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JPH0630233B2 - Surface analyzer - Google Patents
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JPH0630233B2 - Surface analyzer - Google Patents

Surface analyzer

Info

Publication number
JPH0630233B2
JPH0630233B2 JP59230832A JP23083284A JPH0630233B2 JP H0630233 B2 JPH0630233 B2 JP H0630233B2 JP 59230832 A JP59230832 A JP 59230832A JP 23083284 A JP23083284 A JP 23083284A JP H0630233 B2 JPH0630233 B2 JP H0630233B2
Authority
JP
Japan
Prior art keywords
sample
thin film
magnet
sample holder
incident
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
JP59230832A
Other languages
Japanese (ja)
Other versions
JPS61109252A (en
Inventor
啓義 副島
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Shimadzu Corp
Original Assignee
Shimadzu Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Shimadzu Corp filed Critical Shimadzu Corp
Priority to JP59230832A priority Critical patent/JPH0630233B2/en
Publication of JPS61109252A publication Critical patent/JPS61109252A/en
Publication of JPH0630233B2 publication Critical patent/JPH0630233B2/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02Details
    • H01J37/20Means for supporting or positioning the object or the material; Means for adjusting diaphragms or lenses associated with the support

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は、例えばEPMA(電子線マイクロアナライ
ザ)のように、試料に電子線照射を行なって表面分析を
行なう装置において、試料、特に薄膜試料を保持する試
料保持台に関する。
The present invention relates to a sample, particularly a thin film sample, in an apparatus such as an EPMA (electron beam microanalyzer) for irradiating a sample with an electron beam for surface analysis. The present invention relates to a sample holding table that holds the.

(従来の技術) EPMAなどの表面分析装置において、薄膜試料を測定
する場合、薄膜試料はその縁部が支持され測定部は空間
に保持されるか、バルクの試料保持台に保持される。
(Prior Art) When measuring a thin film sample in a surface analyzer such as EPMA, the thin film sample is supported at its edge and the measurement part is held in a space, or held on a bulk sample holder.

(発明が解決しようとする問題点) 分析試料が薄膜の場合、入射電子のエネルギーが相対的
に高すぎてイオン化率が小さい(副島啓義 博士論文
(大阪大学、1979年)第4章参照)。
(Problems to be Solved by the Invention) When the analysis sample is a thin film, the energy of incident electrons is relatively high and the ionization rate is small (see Chapter 4 of Dr. Hiroyoshi Soejima (Osaka University, 1979)).

第3図に示されるように、試料1が空間に保持された場
合には、入射電子2のうち試料1を透過した電子4は試
料1のイオン化には勿論寄与しない。3はイオン化に伴
なって発生したX線である。また、第4図に示されるよ
うに、試料1がバルクの試料保持台5に保持された場合
には、試料1を透過した電子4の一部が試料保持台5で
反射され、反射電子6となって再び試料1に入射し試料
1のイオン化に寄与するが、その寄与の程度は大きくな
い。
As shown in FIG. 3, when the sample 1 is held in space, the electrons 4 of the incident electrons 2 that have passed through the sample 1 do not contribute to the ionization of the sample 1. Reference numeral 3 is an X-ray generated along with ionization. Further, as shown in FIG. 4, when the sample 1 is held on the bulk sample holder 5, some of the electrons 4 that have passed through the sample 1 are reflected by the sample holder 5 and the reflected electrons 6 are reflected. Then, it again enters the sample 1 and contributes to the ionization of the sample 1, but the degree of the contribution is not large.

このように、薄膜試料の場合には、試料励起効率が悪
く、信号(EPMAの場合はX線)の発生強度が小さ
く、したがって検出感度が低いという問題がある。
As described above, in the case of a thin film sample, there are problems that the sample excitation efficiency is low, the intensity of the signal (X-ray in the case of EPMA) is small, and the detection sensitivity is low.

本発明は、電子線照射を行なう表面分析装置において、
薄膜試料の分析感度を高めることを目的とするものであ
る。
The present invention provides a surface analysis device that performs electron beam irradiation,
The purpose is to increase the analytical sensitivity of a thin film sample.

(問題点を解決するための手段) 本発明は試料保持台を改良することにより上記問題点を
解決しようとするものであって、その試料保持台は、少
なくとも試料を保持する部分が磁区の貫通した磁石にて
形成されており、その磁石の磁区方向が電子線の入射方
向に対し概して直角方向に向けられ、かつ、その磁石の
試料固着面は試料を透過した入射電子がその磁石内の磁
界によるローレンツ力で曲げられて試料に戻される方向
に傾斜して設置されている試料保持台である。
(Means for Solving Problems) The present invention is intended to solve the above problems by improving a sample holder, and the sample holder has at least a portion for holding a sample that penetrates a magnetic domain. The magnet is oriented so that the magnetic domain direction of the magnet is generally perpendicular to the direction of incidence of the electron beam, and the sample fixing surface of the magnet is such that the incident electrons transmitted through the sample The sample holder is installed so as to be tilted in the direction in which the sample is bent by the Lorentz force and returned to the sample.

(作用) 薄膜試料を透過した電子は試料保持台の磁石からの磁界
によりローレンツ力を受けて曲げられ、その磁石の表面
から出て再び薄膜試料に入射する反射電子となる割合が
増大する。
(Function) Electrons that have passed through the thin film sample are bent by the Lorentz force due to the magnetic field from the magnet of the sample holder, and the proportion of the electrons that emerge from the surface of the magnet and enter the thin film sample again increases.

(実施例) 第1図は一実施例を表わす。7は永久磁石にてなる試料
保持台であり、表面に薄膜試料1が固着される。この試
料保持台7をEPMAのような表面分析装置に設置する
ときは、入射電子2の入射方向に対して直角方向とし、
かつ、その試料保持台7の表面(薄膜試料1が固着され
ている面)を入射電子2が試料保持台7中でローレンツ
力により曲げられる方向に傾斜して設置する。すなわ
ち、第1図において、入射電子2が上方から入射してく
るとし、試料保持台7の磁区の方向を紙面に対し裏面か
ら表面へ向う方向とした場合には、試料保持台7の表面
を図のように水平より右下りに傾斜させて設置する。M
sは磁化の状態を示す。
(Embodiment) FIG. 1 shows an embodiment. Reference numeral 7 is a sample holder made of a permanent magnet, and the thin film sample 1 is fixed on the surface. When the sample holder 7 is installed in a surface analyzer such as EPMA, the sample holder 7 is set in a direction perpendicular to the incident direction of the incident electrons 2.
Moreover, the surface of the sample holder 7 (the surface to which the thin film sample 1 is fixed) is installed so as to be inclined in the direction in which the incident electrons 2 are bent in the sample holder 7 by the Lorentz force. That is, in FIG. 1, assuming that the incident electrons 2 are incident from above, and the direction of the magnetic domains of the sample holder 7 is from the back surface to the surface with respect to the paper surface, the surface of the sample holder 7 is As shown in the figure, install it by inclining to the right from the horizontal. M
s indicates the state of magnetization.

第1図のように設置された永久磁石の試料保持台7に薄
膜試料1を固着して電子2を照射すると、入射電子2が
薄膜試料1を励起するだけでなく、薄膜試料1を透過し
た電子は試料保持台7内でローレンツ力を受けて大半が
薄膜試料1の方向へ散乱されてくるので、再び薄膜試料
1へ入射して薄膜試料1を励起する反射電子6となる確
率が高くなる。すなわち、入射電子2のイオン化率が大
幅に向上する。
When the thin film sample 1 is fixed to the sample holder 7 of the permanent magnet installed as shown in FIG. 1 and the electron 2 is irradiated, the incident electron 2 not only excites the thin film sample 1 but also penetrates the thin film sample 1. Most of the electrons receive Lorentz force in the sample holder 7 and are scattered toward the thin film sample 1, so that the probability of becoming the reflected electrons 6 that enter the thin film sample 1 again and excite the thin film sample 1 becomes high. . That is, the ionization rate of the incident electrons 2 is significantly improved.

第2図は他の実施例を表わす。この試料保持台は、磁性
をもたないバルクの部分10に永久磁石11が埋め込ま
れて構成され、薄膜試料1は永久磁石11の表面に固着
されるようになっている。
FIG. 2 shows another embodiment. This sample holder is configured by embedding a permanent magnet 11 in a bulk portion 10 having no magnetism, and the thin film sample 1 is fixed to the surface of the permanent magnet 11.

この試料保持台がEPMAなどの表面分析装置に設置さ
れるときの永久磁石11の磁区の方向及び表面の傾斜の
方向は第1図と同じである。
The direction of the magnetic domains of the permanent magnet 11 and the direction of the surface inclination when the sample holder is installed in a surface analyzer such as EPMA are the same as those in FIG.

尚、第1図及び第2図において、永久磁石7,11の磁
区の方向は入射電子2の入射方向に対し直角であること
が最も好ましいが、若干傾斜していても実用上差し支え
がなく、したがって、本発明はそのような場合も含んで
いる。
1 and 2, the direction of the magnetic domains of the permanent magnets 7 and 11 is most preferably at right angles to the incident direction of the incident electrons 2, but there is no practical problem even if they are slightly inclined. Therefore, the present invention includes such cases.

更に他の実施例としては、第1図又は第2図の永久磁石
を電磁石としてもよい。
As still another embodiment, the permanent magnet shown in FIG. 1 or 2 may be an electromagnet.

(発明の効果) 本発明によれば、薄膜試料を透過した電子が試料保持台
の磁石の磁界からローレンツ力を受けて再び薄膜試料に
入射してくるので、従来のように薄膜試料を空間に保持
したり磁性をもたない試料保持台に保持する場合に比較
して、薄膜試料の励起効率が向上し、検出感度が向上す
る。
(Effect of the Invention) According to the present invention, the electrons that have passed through the thin film sample receive the Lorentz force from the magnetic field of the magnet of the sample holder and enter the thin film sample again. The excitation efficiency of the thin film sample is improved and the detection sensitivity is improved as compared with the case of holding the sample or holding it on a sample holder that does not have magnetism.

【図面の簡単な説明】[Brief description of drawings]

第1図及び第2図はそれぞれ実施例を示す断面図、第3
図及び第4図はそれぞれ従来例を示す断面図である。 1……薄膜試料、2……入射電子、 6……反射電子、7,11……永久磁石。
1 and 2 are sectional views showing an embodiment, respectively.
FIG. 4 and FIG. 4 are sectional views showing a conventional example. 1 ... Thin film sample, 2 ... Incident electron, 6 ... Reflected electron, 7, 11 ... Permanent magnet.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】試料の励起源として電子線を使用する表面
分析装置において、 試料が固着される試料保持台を備え、その試料保持台の
少なくとも試料を保持する部分は磁区が貫通した磁石に
て形成されており、その磁石の磁区方向が電子線の入射
方向に対し概して直角方向に向けられ、かつ、その磁石
の試料固着面は試料を透過した入射電子がその磁石内の
磁界によるローレンツ力で曲げられて試料に戻される方
向に傾斜して設置されていることを特徴とする表面分析
装置。
1. A surface analyzer using an electron beam as an excitation source for a sample, comprising a sample holder on which a sample is fixed, and at least a portion of the sample holder which holds the sample is a magnet having a magnetic domain penetrating therethrough. The magnetic domain direction of the magnet is oriented almost at right angles to the incident direction of the electron beam, and the sample fixing surface of the magnet is such that the incident electrons transmitted through the sample are Lorentz force by the magnetic field in the magnet. A surface analysis device, which is installed so as to be inclined in a direction in which it is bent and returned to a sample.
JP59230832A 1984-10-31 1984-10-31 Surface analyzer Expired - Fee Related JPH0630233B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP59230832A JPH0630233B2 (en) 1984-10-31 1984-10-31 Surface analyzer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP59230832A JPH0630233B2 (en) 1984-10-31 1984-10-31 Surface analyzer

Publications (2)

Publication Number Publication Date
JPS61109252A JPS61109252A (en) 1986-05-27
JPH0630233B2 true JPH0630233B2 (en) 1994-04-20

Family

ID=16913973

Family Applications (1)

Application Number Title Priority Date Filing Date
JP59230832A Expired - Fee Related JPH0630233B2 (en) 1984-10-31 1984-10-31 Surface analyzer

Country Status (1)

Country Link
JP (1) JPH0630233B2 (en)

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS57196465A (en) * 1981-05-28 1982-12-02 Nichidenshi Tekunikusu:Kk Scanning electron microscope

Also Published As

Publication number Publication date
JPS61109252A (en) 1986-05-27

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