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JPH06288952A - Gas sensor - Google Patents
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JPH06288952A - Gas sensor - Google Patents

Gas sensor

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Publication number
JPH06288952A
JPH06288952A JP7494193A JP7494193A JPH06288952A JP H06288952 A JPH06288952 A JP H06288952A JP 7494193 A JP7494193 A JP 7494193A JP 7494193 A JP7494193 A JP 7494193A JP H06288952 A JPH06288952 A JP H06288952A
Authority
JP
Japan
Prior art keywords
gas
temperature
sensor
heater
gas detector
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP7494193A
Other languages
Japanese (ja)
Inventor
Michio Hirai
迪夫 平井
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Materials Corp
Original Assignee
Mitsubishi Materials Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Materials Corp filed Critical Mitsubishi Materials Corp
Priority to JP7494193A priority Critical patent/JPH06288952A/en
Publication of JPH06288952A publication Critical patent/JPH06288952A/en
Withdrawn legal-status Critical Current

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Abstract

(57)【要約】 【目的】 容易に小型化でき、最良の応答速度と検出感
度が安定して得られ、検出値の再現性が高いガスセンサ
を得る。 【構成】 絶縁性基板10の表面にガス検出体11と温
度センサ12が設けられ、この基板の裏面にガス検出体
を加熱するヒータ16が設けられる。温度センサはチッ
プサーミスタであってガス検出体の近傍の基板表面に実
装され、ガス検出体の温度を検出する。温度センサ12
の検出出力に基づいてガス検出体11の温度が一定にな
るようにヒータ16への印加電圧を制御するコントロー
ラ20を備える。
(57) [Summary] [Objective] To obtain a gas sensor that can be easily miniaturized, stably obtains the best response speed and detection sensitivity, and has high reproducibility of detection values. [Structure] A gas detector 11 and a temperature sensor 12 are provided on the front surface of an insulating substrate 10, and a heater 16 for heating the gas detector is provided on the rear surface of the substrate. The temperature sensor is a chip thermistor and is mounted on the surface of the substrate in the vicinity of the gas detector, and detects the temperature of the gas detector. Temperature sensor 12
The controller 20 controls the voltage applied to the heater 16 so that the temperature of the gas detector 11 becomes constant based on the detection output of the above.

Description

【発明の詳細な説明】Detailed Description of the Invention

【0001】[0001]

【産業上の利用分野】本発明は、水素、一酸化炭素、ア
ルコール、炭化水素、酸素、二酸化炭素、塩素等のガス
のうち所定のガスを検出するのに適するガスセンサに関
する。更に詳しくは、温度センサと一体化されたガスセ
ンサに関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a gas sensor suitable for detecting a predetermined gas among gases such as hydrogen, carbon monoxide, alcohols, hydrocarbons, oxygen, carbon dioxide and chlorine. More specifically, it relates to a gas sensor integrated with a temperature sensor.

【0002】[0002]

【従来の技術】ガスセンサは、ガス検出体の温度が低い
と、その検出感度が低く被検ガスに対する応答速度が遅
い。そのためガス検出体が取付けられる基板にはヒータ
が組込まれ、全体を高温度に加熱している。更にこのと
きのガス検出体の温度には、ガス検出体と被検ガスの種
類によって、検出感度が高まる最適な温度があることが
知られている。表1はその一例である。表1では、ガス
検出体が金属酸化物半導体薄膜からなる半導体ガスセン
サである場合に、その被検ガスの種類に応じた最適使用
温度を示している。
2. Description of the Related Art In a gas sensor, when the temperature of a gas detector is low, its detection sensitivity is low and its response speed to a test gas is slow. Therefore, a heater is incorporated in the substrate on which the gas detector is attached to heat the whole to a high temperature. Further, it is known that the temperature of the gas detection body at this time has an optimum temperature at which the detection sensitivity is increased depending on the types of the gas detection body and the test gas. Table 1 is an example. In Table 1, when the gas detector is a semiconductor gas sensor made of a metal oxide semiconductor thin film, the optimum operating temperature according to the type of the test gas is shown.

【0003】[0003]

【表1】 [Table 1]

【0004】従って、ガスセンサを用いた計測により信
頼性の高い被検ガスの濃度を得るためには、ヒータの加
熱温度を正確に制御する必要がある。従来のこの種の温
度制御は、ヒータへの電力を一定に保つことにより行っ
ている。しかしガス検出体に金属酸化物半導体薄膜を用
いたガスセンサは、ガス検出感度は優れているもののガ
ス検出体がヒータの熱を受ける以外に測定雰囲気の温度
の影響を受け易く、正確な温度制御を行うことが難し
い。
Therefore, in order to obtain a highly reliable concentration of the test gas by the measurement using the gas sensor, it is necessary to accurately control the heating temperature of the heater. This type of conventional temperature control is performed by keeping the electric power to the heater constant. However, although the gas sensor using a metal oxide semiconductor thin film as the gas detector has excellent gas detection sensitivity, the gas detector is easily affected by the temperature of the measurement atmosphere in addition to the heat of the heater, and accurate temperature control is required. Difficult to do.

【0005】この点を解決するために、従来、温度セン
サと一体化されたガスセンサが提案されている(特開平
4−273050)。このガスセンサでは、同一基板の
表面上に同じ金属酸化物半導体薄膜で覆われた2組の対
向電極を設け、そのうちの1組の対向電極を覆った金属
酸化物半導体薄膜上にガスバリヤ性の耐熱絶縁性薄膜を
積層して被覆し、基板裏面側に薄膜状ヒータを設けてい
る。このガスセンサの金属酸化物半導体薄膜では、その
電気伝導度が薄膜の半導体的性質から被検ガスの濃度変
化に対しては勿論、温度変化に対しても変化する。一
方、雰囲気中の酸素や被検ガスとの接触が阻止されるガ
スバリヤ性の耐熱絶縁性薄膜では、その電気伝導度が被
検ガスの濃度変化に対しては変化せず、温度変化のみに
よって変化し、温度センサとして機能する。そのため、
測定雰囲気の温度が変化したときには耐熱絶縁性薄膜で
覆った方の電極出力で、金属酸化物半導体薄膜で覆った
方の電極出力を補正し、即ち温度補償する。これにより
ガスセンサの検出値は測定雰囲気の温度の影響を受け
ず、被検ガスの濃度によってのみ変化するようになる。
In order to solve this point, a gas sensor integrated with a temperature sensor has been conventionally proposed (Japanese Patent Laid-Open No. 4-273050). In this gas sensor, two sets of counter electrodes covered with the same metal oxide semiconductor thin film are provided on the surface of the same substrate, and a gas barrier heat-resistant insulation is provided on the metal oxide semiconductor thin film covering one set of the counter electrodes. Film is laminated and covered, and a thin film heater is provided on the back side of the substrate. In the metal oxide semiconductor thin film of this gas sensor, its electrical conductivity changes not only with the change in the concentration of the test gas but also with the change in temperature due to the semiconductor properties of the thin film. On the other hand, in a gas barrier heat-resistant insulating thin film that prevents contact with oxygen in the atmosphere and the test gas, its electrical conductivity does not change with changes in the concentration of the test gas, but only with temperature changes. Function as a temperature sensor. for that reason,
When the temperature of the measurement atmosphere changes, the electrode output covered with the heat-resistant insulating thin film is used to correct the electrode output covered with the metal oxide semiconductor thin film, that is, the temperature is compensated. As a result, the detection value of the gas sensor is not affected by the temperature of the measurement atmosphere and changes only with the concentration of the test gas.

【0006】[0006]

【発明が解決しようとする課題】しかし、上記ガスセン
サに組込まれたヒータはガス検出体が表1に示されるよ
うな最適な温度になるように一定電圧が印加されるに過
ぎない。そのため、測定雰囲気の温度等によりガス検出
体自体の温度が変化したときには、上記ガスセンサの構
成では、最適な検出感度や応答速度が得られない不具合
があった。特に、被検ガスが2種類混在している場合に
は、上記2つの薄膜で温度変化を自動的に補償すると、
上記ガスセンサで2種類のガスのうちいずれかのガスを
検出したのか不明瞭になり、ガス選択性が変化又は低下
する問題点があった。また、上記ガスセンサは基板の表
面に薄膜のセンサを2個設ける必要があり、広い基板面
積を要し、小型化しにくい欠点があった。
However, the heater incorporated in the gas sensor is merely applied with a constant voltage so that the gas detector has an optimum temperature as shown in Table 1. Therefore, when the temperature of the gas detector itself changes due to the temperature of the measurement atmosphere or the like, the configuration of the gas sensor described above has a problem that optimum detection sensitivity and response speed cannot be obtained. Especially, when two kinds of test gases are mixed, if the temperature change is automatically compensated by the above two thin films,
It becomes unclear which gas of the two kinds of gas is detected by the gas sensor, and there is a problem that the gas selectivity is changed or lowered. Further, the above gas sensor has a drawback that it is necessary to provide two thin film sensors on the surface of the substrate, a large substrate area is required, and miniaturization is difficult.

【0007】本発明の目的は、容易に小型化でき、温度
センサによりヒータへの印加電圧を制御してガス検出体
の温度を所定温度に保つことにより、最良の応答速度と
検出感度が安定して得られ、検出値の再現性が高いガス
センサを提供することにある。
The object of the present invention is to easily miniaturize, and by controlling the voltage applied to the heater by the temperature sensor to keep the temperature of the gas detector at a predetermined temperature, the best response speed and detection sensitivity are stabilized. Another object of the present invention is to provide a gas sensor obtained by the above method and having high reproducibility of detection values.

【0008】[0008]

【課題を解決するための手段】上記目的を達成するため
の本発明の構成を図1に基づいて説明する。本発明は、
絶縁性基板10の表面にガス検出体11と温度センサ1
2が設けられ、この基板10の裏面にガス検出体11を
加熱するヒータ16が設けられたガスセンサの改良であ
る。その特徴ある構成は、温度センサ12がガス検出体
11の近傍の基板10表面に実装され、ガス検出体11
の温度を検出するチップサーミスタである点である。ま
た、図2に示すように、本発明のガスセンサは温度セン
サ12の検出出力に基づいてガス検出体11の温度が一
定になるようにヒータ16への印加電圧を制御するコン
トローラ20を備えることが好ましい。
The structure of the present invention for achieving the above object will be described with reference to FIG. The present invention is
The gas detector 11 and the temperature sensor 1 are provided on the surface of the insulating substrate 10.
2 is provided, and a heater 16 for heating the gas detection body 11 is provided on the back surface of the substrate 10 to improve the gas sensor. The characteristic configuration is that the temperature sensor 12 is mounted on the surface of the substrate 10 in the vicinity of the gas detector 11 and
It is a chip thermistor that detects the temperature of. Further, as shown in FIG. 2, the gas sensor of the present invention may include a controller 20 that controls the voltage applied to the heater 16 so that the temperature of the gas detection body 11 becomes constant based on the detection output of the temperature sensor 12. preferable.

【0009】[0009]

【作用】温度センサ12としてのチップサーミスタをガ
ス検出体11の近傍の基板10の表面にはんだ付け等に
より実装される。これにより、ガス検出体自体の温度を
チップサーミスタ12が検出できるとともに、ガスセン
サを小型化できる。サーミスタ12の出力に基づいてガ
ス検出体11の温度が一定になるようにコントローラ2
0がヒータ16への印加電圧を制御すれば、ガス検出体
11の温度が最良の状態に維持され、ガスセンサの応答
速度や検出感度が安定化する。
The chip thermistor as the temperature sensor 12 is mounted on the surface of the substrate 10 near the gas detector 11 by soldering or the like. Thereby, the temperature of the gas detector itself can be detected by the chip thermistor 12, and the gas sensor can be downsized. Based on the output of the thermistor 12, the controller 2 keeps the temperature of the gas detector 11 constant.
If 0 controls the voltage applied to the heater 16, the temperature of the gas detector 11 is maintained in the optimum state, and the response speed and detection sensitivity of the gas sensor are stabilized.

【0010】[0010]

【実施例】以下、本発明の実施例を図面に基づいて詳し
く説明する。図1に示すように、アルミナ、窒化アルミ
ニウム等の耐熱性と絶縁性に優れた基板10の表面には
ガス検出体11と温度センサ12が設けられる。この例
では、基板10のサイズは長さ約3mm、幅約3mm、
厚さ約0.5mmである。またガス検出体11は金属酸
化物半導体薄膜であって、膜厚が約2μmのSnO2
膜である。この薄膜は真空蒸着法、スパッタリング法、
イオンプレーティング法等により基板表面に形成され
る。13,14はガス検出体の電極であって、例えば金
ペーストを所定形状に印刷して形成される。温度センサ
12はチップサーミスタであって、この例ではチップサ
ーミスタのサイズは長さ約2mm、幅約1.25mm、
厚さ約1.25mmである。チップサーミスタはMn,
Fe,Co,Ni,Cu,Al等の金属の酸化物粉末か
ら作られたチップ状のセラミック素体12aの両端面に
Agのペーストを塗布し焼付けて端子電極12b,12
cを設けることにより作られる。基板表面には導電性ペ
ーストを印刷して回路パターン(図示せず)が形成さ
れ、この回路パターンには温度センサ12の端子電極1
2b,12cがはんだ15付けにより固着される。この
例では、端子電極12bがガス検出体の電極14の近傍
の回路パターンにはんだ付けされる。基板10の裏面に
は薄膜状のヒータ16が設けられる。このヒータ16は
金、白金等のペーストを印刷することにより膜厚約2μ
mに形成される。17,18はヒータの電極である。ヒ
ータ16は温度センサ12が位置する基板裏面まで延び
て設けられる。
Embodiments of the present invention will now be described in detail with reference to the drawings. As shown in FIG. 1, a gas detector 11 and a temperature sensor 12 are provided on the surface of a substrate 10 such as alumina or aluminum nitride, which has excellent heat resistance and insulation properties. In this example, the size of the substrate 10 is about 3 mm in length and about 3 mm in width,
The thickness is about 0.5 mm. The gas detector 11 is a metal oxide semiconductor thin film, which is a SnO 2 thin film having a thickness of about 2 μm. This thin film is vacuum deposited, sputtered,
It is formed on the substrate surface by the ion plating method or the like. Reference numerals 13 and 14 denote electrodes of the gas detector, which are formed by printing gold paste in a predetermined shape, for example. The temperature sensor 12 is a chip thermistor. In this example, the size of the chip thermistor is about 2 mm in length and about 1.25 mm in width,
The thickness is about 1.25 mm. The chip thermistor is Mn,
Terminal pastes 12b, 12 are prepared by applying Ag paste on both end faces of a chip-shaped ceramic body 12a made of oxide powder of a metal such as Fe, Co, Ni, Cu, Al and baking it.
It is made by providing c. A circuit pattern (not shown) is formed by printing a conductive paste on the substrate surface, and the terminal electrode 1 of the temperature sensor 12 is formed on the circuit pattern.
2b and 12c are fixed by soldering 15. In this example, the terminal electrode 12b is soldered to the circuit pattern near the electrode 14 of the gas detector. A thin film heater 16 is provided on the back surface of the substrate 10. The heater 16 has a film thickness of about 2 μm by printing a paste such as gold or platinum.
formed in m. Reference numerals 17 and 18 denote heater electrodes. The heater 16 is provided so as to extend to the back surface of the substrate where the temperature sensor 12 is located.

【0011】図2に示すように、温度センサ12の検出
出力はコントローラ20に接続される。コントローラ2
0の制御出力はヒータ16に接続される。コントローラ
20には図示しないメモリが内蔵され、メモリにはガス
検出体11が検出しようとするガス(被検ガス)を最適
に検出できる温度に相応した値が記憶されている。図2
において、図1と同一の符号は同一構成部品を示す。ま
た21は負荷であり、22はガスセンサの入力端子、2
3はその出力端子である。この測定回路では、ヒータ電
圧をVH、回路入力電圧をVC、負荷抵抗をRL、出力電
圧をVRLで表わすと、ガス検出体の抵抗RSは次の式で
表わされる。 RS = {(VC/VRL)−1}×RL …(1) またガス検出体自体の温度をTS、基板を介してヒータ
から受ける熱をTH、雰囲気の温度をTFとすると、TS
は次の式で表わされる。 TS = TH − TF …(2) ここで、温度センサ自体の温度をTTとすると、ヒータ
16が温度センサ12の裏側まで延びているため、TT
は次の式で表わされる。 TT = TH − TF …(3) 上記式(2)及び式(3)の関係から、温度センサ12
の温度変化はガス検出体11の温度変化とみなすことが
できる。
As shown in FIG. 2, the detection output of the temperature sensor 12 is connected to the controller 20. Controller 2
The control output of 0 is connected to the heater 16. The controller 20 has a memory (not shown) built therein, and the memory stores a value corresponding to the temperature at which the gas (test gas) to be detected by the gas detector 11 can be optimally detected. Figure 2
1, the same reference numerals as those in FIG. 1 denote the same components. Further, 21 is a load, 22 is an input terminal of the gas sensor, 2
3 is its output terminal. In this measuring circuit, when the heater voltage is V H , the circuit input voltage is V C , the load resistance is R L , and the output voltage is V RL , the resistance R S of the gas detector is expressed by the following equation. R S = {(V C / V RL) -1} × R L ... (1) The temperature of the gas detection element itself T S, the heat received from the heater through the substrate T H, the temperature of the atmosphere T F Then, T S
Is expressed by the following equation. T S = T H −T F (2) Here, assuming that the temperature of the temperature sensor itself is T T , since the heater 16 extends to the back side of the temperature sensor 12, T T
Is expressed by the following equation. T T = T H −T F (3) From the relationship of the above equations (2) and (3), the temperature sensor 12
The temperature change of can be regarded as the temperature change of the gas detector 11.

【0012】このガスセンサで所定のガスを検出する場
合には、コントローラ20はガス検出体11がそのガス
を最適に検出し得る温度となるように、ヒータ16に電
圧を印加する。測定雰囲気の変化等によりガス検出体自
体の温度が変化すると、温度センサ12の検出値とメモ
リに記憶された基準値とに差異が生じる。コントローラ
20はこの差異がなくなるように、ヒータ16の印加電
圧を変更する。これにより、ガス検出体は常に所定の温
度に維持され、ガスセンサの応答速度や検出感度が安定
化する。
When the gas sensor detects a predetermined gas, the controller 20 applies a voltage to the heater 16 so that the gas detector 11 has a temperature at which the gas can be detected optimally. When the temperature of the gas detector itself changes due to a change in the measurement atmosphere or the like, a difference occurs between the detection value of the temperature sensor 12 and the reference value stored in the memory. The controller 20 changes the voltage applied to the heater 16 so as to eliminate this difference. Thereby, the gas detector is always maintained at a predetermined temperature, and the response speed and detection sensitivity of the gas sensor are stabilized.

【0013】なお、上記例ではガス検出体として、Sn
2薄膜を示したが、本発明はこの金属酸化物半導体薄
膜を含む半導体ガスセンサに限らず、前記表1に示した
他の金属酸化物半導体薄膜を含むものでもよい。また、
上記例で示した各部品のサイズは一例であって、本発明
は上記数値に限るものではない。
In the above example, Sn is used as the gas detector.
Although the O 2 thin film is shown, the present invention is not limited to the semiconductor gas sensor including this metal oxide semiconductor thin film, and may include the other metal oxide semiconductor thin films shown in Table 1 above. Also,
The size of each component shown in the above example is an example, and the present invention is not limited to the above numerical values.

【0014】[0014]

【発明の効果】以上述べたように、本発明によれば、温
度センサがその実装面積が極めて僅かなチップサーミス
タであって、絶縁性基板の面積を僅かに広げることで足
りるため、容易にガスセンサを小型化できる。またチッ
プサーミスタははんだ付けで固着できるため簡便に基板
に実装できる。本発明のコントローラを備えたガスセン
サによれば、従来のようにヒータに定電圧を印加せず
に、温度センサの出力に応じてガス検出体の温度を所望
の温度に設定かつ維持できるため、被検ガスを検出する
のに最適な条件に容易にかつ確実にすることができる。
この結果、最良の応答速度と検出感度がばらつくことな
く安定して得られ、検出値の再現性が高い優れたガスセ
ンサが得られる。
As described above, according to the present invention, the temperature sensor is a chip thermistor having a very small mounting area, and it suffices to slightly increase the area of the insulating substrate. Can be downsized. Moreover, since the chip thermistor can be fixed by soldering, it can be easily mounted on the substrate. According to the gas sensor including the controller of the present invention, the temperature of the gas detector can be set and maintained at a desired temperature according to the output of the temperature sensor without applying a constant voltage to the heater as in the conventional case. The optimum conditions for detecting the test gas can be easily and reliably ensured.
As a result, the best response speed and detection sensitivity can be stably obtained without variation, and an excellent gas sensor with high reproducibility of detection values can be obtained.

【図面の簡単な説明】[Brief description of drawings]

【図1】本発明実施例のガスセンサの断面図。FIG. 1 is a sectional view of a gas sensor according to an embodiment of the present invention.

【図2】その測定回路の構成図。FIG. 2 is a configuration diagram of the measurement circuit.

【符号の説明】[Explanation of symbols]

10 絶縁性基板 11 ガス検出体 12 温度センサ 16 ヒータ 20 コントローラ 10 Insulating Substrate 11 Gas Detector 12 Temperature Sensor 16 Heater 20 Controller

Claims (4)

【特許請求の範囲】[Claims] 【請求項1】 絶縁性基板(10)の表面にガス検出体(11)
と温度センサ(12)が設けられ、前記基板(10)の裏面に前
記ガス検出体(11)を加熱するヒータ(16)が設けられたガ
スセンサにおいて、 前記温度センサ(12)がガス検出体(11)の近傍の前記基板
(10)表面に実装され前記ガス検出体(11)の温度を検出す
るチップサーミスタであることを特徴とするガスセン
サ。
1. A gas detector (11) on the surface of an insulating substrate (10).
And a temperature sensor (12) are provided, and a heater (16) for heating the gas detection body (11) is provided on the back surface of the substrate (10), the temperature sensor (12) is a gas detection body ( 11) near the substrate
(10) A gas sensor, which is a chip thermistor mounted on the surface for detecting the temperature of the gas detector (11).
【請求項2】 温度センサ(12)の検出出力に基づいてガ
ス検出体の温度が一定になるようにヒータ(16)への印加
電圧を制御するコントローラ(20)を備えた請求項1記載
のガスセンサ。
2. The controller (20) according to claim 1, further comprising a controller (20) for controlling the voltage applied to the heater (16) so that the temperature of the gas detection body becomes constant based on the detection output of the temperature sensor (12). Gas sensor.
【請求項3】 ガス検出体(11)が金属酸化物半導体薄膜
である請求項1記載のガスセンサ。
3. The gas sensor according to claim 1, wherein the gas detector (11) is a metal oxide semiconductor thin film.
【請求項4】 ヒータ(16)が温度センサ(12)が位置する
基板(10)裏面まで延びて設けられた請求項1記載のガス
センサ。
4. The gas sensor according to claim 1, wherein the heater (16) is provided so as to extend to the back surface of the substrate (10) on which the temperature sensor (12) is located.
JP7494193A 1993-04-01 1993-04-01 Gas sensor Withdrawn JPH06288952A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP7494193A JPH06288952A (en) 1993-04-01 1993-04-01 Gas sensor

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7494193A JPH06288952A (en) 1993-04-01 1993-04-01 Gas sensor

Publications (1)

Publication Number Publication Date
JPH06288952A true JPH06288952A (en) 1994-10-18

Family

ID=13561882

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7494193A Withdrawn JPH06288952A (en) 1993-04-01 1993-04-01 Gas sensor

Country Status (1)

Country Link
JP (1) JPH06288952A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002062276A (en) * 2000-08-17 2002-02-28 New Cosmos Electric Corp Gas detection device and operation method thereof
KR100482490B1 (en) * 2002-05-16 2005-04-14 기아자동차주식회사 Air quality control sensor having temperature sensor for outside door as a one body
JP2005265548A (en) * 2004-03-17 2005-09-29 Tdk Corp Gas sensor
JP2018194434A (en) * 2017-05-17 2018-12-06 大阪瓦斯株式会社 Gas detection device
KR20220029141A (en) * 2020-09-01 2022-03-08 신수환 Gas sensor with baseline calibration function and control method thereof

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002062276A (en) * 2000-08-17 2002-02-28 New Cosmos Electric Corp Gas detection device and operation method thereof
KR100482490B1 (en) * 2002-05-16 2005-04-14 기아자동차주식회사 Air quality control sensor having temperature sensor for outside door as a one body
JP2005265548A (en) * 2004-03-17 2005-09-29 Tdk Corp Gas sensor
JP2018194434A (en) * 2017-05-17 2018-12-06 大阪瓦斯株式会社 Gas detection device
KR20220029141A (en) * 2020-09-01 2022-03-08 신수환 Gas sensor with baseline calibration function and control method thereof

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