JPH0644148B2 - Anti-reflection coated pellicle manufacturing method - Google Patents
Anti-reflection coated pellicle manufacturing methodInfo
- Publication number
- JPH0644148B2 JPH0644148B2 JP14896886A JP14896886A JPH0644148B2 JP H0644148 B2 JPH0644148 B2 JP H0644148B2 JP 14896886 A JP14896886 A JP 14896886A JP 14896886 A JP14896886 A JP 14896886A JP H0644148 B2 JPH0644148 B2 JP H0644148B2
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- support frame
- supported
- producing
- antireflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title claims description 12
- 239000010409 thin film Substances 0.000 claims description 51
- 239000011248 coating agent Substances 0.000 claims description 18
- 238000000576 coating method Methods 0.000 claims description 18
- 229920005989 resin Polymers 0.000 claims description 18
- 239000011347 resin Substances 0.000 claims description 18
- 239000010408 film Substances 0.000 claims description 12
- 229910001512 metal fluoride Inorganic materials 0.000 claims description 6
- 239000000020 Nitrocellulose Substances 0.000 claims description 3
- FJWGYAHXMCUOOM-QHOUIDNNSA-N [(2s,3r,4s,5r,6r)-2-[(2r,3r,4s,5r,6s)-4,5-dinitrooxy-2-(nitrooxymethyl)-6-[(2r,3r,4s,5r,6s)-4,5,6-trinitrooxy-2-(nitrooxymethyl)oxan-3-yl]oxyoxan-3-yl]oxy-3,5-dinitrooxy-6-(nitrooxymethyl)oxan-4-yl] nitrate Chemical group O([C@@H]1O[C@@H]([C@H]([C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O)O[C@H]1[C@@H]([C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@@H](CO[N+]([O-])=O)O1)O[N+]([O-])=O)CO[N+](=O)[O-])[C@@H]1[C@@H](CO[N+]([O-])=O)O[C@@H](O[N+]([O-])=O)[C@H](O[N+]([O-])=O)[C@H]1O[N+]([O-])=O FJWGYAHXMCUOOM-QHOUIDNNSA-N 0.000 claims description 3
- 229920001220 nitrocellulos Polymers 0.000 claims description 3
- KXJGSNRAQWDDJT-UHFFFAOYSA-N 1-acetyl-5-bromo-2h-indol-3-one Chemical compound BrC1=CC=C2N(C(=O)C)CC(=O)C2=C1 KXJGSNRAQWDDJT-UHFFFAOYSA-N 0.000 claims description 2
- 229920008347 Cellulose acetate propionate Polymers 0.000 claims description 2
- 229920002301 cellulose acetate Polymers 0.000 claims description 2
- 229920006217 cellulose acetate butyrate Polymers 0.000 claims description 2
- 238000000151 deposition Methods 0.000 claims 1
- 238000000034 method Methods 0.000 description 12
- 238000007740 vapor deposition Methods 0.000 description 11
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 6
- 239000011521 glass Substances 0.000 description 6
- 229920000742 Cotton Polymers 0.000 description 5
- 239000000853 adhesive Substances 0.000 description 5
- 230000001070 adhesive effect Effects 0.000 description 5
- 239000000126 substance Substances 0.000 description 5
- 230000000694 effects Effects 0.000 description 4
- 239000000463 material Substances 0.000 description 4
- PUZPDOWCWNUUKD-UHFFFAOYSA-M sodium fluoride Chemical compound [F-].[Na+] PUZPDOWCWNUUKD-UHFFFAOYSA-M 0.000 description 4
- 238000002834 transmittance Methods 0.000 description 4
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical compound [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 description 3
- 229910001634 calcium fluoride Inorganic materials 0.000 description 3
- 229920002678 cellulose Polymers 0.000 description 3
- 239000000428 dust Substances 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- OYLGJCQECKOTOL-UHFFFAOYSA-L barium fluoride Chemical compound [F-].[F-].[Ba+2] OYLGJCQECKOTOL-UHFFFAOYSA-L 0.000 description 2
- 229910001632 barium fluoride Inorganic materials 0.000 description 2
- 239000001913 cellulose Substances 0.000 description 2
- ORUIBWPALBXDOA-UHFFFAOYSA-L magnesium fluoride Chemical compound [F-].[F-].[Mg+2] ORUIBWPALBXDOA-UHFFFAOYSA-L 0.000 description 2
- 229910001635 magnesium fluoride Inorganic materials 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 238000002360 preparation method Methods 0.000 description 2
- 235000013024 sodium fluoride Nutrition 0.000 description 2
- 239000011775 sodium fluoride Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 239000002904 solvent Substances 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- DKPFZGUDAPQIHT-UHFFFAOYSA-N Butyl acetate Natural products CCCCOC(C)=O DKPFZGUDAPQIHT-UHFFFAOYSA-N 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 238000011109 contamination Methods 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 238000001723 curing Methods 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 229920006332 epoxy adhesive Polymers 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 229910044991 metal oxide Inorganic materials 0.000 description 1
- 238000012544 monitoring process Methods 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 239000003960 organic solvent Substances 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000000016 photochemical curing Methods 0.000 description 1
- 230000000630 rising effect Effects 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052814 silicon oxide Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 238000001771 vacuum deposition Methods 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/62—Pellicles, e.g. pellicle assemblies, e.g. having membrane on support frame; Preparation thereof
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Description
【発明の詳細な説明】 〔産業上の利用分野〕 本発明はフォトマスクの防塵カバーに適した光線過率の
大きい透明樹脂薄膜からなるコーテッドペリクルの製法
に関する。Description: TECHNICAL FIELD The present invention relates to a method for producing a coated pellicle, which is suitable for a dust-proof cover of a photomask and which is made of a transparent resin thin film having a large light transmittance.
集積回路の製造には、投影プリント法が使用されている
が、これはフォトマスク上のパターンを、光線を用い
て、レヂストを塗布したシリコンウエハー上に投影し、
パターンに対応する部分のレヂストの光劣化又は光硬化
を行わせるものである。このとき、フォトマスク上のパ
ターンの望ましくない付着物（即ちゴミ）が存在する
と、それがウエハー上に投影されてしまう。この影響を
回避するために、樹脂薄膜で製した防塵カバーを使用す
る方法が考案されている（特公昭５４−２８７１６
号）。このような防塵カバーを使用することにより、集
積回路チップの製造歩留りが向上し、フォトマスクのク
リーニング回路が減少してその寿命を伸ばすなどの効果
がある。この場合、ゴミはフォトマスクの画像面上に付
着するかわりに、樹脂薄膜の表面に付着することにな
る。この際、薄膜自身の厚み及びフォトマスク画像と薄
膜との距離が全面にわたって一定であれば、薄膜上の異
物、即ちゴミの存在の影響をレジスト面においてアウト
フォーカシングさせることが可能であり、フォトマスク
画像に忠実なパターンを露光により得ることができる。Projection printing is used in the manufacture of integrated circuits, which uses a light beam to project a pattern on a photomask onto a resist-coated silicon wafer.
The optical deterioration or the photo-curing of the resist of the portion corresponding to the pattern is performed. At this time, if there is an unwanted deposit (that is, dust) of the pattern on the photomask, it is projected onto the wafer. In order to avoid this effect, a method of using a dustproof cover made of a resin thin film has been devised (Japanese Patent Publication No. 54-28716).
issue). By using such a dustproof cover, the manufacturing yield of the integrated circuit chip is improved, and the cleaning circuit of the photomask is reduced to prolong its life. In this case, dust adheres to the surface of the resin thin film instead of adhering to the image surface of the photomask. At this time, if the thickness of the thin film itself and the distance between the photomask image and the thin film are constant over the entire surface, the effect of the presence of foreign matter, that is, dust on the thin film can be out-focused on the resist surface. A pattern faithful to the image can be obtained by exposure.
上記薄膜は所定の厚みを有する支持枠にその外周を接着
支持させてリングラフィ工程に使用する。このようにし
たものを業界ではペリクルと呼んでおり、これに用いる
薄膜の厚みは通常約0.9μｍ又は約2.9μｍと極めて薄い
ものであるため、その準備及び取り扱いに格別の工夫を
要する。The thin film is used in the linography step by adhering and supporting the outer periphery of the thin film to a supporting frame having a predetermined thickness. Such a thing is called a pellicle in the industry, and the thickness of the thin film used for it is usually as thin as about 0.9 μm or about 2.9 μm, so that special preparation is required for its preparation and handling.
本発明者等はさきにフォトマスク保護用薄膜の製造方法
としてセルロースエステルを有機溶剤に溶解したものを
平滑なガラス板上に流延し、溶剤を除去してガラス板上
に均一な厚みの薄膜を形成した後、水中で薄膜がガラス
板から分離して自然に剥離するのを持ってこれを回収
し、湿潤状態の間に支持枠を接着支持させる方法（特開
昭５８−２１９０２３号）を提案した。この方法によれ
ば薄膜は支持枠に支持された状態で乾燥される過程で均
一な緊張状態が達成できる。The present inventors previously cast a solution of cellulose ester dissolved in an organic solvent onto a smooth glass plate as a method for producing a thin film for protecting a photomask, remove the solvent, and form a thin film having a uniform thickness on the glass plate. After the formation of the film, the thin film is separated from the glass plate in water and spontaneously peels off and is recovered, and the supporting frame is adhered and supported in a wet state (JP-A-58-219023). Proposed. According to this method, a uniform tension state can be achieved while the thin film is dried while being supported by the support frame.
しかしながら、このような樹脂薄膜は物質として光線透
過率の大きいものを使用しても、露光光線の使用波長領
域（300〜700mm）にわたって95％以上の透過率を得るこ
とは出来ない。これは、光線の一部が膜／大気の界面で
反射して逆行し、そのまた一部が反対側の膜／大気の界
面で反射して順行する。この２回反射後の順行光は、直
接透過光に対し、膜厚の２倍だけ遅れた光、即ち同一波
長で位相差のある光となって互いに干渉し合うためであ
る。However, even if such a resin thin film having a large light transmittance is used as the substance, it is not possible to obtain a transmittance of 95% or more over the operating wavelength range (300 to 700 mm) of the exposure light. This is because some of the light rays are reflected back at the film / air interface and some are reflected back at the opposite film / air interface. This is because the forward light after being reflected twice becomes light that is delayed by twice the film thickness of the directly transmitted light, that is, light having a phase difference at the same wavelength and interferes with each other.
このような膜内２回反射光の干渉による影響を除去し、
光線透過率を向上させる方法として、発明者らはさらに
薄膜の一方又は両方の表面に、薄膜材質よりも屈折率の
低い透明物質を約100nmの厚みにコーティングすること
によって、300〜700nmの波長の光を96%以上透過するコ
ーテッド薄膜を得ることができることを認め、特開昭６
１−１３２０１号にその内容を開示した。By removing the influence of the interference of the twice-reflected light in the film,
As a method for improving the light transmittance, the inventors further coated one or both surfaces of the thin film with a transparent substance having a refractive index lower than that of the thin film material to a thickness of about 100 nm to obtain a wavelength of 300 to 700 nm. It was found that a coated thin film that transmits 96% or more of light can be obtained, and it is disclosed in Japanese Patent Laid-Open No.
The contents are disclosed in No. 1-13201.
ペリクルに使用する樹脂薄膜には、特にセルロース誘導
体が優れている。前述の様に、膜面２回反射光による干
渉の影響を除去する目的においては、樹脂薄膜材質より
も屈折率の低い物質をコーティングする必要がある。即
ち、セルロース誘導体の場合、露光に使用する300〜700
nmの波長の範囲に対する屈折率は1.50〜1.55程度である
ので、コーティングに適する物質としては、弗化カルシ
ウム（436nmにおける屈折率1.23、以下同様）、弗化バ
リウム（1.3）、弗化ナトリウム（1.34）、弗化マグネ
シウム（1.38）などがある。Cellulose derivatives are particularly excellent for the resin thin film used for the pellicle. As described above, in order to remove the influence of interference due to the twice-reflected light on the film surface, it is necessary to coat a substance having a lower refractive index than the resin thin film material. That is, in the case of a cellulose derivative, 300 to 700 used for exposure
Since the refractive index for the wavelength range of nm is about 1.50 to 1.55, suitable materials for coating are calcium fluoride (refractive index 1.23 at 436 nm, the same below), barium fluoride (1.3), sodium fluoride (1.34). ), Magnesium fluoride (1.38), etc.
これらの金属弗化物等を薄膜にコーティングする方法と
しては、真空蒸着法が用いられる。即ち、金属弗化物等
を10-3〜10-5Torrの高真空中で加熱し、発生する蒸気を
樹脂薄膜上に蒸着させる。A vacuum deposition method is used as a method for coating these thin films with such metal fluorides. That is, metal fluoride or the like is heated in a high vacuum of 10 −3 to 10 −5 Torr, and the generated vapor is vapor-deposited on the resin thin film.
上述したように支持枠に樹脂薄膜を均一な緊張状態を保
って支持させる技術は確立されているので支持枠を薄膜
を支持させた状態で金属弗化物等を蒸着させると反射防
止コーテッドペリクルを得ることができる。As described above, a technique for supporting the resin thin film on the support frame while maintaining a uniform tension state has been established. Therefore, when the support frame supports the thin film, metal fluoride or the like is vapor-deposited to obtain an antireflection coated pellicle. be able to.
支持枠で先ず薄膜を装着し、その状態で蒸着コーティン
グを施した製品は、しかしながら次のような問題点があ
ることが判明した。However, it has been found that the product in which the thin film is first mounted on the support frame and the vapor deposition coating is applied in that state has the following problems.
１）蒸着コーティングは樹脂薄膜面のみに止まらず、支
持枠体表面にも及ぶ。薄膜面は直接に固体が接触するよ
う留意して取り扱われるが、支持枠体は治具や作業者の
手と接触するのでコーティング脱落及びこれによる汚染
発生の危険性がある。1) The vapor deposition coating extends not only to the resin thin film surface but also to the support frame surface. The thin film surface is handled with care so that solids come into direct contact, but since the support frame comes into contact with the jig and the operator's hand, there is a risk of the coating falling off and the resulting contamination.
２）また、蒸着コーチィングは支持枠体と樹脂薄膜の境
界部分に、支持枠立ち上がりの影響によって蒸着死角が
形成され、その部分の蒸着厚みがうすくなる。蒸着死角
となる部分は支持枠高さが2.0mmの場合、0.5mm巾程度、
支持枠高さが10mmの場合、2.5mm巾程度である。ペリク
ルの大きさは一辺又は直径が80〜120mmのものであり、
従来は露光工程で厚みの均一な中央部のみを専ら使用し
たため、実用上の問題は生じなかった。しかしながら、
集積回路も集積度の増大及び生産効率向上の要求が大き
くなるに伴いペリクルの周辺部分をも使用するようにな
って来たが、その場合コーティングの不均一な部分を利
用すれば製品の仕上がり精度が低下する。2) Further, in the vapor deposition coating, a vapor deposition dead angle is formed at the boundary portion between the support frame and the resin thin film due to the effect of rising of the support frame, and the vapor deposition thickness of that portion becomes thin. If the support frame height is 2.0 mm, the area that will be the blind spot will be about 0.5 mm wide,
If the support frame height is 10 mm, it is about 2.5 mm wide. The size of the pellicle is one with a side or diameter of 80 to 120 mm,
Conventionally, since only the central portion having a uniform thickness was used in the exposure step, there was no practical problem. However,
With the increasing demand for higher integration and higher production efficiency in integrated circuits, the peripheral part of the pellicle has come to be used. In that case, if the uneven part of the coating is used, the accuracy of the finished product can be improved. Is reduced.
即ち、蒸着コーティングが樹脂薄膜の端から端まで均一
であり、且つ支持枠には蒸着が及んでいないペリクルが
要求されている。That is, there is a demand for a pellicle in which vapor deposition coating is uniform from end to end of the resin thin film and the support frame is not vapor-deposited.
本発明者等は、現在使用されている支持枠より直径又は
長さ、巾が一回り大きい仮支持枠に薄膜を従来の方法で
装着し、蒸着コーティングを行った後、支持枠体上に移
設支持させることにより、支持枠に蒸着が及ばず支持枠
内の端から端までの間、コーティング厚みが均一である
ペリクルが得られることを認め本発明に到達した。The inventors of the present invention attach a thin film to a temporary support frame having a diameter, length, and width slightly larger than the currently used support frame by a conventional method, perform vapor deposition coating, and then transfer the thin film onto a support frame. It was confirmed that the pellicle having a uniform coating thickness can be obtained from the end to the end in the support frame without vapor deposition on the support frame by supporting the pellicle.
即ち、本発明は、0.5〜10μｍの膜厚が全域にわたって
一定な樹脂薄膜であって、均一な緊張状態で周辺を支持
枠体上に接着支持され、片面又は両面に反射防止コーテ
ィングが施されている樹脂薄膜からなるコーテッドペリ
クルの製法において、上記支持枠よりも大きなスパンを
有する仮支持枠を用いて、未コーテッド薄膜を支持させ
た状態で反射防止コーティングを施し、しかる後に支持
枠体上に移設支持させることを特徴とする反射防止コー
テッドペリクルの製法に関するものである。That is, the present invention is a resin thin film having a film thickness of 0.5 to 10 μm which is constant over the entire area, the periphery of which is adhered and supported on a support frame in a uniform tension state, and an antireflection coating is applied to one side or both sides. In the method for producing a coated pellicle consisting of a resin thin film, a temporary support frame having a span larger than that of the above support frame is used to apply an antireflection coating while the uncoated thin film is supported, and then transferred to a support frame. The present invention relates to a method for producing an antireflection coated pellicle characterized by being supported.
本発明において使用される樹脂薄膜としては硝酸セルロ
ース、酢酸セルロース、酢酸プロピオン酸セルロース、
酢酸酪酸セルロース又はシアノエチルセルロース等が挙
げられる。As the resin thin film used in the present invention, cellulose nitrate, cellulose acetate, cellulose acetate propionate,
Examples thereof include cellulose acetate butyrate and cyanoethyl cellulose.
又、反射防止コーティングとしては、金属弗化物又は酸
化物を蒸着させてなるものが好ましい。金属弗化物とし
ては弗化カルシウム、弗化バリウム、弗化ナトリウム、
弗化マグネシウム等が挙げられ、酸化物としては酸化珪
素、酸化チタン、酸化ジルコニウム等が挙げられる。Further, the antireflection coating is preferably one obtained by vapor deposition of metal fluoride or oxide. The metal fluorides include calcium fluoride, barium fluoride, sodium fluoride,
Examples thereof include magnesium fluoride, and examples of the oxide include silicon oxide, titanium oxide, zirconium oxide, and the like.
ペリクルの樹脂薄膜は極めて薄いものであるため、四囲
を支持してはじめて形状を保持できる。さらに完全な水
平を保つためには膜面に平行な全方向において均一な緊
張状態を有するように支持させなければならない。その
ような膜の支持方法として、発明者等はさきに、薄膜が
湿潤状態にある間に支持枠に接着支持させ、乾燥過程で
のごく微小の収縮を利用して均一な緊張下に支持させる
方法を提案した（特開昭５８−２１９０２３号）。Since the resin thin film of the pellicle is extremely thin, the shape can be maintained only after supporting the four enclosures. Further, in order to maintain perfect horizontalness, it must be supported so as to have a uniform tension in all directions parallel to the membrane surface. As a method of supporting such a membrane, the present inventors have previously made the thin film adhere to a supporting frame while it is in a wet state and support it under uniform tension by utilizing a very small shrinkage in the drying process. A method was proposed (JP-A-58-219023).
本発明においては、仮支持枠への支持にこの方法がその
まま適用できるが、他の方法を用いてもよいことは云う
までもない。支持枠の直径又は一辺は90〜120cm程度の
ものが使用されているが、仮支持枠は支持枠の外側より
も５mm以上、好ましくは10〜40mm大きい内側寸法を有す
るものを用いる。支持枠との寸法差があまり小さいと、
作業が困難になり、大きすぎると材料の得率が低下して
不経済になる。In the present invention, this method can be directly applied to support on the temporary support frame, but it goes without saying that other methods may be used. Although the diameter or one side of the support frame is about 90 to 120 cm, a temporary support frame having an inner dimension larger than the outer side of the support frame by 5 mm or more, preferably 10 to 40 mm is used. If the dimensional difference from the support frame is too small,
If the work becomes difficult and the size is too large, the yield of the material is reduced, which is uneconomical.
本発明の方法を実施するにあたり、仮支持枠への薄膜の
接着は、溶液型接着剤又は薄膜物質の溶剤を用いて行う
と、接着力は比較的低いが、接着時間が早く仕上がり状
態の良い接着が行える。次に支持枠への装着には接着時
間は長いが接着力の大きい触媒硬化型の接着剤を用いて
行うのが良い。In carrying out the method of the present invention, when the thin film is adhered to the temporary support frame using a solution adhesive or a solvent of the thin film substance, the adhesive force is relatively low, but the adhesion time is fast and the finished state is good. Can be bonded. Next, for mounting on the support frame, it is preferable to use a catalyst-curing type adhesive having a long adhesive time but a large adhesive force.
本発明の方法により、支持枠体の蒸着が及ばず、膜面の
全域にわたって均一な反射防止コーティングを有するペ
リクルを得ることができる。According to the method of the present invention, it is possible to obtain a pellicle having a uniform antireflection coating over the entire film surface without vapor deposition of the supporting frame.
実施例 硝化綿RS−５（ダイセル化学工業製、イソプロパノール
湿綿、固型分70％）64ｇ、メチルエチルケトン146ｇ、
酢酸ブチル120ｇ及びトルエン120ｇからなる硝化綿ドー
プを、クリアランス50μｍのパーコーターを用いて、平
滑なガラス板上に塗布し、24時間室温（20℃）に放置乾
燥し、さらに60℃で１時間乾燥した。乾燥フィルム化し
た硝化綿をガラス板ごと静かに清浄な水中に浸漬した。
暫時放置すると、硝化綿薄膜はガラス板から自然に剥離
したので、一旦直径約185mmの円形アルミフレームを用
いて形を崩さないようすくい上げ、該フレーム内の部分
を内径160mm、外径163mm、厚さ３mmのアルミニウム製仮
支持枠の上面にマウントした。次いで薄膜の支持枠との
接触界面に沿って、少量のメチルエチルケトンを塗布
し、風乾することによって、フィルムを支持枠に接着さ
せた。支持枠の外側にはみ出している部分のフィルムを
切り除き、60℃で３時間乾燥させると、均一な緊張度で
支持された厚さ３μｍ（比重1.6）の硝酸セルロース薄
膜が得られた。Example Nitrified cotton RS-5 (manufactured by Daicel Chemical Industries, isopropanol wet cotton, solid content 70%) 64 g, methyl ethyl ketone 146 g,
A nitrified cotton dope composed of 120 g of butyl acetate and 120 g of toluene was applied on a smooth glass plate using a percoater with a clearance of 50 μm, left to dry at room temperature (20 ° C.) for 24 hours, and further dried at 60 ° C. for 1 hour. . The dried film of nitrified cotton together with the glass plate was gently immersed in clean water.
When left alone for a while, the nitrified cotton thin film spontaneously peeled off from the glass plate, so once it was scooped up using a circular aluminum frame with a diameter of about 185 mm so as not to lose its shape, and the part inside the frame was 160 mm inside diameter, 163 mm outside diameter, thickness It was mounted on the upper surface of a 3 mm aluminum temporary support frame. The film was then adhered to the support frame by coating a small amount of methyl ethyl ketone along the contact interface of the thin film with the support frame and air drying. The portion of the film protruding to the outside of the support frame was cut off and dried at 60 ° C. for 3 hours to obtain a cellulose nitrate thin film having a thickness of 3 μm (specific gravity 1.6) supported with a uniform tension.
上記仮支持枠に支持された薄膜にシンクロン真空蒸着装
置（真空器機工業）を用いて、438nmの光でモニターし
ながら反射率が最小となるまで弗化カルシウムのコーテ
ィングを行った。The thin film supported by the temporary support frame was coated with calcium fluoride using a SYNCHRON vacuum vapor deposition apparatus (Vacuum Equipment Co., Ltd.) while monitoring with light of 438 nm until the reflectance became minimum.
コーティング層の厚さは約110nmであった。The thickness of the coating layer was about 110 nm.
片面コーテッド薄膜を反転し、同様にして両面コーテッ
ド薄膜とした。The single-sided coated thin film was inverted to form a double-sided coated thin film in the same manner.
次に内径102mm、外径107mm、厚み（立ち上がり）6.3mm
のアルミ製支持枠の上面にエポキシ系接着剤（商品名：
セメダインパイスーパー）を塗布し、仮支持枠に支持さ
れたコーテッド薄膜の薄膜部分を重ね、静置して接着を
完了させたのち、支持枠の外へはみ出した薄膜を切除し
て製品を得た。Next, inner diameter 102 mm, outer diameter 107 mm, thickness (rise) 6.3 mm
Epoxy adhesive (commercial name:
Cemedine pie super) was applied, the thin film part of the coated thin film supported on the temporary support frame was overlaid, and allowed to stand still to complete the adhesion, and then the thin film protruding to the outside of the support frame was cut off to obtain a product. .
Claims (3)
な樹脂薄膜であって、均一な緊張状態で周辺を支持枠体
上に接着支持され、片面又は両面に反射防止コーティン
グが施されている樹脂薄膜からなるコーテッドペリクル
の製法において、上記支持枠よりも大きなスパンを有す
る仮支持枠を用いて、未コーテッド薄膜を支持させた状
態で反射防止コーティングを施し、しかる後に支持枠体
上に移設支持させることを特徴とする反射防止コーテッ
ドペリクルの製法。1. A resin thin film having a film thickness of 0.5 to 10 μm which is constant over the entire area, the periphery of which is adhered and supported on a support frame in a uniform tension state, and an antireflection coating is applied to one side or both sides. In the method for producing a coated pellicle composed of a resin thin film, a temporary support frame having a span larger than that of the above-mentioned support frame is used to apply an antireflection coating while the uncoated thin film is supported, and then transferred and supported on a support frame. A method for producing an antireflection coated pellicle, which comprises:
化物を蒸着させてなるものである特許請求の範囲第１項
記載の反射防止コーテッドペリクルの製法。2. The method for producing an antireflection coated pellicle according to claim 1, wherein the antireflection coating is formed by depositing a metal fluoride or an oxide.
ス、酢酸プロピオン酸セルロース、酢酸酪酸セルロース
又はシアノエチルセルロースである特許請求の範囲第１
項又は第２項記載の反射防止コーテッドペリクルの製
法。3. The resin thin film is cellulose nitrate, cellulose acetate, cellulose acetate propionate, cellulose acetate butyrate or cyanoethyl cellulose.
Item 4. The method for producing an antireflection coated pellicle according to Item 2 or Item 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14896886A JPH0644148B2 (en) | 1986-06-25 | 1986-06-25 | Anti-reflection coated pellicle manufacturing method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14896886A JPH0644148B2 (en) | 1986-06-25 | 1986-06-25 | Anti-reflection coated pellicle manufacturing method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS635344A JPS635344A (en) | 1988-01-11 |
| JPH0644148B2 true JPH0644148B2 (en) | 1994-06-08 |
Family
ID=15464693
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14896886A Expired - Lifetime JPH0644148B2 (en) | 1986-06-25 | 1986-06-25 | Anti-reflection coated pellicle manufacturing method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0644148B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2733483B2 (en) * | 1988-12-13 | 1998-03-30 | 三井化学株式会社 | Manufacturing method of high light transmitting dustproof body |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60134239A (en) * | 1983-12-23 | 1985-07-17 | Fujitsu Ltd | Mask substrate |
| JPS60237450A (en) * | 1984-05-11 | 1985-11-26 | Asahi Chem Ind Co Ltd | Dust preventing cover for nonreflective photomask-reticle and its manufacture |
-
1986
- 1986-06-25 JP JP14896886A patent/JPH0644148B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS635344A (en) | 1988-01-11 |
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