JPH0621789B2 - Distance detector - Google Patents
Distance detectorInfo
- Publication number
- JPH0621789B2 JPH0621789B2 JP21751987A JP21751987A JPH0621789B2 JP H0621789 B2 JPH0621789 B2 JP H0621789B2 JP 21751987 A JP21751987 A JP 21751987A JP 21751987 A JP21751987 A JP 21751987A JP H0621789 B2 JPH0621789 B2 JP H0621789B2
- Authority
- JP
- Japan
- Prior art keywords
- light receiving
- distance
- light
- signal extraction
- extraction electrodes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
- 239000004065 semiconductor Substances 0.000 claims description 43
- 238000000605 extraction Methods 0.000 claims description 21
- 239000000758 substrate Substances 0.000 claims description 11
- 238000001514 detection method Methods 0.000 claims description 8
- 239000012535 impurity Substances 0.000 claims description 7
- 238000006243 chemical reaction Methods 0.000 claims description 5
- 238000000926 separation method Methods 0.000 claims description 2
- 230000003287 optical effect Effects 0.000 description 12
- 238000010586 diagram Methods 0.000 description 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 6
- 229910052710 silicon Inorganic materials 0.000 description 6
- 239000010703 silicon Substances 0.000 description 6
- 230000014509 gene expression Effects 0.000 description 4
- 238000005259 measurement Methods 0.000 description 4
- 238000005070 sampling Methods 0.000 description 4
- 239000003990 capacitor Substances 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- JBRZTFJDHDCESZ-UHFFFAOYSA-N AsGa Chemical compound [As]#[Ga] JBRZTFJDHDCESZ-UHFFFAOYSA-N 0.000 description 1
- 230000003321 amplification Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 230000004907 flux Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000003199 nucleic acid amplification method Methods 0.000 description 1
Landscapes
- Automatic Focus Adjustment (AREA)
- Photo Coupler, Interrupter, Optical-To-Optical Conversion Devices (AREA)
- Length Measuring Devices By Optical Means (AREA)
- Measurement Of Optical Distance (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明は被測定物からの光を光点として入射し、この光
点の位置を検出する半導体位置検出器を用い、この半導
体位置検出器からの出力にもとづいて被測定物までの距
離を検出する距離検出装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention uses a semiconductor position detector that receives light from an object to be measured as a light spot and detects the position of this light spot. The present invention relates to a distance detecting device that detects a distance to an object to be measured based on an output from the.
従来、光源から被測定物に光を投射し、この光源から一
定距離だけ離れた位置に設けられた半導体位置検出器で
反射光を受け、被測定物までの距離を検出する能動距離
検出装置が知られている。Conventionally, there is an active distance detecting device that projects light from a light source onto an object to be measured, receives reflected light with a semiconductor position detector provided at a position apart from the light source, and detects the distance to the object to be measured. Are known.
第4図はかかる距離検出装置の光学系の説明図である。
図示の通り、発光ダイオード(LED)などの光源1か
らの光は、集光レンズ2を介して被測定物3に照射され
る。被測定物3からの反射光は受光レンズ4で集光さ
れ、半導体位置検出器5の受光部(図示せず)の光点と
して入射される。ここで、基線長をBとし、被測定物3
までの距離をLとし、受光レンズ4と半導体位置検出器
5の間隔(結像距離)をfとし、受光レンズ4の光軸か
ら半導体位置検出器5上の光点位置(集光中心位置)S
Pまでの距離(スポット光の移動量)をxとすると、下
記の(1)式が成り立つ。FIG. 4 is an explanatory diagram of an optical system of such a distance detecting device.
As shown in the figure, the light from the light source 1 such as a light emitting diode (LED) is irradiated onto the DUT 3 via the condenser lens 2. The reflected light from the DUT 3 is condensed by the light receiving lens 4 and is incident as a light spot of a light receiving portion (not shown) of the semiconductor position detector 5. Here, the baseline length is set to B, and the measured object 3
Is L, the distance between the light receiving lens 4 and the semiconductor position detector 5 (image forming distance) is f, and the light point position on the semiconductor position detector 5 from the optical axis of the light receiving lens 4 (concentration center position) S
When the distance to P (the amount of movement of the spot light) is x, the following formula (1) is established.
x=(f・B)/L …(1) 従って、第4図においてx,f,Bの値が既知であれ
ば、被測定物3までの距離Lを求めることができる。x = (f · B) / L (1) Therefore, if the values of x, f, and B are known in FIG. 4, the distance L to the DUT 3 can be obtained.
第5図は第4図に示す一次元の半導体位置検出器5の詳
細な断面構成図である。図示に通り、高抵抗の真性(i
型)シリコン基板51の表面側には、均一にp型不純物
を拡散したp型抵抗層52が形成され、p−n接合型ダ
イオードとして受光部をなしている。また、シリコン基
板51の裏面側にはn型不純物を高濃度に拡散したn+
型導電層53が形成され、これに電極54がオーミック
接触されている。表面側のp型抵抗層(受光部)52の
両端には一体の信号取出電極55a,55bが配設さ
れ、ここから電流IA,IBが取り出されるようになっ
ている。FIG. 5 is a detailed sectional configuration diagram of the one-dimensional semiconductor position detector 5 shown in FIG. As shown in the figure, the intrinsic (i
A p-type resistance layer 52 in which p-type impurities are uniformly diffused is formed on the surface side of a (type) silicon substrate 51 to form a light receiving portion as a pn junction diode. In addition, on the back surface side of the silicon substrate 51, n + which is a high concentration of n-type impurities diffused
A mold conductive layer 53 is formed, and an electrode 54 is in ohmic contact with this. The signal extraction electrodes 55a and 55b are integrally provided at both ends of the p-type resistance layer (light receiving portion) 52 on the front surface side, and the currents I A and I B are taken out therefrom.
いま、p型抵抗層52上の位置SPに被測定物3からの
光が光点として入射され、この位置SPが電極55aか
ら距離xだけ離れていたとする。また、電極55a,5
5bの間の距離をCとし、その間のp型抵抗層52の抵
抗値をRCとし、位置SPと電極55aとの間のp型抵
抗層52の抵抗をRxとし、更に光の入射により生成さ
れる光電流をIOとすると、電流IA,IBには次の式
が成り立つ。Now, it is assumed that the light from the DUT 3 is incident on the position SP on the p-type resistance layer 52 as a light spot, and the position SP is separated from the electrode 55a by the distance x. Also, the electrodes 55a, 5
5b is C, the resistance value of the p-type resistance layer 52 between them is R C , the resistance of the p-type resistance layer 52 between the position SP and the electrode 55a is R x , When the generated photocurrent is I O , the following equations hold for the currents I A and I B.
IA=IO・(RC−Rx)/RC IB=IO・Rx/RC …(2) ここで、p型抵抗層52における抵抗値はその長さと比
例するから、上記の(2)式は下記の(3)式のように
なる。In I A = I O · (R C -R x) / R C I B = I O · R x / R C ... (2) where the resistance value of the p-type resistive layer 52 from proportional to its length, The above equation (2) becomes the following equation (3).
IA=IO・(C−x)/C IB=IO・x/C …(3) 従って、上記の(3)式より (IA−IB)/(IA+IB)=1−2x/C…
(4) が得られるので、入射光の強度にかかわりなく、電流I
A、IBの値から光の入射位置SPを演算することがで
きる。I A = I O · (C−x) / C I B = I O · x / C (3) Therefore, from the above formula (3), (I A −I B ) / (I A + I B ) = 1-2x / C ...
(4) is obtained, the current I can be obtained regardless of the intensity of incident light.
A, it is possible to calculate the incident position SP of the light from the value of I B.
第6図は測距範囲をLNからLFに設定した時の距離検
出用光学系を示す図である。光源1の発光光束を集光レ
ンズ2によって集光し、被測定物3を照射する。被測定
物3からの反射光は集光レンズ2に対して基線長Bだけ
隔てて配置された受光レンズ4により集光される。半導
体位置検出器5は受光レンズ4から距離fの集光位置
(光点位置)に配置されている。FIG. 6 is a diagram showing a distance detecting optical system when the distance measuring range is set from L N to L F. The luminous flux of the light source 1 is condensed by the condensing lens 2 to irradiate the DUT 3. The reflected light from the DUT 3 is condensed by the light receiving lens 4 which is arranged at a distance of the base line length B from the condensing lens 2. The semiconductor position detector 5 is arranged at a light collecting position (light spot position) at a distance f from the light receiving lens 4.
ここで、測距範囲内の最至近距離(近距離側の限界)お
よび最遠距離(遠距離側の限界)をそれぞれLNおよび
LFとし、被測定物3までの距離をLとする。また、受
光レンズ4の光軸から半導体位置検出器5の受光部の一
方の端までの距離をxFとし、他方の端までの距離xN
とし、被測定物3からの反射光が受光レンズ4によって
集光される光点位置SPから受光レンズ4の光軸までの
距離をxとし、光点位置SPから半導体位置検出器5の
受光部の一方の端までの距離をx1とし、半導体位置検
出器5の受光部の長さ(一対の電極の間隔)をCとする
と、それぞれ以下の関係式が成り立つ。Here, the closest distance (limit on the short distance side) and the farthest distance (limit on the long distance side) in the distance measuring range are L N and L F , respectively, and the distance to the DUT 3 is L. Further, the distance from the optical axis of the light receiving lens 4 to the one end of the light receiving portion of the semiconductor position detector 5 and x F, the distance x N to the other end
And x is the distance from the light spot position SP at which the reflected light from the DUT 3 is condensed by the light receiving lens 4 to the optical axis of the light receiving lens 4, and the light receiving portion of the semiconductor position detector 5 from the light spot position SP. When the distance to one end is x 1 and the length of the light receiving portion of the semiconductor position detector 5 (interval between a pair of electrodes) is C, the following relational expressions hold.
従って、上記の(5),(6)の式より下記の(7)式
が得られる。 Therefore, the following equation (7) is obtained from the above equations (5) and (6).
また、第6図においては、 x1=x−xF=f・B(1/L−1/LF)…(8) の関係式も得られる。 Further, in FIG. 6, a relational expression of x 1 = x−x F = f · B (1 / L−1 / L F ) ... (8) is also obtained.
次に、半導体位置検出器5の位置分解能をΔx、距離L
NおよびLFにおける距離分解能をそれぞれΔLN,Δ
LFとし、LNとLFの関係を LF/LN=m …(9) で表わすと、次の関係式が得られる。Next, the position resolution of the semiconductor position detector 5 is Δx and the distance L is
The distance resolutions at N and L F are ΔL N and Δ, respectively.
And L F, expressed the relationship of L N and L F with L F / L N = m ... (9), the following relationship is obtained.
(11)式および(12)式より、距離分解能ΔLNお
よびΔLFはそれぞれ(13)式および(14)式に示
すようになる。 From equations (11) and (12), the distance resolutions ΔL N and ΔL F are as shown in equations (13) and (14), respectively.
ΔLN=Δx・L▲2 N▼/(Δx・LN+f・B)…
(13) ΔLF=m2・Δx・L▲2 N▼ /(m・Δx・LN+f・B)…(14) (13)式および(14)式の比をとると、下記の(1
5)式が得られる。ΔL N = Δx · L ▲ 2 N ▼ / (Δx · L N + f · B) ...
(13) ΔL F = m 2 · Δx · L ▲ 2 N ▼ / (m · Δx · L N + f · B) ... (14) When the ratios of the expressions (13) and (14) are taken, the following ( 1
Equation 5) is obtained.
ΔLF/ΔLN=m2・(Δx・LN+f・B) /(m・Δx・Ln+f+B)…(15) (15)式において、m・Δx・LN《f・Bの条件が
成り立つ時には、これを下記の(16)式に近似するこ
とができる。ΔL F / ΔL N = m 2 · (Δx · L N + f · B) / (m · Δx · L n + f + B) (15) In the expression (15), m · Δx · L N << f · B When is satisfied, this can be approximated by the following equation (16).
ΔLF/ΔLN≒m2 …(16) (16)式より、遠距離側の距離分解能ΔLFは前述の
(9)式に示すmが大きいと、著しく悪化することがわ
かる。ΔL F / ΔL N ≈m 2 (16) From the equation (16), it can be seen that the distance resolution ΔL F on the far distance side is significantly deteriorated when m shown in the above equation (9) is large.
言い換えれば、測定可能な最至近距離から最遠距離まで
の範囲を大きくとれば、それだけ遠距離になったときの
分解能が低下してしまう。このため、例えばレーザ加工
機の加工部における位置検出のように近距離側での光分
解能が期待される位置検出装置を、無人搬送車の走行な
どにおける位置検出のように遠距離側での高分解能が要
求される装置に適用すると、所望の分解能が得られない
欠点があった。In other words, if the range from the shortest measurable distance to the farthest measurable distance is increased, the resolution at such a long distance decreases. Therefore, for example, a position detection device that is expected to have an optical resolution on the short distance side, such as a position detection on a processing part of a laser processing machine, can be used on a long distance side such as a position detection on an unmanned guided vehicle traveling. When applied to a device that requires a high resolution, there is a drawback that the desired resolution cannot be obtained.
そこで本発明は、遠、近の限界距離の比(LF/LN=
m)を大きくしても、遠距離側において高い距離分解能
を得ることのできる側距範囲の広い距離検出装置を提供
することを目的とする。Therefore, according to the present invention, the ratio of the far and near limit distances (L F / L N =
It is an object of the present invention to provide a distance detection device having a wide side distance range that can obtain high distance resolution on the far side even if m) is increased.
本発明に係る距離検出装置は、高抵抗の半導体基板の表
面側に第1導電型不純物を含む受光部を形成すると共
に、裏面側に第2導電型不純物層を形成し、受光部に被
測定物からの光が光点として入射されたときに当該受光
部の両端に配設された信号取出電極から光電流が取り出
される半導体位置検出器を備え、この半導体位置検出器
の光電流出力から被測定物までの距離を検出する距離検
出装置であって、下記のように構成されることを特徴と
する。すなわち、前述の受光部は、各一対の信号取出電
極を両端に配設した複数の受光エリアを含み、この複数
の受光エリアは各一対の信号取出電極の一方と他方が互
いに隣接するように一列に配設され、かつ複数の受光エ
リアの信号取出電極の間隔は一方から他方へ向かって順
次大きくなると共に、任意の受光エリアの信号取出電極
の間隔と任意の受光エリアと隣接する他方の側の受光エ
リアの信号取出電極の間隔との比は常に一定となってい
る。そして、本発明の距離検出装置は、複数の受光エリ
アの各一対の信号取出電極からの光電流出力にもとづい
て、いずれの受光エリアに最も強く光が当たっているか
を判別する判別手段と、複数の受光エリアの光電流出力
のうち最も強く光が当たっているものを判別手段の判別
結果にもとづいて選択するセレクト手段と、このセレク
ト手段により選択された光電流出力から受光部における
光点の位置を求め、被測定物までの距離を演算する演算
手段とを備える。A distance detecting device according to the present invention forms a light receiving portion containing a first conductivity type impurity on a front surface side of a high-resistance semiconductor substrate, and forms a second conductivity type impurity layer on a back surface side of the light receiving portion to be measured. When a light from an object is incident as a light spot, it is equipped with a semiconductor position detector from which a photocurrent is taken out from signal extraction electrodes arranged at both ends of the light receiving part. A distance detecting device for detecting a distance to a measurement object, characterized by being configured as follows. That is, the above-mentioned light receiving section includes a plurality of light receiving areas each having a pair of signal output electrodes arranged at both ends, and the plurality of light receiving areas are arranged in a row so that one and the other of each pair of signal output electrodes are adjacent to each other. And the intervals between the signal extraction electrodes of the plurality of light receiving areas gradually increase from one to the other, and the intervals between the signal extraction electrodes of an arbitrary light receiving area and the other side adjacent to the arbitrary light receiving area The ratio of the light receiving area to the distance between the signal extraction electrodes is always constant. Further, the distance detecting device of the present invention is based on the photocurrent output from each pair of signal extraction electrodes of the plurality of light receiving areas, and a determining means for determining which light receiving area is most strongly exposed to light, Of the photocurrent output of the light receiving area of the light receiving area based on the discrimination result of the discriminating means, and the position of the light spot in the light receiving portion from the photocurrent output selected by the selecting means. And calculating means for calculating the distance to the object to be measured.
本発明の構成によれば、遠距離側の被測定物からの光と
近距離側の被測定物からの光は、それぞれ異なる受光エ
リアに光点として入射され、従って各光電流はそれぞれ
の受光エリアの信号取出電極から出力される。そして、
各受光エリアからの光電流出力については、いずれに最
も強く光が当たっているかが判別される。従って、被測
定物までの距離に応じて、最も適当な受光エリアが選択
されて距離が検出されることになる。According to the configuration of the present invention, the light from the object to be measured on the far distance side and the light from the object to be measured on the near distance side are incident on different light receiving areas as light spots, and accordingly, each photocurrent is received by each light receiving area. It is output from the signal extraction electrode of the area. And
Regarding the photocurrent output from each light receiving area, it is determined which one is most strongly exposed to the light. Therefore, the most suitable light receiving area is selected according to the distance to the object to be measured, and the distance is detected.
以下、添付図面を参照して本発明の実施例を詳細に説明
する。なお、図面の説明において同一の要素には同一の
符号を付し、重複する説明を省略する。Hereinafter, embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the description of the drawings, the same elements will be denoted by the same reference symbols, without redundant description.
第1図は実施例に係る距離検出装置のブロック図であ
り、この装置は半導体位置検出器とその出力信号を処理
する信号処理回路とを有している。図示の通りこの実施
例では、第1の特徴として半導体位置検出器の受光部が
複数のエリア(受光エリア)に分割されており、第2の
特徴として各受光エリアからの光電流出力を選択し、最
も強く光の当たっている受光エリアからの光電流出力に
もとづいて所定の演算処理を行なうようになっている。
そこで、まず半導体位置検出器の構成と作用から詳細に
説明する。FIG. 1 is a block diagram of a distance detecting device according to an embodiment, which has a semiconductor position detector and a signal processing circuit for processing an output signal thereof. As shown, in this embodiment, the first feature is that the light receiving portion of the semiconductor position detector is divided into a plurality of areas (light receiving areas), and the second feature is that the photocurrent output from each light receiving area is selected. The predetermined arithmetic processing is performed based on the photocurrent output from the light receiving area where the light is most intense.
Therefore, first, the structure and operation of the semiconductor position detector will be described in detail.
第2図は半導体位置検出器の斜視図であり、第3図
(a)はその平面図あり、同図(b)は縦断面図であ
る。そして、これが従来のものと比べて特徴的なこと
は、半導体基板の表面側に形成された受光部が、複数の
受光エリアを列設して構成されていることである。n個
(nは2以上の整数)の受光エリア521〜52nは、
高抵抗のシリコン基板51の表面側にP型の不純物を均
一に拡散させることで形成されるが、各受光エリア52
1〜52nの長手方向の長さは順次に大きくなってい
る。そして、各受光エリア521〜52nの両端には幅
を十分に狭くした各一対の信号取出電極55a1〜55
an、55b1〜55bnが配設され、一対の取出電極
間のP型抵抗層(受光エリア)の長さC1〜Cnには C2/C1=C3/C2=… =Cn/Cn-1=D(一定)…(17) の関係が成立している。なお、各信号取出電極55a1
〜55an,55b1〜55bnの幅Wは、W《C1と
みなせる程度に十分に狭くなっているものとする。2 is a perspective view of the semiconductor position detector, FIG. 3 (a) is a plan view thereof, and FIG. 3 (b) is a longitudinal sectional view thereof. What is characteristic of this compared with the conventional one is that the light receiving portion formed on the front surface side of the semiconductor substrate is formed by arranging a plurality of light receiving areas in a row. The n (n is an integer of 2 or more) light receiving areas 52 1 to 52 n are
It is formed by uniformly diffusing P-type impurities on the surface side of the high resistance silicon substrate 51.
The length of 1 to 52 n in the longitudinal direction is sequentially increased. Then, a pair of signal extraction electrodes 55a 1 to 55 55 each having a sufficiently narrow width is provided at both ends of each of the light receiving areas 52 1 to 52 n.
a n , 55b 1 to 55b n are arranged, and C 2 / C 1 = C 3 / C 2 = ... for the lengths C 1 to C n of the P-type resistance layer (light receiving area) between the pair of extraction electrodes. = relationship C n / C n-1 = D ( constant) ... (17) is satisfied. In addition, each signal extraction electrode 55a 1
~55A n, the width W of 55b 1 ~55b n is assumed to be sufficiently narrow to the extent that can be regarded as a W "C 1.
測距範囲をn分割し、遠距離側よりL1,L2,L3,
L4,…Lnとすると、半導体位置検出器5が上記の
(17)式を満足しているとき、下記の(18)式の関
係が成り立つ。The distance measuring range is divided into n, and L 1 , L 2 , L 3 ,
Assuming that L 4 , ... L n , when the semiconductor position detector 5 satisfies the above equation (17), the following equation (18) holds.
L1/L2=L2/L3=L3/L4 =…=Ln-1/Ln=D(一定)…(18) 半導体位置検出器5に接続される増幅回路において、半
導体位置検出器5に入射する光には信号光以外に外乱光
(たとえば太陽光等)も含まれる。この場合は、電流−
電圧変換用抵抗とコンデンサを用いたAC結合方式(浜
松ホトニクス株式会社発行「半導体位置検出器カタロ
グ」P.14参照)を用いるのが一般的である。このと
き、半導体位置検出器5の電極間抵抗RCと電流−電圧
変換用抵抗の温度特性の違いにより、前述の(4)式に
示す信号演算出力に誤差を生じる。それゆえ、第2図に
示す半導体位置検出器5の高抵抗シリコン基板51上の
各電極55a1〜55an,55b1〜55bnに近接
して電流−電圧変換用抵抗(図示せず)を形成し、抵抗
の温度特性をそろえることにより、上記信号演算出力の
誤差をなくすことができる。L 1 / L 2 = L 2 / L 3 = L 3 / L 4 = ... = L n-1 / L n = D (constant) ... (18) In the amplifier circuit connected to the semiconductor position detector 5, a semiconductor is used. The light incident on the position detector 5 includes ambient light (for example, sunlight) in addition to the signal light. In this case, the current −
It is common to use an AC coupling method using a voltage conversion resistor and a capacitor (see "Semiconductor Position Detector Catalog" P.14 issued by Hamamatsu Photonics KK). At this time, due to the difference in the temperature characteristics of the inter-electrode resistance R C of the semiconductor position detector 5 and the current-voltage conversion resistance, an error occurs in the signal calculation output shown in the above equation (4). Therefore, the electrodes 55a 1 ~55a n on high-resistance silicon substrate 51 of the semiconductor position detector 5 shown in FIG. 2, the current in proximity to 55b 1 ~55b n - voltage converting resistor (not shown) By forming the resistors and aligning the temperature characteristics of the resistors, the error in the signal calculation output can be eliminated.
第1図は本発明に適用される半導体位置検出器5と、こ
れに専用の信号処理回路のブロック図である。この実施
例では、半導体位置検出器5の受光部51を分離層58
1,582によって完全に三分割し、前述の(17)式
の関係は以下の数値に設定してある。FIG. 1 is a block diagram of a semiconductor position detector 5 applied to the present invention and a signal processing circuit dedicated thereto. In this embodiment, the light receiving portion 51 of the semiconductor position detector 5 is separated from the separation layer 58.
1, 58 2 by completely divided into three parts, the relationship of the aforementioned equation (17) is set to the following values.
C2/C1=C3/C2=2 …(19) これに伴い、測距範囲の分割は前述の(18)式より以
下の数値になる。C 2 / C 1 = C 3 / C 2 = 2 (19) Along with this, the division of the distance-measuring range becomes the following numerical value from the above-mentioned formula (18).
L1/L2=L2/L3=2 …(20) 半導体位置検出器5上には、各受光エリア521〜52
3の信号取出電極55a1〜55a3,55b1〜55
b3に接して電流−電圧変換抵抗rが形成されている。
光が入射することにより得られる光電流IAおよびIB
は、この電流−電圧変換抵抗rにより電圧に変換され、
コンデンサCによりAC結合されて交流成分のみが増幅
器U1〜U6に送られ、増幅後にゲート回路22と加算
回路U7〜U9に転送される。加算回路U7は光が半導
体位置検出器5の受光エリア521に入射して得られる
光電流における交流成分の和を演算する。同様に、加算
回路U8およびU9は受光エリア522および受光エリ
ア523から得られる光電流の交流成分の和を演算す
る。加算回路U7〜U9の出力はサンプルアンドホール
ド回路U10〜U12に与えられ、光源1をパルス点燈させ
た時の被測定物3からの反射されてくる光の信号レベル
がホールドされる。この時のサンプリング信号は第1図
の記号φ2で示される。L 1 / L 2 = L 2 / L 3 = 2 (20) Each of the light receiving areas 52 1 to 52 on the semiconductor position detector 5.
3 signal extraction electrodes 55a 1 to 55a 3 and 55b 1 to 55
b 3 to contact a current - voltage conversion resistor r is formed.
Photocurrents I A and I B obtained by the incidence of light
Is converted into a voltage by this current-voltage conversion resistor r,
Only AC components are AC-coupled by the capacitor C and are sent to the amplifiers U 1 to U 6 , and after amplification, they are transferred to the gate circuit 22 and the adding circuits U 7 to U 9 . Addition circuit U 7 calculates the sum of the AC components in the photocurrent light is obtained by entering the light receiving area 52 1 of the semiconductor position detector 5. Similarly, the adder circuits U 8 and U 9 calculate the sum of the AC components of the photocurrents obtained from the light receiving area 52 2 and the light receiving area 52 3 . The outputs of the adder circuits U 7 to U 9 are given to the sample and hold circuits U 10 to U 12, and the signal level of the light reflected from the DUT 3 when the light source 1 is pulsed is held. It The sampling signal at this time is shown by symbol φ 2 in FIG.
サンプルアンドホールド回路U10〜U12の出力はフィル
タ回路U13〜U15により平均化される。そして、フィル
タ回路U13〜U15の出力は比較回路U16〜U18に与えら
れ、ここで被測定物3から反射されてくる信号光が半導
体位置検出器5の受光エリア521〜523のうちのど
の受光エリアに最も強く当っているかが判定され、その
結果がゲート信号G1,G2およびG3として出力され
る。ここで、例えば光信号が受光エリア521に入射し
ている場合には、ゲート信号G1が“H”(ハイレベ
ル)となり、ゲート信号G2およびG3が“L”(ロウ
レベル)となる。このゲート信号G1,G2およびG3
により、ゲート回路22において信号光が最も強く入射
している受光エリアからの信号線をONさせ、その出力
が減算回路23および加算回路24に送られる。The output of the sample-and-hold circuit U 10 ~U 12 is averaged by the filter circuit U 13 ~U 15. The output of the filter circuit U 13 ~U 15 is supplied to the comparison circuit U 16 ~U 18, wherein the light receiving area 52 1-52 3 of the signal light reflected from the object to be measured 3 is semiconductor position detector 5 It is determined which one of the light receiving areas is most strongly hit, and the result is output as gate signals G1, G2 and G3. Here, for example, when the optical signal is incident on the light receiving area 52 1, a gate signal G1 is "H" (high level), and the gate signal G2 and G3 is set to "L" (a low level). These gate signals G1, G2 and G3
Thus, in the gate circuit 22, the signal line from the light receiving area where the signal light is most strongly incident is turned on, and the output is sent to the subtraction circuit 23 and the addition circuit 24.
減算回路23および加算回路24の演算出力は信号成分
抜取回路25に与えられ、ここで外乱光成分に重畳され
た信号成分のみが抜き取られる。ここでは、光源をパル
ス点燈させる直前の電圧レベルをサンプリング信号φ1
により記録し、パルス点燈時の電圧レベルをサンプリン
グ信号φ2により記録する。この両者の記録値の差分を
とることにより、信号成分の抜き取りが実行される。信
号成分抜取回路25の出力はアナログ割算器26に与え
られ、ここで演算が実行されてアナログ電圧の形で出力
される。その結果、ゲート信号G1,G2およびG3の
出力状態により三分割された測距範囲の、どこに被測定
物が存在するかが判明し、アナログ電圧出力により被測
定物3までの正確な距離を求めることができる。The operation outputs of the subtraction circuit 23 and the addition circuit 24 are given to a signal component extraction circuit 25, where only the signal component superimposed on the disturbance light component is extracted. Here, the sampling signal φ 1 is the voltage level immediately before the light source is pulsed.
The voltage level at the time of pulse lighting is recorded by the sampling signal φ 2 . The signal component is extracted by taking the difference between the two recorded values. The output of the signal component extracting circuit 25 is given to the analog divider 26, where an arithmetic operation is executed and output in the form of an analog voltage. As a result, it is determined where the object to be measured is in the distance measuring range divided into three by the output states of the gate signals G1, G2 and G3, and the accurate distance to the object to be measured 3 is obtained by the analog voltage output. be able to.
この距離検出のためのアナログ演算は、具体的には前述
の(3)式および(4)式により行なうことができる。
すなわち、前述の(1)式と(4)式から距離xを消去
すると、 (IA−IB)/(IA+B) =1−2f・B/(C・L) …(21) の関係が得られるので、電流演算値(IA−IB)/
(IA+B)は被測定物までの距離Lに反比例している
ことがわかり、従って間接的に距離Lを求めることがで
きる。Specifically, the analog calculation for detecting the distance can be performed by the above equations (3) and (4).
That is, when erasing the distance x from the equation (1) and (4), (I A -I B) / (I A + B) = 1-2f · B / (C · L) ... (21) since the relationship is obtained, the current calculated value (I a -I B) /
It can be seen that (I A + B ) is inversely proportional to the distance L to the object to be measured, and therefore the distance L can be indirectly obtained.
なお、図には示していないが、信号成分抜取回路25の
出力のうち、IA+Bの信号のレベルをモニタし、この
電圧レベルが一定になるように光源1側の駆動回路(図
示せず)を制御することにより、アナログ割算器26の
演算精度を向上させることができる。Although not shown in the figure, of the output of the signal component extracting circuit 25, the level of the signal of I A + B is monitored, and the drive circuit (not shown) on the light source 1 side so that this voltage level becomes constant. By controlling (1), the calculation accuracy of the analog divider 26 can be improved.
次に、上記実施例を具体的数値によってより詳しく説明
する。Next, the above embodiment will be described in more detail with specific numerical values.
まず、実施例の測距装置の光学条件を以下の如く設定す
る。First, the optical conditions of the distance measuring device of the embodiment are set as follows.
f=60〔mm〕 B=200〔mm〕 LN3=750〔mm〕 LF3=LN21500〔mm〕 LF2=LN13000〔mm〕 LF1=6000〔mm〕 LF1/LN1=2 C1=f・B(1/LN1−1/LF1)=2〔mm〕 Δx=C1/500=4〔μm〕 半導体位置検出器5の分解能は入射光にもとづく信号光
電流の大きさにより変化するが、一般に信号光電流の和
(IA+B)が300〔nA〕の時に、分解能Δxは電
極間隔の1/500程度になる。そこで、Δx=C1/
500として求める。上記の数値を前述の(14)式に
代入すると、最遠距離の距離分解能ΔLFは以下の如く
なる。f = 60 [mm] B = 200 [mm] L N3 = 750 [mm] L F3 = L N2 1500 [mm] L F2 = L N1 3000 [mm] L F1 = 6000 [mm] L F1 / L N1 = 2 C1 = f · B (1 / L N1 −1 / L F1 ) = 2 [mm] Δx = C1 / 500 = 4 [μm] The resolution of the semiconductor position detector 5 is the magnitude of the signal photocurrent based on the incident light. varies with, but the sum of the general signal photocurrent (I a + B) is at 300 [nA], the resolution Δx is about 1/500 of the electrode spacing. Therefore, Δx = C1 /
Calculate as 500. Substituting the above numerical values into the above equation (14), the distance resolution ΔL F of the farthest distance is as follows.
ΔLF=12〔mm〕 …(19) これに対して、同一の光学系で従来の半導体位置検出器
を用いた場合に、同様にして最遠距離の距離分解能を求
めると以下の如くなる。ΔL F = 12 [mm] (19) On the other hand, when the conventional semiconductor position detector is used in the same optical system, the distance resolution of the farthest distance is similarly obtained as follows.
f・B=12000 LN=750〔mm〕 LF=6000〔mm〕 LF/LN=8 C=f・B(1/LN−1/LF)=14〔mm〕 ΔLF=83〔mm〕 …(20) そこで、(19)式と(20)式を比較すると、本実施
例においては従来技術の半導体位置検出器を用いた時に
比べて、遠距離測での距離分解能は同一光学系を用いて
も約7倍に改善されている。この効果は、半導体位置検
出器の受光部の分割数(受光エリアの数)を増すことに
より、さらに向上させることができる。 f · B = 12000 L N = 750 (mm) L F = 6000 [mm] L F / L N = 8 C = f · B (1 / L N -1 / L F) = 14 [mm] [Delta] L F = 83 [mm] (20) Then, comparing equations (19) and (20), the distance resolution in long-distance measurement is higher in this embodiment than in the case of using the conventional semiconductor position detector. Even with the same optical system, it is improved about 7 times. This effect can be further improved by increasing the number of divisions of the light receiving portion of the semiconductor position detector (the number of light receiving areas).
本発明は上記実施例を限定されるものはなく、種々の変
形が可能である。The present invention is not limited to the above embodiment, and various modifications can be made.
例えば、本発明の距離検出装置に適用にされる半導体位
置検出器は、第2図に示されるものに限られない。ま
た、半導体基板についてもシリコンに限らず、例えばガ
リウムヒ素(GaAs)とすれば、より高温の条件下で
も用いることが可能になる。For example, the semiconductor position detector applied to the distance detecting device of the present invention is not limited to that shown in FIG. Further, the semiconductor substrate is not limited to silicon, and if gallium arsenide (GaAs) is used, for example, it can be used under higher temperature conditions.
以上、詳細に説明した通り本発明によれば、遠距離測の
被測定物からの光と近距離測の被測定物からの光は、そ
れぞれ異なる受光エリアに光点として入射され、従って
各光電流はそれぞれの受光エリアの信号取出電極から出
力される。そして、最も強く光の当たっている受光エリ
アからの光電流出力が選択されてアナログ演算がされる
ので、遠、近の限界距離の比(LF/LN=m)を大き
くしても、遠距離側において高い距離分解能を得ること
のできる測距範囲の広い距離検出装置が得られる。As described above in detail, according to the present invention, the light from the object to be measured for long-distance measurement and the light from the object to be measured for short-distance measurement are made incident on different light receiving areas as light spots, and accordingly, each light The current is output from the signal extraction electrode in each light receiving area. Then, since the photocurrent output from the light receiving area where the light is most intense is selected and the analog calculation is performed, even if the ratio of the far and near limit distances (L F / L N = m) is increased, It is possible to obtain a distance detection device having a wide distance measuring range and capable of obtaining high distance resolution on the far side.
第1図は本発明の実施例に係る距離検出装置の要部ブロ
ック図、第2図は本発明の実施例に適用される半導体位
置検出器の斜視図、第3図は第2図に示す半導体位置検
出器の平面図および縦断面図、第4図は距離検出装置の
光学系の説明図、第5図は従来装置に適用される半導体
位置検出器の断面図、第6図は測距範囲をLNからLF
にしたときの距離検出用光学系の説明図である。 1……光源、2……集光レンズ、3……被測定物、4…
…受光レンズ、5……半導体位置検出器、22……ゲー
ト回路、23……減算回路、24……加算回路、25…
…信号成分抜取回路、26……アナログ割算器、51…
…シリコン基板、52……受光部(P型抵抗層)、52
1〜52n……受光エリア、53……n+型導電層、5
5a,55a1〜55an,55b,55b1〜55b
n……信号取出電極、U1〜U6……増幅器、U7〜U
9……加算回路、U10〜U12……サンプルアンドホール
ド回路、U13〜U15……フィルタ回路、U16〜U18……
比較回路(コンパレータ)。FIG. 1 is a block diagram of an essential part of a distance detecting device according to an embodiment of the present invention, FIG. 2 is a perspective view of a semiconductor position detector applied to the embodiment of the present invention, and FIG. 3 is shown in FIG. A plan view and a longitudinal sectional view of the semiconductor position detector, FIG. 4 is an explanatory view of an optical system of the distance detecting device, FIG. 5 is a sectional view of the semiconductor position detector applied to a conventional device, and FIG. 6 is a distance measuring device. Range L N to L F
FIG. 7 is an explanatory diagram of a distance detecting optical system when the setting is made. 1 ... Light source, 2 ... Condensing lens, 3 ... Object to be measured, 4 ...
... light receiving lens, 5 ... semiconductor position detector, 22 ... gate circuit, 23 ... subtraction circuit, 24 ... addition circuit, 25 ...
… Signal component sampling circuit, 26… Analog divider, 51…
... Silicon substrate, 52 ... Light receiving part (P-type resistance layer), 52
1 to 52 n ... light receiving area, 53 ... n + type conductive layer, 5
5a, 55a 1 ~55a n, 55b , 55b 1 ~55b
n ...... signal extraction electrodes, U 1 ~U 6 ...... amplifier, U 7 ~U
9 ...... adder circuit, U 10 ~U 12 ...... sample and hold circuit, U 13 ~U 15 ...... filter circuit, U 16 ~U 18 ......
Comparison circuit (comparator).
Claims (4)
不純物を含む受光部を形成すると共に、裏面側に第2導
電型不純物層を形成し、前記受光部に被測定物からの光
が光点として入射されたときに当該受光部の両端に配設
された信号取出電極から光電流が取り出される半導体位
置検出器を備え、この半導体位置検出器の光電流出力か
ら前記光点の入射位置を求めて記被測定物までの距離を
検出する距離検出装置において、 前記受光部は、各一対の信号取出電極を両端に配設した
複数の受光エリアを含み、この複数の受光エリアは前記
各一対の信号取出電極の一方と他方が互いに隣接するよ
うに一列に配設され、かつ前記複数の受光エリアの信号
取出電極の間隔は一方から他方へ向かって順次大きくな
ると共に、任意の受光エリアの信号取出電極の間隔と前
記任意の受光エリアと隣接する前記他方の側の受光エリ
アの信号取出電極の間隔との比は常に一定となってお
り、 前記複数の受光エリアの各一対の信号取出電極からの光
電流出力にもとづいて、いずれの受光エリアに最も強く
光が当たっているかを判別する判別手段と、 前記複数の受光エリアの光電流出力のうち最も強く光が
当たっているものを前記判別手段の判別結果もとづいて
選択するセレクト手段と、 このセレクト手段により選択された光電流出力から前記
受光部における光点の位置を求め、前記被測定物までの
距離を演算する演算手段と を備えることを特徴とする距離検出装置。1. A high-resistance semiconductor substrate is provided with a light receiving portion containing a first conductivity type impurity on a front surface side thereof, and a second conductivity type impurity layer is formed on a back surface side of the high resistance semiconductor substrate. When light is incident as a light spot, a semiconductor position detector is provided from which a photocurrent is taken out from the signal extraction electrodes arranged at both ends of the light receiving part. In the distance detection device for detecting the distance to the DUT by obtaining the incident position, the light receiving unit includes a plurality of light receiving areas in which each pair of signal extraction electrodes is arranged at both ends, and the plurality of light receiving areas are One and the other of each of the pair of signal extraction electrodes are arranged in a row so as to be adjacent to each other, and the intervals between the signal extraction electrodes in the plurality of light receiving areas gradually increase from one to the other, and at the same time, receive any light. Area signal extraction The ratio of the distance between the electrodes and the distance between the signal extraction electrodes of the light reception area on the other side adjacent to the arbitrary light reception area is always constant, and the ratio from the pair of signal extraction electrodes of the plurality of light reception areas Based on the photocurrent output, a determination unit that determines which of the light receiving areas is most strongly exposed to light, and the one of the plurality of light receiving areas that is most strongly exposed to light is the determination unit of the determination unit. Selective means for selecting based on the discrimination result, and arithmetic means for calculating the distance to the object to be measured by obtaining the position of the light spot in the light receiving part from the photocurrent output selected by the selecting means. Distance detection device.
た分離層を介して前記複数の受光エリアに分割されてい
ることを特徴とする特許請求の範囲第1項記載の距離検
出装置。2. The distance detecting device according to claim 1, wherein the light receiving portion is divided into the plurality of light receiving areas via a separation layer formed on the semiconductor substrate.
抵抗を介して接地されていることを特徴とする特許請求
の範囲第1項または第2項記載の距離検出装置。3. The distance detecting device according to claim 1 or 2, wherein the signal extracting electrode is grounded via a resistor for current / voltage conversion.
電流出力のレベルを比較する比較回路を有することを特
徴とする特許請求の範囲第1項ないし第3項のいずれか
に記載の距離検出装置。4. The distance according to claim 1, wherein the discriminating means has a comparison circuit for comparing the photocurrent output levels of the plurality of light receiving areas. Detection device.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21751987A JPH0621789B2 (en) | 1987-08-31 | 1987-08-31 | Distance detector |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP21751987A JPH0621789B2 (en) | 1987-08-31 | 1987-08-31 | Distance detector |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6418010A JPS6418010A (en) | 1989-01-20 |
| JPH0621789B2 true JPH0621789B2 (en) | 1994-03-23 |
Family
ID=16705511
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP21751987A Expired - Fee Related JPH0621789B2 (en) | 1987-08-31 | 1987-08-31 | Distance detector |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0621789B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5318424A (en) * | 1992-12-07 | 1994-06-07 | Carrier Corporation | Minimum diameter scroll component |
-
1987
- 1987-08-31 JP JP21751987A patent/JPH0621789B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6418010A (en) | 1989-01-20 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |