JPH0634931B2 - Gas dilution method - Google Patents
Gas dilution methodInfo
- Publication number
- JPH0634931B2 JPH0634931B2 JP62122810A JP12281087A JPH0634931B2 JP H0634931 B2 JPH0634931 B2 JP H0634931B2 JP 62122810 A JP62122810 A JP 62122810A JP 12281087 A JP12281087 A JP 12281087A JP H0634931 B2 JPH0634931 B2 JP H0634931B2
- Authority
- JP
- Japan
- Prior art keywords
- gas
- gas supply
- supply system
- flow rate
- base
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Fee Related
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01F—MIXING, e.g. DISSOLVING, EMULSIFYING OR DISPERSING
- B01F23/00—Mixing according to the phases to be mixed, e.g. dispersing or emulsifying
- B01F23/10—Mixing gases with gases
- B01F23/19—Mixing systems, i.e. flow charts or diagrams; Arrangements, e.g. comprising controlling means
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Devices For Use In Laboratory Experiments (AREA)
Description
【発明の詳細な説明】 〔概要〕 一定濃度の希釈ガスを所定の流量で使用域に供給する方
法として、目的ガス供給系に対してベースガス供給系を
複数個用意しておき、目的ガス供給系と第１のベースガ
ス供給系とを結合して混合することにより一次希釈ガス
を作り、この一次希釈ガスの流量をオーバーフロー調整
バルブで必要量に調整した後、背圧低減混合器で第２の
ベースガス供給系と結合して混合するガス希釈方法。Detailed Description [Summary] As a method of supplying a diluted gas of a constant concentration to a use region at a predetermined flow rate, a plurality of base gas supply systems are prepared for a target gas supply system and the target gas supply system is prepared. A primary dilution gas is produced by combining and mixing the system and the first base gas supply system, and the flow rate of this primary dilution gas is adjusted to a required amount by an overflow adjustment valve, and then the second dilution is performed by a back pressure reduction mixer. A method for diluting gas by combining and mixing with the base gas supply system of.
本発明はガスの希釈方法に関し、特に低濃度のガスを一
定の流量で使用域に供給する方法に関する。The present invention relates to a method for diluting a gas, and more particularly to a method for supplying a low concentration gas at a constant flow rate to a use area.
大量の情報を高速に処理するため情報処理装置の進歩は
著しく、入出力機器を含めて多くの事業所に備えられて
いる。BACKGROUND ART Information processing devices have made remarkable progress in order to process large amounts of information at high speed, and are installed in many business establishments including input / output devices.
こゝで、電算機などの主要機器は防塵と温調設備が施さ
れた環境下に置かれていることが多いが、入出力機器は
作業環境に置かれており、そのために接点の硫化や配線
の腐蝕などによる性能の劣化が起こり易い。Most of the main equipment such as computers are placed in an environment where dustproof and temperature control equipment is installed, but the input / output equipment is placed in the work environment. Degradation of performance easily occurs due to corrosion of wiring.
そこで、この対策として人為的に酸化環境や腐蝕環境を
作り、機器の耐酸化処理や耐腐蝕処理が研究されてい
る。Therefore, as measures against this, an oxidation environment or a corrosion environment is artificially created, and an oxidation resistance treatment or a corrosion resistance treatment of equipment is being researched.
すなわち、電気接点，電極，機構部品などの被検査物を
容器内に置き、これに一定濃度の雰囲気ガスを一定の流
量で供給して変化量を測定することが行われている。That is, an object to be inspected such as an electrical contact, an electrode, a mechanical part, etc. is placed in a container, and an atmosphere gas having a constant concentration is supplied to the container at a constant flow rate to measure the change amount.
耐環境試験を行うためのガス濃度は数PPM(10-6) 程度と
含有量は極めて微量であり、そのために目的ガスをベー
スガスで充分に希釈する必要がある。The gas concentration for carrying out the environment resistance test is about several PPM (10 -6 ), and the content is extremely small. Therefore, it is necessary to sufficiently dilute the target gas with the base gas.
第４図は従来の環境ガス供給系の配管図を示すものであ
る。FIG. 4 is a piping diagram of a conventional environmental gas supply system.
すなわち、目的ガス供給系１とベースガス供給系２とが
三ッ又コックジョイント３によって結合し、容器Ｃに供
給されている。That is, the target gas supply system 1 and the base gas supply system 2 are connected by the three-pronged cock joint 3 and supplied to the container C.
こゝで、ガス供給系には同図に示すようにボンベからの
ガスの流量を調整する流量調整バルブV1,V2と流量計F1,
F2が備えられている。Here, the gas supply system is equipped with flow rate adjusting valves V 1 and V 2 and a flow meter F 1 and V 1 for adjusting the flow rate of the gas from the cylinder as shown in the figure.
F 2 is equipped.
こゝで、目的ガスが腐蝕性をもつ場合に使用される流量
計としてはルビー製の三角錘が流量に応じて浮動する浮
子式のガス流量計が用いられることが多く、一般に流量
計F1としては最小流量〜最大流量が５cc/ 分〜50cc/ 分
のもの、また流量計F2としては50cc/ 分〜500cc/分程度
のものが使用されることが多い。Here, as a flow meter used when the target gas is corrosive, a float type gas flow meter in which a ruby triangular pyramid floats according to the flow rate is often used, and in general, a flow meter F 1 The minimum flow rate to the maximum flow rate is 5 cc / min to 50 cc / min, and the flow meter F 2 is about 50 cc / min to 500 cc / min.
例えば、目的ガス例えば硫化水素(H2S) をベースガス例
えば空気により1 ：100 に希釈したい場合は流量調整バ
ルブV1を用いて目的ガス供給系１の流量を５cc/ 分と
し、またV2を調節してベースガス供給系２の流量を500c
c/分に調節し、三ッ又ジョイント３で混合して行われて
いた。For example, 1 the base gas, for example air target gas such as hydrogen sulfide (H 2 S): If you want diluted 100 to 5 cc / min flow rate the desired gas supply system 1 by using the flow regulating valve V 1, also V 2 Adjust the flow rate of the base gas supply system 2 to 500c
It was done by adjusting to c / min and mixing at the three-pronged joint 3.
然し、雰囲気ガスの濃度は極めて希薄であり、数PPM の
場合は、このような方法で作ることは不可能であり、目
的ガス供給系１の供給源（ボンベ）として予め希釈した
ものを使用するか、或いはベースガス供給系２の流量を
極端に大きくして使用する必要があり、この場合に混合
ガスの流量が大きくなり過ぎると云う問題があった。However, the concentration of the atmospheric gas is extremely low, and in the case of several PPM, it is impossible to make it by such a method, and a prediluted one is used as the supply source (cylinder) of the target gas supply system 1. Alternatively, it is necessary to use the base gas supply system 2 with an extremely large flow rate, and in this case, there is a problem that the flow rate of the mixed gas becomes too large.
以上記したように情報処理機器の耐環境性向上のため、
雰囲気ガス中での特性劣化の評価が行われているが、雰
囲気ガスの濃度が微量のために微量濃度の雰囲気ガスを
適当な流速で作ることが難しいことが問題であった。As mentioned above, in order to improve the environmental resistance of information processing equipment,
Although the characteristic deterioration in atmospheric gas has been evaluated, it has been a problem that it is difficult to produce a minute amount of atmospheric gas at an appropriate flow rate because the atmospheric gas concentration is very small.
上記の問題は大幅に希釈した目的ガスを一定の濃度で使
用域に供給する方法として、目的ガス供給系に対してベ
ースガス供給系を複数個用意しておき、目的ガス供給系
と第１のベースガス供給系とを結合して混合することに
より一次希釈ガスを作り、この一次希釈ガスの流量をオ
ーバーフロー調整バルブで必要量に調整した後、背圧低
減混合器で第２のベースガス供給系と結合し、混合する
ガス希釈方法により解決することができる。The above problem is a method of supplying a target gas supply system with a plurality of base gas supply systems in order to supply a significantly diluted target gas at a constant concentration to the target gas supply system. A primary dilution gas is created by combining and mixing with a base gas supply system, and the flow rate of this primary dilution gas is adjusted to a required amount by an overflow adjustment valve, and then the second base gas supply system is adjusted by a back pressure reduction mixer. It can be solved by a gas dilution method of combining with and mixing.
本発明は微量濃度の目的ガスを一定の流量で容器に供給
する方法としてベースガス供給系を二個用意し、この内
の一個と目的ガス供給系とによって一次希釈を行った
後、この段階で大部分の一次希釈ガスを排出し、必要と
する少量の一次希釈ガスをベースガス供給系と混合する
ことにより二次希釈ガスを得るものである。The present invention prepares two base gas supply systems as a method of supplying a trace amount of target gas to a container at a constant flow rate, and performs primary dilution by one of them and the target gas supply system. Most of the primary dilution gas is discharged, and the required small amount of primary dilution gas is mixed with the base gas supply system to obtain the secondary dilution gas.
第１図は本発明に係る環境ガス供給系の配管図であっ
て、ベースガスボンベB2からのベースガス供給系２を二
個用意し、この一つの供給系（流量調整バルブV2と流量
計F2）と目的ガス供給系１（流量調整バルブV1と流量計
F1）とを混合して一次希釈ガス供給系５を作り、流量調
整バルブV3とオバーフロー調整バルブV5を用いて流量計
F3の流量を調節する。FIG. 1 is a piping diagram of an environmental gas supply system according to the present invention, in which two base gas supply systems 2 from a base gas cylinder B 2 are prepared, and one supply system (a flow control valve V 2 and a flow meter) is provided. F 2 ) and target gas supply system 1 (flow rate adjustment valve V 1 and flow meter)
F 1 ) is mixed to form the primary dilution gas supply system 5, and the flow rate control valve V 3 and the overflow control valve V 5 are used.
Adjust F 3 flow rate.
すなわち、オーバフロー調整バルブV5を緩め大部分の一
次希釈ガスを装置外に排出する。That is, the overflow adjusting valve V 5 is loosened and most of the primary dilution gas is discharged to the outside of the device.
次に、この一次希釈ガス供給系５とベースガス供給系２
の一つ（流量調整バルブV4と流量計F4）とを背圧低減混
合器６により結合して混合し、これを被試験試料がある
容器４に供給するものである。Next, the primary dilution gas supply system 5 and the base gas supply system 2
One of the above (flow rate adjusting valve V 4 and flow meter F 4 ) is coupled by the back pressure reducing mixer 6 and mixed, and this is supplied to the container 4 having the sample to be tested.
こゝで、背圧低減混合器６は第３図に断面図を示す一種
のアスピレータ (Aspirator)であって、通常の三ッ又コ
ックジョイントを用いて混合する場合にガスの供給方向
10に流路が狭い個所があったりして抵抗が加わる場合に
は流量の多いベースガス８の圧力が流量の少ない一次希
釈ガス９の方向に加わり、その結果として流量計の表示
が実際よりも少なく出て不正確となる。Here, the back pressure reducing mixer 6 is a kind of aspirator whose cross-sectional view is shown in FIG. 3, and in the case of mixing using an ordinary three-way cock joint, the gas supply direction
When resistance is added due to a narrow passage in 10 or the like, the pressure of the base gas 8 having a large flow rate is applied in the direction of the primary dilution gas 9 having a small flow rate, and as a result, the display of the flow meter is less than the actual one. It is less accurate and inaccurate.
そこで、この改善法として同図に示すような背圧低減混
合器を用い、先細の噴出口11より噴出するベースガス８
により一次希釈ガス９が吸引される三ッ又構造をとるこ
とにより確実に混合すると共に流量計の測定精度を向上
するものである。Therefore, as the improvement method, a back pressure reducing mixer as shown in the figure is used, and the base gas 8 jetted from the tapered jet port 11 is used.
By adopting a three-pronged structure in which the primary dilution gas 9 is sucked by the above, the mixing is assured and the measurement accuracy of the flow meter is improved.
このようにオーバフロー調整バルブV5により不要ガスを
捨てる一次希釈ガス供給系５を作り、これとベースガス
供給系２とを背圧低減混合器６で結合して混合する方法
をとることにより希釈ガスを適当な流量で容器４に供給
することができる。As described above, the primary diluting gas supply system 5 for discarding unnecessary gas is formed by the overflow adjusting valve V 5, and the diluting gas is mixed with the base gas supply system 2 by the back pressure reducing mixer 6 to mix them. Can be supplied to the container 4 at an appropriate flow rate.
第２図は本発明の実施法を説明する配管図であって、高
範囲に希釈度を変えた雰囲気ガスを複数個同時に作るこ
とができる。FIG. 2 is a piping diagram for explaining the method of practicing the present invention. It is possible to simultaneously produce a plurality of atmospheric gases having a high degree of dilution.
すなわち、同図に示すように目的ガスボンベB1と流量調
整バルブV1の間にストップバルブS1を、また流量調整バ
ルブV3と目的ガスボンベB1との間にストップバルブS3を
設ける。That is, the target gas cylinder B 1 and flow regulating stop valve S 1 between the valve V 1 as shown in the figure, also provided a stop valve S 3 between the flow regulating valve V 3 and the target gas cylinder B 1.
またベースガスボンベB2と流量調整バルブV2，V4・・Vn
の間にストップバルブS2,S4・・Snを設けておく。In addition, the base gas cylinder B 2 and the flow rate adjusting valves V 2 , V 4 ··· V n
Stop valves S 2 , S 4 ··· S n are provided between them.
まず、希釈度が少なく一次希釈だけで間に合う場合は目
的ガスボンベB1につながるストップバルブS1とオーバー
フロー調整バルブV5を閉じ、S3を開けて流量調整バルブ
V3〜V9とベースガスボンベB2に繋がる流量調整バルブ
V2，V4・・Vnより希釈度を調節し、背圧低減混合器M1〜
Mnでベースガスと混合して容器C1〜Cnに供給する。First, if the dilution is low and only primary dilution is needed, close the stop valve S 1 and the overflow adjustment valve V 5 connected to the target gas cylinder B 1 , and open S 3 to open the flow adjustment valve.
Flow regulating valve connected to V 3 ~V 9 and the base gas cylinder B 2
Adjusting the degree of dilution from V 2 , V 4 ··· V n , back pressure reducing mixer M 1 ~
Mn is mixed with the base gas and supplied to the containers C 1 to C n .
また、希釈度が大きい場合はストップバルブS3を閉じて
S1とS2を開き、流量調整バルブV1とV2を調節して一次希
釈ガスを作り、V5で余分の一次希釈ガスを除去すると共
に流量調整バルブV3・・V9で流量を調整し背圧低減混合
器M1〜Mnでベースガスと混合して容器C1〜Cnに供給す
る。Also, if a large dilution closes the stop valve S 3
Open S 1 and S 2 , adjust the flow rate adjusting valves V 1 and V 2 to make the primary dilution gas, remove the excess primary dilution gas at V 5 and adjust the flow rate by the flow rate adjusting valves V 3 ... V 9. It is adjusted and mixed with the base gas in the back pressure reducing mixers M 1 to M n , and the mixed gas is supplied to the containers C 1 to C n .
このような方法をとることにより複数の容器にそれぞれ
希釈度の違った雰囲気ガスを供給することができる。By adopting such a method, it is possible to supply atmospheric gases having different dilution degrees to a plurality of containers.
本発明によれば希釈度の大きな雰囲気ガスをそれぞれ希
釈度が違った状態で複数の容器に供給することができ、
これにより複数の耐環境試験を一つのガス供給装置を用
いて同時に行うことができる。According to the present invention, it is possible to supply atmospheric gas having a large degree of dilution to a plurality of containers in a state where the degree of dilution is different,
Thereby, a plurality of environment resistance tests can be simultaneously performed using one gas supply device.
第１図は本発明に係る環境ガス供給系の配管図、 第２図は本発明の実施法を説明する配管図、 第３図は背圧低減混合器の断面図、 第４図は従来の環境ガス供給系の配管図、 である。 図において、 １は目的ガス供給系、２はベースガス供給系、 ３は三ッ又ジョイント、４は容器、 ５は一次希釈ガス供給系、 ６は背圧低減混合器、 である。 FIG. 1 is a piping diagram of an environmental gas supply system according to the present invention, FIG. 2 is a piping diagram for explaining an embodiment of the present invention, FIG. 3 is a sectional view of a back pressure reducing mixer, and FIG. It is a piping diagram of an environmental gas supply system. In the figure, 1 is a target gas supply system, 2 is a base gas supply system, 3 is a three-pronged joint, 4 is a container, 5 is a primary dilution gas supply system, and 6 is a back pressure reducing mixer.
Claims (1)
に供給する方法として、目的ガス供給系に対してベース
ガス供給系を複数個用意しておき、目的ガス供給系と第
１のベースガス供給系とを結合して混合することにより
一次希釈ガスを作り、該一次希釈ガスの流量をオーバー
フロー調整バルブで必要量に調整した後、背圧低減混合
器で第２のベースガス供給系と結合し、混合することを
特徴とするガス希釈方法。1. As a method for supplying a dilute concentration of a target gas to a use area at a constant flow rate, a plurality of base gas supply systems are prepared for the target gas supply system, and the target gas supply system and the first gas supply system are provided. A primary diluting gas is produced by combining and mixing with a base gas supply system, and the flow rate of the primary diluting gas is adjusted to a required amount by an overflow adjustment valve, and then a second base gas supply system is provided by a back pressure reduction mixer. A method of diluting gas, which comprises combining with and mixing.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62122810A JPH0634931B2 (en) | 1987-05-20 | 1987-05-20 | Gas dilution method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62122810A JPH0634931B2 (en) | 1987-05-20 | 1987-05-20 | Gas dilution method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS63287559A JPS63287559A (en) | 1988-11-24 |
| JPH0634931B2 true JPH0634931B2 (en) | 1994-05-11 |
Family
ID=14845201
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP62122810A Expired - Fee Related JPH0634931B2 (en) | 1987-05-20 | 1987-05-20 | Gas dilution method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0634931B2 (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0370151A1 (en) * | 1988-11-21 | 1990-05-30 | L'air Liquide, Societe Anonyme Pour L'etude Et L'exploitation Des Procedes Georges Claude | Process for producing low-concentration gas mixtures, and apparatus for producing the same |
| EP2986980B1 (en) * | 2013-04-15 | 2020-05-06 | Thermo Fisher Scientific (Bremen) GmbH | Gas inlet system for isotope ratio analyser |
| CN106064026A (en) * | 2016-07-26 | 2016-11-02 | 液化空气（中国）研发有限公司 | Multicomponent gas mixing system |
-
1987
- 1987-05-20 JP JP62122810A patent/JPH0634931B2/en not_active Expired - Fee Related
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63287559A (en) | 1988-11-24 |
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| Date | Code | Title | Description |
|---|---|---|---|
| LAPS | Cancellation because of no payment of annual fees |