JPH0633515B2 - Method for cleaning plating tank and plating solution switching pipeline - Google Patents
Method for cleaning plating tank and plating solution switching pipelineInfo
- Publication number
- JPH0633515B2 JPH0633515B2 JP16946786A JP16946786A JPH0633515B2 JP H0633515 B2 JPH0633515 B2 JP H0633515B2 JP 16946786 A JP16946786 A JP 16946786A JP 16946786 A JP16946786 A JP 16946786A JP H0633515 B2 JPH0633515 B2 JP H0633515B2
- Authority
- JP
- Japan
- Prior art keywords
- plating
- tank
- plating solution
- pure
- solution
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000007747 plating Methods 0.000 title claims description 119
- 238000004140 cleaning Methods 0.000 title claims description 12
- 238000000034 method Methods 0.000 title claims description 7
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 30
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 29
- 239000000956 alloy Substances 0.000 claims description 19
- 229910045601 alloy Inorganic materials 0.000 claims description 19
- 229910007567 Zn-Ni Inorganic materials 0.000 claims description 8
- 229910007614 Zn—Ni Inorganic materials 0.000 claims description 8
- 239000011701 zinc Substances 0.000 description 25
- 229910000831 Steel Inorganic materials 0.000 description 6
- 239000010959 steel Substances 0.000 description 6
- 238000005406 washing Methods 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 150000002500 ions Chemical class 0.000 description 4
- 229910021645 metal ion Inorganic materials 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000007796 conventional method Methods 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000010802 sludge Substances 0.000 description 2
- 229910000640 Fe alloy Inorganic materials 0.000 description 1
- -1 N i 2+ Substances 0.000 description 1
- 229910019142 PO4 Inorganic materials 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 238000004090 dissolution Methods 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 description 1
- 239000010452 phosphate Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Landscapes
- Electroplating Methods And Accessories (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 この発明は、連続電気Ｚｎめっきにおいて、めっき槽の
めっき液を切換える際に、残存した合金めっき液の金属
イオンを除去するためのめっき槽及びめっき液切換管路
の洗浄方法に関する。DETAILED DESCRIPTION OF THE INVENTION [Industrial field of application] The present invention relates to a plating bath for removing metal ions of an alloy plating solution that remains when switching plating solutions in a plating bath in continuous electric Zn plating, and The present invention relates to a method for cleaning a plating solution switching line.
〔従来の技術〕 一般に、鋼板の電気Ｚｎめっきには、純ＺｎめっきやＺ
ｎ−Ｎｉ，Ｚｎ−Ｆｅ等の合金めっきがあり、鋼板は連
続的に通板されるラインを構成しているため、異なった
めっきを行う場合はめっき槽内のめっき液をその種類に
応じて切換える方法が採られている。[Prior Art] Generally, pure Zn plating or Z
There is alloy plating of n-Ni, Zn-Fe, etc., and the steel plate constitutes a line that is continuously threaded. Therefore, when performing different plating, the plating solution in the plating tank should be selected according to its type. The method of switching is adopted.
ラインを構成している１つの電気Ｚｎめっき設備におい
て、例えばＺｎ−ＮｉやＺｎ−Ｆｅ等の合金めっきから
純Ｚｎめっきに切換える場合は、めっき槽から上記の合
金めっき液を合金めっき液タンクへ戻し、代りに純Ｚｎ
めっき液から液タンクから純Ｚｎめっき液をめっき槽へ
供給することになるが、合金めっき液を全部タンクへ戻
しても、めっき槽やめっき液切換管路にはわずかな量な
がら合金めっき液が残留し、またスラッジが付着してい
る。そしてこれらの残留めっき液やスラッジの中にはＮ
ｉ２＋やＦｅ２＋，Ｆｅ３＋等が含まれいて、これらの
成分がめっき槽へ切換え（入れ換え）られた純Ｚｎめっ
き液中に混入することになる。この金属イオンの混入
は、Ｚｎめっき鋼板の表面品質に次のような悪影響を与
える。すなわち、例えば純Ｚｎめっき液に、Ｎｉ２＋が
５００ppm以上混入すると、めっき後の鋼板にリン酸塩
処理を施した場合、白色度が５０以下に低下することが
知られている。従って、上記金属イオンの混入を防止す
るために、めっき液切換え時にめっき槽及びめっき液切
換管路の洗浄が必要であって、従来は水を用いて洗浄を
行っていた。When switching from alloy plating such as Zn-Ni and Zn-Fe to pure Zn plating in one electric Zn plating facility that constitutes a line, the above alloy plating solution is returned from the plating tank to the alloy plating solution tank. , Instead of pure Zn
Although the pure Zn plating solution is supplied from the plating solution to the plating tank from the solution tank, even if all of the alloy plating solution is returned to the tank, a small amount of alloy plating solution remains in the plating tank and the plating solution switching pipeline. It remains and sludge is attached. And in these residual plating solution and sludge, N
i 2+ , Fe 2+ , Fe 3+, etc. are contained, and these components are mixed in the pure Zn plating solution switched (replaced) to the plating tank. The mixing of the metal ions has the following adverse effects on the surface quality of the Zn-plated steel sheet. That is, for example, when Ni 2+ is mixed into a pure Zn plating solution in an amount of 500 ppm or more, it is known that the whiteness is reduced to 50 or less when the plated steel sheet is subjected to a phosphate treatment. Therefore, in order to prevent the mixing of the metal ions, it is necessary to clean the plating tank and the plating solution switching pipeline when switching the plating solution, and conventionally, cleaning was performed using water.
しかしながら、従来のように水で洗浄する方法にあって
は、水によって長時間、めっき槽やめっき液切換管路を
循環させて洗浄した後、純Ｚｎめっき液をめっき槽に供
給して循環させると、却ってめっき液中Ｎｉ２＋の濃度
の上昇が起きるという問題がある。However, in the conventional method of cleaning with water, the plating tank and the plating solution switching pipeline are circulated and cleaned with water for a long time, and then the pure Zn plating solution is supplied to the plating tank and circulated. On the contrary, there is a problem that the concentration of Ni 2+ in the plating solution rises.
この発明は、このような従来の問題点にかんがみてなさ
れたものであって、洗浄水に塩酸を添加することによ
り、上記問題点を解決することを目的としている。The present invention has been made in view of such conventional problems, and an object thereof is to solve the above problems by adding hydrochloric acid to washing water.
この発明は、連続式電気Ｚｎめっき設備のめっき構内の
めっき液をＺｎ−Ｎｉ，Ｚｎ−Ｆｅ等の合金めっき液か
ら純Ｚｎめっき液に切換える際に、純Ｚｎめっき液を前
記めっき槽に供給するに先立ってこのめっき槽及びめっ
き液切換管路に塩酸を添加した洗浄水を循環させて洗浄
するめっき槽及びめっき液切換管路の洗浄方法としたも
のである。The present invention supplies a pure Zn plating solution to the plating tank when the plating solution in the plating facility of a continuous type electric Zn plating facility is switched from an alloy plating solution such as Zn-Ni, Zn-Fe to a pure Zn plating solution. Prior to the above, the method for cleaning the plating tank and the plating solution switching pipeline is carried out by circulating cleaning water containing hydrochloric acid in the plating tank and the plating solution switching pipeline.
鋼板に対する電気Ｚｎめっきの種類を切換えるに際し、
例えばＺｎ−Ｎｉ，Ｚｎ−Ｆｅ等の合金めっきから純Ｚ
ｎめっきに切換える場合、めっき槽内の合金めっき液を
合金めっき液タンクへ戻し、次に純Ｚｎめっき液をめっ
き槽へ供給するに先立って、適量の塩酸を添加した洗浄
水によってめっき槽及びめっき液切換管路を循環洗浄す
ると、めっき槽及びめっき液切換管路に残留していたＮ
ｉ２＋やＦｅ２＋，Ｆｅ３＋等の金属イオンが塩酸を含
む洗浄水中に普通の水に比べてはるかに多量溶解するこ
とにより、洗浄後、めっき槽内へ純Ｚｎめっき液を供給
し循環させても上記合金イオンが製品に影響を与えるほ
ど混入することは生じない。When switching the type of electric Zn plating for steel plate,
For example, from Zn-Ni, Zn-Fe alloy plating to pure Z
When switching to n plating, the alloy plating solution in the plating tank is returned to the alloy plating solution tank, and before the pure Zn plating solution is supplied to the plating tank, an appropriate amount of hydrochloric acid is added to the plating water to wash the plating tank and the plating solution. When the liquid switching line was circulated and washed, N remained in the plating tank and the plating liquid switching line
By dissolving metal ions such as i 2+ , Fe 2+ , and Fe 3+ in the washing water containing hydrochloric acid in a much larger amount than ordinary water, a pure Zn plating solution is supplied and circulated in the plating tank after washing. Also, the alloy ions do not mix so much that they affect the product.
以下、この発明を図面に基づいて説明する。第１図はこ
の発明の一実施例を示す図である。The present invention will be described below with reference to the drawings. FIG. 1 is a diagram showing an embodiment of the present invention.
図において、１は連続式電気Ｚｎめっき設備のめっき槽
である。２は合金めっき液タンクであって弁２８，２１
を介してめっき槽１と連通している。３は純Ｚｎめっき
液タンクであって弁２９，２２を介してめっき槽１と連
通している。４は洗浄水タンクであって、弁２７，２３
を介してめっき槽１と連通し、また弁２４を介して塩酸
タンク５と連通している。In the figure, 1 is a plating tank of a continuous type electric Zn plating facility. 2 is an alloy plating solution tank, and valves 28 and 21
And communicates with the plating tank 1. A pure Zn plating solution tank 3 communicates with the plating tank 1 via valves 29 and 22. 4 is a wash water tank, which has valves 27, 23
Via the valve 24 and the hydrochloric acid tank 5 via the valve 24.
２０はめっき槽１の排出弁、２４は洗浄水タンク４へ塩
酸を塩酸タンク５から供給する際に開とする弁、２５は
洗浄水タンク５へ水を供給するときに開とする弁、２６
は洗浄水タンク４の水をそのタンク内で循環させるとき
に開とする弁である。３１〜３４はポンプであって、そ
れぞれ塩酸タンク５，洗浄水タンク４，純Ｚｎめっき液
タンク３，合金めっき液タンク２に設けられたものであ
る。Reference numeral 20 is a discharge valve of the plating tank 1, 24 is a valve which is opened when hydrochloric acid is supplied from the hydrochloric acid tank 5 to the cleaning water tank 4, 25 is a valve which is opened when water is supplied to the cleaning water tank 5, 26
Is a valve that is opened when the water in the wash water tank 4 is circulated in the tank. Pumps 31 to 34 are provided in the hydrochloric acid tank 5, the wash water tank 4, the pure Zn plating solution tank 3, and the alloy plating solution tank 2, respectively.
６はｐＨ計，７は電導度計であって、いずれも洗浄水の
塩酸濃度を検知するために洗浄水タンク４に設けらたも
のである。A pH meter 6 and an electric conductivity meter 7 are provided in the wash water tank 4 for detecting the hydrochloric acid concentration of the wash water.
８はめっき槽１内に設けられたコンダクタロールであっ
て、鋼板９を巻掛けるとともに、めっきの際に陰極とな
るものである。１０は同様に陽極となる亜鉛電極であ
る。Reference numeral 8 denotes a conductor roll provided in the plating tank 1, which winds the steel plate 9 and serves as a cathode during plating. 10 is a zinc electrode which also serves as an anode.
なお、合金めっき液タンク２は本例ではＺｎ−Ｎｉめっ
き液用としたが、このめっき液とは限らずＺｎ−Ｆｅめ
っき液の場合もあり、またこのタンクがめっき液の種類
別に複数、並設される場合もあるが、めっき液の切換方
法はいずれも以下のごとく同様である。Although the alloy plating solution tank 2 is for the Zn-Ni plating solution in this example, it may be a Zn-Fe plating solution without being limited to this plating solution. In some cases, the method of switching the plating solution is the same as described below, although it may be provided.
以上の構成によって、Ｚｎ−Ｎｉめっきから純Ｚｎめっ
きに切換える場合の例について説明する。An example of switching from Zn—Ni plating to pure Zn plating with the above configuration will be described.
先ず、弁２０，２１を開として、めっき槽１内のＺｎ−
Ｎｉめっき液を合金めっき液タンク２に戻す。次に空に
なっためっき槽１及びめっき液切換管路のうち共通管路
となるａ−ｂ，ｃ−ｄ，ｅ−ｆの管路を洗浄するため
に、弁２８，２１を閉とし、弁２７，２０，２３を開と
する。この状態でポンプ３２を駆動し、約１％の濃度に
調整された洗浄水タンク４の稀塩酸溶液を弁２７→管路
ａ−ｂ→めっき槽１→弁２０→弁２３の経路及びめっき
槽１をオーバーフローさせ、管路ｅ−ｄ−ｆ→弁２３の
経路で洗浄水タンク４へ戻す循環を所定時間（実施例で
は４５分間）繰返す。この間、洗浄水タンク４に設けた
ｐＨ計６によって稀塩酸溶液がｐＨ0.５以下にならない
よう管理する。これは、めっき槽１にはゴムライニング
が施してあり、このライニングが強酸によって劣化する
のを予防するためで、ｐＨ調整は塩酸タンク５から洗浄
水タンク４への塩酸添加量調整によって行われる。この
際、前もって弁２６を開とし弁２７を閉とした状態でポ
ンプ３２を駆動して水を洗浄水タンク４内で循環させ、
攪拌を兼ねて濃度調整を行う。また、電導度計７を設け
てｐＨ計６と共に管理すれば、洗浄水のｐＨ値の管理が
さらに容易となる。First, the valves 20 and 21 are opened, and Zn- in the plating tank 1 is
The Ni plating solution is returned to the alloy plating solution tank 2. Next, the valves 28 and 21 are closed in order to clean the ab, cd, and ef pipelines that are common pipelines among the empty plating tank 1 and the plating solution switching pipelines. The valves 27, 20, 23 are opened. In this state, the pump 32 is driven, and the diluted hydrochloric acid solution in the wash water tank 4 adjusted to a concentration of about 1% is supplied to the valve 27, the pipe line ab, the plating tank 1, the valve 20, the valve 23, and the plating tank. 1 is overflowed and the circulation of returning to the wash water tank 4 through the path of the pipe line e-d-f → the valve 23 is repeated for a predetermined time (45 minutes in the embodiment). During this period, the pH meter 6 provided in the wash water tank 4 manages the diluted hydrochloric acid solution so that the pH does not fall below 0.5. This is because the plating tank 1 is provided with a rubber lining to prevent the lining from being deteriorated by a strong acid, and the pH is adjusted by adjusting the amount of hydrochloric acid added from the hydrochloric acid tank 5 to the wash water tank 4. At this time, with the valve 26 opened and the valve 27 closed in advance, the pump 32 is driven to circulate the water in the wash water tank 4,
Adjust the concentration while also stirring. Further, if the conductivity meter 7 is provided and managed together with the pH meter 6, it becomes easier to manage the pH value of the wash water.
以上のように、洗浄水が循環した経路、すなわちＺｎ−
Ｎｉ等の合金めっき液が流通しためっき液切換管路の洗
浄が終了したら、ポンプ３２を停始し、弁２７を閉、弁
２９を開としてポンプ３４を駆動し、純Ｚｎめっき液タ
ンク３のめっき液をめっき槽１に供給するとともに弁２
０，２２を開として純Ｚｎめっき液を循環させる。As described above, the path through which the wash water circulates, that is, Zn-
When the cleaning of the plating solution switching line through which the alloy plating solution such as Ni has flowed is completed, the pump 32 is stopped, the valve 27 is closed, the valve 29 is opened, and the pump 34 is driven to drive the pure Zn plating solution tank 3. Supply the plating solution to the plating tank 1 and the valve 2
0 and 22 are opened to circulate the pure Zn plating solution.
実際に、以上の方法によって操業した結果、従来の水だ
けの洗浄による方法ではＮｉイオンが６００ppm残留し
ていたのが、１００ppmにまで低下させることができ
た。Actually, as a result of operating by the above method, Ni ion remained 600 ppm by the conventional method of only washing with water, but it could be reduced to 100 ppm.
なお、この効果は、Ｚｎ−Ｎｉめっきから純Ｚｎめっき
に切換えた場合のみでなく、Ｚｎ−Ｆｅ等の他の合金め
っきに切換える場合も同様である。This effect is the same not only when switching from Zn—Ni plating to pure Zn plating, but also when switching to another alloy plating such as Zn—Fe.
以上説明したように、本発明によれば、Ｚｎ−Ｎｉ，Ｚ
ｎ−Ｆｅ等の合金めっきから純Ｚｎめっきに切換えるに
あたり、めっき液切換管路を予め塩酸を添加した洗浄水
を循環させて洗浄する方法としたため、純Ｚｎめっき液
中に残存するＮｉイオンやＦｅイオンを著しく低下する
ことが可能となり、良好なＺｎめっき鋼板を連続的に生
産できるという効果が得られる。As described above, according to the present invention, Zn-Ni, Z
When switching from alloy plating of n-Fe or the like to pure Zn plating, the plating solution switching pipeline was cleaned by circulating cleaning water to which hydrochloric acid was added in advance, so that Ni ions and Fe remaining in the pure Zn plating solution were used. It is possible to significantly reduce the ions, and it is possible to obtain the effect that a good Zn-plated steel sheet can be continuously produced.
第１図は本発明に係る実施例を適用した連続めっき設備
の概要図、第２図は洗浄水の塩酸濃度とＮｉ溶解速度と
の関係を示す線図である。 １……めっき槽；弁２７→管路ａ−ｂ→めっき槽１→弁
２０→弁２３、管路ｅ−ｄ−ｆ……めっき液切換管路。FIG. 1 is a schematic diagram of a continuous plating facility to which the embodiment according to the present invention is applied, and FIG. 2 is a diagram showing the relationship between the hydrochloric acid concentration of washing water and the Ni dissolution rate. 1 ... Plating tank; valve 27 → pipe a-b → plating tank 1 → valve 20 → valve 23, pipeline ed-f …… plating solution switching pipeline.
Claims (1)
めっき液を、Ｚｎ−Ｎｉ，Ｚｎ−Ｆｅ等の合金めっき液
から純Ｚｎめっき液に切換える際に、純Ｚｎめっき液を
前記めっき槽に供給するに先立って、このめっき槽及び
めっき液切換え管路に塩酸を添加した洗浄水を循環させ
て洗浄することを特徴とするめっき槽及びめっき液切換
え管路の洗浄方法。1. A pure Zn plating solution is used when the plating solution in a plating tank of a continuous electric Zn plating facility is switched from an alloy plating solution such as Zn-Ni or Zn-Fe to a pure Zn plating solution. A method for cleaning a plating tank and a plating solution switching pipeline, characterized in that cleaning water containing hydrochloric acid is circulated in the plating tank and the plating solution switching pipeline before supplying to the plating tank and the plating solution switching pipeline.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16946786A JPH0633515B2 (en) | 1986-07-18 | 1986-07-18 | Method for cleaning plating tank and plating solution switching pipeline |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP16946786A JPH0633515B2 (en) | 1986-07-18 | 1986-07-18 | Method for cleaning plating tank and plating solution switching pipeline |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6326400A JPS6326400A (en) | 1988-02-03 |
| JPH0633515B2 true JPH0633515B2 (en) | 1994-05-02 |
Family
ID=15887100
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP16946786A Expired - Lifetime JPH0633515B2 (en) | 1986-07-18 | 1986-07-18 | Method for cleaning plating tank and plating solution switching pipeline |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0633515B2 (en) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7033463B1 (en) | 1998-08-11 | 2006-04-25 | Ebara Corporation | Substrate plating method and apparatus |
| KR20020041236A (en) * | 2000-11-27 | 2002-06-01 | 이구택 | A method for flushing tin plating line |
| KR100470064B1 (en) * | 2002-10-18 | 2005-02-05 | 주식회사 포스코 | Method for Manufacturing Galvanized Steel Sheet for Anti-Finger Steel Sheet |
| JP7786347B2 (en) * | 2022-11-29 | 2025-12-16 | トヨタ自動車株式会社 | Metal film deposition equipment |
-
1986
- 1986-07-18 JP JP16946786A patent/JPH0633515B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6326400A (en) | 1988-02-03 |
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