JPH0625269B2 - Method for manufacturing polyimide film - Google Patents
Method for manufacturing polyimide filmInfo
- Publication number
- JPH0625269B2 JPH0625269B2 JP14581688A JP14581688A JPH0625269B2 JP H0625269 B2 JPH0625269 B2 JP H0625269B2 JP 14581688 A JP14581688 A JP 14581688A JP 14581688 A JP14581688 A JP 14581688A JP H0625269 B2 JPH0625269 B2 JP H0625269B2
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- JP
- Japan
- Prior art keywords
- film
- temperature
- solvent
- less
- polyamic acid
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- Manufacture Of Macromolecular Shaped Articles (AREA)
- Moulding By Coating Moulds (AREA)
- Shaping By String And By Release Of Stress In Plastics And The Like (AREA)
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は、耐熱性に優れたポリイミドフィルムの製造方
法に関するものである。より詳しくは、芳香族テトラカ
ルボン酸二無水物と芳香族ジアミンとの重縮合生成物で
あるポリアミック酸の溶液から流延成形法によって耐熱
性と機械特性に優れたポリイミドフィルムを製造する方
法に関する。TECHNICAL FIELD The present invention relates to a method for producing a polyimide film having excellent heat resistance. More specifically, the present invention relates to a method for producing a polyimide film having excellent heat resistance and mechanical properties by a casting method from a solution of polyamic acid which is a polycondensation product of aromatic tetracarboxylic dianhydride and aromatic diamine.
[従来技術] 全芳香族ポリイミドフィルムは、非常に優れた耐熱性と
機械特性を有し、中でも1,2,4,5-ベンゼンテトラカルボ
ン酸二無水物(無水ピロメリット酸)と4−アミノフェ
ニルエーテル(ジアミノジフェニルエーテル)を非プロ
トン性極性溶媒中で重縮合して得られるポリアミック酸
を脱水環化して得られるポリ-N,N′−ビスフェノキシフ
ェニル−ピロメリットイミド(1)が良く知られている。[Prior Art] A wholly aromatic polyimide film has excellent heat resistance and mechanical properties, among which 1,2,4,5-benzenetetracarboxylic dianhydride (pyromellitic dianhydride) and 4-amino Poly-N, N'-bisphenoxyphenyl-pyromellitimide (1), which is obtained by cyclocondensation of polyamic acid obtained by polycondensing phenyl ether (diaminodiphenyl ether) in an aprotic polar solvent, is well known. ing.
ポリピロメリットイミドは、400℃以上に加熱しても溶
融せず、またこれを溶解する溶媒もない。このためポリ
ピロメリットイミドフィルムの製造は、前駆体のポリア
ミック酸の溶液を流延成形法によってフィルムに成形す
るとともに、脱水環化(イミド化)してポリイミドフィ
ルムとする方法が採られている。 Polypyromellitimide does not melt even when heated to 400 ° C. or higher, and there is no solvent that dissolves it. For this reason, a method of producing a polypyromellitimide film has adopted a method in which a solution of a precursor polyamic acid is formed into a film by a casting method, and dehydration cyclization (imidization) is performed to obtain a polyimide film.
このポリイミドフィルムは、おおよそ次の様な工程で製
造される。This polyimide film is manufactured by the following steps.
すなわちポリアミック酸溶液を金属、ガラス等の平滑な
支持体の表面に塗布し、加熱によって溶媒を除去して支
持体から剥離し自己支持性フィルムを得る。この段階で
は未だ完全にはイミド化していないため続いてこの自己
支持性フィルムを高温で熱処理、あるいは化学的に処理
してポリイミドフィルムとする。That is, the polyamic acid solution is applied to the surface of a smooth support such as metal or glass, the solvent is removed by heating, and the film is peeled from the support to obtain a self-supporting film. At this stage, the self-supporting film is not completely imidized yet, so that the self-supporting film is subsequently heat-treated at high temperature or chemically treated to form a polyimide film.
ところでポリマーの物性は、その化学構造によるととも
に物理的な状態、すなわち分子の集合状態にも負うとこ
ろが大きい。このことは結晶性ポリマーであるナイロ
ン、ポリエチレンテレフタレート、ポリプロピレンなど
で顕著に認めることができる。By the way, the physical properties of a polymer largely depend not only on its chemical structure but also on its physical state, that is, the state of aggregation of molecules. This can be remarkably observed in crystalline polymers such as nylon, polyethylene terephthalate and polypropylene.
フィルムの場合、結晶性であることは機械的性質、熱的
性質に有利に働く。ポリイミドフィルムも例外ではな
く、ポリイミドフィルムの結晶性と機械的性質や、熱的
性質との関連に付いて既に多くの研究者らによって研究
されている。無水ピロメリット酸と4−アミノフェニル
エーテルからなるポリ-N,N′−ビスフェノキシフェニル
−ピロメリットイミド(1)のフィルムについて、明瞭な
結晶構造は認められないものの規則的な分子凝集構造の
存在が示唆されている(Isoda et al.J.Polym.Sci.Poly
m.Phys.Ed.,19 1293(1981),T.P.Russel ibid 22 1105(1
983))。In the case of a film, being crystalline favors mechanical properties and thermal properties. Polyimide films are no exception, and many researchers have already studied the relationship between crystallinity, mechanical properties, and thermal properties of polyimide films. Regarding the poly-N, N'-bisphenoxyphenyl-pyromellitimide (1) film consisting of pyromellitic dianhydride and 4-aminophenyl ether, the presence of a regular molecular aggregation structure, although no clear crystal structure was observed Have been suggested (Isoda et al. J.Polym.Sci.Poly
m.Phys.Ed., 19 1293 (1981), TPRussel ibid 22 1105 (1
983)).
これらの研究によれば、規則的な分子凝集構造の生成は
熱イミド化条件に負うところが大きい。例えばポリアミ
ック酸溶液をガラス板に塗布し、これを低温で長時間減
圧下で乾燥しポリアミック酸フィルムとし、さらに急速
に昇温し高温でイミド化する方法で規則的な分子凝集構
造が生成するとしている。さらにポリアミック酸溶液を
ガラス板に塗布し、高温でゆっくり乾燥、熱イミド化す
ると規則的な凝集構造は形成されないとしている。According to these studies, the formation of a regular molecular aggregate structure depends largely on the thermal imidization conditions. For example, applying a polyamic acid solution to a glass plate, drying it under reduced pressure for a long time at a low temperature to form a polyamic acid film, and further increasing the temperature rapidly and imidizing at a high temperature to form a regular molecular aggregation structure There is. Further, it is stated that if a polyamic acid solution is applied to a glass plate, slowly dried at a high temperature, and thermally imidized, a regular agglomerated structure is not formed.
しかしながら低温で長時間減圧乾燥し、さらに急速に昇
温して高温でイミド化するという方法は工業的には極め
て難しく不可能と言わねばならない。何故なら低温減圧
下での長時間乾燥を連続工程で実現することは非常に困
難である。However, it must be said that a method of drying under reduced pressure at a low temperature for a long time, further raising the temperature rapidly and imidizing at a high temperature is extremely difficult and impossible industrially. Because it is very difficult to realize long-term drying under low temperature and reduced pressure in a continuous process.
自己支持性フィルムを得る段階で該自己支持性フィルム
に含まれる溶媒が多いと、次工程の熱イミド化時に溶媒
が急に蒸発するため発泡しフィルムの表面性を損なう。
したがって沸点の高い非プロトン性極性溶媒を蒸発させ
るためには、どうしても高い温度でゆっくり乾燥し、自
己支持性フィルムを得なければならない。また、ポリイ
ミドフィルムの凝集構造は、単に温度条件だけで決定さ
れるのではなく、フィルムに加わる外力にもよる。延伸
配向も重要な因子である。If a large amount of solvent is contained in the self-supporting film at the stage of obtaining the self-supporting film, the solvent abruptly evaporates at the time of thermal imidization in the next step and foams to impair the surface property of the film.
Therefore, in order to evaporate the aprotic polar solvent having a high boiling point, it must be dried slowly at a high temperature to obtain a self-supporting film. Further, the agglomeration structure of the polyimide film is determined not only by the temperature condition but also by the external force applied to the film. Stretch orientation is also an important factor.
以上述べたように結晶性で機械特性の優れたポリイミド
フィルムを製造することは、極めて困難なことであっ
た。As described above, it is extremely difficult to produce a crystalline polyimide film having excellent mechanical properties.
[発明の目的] 本発明は、ポリアミック酸溶液から流延成形法によりポ
リイミドフィルムを製造する方法において、結晶性で機
械的特性が優れたフィルムを工業的に得ようとして研究
した結果得られたもので、ポリアミック酸溶液の組成、
自己支持性フィルムを製造する条件、熱イミド化条件の
特定の組み合わせによって規則的な分子凝集構造を持
つ、すなわち結晶性で機械的特性が優れたポリイミドフ
ィルムを得ることができることを見出し本発明に到達し
たものである。[Object of the Invention] The present invention is a method for producing a polyimide film from a polyamic acid solution by a casting method, which is obtained as a result of research for industrially obtaining a film having excellent crystallinity and mechanical properties. So, the composition of the polyamic acid solution,
It has been found that a polyimide film having a regular molecular aggregation structure, that is, crystalline and excellent mechanical properties can be obtained by a specific combination of conditions for producing a self-supporting film and thermal imidization conditions, and has reached the present invention. It was done.
[発明の構成] 本発明は、1,2,4,5-ベンゼンテトラカルボン酸二無水物
と4−アミノフェニルエーテルとの重縮合生成物である
ポリアミック酸の溶液から流延成形法によってポリイミ
ドフィルムを製造する方法において、 (A) 該ポリアミック酸溶液が、非プロトン性極性溶媒
と、非プロトン性極性溶媒と相溶性のある140℃におけ
る蒸気圧が550mmHg以上の非極性溶媒との混合溶媒でか
つ非プロトン性極性溶媒が全溶媒の70重量%以上、97%
以下である混合溶媒のポリアミック酸溶液であり、 (B) 該ポリアミック酸溶液を支持体に塗布し、140℃以
下の温度で乾燥して溶媒含有率が5重量%以上、40重量
%以下の自己支持性フィルムを得る工程と、 (C) これに続いて、該自己支持性フィルムを150〜300
℃の温度域において18℃/分以上、50℃/分以下の速度
で昇温し、同時に200℃以上、370℃以下の温度域でフィ
ルムの引取方向およびこれに垂直な方向にそれぞれ10%
以上、70%以下に延伸し、300℃以上、500℃以下の温度
でイミド化する工程、 とによって製造されることを特徴とするポリイミドフィ
ルムの製造方法である。[Structure of the Invention] The present invention relates to a polyimide film prepared by casting from a solution of polyamic acid which is a polycondensation product of 1,2,4,5-benzenetetracarboxylic dianhydride and 4-aminophenyl ether. In the method for producing (A), the polyamic acid solution is a mixed solvent of an aprotic polar solvent, and a non-polar solvent having a vapor pressure at 140 ° C. that is compatible with the aprotic polar solvent of 550 mmHg or more, and Aprotic polar solvent is over 70% by weight of all solvents, 97%
A polyamic acid solution of the following mixed solvent, wherein (B) the polyamic acid solution is applied to a support and dried at a temperature of 140 ° C. or less to have a solvent content of 5% by weight or more and 40% by weight or less. A step of obtaining a supporting film, and (C) subsequently to 150-300 of the self-supporting film.
In the temperature range of ℃, the temperature is raised at a rate of 18 ℃ / min or more and 50 ℃ / min or less, and at the same time, in the temperature range of 200 ℃ or more and 370 ℃ or less, 10% in the film take-up direction and the direction perpendicular to it.
As described above, the method for producing a polyimide film is characterized in that it is produced by a step of stretching at 70% or less and imidizing at a temperature of 300 ° C. or more and 500 ° C. or less.
重縮合反応は、非プロトン性極性溶媒中で行われる。非
プロトン性極性溶媒は、N,N-ジメチルホルムアミド(D
MF)、N,N-ジメチルアセトアミド(DMAC)、N−
メチル−2−ピロリドン(NMP)などである。非プロ
トン性極性溶媒は、一種類のみ用いてもよいし、2種類
以上を混合して用いてもよい。The polycondensation reaction is carried out in an aprotic polar solvent. The aprotic polar solvent is N, N-dimethylformamide (D
MF), N, N-dimethylacetamide (DMAC), N-
Methyl-2-pyrrolidone (NMP) and the like. The aprotic polar solvent may be used alone or in combination of two or more.
上記非プロトン性極性溶媒と混合して使用する非極性溶
媒は、上記非プロトン性極性溶媒と相溶性があり140℃
における蒸気圧が550mmHg以上である溶媒である。特に
好ましくは、トルエン、キシレンなどの芳香族炭化水素
である。この溶媒は、自己支持性フィルムを得る工程に
おいて溶媒の蒸発を促進し溶媒含有率を低くする目的で
加える。140℃における蒸気圧が550mmHg以下であると溶
媒の蒸発が進まず、結局乾燥温度を高くしなくてはなら
ないため好ましくない。The non-polar solvent used as a mixture with the aprotic polar solvent is compatible with the aprotic polar solvent and has a temperature of 140 ° C.
The solvent has a vapor pressure of 550 mmHg or more. Particularly preferred are aromatic hydrocarbons such as toluene and xylene. This solvent is added for the purpose of promoting evaporation of the solvent and lowering the solvent content in the step of obtaining a self-supporting film. If the vapor pressure at 140 ° C. is 550 mmHg or less, the evaporation of the solvent does not proceed, and the drying temperature must be raised after all, which is not preferable.
混合溶媒における非プロトン性極性溶媒の割合は、70重
量%以上、97重量%以下である。ポリアミック酸の良溶
媒は非プロトン性極性溶媒を除いて他にはなく、非プロ
トン性極性溶媒が70重量%未満では溶媒の溶解力が低下
しポリアミック酸が析出するため好ましくない。また非
プロトン性極性溶媒が97重量%を越えると混合溶媒の効
果が発現せず好ましくない。The proportion of the aprotic polar solvent in the mixed solvent is 70% by weight or more and 97% by weight or less. Except for the aprotic polar solvent, there is no other good solvent for the polyamic acid, and if the aprotic polar solvent is less than 70% by weight, the solvent power is reduced and the polyamic acid precipitates, which is not preferable. Further, if the aprotic polar solvent exceeds 97% by weight, the effect of the mixed solvent is not exhibited, which is not preferable.
フィルムとして実用的な強度を得るためには、高分子量
であることが必要である。ポリアミック酸の分子量の絶
対値を知ることは難しいが、同一組成の場合極限粘度か
ら分子量の大小を知ることができる。実用的には極限粘
度をもとめる代わりにポリマー濃度0.5g/dlのときの
インヘレント粘度(ηinh)で分子量を表すことが多
い。重縮合反応では分子量は、モノマーモル比で制御す
ることができる。結局ポリマーの分子量はインヘレント
粘度で評価し、分子量の制御はモノマーモル比で制御す
ることができる。本発明においては、インヘレント粘度
とモノマーモル比の関係、さらにフィルム強度との関連
を検討した結果、モノマーモル比rは、 0.960≦r≦1.000、 より好ましくは、 0.980≦r≦1.000 の範囲にあることが好ましい(ただし である)。In order to obtain practical strength as a film, it is necessary to have a high molecular weight. It is difficult to know the absolute value of the molecular weight of the polyamic acid, but in the case of the same composition, the molecular weight can be known from the intrinsic viscosity. In practice, instead of obtaining the intrinsic viscosity, the molecular weight is often expressed by the inherent viscosity (ηinh) at a polymer concentration of 0.5 g / dl. In the polycondensation reaction, the molecular weight can be controlled by the monomer molar ratio. After all, the molecular weight of the polymer can be evaluated by the inherent viscosity, and the molecular weight can be controlled by the monomer molar ratio. In the present invention, as a result of examining the relationship between the inherent viscosity and the monomer molar ratio, and further the relationship with the film strength, the monomer molar ratio r is in the range of 0.960 ≦ r ≦ 1.000, more preferably 0.980 ≦ r ≦ 1.000. Preferred (but Is).
該ポリアミック酸溶液を支持体に塗布し、乾燥して自己
支持性フィルムを得る工程において、乾燥は140℃以
下、より好ましくは120℃以下で行わなければならな
い。ポリアミック酸からポリイミドへの脱水環化反応
は、130℃ぐらいから顕著に進む。In the step of applying the polyamic acid solution to a support and drying it to obtain a self-supporting film, the drying must be performed at 140 ° C or lower, more preferably 120 ° C or lower. The dehydration cyclization reaction from polyamic acid to polyimide proceeds remarkably at about 130 ° C.
150℃程度の低の温度でイミド化すると、既にイミド化
した部分はガラス転移温度が400℃以上と極めて高くな
るため、かさ高いポリアミック酸の構造から、緻密なポ
リイミドの規則的な分子凝集構造、すなわち結晶構造へ
移行することができない。従って乾燥は、低温でイミド
化が進まぬように上記条件の温度範囲内で行わなければ
ならない。When imidized at a low temperature of about 150 ° C., the glass transition temperature of the already imidized portion becomes extremely high at 400 ° C. or higher, so that from the bulky polyamic acid structure, a regular polyimide molecular aggregation structure, That is, it is not possible to shift to a crystal structure. Therefore, the drying must be performed within the temperature range of the above conditions so that the imidization does not proceed at a low temperature.
自己支持性フィルムの溶媒含有率は、5重量%以上、40
重量%以下でなければならない。自己支持性フィルムの
溶媒含有率が40重量%を越えるとフィルム強度が低下
し、また支持体に対する密着力も大きいため剥離が難し
くなる。これを解決するには離型剤を大量に添加するこ
とが考えられるが、フィルムの用途によって表面にブリ
ードした離型剤が障害となることが多くこの方法は適切
ではない。また溶媒含有率が高いと分子鎖の運動性が高
まるため脱水環化反応には有利だが、些少な力でも分子
鎖が流動して強く配向する。この段階での分子配向は、
フィルム特性を劣ったものとし好ましくない。さらに次
工程の熱イミド化工程で大量の溶媒の蒸発のため、フィ
ルムに気泡が生じ易くなり好ましくない。一方、溶媒含
有量が低い、5重量%以下と分子鎖の運動性が低く脱水
環化反応を妨げる。脱水環化反応を進め、かつ低温での
分子配向を防ぐため自己支持性フィルムの溶媒含有率
は、5重量%以上、40重量%以下、より好ましくは、15
重量%以上、30重量%以下の範囲になければならない。The solvent content of the self-supporting film is 5 wt% or more, 40
Must be below wt%. If the solvent content of the self-supporting film exceeds 40% by weight, the film strength will decrease and the adhesion to the support will be large, making peeling difficult. To solve this problem, a large amount of a release agent may be added, but the release agent bleeding on the surface often becomes an obstacle depending on the use of the film, and this method is not suitable. Further, if the solvent content is high, the mobility of the molecular chain is increased, which is advantageous for the dehydration cyclization reaction, but the molecular chain flows and is strongly oriented even with a small force. The molecular orientation at this stage is
It is not preferable because the film characteristics are inferior. Further, since a large amount of solvent is vaporized in the subsequent thermal imidization step, bubbles are easily generated in the film, which is not preferable. On the other hand, when the content of the solvent is low and it is 5% by weight or less, the mobility of the molecular chain is low and the cyclodehydration reaction is prevented. The solvent content of the self-supporting film is 5% by weight or more and 40% by weight or less, more preferably 15% in order to promote the dehydration cyclization reaction and prevent molecular orientation at low temperature.
It must be in the range of not less than 30% by weight and not more than 30% by weight.
次いで該自己支持性フィルムを高温で処理して脱水環化
しイミド化するが、この時熱処理は、18℃/分以上、50
℃/分以下の速度で昇温し300℃以上、500℃以下の温度
域でイミド化しなければならない。高温でイミド化しな
ければならない理由は先の述べたように、イミド化した
部分はガラス転移温度が極めて高くなるため、かさ高い
ポリアミック酸の構造から、緻密なポリイミドの規則的
な分子凝集構造、すなわち結晶構造へ移行するには高温
を要するからである。Then, the self-supporting film is treated at a high temperature to dehydrate cyclize and imidize.
The temperature must be raised at a rate of ℃ / min or less to imidize in the temperature range of 300 ℃ or more and 500 ℃ or less. As described above, the reason why it has to be imidized at a high temperature is that the glass transition temperature of the imidized portion becomes extremely high, so that the structure of the bulky polyamic acid causes a regular molecular aggregation structure of a dense polyimide, that is, This is because a high temperature is required to shift to the crystal structure.
しかし実際の工程では昇温速度が問題で、低温でイミド
化が進行しないうちに高温に持って行かなければならな
い。短時間で300℃以上の温度に昇温しイミド化しなけ
れば、結晶構造は生成しない。そのためには、150〜300
℃のの温度域において18℃/分以上、50℃/分以下の速
度で昇温しなければならない。18℃/分以下の速度で昇
温するとほとんど無定形構造となり好ましくない。また
昇温速度が50℃/分を越えると、フィルムに残存する溶
媒や縮合水が急激に蒸発し、フィルムに穴が開いたり表
面が荒れるため好ましくない。最終のイミド化温度が30
0℃以下であると結晶構造が生成されず、環化率も不十
分であるため好ましくない。さらに酸素になる酸化劣化
を考慮すると最終のイミド化温度は300℃以上500℃以下
が好ましい。However, in the actual process, the rate of temperature rise is a problem, and it has to be brought to a high temperature before the imidization proceeds at a low temperature. A crystal structure will not be formed unless the temperature is raised to 300 ° C or higher in a short time to imidize. For that, 150-300
In the temperature range of ° C, the temperature must be raised at a rate of 18 ° C / min or more and 50 ° C / min or less. If the temperature is raised at a rate of 18 ° C./minute or less, the structure becomes almost amorphous, which is not preferable. On the other hand, if the heating rate exceeds 50 ° C./min, the solvent and condensed water remaining in the film will evaporate abruptly, resulting in holes in the film and roughening of the surface, which is not preferable. Final imidization temperature is 30
When the temperature is 0 ° C or lower, a crystal structure is not formed and the cyclization rate is insufficient, which is not preferable. Further, considering the oxidative deterioration of oxygen, the final imidization temperature is preferably 300 ° C. or higher and 500 ° C. or lower.
熱処理条件は、150〜300℃の温度域において18℃/分以
上、50℃/分以下の速度で昇温し300℃以上、500℃以下
の温度でイミド化しなければならない。より好ましく
は、20℃/分以上、40℃/分以下の速度で昇温し320℃
以上、450℃以下の温度でイミド化しなければならな
い。As for the heat treatment conditions, the temperature must be raised in the temperature range of 150 to 300 ° C. at a rate of 18 ° C./min or more and 50 ° C./min or less to imidize at a temperature of 300 ° C. or more and 500 ° C. or less. More preferably, the temperature is raised at a rate of 20 ° C / min or more and 40 ° C / min or less and 320 ° C.
As described above, it must be imidized at a temperature of 450 ° C. or lower.
ポリイミドフィルムの機械特性を向上させるために、凝
集構造を一定の方向に配向させることは極めて有効であ
る。一軸方向に配向すると異方性が出るため、二軸に配
向させることが好ましい。ポリイミドフィルムの場合、
延伸する温度域が重要で、理由は不明であるが200℃以
下の温度で延伸しても特性向上は認められない。200℃
以上の温度でフィルムを二軸方向にそれぞれ10%以上延
伸すると、引張り強さや引張り弾性率が著しく向上する
ことを見い出した。延伸する温度は200℃以上、より好
ましくは250℃以上、370℃以下であることが必要であ
る。延伸倍率が10%以下では、延伸配向の効果が見られ
ず適当でない。延伸倍率の上限は、ピンホール発生等の
欠陥や、フィルムの破断が問題になるため、70%以下が
好ましい。二軸延伸は、同時あるいは逐次のいづれであ
っても構わない。In order to improve the mechanical properties of the polyimide film, it is extremely effective to orient the aggregate structure in a certain direction. Anisotropy appears when oriented in a uniaxial direction, so biaxial orientation is preferred. In case of polyimide film,
The temperature range for stretching is important and the reason is unknown, but no improvement in properties is observed even when stretching at a temperature of 200 ° C or lower. 200 ° C
It has been found that the tensile strength and the tensile elastic modulus are remarkably improved when the film is stretched biaxially by 10% or more at the above temperatures. The stretching temperature needs to be 200 ° C or higher, more preferably 250 ° C or higher and 370 ° C or lower. If the draw ratio is 10% or less, the effect of draw orientation is not observed and it is not suitable. The upper limit of the draw ratio is preferably 70% or less because defects such as pinholes and film breakage become problems. The biaxial stretching may be simultaneous or sequential.
[発明の効果] 本発明のポリアミック酸溶液組成物によれば、イミド化
反応が進行しない温度で溶媒を除去することができ、さ
らに本発明の熱イミド化条件と延伸により、緻密で強度
的に優れたポリイミドフィルムを製造することができ
る。[Effects of the Invention] According to the polyamic acid solution composition of the present invention, the solvent can be removed at a temperature at which the imidization reaction does not proceed, and the thermal imidization conditions and the stretching of the present invention make the composition dense and strong. An excellent polyimide film can be manufactured.
すなわち本発明の方法に従うと、工業的に可能な方法で
結晶性で機械的特性が優れたポリイミドフィルムを製造
することができる。That is, according to the method of the present invention, a crystalline polyimide film having excellent mechanical properties can be produced by an industrially possible method.
以下実施例で本発明を詳しく説明する。なお密度は、ヨ
ウ化ナトリウムを使用した密度勾配管法で測定した25℃
における値である。結晶化度は、次式によって密度の値
から計算した。The present invention will be described in detail below with reference to examples. The density is 25 ℃ measured by the density gradient tube method using sodium iodide.
Is the value at. The crystallinity was calculated from the density value by the following formula.
X線広角散乱測定は、フィルム面に垂直にX線を入射し
て透過法で測定した。 The X-ray wide-angle scattering measurement was performed by a transmission method in which X-rays were incident perpendicularly to the film surface.
2θ=5.8゜付近のピークが、ポリ−N,N′−ビスフェノ
キシフェニル−ピロメリットイミド(1)分子凝集構造に
よる反射ピークである。The peak near 2θ = 5.8 ° is the reflection peak due to the poly-N, N′-bisphenoxyphenyl-pyromellitimide (1) molecular aggregation structure.
温度はフィルムに貼付した熱電対で測定し、昇温速度は
このデータを元に計算した。The temperature was measured with a thermocouple attached to the film, and the heating rate was calculated based on this data.
延伸倍率は、熱処理する前のポリアミック酸自己支持性
フィルムに評点を記入して長さを測定し、続いてフィル
ムを熱処理して標点間の距離を再び測定して、以下の式
から算出した。The draw ratio was calculated from the following formula by writing a rating on the polyamic acid self-supporting film before heat treatment and measuring the length, then heat treating the film and again measuring the distance between the marks. .
LO:熱処理前の標点間距離 L:熱処理後の標点間距離 線膨張係数は、熱機械試験機(TMA)で測定した。L O : Gauge distance before heat treatment L: Gauge distance after heat treatment The linear expansion coefficient was measured with a thermomechanical tester (TMA).
実施例 1 5リットルの三口フラスコに脱水精製したNMP2,000g
を入れ、チッソガスを流しながら10分間激しくかき混ぜ
る。次に4−アミンフェニルエーテル200.24g(1.000モ
ル)を投入し、均一溶液となるまでかき混ぜる。続いて
無水ピロメリット酸217.68g(0.988モル)を添加する。
この間フラスコは5℃に保つ。溶液の粘度が十分に高く
なったところでNMP454g、キシレン613gを追加し、樹
脂分12.0重量%、溶媒組成NMP/キシレン=80/20の
ポリアミック酸溶液を得た。Example 1 2,000 g of dehydrated and purified NMP in a 5-liter three-necked flask
And stir vigorously for 10 minutes while flowing Chisso gas. Next, 200.24 g (1.000 mol) of 4-amine phenyl ether was added and stirred until a uniform solution was obtained. Then 217.68 g (0.988 mol) of pyromellitic dianhydride are added.
During this time, the flask is kept at 5 ° C. When the viscosity of the solution became sufficiently high, 454 g of NMP and 613 g of xylene were added to obtain a polyamic acid solution having a resin content of 12.0% by weight and a solvent composition of NMP / xylene = 80/20.
このポリアミック酸溶液を鏡面研磨したステンレス板
(300×300×3t)に塗布し、90℃で10分間、110℃で1
0分間熱風循環式乾燥機で乾燥し、溶媒含有率22.7重量
%の自己支持性フィルムを得た。This polyamic acid solution is applied to a mirror-polished stainless steel plate (300 x 300 x 3t), 90 ° C for 10 minutes, 110 ° C for 1 minute.
It was dried by a hot air circulation dryer for 0 minutes to obtain a self-supporting film having a solvent content of 22.7% by weight.
この自己支持性フィルムを150℃にした熱処理乾燥機に
入れ、360℃まで昇温した。This self-supporting film was placed in a heat treatment dryer at 150 ° C. and heated to 360 ° C.
150〜300℃までの平均昇温速度は24.5℃/分、300〜350
℃までの平均昇温速度は、18.9℃/分であった。フィル
ムは360℃に10分保った。この間、270℃からフィルムを
直交する二軸方向に延伸し335℃で延伸を停止した。そ
の後150℃まで徐冷しポリイミドフィルムを得た。平均
延伸倍率は、28%であった。このポリイミドフィルムの
性能を表1に、X線回折図を図1に示す。密度及びX線
回折パターンからこのポリイミドフィルムは、結晶性が
高いことがわかる。なおキシレンの140℃における蒸気
圧は、最も沸点の高いo−キシレンで約675mmHgであ
る。Average heating rate from 150 to 300 ℃ is 24.5 ℃ / min, 300 to 350
The average heating rate up to ° C was 18.9 ° C / min. The film was kept at 360 ° C for 10 minutes. During this period, the film was stretched from 270 ° C in the biaxial directions orthogonal to each other and stopped at 335 ° C. Then, it was gradually cooled to 150 ° C. to obtain a polyimide film. The average stretch ratio was 28%. The performance of this polyimide film is shown in Table 1, and the X-ray diffraction pattern is shown in FIG. From the density and X-ray diffraction pattern, it can be seen that this polyimide film has high crystallinity. The vapor pressure of xylene at 140 ° C. is about 675 mmHg for o-xylene, which has the highest boiling point.
比較例 1 実施例1と同じポリアミック酸自己支持性フィルムを使
用し、フィルムの熱イミド化は実施例1と同じとした
が、全く延伸しなかった。このポリイミドフィルムは、
図2のX線回折パターンや密度の値から結晶性が低く、
ほぼ無定形であることがわかる。また実施例1のポリイ
ミドフィルムと比べて弾性率、引張り強さが劣る。Comparative Example 1 The same polyamic acid self-supporting film as in Example 1 was used, and the thermal imidization of the film was the same as in Example 1, but it was not stretched at all. This polyimide film is
The crystallinity is low from the X-ray diffraction pattern and the value of density in FIG.
It can be seen that it is almost amorphous. Further, the elastic modulus and tensile strength are inferior to those of the polyimide film of Example 1.
比較例 2 実施例1と同じポリアミック酸自己支持性フィルムを使
用した。この自己支持性フィルムを150〜300℃の平均昇
温速度10℃/分で昇温し、360℃に10分保った。この
間、実施例1と同様に延伸を行った。図3のX線回折パ
ターンに見る様に、2θ=5.8゜ののピークが小さく、
結晶性が低いことがわかる。実施例1のポリイミドフィ
ルムと比べて、弾性率は若干高いものの、引張り強さや
伸びの様子が劣る。Comparative Example 2 The same polyamic acid self-supporting film as in Example 1 was used. This self-supporting film was heated at an average temperature rising rate of 150 to 300 ° C. of 10 ° C./minute and kept at 360 ° C. for 10 minutes. During this time, stretching was performed in the same manner as in Example 1. As seen in the X-ray diffraction pattern of Fig. 3, the peak at 2θ = 5.8 ° is small,
It can be seen that the crystallinity is low. Although the elastic modulus is slightly higher than that of the polyimide film of Example 1, tensile strength and elongation are inferior.
図1は、実施例1で作成したポリイミドフィルムのX線
(広角散乱)回折図である。 図2は、比較例1で作成したポリイミドフィルムのX線
(広角散乱)回折図である。 図3は、比較例2で作成したポリイミドフィルムのX線
(広角散乱)回折図である。FIG. 1 is an X-ray (wide-angle scattering) diffraction pattern of the polyimide film prepared in Example 1. FIG. 2 is an X-ray (wide-angle scattering) diffraction diagram of the polyimide film prepared in Comparative Example 1. FIG. 3 is an X-ray (wide-angle scattering) diffraction diagram of the polyimide film prepared in Comparative Example 2.
───────────────────────────────────────────────────── フロントページの続き (51)Int.Cl.5 識別記号 庁内整理番号 FI 技術表示箇所 B29L 7:00 4F C08L 79:08 9285−4J ─────────────────────────────────────────────────── ─── Continuation of the front page (51) Int.Cl. 5 Identification number Office reference number FI technical display location B29L 7:00 4F C08L 79:08 9285-4J
Claims (1)
物と4−アミノフェニルエーテルとの重縮合生成物であ
るポリアミック酸の溶液から流延成形法によってポリイ
ミドフィルムを製造する方法において、 (A) 該ポリアミック酸溶液が、非プロトン性極性溶媒
と、非プロトン性極性溶媒と相溶性のある140℃におけ
る蒸気圧が550mmHg以上の非極性溶媒との混合物溶媒で
かつ非プロトン性極性溶媒が全溶媒の70重量%以上、97
%以下である混合溶媒のポリアミック酸溶液であり、 (B) 該ポリアミック酸溶液を支持体に塗布し、140℃以
下の温度で乾燥して溶媒含有率が5重量%以上、40重量
%以下の自己支持性フィルムを得る工程と、 (C) これに続いて、該自己支持性フィルムを150〜300
℃の温度域において18℃/分以上、50℃/分以下の速度
で昇温し、同時に200℃以上、370℃以下の温度域でフィ
ルムの引取方向およびこれに垂直な方向にそれぞれ10%
以上、70%以下に延伸し、300℃以上、500℃以下の温度
でイミド化する工程、 とによって製造されることを特徴とするポリイミドフィ
ルムの製造方法。1. A method for producing a polyimide film from a solution of polyamic acid which is a polycondensation product of 1,2,4,5-benzenetetracarboxylic dianhydride and 4-aminophenyl ether by a casting method. In (A) the polyamic acid solution is a mixture of an aprotic polar solvent and a non-polar solvent having a vapor pressure at 140 ° C. that is compatible with the aprotic polar solvent of 550 mmHg or more, and is an aprotic polar solvent. Solvent is 70% by weight or more of the total solvent, 97
% Or less of a mixed solvent polyamic acid solution, wherein (B) the polyamic acid solution is applied to a support and dried at a temperature of 140 ° C. or lower to have a solvent content of 5% by weight or more and 40% by weight or less. A step of obtaining a self-supporting film, and (C) subsequently to 150-300
In the temperature range of ℃, the temperature is raised at a rate of 18 ℃ / min or more and 50 ℃ / min or less, and at the same time, in the temperature range of 200 ℃ or more and 370 ℃ or less, 10% in the film take-up direction and the direction perpendicular to it.
As described above, the process for stretching a film to 70% or less and imidizing at a temperature of 300 ° C. or more and 500 ° C. or less, and a method for producing a polyimide film.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14581688A JPH0625269B2 (en) | 1988-06-15 | 1988-06-15 | Method for manufacturing polyimide film |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14581688A JPH0625269B2 (en) | 1988-06-15 | 1988-06-15 | Method for manufacturing polyimide film |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH01315428A JPH01315428A (en) | 1989-12-20 |
| JPH0625269B2 true JPH0625269B2 (en) | 1994-04-06 |
Family
ID=15393802
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14581688A Expired - Lifetime JPH0625269B2 (en) | 1988-06-15 | 1988-06-15 | Method for manufacturing polyimide film |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0625269B2 (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2006348259A (en) * | 2005-05-16 | 2006-12-28 | Toyobo Co Ltd | Polyimide film and method for producing the same |
| JP2007046045A (en) * | 2005-07-13 | 2007-02-22 | Teijin Ltd | Polyimide film substrate |
| WO2009148060A1 (en) * | 2008-06-02 | 2009-12-10 | 宇部興産株式会社 | Method for producing aromatic polyimide film wherein linear expansion coefficient in transverse direction is lower than linear expansion coefficient in machine direction |
| CN102917859B (en) * | 2010-03-31 | 2015-12-16 | 宇部兴产株式会社 | Polyimide film, and the method preparing polyimide film |
| KR102421569B1 (en) * | 2015-09-25 | 2022-07-15 | 에스케이이노베이션 주식회사 | Manufacturing method for polymer film |
-
1988
- 1988-06-15 JP JP14581688A patent/JPH0625269B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH01315428A (en) | 1989-12-20 |
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