JPH0644659B2 - Optical integrated circuit device - Google Patents
Optical integrated circuit deviceInfo
- Publication number
- JPH0644659B2 JPH0644659B2 JP60157254A JP15725485A JPH0644659B2 JP H0644659 B2 JPH0644659 B2 JP H0644659B2 JP 60157254 A JP60157254 A JP 60157254A JP 15725485 A JP15725485 A JP 15725485A JP H0644659 B2 JPH0644659 B2 JP H0644659B2
- Authority
- JP
- Japan
- Prior art keywords
- laser
- light
- integrated circuit
- optical integrated
- cavity
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
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- Optical Integrated Circuits (AREA)
- Semiconductor Lasers (AREA)
Description
【発明の詳細な説明】 産業上の利用分野 本発明は光通信用光源やコンパクトディスク用光源に用
いることができる光集積回路装置に関するものである。Description: TECHNICAL FIELD The present invention relates to an optical integrated circuit device that can be used as a light source for optical communication and a light source for compact discs.
従来の技術 従来、半導体レーザを用いる際、一定光出力を得るため
には、レーザの後方より出射する光を受光素子で検知
し、その信号をレーザの駆動回路ヘフィードバックす
る、いわゆるAPC(Automatic Power Control)動作
を行なっている。このため、レーザチップの後方に受光
素子をボンディングしなければならない。又、受光素子
からの反射光がレーザキャビティに戻ると発振光の縦モ
ードを不安定にするため、反射光がレーザキャビティー
に戻らないように配慮されなければならない。これとは
別に戻り光を利用して、縦モードを安定化する方法も検
討されている。これらの縦モード安定化のために外部に
反射鏡を設ける方法が行われている。2. Description of the Related Art Conventionally, when a semiconductor laser is used, in order to obtain a constant light output, light emitted from the rear of the laser is detected by a light receiving element, and the signal is fed back to a laser drive circuit, so-called APC (Automatic Power). Control) operation. Therefore, the light receiving element has to be bonded behind the laser chip. Further, when the reflected light from the light receiving element returns to the laser cavity, the longitudinal mode of the oscillated light becomes unstable. Therefore, care must be taken to prevent the reflected light from returning to the laser cavity. Aside from this, a method of stabilizing the longitudinal mode by utilizing the returning light is also being studied. In order to stabilize these longitudinal modes, a method of providing a reflecting mirror on the outside has been performed.
発明が解決しようとする問題点 上記のようにレーザのAPC動作のために受光素子を後
方に設けることや、縦モード安定化のために外部に反射
鏡を設ける方法は、装着時の再現性に乏しく、安定性に
欠ける。Problems to be Solved by the Invention As described above, the method of providing the light receiving element in the rear for the APC operation of the laser and the method of providing the external reflecting mirror for stabilizing the longitudinal mode are not reproducible at the time of mounting. Poor and lacking stability.
本発明は上記欠点に鑑み、縦モードの安定化を安定性よ
く実施することのできる光集積回路装置を提供するもの
である。In view of the above drawbacks, the present invention provides an optical integrated circuit device capable of stabilizing the longitudinal mode with good stability.
問題点を解決するための手段 上記問題点を解決するために、本発明の光集積回路装置
は、半導体レーザとそのキャビティーに隣接してレーザ
の活性層に一致するように絶縁膜を介して受光素子とな
るPn接合が形成されて構成されている。Means for Solving the Problems In order to solve the above problems, the optical integrated circuit device of the present invention has a semiconductor laser and a cavity between the semiconductor laser and an insulating film so as to be adjacent to the active layer of the laser. It is configured by forming a Pn junction which becomes a light receiving element.
作用 この構成によって、レーザの活性層内に分布する光の一
部を受光素子で検知することができ、その信号でAPC
動作を行なうことができる。その上、レーザキャビティ
ーに隣接して局部的に形成された受光素子部とそれ以外
にキャビティー部界面で光の内部反射が起こり、複合キ
ャビティーを構成し、縦モードを安定化することができ
る。With this configuration, a part of the light distributed in the active layer of the laser can be detected by the light receiving element, and the signal can be used to detect the APC.
Can perform actions. In addition, internal reflection of light occurs at the interface between the light-receiving element part formed locally adjacent to the laser cavity and the cavity part other than that, forming a composite cavity and stabilizing the longitudinal mode. it can.
実施例 以下、本発明の一実施例について、図面を参照しながら
説明する。Embodiment One embodiment of the present invention will be described below with reference to the drawings.
第1図,第2図は本発明の実施例における光集積回路の
斜視図および断面図である。1 and 2 are a perspective view and a sectional view of an optical integrated circuit according to an embodiment of the present invention.
1はp型GaAs基板、2はn型GaAs層、3はp型Ga1-xAlx
Asクラッド層、4はノンドープGa1-yAlyAs活性層、5は
n型Ga1-x′Alx′Asクラッド層、6はn型GaAs層、7は
p側オーミック電極、8はn側オーミック電極、9はレ
ーザと受光素子を電気的に分離するSiO2膜、10はn型
GaAs層、11はp型GaAs層、12はオーミック電極、1
3〜15は電極端子である。1 is a p-type GaAs substrate, 2 is an n-type GaAs layer, 3 is a p-type Ga 1-x Al x
As clad layer, 4 is a non - doped Ga 1-y Al y As active layer, 5 is an n-type Ga 1-x ′ Al x ′ As clad layer, 6 is an n-type GaAs layer, 7 is a p-side ohmic electrode, and 8 is n. Side ohmic electrode, 9 is a SiO 2 film that electrically separates the laser and the light receiving element, and 10 is an n-type
GaAs layer, 11 is p-type GaAs layer, 12 is ohmic electrode, 1
3 to 15 are electrode terminals.
n型GaAs層2は1μm、p型Ga1-xAlxAsクラッド層3は
0.3μm、活性層4は0.1μm、n型Ga1-x′Alx′As層5
は2μm、n型GaAs層6は2μmである。SiO2膜9はク
ラッド層3の溝部エッジより5μmの所に位置し、厚さ
3000Åである。n型GaAs層10とp型GaAs層11と
の接合部は活性層4と一致している。The n-type GaAs layer 2 is 1 μm, and the p-type Ga 1-x Al x As clad layer 3 is
0.3 μm, active layer 4 is 0.1 μm, n-type Ga 1-x ′ Al x ′ As layer 5
Is 2 μm and the n-type GaAs layer 6 is 2 μm. The SiO 2 film 9 is located 5 μm from the groove edge of the cladding layer 3 and has a thickness of 3000 Å. The junction between the n-type GaAs layer 10 and the p-type GaAs layer 11 coincides with the active layer 4.
以上のように構成された光集積回路について、その動作
を説明する。The operation of the optical integrated circuit configured as described above will be described.
先ず、端子13をプラス、端子14をマイナスにしてレ
ーザ部をバイアスするとクラッド層3の溝部直上の活性
層4で単一横モード発振を行なう。ここで端子13に対
して15もマイナスにしてn,p−GaAs層10,11の
接合部に逆バイアスを印加する。First, when the terminal 13 is positive and the terminal 14 is negative and the laser portion is biased, single transverse mode oscillation is performed in the active layer 4 immediately above the groove portion of the cladding layer 3. Here, 15 is also made negative with respect to the terminal 13, and a reverse bias is applied to the junction of the n, p-GaAs layers 10 and 11.
キャビティーでの活性層接合面に平行方向での光の近視
野分布はクラッド層3の溝幅以上に広がり光分布の一部
がSiO2膜9を通してn,p−GaAs層10,11の接合部
で吸収されることになり、その信号を用いることによっ
てレーザの光出力を一定にするAPC動作を行なうこと
ができる。The near-field distribution of light in the direction parallel to the active layer bonding surface in the cavity spreads beyond the groove width of the cladding layer 3 and part of the light distribution passes through the SiO 2 film 9 to bond the n, p-GaAs layers 10, 11 together. The light is absorbed by a part, and by using the signal, it is possible to perform the APC operation in which the light output of the laser is made constant.
本実施例のレーザは3つのキャビティーl1,l2,l
3を有する複合キャビティーレーザになっており、ゲイ
ン分布の中で3つのキャビティーで干渉を行なう波長が
選択され、単一縦モード発振を行なう。The laser of this embodiment has three cavities l 1 , l 2 , l
It is a compound cavity laser having 3 and wavelengths that cause interference in 3 cavities in the gain distribution are selected, and single longitudinal mode oscillation is performed.
又、レーザ方向の光の出射を必要とせず、キャビティー
の後方端面に高反射コーディング膜16を形成し、反射
率を100%に近い高反射面を形成することにより、レ
ーザの高出力化も容易に行なえる。なお、実施例ではレ
ーザとして内部ストライプ型を示したが、これに限定さ
れるものではなく、いかなるストライプ型レーザでも用
いることができる。又、受光部としてpn接合を示した
が、これに限定されるものではなく、いかなる受光素子
(pin,アバランシェフォトダイオード,フォトコンダ
クターなど)でもよい。又、GaAs-CaAlAs系材料で示し
たが、InGaAs p系をはじめ、その他のIII−V,II−I
V族半導体の使用も可能である。Further, it is not necessary to emit light in the laser direction, and a high reflection coating film 16 is formed on the rear end surface of the cavity to form a high reflection surface having a reflectance close to 100%, thereby increasing the laser output. Easy to do. Although the internal stripe type laser is shown as the laser in the embodiments, the present invention is not limited to this, and any stripe type laser can be used. Although the pn junction is shown as the light receiving portion, the light receiving portion is not limited to this, and any light receiving element (pin, avalanche photodiode, photoconductor, etc.) may be used. Also, although shown as GaAs-CaAlAs-based materials, InGaAs p-based and other III-V, II-I
The use of Group V semiconductors is also possible.
SiO2以外の絶縁材料の使用できることはいうまでもな
い。又、本実施例では受光部をレーザキャビティーの中
央に位置させ、3つのキャビティーの構成を示したが受
光部をキャビティー端部に形成し2つのキャビティーに
することも可能である。その上、受光部を複数にして3
つ以上の複合キャビティーレーザも構成することができ
る。又、発振部の両側に設けることもできる。It goes without saying that an insulating material other than SiO 2 can be used. In this embodiment, the light receiving portion is located at the center of the laser cavity, and the structure of three cavities is shown. However, the light receiving portion may be formed at the end of the cavity to form two cavities. In addition, the number of light-receiving units is 3
Two or more composite cavity lasers can also be constructed. It can also be provided on both sides of the oscillator.
発明の効果 以上のように本発明は、レーザのストライプ状キャビテ
ィーに隣接させ、受光素子を設けることにより、受光素
子の信号を用いてレーザをAPC動作させることがで
き、その上、複合キャビティー構造をとることができ、
安定な単一縦モード発振を行うことができ、その実用的
効果は大なるものである。As described above, according to the present invention, by providing the light receiving element adjacent to the stripe-shaped cavity of the laser, the laser of the light receiving element can be used for the APC operation, and moreover, the composite cavity is provided. Can take a structure,
Stable single longitudinal mode oscillation can be performed, and its practical effect is great.
さらに、後方端面を高反射率にすることによりレーザの
高出力動作という効果も得られる。Further, by making the rear end face have a high reflectance, an effect of high power operation of the laser can be obtained.
第1図は本発明の一実施例における光集積回路装置の斜
視図、第2図はその断面図である。 1……p型GaAs基板、2……n型GaAs層、3……p型Ga
1-xAlxAs層、4……ノンドープGa1-yAlyAs活性層、5…
…n型Ga1-x′Alx′As層、6……n型GaAs層、7……p
側オーミック電極、8……n側オーミック電極、9……
SiO2膜、10……n型GaAs層、11……p型GaAs層、1
2……オーミック電極、13〜15……電極端子、16
……高反射コーティング膜。FIG. 1 is a perspective view of an optical integrated circuit device according to an embodiment of the present invention, and FIG. 2 is a sectional view thereof. 1 ... p-type GaAs substrate, 2 ... n-type GaAs layer, 3 ... p-type Ga
1-x Al x As layer, 4 ... Non - doped Ga 1-y Al y As active layer, 5 ...
... n-type Ga 1-x 'Al x' As layer, 6 ...... n-type GaAs layer, 7 ...... p
Side ohmic electrode, 8 ... n side ohmic electrode, 9 ...
SiO 2 film, 10 ... n-type GaAs layer, 11 ... p-type GaAs layer, 1
2 ... Ohmic electrode, 13-15 ... Electrode terminal, 16
...... Highly reflective coating film.
Claims (2)
接合と、ストライプ状の窓を有する電流制限層とをそな
えた半導体レーザにおいて、少なくともレーザキャビテ
ィ部に隣接した前記ダブルヘテロ接合の一部を除去した
部分に、絶縁膜を介して受光素子がその接合部と前記活
性層と同位置となるように形成され、前記受光素子部と
前記レーザキャビティ部界面で光の内部反射を生じさ
せ、複合キャビティを構成することを特徴とする光集積
回路装置。1. A semiconductor laser having a double heterojunction including an active layer on a semiconductor substrate and a current limiting layer having a stripe-shaped window, wherein at least a part of the double heterojunction adjacent to the laser cavity is formed. In the removed portion, a light receiving element is formed through an insulating film so as to be located at the same position as the junction and the active layer, and internal reflection of light is generated at the interface between the light receiving element and the laser cavity portion, and An optical integrated circuit device comprising a cavity.
が形成されていることを特徴とする特許請求の範囲第1
項記載の光集積回路装置。2. A high-reflectivity film is formed on the rear end face of the laser cavity.
An optical integrated circuit device according to the item.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60157254A JPH0644659B2 (en) | 1985-07-17 | 1985-07-17 | Optical integrated circuit device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP60157254A JPH0644659B2 (en) | 1985-07-17 | 1985-07-17 | Optical integrated circuit device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS6218079A JPS6218079A (en) | 1987-01-27 |
| JPH0644659B2 true JPH0644659B2 (en) | 1994-06-08 |
Family
ID=15645628
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP60157254A Expired - Lifetime JPH0644659B2 (en) | 1985-07-17 | 1985-07-17 | Optical integrated circuit device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0644659B2 (en) |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2695315B2 (en) * | 1991-08-01 | 1997-12-24 | 株式会社ピーエフユー | Malfunction prevention device for paper detection sensor |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56150888A (en) * | 1980-04-23 | 1981-11-21 | Matsushita Electric Ind Co Ltd | Semiconductor laser device |
| JPS59128756U (en) * | 1983-02-18 | 1984-08-30 | 三洋電機株式会社 | semiconductor laser equipment |
-
1985
- 1985-07-17 JP JP60157254A patent/JPH0644659B2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6218079A (en) | 1987-01-27 |
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