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JPH0622791B2 - Continuous polishing equipment for glass plates - Google Patents
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JPH0622791B2 - Continuous polishing equipment for glass plates - Google Patents

Continuous polishing equipment for glass plates

Info

Publication number
JPH0622791B2
JPH0622791B2 JP63233804A JP23380488A JPH0622791B2 JP H0622791 B2 JPH0622791 B2 JP H0622791B2 JP 63233804 A JP63233804 A JP 63233804A JP 23380488 A JP23380488 A JP 23380488A JP H0622791 B2 JPH0622791 B2 JP H0622791B2
Authority
JP
Japan
Prior art keywords
polishing
glass plate
polishing tool
glass
tool
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP63233804A
Other languages
Japanese (ja)
Other versions
JPH0283150A (en
Inventor
心隆 西畑
尚宏 堀田
智則 青木
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
AGC Inc
Original Assignee
Asahi Glass Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Glass Co Ltd filed Critical Asahi Glass Co Ltd
Priority to JP63233804A priority Critical patent/JPH0622791B2/en
Publication of JPH0283150A publication Critical patent/JPH0283150A/en
Publication of JPH0622791B2 publication Critical patent/JPH0622791B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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  • Grinding Of Cylindrical And Plane Surfaces (AREA)

Description

【発明の詳細な説明】 [産業上の利用分野] 本発明は硝子板の連続研磨装置に関するものである。DETAILED DESCRIPTION OF THE INVENTION [Field of Industrial Application] The present invention relates to a continuous polishing apparatus for glass plates.

[従来の技術] 従来、液晶用硝子基板のような比較的薄い硝子板の研磨
は、オスカー式片面研磨機や両面研磨機によって行われ
ていたが、これらの方法では硝子板に加わる研磨定盤の
周速差を利用しているため、硝子板各点における硝子の
除去されかたが異なり硝子板サイズが大型化すればする
程、より多くの研磨代をとらなければならない。一方、
硝子板はキャリヤという枠内支持であるため研磨負荷か
らみて大型化に対して限界が生じている。又、これらは
装置構成上自動化が困難であるため、多大の人手を要
し、その結果研磨装置への硝子板脱着時における扱いキ
ズの発生確率が高くなるという問題を生じている。
[Prior Art] Conventionally, polishing of a relatively thin glass plate such as a glass substrate for liquid crystal has been performed by an Oscar type single-side polishing machine or a double-side polishing machine. With these methods, a polishing surface plate added to the glass plate is used. Since the difference in the peripheral speed is used, the glass removal is different at each point of the glass plate, and the larger the glass plate size is, the more polishing allowance must be taken. on the other hand,
Since the glass plate is supported within the frame of the carrier, there is a limit to the size increase in view of the polishing load. Further, since it is difficult to automate these due to the apparatus configuration, a great deal of manpower is required, and as a result, there is a problem that the probability of handling scratches occurring when the glass plate is attached to or detached from the polishing apparatus increases.

[発明の解決しようとする課題] 本発明の目的は、従来技術が有していた前述の欠点を解
消する新規な研磨装置を提供することである。
[Problems to be Solved by the Invention] An object of the present invention is to provide a novel polishing apparatus that overcomes the above-mentioned drawbacks of the prior art.

[課題を解決するための手段] 本発明は、前述の問題点を解決すべくなされたものであ
り、硝子板を一方向に移送するための研磨テーブルと、
該研磨テーブルの上方に硝子板の移送方向に沿って配置
された複数個の研磨具とを有し、各研磨具は偏心軸によ
って前記硝子板に対し偏心回転運動を行い、かつ隣り合
う研磨具の回転位相が反転するように設置されているこ
とを特徴とする硝子板の連続研磨装置を提供するもので
ある。
[Means for Solving the Problems] The present invention has been made to solve the above-described problems, and includes a polishing table for transferring a glass plate in one direction,
A plurality of polishing tools arranged above the polishing table along the transfer direction of the glass plate, each polishing tool performing an eccentric rotational motion with respect to the glass plate by an eccentric shaft, and adjacent polishing tools. The present invention provides a continuous polishing apparatus for glass plates, which is installed so that the rotational phase of the glass plate is reversed.

次に図面に従って本発明に係る研磨装置について具体的
に説明する。
Next, the polishing apparatus according to the present invention will be specifically described with reference to the drawings.

第1図において、1は研磨機構を支持するための片持ち
はりであり、通常は鋳物で製作されている。これらの片
持ちはりは、研磨ラインに研磨具3の数に合せて配置さ
れる。研磨ラインはレール6上を連接して矢印方向に走
行する研磨テーブル7により構成されており、硝子板5
はこの研磨テーブル上に傷がつかないように薄いクッシ
ョン材を介して張り付け固定される。
In FIG. 1, reference numeral 1 denotes a cantilever beam for supporting a polishing mechanism, which is usually made of cast metal. These cantilever beams are arranged on the polishing line according to the number of polishing tools 3. The polishing line is composed of a polishing table 7 connected on a rail 6 and traveling in the direction of the arrow.
Is attached and fixed on this polishing table through a thin cushion material so as not to be scratched.

研磨テーブル7の裏側には図示を省略したが、テーブル
に対して垂直にラックが設けてあり、テーブル下方に設
けてある駆動モータとピニオンを介して動作するように
なっている。ラックがテーブルに対して垂直に設けてあ
るのは、ピニオンとのバックラッシによってテーブルが
研磨具に対して垂直方向に振動を起すのを避けるためで
ある。また、このテーブル駆動用モータはインバータを
備え付けており、スピードを0〜100cm/分の間で可変す
ることができる。硝子板5を研磨する位置では、このよ
うにレール6によりテーブルは送られるが、研磨後の戻
りラインでは、さほど位置精度、振動などが問題になら
ないため、ロール8により戻るようになっている。
Although not shown in the figure on the back side of the polishing table 7, a rack is provided vertically to the table so that it can be operated via a drive motor and a pinion provided below the table. The rack is provided perpendicularly to the table in order to prevent the table from vibrating vertically to the polishing tool due to backlash with the pinion. Further, this table driving motor is equipped with an inverter so that the speed can be varied between 0 and 100 cm / min. At the position where the glass plate 5 is polished, the table is fed by the rails 6 in this way, but the return line after polishing does not cause much problems in positional accuracy, vibration, etc., so that the table is returned by the roll 8.

研磨具3は、重量を軽くするため通常はA1あるいはA
1合金で製作されており、その下面には図示を省略した
が研磨パッドとして例えば発泡ポリウレタンパッドを貼
っている。ここで、研磨具の形状としては、硝子面の表
面を均一に研磨するという点から短冊型であることが望
まれる。この研磨具3は、前述片持ちはり1にボールベ
アリング10により軸支した回転軸の下端にディスク11を
装着し、このディスク11は偏心して設けた偏心軸12によ
り支持板13を取付け、この支持板にシリンダー5を介し
て装着した定盤14に取付けられる。この場合、研磨具3
は定盤14に通常ユニバーサルジョイント16により取付け
られる。テーパ状の硝子板あるいは硝子板間の継ぎ目の
段差に対し、フレキシブルに対応させるためである。な
お、定盤14は両端のガイド15により支持板13に安定して
取付けられており、シリンダー5によるストロークに対
して左右に傾かないように工夫されている。
The polishing tool 3 is usually A1 or A to reduce the weight.
Although it is made of one alloy, a foamed polyurethane pad, for example, is attached as a polishing pad on the lower surface, though not shown. Here, the shape of the polishing tool is preferably a strip shape from the viewpoint of uniformly polishing the glass surface. In this polishing tool 3, a disk 11 is mounted on the lower end of a rotary shaft that is supported by a ball bearing 10 on the cantilever 1 described above, and a support plate 13 is mounted on the disk 11 by an eccentric shaft 12 that is eccentrically provided. It is attached to a surface plate 14 mounted on a plate via a cylinder 5. In this case, the polishing tool 3
Is usually attached to the surface plate 14 by a universal joint 16. This is to flexibly cope with the step difference of the tapered glass plate or the joint between the glass plates. The surface plate 14 is stably attached to the support plate 13 by the guides 15 at both ends, and is devised so as not to tilt left and right with respect to the stroke of the cylinder 5.

なお、図には示していないが、ディスク11には、偏心軸
12による回転モーメントを消去するために、偏心軸12の
反対側にバランスを付けるのが好ましい。これにより振
動を最小限にすることができる。
Although not shown in the figure, the disk 11 has an eccentric shaft.
To eliminate the rotational moment due to 12, it is preferable to balance on the opposite side of the eccentric shaft 12. This can minimize vibration.

以上、一つの研磨具の取付け構造について説明したが、
各片持ちはり1には研磨具3が同様に取付けられる。そ
して、これらの研磨具3はドライブシャフト9に駆動結
合されており、同時に回転できるようになっている。こ
の場合、ドライブシャフト9はモータインバータを介し
て連結されており、これにより研磨具の回転数は0〜30
0rpmの間で変えられる。
Up to this point, the mounting structure for one polishing tool has been described.
A polishing tool 3 is similarly attached to each cantilever 1. The polishing tools 3 are drivingly connected to the drive shaft 9 so that they can rotate at the same time. In this case, the drive shaft 9 is connected via a motor inverter, so that the rotation speed of the polishing tool is 0 to 30.
Can be changed between 0 rpm.

更に、本発明において重要なことは研磨ラインに沿って
並設される研磨具3は、回転方向はすべて同様である
が、後述するように隣り合う定盤14及び研磨具3の質量
重心の回転位相が第2図に示すようにそれぞれ180゜ずつ
反転することである。このような構成により、硝子板に
複数個の研磨具が載った場合に、硝子板に加わる負荷を
バランスさせることができ、特に偶数個の研磨具が硝子
板5に対して作動しているときには、負荷を相殺するこ
とができる。
Further, it is important in the present invention that the polishing tools 3 arranged in parallel along the polishing line have the same rotation directions, but as will be described later, rotation of the mass center of gravity of the adjacent platen 14 and polishing tool 3 is adjacent to each other. The phase is inverted by 180 ° as shown in FIG. With such a configuration, when a plurality of polishing tools are placed on the glass plate, the load applied to the glass plate can be balanced, and particularly when an even number of polishing tools are operating on the glass plate 5. , Can offset the load.

[作用] 次に第2図、第3図により研磨具の動作について説明す
る。
[Operation] Next, the operation of the polishing tool will be described with reference to FIGS. 2 and 3.

本発明装置において、テーブル7は連続的に太矢印方向
へ移動する。研磨具3は偏心軸によって第2図のように
運動する。その運動詳細を第3図(a),(b)で示す。18は
研磨具の質量重心、17はその質量重心が偏心軸によって
移動する軌跡を示している。(a)において隣り合う各研
磨具同志は回転方向はすべて同様であるが、質量重心の
回転位相がそれぞれ180゜ずつ反転している。19は研磨具
が硝子板5に加える力の方向を示している。
In the device of the present invention, the table 7 continuously moves in the direction of the thick arrow. The polishing tool 3 moves as shown in FIG. 2 by the eccentric shaft. Details of the exercise are shown in FIGS. 3 (a) and 3 (b). 18 is the mass center of gravity of the polishing tool, and 17 is the locus of movement of the mass center of gravity by the eccentric axis. In (a), the polishing tools adjacent to each other have the same rotation direction, but the rotation phase of the mass center of gravity is reversed by 180 °. Reference numeral 19 indicates the direction of the force applied to the glass plate 5 by the polishing tool.

本発明において、このような機構を持たせることによっ
て、硝子板に複数の研磨具が作用したとき互いに相殺す
るように働き、特に偶数のときには硝子板5に加わる負
荷は完全に相殺される。また、奇数個の研磨具が載った
場合でも、従来のオスカー式片面研磨機や両面研磨機に
比べ、硝子板に加わる負荷は比べるほどにならない程小
さい。そのため従来の様なキャリヤ内での硝子板の支持
を行わなくても、大型サイズの硝子板を連続的に研磨加
工することが可能となる。
In the present invention, by providing such a mechanism, when a plurality of polishing tools act on the glass plate, they act to cancel each other, and particularly when the number is even, the load applied to the glass plate 5 is completely canceled. Even when an odd number of polishing tools are mounted, the load applied to the glass plate is incomparably smaller than that of the conventional Oscar type single-side polishing machine or double-side polishing machine. Therefore, it becomes possible to continuously grind a large-sized glass plate without supporting the glass plate in the carrier as in the conventional case.

[実施例] 第1図において、個々のテーブルの大きさは500mm×125
0mmとし、送りスピードは0〜100cm/minをイバータによ
り可変とした。又各研磨具は480mm×100mmの大きさと
し、各研磨具間のピッチを100mmとし総数32ケ並べる形
とし、それぞれを回転数0〜300rpmとし、インバータに
より可変とした。
[Embodiment] In FIG. 1, the size of each table is 500 mm × 125.
The feed rate was 0 to 100 cm / min, which was variable by the inverting. The size of each polishing tool was 480 mm × 100 mm, the pitch between the polishing tools was 100 mm, and a total of 32 pieces were arranged. The number of rotations was 0 to 300 rpm, which was variable by an inverter.

硝子板は300mm×300mm×1.1mmとし、テーブルへは研磨
布に水で吸着させる方法によって固定する。パッドとし
て酸化セリウムを含浸させた発泡ポリウレタンパッドを
用い、研磨液としては10〜15be程度の酸化セリウム溶液
を#200あるいは#400のメッシュでふるいにかけて用い
た。
The glass plate is 300 mm × 300 mm × 1.1 mm, and it is fixed to the table by a method in which a polishing cloth is adsorbed with water. A foamed polyurethane pad impregnated with cerium oxide was used as a pad, and a cerium oxide solution of about 10 to 15 be was used as a polishing liquid by sieving with a # 200 or # 400 mesh.

以下、前述の実施例に基づき硝子素板がもつ表面上の微
小なうねり(〜0.2μm高さ)とキズが除去されるのに
要する時間の一例を従来の研磨方式で行なった場合と比
較して挙げる。
Below, an example of the time required for removing minute undulations (~ 0.2 μm height) and scratches on the surface of the glass plate based on the above-mentioned embodiment is compared with the case where the conventional polishing method is used. I will list it.

[発明の効果] 従来のオスカー式片面研磨機では硝子表面の凹凸を除去
するために5μm以上の研磨代をとらなければならなか
ったが、本発明装置では、隣り合う研磨具の質量重心の
回転位相を180゜ずつずらしているので、硝子板に加わる
負荷がバランスし、研磨具に周速差を発生しない結果と
して研磨代が2〜3μm程度で良好な面が得られる。さ
らに研磨具が連続して並んでいるために、前段では粗研
磨、中断は通常の液晶用硝子並の研磨、後段ではフォト
マスク並みの精密研磨面とパッドを交換するだけで容易
に得られることが確認されている。
[Advantages of the Invention] In the conventional Oscar type single-side polishing machine, a polishing allowance of 5 μm or more had to be taken in order to remove the irregularities on the glass surface. Since the phases are shifted by 180 °, the load applied to the glass plate is balanced and no difference in peripheral speed is generated in the polishing tool. As a result, the polishing allowance is about 2 to 3 μm and a good surface is obtained. Furthermore, since the polishing tools are lined up in a row, rough polishing can be performed in the first stage, interruption can be easily performed as with ordinary glass for liquid crystal, and in the second stage it can be easily obtained by exchanging the pad with a precision polishing surface similar to a photomask. Has been confirmed.

更に、本発明の好ましい実施例では研磨具を2軸により
片持ちはりに支持しているので、研磨具を常に安定して
保持することができ、これにより研磨具の拡大化が図れ
ると共に、硝子板を均一に研磨することができる。
Further, in the preferred embodiment of the present invention, since the polishing tool is supported by the cantilever by the two shafts, the polishing tool can always be held stably, which allows the polishing tool to be enlarged and the glass to be used. The plate can be evenly polished.

更にまた、研磨具を支持板に定盤を介して取付けると、
研磨具の支持が一層安定するばかりでなく、研磨面の凹
凸、段差などに対しても柔軟に対応することが可能であ
る。
Furthermore, when the polishing tool is attached to the support plate via the surface plate,
Not only is the support of the polishing tool more stable, but it is also possible to flexibly deal with irregularities and steps on the polishing surface.

【図面の簡単な説明】[Brief description of drawings]

第1図は。本発明装置の一実施例を示す概略的な斜視図
であり、第2図は研磨具の基本構成を示す平面図であ
り、第3図は第2図における研磨具の動きを示す説明図
である。 図において、1は片持ちはり、3は研磨具、5は硝子
板、7は研磨テーブル。
Figure 1 is. FIG. 2 is a schematic perspective view showing an embodiment of the device of the present invention, FIG. 2 is a plan view showing the basic structure of the polishing tool, and FIG. 3 is an explanatory view showing the movement of the polishing tool in FIG. is there. In the figure, 1 is a cantilever beam, 3 is a polishing tool, 5 is a glass plate, and 7 is a polishing table.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】硝子板を一方向に移送するための研磨テー
ブルと、該研磨テーブルの上方に硝子板の移送方向に沿
って配置された複数個の研磨具とを有し、各研磨具は偏
心軸によって前記硝子板に対し偏心回転運動を行い、か
つ隣り合う研磨具の回転位相が反転するように設置され
ていることを特徴とする硝子板の連続研磨装置。
1. A polishing table for transporting a glass plate in one direction, and a plurality of polishing tools arranged above the polishing table along the transport direction of the glass plate, each polishing tool comprising: An apparatus for continuously polishing a glass plate, which is installed such that an eccentric shaft makes an eccentric rotary motion with respect to the glass plate and the rotation phases of adjacent polishing tools are reversed.
JP63233804A 1988-09-20 1988-09-20 Continuous polishing equipment for glass plates Expired - Fee Related JPH0622791B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP63233804A JPH0622791B2 (en) 1988-09-20 1988-09-20 Continuous polishing equipment for glass plates

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP63233804A JPH0622791B2 (en) 1988-09-20 1988-09-20 Continuous polishing equipment for glass plates

Publications (2)

Publication Number Publication Date
JPH0283150A JPH0283150A (en) 1990-03-23
JPH0622791B2 true JPH0622791B2 (en) 1994-03-30

Family

ID=16960846

Family Applications (1)

Application Number Title Priority Date Filing Date
JP63233804A Expired - Fee Related JPH0622791B2 (en) 1988-09-20 1988-09-20 Continuous polishing equipment for glass plates

Country Status (1)

Country Link
JP (1) JPH0622791B2 (en)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4556474B2 (en) * 2004-04-02 2010-10-06 凸版印刷株式会社 Color filter polishing method
JP5261985B2 (en) * 2007-05-29 2013-08-14 凸版印刷株式会社 Color filter polishing apparatus and polishing method thereof
JP5061296B2 (en) * 2007-07-11 2012-10-31 サイチ工業株式会社 Flat double-side polishing method and flat double-side polishing apparatus
JP4756709B2 (en) * 2007-10-16 2011-08-24 Sdフューチャーテクノロジー株式会社 Polishing equipment
JP2009184074A (en) * 2008-02-06 2009-08-20 Sd Future Technology Co Ltd Polishing device
JP5664904B2 (en) * 2010-12-27 2015-02-04 旭硝子株式会社 Glass plate continuous polishing apparatus and continuous polishing method

Also Published As

Publication number Publication date
JPH0283150A (en) 1990-03-23

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