JPH0634939B2 - Surface modification method of granules - Google Patents
Surface modification method of granulesInfo
- Publication number
- JPH0634939B2 JPH0634939B2 JP22024688A JP22024688A JPH0634939B2 JP H0634939 B2 JPH0634939 B2 JP H0634939B2 JP 22024688 A JP22024688 A JP 22024688A JP 22024688 A JP22024688 A JP 22024688A JP H0634939 B2 JPH0634939 B2 JP H0634939B2
- Authority
- JP
- Japan
- Prior art keywords
- substance
- particles
- treated
- dish
- reforming
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Landscapes
- Finish Polishing, Edge Sharpening, And Grinding By Specific Grinding Devices (AREA)
- Combined Means For Separation Of Solids (AREA)
- Crushing And Grinding (AREA)
Description
【発明の詳細な説明】 [産業上の利用分野] 本発明は母体物質の粒子表面に子物質が付着している被
処理粒体から該子物質を剥離させる粒体の表面改質方法
に関する。Description: TECHNICAL FIELD The present invention relates to a method for surface modification of granules, in which the child substance is peeled from the particles to be treated in which the child substance is attached to the particle surface of the mother substance.
詳しくは、被処理粒体又は被処理粒体と改質媒体とを遠
心流動させて被処理粒体の表面から子物質を剥離させる
方法に関する。More specifically, the present invention relates to a method of centrifugally flowing the particles to be treated or the particles to be treated and the modifying medium to separate the child substance from the surface of the particles to be treated.
[従来の技術] 従来、この種の表面改質方法として、篩分け法のほか、
慣性力利用分級機や回転かご型分級機などを用いた方法
が知られている。第3図〜第5図は従来公知の改質方法
の説明図であり、第3図は篩分け法による概略的な斜視
図である。符号40は篩であって、篩上に被処理粒体を
供給し、篩上で被処理粒体を上下または前後にそれぞれ
揺動や振動を加えて、被処理粒体同志を擦り合せながら
母体物質と子物質に分離し、分離後は母体物質を篩上残
分として、子物質を篩下としてそれぞれ回収する。第4
図は慣性力利用分級機を利用した場合の改質方法の模式
図であって、被処理粒体を壁面に向って高速で噴出させ
ると被処理粒体が得た運動エネルギで壁面に衝突し、こ
の衝突時の衝撃により子物質が剥離される。この時、同
時に壁面と平行に下方から上方に向って空気を流してお
けば母体物質は空気の流れに抗して落下し、子物質は空
気に同伴されて上方へ搬出される。第5図は回転かご型
分級機を利用した場合の改質方法であって、回転円筒4
1を適度な角度をもたせた状態で回転させながら、回転
円筒41下方から上方に向かって空気を流し、逆に回転
円筒41上方に配したシュート42から回転円筒41上
部に被処理粒体を供給すると、回転円筒41内で被処理
粒体同志が擦れながら回転円筒41下部に向かって搬送
され、母体物質は空気に抗して回転円筒41下部に流下
し、また子物質は回転円筒41上部から空気に同伴され
て搬出され、それぞれ分離される。[Prior Art] Conventionally, as a surface modification method of this type, in addition to a sieving method,
A method using an inertial force classifier, a rotating basket type classifier, or the like is known. 3 to 5 are explanatory views of a conventionally known reforming method, and FIG. 3 is a schematic perspective view by a sieving method. Reference numeral 40 denotes a sieve, and the particles to be treated are supplied onto the sieve, and the particles to be treated are shaken or vibrated up and down or back and forth respectively on the sieve to rub the particles to be treated with each other. The substance is separated into a child substance, and after the separation, the mother substance is collected as a residue on the sieve and the child substance is collected under the sieve. Fourth
The figure is a schematic diagram of the reforming method using an inertial force classifier.When the particles to be treated are ejected at high speed toward the wall surface, the particles to be treated collide with the wall surface with the kinetic energy obtained. The child matter is peeled off by the impact at the time of this collision. At this time, if air is made to flow from the lower side to the upper side in parallel with the wall surface at the same time, the base substance falls against the flow of air, and the child substance is carried along with the air and carried out upward. FIG. 5 shows a reforming method using a rotating basket type classifier.
While rotating No. 1 at an appropriate angle, air is made to flow from the lower side to the upper side of the rotating cylinder 41, and conversely, the particles to be treated are supplied to the upper side of the rotating cylinder 41 from the chute 42 arranged above the rotating cylinder 41. Then, the particles to be treated are rubbed and conveyed toward the lower part of the rotating cylinder 41 in the rotating cylinder 41, the mother substance flows down to the lower part of the rotating cylinder 41 against the air, and the child substance is discharged from the upper part of the rotating cylinder 41. They are carried along with the air and separated.
[発明が解決しようとする課題] 上記のような改質方法では、それぞれ下記のような欠点
を有している。すなわち、篩分け方法における分級方法
では、子物質が硬い場合には子物質の剥離が不十分であ
り、母体物質を製品とする場合は品質が低下しやすい。[Problems to be Solved by the Invention] Each of the above-mentioned reforming methods has the following drawbacks. That is, in the classification method in the sieving method, the peeling of the child substance is insufficient when the child substance is hard, and the quality tends to deteriorate when the mother substance is used as a product.
慣性力利用分級機による改質方法では、被処理粒体に運
動エネルギを与えて高速で壁面に衝突させるため、母体
物質と子物質の分離効率が悪い場合は何度も繰返し衝突
させねばならず、このため母体物質の変形を招きやす
い。また、被処理粒体が壁面に衝突した際に子物質の一
部が母体物質に食い込んでしまい、子物質を十分に剥離
することができない。そして、これらのために、母体物
質を製品とする場合は品質が低下しやすい。In the reforming method using an inertial force classifier, kinetic energy is applied to the particles to be treated and they collide with the wall surface at high speed.Therefore, if the separation efficiency of the matrix substance and the daughter substance is poor, they must be repeatedly collided. Therefore, the base material is likely to be deformed. Further, when the particles to be treated collide with the wall surface, a part of the child substance bites into the mother substance, and the child substance cannot be sufficiently peeled off. For these reasons, the quality tends to deteriorate when the base material is used as a product.
回転かご型分級機による改質方法では、子物質の剥離効
率が悪い。そして、剥離効率を良くしようとして回転数
を大きくしても同期速度があるために回転数制限があ
り、低速回転を強いられる。また、母体物質から一旦剥
離された子物質が母体物質と共に回転円筒内に長時間滞
留する。このため、せっかく剥離された子物質が再度母
体物質に付着したり、あるいは食い込んだりするため
に、子物質の剥離が不十分になり易い。それで、これら
の結果、母体物質を製品とする場合は品質が低下しやす
い。また、一旦剥離された子物質同志が固まり合うこと
も多い。In the reforming method using the rotating basket type classifier, the efficiency of peeling off the child substance is poor. Further, even if the number of rotations is increased to improve the peeling efficiency, the number of rotations is limited because of the synchronous speed, and low speed rotation is forced. Further, the child substance once separated from the base substance stays in the rotating cylinder together with the base substance for a long time. For this reason, since the child substance which has been peeled off with a great deal of reattachment to the mother substance or digging into the mother substance again, peeling of the child substance tends to be insufficient. Therefore, as a result of these, when the matrix material is used as a product, the quality is likely to deteriorate. In addition, the child substances that have been once separated are often solidified together.
さらに、第3〜5図のいずれの従来例にあっても、粒径
が1mm以下程度の小粒体については表面改質は殆どで
きなかった。Further, in any of the conventional examples shown in FIGS. 3 to 5, almost no surface modification was possible for small particles having a particle size of about 1 mm or less.
[課題を解決するための手段] 本発明は、母体物質の粒子表面に子物質が付着している
被処理粒体から該子物質を剥離させる粒体の表面改質方
法の改良に関するものである。[Means for Solving the Problems] The present invention relates to an improvement in a surface modification method of a granular material, in which the child substance is separated from a treated granular material in which the child substance is attached to the particle surface of the mother substance. .
請求項(1)の粒体の表面改質方法では、回転軸心が縦
方向に向いていて、少なくとも中央部分が下方に向って
拡径する皿面を有し、かつ該皿面の縦断面が凹状に湾曲
している形状の回転自在な円状の回転皿と、少なくとも
上部が上方に向って縮径する内壁面を有し、該内壁面の
縦断面が凹状に湾曲している形状であり、前記回転皿と
同軸的に周設されて静止している固定環とを具備し、前
記回転皿の皿面と固定環の内壁面とが、回転皿と固定環
との間の微小隙間を除いて、連続的な円滑面に形成され
ている装置を用いる。In the method for modifying the surface of granules according to claim (1), the axis of rotation is oriented in the longitudinal direction, and at least the central portion has a dish surface that expands downward, and the longitudinal cross section of the dish surface. Has a shape of a freely rotatable circular rotating dish having a concave shape, and at least an upper portion having an inner wall surface whose diameter decreases upward, and the longitudinal cross section of the inner wall surface has a concave shape. And a stationary ring that is coaxially provided around the rotating dish and is stationary, and the plate surface of the rotating dish and the inner wall surface of the stationary ring have a minute gap between the rotating dish and the stationary ring. Except that the apparatus formed is a continuous smooth surface.
そして、該装置の皿面と内壁面とで囲まれる改質室内に
前記被処理粒体又は被処理粒体と改質媒体とを収容した
状態で回転皿を回転させて被処理粒体の表面から子物質
を剥離させると共に、前記回転皿と固定環との間の微小
隙間から気体を該改質室内に導入し、被処理粒体から剥
離した子物質を気流搬送して改質室外に排出させる。The surface of the granules to be treated is rotated by rotating the rotary dish in a state where the granules to be treated or the granules to be treated and the reforming medium are contained in a reforming chamber surrounded by the dish surface and the inner wall surface of the apparatus. The child substance is peeled off, the gas is introduced into the reforming chamber through the minute gap between the rotary dish and the fixed ring, and the child substance peeled off from the particles to be treated is conveyed by air flow and discharged to the outside of the reforming chamber. Let
請求項(2)の回転皿は、皿面の中央部分が下方に向っ
て拡径し、該中央部分にひき続く中間部分では略水平で
あり、該中間部分にひき続く外周部分では上方に向って
拡径する形状を有している。また、前記固定環は、下部
が上方に向って拡径し、該下部にひき続く中間部では略
鉛直であり、該中間部にひき続く上部では上方に向って
縮径する形状を有している。In the rotating dish according to claim (2), the central portion of the dish surface is expanded downward, the intermediate portion continuing to the central portion is substantially horizontal, and the outer peripheral portion continuing to the intermediate portion is directed upward. Has a shape to expand the diameter. Further, the fixed ring has a shape in which a lower portion is expanded in diameter upward, is substantially vertical in an intermediate portion continuing to the lower portion, and is reduced in diameter upward in an upper portion continuing to the intermediate portion. There is.
[作用] 回転皿の皿面と固定環の内壁面とで囲まれる室内に被処
理粒体又は被処理粒体と改質媒体とを収容し、回転皿を
回転させることで、被処理粒体や改質媒体は回転皿の回
転速度よりも遅い速度で円周方向に公転しながら、皿面
と内壁面を循環する上下方向の円運動をも行ない、これ
ら二つの運動を合成した縄を綯うような螺旋進行運動
(この運動は遠心流動と通称されている。)を行なう。
これにより、被処理粒体同志又は被処理粒体と改質媒体
とが擦れ合い、被処理粒体の表面から子物質が剥離され
る。また、これと平行して回転皿と固定環との間の隙間
から気体を導入するとによって剥離された子物質は気流
搬送されて速やかに室外に排出され、物体物質と分離さ
れる。[Operation] The particles to be treated or the particles to be treated and the reforming medium are housed in a chamber surrounded by the dish surface of the rotating dish and the inner wall surface of the fixed ring, and the rotating dish is rotated, whereby the particles to be treated are treated. The reforming medium revolves in the circumferential direction at a slower speed than the rotation speed of the rotating dish, and also makes a vertical circular motion that circulates on the plate surface and the inner wall surface, and twists the rope that combines these two motions. Such a spiral progressive movement (this movement is commonly called centrifugal flow) is performed.
As a result, the particles to be treated or the particles to be treated and the modifying medium rub against each other, and the sub-substances are separated from the surface of the particles to be treated. Further, in parallel with this, when the gas is introduced from the gap between the rotary dish and the fixed ring, the separated child substance is conveyed by air flow and quickly discharged outside the room, and separated from the object substance.
本発明で採用している表面改質装置は被処理粒体や改質
媒体を遠心流動させるものであり、被処理粒体表面の摩
砕作用が顕著である。このため、短時間のうちに子物質
が剥離される。そして、導入される空気により剥離され
た子物質が速やかに排出されるので母体物質と子物質と
を効率よく分離できる。The surface reforming apparatus used in the present invention centrifuges the particles to be treated and the reforming medium, and has a remarkable grinding effect on the surface of the particles to be treated. Therefore, the child substance is peeled off in a short time. Further, since the separated child substance is quickly discharged by the introduced air, the mother substance and the child substance can be efficiently separated.
また、母体物質が軟かくて子物質が硬い場合、あるい
は、母体物質が硬くて子物質が軟かい場合でも、装置内
での被処理粒体の滞留時間を変えて、被処理粒体同志又
は被処理粒体と改質媒体との擦れ合いの程度を変えるだ
けで容易に対処できる。In addition, when the mother substance is soft and the child substance is hard, or even when the mother substance is hard and the child substance is soft, the residence time of the particles to be treated in the device is changed, This can be easily dealt with only by changing the degree of friction between the particles to be treated and the modifying medium.
さらに、小径の粒体についても確実に子物質を剥離でき
る。Further, the child substance can be reliably peeled off even from the small-diameter particles.
なお、請求項(2)においては被処理粒体や改質媒体の
遠心流動がより円滑に行なわれるので、表面改質効果が
極めて高い。According to claim (2), the centrifugal flow of the particles to be treated and the reforming medium is performed more smoothly, so that the surface reforming effect is extremely high.
[実施例] 以下、図面を参照して実施例について説明する。Embodiments Embodiments will be described below with reference to the drawings.
第2図は本発明方法を実施するに好適な装置の側面図、
第1図は要部縦断面図である。FIG. 2 is a side view of an apparatus suitable for carrying out the method of the present invention,
FIG. 1 is a longitudinal sectional view of a main part.
符号1は固定環、2は回転皿である。固定環1は底面が
プレート3で封じられたドラム状ケーシング4の上側に
固設され、該プレート3は脚柱5により支承されてい
る。回転皿2には支持ブロック6が固設され、該支持ブ
ロック6はベアリング装置7を介して前記プレート3に
支持されている。即ち、プレート3の中央部分には開口
8が穿設され、ベアリングハウジング9のフランジ部1
0が該開口8の縁部に係止され、ボルト11により固定
されている。支持ブロック6の下側には駆動軸12が連
結されており、該駆動軸12は継手13を介して減速機
14の出力軸15に連結されている。符号17は駆動用
の可変速型のモータであり、減速機14に連結されてい
る。Reference numeral 1 is a fixed ring, and 2 is a rotary dish. The fixed ring 1 is fixed to the upper side of a drum-shaped casing 4 whose bottom surface is sealed by a plate 3, and the plate 3 is supported by a pedestal 5. A support block 6 is fixedly mounted on the rotary plate 2, and the support block 6 is supported by the plate 3 via a bearing device 7. That is, the opening 8 is formed in the central portion of the plate 3, and the flange portion 1 of the bearing housing 9 is formed.
0 is locked to the edge of the opening 8 and fixed by a bolt 11. A drive shaft 12 is connected to the lower side of the support block 6, and the drive shaft 12 is connected to an output shaft 15 of a speed reducer 14 via a joint 13. Reference numeral 17 is a variable speed motor for driving, and is connected to the speed reducer 14.
回転皿2の上側には蓋部材18が取り付けられている。
該蓋部材18はその下端外周にフランジ19を備えてお
り、該フランジ19が固定環1の上端外周縁に穿設され
たフランジ20上に載置され、ボルト21により固定さ
れている。蓋部材18の中央には排出管22が設置さ
れ、該排出管22内は固定環1、回転皿2及び蓋部材1
8で囲まれる改質室23内に連通している。蓋部材18
には投入管24が設けられており、該投入管24内は改
質室23内に連通している。A lid member 18 is attached to the upper side of the rotary plate 2.
The lid member 18 is provided with a flange 19 on the outer circumference of the lower end thereof, and the flange 19 is placed on a flange 20 formed on the outer peripheral edge of the upper end of the fixed ring 1 and fixed by a bolt 21. A discharge pipe 22 is installed in the center of the lid member 18, and the fixed ring 1, the rotary plate 2 and the lid member 1 are provided in the discharge pipe 22.
It communicates with the reforming chamber 23 surrounded by 8. Lid member 18
Is provided with a charging pipe 24, and the inside of the charging pipe 24 communicates with the inside of the reforming chamber 23.
次に、第1図を参照して固定環1及び回転皿2の構成に
ついて詳細に説明する。Next, the configurations of the fixed ring 1 and the rotary plate 2 will be described in detail with reference to FIG.
固定環1は軸心方向を鉛直方向にして設置された環形状
のものであり、高さ方向の中途部分(以下、中部とい
う。)1bが最も拡径している。固定環1は、該中部1
bから下方部分(以下、下部という。)1cが下方に向
ってわずかに縮径し、該中部から上方部分(以下、上部
という。)1aは上方に向って縮径している。従って、
該固定環1はその内壁面1Aは下部1cから中部1bに
向ってわずかに拡径し、中部1bは略鉛直であり、中部
1bから上部1aに向って縮径する形状であり、かつ該
内壁面1Aは縦断面が凹状に湾曲している。なお、固定
環1の中部1bの外周面にはフランジ25が突設され、
該フランジ25がケーシング3の上端外周に穿設された
フランジ26に載置され、ボルト27により固定されて
いる。The fixed ring 1 has a ring shape installed with the axial direction being the vertical direction, and the diameter of the middle portion (hereinafter referred to as the middle portion) 1b in the height direction is the largest. The fixed ring 1 is the middle part 1
A lower portion (hereinafter, referred to as a lower portion) 1c is slightly reduced in diameter from b, and an upper portion (hereinafter, referred to as an upper portion) 1a is reduced in diameter from the middle portion. Therefore,
The inner wall surface 1A of the fixed ring 1 has a diameter that slightly expands from the lower portion 1c toward the middle portion 1b, the middle portion 1b is substantially vertical, and the diameter decreases from the middle portion 1b toward the upper portion 1a. The wall surface 1A has a curved vertical cross section. A flange 25 is provided on the outer peripheral surface of the middle portion 1b of the fixed ring 1,
The flange 25 is placed on a flange 26 formed on the outer periphery of the upper end of the casing 3, and is fixed by a bolt 27.
回転皿2の皿面は、中央部分2aでは下方に向って拡径
する形状であり、該中央部分にひき続く中間部分2bで
は略々水平であり、該中間部分2bにひき続く外周部分
2cでは上方に向って拡径する形状である。この皿面2
Aは全体として凹状に湾曲しており、前記固定環1の内
壁面1Aと該皿面2Aとは固定環1と回転皿2との間の
微小な隙間29を除いて連続的な円滑面を形成してい
る。The plate surface of the rotary plate 2 has a shape in which the diameter increases downward in the central portion 2a, is substantially horizontal in the intermediate portion 2b continuing to the central portion, and is substantially horizontal in the outer peripheral portion 2c continuing to the intermediate portion 2b. The shape is such that the diameter increases upward. This plate surface 2
A is concavely curved as a whole, and the inner wall surface 1A of the stationary ring 1 and the dish surface 2A form a continuous smooth surface except for a minute gap 29 between the stationary ring 1 and the rotary dish 2. Is forming.
回転皿2の中央部分には尖頭のキャップ30が装着さ
れ、ボルト31により止め付けられている。回転皿2の
中央部分には軸孔32が穿設され、前記支持ブロック6
の上端が該軸孔32に嵌入されている。上記ボルト31
の下端は該支持ブロック6の上端に設けられたピース3
3に螺合されている。A pointed cap 30 is attached to the central portion of the rotary plate 2 and is fixed by a bolt 31. A shaft hole 32 is bored in the central portion of the rotary plate 2, and the support block 6
The upper end of is fitted into the shaft hole 32. Bolt 31
The lower end of the piece 3 is provided on the upper end of the support block 6.
It is screwed to 3.
なお、図示はしないが固定環1の内壁面1Aと回転皿2
の皿面2Aにはそれぞれライナが装着されている。Although not shown, the inner wall surface 1A of the fixed ring 1 and the rotary plate 2
A liner is attached to each of the dish surfaces 2A.
前記プレート3には空気等の気体の導入口34が穿設さ
れ、配管35を介して気体をケーシング3内の気体室3
6に導入可能としてある。The plate 3 is provided with an inlet 34 for introducing a gas such as air, and the gas is supplied through a pipe 35 to the gas chamber 3 in the casing 3.
It can be introduced in 6.
また、前記排出管22にはバックフィルタなどの粉体捕
集手段(図示略)が接続されている。A powder collecting means (not shown) such as a back filter is connected to the discharge pipe 22.
このように構成された装置による粉体の表面改質方法の
一例について次に説明する。Next, an example of the surface modification method of the powder by the apparatus configured as described above will be described.
予め、改質室23内には例えば球状のボールからなる改
質媒体が多数挿入されている。まず、例えば、母体物質
の粒子表面にこの母体物質とは異質の子物質が付着して
いる被処理粒体を投入管24から装置内に投入する。回
転皿2の回転に伴って被処理粒体及び改質媒体は固定環
1の内壁面1Aと皿面2Aとを循環する円運動(矢印
S)と、回転皿2の軸心回りの公転運動との合成による
縄を綯うような螺旋運動(遠心流動)を行ない、その間
で被処理粒体の粒子表面の摩砕又は剥ぎ取りを行なう。In advance, a large number of reforming media made of, for example, spherical balls are inserted into the reforming chamber 23. First, for example, the particles to be treated in which the child substance different from the mother substance adheres to the surface of the mother substance particles are charged into the apparatus through the charging pipe 24. The granules to be treated and the reforming medium circulate between the inner wall surface 1A of the fixed ring 1 and the dish surface 2A as the rotating dish 2 rotates (arrow S), and the orbital motion of the rotating dish 2 around the axis. A spiral movement (centrifugal flow) is carried out like a rope due to the synthesis with, and the surface of the particles of the particles to be treated is ground or stripped in the meantime.
即ち、回転皿2を回転させると、改質媒体は遠心力によ
り外周方向に移動され、この速度エネルギによって固定
環1の内壁面1Aを這い上り、その這い上る力が重力よ
り小さくなったら次いで該内壁面1Aから離れて回転皿
2の皿面2A上に落下する。皿面2A上に移動した改質
媒体はこの皿面2Aに沿って再び固定環1へ向けて移動
される。That is, when the rotary plate 2 is rotated, the reforming medium is moved in the outer peripheral direction by the centrifugal force, and the velocity energy crawls up the inner wall surface 1A of the fixed ring 1, and when the climbing force becomes smaller than gravity, then It separates from the inner wall surface 1A and falls onto the dish surface 2A of the rotary dish 2. The reforming medium that has moved onto the dish surface 2A is again moved toward the fixed ring 1 along the dish surface 2A.
また、回転皿2を回転させると、改質媒体は回転皿2の
回転速度よりも遅い速度で円周方向に公転する。したが
って、改質媒体は、前述のように皿面2Aと内壁面1A
を循環する上下方向の円運動Sの他に、回転皿2の軸心
回りを回転する公転運動をも行ない、これらの二つの運
動を合成した縄を綯うような螺旋進行運動(遠心流動)
を行なう。When the rotating dish 2 is rotated, the reforming medium revolves in the circumferential direction at a speed lower than the rotation speed of the rotating dish 2. Therefore, as described above, the reforming medium is the dish surface 2A and the inner wall surface 1A.
In addition to the circular motion S in the up-and-down direction that circulates around, a revolving motion that rotates around the axis of the rotary plate 2 is also performed, and a spiral progressing motion (centrifugal flow) that twists the rope combining these two motions.
Do.
このように、改質媒体は回転皿2の円周方向への運動を
維持しつつ内壁面1Aを這い上る運動を行なうのである
が、この内壁面1Aが固定されているとき、改質媒体の
円周方向速度(公転速度)および改質媒体の這い上り速
度との合成速度がそのまま内壁面1Aと改質媒体の速度
差になる。したがって、改質媒体と内壁面1Aとの速度
差は、極めて大きなものとなり、内壁面1A上を移動す
る際の改質媒体の作用による粉砕ならびに摩砕作用は著
しく強いものとなる。In this way, the reforming medium moves up the inner wall surface 1A while maintaining the movement of the rotary dish 2 in the circumferential direction. When the inner wall surface 1A is fixed, the reforming medium The combined speed of the circumferential speed (revolution speed) and the creeping speed of the reforming medium directly becomes the speed difference between the inner wall surface 1A and the reforming medium. Therefore, the speed difference between the reforming medium and the inner wall surface 1A becomes extremely large, and the crushing and grinding action by the action of the reforming medium when moving on the inner wall surface 1A becomes extremely strong.
さらに、内壁面1Aから離脱して皿面2A上に着床した
改質媒体は、この皿面2Aに沿って滑らかに転がり落ち
るので、皿面2Aを転動降下する際の運動により、内壁
面1Aを駆け上る際に得た位置エネルギを半径方向への
運動エネルギに変換することができるから、改質媒体に
一旦付与されたエネルギをいたずらに消費することな
く、剥離作用に有効に利用することができる。さらに、
皿面2Aに沿って降下する際は、改質媒体はこの皿面2
Aと摺動するから、この降下運動中においても子物質の
剥離が行なわれる。Furthermore, since the reforming medium that has left the inner wall surface 1A and has landed on the dish surface 2A rolls down smoothly along this dish surface 2A, the movement when rolling down the dish surface 2A causes the inner wall surface to move. Since the potential energy obtained when ascending 1 A can be converted into kinetic energy in the radial direction, the energy once applied to the reforming medium can be effectively used for the peeling action without being unnecessarily consumed. You can further,
When descending along the plate surface 2A, the reforming medium is
Since it slides with A, the child substance is peeled off even during this descending motion.
配管35、気体室36及び間隙29から改質室23内に
適当量の空気を導入しておき、前記したような遠心流動
を一定時間継続すると、被処理粒体の表皮の子物質が摩
砕あるいは剥ぎ取りにより剥離され、剥離された表皮は
空気とともに排出管22から搬出される。こうして被処
理粒体は子物質と母体物質とに分離される。When a proper amount of air is introduced into the reforming chamber 23 through the pipe 35, the gas chamber 36 and the gap 29 and the centrifugal flow as described above is continued for a certain period of time, the child matter of the epidermis of the particles to be treated is ground. Alternatively, it is peeled off, and the peeled skin is carried out from the discharge pipe 22 together with air. In this way, the particles to be treated are separated into a child substance and a mother substance.
なお、遠心流動している被処理粒体及び改質媒体中に隙
間29から気体が吹き込まれるので、被処理粒体から剥
離された子物質は直ちに気流搬送されて排出される。こ
のため、一旦剥離された子物質が再び母体物質に付着す
ることがない。Since the gas is blown into the particles and the reforming medium that are centrifugally flowing from the gap 29, the child substances separated from the particles to be processed are immediately conveyed by airflow and discharged. Therefore, the separated child substance does not adhere to the base substance again.
勿論、改質室23内への空気の導入は、配管35からの
空気の吹込みで行なう代りに排出管22からの吸引で行
なうこともできる。Of course, the introduction of air into the reforming chamber 23 can be performed by suction from the discharge pipe 22 instead of by blowing air from the pipe 35.
このようにして、被処理粒体の表面から子物質を確実に
剥離することができ、高純度の母体物質又は子物質を効
率良く得ることができる。また、この母体物質は実質的
に表皮の子物質のみが剥離されたものであり、圧潰作用
等は殆ど受けず、ほぼ原型を有するものであり、粒子形
状の好適な母体物質を回収できる。In this way, the sub-substance can be reliably peeled off from the surface of the particles to be treated, and the high-purity base substance or sub-substance can be efficiently obtained. In addition, since the matrix substance is obtained by substantially peeling off only the epidermis substance, it has almost no original shape and is almost in the original form, and the matrix substance having a suitable particle shape can be recovered.
本発明方法によると各種の物質を母体物質とする粒子表
面から通常は異質な子物質を、場合によっては同質の子
物質を剥離することができるが、本発明は特に鉄、銅、
ニッケル、コバルト、アルミニウムなどの金属(純金属
又は合金)の粒子表面から酸化物、窒化物、炭化物など
よりなる子物質を剥離する場合に好適である。According to the method of the present invention, it is possible to peel off a heterogeneous child substance from the particle surface of various substances as a base substance, and in some cases, the same child substance, but the present invention is particularly iron, copper,
It is suitable for exfoliating a child substance made of an oxide, a nitride, a carbide or the like from the particle surface of a metal (pure metal or alloy) such as nickel, cobalt or aluminum.
例えば、本発明は純鉄の粒子表面に付着したスラグを剥
離する場合に好適に採用できる。金属粒子の表面からス
ラグを剥離する場合、被処理粒体の粒径は10mm以
下、とりわけ0.1〜5mm、特に、従来技術に比べて
際立った剥離効果を得ようとする場合は、0.1〜1m
m程度とするのが好適である。また、この場合、スラグ
が鉄に対し50重量%(以下、%と略)以下、特に10
〜20%付着しているものが好適である。For example, the present invention can be preferably used when peeling slag adhering to the surface of pure iron particles. When the slag is peeled off from the surface of the metal particles, the particle diameter of the particles to be treated is 10 mm or less, particularly 0.1 to 5 mm, and especially when it is desired to obtain a remarkable peeling effect as compared with the prior art. 1-1m
It is preferable to set it to about m. Further, in this case, the slag is 50% by weight (hereinafter, abbreviated as%) or less with respect to iron, especially 10
Those having -20% adhesion are preferable.
本発明方法では、改質媒体または被処理粒体のうちで改
質媒体の役目を果すものを用いることにより子物質の剥
離を促進できる改質媒体としては被処理粒体の母体物質
と同材質の粒子が好適であるが、硬質粒子(例えば鋼球
やセラミックボールやコランダムボール)であれば被処
理粒体と改質媒体とは異なる材質のものであっても良
い。In the method of the present invention, the reforming medium that can promote the exfoliation of the child substance by using the reforming medium or the granules to be treated that functions as the reforming medium is the same material as the parent substance of the granules to be treated. However, if the particles are hard particles (for example, steel balls, ceramic balls, or corundum balls), the particles to be treated and the modifying medium may be made of different materials.
また、改質媒体は10mm程度の直径のものが摩砕に好
適であるが、より効率のよい摩砕を行なうには、被処理
粒体の径が改質媒体の径の5〜20%となるようにする
のがよい。なお、被処理粒体を予めある程度一定粒径以
下に破砕しておくか、または、未粉砕物であれば最初か
ら前記した条件に合う粒子径のものを準備しておくこと
もできる。Further, the reforming medium having a diameter of about 10 mm is suitable for milling, but for more efficient milling, the diameter of the particles to be treated is 5 to 20% of the diameter of the reforming medium. It is better to be It should be noted that the particles to be treated may be crushed to a certain size or less in advance, or if the particles are unpulverized, particles having a particle diameter satisfying the above-described conditions may be prepared from the beginning.
本発明では改質媒体を用いず、被処理粒体のみを改質室
23内に装入して回転皿2を回転させるようにしても良
い。このようにすると、被処理粒体が遠心流動した際に
被処理粒体同志が擦れ合い、子物質の剥離が行なわれ
る。In the present invention, the reforming medium may not be used, and only the particles to be treated may be charged into the reforming chamber 23 to rotate the rotary dish 2. In this way, when the particles to be treated are centrifugally flowed, the particles to be treated rub against each other, and the sub-substances are separated.
このように被処理粒体のみを改質室23に装入する場
合、一部の被処理粒体を大径のものとしても良い。この
ようにすると、この大径の粒体が改質媒体と同様に遠心
流動し、強力な摩砕作用を発揮して小径の被処理粒体か
ら子物質を剥離させることができる。(もちろん、大径
の被処理粒体からも子物質が剥離される。)このように
大径の被処理粒体を用いる場合、該大径の粒体の径は小
径の被処理粒体の径の5〜20倍程度とし、大径の粒子
の量は小径の粒子に対し100〜200%程度とするの
が好適である。When only the particles to be treated are charged in the reforming chamber 23 as described above, some of the particles to be treated may have a large diameter. In this way, the large-diameter particles centrifugally flow like the reforming medium, exhibiting a strong grinding action, and the sub-substances can be separated from the small-diameter particles to be treated. (Of course, the child substance is also peeled off from the large-diameter particles to be treated.) When the large-diameter particles to be treated are used, the diameter of the large-diameter particles is smaller than that of the small-particles to be treated. It is preferable that the diameter is about 5 to 20 times the diameter, and the amount of the large diameter particles is about 100 to 200% with respect to the small diameter particles.
なお、回転皿2は例えば50〜1000rpmで回転さ
れる。The rotary plate 2 is rotated at, for example, 50 to 1000 rpm.
本発明方法では、所定量の被処理粒体を改質室23内に
投入し、所定時間装置を運転した後、改質室23内から
母体物質をすべて取り出すバッチ式運転が好適である
が、投入管24から被処理粒体を連続的に投入し、改質
室23内から処理済の母体物質を連続的に抜き出すよう
にした連続処理方式であっても良い。この連続処理を行
う場合、例えば前記隙間29を利用したり、別に設けた
母体物質抜出口(図示せず。)から母体物質を抜き出す
ことができる。隙間から母体物質を抜き出す場合には回
転皿2の下面にスクレーバ(図示せず。)を設けてお
き、隙間から落下した母体物質をかき集め、プレート3
又はケーシング4に設けた排出口(図示せず。)から母
体物質を排出すれば良い。In the method of the present invention, a batch-type operation in which a predetermined amount of particles to be treated is put into the reforming chamber 23, the apparatus is operated for a predetermined time, and then all the matrix substances are taken out from the reforming chamber 23 is preferable. A continuous treatment method may be used in which the particles to be treated are continuously charged from the charging pipe 24 and the treated base material is continuously withdrawn from the reforming chamber 23. When this continuous treatment is performed, for example, the gap 29 can be utilized, or the base substance can be extracted from a separately provided base substance outlet (not shown). When extracting the base substance from the gap, a scraper (not shown) is provided on the lower surface of the rotary dish 2, and the base substance dropped from the gap is scraped off, and the plate 3
Alternatively, the base substance may be discharged from a discharge port (not shown) provided in the casing 4.
なお、隙間29から母体物質を抜き出さない場合であっ
ても、回転皿にスクレーパを設け、隙間から落下した物
質をかき集めて排出するようにしても良い。Even when the base substance is not extracted from the gap 29, a scraper may be provided on the rotary dish to scrape and discharge the substance dropped from the gap.
本発明において、前記隙間から吹き込む気体は通常の場
合、空気が用いられるが、例えば酸化され易い金属を母
体物質とする場合には窒素など空気以外の気体を用いて
も良い。In the present invention, air is usually used as the gas blown from the gap, but when a metal that is easily oxidized is used as a base substance, a gas other than air such as nitrogen may be used.
次に具体的な実施例について説明する。Next, specific examples will be described.
第1,2図に示した装置において平均粒径0.9mmの
被処理物体(母体物質:鉄,子物質:スラグ。スラグの
平均付着量は鉄に対し17%)100kgと改質媒体
(平均粒径10mmの鉄)150kgとを投入した。な
お、装置の緒元は次の通りである。In the apparatus shown in FIGS. 1 and 2, 100 kg of an object to be treated having an average particle diameter of 0.9 mm (matrix substance: iron, child substance: slag. The average amount of slag adhering to iron is 17%) and a reforming medium (average). 150 kg of iron having a particle diameter of 10 mm) was added. The specifications of the device are as follows.
固定環の最大内径:1200mm 固定環の上端内径: 800mm 回転皿の最大内径:1000mm 皿面の最底部から 固定環の上端までの高さ:600mm 隙間:1mm 回転皿2を250rpmで回転させながら配管35から
空気を1200m3/Hrの割合で供給し、15分経過
後装置を停止し、改質室23内から粒子を全量取り出し
て計量したところ、80kgであった。また、分析の結
果、スラグの含有量は5%であった。改質媒体の損耗を
ゼロとした場合、スラグの除去率は76%に達し、鉄の
回収率は92%に達した。Maximum inner diameter of fixed ring: 1200 mm Upper inner diameter of fixed ring: 800 mm Maximum inner diameter of rotating dish: 1000 mm Height from the bottom of the plate surface to the upper end of the fixed ring: 600 mm Gap: 1 mm Piping while rotating the rotating dish 2 at 250 rpm Air was supplied at a rate of 1200 m 3 / Hr from 35, the apparatus was stopped after 15 minutes, and all the particles were taken out from the reforming chamber 23 and weighed, which was 80 kg. As a result of the analysis, the slag content was 5%. When the loss of the reforming medium was set to zero, the slag removal rate reached 76% and the iron recovery rate reached 92%.
なお、第3,4,5図に示した従来法により同じ被処理
粒体の改質処理を同じ時間だけ行ったところ、スラグの
除去率は0.5%、48%及び60%であった。When the same target particles were modified by the conventional method shown in FIGS. 3, 4, and 5 for the same time, the slag removal rates were 0.5%, 48%, and 60%. .
なお、本発明方法を実施する場合においては、回転皿の
回転速度は一定としても良いのであるが、規則的ないし
不規則的に変動させても良い。回転数を変動させること
により、改質媒体や被処理粒体の運動に不規則性が与え
られ、摩砕作用が向上される。In the case of carrying out the method of the present invention, the rotation speed of the rotary dish may be constant, but it may be changed regularly or irregularly. By varying the rotation speed, irregularity is given to the movement of the reforming medium and the particles to be treated, and the grinding action is improved.
[発明の効果] 以上の実施例からも明らかな通り、本発明は被処理粒体
を遠心流動させながら子物質を剥離し、子物質を剥離し
たところに気体を導入することにより、剥離した子物質
をすみやかに母体物質と分離して排出するものであるの
で、剥離した子物質が再び母体物質に結合したり、剥離
した子物質同志がそこで結合し合うこともなく、短時間
で効率良く、かつ、確実容易に子物質を剥離でき、確実
容易に子物質を取り出すことができる。従って、子物質
及び母体物質のいずれを製品とする場合であっても、そ
れらを高収率にて回収できる。[Effects of the Invention] As is clear from the above examples, the present invention peels off the child substance while centrifugally flowing the particles to be treated, and introduces a gas at the place where the child substance is peeled off to separate the child substance. Since the substance is promptly separated from the parent substance and discharged, the peeled child substances do not bond again to the mother substance, and the peeled child substances do not bond with each other there, and in a short time, efficiently, In addition, the child substance can be reliably and easily peeled off, and the child substance can be reliably and easily taken out. Therefore, regardless of whether the child substance or the mother substance is used as a product, they can be recovered in high yield.
すなわち、被処理粒体は回転皿で与えられた遠心力を固
定環で失速する動作を繰り返すため、被処理粒体同志又
は被処理粒体と改質媒体との摩砕作用が顕著である。そ
して、回転皿と固定環の間の隙間から気体を連続的に導
入し、摩砕により改質物質から分離された子物質がただ
ちに気流搬送されて排出されるため、母体物質と子物質
の分離が連続的に効率よくスムースに行なわれる。この
結果、改質装置内での被処理粒体の滞留時間が小さくて
すみ、短時間で改質処理を行なえる。That is, since the particles to be treated repeat the operation of stalling the centrifugal force given by the rotating dish by the fixed ring, the grinding effect between the particles to be treated or the particles to be treated and the modifying medium is remarkable. Then, gas is continuously introduced through the gap between the rotating dish and the stationary ring, and the child substance separated from the reforming substance by grinding is immediately conveyed by air flow and discharged, so that the mother substance and the child substance are separated. Is continuously and efficiently performed smoothly. As a result, the residence time of the particles to be treated in the reforming device is short, and the reforming process can be performed in a short time.
また、他の操作条件を一定にして改質室内への気体の吹
込み量を変えるだけで最適な分離操作が可能なため、母
体物質の変形現象および母体物質の破壊が発生しにく
い。本発明方法によれば、摩砕効果を大幅に高め、かつ
摩砕に要する動力原単位を大幅に減少させることが可能
である。Further, since the optimum separation operation can be performed only by changing the amount of gas blown into the reforming chamber while keeping other operating conditions constant, the deformation phenomenon of the host substance and the destruction of the host substance are unlikely to occur. According to the method of the present invention, it is possible to significantly enhance the milling effect and significantly reduce the power consumption unit required for milling.
本発明方法によると、従来法では表面改質できなかった
例えば粒径1mm以下の小粒子についても効率良く表面
改質を行なうことができる。According to the method of the present invention, surface modification can be efficiently performed even for small particles having a particle size of 1 mm or less, which cannot be surface modified by the conventional method.
特に、本発明の請求項(2)によると、より効率良く表
面改質を行なうことができる。Particularly, according to claim (2) of the present invention, the surface modification can be performed more efficiently.
第1図は実施例装置の要部縦断面図、第2図は全体側面
図である。第3図,第4図及び第5図は従来例の説明図
である。 1……固定環、2……回転皿、 1A……内壁面、2A……皿面、 3……プレート、4……ケーシング、 14……減速機、17……モータ、 18……蓋部材、22……排出管、 23……改質室、24……投入管、 29……隙間。FIG. 1 is a longitudinal sectional view of a main part of the embodiment apparatus, and FIG. 2 is an overall side view. FIG. 3, FIG. 4 and FIG. 5 are explanatory views of a conventional example. 1 ... Stationary ring, 2 ... Rotating pan, 1A ... Inner wall surface, 2A ... Plate surface, 3 ... Plate, 4 ... Casing, 14 ... Reduction gear, 17 ... Motor, 18 ... Lid member , 22 ... discharge pipe, 23 ... reforming chamber, 24 ... input pipe, 29 ... gap.
Claims (2)
る被処理粒体から該子物質を剥離させる粒体の表面改質
方法において、 回転軸心が縦方向に向いていて、少なくとも中央部分が
下方に向って拡径する皿面を有し、かつ該皿面の縦断面
が凹状に湾曲している形状の回転自在な円状の回転皿
と、 少なくとも上部が上方に向って縮径する内壁面を有し、
該内壁面の縦断面が凹状に湾曲している形状であり、前
記回転皿と同軸的に周設されて静止している固定環とを
具備し、 前記回転皿の皿面と固定環の内壁面とが、回転皿と固定
環との間の微小隙間を除いて、連続的な円滑面に形成さ
れている装置を用い、 該装置の皿面と内壁面とで囲まれる改質室内に前記被処
理粒体又は被処理粒体と改質媒体とを収容した状態で回
転皿を回転させて被処理粒体の表面から子物質を剥離さ
せると共に、 前記回転皿と固定環との間の微小隙間から気体を該改質
室内に導入し、被処理粒体から剥離した子物質を気流搬
送して改質室外に排出させることを特徴とする粒体の表
面改質方法。1. A method for surface modification of a granular material, wherein a sub-substance is separated from a particle to be treated in which a sub-substance is adhered to the surface of the parent substance particle, wherein the axis of rotation is oriented in the longitudinal direction and at least A rotatable circular rotary plate having a central portion having a dish surface whose diameter expands downward and the longitudinal cross section of the dish surface is concavely curved; and at least an upper portion of which is compressed upward. Has an inner wall surface that
The inner wall surface has a shape in which a vertical cross section is curved in a concave shape, and includes a stationary ring that is coaxially provided around the rotating dish and is stationary. An apparatus is used in which the wall surface is formed as a continuous smooth surface except for a minute gap between the rotary dish and the fixed ring, and the above-mentioned apparatus is provided in the reforming chamber surrounded by the dish surface and the inner wall surface of the apparatus. While rotating the rotary dish in the state of containing the particles to be treated or the particles to be treated and the modifying medium, the sub-substances are separated from the surface of the particles to be treated, and the fine particles between the rotating dish and the stationary ring are A method for modifying the surface of a granular material, characterized in that a gas is introduced into the reforming chamber through a gap, and the child substance separated from the particles to be treated is conveyed by air flow and discharged outside the modifying chamber.
って拡径し、該中央部分にひき続く中間部分では略水平
であり、該中間部分にひき続く外周部分では上方に向っ
て拡径する形状を有し、 前記固定環は、下部が上方に向って拡径し、該下部にひ
き続く中間部では略鉛直であり、該中間部にひき続く上
部では上方に向って縮径する形状を有している請求項
(1)の粒体の表面改質方法。2. The rotating dish has a central portion of the dish surface that expands downward, is substantially horizontal at an intermediate portion that continues to the central portion, and is upward at an outer peripheral portion that extends to the intermediate portion. The fixed ring has a shape in which the lower part expands upward, is substantially vertical in the middle part that continues to the lower part, and contracts upward in the upper part that continues to the middle part. The method for modifying the surface of a granular material according to claim 1, which has a diameter.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22024688A JPH0634939B2 (en) | 1988-09-02 | 1988-09-02 | Surface modification method of granules |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP22024688A JPH0634939B2 (en) | 1988-09-02 | 1988-09-02 | Surface modification method of granules |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0268150A JPH0268150A (en) | 1990-03-07 |
| JPH0634939B2 true JPH0634939B2 (en) | 1994-05-11 |
Family
ID=16748184
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP22024688A Expired - Lifetime JPH0634939B2 (en) | 1988-09-02 | 1988-09-02 | Surface modification method of granules |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0634939B2 (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9334586B2 (en) | 2009-03-31 | 2016-05-10 | Donghua University | Process of melt-spinning polyacrylonitrile fiber |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4777443B2 (en) * | 2009-02-10 | 2011-09-21 | 東芝テック株式会社 | Printing device |
-
1988
- 1988-09-02 JP JP22024688A patent/JPH0634939B2/en not_active Expired - Lifetime
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US9334586B2 (en) | 2009-03-31 | 2016-05-10 | Donghua University | Process of melt-spinning polyacrylonitrile fiber |
| US9428850B2 (en) | 2009-03-31 | 2016-08-30 | Donghua University | Process of making pan-based carbon fiber |
| US9476147B2 (en) | 2009-03-31 | 2016-10-25 | Donghua University | Gel spinning process for producing a pan-based precursor fiber |
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0268150A (en) | 1990-03-07 |
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