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JPH0632352B2 - Glass cloth processing method - Google Patents
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JPH0632352B2 - Glass cloth processing method - Google Patents

Glass cloth processing method

Info

Publication number
JPH0632352B2
JPH0632352B2 JP60234341A JP23434185A JPH0632352B2 JP H0632352 B2 JPH0632352 B2 JP H0632352B2 JP 60234341 A JP60234341 A JP 60234341A JP 23434185 A JP23434185 A JP 23434185A JP H0632352 B2 JPH0632352 B2 JP H0632352B2
Authority
JP
Japan
Prior art keywords
glass cloth
glass
present
printed wiring
wiring board
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
JP60234341A
Other languages
Japanese (ja)
Other versions
JPS6293992A (en
Inventor
盛隆 池田
尚利 川上
太郎 徳沢
逸雄 田中
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Unitika Ltd
Original Assignee
Unitika Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Unitika Ltd filed Critical Unitika Ltd
Priority to JP60234341A priority Critical patent/JPH0632352B2/en
Publication of JPS6293992A publication Critical patent/JPS6293992A/en
Publication of JPH0632352B2 publication Critical patent/JPH0632352B2/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05KPRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00Printed circuits
    • H05K1/02Details
    • H05K1/03Use of materials for the substrate
    • H05K1/0313Organic insulating material
    • H05K1/0353Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement
    • H05K1/0366Organic insulating material consisting of two or more materials, e.g. two or more polymers, polymer + filler, + reinforcement reinforced, e.g. by fibres, fabrics

Landscapes

  • Surface Treatment Of Glass Fibres Or Filaments (AREA)
  • Chemical Or Physical Treatment Of Fibers (AREA)
  • Reinforced Plastic Materials (AREA)

Description

【発明の詳細な説明】 (産業上の利用分野) 本発明は,耐熱性,寸法安定性にすぐれたプリント配線
基板を製造するためのガラスクロスの処理方法に関する
ものである。
TECHNICAL FIELD The present invention relates to a glass cloth treatment method for producing a printed wiring board having excellent heat resistance and dimensional stability.

(従来の技術)(発明が解決しようとする問題点) ガラスクロスを用いたプリント配線基板の製造は,ガラ
スクロスを有機シラン処理した後,エポキシ樹脂等のワ
ニスを含浸し,次いで,熱処理することにより半硬化状
態の,いわゆるプリプレグを製造し,引き続き所定の寸
法に裁断後,これを数枚重ねた上にさらに片面ないし両
面に銅箔を重ねて熱プレスを施して銅張り積層板を作成
することからスタートする。
(Prior Art) (Problems to be Solved by the Invention) In the production of a printed wiring board using a glass cloth, the glass cloth is treated with an organic silane, then impregnated with a varnish such as an epoxy resin, and then heat treated. So-called prepreg in semi-cured state is manufactured by the following, and after cutting it to a predetermined size, several sheets of this are piled up and copper foil is further laminated on one side or both sides and hot press is applied to form a copper-clad laminate. Start from that.

プリント配線基板を実装した機器は,高密度化が一段と
進み,小型化が進んでいるが,それに伴いプリント配線
基板に対する耐熱性や寸法安定性などの性能向上が強く
望まれてきた。ガラスクロスを用いたプリント配線基板
の耐熱性や寸法安定性は,ガラスクロスの品質ばかりで
なく,ガラスクロスとワニスの接着性やワニスの含浸の
均一度に依存するといわれており,例えば,ワニスの含
浸の不充分な場合には,高温下におけるブリスター(界
面剥離)やミーズリング(交絡点の剥離)を起こすこと
が知られている。
Devices mounted with a printed wiring board are becoming higher in density and smaller in size, and along with this, improvement in performance such as heat resistance and dimensional stability of the printed wiring board has been strongly desired. It is said that the heat resistance and dimensional stability of a printed wiring board using a glass cloth depend not only on the quality of the glass cloth but also on the adhesiveness between the glass cloth and the varnish and the uniformity of the varnish impregnation. It is known that when the impregnation is insufficient, blister (interfacial peeling) and measling (peeling at the entanglement points) occur at high temperature.

ガラスクロスに対するワニスの均一な含浸と接着性の向
上は,ガラスクロスをシランカップリング剤等で処理す
る方法が有効であることも知られており,シランカップ
リング剤の種類や調合条件の改良などが試みられてきた
が,いずれの方法においても未だ満足すべき結果は得ら
れておらず,さらに改善が望まれていた。
It is known that the method of treating glass cloth with a silane coupling agent is effective for the uniform impregnation of the varnish and the improvement of adhesion to the glass cloth. However, satisfactory results have not yet been obtained by any of the methods, and further improvement is desired.

本発明は,このような従来技術の欠点を解消し,ガラス
クロスを用いた耐熱性と寸法安定性にすぐれたプリント
配線基板を提供することを目的とするものである。
SUMMARY OF THE INVENTION It is an object of the present invention to solve the above-mentioned drawbacks of the prior art and to provide a printed wiring board that uses glass cloth and is excellent in heat resistance and dimensional stability.

(問題点を解決するための手段) 本発明者らは,このような問題点を解決するために鋭意
検討の結果,低温プラズマ処理が有効であることを見出
し,本発明に到達した。
(Means for Solving Problems) As a result of intensive studies for solving such problems, the present inventors have found that low temperature plasma treatment is effective and arrived at the present invention.

すなわち,本発明は,ガラスクロスを有機シラン処理
し,次いで,低温プラズマ処理することを特徴とするプ
リント配線基板用ガラスクロスの処理方法に関するもの
である。
That is, the present invention relates to a method for treating a glass cloth for a printed wiring board, which comprises subjecting the glass cloth to an organosilane treatment and then a low temperature plasma treatment.

以下に,本発明を詳細に説明する。The present invention will be described in detail below.

本発明でいうガラスクロスとは,Eガラス,Cガラス,
Sガラス等,各種のガラス成分組成をもつガラス長繊維
を用いて製織された織物であり,平織,綾織,朱子織な
どの各種織物をいう。本発明で用いられるガラス長繊維
のフィラメント径は,数ミクロンから数十ミクロンが好
ましい。本発明で用いられるガラスクロスは,かかるガ
ラス長織維を複数本合わせて得られるガラスヤーンを通
常の織物製造と同様に製経工程,糊付工程にかけた後製
織して得られるものである。ガラスクロスの経糸と緯糸
の単位長さ当りの本数,厚さ,単位面積当りの重量とし
ては,日本工業規格のR3414やアメリカ軍用規格(MI
L規格)に適合するものならばいかなるものでも使用で
きるが,例えば,クロス厚さは20ミクロンないし25
0ミクロンで,重さは1平方メートル当り30gないし
300gの範囲のものが望ましい。また,ガラス成分と
しては,無アルカリガラスのEガラスが望ましい。
The glass cloth referred to in the present invention means E glass, C glass,
It is a woven fabric woven using long glass fibers having various glass component compositions such as S glass, and refers to various woven fabrics such as plain weave, twill weave and satin weave. The filament diameter of the long glass fiber used in the present invention is preferably several microns to several tens of microns. The glass cloth used in the present invention is obtained by subjecting a glass yarn obtained by combining a plurality of such glass long fibers to a warping step and a sizing step in the same manner as in ordinary woven fabric production, and then weaving. The number, thickness, and weight per unit area of the warp and weft of the glass cloth per unit length are Japanese Industrial Standard R3414 and American Military Standard (MI).
Any material that conforms to the L standard) can be used, but for example, the cross thickness is 20 microns to 25
It is preferably 0 microns and weighs in the range of 30 to 300 g per square meter. As the glass component, non-alkali glass E glass is desirable.

通常,ガラスクロスには製織に必要な有機のバインダー
や糊剤が付着しており,そのままではプリント基板向の
ガラスクロスとして使用できないため,これらの有機物
を完全に除去する必要がある。これらの有機物を除去す
る方法としては,約600℃の炉に通したり,350〜
400℃の炉の中に回分式で数十時間処理する方法(こ
れらをヒートクリーニング処理という),あるいは糊抜
の薬剤を用いる湿式処理方法等が挙げられる。
Usually, an organic binder or sizing agent necessary for weaving is attached to the glass cloth, and it cannot be used as it is as a glass cloth for a printed circuit board. Therefore, it is necessary to completely remove these organic substances. As a method for removing these organic substances, a furnace at about 600 ° C. or 350-
Examples of the method include a batch method for several tens of hours in a furnace at 400 ° C. (these are referred to as heat cleaning processing), and a wet processing method using a desizing agent.

ヒートクリーニング処理等により有機物を除去したガラ
スクロスは,続いて,積層板用ワニスとの接着力や密着
性を向上させるために,有機シランを主成分とする表面
処理剤で処理される。本発明方法において使用する有機
シランは,一般式RnSiX(4-n) で表わされるものであ
る。この式において,Xは任意の一価の加水分解し得る
基,例えば,ハロゲン原子,アルコキシ基およびアシロ
キシ基であり,nは1〜3である。nが1あるいは2に
おいては,Xは互いに同一のものでも異なっていてもよ
い。また,Rは少なくとも炭素原子を一つ有する基であ
り,炭素原子に結合する水素原子は,アミノ基,エポキ
シ基,メルカプト基およびビニル基等の反応性を有する
基で置換されていてもよい。また,本発明で使用する有
機シランは,二種以上を混合して使用してもよい。
The glass cloth from which organic substances have been removed by heat cleaning or the like is subsequently treated with a surface treatment agent containing organosilane as a main component in order to improve the adhesive force and the adhesiveness with the varnish for laminates. The organosilane used in the method of the present invention is represented by the general formula RnSiX (4-n) . In this formula, X is any monovalent hydrolyzable group, such as a halogen atom, an alkoxy group and an acyloxy group, and n is 1 to 3. When n is 1 or 2, X's may be the same or different. R is a group having at least one carbon atom, and the hydrogen atom bonded to the carbon atom may be substituted with a reactive group such as an amino group, an epoxy group, a mercapto group and a vinyl group. The organosilane used in the present invention may be used as a mixture of two or more kinds.

前記一般式で表わされる代表的な有機シランとしては,
例えば,γ−グリシドオキシプロピルトリメトキシシラ
ン,γ−メルカプトプロピルトリメトキシシラン,γ−
アミノプロピルトリエトキシシラン,N−β−(アミノ
エチル)−γ−アミノプロピルトリメトキシシラン,N
−β−(N−ビニルベンジルアミノエチル)−γ−アミ
ノプロピルトリメトキシシラン,γ−(フェニルアミ
ノ)プロピルトリメトキシシラン,フェニルトリメトキ
シシランおよびメチルトリメトキシシラン等が挙げられ
る。
As a typical organosilane represented by the above general formula,
For example, γ-glycidoxypropyltrimethoxysilane, γ-mercaptopropyltrimethoxysilane, γ-
Aminopropyltriethoxysilane, N-β- (aminoethyl) -γ-aminopropyltrimethoxysilane, N
Examples include -β- (N-vinylbenzylaminoethyl) -γ-aminopropyltrimethoxysilane, γ- (phenylamino) propyltrimethoxysilane, phenyltrimethoxysilane and methyltrimethoxysilane.

これらの有機シランは,通常水溶液またはアルコール
類,ケトン類,グリコールエーテル類等の有機溶剤と水
との混合溶液として,0.01〜5重量%程度の濃度に
調整して使用される。
These organic silanes are usually used as an aqueous solution or a mixed solution of an organic solvent such as alcohols, ketones, glycol ethers and water and adjusted to a concentration of about 0.01 to 5% by weight.

有機シランを主成分とする表面処理剤をガラスクロスに
適用する方法としては,浸漬法,噴霧法,ガス化法など
任意の公知の方法が採用できる。一般に多用される浸漬
法では,例えば,室温に近い温度でガラスクロスを有機
シラン溶液へ数秒間浸漬した後,マングルで絞り,続い
て80〜180℃で数分間乾燥キュアリングすることに
より,有機シランが0.01〜2重量%程度付与された
ガラスクロスを得る。
As a method of applying the surface treatment agent containing organosilane as a main component to the glass cloth, any known method such as a dipping method, a spraying method, or a gasification method can be adopted. In the commonly used dipping method, for example, the glass cloth is dipped in the organic silane solution at a temperature close to room temperature for several seconds, squeezed with a mangle, and then dried and cured at 80 to 180 ° C. for several minutes. To obtain a glass cloth having about 0.01 to 2% by weight.

本発明方法では,この有機シラン処理したガラスクロス
にさらに低温プラズマ処理を施す。低温プラズマ処理条
件としては,一般に公知の処理条件が採用される。例え
ば,温度としては室温〜百数十度,圧力としては0.1
〜1torr,周波数としては数〜数十メガヘルツ,電極単
位面積当りの出力としては0.1〜10kw/cm2,処理
時間としては数秒〜数十分の範囲が好ましい。
In the method of the present invention, this organosilane-treated glass cloth is further subjected to low-temperature plasma treatment. Generally known processing conditions are adopted as the low-temperature plasma processing conditions. For example, the temperature is room temperature to hundreds of degrees, and the pressure is 0.1
The frequency is preferably several to several tens of megahertz, the output per unit area of the electrode is 0.1 to 10 kw / cm 2 , and the processing time is preferably several seconds to several tens of minutes.

この低温プラズマ処理は,回分式でも連続式でも行え
る。
This low temperature plasma treatment can be performed either batchwise or continuously.

本発明の方法で得られたガラスクロスは,ワニス含浸
後,乾燥,キュアしてプリプレグし,次いで,プレスし
てプリント配線板用の積層板に加工される。
The glass cloth obtained by the method of the present invention is impregnated with varnish, dried, cured and prepreged, and then pressed to be processed into a laminated board for a printed wiring board.

(実施例) 次に本発明を実施例によって説明するが,本発明におけ
る各性能評価は次の方法によって行った。
(Examples) Next, the present invention will be described with reference to Examples. Each performance evaluation in the present invention was performed by the following methods.

(1) 寸法安定性 JIS C−6486によって評価した。(1) Dimensional stability It was evaluated according to JIS C-6486.

(2) 含浸性 トリアセテートフィルムを張ったガラス板にガラスクロ
スを置き,このガラスクロスにエポキシ樹脂を載せてか
ら3分後の透過光の強さと,空試験の透過光の強さを測
定し,上式で算出される透過度により評価した。
(2) Impregnating property Place the glass cloth on the glass plate with the triacetate film, measure the intensity of the transmitted light 3 minutes after placing the epoxy resin on the glass cloth, and the intensity of the transmitted light in the blank test, and calculate by the above formula. It was evaluated by the transmittance.

(3) 耐熱性 積層板を常圧で煮沸後,260℃の半田浴槽に30秒間
浸漬し,取り出した後の積層板の界面剥離(ブリスタ
ー),ガラスクロスの交絡点の剥離(ミーズリング)を
調べ,剥離の発生する煮沸時間を耐熱保持時間とする。
試験片は50mm×50mmとする。
(3) Heat resistance After boiling the laminated plate at normal pressure, soak it in a solder bath at 260 ° C for 30 seconds, and remove the interface between the laminated plate (blister) and the entanglement point of glass cloth (measling). The boiling time at which peeling occurs is taken as the heat-resistant holding time.
The test piece is 50 mm × 50 mm.

実施例1 ヒートクリーニング処理を施したガラスクロス(経糸G
75 1/0 1Z,緯糸G75 1/0 1Z;経糸密度44本/イン
チ,緯糸密度33本/インチ)を用意し,アミノシラン0.
1重量%水溶液に浸漬後,ガラスクロス100重量部に
対して水溶液30重量部になるようにマングルで均一に
絞った。続いて,熱風乾燥機で150℃にて2分間乾燥
キュアリングし,アミノシラン処理ガラスクロスを得
た。
Example 1 Glass cloth (warp G
75 1/0 1Z, weft G75 1/0 1Z; warp density 44 yarns / inch, weft yarn density 33 yarns / inch), aminosilane 0.
After soaking in a 1% by weight aqueous solution, the solution was uniformly squeezed with a mangle so that the amount of the aqueous solution was 30 parts by weight with respect to 100 parts by weight of glass cloth. Then, it was dried and cured at 150 ° C. for 2 minutes with a hot air dryer to obtain an aminosilane-treated glass cloth.

次に,このガラスクロスを並行平型電極を内部に設置し
た真空容器内に入れ,真空ポンプで排気減圧して1.0
torrの真空度とし,13.56MHzの高周波電源よりマ
ッチング回路を通して電極に高周波を0.5kw/cm2
出力で印加し,低温プラズマを発生させて1分間処理
し,プラズマ処理クロスを得た。次に,この低温プラズ
マ処理したガラスクロスにNEMA規格のFR−4組成
のエポキシ樹脂を含浸し,エポキシ樹脂45重量部,ガ
ラスクロス55重量部からなるプリプレグを作成した。
このプリプレグを8枚重ねて,170℃で1時間加圧成
形して積層板を作成した。次いで,得られた積層板で耐
熱性と寸法安定性を測定した。その結果を第1表に示し
た。
Next, this glass cloth was placed in a vacuum container having a parallel flat electrode installed therein, and was evacuated by a vacuum pump to reduce the pressure to 1.0.
A high frequency power of 13.56 MHz was applied to the electrodes from a high frequency power supply of 13.56 MHz at an output of 0.5 kw / cm 2 to generate high temperature plasma for 1 minute to obtain a plasma processing cloth. Next, this low-temperature plasma-treated glass cloth was impregnated with an epoxy resin of FR-4 composition of NEMA standard to prepare a prepreg consisting of 45 parts by weight of epoxy resin and 55 parts by weight of glass cloth.
Eight prepregs were stacked and pressure-molded at 170 ° C. for 1 hour to prepare a laminated plate. Next, the heat resistance and the dimensional stability of the obtained laminated plate were measured. The results are shown in Table 1.

比較例1 実施例1の低温プラズマ処理工程を除いた積層板を作成
し,実施例1と同じ項目を測定した。測定結果を第1表
に示す。
Comparative Example 1 A laminated plate was prepared by removing the low temperature plasma treatment step of Example 1, and the same items as in Example 1 were measured. The measurement results are shown in Table 1.

第1表から明らかなように,本発明によるガラスクロス
は従来のガラスクロスに比べてワニスの含浸性が良好で
あり,このガラスクロスを使用した積層板は,従来のガ
ラスクロスを使用した積層板に比べ耐熱性,寸法安定性
が明らかに向上した。
As is clear from Table 1, the glass cloth according to the present invention has a better varnish impregnation property than the conventional glass cloth, and the laminated board using this glass cloth is the laminated board using the conventional glass cloth. The heat resistance and dimensional stability are clearly improved in comparison with.

実施例2,3 実施例1のアミノシランをエポキシシラン(実施例
2),あるいはグリシドキシシラン(実施例3)に代え
た以外は実施例1と同じ条件で処理して積層板を得た。
測定結果を第2表に示す。
Examples 2 and 3 Laminates were obtained by treating under the same conditions as in Example 1 except that the aminosilane of Example 1 was replaced with epoxysilane (Example 2) or glycidoxysilane (Example 3).
The measurement results are shown in Table 2.

比較例2,3 比較例1のアミノシランをエポキシシラン(比較例
2),あるいはグリシドキシシラン(比較例3)に代え
た以外は比較例1と同じ条件で処理して積層板を得た。
測定結果を第2表に示す。
Comparative Examples 2 and 3 Laminates were obtained by treating under the same conditions as in Comparative Example 1 except that the aminosilane of Comparative Example 1 was replaced with epoxysilane (Comparative Example 2) or glycidoxysilane (Comparative Example 3).
The measurement results are shown in Table 2.

第2表から明らかなように,シランカップリング剤を代
えてもワニスの含浸性が向上し,成形加工後の積層板の
耐熱性,寸法安定性が向上していることが判る。
As is clear from Table 2, even if the silane coupling agent is changed, the impregnation property of the varnish is improved, and the heat resistance and dimensional stability of the laminated plate after the molding process are improved.

(発明の効果) 本発明の方法によれば,ガラスクロスへのワニスの含浸
性が向上することにより,プリント配線基板としての耐
熱性,寸法安定性が向上する。
(Effect of the Invention) According to the method of the present invention, the impregnability of the glass cloth with the varnish is improved, so that the heat resistance and the dimensional stability of the printed wiring board are improved.

Claims (1)

【特許請求の範囲】[Claims] 【請求項1】ガラスクロスを有機シラン処理し,次いで
低温プラズマ処理することを特徴とするプリント配線基
板用ガラスクロスの処理方法。
1. A method for treating a glass cloth for a printed wiring board, which comprises subjecting the glass cloth to an organic silane treatment and then a low temperature plasma treatment.
JP60234341A 1985-10-18 1985-10-18 Glass cloth processing method Expired - Lifetime JPH0632352B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP60234341A JPH0632352B2 (en) 1985-10-18 1985-10-18 Glass cloth processing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP60234341A JPH0632352B2 (en) 1985-10-18 1985-10-18 Glass cloth processing method

Publications (2)

Publication Number Publication Date
JPS6293992A JPS6293992A (en) 1987-04-30
JPH0632352B2 true JPH0632352B2 (en) 1994-04-27

Family

ID=16969467

Family Applications (1)

Application Number Title Priority Date Filing Date
JP60234341A Expired - Lifetime JPH0632352B2 (en) 1985-10-18 1985-10-18 Glass cloth processing method

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JP (1) JPH0632352B2 (en)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6165686B2 (en) * 2014-07-31 2017-07-19 信越化学工業株式会社 Sealing material with supporting substrate, post-sealing semiconductor element mounting substrate, post-sealing semiconductor element forming wafer, semiconductor device, and manufacturing method of semiconductor device

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4971264A (en) * 1972-11-15 1974-07-10
JPS5887363A (en) * 1981-11-20 1983-05-25 ユニチカ株式会社 Refining of fiber product

Also Published As

Publication number Publication date
JPS6293992A (en) 1987-04-30

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