JPH0624091B2 - Oxide cathode structure - Google Patents
Oxide cathode structureInfo
- Publication number
- JPH0624091B2 JPH0624091B2 JP12533084A JP12533084A JPH0624091B2 JP H0624091 B2 JPH0624091 B2 JP H0624091B2 JP 12533084 A JP12533084 A JP 12533084A JP 12533084 A JP12533084 A JP 12533084A JP H0624091 B2 JPH0624091 B2 JP H0624091B2
- Authority
- JP
- Japan
- Prior art keywords
- weight
- base metal
- cathode
- oxide cathode
- cathode assembly
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/13—Solid thermionic cathodes
- H01J1/14—Solid thermionic cathodes characterised by the material
Landscapes
- Solid Thermionic Cathode (AREA)
Description
【発明の詳細な説明】 [発明の技術分野] 本発明は酸化物陰極構体に係り、特に安定した特性が要
求されるカラーブラウン管やデイスプレイ管等に使用し
て好適な超速動かつ長寿命の酸化物陰極構体に関するも
のである。Description: TECHNICAL FIELD OF THE INVENTION The present invention relates to an oxide cathode assembly, and is suitable for use in a color cathode ray tube, a display tube or the like, which requires particularly stable characteristics, and is suitable for ultrafast and long-life oxidation. The present invention relates to a cathode structure.
[発明の技術的背景とその問題点] カラーブラウン管やデイスプレイ管は、そのスイツチを
入れた時、出来るだけ速やかに出画し、安定した画面が
得られることが望ましい。[Technical Background of the Invention and Problems Thereof] It is desirable that a color cathode ray tube or a display tube should output a picture as quickly as possible when the switch is put in and obtain a stable screen.
最近、この要請を満たす為に速動型陰極が広く使用され
ている。この速動型陰極構体の一例を第1図に示す。陰
極スリーブ(12)にニツケル・クロム合金,例えばクロム
を20重量%含むニツケル・クロム合金を用い、微量の還
元剤,例えばマグネシウムを0.06重量%,ケイ素を0.03
重量%含有する主としてニツケルよりなる基体金属(11)
上には、バリウム,ストロンチウム,カルシウムの三元
系炭酸塩からなる電子放射物質(13)が塗布される。この
三元系炭酸塩は、後に真空中で加熱分解して三元系酸化
物に転化される。陰極スリーブ(12)は陰極の製造工程中
に適当な酸素分圧を持つ湿水素中で加熱し、クロムを選
択的に酸化することにより表面を黒化し、熱放射率を例
えばニツケルの0.2に対して0.8に増大させ、定常
動作温度の高温時における熱放射を増大し、かつ、この
増大した熱損失に見合うだけの例えば陰極容積当りで、
これまでの非速動型陰極の約4倍という大きな電力をヒ
ータ(14)に投入することにより、急速な温度上昇を可能
とするものである。投入電力を増加する以外に速動性を
得る方法としては、陰極スリーブ(12)あるいは基体金属
(11)の容積を小さくし、熱容量を小さくする方法があ
る。Recently, fast-moving cathodes have been widely used to meet this demand. An example of this fast-moving cathode assembly is shown in FIG. Nickel-chromium alloy, for example nickel-chromium alloy containing 20% by weight of chromium, is used for the cathode sleeve (12), and a small amount of reducing agent such as 0.06% by weight of magnesium and 0.03% of silicon.
Base metal mainly composed of nickel containing 11% by weight (11)
An electron emitting material (13) composed of a ternary carbonate of barium, strontium and calcium is applied on the top. This ternary carbonate is later decomposed by heating in vacuum and converted into a ternary oxide. The cathode sleeve (12) is heated in wet hydrogen having an appropriate oxygen partial pressure during the manufacturing process of the cathode to blacken the surface by selectively oxidizing chromium, and the thermal emissivity is, for example, 0.2 of Nickel. To 0.8 to increase the heat radiation at high temperatures at steady operating temperature and to justify this increased heat loss, for example per cathode volume,
By supplying a large amount of electric power to the heater (14), which is about four times as high as that of the conventional non-fast moving cathode, it is possible to rapidly raise the temperature. Other than increasing the input power, the method of obtaining fast motion is to use the cathode sleeve (12) or the base metal.
There is a method of reducing the heat capacity by reducing the volume of (11).
陰極の速動性を出画時間を指標として表わせば上述した
説明より明らかなように次の式で表わされる。If the fast-moving property of the cathode is expressed using the image output time as an index, it can be expressed by the following equation, as is clear from the above description.
速動性を向上させる為にヒータ投入電力を増加させる方
法は、定常動作時の熱利用効率を下げると共に定常動作
時の陰極温度が必要以上に高くなる危険性がある。一
方、陰極スリーブ(12)あるいは基体金属(11)の肉厚を薄
くして陰極の熱容量を小さくする方法は、例えば陰極ス
リーブ(12)と基体金属(11)の溶接が困難になる等の製造
上の問題を生じたり、薄肉化に伴う強度の低下や還元剤
の絶対量低下によるエミツシヨンの劣化等が心配され
る。このような種々の要素を加味すると、第1図に示し
た酸化物陰極構体では工業的及び実用的に実現可能な出
画時間は2.5 〜3秒位が限度とされてきた。なお、現在
一般に市販されている速動型陰極の出画時間は4〜5秒
である。 The method of increasing the electric power supplied to the heater in order to improve the fast-moving property has a risk of lowering the heat utilization efficiency in the steady operation and raising the cathode temperature in the steady operation more than necessary. On the other hand, a method of reducing the heat capacity of the cathode by reducing the thickness of the cathode sleeve (12) or the base metal (11) is, for example, a manufacturing process in which welding of the cathode sleeve (12) and the base metal (11) becomes difficult. There is concern that the above problems may occur, the strength may be reduced due to thinning, and the emission may be deteriorated due to a reduction in the absolute amount of the reducing agent. Taking these various factors into consideration, the image output time that can be industrially and practically realized in the oxide cathode structure shown in FIG. 1 has been limited to about 2.5 to 3 seconds. It should be noted that the image output time of the fast-moving cathode currently commercially available is 4 to 5 seconds.
これに対して、カラーブラウン管を始め、航空機搭載用
や車載用のデイスプレイ管の分野では、より以上の速動
性,即ち1秒台出画を求める声が強い。On the other hand, in the field of display tubes for on-board and on-board aircraft, such as color cathode ray tubes, there is a strong demand for higher speed, that is, one second display.
この1秒台の出画時間を満足する酸化物陰極構体として
は、第2図に示すように、フイラメントを兼ねる基体金
属(21)を直接通電加熱し、電子放射物質(23)を加熱する
直熱型の酸化物陰極構体が知られているが、この陰極構
体は、断線を起こし易いし、また発熱体として抵抗を高
める為に多量に添加するタングステン等により形成され
る中間層物質がピーリングを起し易い。また、わずかの
電圧変動でもその影響を受け易く、その為周辺回路が大
がかりになる等、信頼性やコストの面でも多くの問題点
を有しているため、傍熱型で1秒台出画を満足する酸化
物陰極構体の開発が望まれていた。As shown in FIG. 2, the oxide cathode assembly satisfying the image output time on the order of 1 second is obtained by directly heating the base metal (21), which also functions as a filament, by heating the electron emitting material (23). Although a thermal oxide cathode assembly is known, this cathode assembly is liable to cause disconnection, and an intermediate layer material formed of a large amount of tungsten or the like added as a heating element to increase resistance causes peeling. Easy to wake up. In addition, even a slight voltage fluctuation is easily affected by it, and the peripheral circuit becomes large, so there are many problems in terms of reliability and cost. It has been desired to develop an oxide cathode assembly satisfying the above requirements.
この様な状況の中で超速動化を実現する酸化物陰極構体
として第3図に示すように、従来の酸化物陰極構体の基
本構造を離れ、2本の陰極スリーブ(32)を溶接接合して
横倒しにし、その上にキヤツプ状の基本金属(31)を溶接
接合し、この基体金属(31)上に電子放射物質(33)を塗布
し、更に陰極スリーブ内にヒータ(34)を配置した構造を
有する超速動型酸化物陰極構体が提案されている。この
陰極構体においては、第1に基体金属(31)がヒータ(34)
により加熱した時、最初に温度が上昇する中央部に載置
されている。第2にヒータ(34)と陰極スリーブ(32)の対
向面積が増え、熱の授受が高められる。第3に陰極スリ
ーブ(32)および基体金属(31)の薄肉化がし易い構造であ
る等の特徴があり、ヒータ投入電力を増加しなくも陰極
構体により決まる定数および陰極の熱容量を低下させる
ことにより、1秒台出画が可能となつた。In such a situation, as shown in FIG. 3 as an oxide cathode assembly that realizes super-high speed operation, the basic structure of the conventional oxide cathode assembly is separated and two cathode sleeves (32) are welded and joined. Then, the cap-shaped basic metal (31) is welded and joined thereto, the electron-emitting substance (33) is applied on the base metal (31), and the heater (34) is arranged in the cathode sleeve. A superfast oxide cathode structure having a structure has been proposed. In this cathode assembly, firstly the base metal (31) is the heater (34).
It is placed in the center where the temperature rises first when heated by. Secondly, the area where the heater 34 and the cathode sleeve 32 face each other is increased, so that heat transfer is enhanced. Thirdly, the cathode sleeve (32) and the base metal (31) can be easily thinned, and the constants determined by the cathode structure and the heat capacity of the cathode can be reduced without increasing the heater input power. With this, it is possible to display images for one second.
しかしながら、第1図に示した従来の酸化物陰極に比較
し、薄肉化により生じる熱変形が起こりにくい構造とな
つているものの、全く変形が生じないわけではない。例
えば、第1図の説明に用いた組成で40μmの板厚で直径
1mm,高さ0.15mmのキヤツプ状基体金属(31)を作り、更
に陰極スリーブ(32)を第1図の説明に用いた組成で、厚
さ15μm,直径1mmφ,長さ2.5mmの大きさに作り、酸
化物陰極構体に組立て、ヒータ(34)の定格電圧の25%増
で断続点火したところ、使用中に基体金属(31)および陰
極スリーブ(32)が変形する現象が認められた。陰極スリ
ーブ(32)においては、ニツケル・クロム合金の代わりに
特開昭53−119662号に示される所のタングステンを添
加,固溶強化したニツケル・クロム・タングステン合金
例えば20重量%のクロムと4重量%のタングステンを含
むニツケル・クロム・タングステン合金を用いることに
より、変形を防止でき、しかも10μmまで薄肉化して
も、何ら問題を起こさなかつた。However, compared with the conventional oxide cathode shown in FIG. 1, although the structure is such that thermal deformation caused by thinning does not easily occur, it does not mean that deformation does not occur at all. For example, a cup-shaped base metal (31) having a plate thickness of 40 μm and a diameter of 1 mm and a height of 0.15 mm having the composition used in the description of FIG. 1 was prepared, and a cathode sleeve (32) was used in the description of FIG. The composition was made to have a thickness of 15 μm, a diameter of 1 mmφ and a length of 2.5 mm, assembled into an oxide cathode assembly, and intermittently ignited at a 25% increase in the rated voltage of the heater (34). A phenomenon that the cathode sleeve (32) and the cathode sleeve (32) are deformed was observed. In the cathode sleeve (32), a nickel-chromium-tungsten alloy, in which tungsten as shown in JP-A-53-119662 is added in place of the nickel-chromium alloy, and solid solution strengthened, for example, 20% by weight of chromium and 4% by weight By using a nickel-chromium-tungsten alloy containing 20% of tungsten, deformation can be prevented, and even if the thickness is reduced to 10 μm, no problem occurs.
そこで基体金属(31)においても、エミツシヨンの低下を
伴なわず、しかも薄肉化しても強度的に優れた基体金属
の開発が要望されている。Therefore, also for the base metal (31), there is a demand for the development of a base metal that is not accompanied by a reduction in emission and is excellent in strength even when it is made thin.
[発明の目的] 本発明は、上述した要望に鑑みてなされたものであり、
強度的に優れ、更にエミツシヨン的にも長寿命である超
速動型の酸化物陰極構体を提供することを目的としてい
る。[Object of the Invention] The present invention has been made in view of the above-mentioned needs,
It is an object of the present invention to provide a super fast-moving type oxide cathode structure which is excellent in strength and has a long life in terms of emission.
[発明の概要] 即ち、本発明は、電子放射物質が頂面に塗布形成された
微量の還元剤を含有する主としてニツケルよりなる基体
金属を少くとも具備する酸化物陰極構体において、基体
金属にイツトリウムを0.05重量%乃至2.0重量%単独に
含有するか、或いはイツトニウムを0.05重量%乃至2.0
重量%と他の所定重量%の元素を含有することを特徴と
しており、他の所定重量%の元素が0.05重量%乃至2.0
重量%のランタンであること、他の所定重量%の元素が
0.01重量%乃至2.0重量%のハフニウム,ジルコニウム
の少くとも1つであること、他の所定重量%の元素が0.
05重量%乃至2.0重量%のランタンと、0.01重量%乃至
2.0重量%のハフニウム,ジルコニウムの少くとも1つ
であること、他の所定重量%の元素が0.01重量%乃至1.
0重量%のケイ素であること、他の所定重量%の元素が
0.05重量%乃至2.0重量%のランタンと、0.01重量%乃
至1.0重量%のケイ素であること、他の所定重量%の元
素が0.05重量%乃至2.0重量%のランタンと0.01重量%
乃至2.0重量%のハフニウム,ジルコニウムの少くとも
1つと、0.01重量%乃至1.0重量%のケイ素であるこ
と、基体金属の厚さが100μmより薄いことを実施態様
としている。SUMMARY OF THE INVENTION That is, according to the present invention, in an oxide cathode assembly having at least a base metal mainly made of nickel containing a trace amount of a reducing agent coated on the top surface of an electron-emitting substance, yttrium is used as the base metal. 0.05 wt% to 2.0 wt% alone, or 0.05 wt% to 2.0 wt%
It is characterized by containing wt% and other predetermined weight% elements, and other predetermined weight% elements are 0.05 wt% to 2.0 wt%.
% Lanthanum, and other specified weight% elements
At least one of 0.01% by weight to 2.0% by weight of hafnium and zirconium, and other predetermined weight% of 0.
Lanthanum from 05 wt% to 2.0 wt% and 0.01 wt% to
At least one of 2.0 wt% hafnium and zirconium, and 0.01 wt% to 1.
0% by weight silicon, other predetermined% by weight elements
0.05 wt% to 2.0 wt% lanthanum, 0.01 wt% to 1.0 wt% silicon, other predetermined wt% elements are 0.05 wt% to 2.0 wt% lanthanum and 0.01 wt%
It is an embodiment that at least one of hafnium and zirconium of 2.0 to 2.0 wt% and silicon of 0.01 to 1.0 wt% are used, and the thickness of the base metal is thinner than 100 μm.
[発明の実施例] 次に本発明の実施例を説明する前に、本発明に至つた過
程について詳細に説明する。[Examples of the Invention] Before describing the examples of the present invention, the process leading to the present invention will be described in detail.
真空溶解→圧延法により、同一の工程で各種還元剤を含
む板厚40μmのニツケル(Ni)リボンを作製し、このニツ
ケルリボンより5mm幅×100mm長の高温引張り試験用の
試験片を切り出し、陰極製造工程及びブラウン管製造工
程で基体金属にかかる最高温度である、およそ1000℃を
想定し、この温度で5分間真空焼鈍後、陰極の動作温度
800℃を含め、室温から1000℃の範囲で高温引張り試験
を行つた。その結果、陰極の動作温度である 800℃にお
ける引張り強度および伸びは下表に示すようになつた。A nickel (Ni) ribbon with a thickness of 40 μm containing various reducing agents is made in the same process by the vacuum melting → rolling method, and a 5 mm wide × 100 mm long test piece for high temperature tensile test is cut out from this nickel ribbon and used as a cathode. Assuming the maximum temperature of the base metal in the manufacturing process and cathode-ray tube manufacturing process, which is approximately 1000 ° C, after vacuum annealing at this temperature for 5 minutes, the operating temperature of the cathode
A high temperature tensile test was performed in the range of room temperature to 1000 ° C including 800 ° C. As a result, the tensile strength and elongation at 800 ° C, the operating temperature of the cathode, were as shown in the table below.
試料番号2,4,6,8,9は還元剤の添加量を原子%
に変換すれば、ほぼ0.20原子%〜0.25原子%となるよう
に調整してあり、ほぼ同量の還元剤を含有しており、添
加還元剤の種類の差による変化を示していることにな
る。試料番号1,2,4,6,8,9の比較より、(i)
マグネシウム(Mg)は引張強度および伸びの改善には、ほ
とんど寄与しない。(ii)ランタン(La)は試験温度の全
ての領域で伸びの改善に大きく寄与する。(iii)イツ
トリウム(Y)は試験温度の全ての領域で引張り強度を大
きく改善し、例えば800℃では試料2の半分の板厚とし
ても試料2と同じ強度を有する。(iv)ハフニウム(H
f),ジルコニウム(Zr)は室温近傍では強度の改善効果が
大きいものの、試験温度が上昇すると、その効果は小さ
くなり1000℃以上では全くなくなる。また試料6,7あ
るいは10,11の比較より、(V)ケイ素(Si)もMgと同じ
ように高温強度および高温伸びの改善にほとんど寄与し
ないことが判明した。 Sample Nos. 2, 4, 6, 8 and 9 represent the amount of reducing agent added in atomic%
If adjusted to 0.20% to 0.25% by atom, it contains approximately the same amount of reducing agent, indicating a change due to the difference in the type of added reducing agent. . From the comparison of sample numbers 1, 2, 4, 6, 8 and 9, (i)
Magnesium (Mg) contributes little to improving tensile strength and elongation. (Ii) Lanthanum (La) greatly contributes to the improvement of elongation in all the test temperature regions. (Iii) Yttrium (Y) greatly improves the tensile strength in all regions of the test temperature, and has the same strength as Sample 2 even at a plate thickness half that of Sample 2 at 800 ° C. (Iv) Hafnium (H
f) and zirconium (Zr) have a great effect of improving the strength in the vicinity of room temperature, but when the test temperature rises, the effect becomes small and disappears at 1000 ° C or higher. Further, comparison of Samples 6, 7 or 10, 11 revealed that (V) silicon (Si), like Mg, hardly contributes to improvement in high temperature strength and high temperature elongation.
更に発明者らは、基体金属に微量添加する還元剤の特性
および得られた基体金属の各種物性などについて詳細に
調べた結果、第1にMg,タングステン(W)など、Ni中に
ある程度固溶限を有する還元剤を添加した基体金属では
固溶強度にあずかるだけであるが、固溶限の小さいMg,S
iではその効果は小さい。またほぼ純Niと同じように加
熱により結晶粒は成長し高温での機械的性質の改善はも
ちろん期待できない。第2にZr,Hfのように遊離Baの生
成反応において、基体金属の結晶粒界を供給および反応
のサイト(場所)とするとされている還元剤を含有する
基体金属においては、ある温度以上の加熱処理で急激に
結晶粒の成長を起すこと、これはZr,Hfが結晶粒界に偏
析することにより粒界移動を抑制するが、ある温度以上
では急激にNi中への固溶度を増すため、粒界移動の抑制
効果がなくなるためであり、機械的性質にも反映してい
ること、第3にYあるいはLaを添加した基体金属では高
温で加熱処理しても、あまり結晶粒の成長を起こさない
こと、そしてこれはYあるいはLaが高温でもNi中にほと
んど固溶限を持たず、Niとの安定な金属間化合物として
基体金属中に分散析出しているためであること、La添加
材では微細な結晶粒のため粒界結合が大きく、破断クラ
ツクが伝幡しにくく、このため伸びがよいこと、Y添加
材では微細な金属間化合物が転移の移動の障壁となつて
強度を増大させていることが判つた。Furthermore, as a result of detailed investigations on the characteristics of the reducing agent added to the base metal in a trace amount and the various physical properties of the obtained base metal, the inventors have found that Mg, tungsten (W), etc. The base metal added with a reducing agent having a limit has only solid solution strength, but Mg, S with a small solid solution limit
With i, the effect is small. Also, as with almost pure Ni, crystal grains grow by heating, and improvement of mechanical properties at high temperature cannot be expected, of course. Secondly, in the case of a free Ba formation reaction such as Zr and Hf, a base metal containing a reducing agent, which is said to be a site (place) for supplying and reacting with a crystal grain boundary of the base metal, has a temperature higher than a certain temperature. Heat treatment causes crystal grain growth to abruptly, which suppresses grain boundary migration due to segregation of Zr and Hf at grain boundaries, but rapidly increases solid solubility in Ni above a certain temperature. Therefore, the effect of suppressing the grain boundary migration is lost, which is reflected in the mechanical properties. Thirdly, the base metal containing Y or La does not grow so much even if it is heat-treated at a high temperature. Does not occur, and this is because Y or La has almost no solid solution limit in Ni even at high temperature and is dispersed and precipitated in the base metal as a stable intermetallic compound with Ni. In the material, since it is a fine crystal grain, the grain boundary bond is large and it breaks. Rack-and-pinion hardly DenHata, Therefore good elongation, HanTsuta be a Y additives that increase the barrier and strength Te summer mobile fine intermetallic compounds of transition.
以下図面により上述した基体金属の結晶粒径について説
明する。先ず、第4図は基体金属を乾水素雰囲気中で各
10分間加熱した時の処理温度と、リニア・インターセプ
ト法(linear intercept法)によつて求めた基体金属の
平均の結晶粒径との関係を示した図である。即ち、曲線
(21)は従来の基体金属として広く用いられている0.03重
量%のSiと0.06重量%のMgを含むNi合金を加熱処理した
結果を示し、曲線(22)は0.35重量%のZrを含む本発明の
実験用のNi合金を加熱した結果を示し、曲線(23)は0.54
重量%のLaを含む本発明の実験用のNi合金を加熱処理し
た結果を示す。なおこれら3種の合金は還元剤の添加量
を原子%に変換すれば、0.20〜0.23原子%となり、ほぼ
同量の還元剤を含有しており、添加還元剤の種類の差に
よる変化を示していることになる。また基体金属は、い
ずれも真空溶解圧延法により作製し、同一の焼鈍,圧延
工程を経て150μmの板厚まで圧延した材料を使用し
た。The crystal grain size of the above-mentioned base metal will be described below with reference to the drawings. First, FIG. 4 shows the base metal in each dry hydrogen atmosphere.
It is the figure which showed the relationship between the processing temperature at the time of heating for 10 minutes, and the average crystal grain size of the base metal calculated | required by the linear intercept method (linear intercept method). That is, the curve
(21) shows the result of heat treatment of a Ni alloy containing 0.03 wt% Si and 0.06 wt% Mg, which is widely used as a conventional base metal, and the curve (22) shows a curve containing 0.35 wt% Zr. Shows the results of heating the experimental Ni alloy of the invention, curve (23) is 0.54
The result of having heat-processed the experimental Ni alloy of this invention containing La by weight% is shown. Note that these three alloys contain 0.20 to 0.23 atom% when the amount of reducing agent added is converted to atomic%, and they contain almost the same amount of reducing agent, and show changes due to the difference in the type of additive reducing agent. Will be. As the base metal, a material which was produced by a vacuum melting rolling method and which was rolled to a plate thickness of 150 μm through the same annealing and rolling process was used.
この第4図を見て明らかなことは、第1にMg,Siを含む
基体金属は比較的低温で結晶粒の成長を起こすこと、第
2にZr単独ではMg,Siを含む場合に結晶粒が粗大化して
いる1000℃位迄は結晶粒の成長が抑制されているもの
の、それにより高い温度では結晶粒の成長が起こるこ
と、第3にLaを添加した時はZr添加で結晶粒の成長が起
こる温度でも結晶粒の成長が著しく抑制されていること
を示す。なおHfを用いた場合はZrと、またYを用いた場
合はLaとほぼ同様の結果が得られた。It is clear from FIG. 4 that first, the base metal containing Mg and Si causes the growth of crystal grains at a relatively low temperature, and second, Zr alone contains the crystal grains when it contains Mg and Si. Although the growth of crystal grains is suppressed up to about 1000 ° C, where it grows, the growth of crystal grains occurs at high temperatures. Third, when La is added, the growth of crystal grains is caused by Zr addition. It is shown that the growth of crystal grains is remarkably suppressed even at the temperature at which is generated. It should be noted that almost the same results as Zr were obtained when Hf was used and La was obtained when Y was used.
次の第5図に示す曲線(24)は乾水素雰囲気中で各10分加
熱処理をした時のLaの添加量と基体金属の平均結晶粒径
との関係を示す。測定点(31)(32)及び(33)はLaの添加量
を0.15重量%,0.26重量%および0.54重量%と変えた基
体金属を1200℃の温度で処理した場合の結果を示す。こ
の第5図の結果よりLaの添加量を変えることにより所望
の結晶粒径に制御できることがわかる。The curve (24) shown in FIG. 5 shows the relationship between the amount of La added and the average crystal grain size of the base metal after heat treatment for 10 minutes in a dry hydrogen atmosphere. The measurement points (31), (32) and (33) show the results when the base metal with the added amounts of La changed to 0.15 wt%, 0.26 wt% and 0.54 wt% was treated at a temperature of 1200 ° C. From the results shown in FIG. 5, it can be seen that the desired crystal grain size can be controlled by changing the amount of La added.
このようにYあるいはLaの様に高温でもNiへの固溶限が
なく、高温でも安定な金属間化合物として析出、分散す
る元素を添加することにより、高温の処理を受けてもほ
とんど結晶粒成長を起こさない基体金属を得ることがで
き、Zr,Hfのように遊離Baの生成反応において、主とし
て結晶粒界を供給および反応のサイトとする還元剤を含
む基体金属の安定した使用を可能とし、Zr,Hfの特性を
最大限に利用できる効果がある。As described above, when Y or La does not have a solid solution limit in Ni even at high temperatures and is precipitated and dispersed as an intermetallic compound that is stable even at high temperatures, almost no crystal grain growth occurs even when subjected to high temperature treatment. It is possible to obtain a base metal that does not cause the phenomenon, and enables stable use of a base metal containing a reducing agent that mainly supplies a grain boundary and serves as a reaction site in the reaction of forming free Ba such as Zr and Hf. There is an effect that the characteristics of Zr and Hf can be utilized to the maximum.
さて陰極と使用時、基体金属が変形するのは、第1に断
続点火の繰返しによる熱疲労,第2に点火中の自重によ
るクリープ変形によるものと考えられる。この熱疲労及
びクリープに対する抵抗を増大させるには、 (a)高温で
も引張強度が低下しない材料の選択, (b)疲労クラツク
の伝幡しにくい金属組織とする, (c)高温で安定な析出
物を分散させる等が考えられるが、上述した一連の実験
結果より、Y更にはLaを同時添加することにより、これ
ら要件を満足すること、またHfあるいはZrを添加するこ
とによりエミツシヨンも、より向上させ得ることが判明
し、本発明を完成させた。It is considered that the base metal is deformed during use with the cathode, firstly due to thermal fatigue due to repeated intermittent ignition and secondly due to creep deformation due to its own weight during ignition. To increase the resistance to thermal fatigue and creep, (a) select a material whose tensile strength does not decrease even at high temperatures, (b) use a metal structure that does not easily propagate fatigue cracks, and (c) stably precipitate at high temperatures. Although it is possible to disperse the substance, from the above series of experimental results, it is possible to satisfy these requirements by adding Y and La at the same time, and to improve the emission by adding Hf or Zr. Therefore, the present invention has been completed.
さらにYおよびLaの酸化物は電子放射物質のアルカリ土
類金属酸化物との間のなじみが悪いと云われており、陰
極の使用中、電子放射物質を活性化させた結果生じるY
およびLaの酸化物が電子放射物質と基体金属の界面に形
成されるが、この界面で電子放射物質がはく離する現
象、いわゆるピーリングが心配された。そこでYとLaの
添加量を変えた数種の基体金属を用意し、第1図に示し
たような酸化物陰極構体に組込み、三極管方式により定
格ヒータ電圧の30%増しで50時間ごとに三極管に衝撃を
与えるタツピング試験を行ないながら300時間の断続点
試験を行なつた。この結果、YあるいはLaの総添加量が
およそ1.7重量%を超える基体金属では、250時間以降の
タツピング試験で電子放射物質が基体金属との界面から
はがれ落ちるものが認められた。さらに300時間の断続
点火試験を終えた試験三極管より不活性雰囲気中で陰極
を取り出し、電子放射物質を一定の曲率半径をもつ針の
先でひつかく,ひつかき試験を実施したところ、Yおよ
びLaの総添加量が、およそ1.25重量%を越える基体金属
はひつかきにより電子放射物質がはがれるものが認めら
れた。Further, it is said that the oxides of Y and La have poor compatibility with the alkaline earth metal oxides of the electron emitting material, and Y produced as a result of activating the electron emitting material during use of the cathode.
Oxides of La and La are formed at the interface between the electron-emitting substance and the base metal, and there was concern about the phenomenon of peeling of the electron-emitting substance at this interface, so-called peeling. Therefore, several kinds of base metals with different addition amounts of Y and La were prepared and incorporated into the oxide cathode structure as shown in Fig. 1, and the triode method was used to increase the rated heater voltage by 30% and the triode every 50 hours. We performed a 300-hour intermittent test while performing a tapping test that gives an impact to. As a result, in the base metal in which the total amount of Y or La added exceeds about 1.7% by weight, it was found that the electron emitting substance peeled off from the interface with the base metal in the tapping test after 250 hours. Furthermore, the cathode was taken out from the test triode after the intermittent ignition test was completed for 300 hours in an inert atmosphere, and the electron emitting material was scratched with a tip of a needle having a constant radius of curvature, and a scratching test was performed. It was found that the base metal in which the total addition amount of the above was more than about 1.25% by weight peeled off the electron emitting material due to scratching.
これに対し、YあるいはLaに加えSiを点火したものでは
タツピング試験およびひつかき試験において電子放射物
質のはがれは全く認められなかつた。このSiを添加した
基体金属と、無添加の基体金属の断面をEPMAにより調べ
たところ、Siを添加した基体金属では電子放射物質の構
成成分であるBaが基体金属表面近傍の結晶粒界に沿つ
て、基体金属内部にむかつて多数侵入し、あたかも根を
おろしたような構造となつていることが判つた。これ
は、Baと複合酸化物を作り易いSiが、Baを基体金属内へ
呼び込む役目をし、あたかも電子放射物質が基体金属中
に多数根をおろしたような構造を作ることがピーリング
に対して有効であることが判つた。On the other hand, no peeling of the electron emitting material was observed in the tapping test and the scratching test in the case where Si was ignited in addition to Y or La. When cross sections of the Si-added base metal and the non-added base metal were examined by EPMA, in the Si-added base metal, Ba, which is a constituent component of the electron-emitting substance, was observed along the grain boundaries near the base metal surface. Then, it was found that a large number of pieces penetrated into the base metal once, and the structure was as if the root had been rooted. This is because Si, which is easy to form a complex oxide with Ba, plays a role in attracting Ba into the base metal, and it is possible to form a structure in which the electron-emitting substance has many roots in the base metal. It turned out to be effective.
次に実施例を用いて、さらに詳細に述べる。Next, it will be described in more detail with reference to examples.
(実施例1) Yを0.4 重量%,Siを0.03重量%を含むNi基の基体金
属,およびYを0.75重量%,ケイ素を0.03重量%含むNi
基の基体金属を真空溶解法により作製し、その後圧延,
焼鈍などの工程を経て、厚さ40μmのリボンを上円部
1.0mmφ,下円部1.4mmφのキヤツプ状に基体金属を
絞り、厚さ15μmt、直径0.8mmφ,長さ3.0mmの2本の
陰極スリーブよりなる双胴型構体上にレーザ溶接し、表
面に電子放射物質を塗布し、第3図に示されるような超
速動型酸化物陰極構体とした。この構体をデイスプレイ
用の電子銃に組み込み、排気,炭酸塩の分解,封止,ゲ
ツタフラツシユ,活性化等の通常工程を経て断続点火に
よる強制寿命試験を行なつた。また比較品として、Mgを
0.06重量%,Siを0.03重量%を含むNi基の基体金属を真
空溶解し、上述した工程と同様な工程を経て、デイスプ
レイ管を作製し同様に断続点火による強制寿命試験を行
なつた。出画時間はいずれも、およそ1.7 秒であつた。(Example 1) Ni-based base metal containing 0.4% by weight of Y and 0.03% by weight of Si, and Ni containing 0.75% by weight of Y and 0.03% by weight of silicon.
The base metal of the base is made by the vacuum melting method, and then rolled,
After annealing and other steps, a ribbon with a thickness of 40 μm was drawn into a cap shape with an upper circle of 1.0 mmφ and a lower circle of 1.4 mmφ, and the base metal was squeezed to a thickness of 15 μmt, a diameter of 0.8 mmφ, and a length of 3.0 mm. Laser welding was performed on a twin-barrel type structure composed of a cathode sleeve, and an electron emitting substance was applied on the surface to obtain a super fast motion type oxide cathode structure as shown in FIG. This structure was incorporated into an electron gun for a display, and a forced life test by intermittent ignition was performed through the usual processes such as exhaust, carbonate decomposition, sealing, getter flashing, activation, and so on. As a comparative product, Mg
A Ni-based base metal containing 0.06% by weight and 0.03% by weight of Si was vacuum-melted, a display tube was produced through the same steps as those described above, and a forced life test by intermittent ignition was similarly performed. The output time was about 1.7 seconds in all cases.
寿命試験におけるカツトオフ電圧の変化量を第6図に示
す。このカツトオフ電圧の変化は陰極と第1グリツド間
の寸法変化に比例することから、カツトオフ電圧を測定
することにより、基体金属の変形を知ることができる。
第6図において、曲線(45),(46)は本発明に係る基体金
属で、それぞれYを0.4 ,0.74重量%を含む基体金属を
使用した場合、四線(47)は従来の基体金属を使用した場
合のカツトオフ電圧の変動曲線である。この結果は従来
品では、基体金属が著しく変形するのに対し、本発明の
基体金属では基体金属の変形を防止できたことを示す。
しかもYを多く含む方がその効果が著しいことが判る。The amount of change in the cutoff voltage in the life test is shown in FIG. Since the change in the cutoff voltage is proportional to the dimensional change between the cathode and the first grid, it is possible to know the deformation of the base metal by measuring the cutoff voltage.
In FIG. 6, curves (45) and (46) are the base metals according to the present invention, and when the base metals containing Y of 0.4 and 0.74% by weight are used, the four lines (47) show the conventional base metals. It is a variation curve of a cut-off voltage when used. This result shows that the base metal of the conventional product is remarkably deformed, whereas the base metal of the present invention can prevent the deformation of the base metal.
Moreover, it can be seen that the effect is remarkable when the content of Y is large.
次に第7図に陰極電流の経時変化を示す。第7図におい
て曲線(55),(56)は本発明に係る基体金属で、それぞれ
Yを0.4 ,0.75重量%を含む基体金属、曲線(57)は従来
の基体金属を使用した場合の陰極電流曲線である。この
結果は本発明の基体金属が従来品に比べエミツシヨン的
にも優れていることを示すものである。なお寿命試験
中、いずれにおいてもピーリングは認められはかつた。Next, FIG. 7 shows the change over time of the cathode current. In FIG. 7, curves (55) and (56) are the base metals according to the present invention, the base metals containing 0.4 and 0.75 wt% of Y, respectively, and the curve (57) is the cathode current when the conventional base metals are used. It is a curve. This result shows that the base metal of the present invention is superior in emission to the conventional product. Peeling was not observed in any of the life tests.
(実施例2) Yを1.25重量%含むNi合金,およびYを1.25重量%,Si
を0.05重量%含むNi合金,および比較品として、Mgを0.
06重量%,Siを0.03重量%含むNi合金の丸棒を第8図に
示すようなジルコニア製容器(62)に入れ、外部からこれ
を高周波誘導加熱により溶解し、溶湯をジルコニア製容
器(62)の底に設けられたノズル(64)より銅で作られた冷
却ロール(66)表面へ供給することにより、その接線方向
に厚さ40μmの薄肉リボンを得た。なお合金溶解からリ
ボン作製の間、酸化を防止するために装置全体を真空チ
ヤンバーの中に保つた。(Example 2) Ni alloy containing 1.25 wt% Y, and 1.25 wt% Y, Si
Alloy containing 0.05% by weight of Mg, and as a comparative product, Mg of 0.
A Ni alloy round bar containing 06% by weight and 0.03% by weight of Si is put in a zirconia container (62) as shown in Fig. 8, and this is melted by high frequency induction heating from the outside to melt the molten metal into a zirconia container (62 (4) was supplied to the surface of a cooling roll (66) made of copper from a nozzle (64) provided at the bottom of the above) to obtain a thin ribbon having a thickness of 40 μm in the tangential direction. The entire apparatus was kept in a vacuum chamber to prevent oxidation during melting of the alloy and production of the ribbon.
こうして得られたリボンを所定の寸法に切断し、(実施
例1)と同じ方法で基体金属を作製し超速動陰極として
デイスプレイ管に組み入れた。The ribbon thus obtained was cut into a predetermined size, a base metal was prepared in the same manner as in (Example 1), and was incorporated into a display tube as a superfast moving cathode.
この場合、実施例1と同様に本発明に係る基体金属はカ
ツトオフ電圧の変化も小さく、エミツシヨン的にも優れ
ていることが確認された。なおSi無添加材では、突如エ
ミツシヨンが劣化するものがあつたが、これはピーリン
グによるものであり、Yの添加量を増した場合、Siの添
加が望ましいことが判つた。In this case, it was confirmed that the base metal according to the present invention has a small change in the cutoff voltage as in the case of Example 1 and is excellent in terms of emission. It should be noted that with some Si-free materials, the emission suddenly deteriorated, but this was due to peeling, and it was found that the addition of Si is desirable when the amount of Y added is increased.
以上(実施例1)および(実施例2)においては添加し
たYは、0.4,0.75,1.25各重量%の3種であるが、添
加するY量は0.05以上、2.0重量%以下が望ましい。こ
れは0.05重量%未満では十分な高温強度アツプの効果が
得られず、また2.0重量%を超えても効果はほぼ飽和
し、それ以上の効果は期待できないからである。In the above (Example 1) and (Example 2), the added Y is three kinds of 0.4, 0.75, and 1.25% by weight, respectively, and the amount of Y added is preferably 0.05 or more and 2.0% by weight or less. This is because if it is less than 0.05% by weight, the effect of sufficient high temperature strength up is not obtained, and if it exceeds 2.0% by weight, the effect is almost saturated and no further effect can be expected.
(実施例3) Yを0.45重量%,Laを0.55重量%含むNi基の基体金属お
よびYを0.45重量%,Laを0.55%,Siを0.05重量%含む
Ni基の基体金属を真空溶解法により作製し、その後圧
延,焼鈍などの工程を経て、厚さ40μmのリボンを作製
した。このリボンより(実施例1)と同じ方法でキヤツ
プ状基体金属を作り、カラーブラウン管用の電子銃に組
み込み、排気,炭酸塩の分解,封止,ゲツタフラツシ
ユ,活性化等の工程を経て、カラーブラウン管を作製
し、(実施例1)と同じ条件で断続点火による強制寿命
試験を行なつた。また比較品としてMgを0.06重量%,Si
を0.03重量%含むNi基の基体金属を真空溶解し、上述し
た工程と同様な工程を経てカラーブラウン管を作製し、
同様に断続点火による強制寿命試験を行なつた。その結
果、いずれの基体金属を使用したカラーブラウン管にお
いても、出画時間はおよそ1.6〜1.7秒であつたが(実施
例1)および(実施例2)と同様に本発明に係る基体金
属は、カツトオフ電圧の変化が小さく、エミツシヨン的
にも優れていること、さらにケイ素を添加した基体金属
は、エミツシヨンに対しても効果があることがわかつ
た。なお強制寿命試験中、いずれの基体金属を使用して
もピーリングは認められなかつた。(Example 3) 0.45% by weight of Y, 0.55% by weight of La and Ni-based base metal and 0.45% by weight of Y, 0.55% of La and 0.05% by weight of Si
A Ni-based base metal was produced by a vacuum melting method, and then a ribbon having a thickness of 40 μm was produced through processes such as rolling and annealing. A cap-shaped base metal is made from this ribbon in the same manner as in (Example 1), incorporated into an electron gun for a color cathode ray tube, and subjected to steps such as exhausting, decomposition of carbonate, sealing, getter flashing and activation, and then a color cathode ray tube. Was manufactured, and a forced life test by intermittent ignition was performed under the same conditions as in (Example 1). As a comparative product, 0.06 wt% Mg, Si
Is vacuum-melted into a Ni-based base metal containing 0.03% by weight, and a color cathode-ray tube is manufactured through the same steps as those described above.
Similarly, a forced life test was performed by intermittent ignition. As a result, in any of the color cathode ray tubes using any base metal, the image output time was about 1.6 to 1.7 seconds, but the base metal according to the present invention was the same as in (Example 1) and (Example 2). It was found that the change in the cut-off voltage is small and the emission is excellent, and that the base metal containing silicon is also effective for the emission. During the forced life test, peeling was not recognized by using any base metal.
(実施例4) Yを1.5重量%,Laを1.5重量%含むNi合金およびYを1.
5重量%,Laを1.5重量%,Siを0.07重量%含むNi合金,
及び比較品としてMgを0.06重量%,Siを0.03重量%含む
Niを使用して(実施例2)と同様に厚さ40μm巾10mmの
薄肉リボンを作り、このリボンより(実施例1)と同じ
ようにキヤツプ状基体金属を作製し、超速動陰極として
カラーブラウン管に組み込み(実施例1)と同じ条件で
強制寿命試験を行なつた。Example 4 A Ni alloy containing 1.5% by weight of Y and 1.5% by weight of La and 1.
Ni alloy containing 5% by weight, 1.5% by weight of La and 0.07% by weight of Si,
And 0.06% by weight of Mg and 0.03% by weight of Si as a comparative product
Using Ni, a thin ribbon having a thickness of 40 μm and a width of 10 mm was made in the same manner as in (Example 2), and a cap-shaped base metal was made from this ribbon in the same manner as in (Example 1). Was subjected to a forced life test under the same conditions as those of the assembly (Example 1).
この場合も他の実施例と同様に本実施例に係る基体金属
はカツトオフ電圧の変化がほとんどなく従つて基体金属
の変形もほとんどなく、しかもエミツシヨン的にも優れ
ていることが確認された。なお本実施例に係る基体金属
のうち、Si無添加材では長時間の使用でピーリングを起
こしたが、Si添加材では長時間の使用においても全くピ
ーリングは認められず、安定した使用が可能であつた。Also in this case, it was confirmed that the base metal according to the present embodiment hardly changes the cut-off voltage, and thus the base metal hardly deforms, and is excellent in emission as in the other embodiments. Among the base metals according to this example, the Si-free material caused peeling after long-term use, but the Si-added material showed no peeling even after long-term use, and stable use was possible. Atsuta
上述した(実施例3)及び(実施例4)はYを0.45重量
%,ランタンを0.55重量%含有したNi基の基体金属及び
Yを1.5重量%,Laを1.5重量%含有したNi基の基体金属
の2種について説明したが、添加量はLaが0.05重量%以
上2重量%以下が望ましい。これは0.05重量%未満では
十分な高温強度アツプや高温伸びアツプの効果が得られ
ず、また2重量%を超えても効果はほぼ飽和し、それ以
上の効果は期待できないからである。The above-described (Example 3) and (Example 4) are the Ni-based substrate metal containing 0.45 wt% Y and 0.55 wt% lanthanum, and the Ni-based substrate containing 1.5 wt% Y and 1.5 wt% La. Although two kinds of metals have been described, La is preferably added in an amount of 0.05% by weight or more and 2% by weight or less. This is because if it is less than 0.05% by weight, sufficient high temperature strength up and high temperature elongation up effects cannot be obtained, and if it exceeds 2% by weight, the effect is almost saturated and no further effect can be expected.
また(実施例1)及び(実施例3)は真空溶解−圧延法
により、(実施例2)、(実施例4)においては溶湯急
冷法により基体金属用のリボンを作製したが、これはY
とLaの総添加量が1重量%を超えると、著しく加工性特
に熱間加工性が低下するためである。しかしながら本発
明は基体金属の製造方法により限定されるものではな
い。Further, (Example 1) and (Example 3) were manufactured by a vacuum melting-rolling method, and in (Example 2) and (Example 4), a ribbon for a base metal was manufactured by a molten metal quenching method.
This is because if the total amount of La and La exceeds 1% by weight, the workability, especially the hot workability, is significantly reduced. However, the present invention is not limited by the method of manufacturing the base metal.
一方、Siの添加量は、0.01重量%以上、1.0重量%未満
が望ましい。これは0.01重量%未満では十分なピーリン
グ防止の効果が期待できず、また1.0重量%を超える
と、Si自身がピーリングに対し悪影響を及ぼすからであ
る。On the other hand, the addition amount of Si is preferably 0.01% by weight or more and less than 1.0% by weight. This is because if it is less than 0.01% by weight, a sufficient effect of preventing peeling cannot be expected, and if it exceeds 1.0% by weight, Si itself has an adverse effect on peeling.
(実施例5) Yを0.26重量%,Zrを0.13重量%含むNi基の基体金属を
真空溶解法により作製し、その後圧延,焼鈍などの通常
の工程を経て、厚さ100μm,直径1.3mmの円板に打ち抜
き、第1図に示す陰極スリーブの先端に溶接し、表面に
電子放射物質を塗布したのち、カラーブラウン管の電子
銃に組込み、次に排気、炭酸塩の分解,封止,ゲツタフ
ラツシユ,活性化等の通常の工程を経て強制寿命試験を
行なつた。また比較品としてZrのみを0.13重量%含むNi
基の基体金属を真空溶解し、上述の工程と同様な工程を
経てカラーブラウン管を作成し同様に強制寿命試験を行
なつた。試験時間3000時間におけるカツトオフ電圧の変
動値を測定したところ比較品の方が約3%大きく、変形
に対して本実施例の方が優れているし、またエミツシヨ
ンも大幅に優れていることが判つた。(Example 5) A Ni-based substrate metal containing 0.26% by weight of Y and 0.13% by weight of Zr was produced by a vacuum melting method, and then subjected to usual steps such as rolling and annealing, and then having a thickness of 100 µm and a diameter of 1.3 mm. It is punched into a disk, welded to the tip of the cathode sleeve shown in FIG. 1, coated with an electron-emitting substance on the surface, and then incorporated into an electron gun of a color cathode ray tube, then exhaust, decomposition of carbonate, sealing, getter flush, A forced life test was performed through a normal process such as activation. As a comparative product, Ni containing only 0.13% by weight of Zr
The base metal of the base was melted in vacuum, a color cathode ray tube was prepared through the same steps as those described above, and the forced life test was conducted in the same manner. When the variation value of the cut-off voltage in the test time of 3000 hours was measured, the comparative product was about 3% larger, and it was found that this example is superior to the deformation and the emission is also significantly superior. Ivy.
本実施例において添加したZrは0.13重量%であるが添加
する元素はHfでも同様な効果を得ることができ、Zr,Hf
の少なくとも一つを0.05重量%以上、2.0重量%以下含
有することが望ましい。これは0.05重量%未満では十分
な還元力が期待できず、また2.0重量%を超えると、そ
れ以上の電子放射能力の向上は期待できず、むしろ電子
放射物質の消耗を早めるだけであるからである。Although Zr added in this example is 0.13% by weight, a similar effect can be obtained with Hf as the element to be added.
It is desirable to contain at least one of 0.05 wt% or more and 2.0 wt% or less. This is because if it is less than 0.05% by weight, sufficient reducing power cannot be expected, and if it exceeds 2.0% by weight, further improvement of the electron emission ability cannot be expected, but rather the consumption of the electron emitting substance is accelerated. is there.
[発明の効果] 上述のように本発明に係る基体金属を具備した電子銃を
配置した電子管、特に安定した特性の要求されるデイス
プレイ管においては、基体金属の変形がなく、安定した
寿命特性を示し、しかもきわだつた超速動性を有する極
めて品位の良好な管特性を得ることができる。[Advantages of the Invention] As described above, in the electron tube in which the electron gun provided with the base metal according to the present invention is arranged, particularly in the display tube in which stable characteristics are required, the base metal is not deformed and stable life characteristics are obtained. In addition, it is possible to obtain extremely good-quality pipe characteristics having outstanding super-high-speed dynamics.
第1図乃至第3図は従来及び本発明に係る基体金属を具
備するそれぞれ異なる速動型酸化物陰極構体を示す図で
あり、第1図(a)は速動型酸化物陰極構体の正面図、第
1図(b)は第1図(a)の要部断面図、第2図(a)は直熱型
酸化物陰極構体の正面図、第2図(b)は第2図(a)の要部
断面図、第3図(a)は超速動型酸化物陰極構体の一部切
欠上面図、第3図(b)は第3図(a)の要部断面図、第4図
は処理温度と結晶粒径の関係を示すグラフ、第5図はLa
添加量と結晶粒径の関係を示す曲線図、第6図および第
7図は本発明と従来のそれぞれ異る強制寿命試験結果を
示すグラフ、第8図は溶湯急冷法の説明図である。 11,21,31……基体金属、12,32……陰極スリーブ 13,23,33……電子放射物質、14,34……ヒータ 61……溶湯、62……セラミツクス容器 63……高周波コイル、64……ノズル 67……リボン、68……冷却ロールFIGS. 1 to 3 are views showing different fast-moving oxide cathode assemblies provided with a base metal according to the related art and the present invention. FIG. 1 (a) is a front view of the fast-moving oxide cathode assembly. Fig. 1 (b) is a cross-sectional view of the main part of Fig. 1 (a), Fig. 2 (a) is a front view of a direct heating oxide cathode assembly, and Fig. 2 (b) is Fig. 2 ( FIG. 3 (a) is a partial cutaway top view of the super fast-moving oxide cathode assembly, FIG. 3 (b) is a cross-sectional view of the main part of FIG. 3 (a), and FIG. Figure is a graph showing the relationship between processing temperature and crystal grain size. Figure 5 is La
FIG. 6 is a graph showing the relationship between the amount added and the crystal grain size, FIGS. 6 and 7 are graphs showing the results of different forced life tests of the present invention and the conventional one, and FIG. 8 is an explanatory view of the melt quenching method. 11,21,31 …… Base metal, 12,32 …… Cathode sleeve 13,23,33 …… Electron emitting material, 14,34 …… Heater 61 …… Molten metal, 62 …… Ceramic container 63 …… High frequency coil, 64 …… Nozzle 67 …… Ribbon, 68 …… Cooling roll
───────────────────────────────────────────────────── フロントページの続き (72)発明者 山本 栄治 神奈川県横浜市磯子区新杉田町8 株式会 社東芝横浜金属工場内 (72)発明者 芳野 久士 神奈川県川崎市幸区小向東芝町1 株式会 社東芝総合研究所内 (72)発明者 羽賀 正勝 神奈川県川崎市幸区小向東芝町1 株式会 社東芝総合研究所内 (56)参考文献 特開 昭58−225528(JP,A) 特開 昭58−42134(JP,A) 特開 昭58−185741(JP,A) 特公 昭56−13783(JP,B2) ─────────────────────────────────────────────────── ─── Continuation of the front page (72) Eiji Yamamoto Eiji Yamamoto 8 Shinsugita-cho, Isogo-ku, Yokohama, Kanagawa Stock Company, Toshiba Yokohama Metal Works (72) Inventor Hisashi Yoshino 1 Komukai-Toshiba, Kawasaki-shi, Kanagawa Incorporated Toshiba Research Institute (72) Inventor Masakatsu Haga 1 Komukai Toshiba-cho, Kouki-ku, Kawasaki-shi, Kanagawa Incorporated Toshiba Research Institute (56) Reference JP-A-58-225528 (JP, A) JP-A 58-42134 (JP, A) JP-A-58-185741 (JP, A) JP-B-56-13783 (JP, B2)
Claims (8)
の還元剤を含有する主としてニッケルよりなる基体金属
を少くとも具備する酸化物陰極構体において、前記基体
金属にイットリウムを0.05重量%乃至 2.0重量%単独に
含有するか、或いは前記イットニウムを0.05重量%乃至
2.0重量%と他の所定重量%の元素を含有することを特
徴とする酸化物陰極構体。1. An oxide cathode assembly comprising at least a base metal consisting mainly of nickel containing a trace amount of a reducing agent coated on the top surface of an electron-emitting substance, wherein the base metal contains 0.05% by weight of yttrium. 2.0 wt% alone or 0.05 wt% or more of the ytnium
An oxide cathode assembly comprising 2.0% by weight and other predetermined weight% of elements.
2.0重量%のランタンであることを特徴とする特許請求
の範囲第1項記載の酸化物陰極構体。2. Other predetermined weight% element is 0.05 weight% to
The oxide cathode assembly according to claim 1, characterized in that it is 2.0% by weight of lanthanum.
2.0重量%のハフニウム,ジルコニウムの少くとも1つ
であることを特徴とする特許請求の範囲第1項記載の酸
化物陰極構体。3. Another predetermined weight% element is 0.01 weight% to
An oxide cathode assembly according to claim 1, characterized in that it is at least one of 2.0% by weight of hafnium and zirconium.
2.0重量%のランタンと、0.01重量%乃至 2.0重量%の
ハフニウム,ジルコニウムの少くとも1つであることを
特徴とする特許請求の範囲第1項記載の酸化物陰極構
体。4. Another predetermined weight% element is 0.05 weight% to
2. An oxide cathode assembly according to claim 1, characterized in that it is at least one of 2.0% by weight lanthanum and 0.01% to 2.0% by weight hafnium, zirconium.
1.0重量%のケイ素であることを特徴とする特許請求の
範囲第1項記載の酸化物陰極構体。5. Another predetermined weight% element is 0.01 weight% to
The oxide cathode assembly according to claim 1, characterized in that it is 1.0% by weight of silicon.
2.0重量%のランタンと、0.01重量%乃至 1.0重量%の
ケイ素であることを特徴とする特許請求の範囲第1項記
載の酸化物陰極構体。6. Other predetermined weight% element is 0.05 weight% to
The oxide cathode assembly according to claim 1, characterized in that it is 2.0% by weight lanthanum and 0.01% to 1.0% by weight silicon.
2.0重量%のランタンと、0.01重量%乃至 2.0重量%の
ハフニウム,ジルコニウムの少なくとも1つと、0.01重
量%乃至 1.0重量%のケイ素であることを特徴とする特
許請求の範囲第1項記載の酸化物陰極構体。7. Another predetermined weight% element is from 0.05 weight% to
2. Oxide according to claim 1, characterized in that it is 2.0% by weight of lanthanum, 0.01% by weight to 2.0% by weight of at least one of hafnium and zirconium, and 0.01% by weight to 1.0% by weight of silicon. Cathode structure.
特徴とする特許請求の範囲第1項乃至第7項いずれかに
記載の酸化物陰極構体。8. The oxide cathode assembly according to any one of claims 1 to 7, wherein the base metal has a thickness of less than 100 μm.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12533084A JPH0624091B2 (en) | 1984-06-20 | 1984-06-20 | Oxide cathode structure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP12533084A JPH0624091B2 (en) | 1984-06-20 | 1984-06-20 | Oxide cathode structure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS617536A JPS617536A (en) | 1986-01-14 |
| JPH0624091B2 true JPH0624091B2 (en) | 1994-03-30 |
Family
ID=14907440
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP12533084A Expired - Lifetime JPH0624091B2 (en) | 1984-06-20 | 1984-06-20 | Oxide cathode structure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0624091B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8164242B2 (en) * | 2007-07-06 | 2012-04-24 | Ngk Spark Plug Co., Ltd. | Spark plug |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0626096B2 (en) * | 1985-10-14 | 1994-04-06 | 三菱電機株式会社 | Electron tube cathode |
| JP4921540B2 (en) * | 2009-11-26 | 2012-04-25 | 日本特殊陶業株式会社 | Electrode material for spark plug |
| GB2583359A (en) * | 2019-04-25 | 2020-10-28 | Aquasium Tech Limited | Electron beam emitting assembly |
Family Cites Families (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5837704B2 (en) * | 1979-07-13 | 1983-08-18 | 日本電信電話株式会社 | Superconductor point contact Josephson device |
| JPS5842134A (en) * | 1981-09-04 | 1983-03-11 | Toshiba Corp | Oxide cathode structure |
| JPS58185741A (en) * | 1982-04-23 | 1983-10-29 | Aichi Steel Works Ltd | Alloy with corrosion resistant at high temperature |
| JPS58225528A (en) * | 1982-06-25 | 1983-12-27 | Toshiba Corp | Cathode structure |
-
1984
- 1984-06-20 JP JP12533084A patent/JPH0624091B2/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US8164242B2 (en) * | 2007-07-06 | 2012-04-24 | Ngk Spark Plug Co., Ltd. | Spark plug |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS617536A (en) | 1986-01-14 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP5457018B2 (en) | Platinum iridium alloy and method for producing the same | |
| US3615901A (en) | Method of making a plastically shapeable cathode material | |
| JPS5952503B2 (en) | Substrate metal plate for directly heated oxide cathode | |
| JPH0624091B2 (en) | Oxide cathode structure | |
| US2192491A (en) | Cathode for electron discharge devices | |
| JP2002260520A (en) | Metal cathode and heat-dissipating cathode structure having the same | |
| US4208208A (en) | Nickel alloy base metal plate for directly heated oxide cathodes | |
| US2223862A (en) | Cathode alloy | |
| US2306290A (en) | Cathode alloy | |
| US2323173A (en) | Electrode wire | |
| US2586768A (en) | Vacuum tube electrode element | |
| JP4018468B2 (en) | Cathode and manufacturing method thereof | |
| JPS5814017B2 (en) | Directly heated cathode for electron tubes | |
| US6190466B1 (en) | Non-sag tungsten wire | |
| US4146393A (en) | Base metal plate materials for directly heated oxide cathode | |
| US2396977A (en) | Electrode alloys | |
| KR820001402B1 (en) | Nickel alloy base metal plate for directly heated oxide cathodes | |
| US1542385A (en) | Thermionic cathode and method of making the same | |
| JPS6367540B2 (en) | ||
| KR820001403B1 (en) | Base metal plate materials for directly heated oxide cathodes | |
| US2140367A (en) | Thermionic cathode | |
| US4222775A (en) | Base metal plate materials for directly heated oxide cathodes | |
| JPS59138033A (en) | Oxide cathode structure | |
| US3085325A (en) | Method of brazing | |
| KR830000979B1 (en) | Base metal plate materials for directly heated oxide cathode |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| EXPY | Cancellation because of completion of term |