関係はRが0%超であればTがいかな
る値でも成立するが、Tが400℃以上になると板厚精度
が劣化してしまい、このため熱延板の圧延は、400℃以
下の温度であつて、且つ上記(1)式の関係を満足させる
ようにして行うことが必要である。Then, 100λ + 48X−360, where λ: average grain boundary spacing in the plate thickness direction (mm), X: Si content (wt%), and parameters indicating rolling conditions, However, if T: rolling temperature (° C) R: rolling reduction (%) per pass, and plotting the results of Figs. 1 to 3,
As shown in FIG. 4, the rollable range and the unrollable range can be separated by a straight line passing through the origin and having an inclination of +1. That is, By satisfying the above condition, low / warm rolling is possible. The relationship of this equation (1) is satisfied at any value of T if R exceeds 0%, but if T is 400 ° C or more, the sheet thickness accuracy deteriorates. It is necessary to perform the process at a temperature of 400 ° C. or lower and satisfy the relationship of the above formula (1).
なお、本発明法は、Si が4.0〜7.0wt %の珪素鉄板をそ
の対象とする。珪素鉄板はSi :6.6wt %付近に軟磁性
のピークがあり、4.0wt %未満、7.0wt %超ではその磁気
特性が劣り、このため4.0〜7.0wt % Siをその対象とす
る。The method of the present invention is applied to a silicon iron plate containing 4.0 to 7.0 wt% of Si. Silicon iron plate has a soft magnetic peak near Si: 6.6 wt%, and its magnetic properties are inferior at less than 4.0 wt% and more than 7.0 wt%. Therefore, 4.0 to 7.0 wt% Si is targeted.
実施例 (1) 第1表に示す合金Aのスラブを熱間圧延して板厚方向平
均粒界間隔が320μの熱延板を得た。これを第2表の条
件により累積圧下率75%で圧延し、圧延可能・不可能
の判定を行つた。その結果を第2表に示す。なお、表中
圧延不可能とは、圧延後エツジより3mm以上の割れが生
じたことを意味している(以下、同様)。Example (1) A slab of alloy A shown in Table 1 was hot-rolled to obtain a hot-rolled sheet having an average grain boundary spacing of 320 μ in the sheet thickness direction. This was rolled at a cumulative rolling reduction of 75% under the conditions shown in Table 2 to determine whether rolling was possible or not. The results are shown in Table 2. In the table, "unrollable" means that a crack of 3 mm or more was generated from the edge after rolling (the same applies hereinafter).
実施例 (2) 第1表に示す合金Bのスラブを熱間圧延して板厚方向平
均粒界間隔210μの熱延板を得た。これを第3表の条件
により累積圧下率75%で圧延し、圧延可能・不可能の
判定を行つた。その結果を第3表に示す。 Example (2) A slab of alloy B shown in Table 1 was hot-rolled to obtain a hot-rolled sheet having an average grain boundary spacing of 210 μ in the sheet thickness direction. This was rolled at a cumulative rolling reduction of 75% under the conditions shown in Table 3 to determine whether rolling was possible or not. The results are shown in Table 3.
実施例 (3) 第1表に示す合金Cのスラブを熱間圧延して板厚方向平
均粒界間隔200μと610μの熱延板を得た。これを第4表
の条件により累積圧下率75%で圧延し、圧延可能・不
可能の判定を行つた。その結果を第4表に示す。 Example (3) A slab of alloy C shown in Table 1 was hot-rolled to obtain a hot-rolled sheet having an average grain boundary spacing of 200 µ and 610 µ in the sheet thickness direction. This was rolled at a cumulative rolling reduction of 75% under the conditions shown in Table 4 to determine whether rolling was possible or not. The results are shown in Table 4.
〔発明の効果〕 以上述べた本発明によれば、Si4wt %以上の無方向性
高珪素鉄板を圧延法により能率的に製造することができ
る。 [Effects of the Invention] According to the present invention described above, a non-oriented high silicon iron plate having Si of 4 wt% or more can be efficiently manufactured by a rolling method.
【図面の簡単な説明】 第1図ないし第3図は、高珪素鉄合金の圧延性に対する
圧延温度及び1パス当りの圧下率の影響を示すものであ
る。第4図は圧延条件に関するパラメータと圧延性との
関係を示すものである。BRIEF DESCRIPTION OF THE DRAWINGS FIG. 1 to FIG. 3 show the effects of rolling temperature and rolling reduction per pass on the rolling property of high silicon iron alloys. FIG. 4 shows the relationship between the rolling condition parameters and the rolling property.
Claims (1)
を熱間圧延し、得られた熱延板を脱スケール後、圧延、
焼鈍して高珪素鉄板を製造するに当り、上記脱スケール
後の圧延を、400℃以下の圧延温度(板温)で、しかも
該圧延温度T(℃)と1パス当りの圧下率R(%)とが下式
を満足するようにして行うことを特徴とする高珪素鉄板
の圧延方法。 但し、λ:圧延素材の板厚方向平均結晶粒径(mm) X:Si 含有量(wt %)1. An iron alloy slab containing 4.0 to 7.0 wt% of Si is hot-rolled, the obtained hot-rolled sheet is descaled, and then rolled.
When manufacturing a high silicon iron plate by annealing, the rolling after the descaling is performed at a rolling temperature (sheet temperature) of 400 ° C. or less, and at the rolling temperature T (° C.) and a rolling reduction R (%) per pass. ) And so as to satisfy the following formula: Where λ: average grain size in the plate thickness direction of rolled material (mm) X: Si content (wt%)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61177571A JPH0621293B2 (en) | 1986-07-30 | 1986-07-30 | Rolling method for high silicon iron plate |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP61177571A JPH0621293B2 (en) | 1986-07-30 | 1986-07-30 | Rolling method for high silicon iron plate |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6335744A JPS6335744A (en) | 1988-02-16 |
| JPH0621293B2 true JPH0621293B2 (en) | 1994-03-23 |
Family
ID=16033294
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP61177571A Expired - Fee Related JPH0621293B2 (en) | 1986-07-30 | 1986-07-30 | Rolling method for high silicon iron plate |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0621293B2 (en) |
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4223273A1 (en) | 2022-02-08 | 2023-08-09 | FUJIFILM Business Innovation Corp. | Cellulosic particle |
| EP4410382A1 (en) | 2023-02-03 | 2024-08-07 | FUJIFILM Business Innovation Corp. | Cellulosic particle |
| EP4410383A1 (en) | 2023-02-03 | 2024-08-07 | FUJIFILM Business Innovation Corp. | Cellulosic particle |
| EP4410873A1 (en) | 2023-02-03 | 2024-08-07 | FUJIFILM Business Innovation Corp. | Cellulosic particle |
| EP4438667A1 (en) | 2023-03-28 | 2024-10-02 | FUJIFILM Business Innovation Corp. | Cellulose particle |
-
1986
- 1986-07-30 JP JP61177571A patent/JPH0621293B2/en not_active Expired - Fee Related
Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP4223273A1 (en) | 2022-02-08 | 2023-08-09 | FUJIFILM Business Innovation Corp. | Cellulosic particle |
| EP4410382A1 (en) | 2023-02-03 | 2024-08-07 | FUJIFILM Business Innovation Corp. | Cellulosic particle |
| EP4410383A1 (en) | 2023-02-03 | 2024-08-07 | FUJIFILM Business Innovation Corp. | Cellulosic particle |
| EP4410873A1 (en) | 2023-02-03 | 2024-08-07 | FUJIFILM Business Innovation Corp. | Cellulosic particle |
| EP4438667A1 (en) | 2023-03-28 | 2024-10-02 | FUJIFILM Business Innovation Corp. | Cellulose particle |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6335744A (en) | 1988-02-16 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |