JPH0623080B2 - Manufacturing method of micro optical element - Google Patents
Manufacturing method of micro optical elementInfo
- Publication number
- JPH0623080B2 JPH0623080B2 JP59072100A JP7210084A JPH0623080B2 JP H0623080 B2 JPH0623080 B2 JP H0623080B2 JP 59072100 A JP59072100 A JP 59072100A JP 7210084 A JP7210084 A JP 7210084A JP H0623080 B2 JPH0623080 B2 JP H0623080B2
- Authority
- JP
- Japan
- Prior art keywords
- flat plate
- substrate
- manufacturing
- ion
- plate microlens
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 16
- 230000003287 optical effect Effects 0.000 title claims description 16
- 238000009792 diffusion process Methods 0.000 claims description 28
- 239000000758 substrate Substances 0.000 claims description 26
- 239000011521 glass Substances 0.000 claims description 7
- 150000002500 ions Chemical class 0.000 description 18
- 238000000034 method Methods 0.000 description 9
- 239000002019 doping agent Substances 0.000 description 7
- 238000007796 conventional method Methods 0.000 description 6
- 150000003839 salts Chemical class 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- NBIIXXVUZAFLBC-UHFFFAOYSA-N Phosphoric acid Chemical compound OP(O)(O)=O NBIIXXVUZAFLBC-UHFFFAOYSA-N 0.000 description 2
- 230000007547 defect Effects 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 239000013307 optical fiber Substances 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- 230000004075 alteration Effects 0.000 description 1
- 229910000147 aluminium phosphate Inorganic materials 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000000835 fiber Substances 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 230000005693 optoelectronics Effects 0.000 description 1
- DCKVFVYPWDKYDN-UHFFFAOYSA-L oxygen(2-);titanium(4+);sulfate Chemical compound [O-2].[Ti+4].[O-]S([O-])(=O)=O DCKVFVYPWDKYDN-UHFFFAOYSA-L 0.000 description 1
- 230000035515 penetration Effects 0.000 description 1
- 238000001552 radio frequency sputter deposition Methods 0.000 description 1
- 229910000348 titanium sulfate Inorganic materials 0.000 description 1
- NWONKYPBYAMBJT-UHFFFAOYSA-L zinc sulfate Chemical compound [Zn+2].[O-]S([O-])(=O)=O NWONKYPBYAMBJT-UHFFFAOYSA-L 0.000 description 1
- 229910000368 zinc sulfate Inorganic materials 0.000 description 1
- 229960001763 zinc sulfate Drugs 0.000 description 1
Landscapes
- Optical Integrated Circuits (AREA)
- Surface Treatment Of Glass (AREA)
Description
【発明の詳細な説明】 〔技術分野〕 本発明は、イオン熱拡散法を用いた微小光学素子の製造
方法に関するものである。TECHNICAL FIELD The present invention relates to a method for manufacturing a micro optical element using an ion thermal diffusion method.
以下、本明細書では、本発明のイオン熱拡散法が用いた
微小光学素子の製造方法を用いて製造する平板マイクロ
レンズについて説明していく。Hereinafter, in the present specification, a flat plate microlens manufactured by the method for manufacturing a micro optical element using the ion thermal diffusion method of the present invention will be described.
本発明は、イオン熱拡散法を用いた微小光学素子の製造
方法を用いて製造する平板マイクロレンズにおいて、イ
オン熱拡散を行うべき面には選択的にイオン熱拡散を行
うための開口部を有するパターンマスクが形成され、イ
オン熱拡散を行わない面には不要なイオン熱拡散を防止
するための開口部を有しない全面マスクが形成されたガ
ラス基板を用いてイオン熱拡散を行う微小光学素子の製
造方法に関する。The present invention, in a flat plate microlens manufactured by using the method for manufacturing a micro optical element using the ion thermal diffusion method, has an opening for selectively performing the ion thermal diffusion on the surface to be subjected to the ion thermal diffusion. A micro-optical element that performs ion heat diffusion using a glass substrate on which a pattern mask is formed and a full-face mask that has no opening for preventing unnecessary ion heat diffusion is formed on the surface that does not perform ion heat diffusion It relates to a manufacturing method.
近年、伊賀，及川らによって、平板基板内へのドーパン
トの選択拡散によってできる平板マイクロレンズが報告
され注目をあつめている。（AppleOpt.22,441(1983)）
この平板マイクロレンズは、多数のマイクロレンズを所
望の位置関係でモノリシックに集積できるという特徴を
もち、他のアレイ状の光学素子と積層することによって
光回路をアレイ状に一括して製作できるなど、将来の光
関連分野において基本的なエレメントになることが期待
されている。また複写器，プリンターイメージセンサ
等、画像伝送の分野においても基本的なエレメントにな
っていくと思われる。さらには光ディスクのピックアッ
プ等にも応用されよう。このように平板マイクロレンズ
は光関連の多くの分野で基本的なエレメントになること
が期待できる。In recent years, Iga, Oikawa and others have reported a flat plate microlens formed by selective diffusion of a dopant into a flat plate substrate, and have been attracting attention. (Apple Opt.22,441 (1983))
This flat plate microlens has a feature that a large number of microlenses can be monolithically integrated in a desired positional relationship, and by stacking with other array-shaped optical elements, optical circuits can be manufactured collectively in an array. It is expected to become a basic element in future optical fields. It is also expected to become a basic element in the field of image transmission such as copiers and printer image sensors. Furthermore, it may be applied to pickup of optical disks. As described above, the flat plate microlens can be expected to become a basic element in many optical fields.
ところが従来の平板マイクロレンズの製造方法は、ドー
パントを基板に選択拡散させるイオン熱拡散の工程で、
基板がわずかにそる、ねじれる、基板側面、裏面がドー
パントで汚染される等の欠点をもつために、各種分野で
要求される精度をもった平板マイクロレンズを再限性良
く得ることはできなかった。従来の平板マイクロレンズ
の製造方法のイオン熱拡散の工程を図１で、また従来の
製造方法で得られた平板マイクロレンズのもつ各種の欠
陥を図２で説明する。However, the conventional method for manufacturing a flat plate microlens is an ion thermal diffusion step of selectively diffusing a dopant into a substrate,
It was not possible to obtain a flat microlens with the accuracy required in various fields with a high degree of restriction because of the defects that the substrate was slightly warped, twisted, and the side and back surfaces of the substrate were contaminated with dopants. . The process of ion thermal diffusion in the conventional method for manufacturing a flat plate microlens will be described with reference to FIG.
従来のイオン熱拡散法においては、イオン熱拡散を、パ
ターンマスクを下にして基板を熔融塩に浸すことによっ
て行なっていた。ところが図１のごとく、パターンマス
クの形成されている面以外の面（図１では基板側面，基
板裏面）には特にドーパントへの基板への浸入を防ぐた
めの対策がとられておらず、基板側面等からドーパント
が拡散し、そのため基板のそり、ねじれ、汚れ等の現象
がみられた。これらの現象は図２に示した様に、平板マ
イクロレンズ、および平板マイクロレンズアレイの精度
を低下させていた。（（ａ）〜（ｄ））。In the conventional ionic heat diffusion method, ionic heat diffusion is performed by immersing the substrate in a molten salt with the pattern mask facing down. However, as shown in FIG. 1, the surface other than the surface on which the pattern mask is formed (the side surface of the substrate, the back surface of the substrate in FIG. 1) has no measures taken to prevent the penetration of the dopant into the substrate. The dopant was diffused from the side surface and the like, so that the phenomenon such as warpage, twist, and stain of the substrate was observed. As shown in FIG. 2, these phenomena deteriorated the accuracy of the flat plate microlens and the flat plate microlens array. ((A)-(d)).
（ａ） 光軸の傾き （ｂ） 個々のレンズ特性のバラツキ（レンズ径、焦点
距離、ＮＡ、収差等） （ｃ） レンズ間の位置関係の精度の低下 （ｄ） 基板の屈折率の不均一性 〔目的〕 本発明は上記の欠点を解決するため、イオン熱拡散法を
用いた平板マイクロレンズの製造方法において、パター
ンマスクが形成されている面以外にもマスクが形成され
ている基板を用いてイオン熱拡散を行ない、目的を達し
たものである。(A) Inclination of optical axis (b) Variation of individual lens characteristics (lens diameter, focal length, NA, aberration, etc.) (c) Decrease in positional accuracy between lenses (d) Non-uniform refractive index of substrate In order to solve the above-mentioned drawbacks, the present invention uses a substrate on which a mask is formed in addition to the surface on which the pattern mask is formed, in a method for manufacturing a flat plate microlens using an ion thermal diffusion method. Ion heat diffusion is performed to achieve the purpose.
以下、図面を用いて本発明を詳しく説明する。本発明の
平板マイクロレンズの製造方法において、イオン熱拡散
の工程の模式図を図３に示す。本発明で用いる基板は、
図１で説明した従来法のイオン熱拡散で用いた基板のパ
ターンマスクが形成されている面以外の面にもマスクが
形成されており、ドーパントはパターンマスクの開口部
からのみ基板に浸入する。したがって従来法の欠点であ
った基板のそり、ねじれ、汚れ等が全くといっていいほ
どなくなり、各種光学デバイスのエレメントとして必要
な精度を具備した平板マイクロレンズが得られるように
なった。以下、本発明の実施例を記す。Hereinafter, the present invention will be described in detail with reference to the drawings. FIG. 3 shows a schematic diagram of the ion thermal diffusion step in the method for manufacturing a flat plate microlens of the present invention. The substrate used in the present invention is
A mask is also formed on the surface other than the surface on which the pattern mask of the substrate used in the conventional ion thermal diffusion described in FIG. 1 is formed, and the dopant enters the substrate only through the opening of the pattern mask. Therefore, warpage, twisting, dirt, etc. of the substrate, which were the drawbacks of the conventional method, are completely eliminated, and a flat plate microlens having accuracy required as an element of various optical devices can be obtained. Examples of the present invention will be described below.
1.３０mm×３０mm×５mm厚のＫＦ２ガラスの六面を研磨
した。The six sides of 1.30 mm × 30 mm × 5 mm thick KF2 glass were polished.
2.上記基板の六面にＲＦスパッタ装置によってＴｉ膜を
おのおの１μｍ形成した。2. A Ti film having a thickness of 1 μm was formed on each of the six surfaces of the substrate by an RF sputtering apparatus.
3.フオト工程により直径５００μｍの円形の開口部を２
mmピッチで格子状に１４４コ（１２×１２）設けた。3. By the photo process, 2 circular openings with a diameter of 500 μm
144 pieces (12 × 12) were provided in a grid pattern with a mm pitch.
4.硫酸タイウム，硫酸亜鉛からなる熔融塩（モル比で５
対５）に基板をパターンマスクを下にして浮かべた。
（図３） 5.Ｎ２雰囲気中、５００℃で９６時間イオン熱拡散を行
なった。4. Molten salt composed of titanium sulfate and zinc sulfate (molar ratio of 5
In the pair 5), the substrate was floated with the pattern mask facing down.
(FIG. 3) 5. Ion thermal diffusion was performed at 500 ° C. for 96 hours in an N 2 atmosphere.
6.基板を熔融塩から取り出して徐冷した。6. The substrate was taken out from the molten salt and gradually cooled.
7.基板を洗浄後、Ｔｉ膜を熱リン酸でエッチングするこ
とによって取り除いた。7. After cleaning the substrate, the Ti film was removed by etching with hot phosphoric acid.
8.ガラス表面を研磨した。8. The glass surface was polished.
以上の操作によって下記の特性をもつ平板マイクロレン
ズが得られた。（図４） レンズ直径 １．５２mm 焦点距離Ａ ３．１２mm（空気中） 焦点距離Ｂ ５．００mm（ガラス中） レンズ間のピッチ ２．００mm レンズ個数 １４４コ この平板マイクロレンズアレイに図５の様に平行光
を入射したところ１４４コすべての平板マイクロレンズ
で良好な集光作用を示し、ガラス基板端面でＧＩ５０フ
ァイバに光を導びくことができた。Through the above operation, a flat plate microlens having the following characteristics was obtained. (Figure 4) Lens diameter 1.52mm Focal length A 3.12mm (in air) Focal distance B 5.00mm (in glass) Pitch between lenses 2.00mm Number of lenses 144 pieces When parallel light was incident on the plate, all 144 flat plate microlenses exhibited a good condensing effect, and the light could be guided to the GI50 fiber at the end surface of the glass substrate.
以上の様に、本発明の平板マイクロレンズの製造方法に
よると、各種用途に必要な精度をもつ平板マイクロレン
ズが比較的簡単な工程で量産でき、そのため将来基本的
な光学エレメントになっていくであろう平板マイクロレ
ンズを安価に提供でき、本発明がオプトエレクトロニク
スの分野に多大な寄与をすると確信する。なお本発明の
イオン熱拡散法を用いた微小光学素子の製造方法は、平
板マイクロレンズに限らず、広く微小光学素子（れば、
薄膜導波路、分岐素子、薄膜スイッチング素子等）の製
造においても応用できよう。As described above, according to the method of manufacturing a flat-plate microlens of the present invention, a flat-plate microlens having accuracy required for various applications can be mass-produced in a relatively simple process, and thus it will become a basic optical element in the future. We believe that the present invention will make a great contribution to the field of optoelectronics by providing a flat plate microlens at low cost. The method for manufacturing a micro optical element using the ion thermal diffusion method of the present invention is not limited to a flat plate micro lens, and is widely applicable to micro optical elements (
It could also be applied in the manufacture of thin film waveguides, branching devices, thin film switching devices, etc.).
第１図は従来のイオン熱拡散法を用いた平板マイクロレ
ンズの製造方法で、１はガラス基板、２はパターンマス
ク、３はセラミック容器、４は熔融塩、５は平板マイク
ロレンズ、６はパターンマスクの開口部以外からのドー
パントの拡散部である。第２図は従来のイオン熱拡散法
を用いた平板マイクロレンズの製造方法によって得られ
た平板マイクロレンズアレイの種々の欠点の例である。
（ａ）は光軸の傾き、（ｂ１）は個々のレンズ特性のバ
ラツキ、（ｃ）はレンズ間の位置関係の精度がわるいこ
と、（ｄ）は基板の屈折率の不均一性をあらわしてあ
る。第３図は本発明の平板マイクロレンズの製造方法を
模式的に表わしたもので、従来法と比べると７のパター
ンマスク以外のマスクが新たに形成されている。第４図
（ａ），（ｂ），第５図は本発明の実施例において得ら
れた平板マイクロレンズおよび平板マイクロレンズアレ
イの特性を示す図である。第４図は集光特性を表す図
で、第５図は光ファイバーとの結合特性を表す図であ
る。８は平板マイクロレンズ基板、９は平板マイクロレ
ンズ、１０は集光スポット、１１は焦点距離（Ａ）、１
２は焦点距離（Ｂ）である。 第５図において１３は平板マイクロレンズアレイ基板、
１４は平板マイクロレンズ、１５は光ファイバーであ
る。FIG. 1 shows a conventional method for manufacturing a flat plate microlens using an ion thermal diffusion method, 1 is a glass substrate, 2 is a pattern mask, 3 is a ceramic container, 4 is molten salt, 5 is a flat plate microlens, and 6 is a pattern. It is a diffusion portion of the dopant from other than the opening portion of the mask. FIG. 2 is an example of various defects of a flat plate microlens array obtained by a conventional method for manufacturing a flat plate microlens using an ion thermal diffusion method.
(A) shows the inclination of the optical axis, (b1) shows the dispersion of the individual lens characteristics, (c) shows that the positional relationship between the lenses is inaccurate, and (d) shows the non-uniformity of the refractive index of the substrate. is there. FIG. 3 schematically shows a method of manufacturing a flat plate microlens of the present invention, in which a mask other than the pattern mask 7 is newly formed as compared with the conventional method. 4 (a), (b), and FIG. 5 are graphs showing the characteristics of the flat plate microlens and the flat plate microlens array obtained in the examples of the present invention. FIG. 4 is a diagram showing a light condensing characteristic, and FIG. 5 is a diagram showing a coupling characteristic with an optical fiber. 8 is a flat plate microlens substrate, 9 is a flat plate microlens, 10 is a focused spot, 11 is a focal length (A), 1
2 is a focal length (B). In FIG. 5, 13 is a flat microlens array substrate,
Reference numeral 14 is a flat plate microlens, and 15 is an optical fiber.
Claims (1)
造方法において、イオン熱拡散を行うべき面には選択的
にイオン熱拡散を行うための開口部を有するパターンマ
スクが形成され、イオン熱拡散を行わない面には不要な
イオン熱拡散を防止するための開口部を有しない全面マ
スクが形成されたガラス基板を用いてイオン熱拡散を行
うことを特徴とする微小光学素子の製造方法。1. A method of manufacturing a micro optical element using an ion thermal diffusion method, wherein a pattern mask having an opening for selectively performing the ion thermal diffusion is formed on a surface to be subjected to the ion thermal diffusion, Ion heat diffusion is performed using a glass substrate on which a full-face mask having no opening for preventing unnecessary ion heat diffusion is formed on the surface on which heat diffusion is not performed. .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59072100A JPH0623080B2 (en) | 1984-04-11 | 1984-04-11 | Manufacturing method of micro optical element |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP59072100A JPH0623080B2 (en) | 1984-04-11 | 1984-04-11 | Manufacturing method of micro optical element |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60215552A JPS60215552A (en) | 1985-10-28 |
| JPH0623080B2 true JPH0623080B2 (en) | 1994-03-30 |
Family
ID=13479648
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP59072100A Expired - Lifetime JPH0623080B2 (en) | 1984-04-11 | 1984-04-11 | Manufacturing method of micro optical element |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0623080B2 (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58167451A (en) * | 1982-03-25 | 1983-10-03 | Seiko Epson Corp | Preparation of optical element |
-
1984
- 1984-04-11 JP JP59072100A patent/JPH0623080B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60215552A (en) | 1985-10-28 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |