JPH0630179B2 - Vacuum deposition equipment - Google Patents
Vacuum deposition equipmentInfo
- Publication number
- JPH0630179B2 JPH0630179B2 JP9687984A JP9687984A JPH0630179B2 JP H0630179 B2 JPH0630179 B2 JP H0630179B2 JP 9687984 A JP9687984 A JP 9687984A JP 9687984 A JP9687984 A JP 9687984A JP H0630179 B2 JPH0630179 B2 JP H0630179B2
- Authority
- JP
- Japan
- Prior art keywords
- vapor deposition
- vapor
- vacuum
- shaped sheet
- film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000001771 vacuum deposition Methods 0.000 title description 2
- 238000007740 vapor deposition Methods 0.000 claims description 43
- 239000000758 substrate Substances 0.000 claims description 14
- 230000008020 evaporation Effects 0.000 claims description 6
- 238000001704 evaporation Methods 0.000 claims description 6
- 238000005485 electric heating Methods 0.000 claims description 4
- 238000004804 winding Methods 0.000 claims description 3
- 239000010408 film Substances 0.000 description 28
- 239000000463 material Substances 0.000 description 24
- 230000003287 optical effect Effects 0.000 description 7
- 230000007547 defect Effects 0.000 description 6
- 230000001105 regulatory effect Effects 0.000 description 6
- 238000000151 deposition Methods 0.000 description 5
- 238000000034 method Methods 0.000 description 5
- 230000008021 deposition Effects 0.000 description 4
- 238000010586 diagram Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 230000003749 cleanliness Effects 0.000 description 2
- 239000011888 foil Substances 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- 239000002313 adhesive film Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 230000001276 controlling effect Effects 0.000 description 1
- 239000011889 copper foil Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 150000004706 metal oxides Chemical class 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/54—Controlling or regulating the coating process
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Manufacturing Optical Record Carriers (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は、光ディスク等の記録膜を形成する真空蒸着装
置に関するものである。TECHNICAL FIELD The present invention relates to a vacuum vapor deposition apparatus for forming a recording film for an optical disc or the like.
従来例の構成とその問題点 現在、情報記録媒体として録音用テープ，ビデオテー
プ，ビデオディスク等が市販され普及しているが、近
年、レーザ光を用いて記録再生が可能な光ディスクが高
密度情報記録媒体として注目されている。画像，音声の
情報以外にもコンピューターのデータメモリ媒体として
利用が拡大されようとしており記録，再生時にエラーの
ない高品質な光ディスクが要求されており、中でも光デ
ィスクの膜特性をつくりだす薄膜作成方法の代表とされ
る真空蒸着装置が注目されている。Structure of Conventional Example and Its Problems At present, recording tapes, video tapes, video discs, etc. are commercially available as information recording media, but in recent years, optical discs capable of recording / reproducing by using laser light have high density information. It is attracting attention as a recording medium. In addition to image and audio information, its use is expanding as a data memory medium for computers, and high-quality optical discs that are error-free during recording and playback are required. Among them, a typical thin-film forming method that creates the film characteristics of optical discs. The vacuum vapor deposition apparatus which is said to be attracting attention.
以下図面を参照しながら従来の真空蒸着装置について説
明する。第１図は従来の真空蒸着装置の真空蒸着槽内の
簡単な構成図である。第１図において、１は真空槽、２
は被蒸着基材、３は回転軸、４はモーター、５は蒸気、
６ａは規制板、７は規制板６ａで規制された蒸気の付着
膜、８は被蒸着基材２に形成された蒸着膜、９は蒸発
源、１０は通電加熱部、１１は真空ポンプ、１２はリー
クポートである。A conventional vacuum vapor deposition apparatus will be described below with reference to the drawings. FIG. 1 is a simple configuration diagram in a vacuum vapor deposition tank of a conventional vacuum vapor deposition apparatus. In FIG. 1, 1 is a vacuum chamber, 2
Is a substrate to be vapor-deposited, 3 is a rotating shaft, 4 is a motor, 5 is steam,
6a is a regulation plate, 7 is a vapor deposition film regulated by the regulation plate 6a, 8 is a vapor deposition film formed on the deposition target substrate 2, 9 is an evaporation source, 10 is an electric heating unit, 11 is a vacuum pump, 12 Is a leak port.
以上のように構成された真空蒸着装置についてその蒸着
方法を説明する。一般的に光ディスクの記録膜形成を行
う蒸着作業は膜にピンホール等の欠陥を発生させないた
めクリーン度１０００以下の室で行なわれている。クリ
ーンな状態が確認された真空槽１内にクリーンな被蒸着
基材２及び規制板６ａをセットする。真空槽１内を真空
ポンプ１１で排気し、真空度１０-5〜１０-6Torrに保っ
た状態で通電加熱部１０にセットした蒸発源９を加熱す
ることにより蒸発源９の一部は蒸気５となり飛び出し、
被蒸着基材２に蒸着膜８が形成される。被蒸着基材以外
に飛んだ蒸気は規制板６ａの内壁面に付着積層し付着膜
７を形成する。このように規制板６ａを設けることによ
り真空槽１の内壁全体に蒸気が付着するのを防ぐ。尚、
膜厚分布を均一にするため蒸着中被蒸着基材２はモータ
ー４によって回転している。The vapor deposition method of the vacuum vapor deposition apparatus configured as described above will be described. In general, the vapor deposition work for forming a recording film of an optical disc is performed in a chamber with a cleanliness of 1000 or less so that defects such as pinholes do not occur in the film. The clean deposition target substrate 2 and the regulation plate 6a are set in the vacuum chamber 1 whose clean state has been confirmed. The inside of the vacuum chamber 1 is evacuated by the vacuum pump 11, and the evaporation source 9 set in the electric heating unit 10 is heated in a state where the degree of vacuum is kept at 10 −5 to 10 −6 Torr. It jumps out to 5,
The vapor deposition film 8 is formed on the vapor deposition base material 2. The vapor that has flowed to other than the vapor-deposited substrate adheres to the inner wall surface of the regulation plate 6a and is laminated to form an adhesion film 7. By thus providing the regulation plate 6a, it is possible to prevent vapor from adhering to the entire inner wall of the vacuum chamber 1. still,
In order to make the film thickness distribution uniform, the deposition target substrate 2 is rotated by the motor 4 during the deposition.
しかしながら、上記のような構成においては規制板６ａ
に積層した付着膜７が蒸着中に剥離し真空槽１内に剥離
片が散らばり被蒸着基材２の蒸着域に付着する。剥離片
が付着した被蒸着基材２に記録膜が蒸着されるとピンホ
ール等になってあらわれるため規制板６ａに積層した付
着膜７が剥離する前にクリーニングされた別の規制板に
取替える必要がある。特に光ディスクの記録膜材料とな
る金属の酸化物等を蒸着した場合、ディスクにして１０
枚程度蒸着すれば剥離しておりその都度真空槽１内の真
空状態を大気圧に戻し規制板６ａを取替えなければなら
ず非能率であり量産性に欠けるという問題点を有してい
た。However, in the above configuration, the regulation plate 6a
The adhered film 7 laminated on is peeled off during the vapor deposition, and the peeled pieces are scattered in the vacuum chamber 1 to be attached to the vapor deposition area of the vapor-deposited substrate 2. When the recording film is vapor-deposited on the vapor-deposited substrate 2 to which the peeling piece is attached, it appears as a pinhole or the like, and therefore it is necessary to replace it with another regulation plate that has been cleaned before the adhesion film 7 laminated on the regulation plate 6a is peeled off. There is. Particularly, when a metal oxide or the like, which is a recording film material for an optical disc, is vapor-deposited,
When vapor-depositing about one sheet, it is peeled off, and the vacuum state in the vacuum chamber 1 must be returned to atmospheric pressure each time and the regulation plate 6a must be replaced, resulting in inefficiency and lack of mass productivity.
発明の目的 本発明の目的は上記従来の蒸着中に飛ぶ蒸気を規制する
方法の欠点をなくし、真空蒸着装置を長時間稼動しても
真空蒸着槽内を高クリーン度に保ちピンホール等の欠陥
のない蒸着膜を形成出来る真空蒸着装置を提供するもの
である。Object of the Invention The object of the present invention is to eliminate the drawbacks of the method of controlling the vapor flying during the above-mentioned conventional vapor deposition, and to maintain a high cleanliness in the vacuum vapor deposition tank even if the vacuum vapor deposition apparatus is operated for a long time, and to prevent defects such as pinholes. The present invention provides a vacuum vapor deposition apparatus capable of forming a vapor-deposited film without a vacuum.
発明の構成 本発明の真空蒸着装置は、蒸着時に発生する被蒸着基材
以外に飛散する蒸気を帯状シート材で囲み、帯状シート
材で囲まれた面に付着させ帯状シート材を順次巻取るこ
とにより積層した付着膜を連続的に処理するように構成
したものであり、これにより蒸着中に被蒸着物以外に飛
散する蒸気を規制すると共に規制付着させた蒸気を、帯
状シート材を巻取ることにより処理し真空槽内の蒸発物
規制範囲を常にクリーンな帯状シート材で囲むことが出
来るため、帯状シート材に積層した付着膜が蒸着時に剥
離して真空槽内を汚すことはなく、真空槽内を常にクリ
ーン状態で維持でき、ピンホール等の欠陥のない蒸着膜
が得られる。Constitution of the invention The vacuum vapor deposition apparatus of the present invention encloses vapors other than the vapor deposition base material generated during vapor deposition in a band-shaped sheet material, attaches the vapor to the surface surrounded by the band-shaped sheet material, and sequentially winds the band-shaped sheet material. It is configured to continuously process the deposited film laminated by the above, and by this, the vapor that is scattered to other than the object to be vaporized during vapor deposition is regulated and the vapor that is regulated and adhered is wound into a strip-shaped sheet material. Since the evaporative substance regulation range in the vacuum tank can always be surrounded by a clean strip-shaped sheet material, the adhered film laminated on the strip-shaped sheet material does not peel off at the time of vapor deposition and contaminate the inside of the vacuum tank. The inside can always be maintained in a clean state, and a vapor-deposited film free from defects such as pinholes can be obtained.
実施例の説明 以下本発明の一実施例について、図面を参照にしながら
説明する。Description of Embodiments One embodiment of the present invention will be described below with reference to the drawings.
第２図は本発明の一実施例における真空蒸着装置の真空
蒸着槽内の構成図を示すものである。第２図において１
３は真空槽、１４は被蒸着基材、１５は回転軸、１６は
モーター、１７は蒸気、１８は帯状シート材、１９は帯
状シート材１８で規制された蒸気の付着膜、２０は被蒸
着基材１４に形成された蒸着膜、２１は蒸発源、２２は
通電加熱部、２３は真空ポンプ、２４はリークポート、
２５は帯状シート材１８の供給リール、２６は帯状シー
ト材１８の巻取りリール、２７は帯状シート材１８の送
りガイドローラー、２８は遮へい板である。FIG. 2 is a diagram showing the inside of the vacuum vapor deposition tank of the vacuum vapor deposition apparatus in one embodiment of the present invention. 1 in FIG.
3 is a vacuum tank, 14 is a substrate to be vapor-deposited, 15 is a rotating shaft, 16 is a motor, 17 is steam, 18 is a strip-shaped sheet material, 19 is a vapor deposition film regulated by the strip-shaped sheet material 18, and 20 is a vapor deposition target. A vapor deposition film formed on the base material 14, 21 is an evaporation source, 22 is an electric heating unit, 23 is a vacuum pump, 24 is a leak port,
Reference numeral 25 is a supply reel for the strip-shaped sheet material 18, 26 is a take-up reel for the strip-shaped sheet material 18, 27 is a feed guide roller for the strip-shaped sheet material 18, and 28 is a shield plate.
以上のように構成された本実施例の真空蒸着装置につい
て以下その蒸着方法を説明する。光ディスクの記録膜等
の蒸着はピンホールの発生が重大欠陥となるため蒸着作
業はクリーンルーム内で行なわれている。そのため真空
槽１３内も常にクリーンな状態に管理されている。第２
図においてまずアルミ箔，銅箔等の金属箔またはフィル
ムを使用した帯状シート材１８を供給リール２５にセッ
トし送りガイドローラー２７に添わせて巻取りリール２
６に巻取らせるように準備する。被蒸着基材１４を回転
軸１５にセットした状態で真空槽１３内を真空ポンプ２
３で真空度10-5〜10-6Torr程度まで排気し、蒸発源２１
を通電加熱することにより蒸発源２１の表面から蒸気１
７が放射線状に飛び被蒸着基材１４に蒸着膜２０が形成
される。被蒸着基材１４以外に飛散した蒸気１７は巻取
りリール２６を回転させることにより順次送られてくる
帯状シート材１８に付着膜７として積層する。帯状シー
ト材１８に積層した付着膜１９は帯状シート材１８に付
着したまま巻取りリール２６により巻取られるため真空
槽１３内の蒸気規制範囲には常にクリーンな帯状シート
材１８が配備される。よって蒸着中の真空槽１３内で規
制された付着膜１９が剥離し散ばることがないため真空
槽１３内を連続かつ長時間クリーン状態に維持出来る。The vapor deposition method of the vacuum vapor deposition apparatus of the present embodiment configured as described above will be described below. The vapor deposition of recording films of optical discs is performed in a clean room because pinholes are a serious defect. Therefore, the inside of the vacuum chamber 13 is always managed in a clean state. Second
In the figure, first, a strip-shaped sheet material 18 using a metal foil such as an aluminum foil or a copper foil or a film is set on a supply reel 25 and is attached to a feed guide roller 27, and the take-up reel 2 is used.
Prepare to be wound on 6. The vacuum pump 2 is installed in the vacuum chamber 13 with the vapor deposition substrate 14 set on the rotary shaft 15.
Evacuate to a vacuum degree of 10 -5 to 10 -6 Torr at 3 to evaporate 21
The vapor is heated from the surface of the evaporation source 21 by heating
The vapor deposition film 20 is formed on the substrate 14 to be vapor-deposited in a radial pattern. The vapor 17 scattered other than the vapor-deposited base material 14 is laminated as an adhesion film 7 on the belt-shaped sheet material 18 sequentially fed by rotating the take-up reel 26. The adhering film 19 laminated on the belt-shaped sheet material 18 is wound by the take-up reel 26 while being attached to the belt-shaped sheet material 18, so that a clean belt-shaped sheet material 18 is always provided in the vapor regulation range in the vacuum tank 13. Therefore, the adhered film 19 regulated in the vacuum chamber 13 during vapor deposition does not peel off and scatter, so that the vacuum chamber 13 can be continuously maintained in a clean state for a long time.
以上のように本実施例によれば蒸着中の蒸気１７は巻取
り可能な帯状シート材１８で規制したことにより、真空
蒸着装置を長時間連続運転しても真空蒸着槽内を高クリ
ーン度に保ちピンホール等の欠陥のない蒸着膜の形成を
実現している。As described above, according to the present embodiment, the vapor 17 during vapor deposition is regulated by the strip-shaped sheet material 18 that can be wound, so that the inside of the vacuum vapor deposition tank can be kept highly clean even if the vacuum vapor deposition apparatus is continuously operated for a long time. It realizes the formation of vapor-deposited film without defects such as pinholes.
発明の効果 以上の説明から明らかなように、本発明は被蒸着物以外
に飛散する蒸気で真空槽の内壁全体を汚さないように設
けられた規制板を巻取り可能な帯状シート材で構成して
いるので飛散した蒸気を巻取りながら連続的に処理する
ことにより、真空槽内を常にクリーンな状態に維持出来
るという優れた効果が得られる。その効果により被蒸着
基材に形成された蒸着膜にピンホール等の欠陥がなくな
り高品質な膜が安定して供給出来る。また連続蒸着装置
においては蒸気の付着した規制板を頻繁に取替える必要
がないため長時間連続的な蒸着が可能となり生産性が向
上するという効果が得られる。EFFECTS OF THE INVENTION As is apparent from the above description, the present invention is composed of a strip-shaped sheet material capable of winding a regulation plate provided so as not to contaminate the entire inner wall of the vacuum chamber with vapor other than the vapor deposition object. Therefore, it is possible to obtain an excellent effect that the inside of the vacuum chamber can always be kept in a clean state by continuously processing while winding the scattered vapor. Due to the effect, defects such as pinholes are eliminated in the vapor deposition film formed on the substrate to be vapor deposited, and a high quality film can be stably supplied. Further, in the continuous vapor deposition apparatus, since it is not necessary to frequently replace the regulation plate to which the vapor adheres, the vapor deposition can be continuously performed for a long time, and the productivity can be improved.
第１図は従来の真空蒸着装置の真空槽内の構成図、第２
図は本発明の一実施例における真空蒸着装置の真空槽内
の構成図である。 １３……真空槽、１４……被蒸着基材、１５……回転
軸、１６……モーター、１７……蒸気、１８……帯状シ
ート材、１９……付着膜、２１……蒸発源、２２……通
電加熱部、２３……真空ポンプ、２５……供給リール、
２６……巻取りリール、２７……ガイドローラー。FIG. 1 is a block diagram of the inside of a vacuum chamber of a conventional vacuum deposition apparatus, and FIG.
FIG. 1 is a configuration diagram of the inside of a vacuum chamber of a vacuum vapor deposition apparatus in one embodiment of the present invention. 13 ... vacuum tank, 14 ... deposited substrate, 15 ... rotary shaft, 16 ... motor, 17 ... steam, 18 ... band sheet material, 19 ... adhesive film, 21 ... evaporation source, 22 ...... Electrical heating section, 23 ... Vacuum pump, 25 ... Supply reel,
26: take-up reel, 27: guide roller.
Claims (1)
熱部とを有する真空槽と、前記真空槽内に設けられた帯
状シート部材を供給する供給部と、前記供給部から供給
される前記帯状シート部材を順次巻取る巻取り部とを有
し、前記被蒸着基材以外に飛散する蒸気を前記帯状シー
ト部材に付着させるように規制して前記蒸気を順次巻取
って処理することを特徴とした真空蒸着装置。1. A vacuum chamber having a holding / rotating unit for a substrate to be vapor-deposited and an electric heating unit for an evaporation source, a supply unit for supplying a belt-shaped sheet member provided in the vacuum chamber, and a supply unit for supplying the strip-shaped sheet member. And a winding unit that sequentially winds the strip-shaped sheet member, and regulates so that vapors other than the vapor-deposited substrate adhere to the strip-shaped sheet member and sequentially winds the vapors for processing. A vacuum vapor deposition device characterized in that.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9687984A JPH0630179B2 (en) | 1984-05-15 | 1984-05-15 | Vacuum deposition equipment |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP9687984A JPH0630179B2 (en) | 1984-05-15 | 1984-05-15 | Vacuum deposition equipment |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS60239951A JPS60239951A (en) | 1985-11-28 |
| JPH0630179B2 true JPH0630179B2 (en) | 1994-04-20 |
Family
ID=14176698
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9687984A Expired - Lifetime JPH0630179B2 (en) | 1984-05-15 | 1984-05-15 | Vacuum deposition equipment |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0630179B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2002038253A (en) * | 2000-07-25 | 2002-02-06 | Futaba Corp | Deposition shield and vacuum film-formation equipment therewith |
| JP2007126727A (en) * | 2005-11-07 | 2007-05-24 | Hitachi Zosen Corp | Vacuum deposition preventive equipment |
| JP5803488B2 (en) * | 2011-09-22 | 2015-11-04 | 凸版印刷株式会社 | Film forming method and film forming apparatus on flexible substrate by atomic layer deposition method |
-
1984
- 1984-05-15 JP JP9687984A patent/JPH0630179B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS60239951A (en) | 1985-11-28 |
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